JP2846943B2 - Display device and method of manufacturing the same - Google Patents
Display device and method of manufacturing the sameInfo
- Publication number
- JP2846943B2 JP2846943B2 JP2306265A JP30626590A JP2846943B2 JP 2846943 B2 JP2846943 B2 JP 2846943B2 JP 2306265 A JP2306265 A JP 2306265A JP 30626590 A JP30626590 A JP 30626590A JP 2846943 B2 JP2846943 B2 JP 2846943B2
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- film
- transparent
- refractive index
- variable
- display device
- Prior art date
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は表示装置およびその製造方法に関するもので
ある。Description: TECHNICAL FIELD The present invention relates to a display device and a method for manufacturing the same.
第８図は従来の透過型表示装置の一例を示す図であ
る。この装置では、バックライト102によって白色光を
供給し、TN型あるいはSTN型液晶101の両側に偏光板103
を配する構造を光シャッターとして用い、出てきた白色
光をカラーフィルター104によって着色して、表示動作
を行なう。FIG. 8 is a diagram showing an example of a conventional transmissive display device. In this device, white light is supplied by a backlight 102, and polarizing plates 103 are provided on both sides of a TN or STN liquid crystal 101.
Is used as an optical shutter, and the emitted white light is colored by a color filter 104 to perform a display operation.
第９図は従来の反射型表示装置の一例である。この装
置では、TN型あるいはSTN型液晶201の両側に偏光板203
を配する構造を光シャッターとして用い、出てきた白色
光をカラーフィルター204によって着色することは、第
８図の場合と同様であるが、バックライトの代わりに反
射板202を配して反射光のみを利用して表示動作を行な
う。FIG. 9 is an example of a conventional reflective display device. In this device, polarizing plates 203 are provided on both sides of a TN or STN liquid crystal 201.
Is used as an optical shutter, and the emitted white light is colored by a color filter 204 in the same manner as in FIG. 8, except that a reflective plate 202 is provided instead of the backlight to reflect the reflected light. The display operation is performed using only the above.
第10図は高分子分散型液晶を用いた従来の反射型カラ
ー表示装置の一例を示す。この装置では、分散質である
液晶301と分散媒である高分子302の混合物である高分子
分散型液晶にさらに染料303を加え、その後方にカラー
膜304を例えばモザイク状に配し、カラー膜304の後方に
反射板305を配している。FIG. 10 shows an example of a conventional reflective color display device using a polymer dispersed liquid crystal. In this apparatus, a dye 303 is further added to a polymer-dispersed liquid crystal, which is a mixture of a liquid crystal 301 as a dispersoid and a polymer 302 as a dispersion medium, and a color film 304 is disposed behind the dye, for example, in a mosaic form. A reflector 305 is arranged behind 304.
この従来の高分子分散型液晶を用いた反射型表示装置
においては、第10図（ａ）に示す散乱モード（電圧をか
けない状態）では、液晶301と高分子302との屈折率の差
により散乱した光が高分子302内あるいは液晶301内に含
有させた染料303に吸収されるから、黒色が表示され、
また第10図（ｂ）に示す透過モード（電圧をかけた状
態）においては、後方にあるカラー膜304の色が発現さ
れる。In the conventional reflection-type display device using polymer-dispersed liquid crystal, in the scattering mode (with no voltage applied) shown in FIG. Since the scattered light is absorbed by the dye 303 contained in the polymer 302 or the liquid crystal 301, a black color is displayed,
In the transmission mode (in a state where a voltage is applied) shown in FIG. 10 (b), the color of the rear color film 304 is developed.
しかし、第８図に示した透過型表示装置では、バック
ライト102の体積が大きく、かつこの部分の消費電力が
大きいため、軽薄化、携帯化を行なうことが困難であっ
た。However, in the transmissive display device shown in FIG. 8, since the volume of the backlight 102 is large and the power consumption of this portion is large, it is difficult to reduce the weight and portability.
また、第９図に示した反射型表示装置では、反射光の
みを利用するから、光量が少ないため、透過型表示装置
の場合に比べて光シャッターの光利用効率を大きく上げ
る必要があるが、TN型あるいはSTN型液晶201を単純に用
いただけでは、本質的に必要な編光板203の存在により
反射光の利用効率が少なくとも半分以下に下がり、高輝
度化が困難であった。Further, in the reflective display device shown in FIG. 9, since only the reflected light is used, the amount of light is small. Therefore, it is necessary to greatly increase the light use efficiency of the optical shutter as compared with the transmissive display device. If the TN type or STN type liquid crystal 201 is simply used, the use efficiency of the reflected light is reduced to at least half or less due to the existence of the essential knitted light plate 203, and it is difficult to increase the luminance.
さらに、第10図に示した高分子分散型液晶を用いた反
射型カラー表示装置では、透過モードにおいても、染料
303により光が吸収されるため、輝度が下がる欠点があ
った。Further, in the reflective color display device using the polymer-dispersed liquid crystal shown in FIG.
Since the light is absorbed by 303, there is a disadvantage that the luminance is reduced.
