JP2848103B2 - Magnetic recording medium - Google Patents

Magnetic recording medium

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Publication number
JP2848103B2
JP2848103B2 JP9388892A JP9388892A JP2848103B2 JP 2848103 B2 JP2848103 B2 JP 2848103B2 JP 9388892 A JP9388892 A JP 9388892A JP 9388892 A JP9388892 A JP 9388892A JP 2848103 B2 JP2848103 B2 JP 2848103B2
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JP
Japan
Prior art keywords
film
magnetic
recording medium
acid
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP9388892A
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Japanese (ja)
Other versions
JPH05266457A (en
Inventor
秀幸 高見
郁雄 中山
佐藤  誠
昌弘 斉藤
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Uemera Kogyo Co Ltd
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Uemera Kogyo Co Ltd
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、磁気ディスク、磁気ド
ラム等の磁気記録体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium such as a magnetic disk and a magnetic drum.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
磁気ディスク等の磁気記録体を製造する場合、アルミニ
ウム等の非磁性基体上に非磁性皮膜を形成し、更にその
上に磁性皮膜を形成することが行われており、この場合
非磁性皮膜としては、比較的リン含量の高いNi−P合
金皮膜が広く用いられている。
2. Description of the Related Art
When manufacturing a magnetic recording medium such as a magnetic disk, a non-magnetic film is formed on a non-magnetic substrate such as aluminum, and a magnetic film is further formed thereon. Ni-P alloy films having a relatively high phosphorus content are widely used.

【0003】このNi−P合金皮膜は、主として次亜リ
ン酸塩を還元剤とする無電解ニッケルめっき浴を用いて
形成されるが、このNi−P皮膜は均一析出性、高耐食
性、高硬度、高耐摩耗性等の利点を有するものの、20
0℃以上の温度で熱処理されると容易に磁性を帯びると
いう問題がある。このため、無電解Ni−Pめっき浴中
の次亜リン酸イオン濃度を高めるなどしてNi−P皮膜
中のP含量を高めることが行われているが、非磁性維持
の点でなお改善の余地がある。
[0003] This Ni-P alloy film is formed mainly by using an electroless nickel plating bath using hypophosphite as a reducing agent. This Ni-P film has uniform deposition properties, high corrosion resistance and high hardness. Although it has advantages such as high abrasion resistance, 20
There is a problem that when heat-treated at a temperature of 0 ° C. or more, magnetism is easily obtained. For this reason, although the P content in the Ni-P film has been increased by increasing the concentration of hypophosphite ions in the electroless Ni-P plating bath, the improvement of the non-magnetic property is still required. There is room.

【0004】磁気記録体の製造においては、Ni−P皮
膜を形成した後、磁性皮膜の形成にスパッタリング法に
より高温下(例えば300℃)に長時間Ni−P皮膜が
曝される場合が多いが、このような場合、Ni−P皮膜
はそのリン含量を多くしても磁性を帯び易く、このため
高温,長時間の熱的条件下に置かれても、非磁性皮膜が
磁化され難く、非磁性を維持し得る磁気記録体が望まれ
ていた。
In the manufacture of magnetic recording media, after forming a Ni-P film, the Ni-P film is often exposed to a high temperature (eg, 300 ° C.) for a long time by a sputtering method for forming the magnetic film. In such a case, the Ni-P film is likely to be magnetized even if its phosphorus content is increased, so that the non-magnetic film is hardly magnetized even under a high-temperature and long-time thermal condition. A magnetic recording medium capable of maintaining magnetism has been desired.

【0005】[0005]