本発明は上述の課題を解決するためになされたもの
で、軽薄化、携帯化を図ることが容易で、かつ高輝度化
が容易な表示装置およびその製造方法を提供することを
目的とする。SUMMARY An advantage of some aspects of the invention is to provide a display device that can be easily reduced in weight and portability and that can easily achieve high luminance, and a method for manufacturing the same.
この目的を達成するため、本発明においては、屈折率
の異なる複数の膜を積層した多層膜であって、かつ少な
くともその中の一つの膜が屈折率の可変な膜である干渉
フィルターを用いた表示素子を設け、上記屈折率の可変
な膜の屈折率の可変範囲がn1からn2（n1＜n2）までの場
合に、上記屈折率の可変な膜と接して積層する膜の屈折
率n3との関係をn3≦n1あるいはn2≦n3とする。In order to achieve this object, the present invention uses an interference filter that is a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is a film having a variable refractive index. A display element is provided, and when the variable range of the refractive index of the film having the variable refractive index is n1 to n2 (n1 <n2), the refractive index n3 of the film laminated in contact with the film having the variable refractive index is provided. Is n3 ≦ n1 or n2 ≦ n3.
また、屈折率の異なる複数の膜を積層した多層膜であ
って、かつ少なくともその中の一つの膜が屈折率の可変
な膜である干渉フィルターを用いた表示素子を黒あるい
は灰色の膜上に複数設置し、上記各表示素子の干渉フィ
ルターの反射率が高い色を赤色、緑色、青色とし、上記
屈折率の可変な膜の屈折率の可変範囲がn1からn2（n1＜
n2）までの場合に、上記屈折率の可変な膜と接して積層
する膜の屈折率n3との関係をn3≦n1あるいはn2≦n3とす
る。Further, a display element using an interference filter which is a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is a film having a variable refractive index, is formed on a black or gray film. A plurality of the filters are provided, and the colors with high reflectance of the interference filters of the display elements are red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1 to n2 (n1 <
In the cases up to n2), the relationship between the film having the variable refractive index and the refractive index n3 of the film laminated in contact with the film is n3 ≦ n1 or n2 ≦ n3.
さらに、屈折率の異なる複数の膜を積層した多層膜で
あって、かつ少なくともその中の一つの膜が屈折率の可
変な膜である干渉フィルターを用いた表示素子を黒ある
いは灰色の膜上に複数積層して設置し、上記各表示素子
の干渉フィルターの反射率が高い色を赤色、緑色、青色
とし、上記屈折率の可変な膜の屈折率の可変範囲がn1か
らn2（n1＜n2）までの場合に、上記屈折率の可変な膜と
接して積層する膜の屈折率n3との関係をn3≦n1あるいは
n2≦n3とする。Further, a display element using an interference filter, which is a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is a film having a variable refractive index, is formed on a black or gray film. A plurality of layers are arranged and installed, and the colors with high reflectance of the interference filter of each display element are red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1 to n2 (n1 <n2). In the case up to, the relationship with the refractive index n3 of the film laminated in contact with the variable refractive index film is n3 ≦ n1 or
n2 ≦ n3.
これらの場合、上記屈折率が可変な膜として液晶を用
いる。In these cases, liquid crystal is used as the film whose refractive index is variable.
さらに、上記屈折率が可変な膜として強誘電体を用い
る。Further, a ferroelectric is used as the film whose refractive index is variable.
上記のような表示装置を製造する場合に、基板上に導
電膜を形成し、上記導電膜を有する上記基板上に第１の
透明な膜を形成し、上記第１の透明な膜上に高分子強誘
電性液晶を形成し、上記高分子強誘電性液晶上に第２の
透明な膜を形成し、上記第２の透明な膜上に透明導電膜
を形成する。In the case of manufacturing the above display device, a conductive film is formed over a substrate, a first transparent film is formed over the substrate having the conductive film, and a high transparent film is formed over the first transparent film. A molecular ferroelectric liquid crystal is formed, a second transparent film is formed on the polymer ferroelectric liquid crystal, and a transparent conductive film is formed on the second transparent film.
また、基板上に導電膜を形成し、上記導電膜を有する
上記基板上に第１の透明な膜を形成し、上記第１の透明
な膜上にスペーサ膜を形成し、上記スペーサ膜上に第２
の透明な膜のパタンを形成し、上記第２の透明な膜上に
透明導電膜のパタンを形成し、上記スペーサ膜をオーバ
エッチングし、上記基板を屈折率が電界によって可変で
透明な物質中に浸し、透明基板で上記屈折率が電界によ
って可変で透明な物質を封止する。A conductive film is formed over the substrate; a first transparent film is formed over the substrate having the conductive film; a spacer film is formed over the first transparent film; Second
A transparent film pattern is formed on the second transparent film, a transparent conductive film pattern is formed on the second transparent film, the spacer film is over-etched, and the substrate is made of a transparent material whose refractive index is variable by an electric field. And a transparent substrate is used to seal a transparent substance whose refractive index is variable by an electric field.
さらに、基板上に導電膜を形成し、上記導電膜を有す
る上記基板上に次に形成する多層膜全体の厚さよりも厚
いリフトオフ膜のパタンを形成し、上記導電膜上に第１
の透明な膜を形成し、上記第１の透明な膜上にスペーサ
膜を形成し、上記スペーサ膜上に第２の透明な膜を形成
し、上記第２の透明な膜上に透明導電膜を形成し、上記
リフトオフ膜をエッチングし、上記スペーサ膜をオーバ
エッチングし、上記基板を屈折率が電界によって可変で
透明な物質中に浸し、透明基板で上記屈折率が電界によ
って可変で透明な物質を封止する。Further, a conductive film is formed on the substrate, a pattern of a lift-off film thicker than the entire thickness of the multilayer film to be formed next is formed on the substrate having the conductive film, and a first film is formed on the conductive film.
A transparent film is formed on the first transparent film, a spacer film is formed on the first transparent film, a second transparent film is formed on the spacer film, and a transparent conductive film is formed on the second transparent film. Is formed, the lift-off film is etched, the spacer film is over-etched, and the substrate is immersed in a transparent material whose refractive index is variable by an electric field. Is sealed.
この表示装置においては、バックライトを用いない。
また、屈折率の異なる複数の膜を積層した多層膜であっ
て、かつ少なくともその中の一つの膜が屈折率が可変な
膜である干渉フィルター〔例えば、光学薄膜（藤原史郎
編、共立出版、1986年）を参照〕を用いるから、屈折率
の可変な膜の屈折率とこの膜と積層する膜の屈折率との
屈折率差を変化させることができる。そして、屈折率差
が大きい場合には、干渉フィルターの原理に従い、特定
の波長帯域の光を反射し、かつそれ以外の波長帯域の光
を透過する。一方、屈折率差が小さい場合には、屈折率
差が大きい場合に比べ、特定の波長帯域の反射率が大幅
に低下し、大部分の光を透過させることができる。した
がって、特定の波長帯域の光の反射、透過を制御でき、
かつそれ以外の波長帯域の光を常に透過する装置を構成
できるから、偏光板が不要でかつ光の利用効率が高い。In this display device, no backlight is used.
Further, an interference filter that is a multilayer film in which a plurality of films having different refractive indexes are laminated, and at least one of the films is a film having a variable refractive index [for example, an optical thin film (Fujiwara Shiro, edited by Kyoritsu Shuppan, 1986)] can be used to change the refractive index difference between the refractive index of a film having a variable refractive index and the refractive index of a film laminated with this film. When the refractive index difference is large, the light in a specific wavelength band is reflected and the light in other wavelength bands is transmitted according to the principle of an interference filter. On the other hand, when the difference in refractive index is small, the reflectance in a specific wavelength band is significantly reduced as compared with the case where the difference in refractive index is large, and most of the light can be transmitted. Therefore, the reflection and transmission of light in a specific wavelength band can be controlled,
In addition, since a device that constantly transmits light in other wavelength bands can be configured, a polarizing plate is unnecessary and the light use efficiency is high.
また、屈折率の異なる複数の膜を積層した多層膜であ
って、かつ少なくともその中の一つの膜が、屈折率の可
変な膜である干渉フィルターを用いた表示素子を黒ある
いは灰色の膜上に複数設置し、上記各表示素子の干渉フ
ィルターの反射率が高い色を赤色、緑色、青色とし、上
記屈折率の可変な膜の屈折率の可変範囲がn1からn2（n1
＜n2）までの場合に、上記屈折率の可変な膜と接して積
層する膜の屈折率n3との関係をn3≦n1あるいはn2≦n3と
し、または屈折率の異なる複数の膜を積層した多層膜で
あって、かつ少なくともその中の一つの膜が屈折率の可
変な膜である干渉フィルターを用いた表示素子を黒ある
いは灰色の膜上に複数積層して設置し、上記各表示素子
の干渉フィルターの反射率が高い色を赤色、緑色、青色
とし、上記屈折率の可変な膜の屈折率の可変範囲がn1か
らn2（n1＜n2）までの場合に、上記屈折率の可変な膜と
接して積層する膜の屈折率n3との関係をn3≦n1あるいは
n2≦n3とすれば、種の色が加法混色の原理に従い実現で
きる。Further, a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is formed on a black or gray film using a display element using an interference filter which is a film having a variable refractive index. And the colors with high reflectance of the interference filter of each display element are red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1 to n2 (n1
Up to <n2), the relationship between the refractive index n3 of the film laminated in contact with the variable refractive index film is n3 ≦ n1 or n2 ≦ n3, or a multilayer in which a plurality of films having different refractive indices are laminated. A plurality of display elements using an interference filter, wherein at least one of the films is a film having a variable refractive index, is stacked on a black or gray film, and the interference of the display elements When the color of the filter having a high reflectance is red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1 to n2 (n1 <n2), the variable refractive index film and The relationship with the refractive index n3 of the film laminated in contact with n3 ≤ n1 or
If n2 ≦ n3, seed colors can be realized according to the principle of additive color mixture.