【課題を解決するための手段及び作用】本発明者らは、
上記要望に応えるため鋭意検討を行った結果、後述する
特定の無電解Ni−P−Moめっき浴から得られたニッ
ケル85.2〜89.1%、リン10.7〜13%、モ
リブデン0.2〜1.8%(%は重量%を示す。以下同
様。)の非晶質Ni−P−Mo合金皮膜を磁気記録体の
非磁性皮膜として形成することにより、この非磁性皮膜
は例えば300℃で3時間熱処理しても磁性を帯びず、
従って高温,長時間の熱的条件下に置かれても、非磁性
皮膜が磁化され難い磁気記録体が可能になることを知見
した。
Means and Action for Solving the Problems The present inventors have
As a result of intensive studies to respond to the above demands, nickel 85.2 to 89.1%, phosphorus 10.7 to 13%, and molybdenum 0.1% obtained from a specific electroless Ni-P-Mo plating bath described later. By forming an amorphous Ni-P-Mo alloy film of 2 to 1.8% (% means% by weight; the same applies hereinafter) as a nonmagnetic film of a magnetic recording medium, this nonmagnetic film becomes, for example, 300%. Even after heat treatment at ℃ for 3 hours, it does not take on magnetism.
Therefore, it has been found that a magnetic recording medium in which the non-magnetic film is hardly magnetized even when subjected to high-temperature and long-term thermal conditions can be obtained.

【0006】なお、従来より無電解Ni−P−Moめっ
き皮膜については種々の提案がある(特公昭57−54
545号公報、特開昭62−60878号及び特開平3
−97835号公報)。しかし、これらのNi−P−M
o皮膜は、Mo含量が高く、通常Mo含量を10%以上
として使用するもので、このようにMo含量が高いと、
逆に皮膜中のリン含有量が低くなり、皮膜が非晶質から
結晶質に変化し、また浴の安定性が悪くなるという問題
があり、非磁性、耐食性という点で磁気記録体の非磁性
皮膜としては適当でない。
Various proposals have been made for electroless Ni-P-Mo plating films (JP-B-57-54).
No. 545, Japanese Patent Application Laid-Open No. 62-60878 and Japanese Patent Application Laid-Open
-97835). However, these Ni-PMs
The o film has a high Mo content and is usually used with a Mo content of 10% or more.
Conversely, the phosphorus content in the film decreases, the film changes from amorphous to crystalline, and the stability of the bath deteriorates. The non-magnetic properties of the magnetic recording medium in terms of non-magnetism and corrosion resistance Not suitable as a film.

【0007】ところが、Mo含量を少なくし、上記のよ
うにMo含量が0.2〜1.8%となるようにP含量1
0.7〜13%のNi−P合金皮膜中にMoを含有させ
た場合、Ni−P皮膜の特性、特に高耐食性、高硬度、
高耐摩耗性という利点を保持し、しかも高温で長時間熱
処理しても磁性を帯び難く、飽和磁束密度が2ガウス以
下の非磁性を維持する非晶質のNi−P−Mo皮膜が得
られ、かかるNi−P−Mo皮膜を磁気記録体の非磁性
皮膜とすることにより、上述した本発明の目的が有効に
達成されることを知見し、本発明をなすに至ったもので
ある。
However, the Mo content is reduced, and the P content is set to 1 so that the Mo content is 0.2 to 1.8% as described above.
When Mo is contained in the Ni-P alloy film of 0.7 to 13%, the characteristics of the Ni-P film, particularly high corrosion resistance, high hardness,
An amorphous Ni-P-Mo film that retains the advantage of high abrasion resistance, is hard to be magnetized even after heat treatment at a high temperature for a long time, and maintains a nonmagnetic property with a saturation magnetic flux density of 2 Gauss or less can be obtained. The inventors have found that the above-mentioned object of the present invention can be effectively achieved by using such a Ni-P-Mo film as a non-magnetic film of a magnetic recording medium, and have accomplished the present invention.

【0008】従って、本発明は、非磁性基体上に非磁性
皮膜を形成し、その上に磁性皮膜を形成してなる磁気記
録体において、上記非磁性皮膜が、水溶性ニッケル塩
と、水溶性モリブデン酸塩と、次亜リン酸又はその塩
と、錯化剤としてオキシジカルボン酸又はその塩及びO
H基を含まないジカルボン酸又はその塩を主成分とする
pH4〜5の酸性無電解Ni−P−Moめっき浴から得
られ、ニッケル85.2〜89.1%、リン10.7〜
13%、モリブデン0.2〜1.8%の組成の非晶質の
飽和磁束密度が2ガウス以下であるNi−P−Mo合金
皮膜であることを特徴とする磁気記録体を提供する。
Accordingly, the present invention provides a magnetic recording medium comprising a non-magnetic film formed on a non-magnetic substrate and a magnetic film formed thereon, wherein the non-magnetic film comprises a water-soluble nickel salt, Molybdate, hypophosphorous acid or a salt thereof, oxydicarboxylic acid or a salt thereof as a complexing agent and O
Obtained from an acidic electroless Ni-P-Mo plating bath having a pH of 4 to 5 and containing a dicarboxylic acid or a salt thereof containing no H group as a main component, 85.2 to 89.1% of nickel and 10.7 to 1 of phosphorus
Provided is a magnetic recording medium characterized by being a Ni-P-Mo alloy film having an amorphous saturation magnetic flux density of 2 Gauss or less having a composition of 13% and molybdenum of 0.2 to 1.8%.