これらの場合、屈折率が可変な膜として液晶を用い、
または屈折率が可変な膜として強誘電体を用いれば、よ
り確実に特定の波長帯域の光反射、透過を制御できる。In these cases, liquid crystal is used as a film having a variable refractive index,
Alternatively, if a ferroelectric is used as a film having a variable refractive index, light reflection and transmission in a specific wavelength band can be more reliably controlled.
また、表示装置の製造方法においては、容易に高輝度
な表示装置を製造することができる。In the method for manufacturing a display device, a high-luminance display device can be easily manufactured.
以下、本発明を図面に示す実施例に基づいて説明す
る。Hereinafter, the present invention will be described based on embodiments shown in the drawings.
（動作原理） 第１図は本発明による反射型カラー表示装置の表示素
子の動作原理を示す概略図である。本表示素子は、導電
膜401上に屈折率n3の透明な膜402を配し、膜402上に屈
折率が電界によってn1からn2（n1＜n2、n2≦n3）まで可
変な透明な膜403（例えば液晶（高分子強誘電性液晶を
含む）あるいは強誘電体）を配し、屈折率が可変で透明
な膜403上に屈折率n3の透明な膜404を配し、透明な膜40
4上に透明導電膜405を配している。(Operating Principle) FIG. 1 is a schematic diagram showing the operating principle of the display element of the reflective color display device according to the present invention. In this display element, a transparent film 402 having a refractive index n3 is disposed on a conductive film 401, and a transparent film 403 having a refractive index variable from n1 to n2 (n1 <n2, n2 ≦ n3) by an electric field on the film 402. (For example, a liquid crystal (including a polymer ferroelectric liquid crystal) or a ferroelectric substance), a transparent film 403 having a refractive index of n3 is disposed on a transparent film 403 having a variable refractive index, and a transparent film 40 is disposed.
On top of this, a transparent conductive film 405 is provided.
この表示素子においては、第１図（ａ）に示すよう
に、導電膜401と透明導電膜405との間に加える電圧によ
り、屈折率が可変で透明な膜403の屈折率をn1とする
と、全体として屈折率がn3/n1/n3（n1＜n3）の膜の多層
の膜となり、よく知られた干渉フィルターの原理〔例え
ば、光学薄膜（藤原史郎編、共立出版、1986年）を参
照〕に従い、特定の波長帯域の光を反射し、それ以外の
光を透過する。また、第１図（ｂ）に示すように、導電
膜401と透明導電膜405との間に加える電圧により屈折率
が可変で透明な膜403の屈折率をn2とすると、全体とし
て屈折率がn3/n2/n3（n1＜n2≦n3）の膜の多層膜とな
り、多層膜中の各膜の屈折率差が第１図（ａ）の場合に
比べて小さくなるため、特定の波長帯域における光の反
射率は大幅に低下し、大部分の光を透過する。なお、こ
こでは、n2≦n3の場合を例として示したが、n3≦n1の場
合でも同様な表示動作が可能なことは明らかである。さ
らに、n1＜n3＜n2の場合であってもn3の値がn1あるいは
n2の値に十分近ければ、やはり同様な表示動作が可能な
ことは明らかである。In this display element, as shown in FIG. 1A, when the refractive index of the transparent film 403 having a variable refractive index is n1 by a voltage applied between the conductive film 401 and the transparent conductive film 405, As a whole, it becomes a multilayer film with a refractive index of n3 / n1 / n3 (n1 <n3), and the principle of a well-known interference filter [for example, see an optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)] , The light of a specific wavelength band is reflected, and the other light is transmitted. Further, as shown in FIG. 1 (b), when the refractive index of the transparent film 403 whose refractive index is variable by the voltage applied between the conductive film 401 and the transparent conductive film 405 is n2, the refractive index as a whole is It becomes a multilayer film of n3 / n2 / n3 (n1 <n2 ≦ n3), and the refractive index difference of each film in the multilayer film becomes smaller than that in the case of FIG. 1 (a). The reflectivity of the light is greatly reduced, and most of the light is transmitted. Here, the case where n2 ≦ n3 is shown as an example, but it is clear that a similar display operation can be performed even when n3 ≦ n1. Furthermore, even when n1 <n3 <n2, the value of n3 is n1 or
It is clear that a similar display operation is possible if the value is sufficiently close to the value of n2.
さらに、本発明によれば、導電膜401と透明導電膜405
との間に加える電圧の大きさにより、屈折率が可変で透
明な膜403の屈折率を連続的に制御できるため、表示素
子の特定の波長帯域における反射率を連続的に制御でき
る。Further, according to the present invention, the conductive film 401 and the transparent conductive film 405
Since the refractive index of the transparent film 403 having a variable refractive index can be continuously controlled depending on the magnitude of the voltage applied between and, the reflectance of the display element in a specific wavelength band can be continuously controlled.