【0009】以下、本発明につき更に詳しく説明する
と、本発明の磁気記録体は、非磁性基体上に非磁性皮
膜、磁性皮膜を順次形成したものである。
Hereinafter, the present invention will be described in more detail. The magnetic recording medium of the present invention has a non-magnetic film and a magnetic film formed sequentially on a non-magnetic substrate.

【0010】ここで、非磁性基体としては、アルミニウ
ム、アルミニウム合金等が用いられる。
Here, as the non-magnetic substrate, aluminum, an aluminum alloy or the like is used.

【0011】また、本発明においては、上記非磁性皮膜
はNi85.2〜89.1%、P10.7〜13%、M
o0.2〜1.8%の組成の非晶質Ni−P−Mo合金
皮膜より形成される。Mo含量が0.2%より少ないと
非磁性特性が低下し、一方1.8%を越えるとリン含量
が低下し、この場合も非磁性特性が低下する。
Further, in the present invention, the non-magnetic film is composed of 85.2 to 89.1% of Ni, 10.7 to 13% of P,
It is formed from an amorphous Ni-P-Mo alloy film having a composition of 0.2 to 1.8%. If the Mo content is less than 0.2%, the non-magnetic properties decrease, while if it exceeds 1.8%, the phosphorus content decreases, and again the non-magnetic properties decrease.

【0012】また、P含量が10.7%より少ない場合
も非磁性特性が低下し、13%を越えると皮膜の外観が
悪くなり、表面の粗度が悪くなる。
Further, when the P content is less than 10.7%, the non-magnetic properties deteriorate, and when the P content exceeds 13%, the appearance of the film deteriorates and the surface roughness deteriorates.

【0013】この非晶質Ni−P−Mo合金皮膜を形成
する方法としては、無電解Ni−P−Moめっき浴を用
いた無電解めっき方法が採用される。
As a method of forming the amorphous Ni-P-Mo alloy film, an electroless plating method using an electroless Ni-P-Mo plating bath is employed.

【0014】この場合、無電解Ni−P−Moめっき浴
は、水溶性ニッケル塩、水溶性モリブデン酸塩、次亜リ
ン酸又はその塩、それに錯化剤を含むものが用いられ
る。
In this case, the electroless Ni-P-Mo plating bath contains a water-soluble nickel salt, a water-soluble molybdate, hypophosphorous acid or a salt thereof, and a complexing agent.

【0015】更に具体的に説明すると、無電解Ni−P
−Moめっき浴において、水溶性ニッケル塩としては、
硫酸ニッケル、塩化ニッケル等が用いられ、めっき浴中
の濃度は、ニッケルとして2〜10g/l、特に4〜8
g/lとすることが好ましい。
More specifically, electroless Ni-P
In the Mo plating bath, the water-soluble nickel salt includes:
Nickel sulfate, nickel chloride or the like is used, and the concentration in the plating bath is 2 to 10 g / l as nickel, particularly 4 to 8 g / l.
g / l is preferable.

【0016】また、水溶性モリブデン酸塩としては、モ
リブデン酸ナトリウム、モリブデン酸アンモニウム、モ
リブデン酸カリウム、モリブデン酸カルシウム、リンモ
リブデン酸、リンモリブデン酸アンモニウム等が用いら
れ、めっき浴中の濃度は0.01〜5g/l、特に0.
05〜1g/lとすることが好ましい。モリブデン酸塩
の濃度が0.01g/lより低いとめっき皮膜中のモリ
ブデン含量が0.2%より少なくなり、一方5g/lを
越えると、モリブデン含量が1.8%より多くなる場合
が生じる。
Examples of the water-soluble molybdate include sodium molybdate, ammonium molybdate, potassium molybdate, calcium molybdate, phosphomolybdic acid, ammonium phosphomolybdate, and the like. 01-5 g / l, especially 0.
It is preferable to set the amount to 0.5 to 1 g / l. When the concentration of molybdate is lower than 0.01 g / l, the molybdenum content in the plating film becomes less than 0.2%, while when it exceeds 5 g / l, the molybdenum content becomes more than 1.8%. .

【0017】次亜リン酸又はその塩としては、次亜リン
酸ナトリウム、次亜リン酸カリウム等か好適に使用さ
れ、めっき浴中の濃度は10〜50g/l、特に20〜
40g/lとすることが好ましい。その量が少なすぎる
とめっき皮膜中のリン含量が10.7%より少なくな
り、逆に多すぎるとめっき皮膜中のリン含量が13%よ
り多くなる場合が生じる。
As the hypophosphorous acid or a salt thereof, sodium hypophosphite, potassium hypophosphite or the like is preferably used, and the concentration in the plating bath is 10 to 50 g / l, particularly 20 to 50 g / l.
It is preferably 40 g / l. If the amount is too small, the phosphorus content in the plating film becomes less than 10.7%, and if it is too large, the phosphorus content in the plating film may become more than 13%.

【0018】錯化剤としては、グリコール酸、乳酸、グ
ルコン酸、プロピオン酸等のモノカルボン酸、酒石酸、
リンゴ酸、コハク酸等のジカルボン酸、クエン酸等のト
リカルボン酸やそれらのナトリウム塩、カリウム塩、ア
ンモニウム塩などのカルボン酸類の1種を単独で又は2
種以上を組み合わせて使用し得るか、本発明において
は、特にNi−P−Mo皮膜の非磁性特性が良好で、上
記組成のNi−P−Mo皮膜を確実に形成し得る点か
ら、錯化剤として、オキシジカルボン酸又はその塩とO
H基を含まないジカルボン酸又はその塩とを併用するこ
とが非磁性特性、析出速度、浴安定性の点から好まし
く、この際前者と後者の併用比率はモル比として10:
1〜0.5:1、特に8:1〜1:1であることが、そ
の併用効果をより有効に発揮させることができる点から
推奨される。
Examples of complexing agents include monocarboxylic acids such as glycolic acid, lactic acid, gluconic acid and propionic acid, tartaric acid,
Dicarboxylic acids such as malic acid and succinic acid; tricarboxylic acids such as citric acid; and carboxylic acids such as sodium salts, potassium salts and ammonium salts thereof alone or in combination with 2 or more.
In the present invention, complexing is preferred because the nonmagnetic properties of the Ni-P-Mo film are particularly good and the Ni-P-Mo film having the above composition can be surely formed. Oxydicarboxylic acid or a salt thereof with O
It is preferable to use a dicarboxylic acid containing no H group or a salt thereof in combination from the viewpoint of nonmagnetic properties, deposition rate, and bath stability. In this case, the combination ratio of the former and the latter is 10:
The ratio of 1 to 0.5: 1, particularly 8: 1 to 1: 1 is recommended because the combined effect can be more effectively exhibited.

【0019】上記錯化剤の配合量は適宜選定されるが、
水溶性ニッケル塩1モルに対し1〜7モル、特に2〜6
モルとすることが好ましい。
The amount of the complexing agent is appropriately selected.
1 to 7 mol, especially 2 to 6 mol per mol of the water-soluble nickel salt
It is preferred to be molar.

【0020】なお、無電解Ni−P−Moのめっき浴に
は、鉛塩その他の安定剤、pH調整剤などの成分を添加
することができ、またそのpHはpH4〜5の酸性範囲
とする。
In the electroless Ni-P-Mo plating bath, components such as lead salts and other stabilizers and pH adjusters can be added, and the pH is in the acidic range of pH 4-5. .