このように本発明によれば、透明導電膜405方向から
見たとき、導電膜401と透明導電膜405との間に印加する
電圧により、干渉反射色の発現の有無を制御できるた
め、以下の実施例11〜３で説明するような表示装置に用
いることにより、高輝度な表示装置を実現できる。さら
に、以下の実施例では、屈折率が可変な膜として液晶を
用いた例について示すが、屈折率が可変な膜として強誘
電体膜を用いた場合でも、同様な実施例が可能なことは
明らかである。As described above, according to the present invention, when viewed from the direction of the transparent conductive film 405, the presence or absence of the occurrence of the interference reflection color can be controlled by the voltage applied between the conductive film 401 and the transparent conductive film 405. By using the display device as described in Embodiments 11 to 3, a display device with high luminance can be realized. Further, in the following embodiments, an example in which liquid crystal is used as a film having a variable refractive index will be described. However, even when a ferroelectric film is used as a film having a variable refractive index, a similar embodiment is possible. it is obvious.
（実施例1:装置） 第２図は本発明による反射型カラー表示装置の一実施
例を示す概略図である。本表示装置は絶縁基板519上に
第１の表示素子506、第２の表示素子512および第３の表
示素子518を例えばモザイク状に配してある。第１の表
示素子506は、黒色の導電膜501（例えばITO膜の裏面に
黒色の顔料や染料を形成した後、表面を荒した金属膜あ
るいは炭素膜）上に、屈折率n3の透明な膜502（例えばS
iO2膜）を配し、透明な膜502上に屈折率が電界によって
n1からn2（n1＜n2、ｎ≦２≦３）まで可変な透明な膜50
3（例えば液晶）を配し、透明な膜503上に屈折率n3の透
明な膜504（例えばSiO2膜）を配し、透明な膜504上に透
明導電膜505（例えばITO膜）を配している。第１の表示
素子506における透明な膜502、透明な膜503、透明な膜5
04の膜厚は、屈折率が可変で透明な膜503の屈折率がn1
の場合に赤色を反射するような干渉フィルターの条件に
応じて定められている〔参照：光学薄膜（藤原史郎編、
共立出版、1986年）〕。第２の表示素子512は、黒色の
導電膜507（例えばITO膜の裏面に黒色の顔料や染料を形
成した膜、表面を荒した金属膜あるいは炭素膜）上に、
屈折率n3の透明膜508（例えばSiO2膜）を配し、透明な
膜508上に屈折率が電界によってn1からn2（n1＜n2、n2
≦n3）まで可変な透明な膜509（例えば液晶）を配し、
透明な膜509上に屈折率n3の透明な膜510（例えばSiO
2膜）を配し、透明な膜510上に透明導電膜511（例えばI
TO膜）を配している。第２の表示素子512における透明
な膜508、透明な膜509、透明な膜510の膜厚は、屈折率
が可変で透明な膜509の屈折率がn1の場合に緑色を反射
するような干渉フィルターの条件に応じて定められてい
る〔参照：光学薄膜（藤原史郎編、共立出版、1986
年）〕。第３の表示素子518は、黒色の導電膜513（例え
ばITO膜の裏面に黒色の顔料や染料を形成した膜、表面
を荒した金属膜あるいは炭素膜）上に、屈折率n3の透明
な膜514（例えばSiO2膜）を配し、透明な膜514上に屈折
率が電界によってn1からn2（n1＜n2、n2≦n3）までの可
変な透明な膜515（例えば液晶）を配し、透明な膜515上
に屈折率n3の透明な膜516（例えばSiO2膜）を配し、透
明な膜516上に透明導電膜517（例えばITO膜）を配して
いる。第３の表示素子518における透明な膜514、透明な
膜515、透明な膜516の膜厚は、屈折率が可変で透明な膜
515の屈折率がn1の場合に青色を反射するような干渉フ
ィルターの条件に応じて定められている〔参照：光学薄
膜（藤原史郎編、共立出版、1986年）〕。(Embodiment 1: Apparatus) FIG. 2 is a schematic view showing an embodiment of a reflection type color display apparatus according to the present invention. In this display device, a first display element 506, a second display element 512, and a third display element 518 are arranged on an insulating substrate 519, for example, in a mosaic shape. The first display element 506 includes a transparent film having a refractive index of n3 on a black conductive film 501 (for example, a metal film or a carbon film having a rough surface after a black pigment or dye is formed on the back surface of the ITO film). 502 (eg S
iO 2 film), and the refractive index on the transparent film 502 is changed by an electric field.
A transparent film 50 variable from n1 to n2 (n1 <n2, n ≦ 2 ≦ 3)
3 (for example, liquid crystal), a transparent film 504 (for example, SiO 2 film) having a refractive index of n3 on the transparent film 503, and a transparent conductive film 505 (for example, ITO film) on the transparent film 504. doing. The transparent film 502, the transparent film 503, and the transparent film 5 in the first display element 506
The film thickness of 04 has a variable refractive index and the transparent film 503 has a refractive index of n1.
Is determined according to the conditions of the interference filter that reflects red in the case of [Ref: Optical thin film (edited by Shiro Fujiwara,
Kyoritsu Shuppan, 1986)]. The second display element 512 is formed over a black conductive film 507 (eg, a film in which a black pigment or dye is formed on the back surface of an ITO film, a metal film or a carbon film having a rough surface).