【0021】このめっき浴を用いて非磁性基体上に非磁
性皮膜(上記組成のNi−P−Mo非晶質皮膜)を形成
する場合は、非磁性基体を常法に従って前処理した後、
該めっき浴に浸漬すればよいが、めっき温度は通常70
〜95℃で行われる。また、めっきに際しては、スター
ラーによる撹拌、ポンプによる撹拌、被めっき物を揺動
させるなどの方法でめっき浴を適度に撹拌することが好
ましく、撹拌により確実に良好な耐熱非磁性のめっき皮
膜を得ることができる。
When a non-magnetic film (Ni-P-Mo amorphous film having the above composition) is formed on a non-magnetic substrate using this plating bath, the non-magnetic substrate is pre-treated according to a conventional method.
It may be immersed in the plating bath, but the plating temperature is usually 70
Performed at 9595 ° C. In plating, it is preferable to stir the plating bath appropriately by a method such as stirring with a stirrer, stirring with a pump, or rocking the object to be plated, so that a good heat-resistant non-magnetic plating film is reliably obtained by stirring. be able to.

【0022】なお、本発明において、この非磁性皮膜の
厚さは1〜30μm、特に5〜15μmとすることが好
ましい。
In the present invention, the thickness of the non-magnetic film is preferably 1 to 30 μm, particularly preferably 5 to 15 μm.

【0023】本発明の磁気記録体は、この非磁性皮膜を
形成後は、常法により表面研摩など通常の処理を行い、
次いでその上に磁性皮膜を形成する。この磁性皮膜とし
ては公知のものでよく、その形成法も公知の方法を採用
し得る。また、磁性皮膜上に保護膜を形成するなど、適
宜の後処理が採用し得る。
After the formation of the non-magnetic film, the magnetic recording medium of the present invention is subjected to ordinary processing such as surface polishing by an ordinary method,
Next, a magnetic film is formed thereon. The magnetic film may be a known one, and a known method can be employed for forming the magnetic film. Further, an appropriate post-treatment such as forming a protective film on the magnetic film can be adopted.

【0024】ここで、本発明の上記非磁性皮膜は従来の
Ni−P皮膜より非磁性特性に優れ、例えば300℃で
3時間熱処理されても非磁性を維持するので、磁性皮
膜、保護膜の形成にスパッタリング法を採用したり、特
開昭56−124118号公報にあるように、加熱によ
り磁性を発生する薄膜を形成し、これを加熱して磁性皮
膜を形成したりするなど、非磁性皮膜形成後、200℃
以上、特に250℃以上、場合によっては300℃以上
の雰囲気となる工程、製造法を採用しても支障がない。
Here, the non-magnetic film of the present invention has better non-magnetic properties than the conventional Ni-P film, and maintains non-magnetism even when heat-treated at 300 ° C. for 3 hours. Non-magnetic coatings such as adopting a sputtering method for the formation, or forming a thin film which generates magnetism by heating and heating to form a magnetic coating as disclosed in JP-A-56-124118. After formation, 200 ° C
As mentioned above, there is no problem even if a process and a manufacturing method in which the atmosphere is at least 250 ° C. or more, and sometimes 300 ° C. or more are adopted.

【0025】また、本発明の非磁性皮膜は、Mo含量が
0.2〜1.8%と少ないので、実質的にNi−P合金
皮膜と同等の特性、例えば高耐食性、高硬度、高耐摩耗
性、均一析出性等の利点を発揮する。
Further, since the non-magnetic film of the present invention has a small Mo content of 0.2 to 1.8%, it has substantially the same properties as the Ni—P alloy film, for example, high corrosion resistance, high hardness, and high resistance. It exhibits advantages such as abrasion and uniform precipitation.

【0026】[0026]

【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。
EXAMPLES The present invention will be described below in detail with reference to examples and comparative examples, but the present invention is not limited to the following examples.

【0027】〔実施例1〜4,比較例〕 下記組成の無電解めっき浴を調製し、被めっきサンプル
として亜鉛置換処理を施したアルミニウム板上にスター
ラー撹拌下において90℃で120分間めっきを行い、
約15μm厚さのめっき皮膜を得た。次に、このめっき
皮膜を電気オーブンを使用し、図1〜3に示す条件で空
気中において熱処理し、飽和磁束密度を測定した。結果
を図1〜3に示す。なお、モリブデン酸ナトリウム量を
変化させた場合の皮膜組成を表1に示す。
Examples 1-4, Comparative Example An electroless plating bath having the following composition was prepared and plated on a zinc-substituted aluminum plate as a sample to be plated at 90 ° C. for 120 minutes with stirring with a stirrer. ,
A plating film having a thickness of about 15 μm was obtained. Next, this plating film was heat-treated in air using an electric oven under the conditions shown in FIGS. 1 to 3 and the saturation magnetic flux density was measured. The results are shown in FIGS. Table 1 shows the film composition when the amount of sodium molybdate was changed.

【0028】浴組成 硫酸ニッケル(ニッケルとして) 6 g/l 次亜リン酸ナトリウム 30 〃 モリブデン酸ナトリウム 0〜1 〃 リンゴ酸 18 〃 コハク酸 16 〃 安定剤 微 量 pH 4.5 なお、磁性測定条件は下記の通りである。磁性測定条件 :振動試料型磁力計(理研電子製BHV−50型) 印加磁場2500O 感度0.005EMU 試料 1×1cm 測定回数n=2 Bath composition Nickel sulfate (as nickel) 6 g / l Sodium hypophosphite 30 {Sodium molybdate 0-1} Malic acid 18 {Succinic acid 16} Stabilizer Fine pH 4.5 Magnetic measurement conditions Is as follows. Magnetic measurement conditions : Vibrating sample magnetometer (BHV-50, manufactured by Riken Denshi) Applied magnetic field 2500 O e Sensitivity 0.005 EMU Sample 1 × 1 cm Number of measurements n = 2

【0029】[0029]

【表1】 [Table 1]

【0030】表1及び図1〜3の結果より、本発明に係
るNi−P−Mo合金めっき皮膜(非磁性皮膜)は、M
oを含まないNi−P合金めっき皮膜に比較して非磁性
特性が優れ、従来のNi−P皮膜では300℃,2時間
の加熱で磁性化されるのに対し、非磁性が維持されるこ
とが認められる。
From the results shown in Table 1 and FIGS. 1 to 3, the Ni—P—Mo alloy plating film (nonmagnetic film) according to the present invention
Non-magnetic properties are superior to Ni-P alloy plating films containing no o. Conventional Ni-P films are magnetized by heating at 300 ° C. for 2 hours, while non-magnetic properties are maintained. Is recognized.

【0031】而して、このようなNi−P−Mo合金め
っき皮膜は、次いで表面を平滑に研摩した後、常法によ
り磁性皮膜が形成され、必要により保護膜が形成されて
磁気記録体が得られるものである。
The Ni—P—Mo alloy plating film is then polished to a smooth surface, then a magnetic film is formed by an ordinary method, and if necessary, a protective film is formed. It is obtained.

【0032】[0032]

【発明の効果】本発明の磁気記録体は、その非磁性皮膜
が特定組成の非晶質のNi−P−Mo合金皮膜であるこ
とにより、高温、長時間の熱的条件下におかれても、該
非磁性皮膜が磁化され難く、非磁性を維持し得るもので
ある。
According to the magnetic recording medium of the present invention, since the non-magnetic film is an amorphous Ni-P-Mo alloy film having a specific composition, it can be exposed to high-temperature and long-term thermal conditions. Also, the non-magnetic film is hardly magnetized and can maintain the non-magnetism.

【図面の簡単な説明】[Brief description of the drawings]

【図1】NaMoOを種々の濃度で含むめっき浴か
ら得られためっき皮膜を300℃で2時間熱処理した場
合におけるNaMoO濃度と飽和磁束密度との関係
を示すグラフである。
FIG. 1 is a graph showing the relationship between the Na 2 MoO 4 concentration and the saturation magnetic flux density when a plating film obtained from a plating bath containing Na 2 MoO 4 at various concentrations is heat-treated at 300 ° C. for 2 hours.

【図2】NaMoOを0g/l又は0.3g/l含
むめっき浴から得られためっき皮膜を種々の温度で2時
間熱処理した場合における熱処理温度と飽和磁束密度と
の関係を示すグラフである。
FIG. 2 is a graph showing a relationship between a heat treatment temperature and a saturation magnetic flux density when heat treatment is performed at various temperatures on plating films obtained from a plating bath containing Na 2 MoO 4 at 0 g / l or 0.3 g / l. It is.