A transparent film 508 (for example, SiO 2 film) having a refractive index of n3 is disposed, and the refractive index is changed from n1 to n2 (n1 <n2, n2) on the transparent film 508 by an electric field.
≦ n3), a transparent film 509 (for example, liquid crystal) that is variable up to
On the transparent film 509, a transparent film 510 (for example, SiO
2 ), and a transparent conductive film 511 (for example, I
TO membrane). The thicknesses of the transparent film 508, the transparent film 509, and the transparent film 510 in the second display element 512 are such that the refractive index is variable and the green film is reflected when the refractive index of the transparent film 509 is n1. It is determined according to the conditions of the filter. [Ref: Optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)
Year)〕. The third display element 518 includes a transparent film having a refractive index of n3 on a black conductive film 513 (for example, a film in which a black pigment or dye is formed on the back surface of an ITO film, a metal film or a carbon film having a rough surface). 514 (for example, SiO 2 film) is disposed, and a transparent film 515 (for example, liquid crystal) whose refractive index is variable from n1 to n2 (n1 <n2, n2 ≦ n3) by an electric field is disposed on the transparent film 514; A transparent film 516 (for example, SiO 2 film) having a refractive index of n3 is provided on the transparent film 515, and a transparent conductive film 517 (for example, ITO film) is provided on the transparent film 516. The thickness of the transparent film 514, the transparent film 515, and the transparent film 516 in the third display element 518 is such that the refractive index is variable and the film is transparent.
It is determined according to the conditions of an interference filter that reflects blue when the refractive index of 515 is n1 [Ref: Optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)].
この反射型カラー表示装置においては、第２図（ａ）
に示すように、黒色の導電膜501、507、513と透明導電
膜505、511、517との間の電圧を屈折率が可変で透明な
膜503、509、515の屈折率がn1となるようにすれば、よ
く知られた干渉フィルターの原理に従い、第１の表示素
子506では赤色、第２の表示素子512では緑色、第３の表
示素子518では青色の光が反射され、透明導電膜505、51
1、517側から見るとそれぞれの色に見える。また、第２
図（ｂ）に示すように、導電膜501、507、513と透明導
電膜505、511、517との間の電圧を屈折率が可変で透明
な膜503、509、515の屈折率がn2となるようにすれば、
第１〜第３表示素子508、512、518は可視光の波長領域
の大部分の光を透過し、透過した光は全ての黒色の導電
膜501、507、513に吸収される。このため、透明導電膜5
05、511、517側から見ると黒色に見える。In this reflection type color display device, FIG.
As shown in FIG. 5, the voltage between the black conductive films 501, 507, 513 and the transparent conductive films 505, 511, 517 is changed such that the refractive index of the transparent films 503, 509, 515 is variable and n1. According to the well-known principle of the interference filter, the first display element 506 reflects red light, the second display element 512 reflects green light, and the third display element 518 reflects blue light. , 51
When viewed from the 1,517 side, each color looks different. Also, the second
As shown in FIG. 2B, the voltage between the conductive films 501, 507, 513 and the transparent conductive films 505, 511, 517 is changed by changing the refractive index of the transparent films 503, 509, 515 to n2. So that
The first to third display elements 508, 512, 518 transmit most of the light in the visible light wavelength range, and the transmitted light is absorbed by all the black conductive films 501, 507, 513. Therefore, the transparent conductive film 5
It looks black when viewed from the 05, 511, 517 side.
したがって、本実施例により、導電膜501と透明導電
膜505との間、導電膜507と透明導電膜511との間および
導電膜513と透明導電膜517との間に加えるそれぞれの電
圧を各画素毎に連続的に制御することにより、種々の色
が加法混色の原理〔例えば応用光学ハンドブック（吉永
弘編、朝倉書店）〕に従い実現できることは明らかであ
る。なお、ここではn2≦n3の場合を例として示したが、
n3≦n1の場合でも同様な表示動作が可能なことは明らか
である。さらに、n1＜n3＜n2の場合であってもn3の値が
n1あるいはn2の値に十分近ければ、やはり同様な表示動
作が可能なことは明らかである。Therefore, according to this embodiment, each voltage applied between the conductive film 501 and the transparent conductive film 505, between the conductive film 507 and the transparent conductive film 511, and between the conductive film 513 and the transparent conductive film 517 is applied to each pixel. It is clear that various colors can be realized in accordance with the principle of additive color mixture (for example, Applied Optics Handbook (edited by Hiroshi Yoshinaga, Asakura Shoten)) by controlling each time continuously. Here, the case where n2 ≦ n3 is shown as an example,
It is clear that a similar display operation is possible even when n3 ≦ n1. Furthermore, even when n1 <n3 <n2, the value of n3 is
It is clear that a similar display operation can be performed if the value is sufficiently close to the value of n1 or n2.
（実施例2:装置） 第３図は本発明による反射型カラー表示装置の一実施
例を示す概略図である。本表示装置は、黒色の膜619
（例えばITO膜の裏面に黒色の顔料や染料を形成した
膜、表面を荒した金属膜あるいは炭素膜）上に第３の表
示素子618を配し、第３の表示素子618の上に第２の表示
素子612を配し、第２の表示素子612の上に第１の表示素
子606を配してある。第１の表示素子606は、透明導電膜
601（例えばITO膜）上に屈折率n3の透明な膜602（例え
ばSiO2膜）を配し、透明な膜602上に屈折率が電界によ
ってn1からn2（n1＜n2、n2≦n3）まで可変な透明な膜60
3（例えば液晶）を配し、透明な膜603上に屈折率n3の透
明な膜604（例えばSiO2膜）を配し、透明な膜604上に透
明導電膜605（例えばITO膜）を配している。第１の表示
素子606における透明な膜602、透明な膜603、透明な膜6
04の膜厚は、屈折率が可変で透明な膜603の屈折率がn1
の場合に赤色を反射するような干渉フィルターの条件に
応じて定められている〔参照：光学薄膜（藤原史郎編、
共立出版、1986年）〕。第２の表示素子612は、透明読
電膜607（例えばITO膜）上に屈折率n3の透明な膜608例
えば（SiO2膜）を配し、透明な膜608上に屈折率が電界
によってn1からn2（n1＜n2、n2≦n3）まで可変な透明な
膜609（例えば液晶）を配し、屈折率が可変で透明な膜6
09上に屈折率n3の透明な膜610（例えばSiO2膜）を配
し、透明な膜610上に透明導電膜611（例えばITO膜）を
配している。第２の表示素子612における透明な膜608、
屈折率が可変で透明な膜609、透明な膜610の膜厚は、屈
折率が可変で透明な膜609の屈折率がn1の場合に緑色を
反射するような干渉フィルターの条件に応じて定められ
ている〔参照：光学薄膜（藤原史郎編、共立出版、1986
年）〕。第３の表示素子618は、透明導電膜613（例えば
ITO膜）上に屈折率n3の透明な膜614（例えばSiO2膜）を
配し、透明な膜614上に屈折率が電界によってn1からn2
（n1＜n2、n2≦n3）まで可変な透明な膜615（例えば液
晶）を配し、屈折率が可変で透明な膜615上に屈折率n3
の透明な膜616（例えばSiO2膜）を配置し、透明な膜616
上に透明導電膜617（例えばITO膜）を配している。第３
の表示素子618における透明な膜614、屈折率が可変で透
明な膜615、透明な膜616の膜厚は、屈折率が可変で透明
な膜615の屈折率がn1の場合に青色を反射するような干
渉フィルターの条件に応じて定められている〔参照：光
学薄膜（藤原史郎編、共立出版、1986年）〕。(Embodiment 2: Apparatus) FIG. 3 is a schematic view showing an embodiment of a reflection type color display apparatus according to the present invention. This display device has a black film 619
A third display element 618 is disposed on the third display element 618 (for example, a film in which a black pigment or dye is formed on the back surface of the ITO film, a metal film or a carbon film having a rough surface). Are arranged, and the first display element 606 is arranged on the second display element 612. The first display element 606 is a transparent conductive film
A transparent film 602 (for example, SiO 2 film) having a refractive index of n3 is arranged on a 601 (for example, ITO film), and the refractive index on the transparent film 602 is changed from n1 to n2 (n1 <n2, n2 ≦ n3) by an electric field. Variable transparent membrane 60
3 (for example, liquid crystal), a transparent film 604 (for example, SiO 2 film) having a refractive index of n3 on the transparent film 603, and a transparent conductive film 605 (for example, ITO film) on the transparent film 604. doing. The transparent film 602, the transparent film 603, and the transparent film 6 in the first display element 606
The film thickness of 04 has a variable refractive index and the transparent film 603 has a refractive index of n1.
Is determined according to the conditions of the interference filter that reflects red in the case of [Ref: Optical thin film (edited by Shiro Fujiwara,
Kyoritsu Shuppan, 1986)]. In the second display element 612, a transparent film 608 having a refractive index of n3, for example, an (SiO 2 film) is disposed on a transparent power reading film 607 (for example, an ITO film), and the refractive index is changed to n1 on the transparent film 608 by an electric field. A transparent film 609 (for example, liquid crystal) that is variable from ま で to n2 (n1 <n2, n2 ≦ n3) is provided, and a transparent film 6 with a variable refractive index is provided.
A transparent film 610 (for example, SiO 2 film) having a refractive index of n3 is provided on 09, and a transparent conductive film 611 (for example, ITO film) is provided on the transparent film 610. A transparent film 608 in the second display element 612,
The thickness of the transparent film 609 with a variable refractive index and the transparent film 610 is determined according to the conditions of an interference filter that reflects green when the refractive index of the transparent film 609 with a variable refractive index is n1. [Ref: Optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)
Year)〕. The third display element 618 includes a transparent conductive film 613 (for example,
A transparent film 614 (for example, SiO 2 film) having a refractive index of n3 is disposed on the ITO film), and the refractive index is changed from n1 to n2 by an electric field on the transparent film 614.