【図3】NaMoOを0g/l又は0.3g/l含
むめっき浴から得られためっき皮膜を300℃で熱処理
した場合における熱処理時間と飽和磁束密度との関係を
示すグラフである。
FIG. 3 is a graph showing a relationship between a heat treatment time and a saturation magnetic flux density when a plating film obtained from a plating bath containing Na 2 MoO 4 at 0 g / l or 0.3 g / l is heat-treated at 300 ° C.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 斉藤 昌弘 大阪府枚方市出口1丁目5番1号 上村 工業株式会社 開発技術研究所内 (56)参考文献 旭硝子工業技術奨励会研究報告、52 (1988)第53頁−第62頁 (58)調査した分野(Int.Cl.6,DB名) C23C 18/50 G11B 5/66 G11B 5/84────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Masahiro Saito 1-5-1, Hirakata Exit, Hirakata City, Osaka Pref. Page 53-Page 62 (58) Field surveyed (Int.Cl. 6 , DB name) C23C 18/50 G11B 5/66 G11B 5/84

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 非磁性基体上に非磁性皮膜を形成し、そ
の上に磁性皮膜を形成してなる磁気記録体において、上
記非磁性皮膜が、水溶性ニッケル塩と、水溶性モリブデ
ン酸塩と、次亜リン酸又はその塩と、錯化剤としてオキ
シジカルボン酸又はその塩及びOH基を含まないジカル
ボン酸又はその塩を主成分とするpH4〜5の酸性無電
解Ni−P−Moめっき浴から得られ、ニッケル85.
2〜89.1重量%、リン10.7〜13重量%、モリ
ブデン0.2〜1.8重量%の組成の非晶質の飽和磁束
密度が2ガウス以下であるNi−P−Mo合金皮膜であ
ることを特徴とする磁気記録体。
1. A magnetic recording medium comprising a nonmagnetic film formed on a nonmagnetic substrate and a magnetic film formed thereon, wherein the nonmagnetic film comprises a water-soluble nickel salt, a water-soluble molybdate. Acid electroless Ni-P-Mo plating bath having a pH of 4 to 5 containing, as main components, hypophosphorous acid or a salt thereof, oxydicarboxylic acid or a salt thereof as a complexing agent, and dicarboxylic acid or a salt thereof containing no OH group. From nickel 85.
An amorphous Ni—P—Mo alloy coating having a composition of 2 to 89.1% by weight, phosphorus of 10.7 to 13% by weight, and molybdenum of 0.2 to 1.8% by weight having a saturation magnetic flux density of 2 Gauss or less. A magnetic recording medium, characterized in that:
JP9388892A 1992-03-19 1992-03-19 Magnetic recording medium Expired - Fee Related JP2848103B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9388892A JP2848103B2 (en) 1992-03-19 1992-03-19 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9388892A JP2848103B2 (en) 1992-03-19 1992-03-19 Magnetic recording medium

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JP2848103B2 true JP2848103B2 (en) 1999-01-20

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Country Link
JP (1) JP2848103B2 (en)

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Publication number Priority date Publication date Assignee Title
US6341420B1 (en) 2000-08-02 2002-01-29 Static Control Components, Inc. Method of manufacturing a developer roller
JP2012142060A (en) * 2011-01-06 2012-07-26 Fuji Electric Co Ltd Substrate for magnetic recording medium and method for manufacturing the same
US20220389588A1 (en) * 2019-11-20 2022-12-08 Atotech Deutschland GmbH & Co. KG Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits
CN111206240A (en) * 2020-01-17 2020-05-29 山东大学 Method for obtaining passivation region of amorphous Ni-Mo-P coating in salt solution and application thereof
JP7459715B2 (en) 2020-08-03 2024-04-02 株式会社レゾナック Substrate for magnetic recording medium, magnetic recording medium and magnetic storage device
JP2022028410A (en) 2020-08-03 2022-02-16 昭和電工株式会社 Magnetic recording medium substrate, magnetic recording medium, and magnetic storage device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
旭硝子工業技術奨励会研究報告、52(1988)第53頁−第62頁

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