(N1 <n2, n2 ≦ n3), a transparent film 615 (for example, liquid crystal) that can be changed is arranged, and a refractive index n3 is formed on the transparent film 615 with a variable refractive index.
A transparent film 616 (for example, SiO 2 film) is disposed, and the transparent film 616 is formed.
A transparent conductive film 617 (for example, an ITO film) is provided thereon. Third
The thickness of the transparent film 614, the transparent film 615 with a variable refractive index, and the transparent film 616 in the display element 618 reflect blue when the refractive index of the transparent film 615 with a variable refractive index is n1. It is determined according to the conditions of such an interference filter [see: Optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)].
この反射型カラー表示装置においては、第３図（ａ）
に示すように、透明導電膜601、607、613と透明導電膜6
05、611、617との間の電圧を屈折率が可変で透明な膜60
3、609、615の屈折率がn1となるようにすれば、よく知
られた干渉フィルターの原理に従い、第１の表示素子60
6では赤色、第２の表示素子612では緑色、第３の表示素
子618では青色の光を反射するため、透明導電膜605側か
らみると加法混色の原理に従い、白色に見える。また、
第３図（ｂ）に示すように、透明導電膜607と透明導電
膜611との間の電圧を屈折率が可変で透明な膜609の屈折
率がn1となるようにし、かつ透明導電膜601、613と透明
導電膜605、617との間の電圧を屈折率が可変で透明な膜
603、615の屈折率がn2となるようにすれば、第２の表示
素子612ではよく知られた干渉フィルターの原理に従い
緑色の光を反射し、第１の表示素子606および第３の表
示素子618では大部分の光は透過するため、透明導電膜6
05側からみると緑色に見える。ここで、透明導電膜601
と透明導電膜605との間の電圧を屈折率が可変で透明な
膜603の屈折率がn1となるようにし、かつ透明導電膜60
7、613と透明導電膜611、617との間の電圧を屈折率が可
変で透明な膜609、615の屈折率がn2となるようにした場
合、あるいは透明導電膜613と透明導電膜617との間の電
圧を屈折率が可変で透明な膜615の屈折率がn1となるよ
うにし、かつ透明導電膜601、607と透明導電膜605、611
との間の電圧を屈折率が可変で透明な膜603、609の屈折
率がn2となるようにした場合においても、第３図（ｂ）
と同様な動作をし、それぞれ赤色あるいは青色が発現す
ることは明らかである。さらに、第３図（ｃ）に示すよ
うに、透明導電膜601、607、613と透明導電膜605、61
1、617との間の電圧を屈折率が可変で透明な膜603、60
9、615の屈折率がn2となるようにすれば、第１〜第３表
示素子606、612、618は可視光の波長領域の大部分の光
を透過し、透過した光は全て黒色の膜619に吸収され
る。このため、透明導電膜604側から見ると黒色に見え
る。In this reflection type color display device, FIG.
As shown in the figure, the transparent conductive films 601, 607, 613 and the transparent conductive film 6
The voltage between 05, 611, and 617 is changed to a transparent film 60 with a variable refractive index.
If the refractive indices of 3, 609 and 615 are set to be n1, the first display element 60 can be formed in accordance with the well-known principle of an interference filter.
6 reflects red light, the second display element 612 reflects green light, and the third display element 618 reflects blue light. Therefore, when viewed from the transparent conductive film 605 side, it looks white according to the principle of additive color mixture. Also,
As shown in FIG. 3B, the voltage between the transparent conductive film 607 and the transparent conductive film 611 is changed so that the refractive index of the transparent film 609 is variable and the transparent conductive film 601 is n1. 613, transparent conductive films 605, 617
If the refractive indices of 603 and 615 are set to n2, the second display element 612 reflects green light in accordance with the well-known principle of the interference filter, and the first display element 606 and the third display element 606. In 618, most of the light is transmitted, so the transparent conductive film 6
It looks green when viewed from the 05 side. Here, the transparent conductive film 601
The voltage between the transparent conductive film 605 and the transparent conductive film 605 is adjusted so that the refractive index of the transparent film 603 is variable and n1.
7, 613 and the transparent conductive film 611, 617 when the refractive index is variable so that the refractive index of the transparent film 609, 615 is n2, or the transparent conductive film 613 and the transparent conductive film 617 The voltage between them is variable so that the refractive index of the transparent film 615 is n1 and the transparent conductive films 601, 607 and 605, 611
In the case where the refractive index of the transparent films 603 and 609 having a variable refractive index is set to n2, the voltage between
It is clear that the same operation as described above is performed, and red or blue is developed, respectively. Further, as shown in FIG. 3 (c), the transparent conductive films 601, 607, 613 and the transparent conductive films 605, 61
The voltage between 1 and 617 is changed to a transparent film 603 and 60 with a variable refractive index.
If the refractive index of 9,615 becomes n2, the first to third display elements 606, 612, 618 transmit most of the light in the visible light wavelength region, and all the transmitted light is a black film. Absorbed in 619. For this reason, when viewed from the transparent conductive film 604 side, it looks black.
したがって、本実施例により、導電膜601と透明導電
膜605との間、導電膜607と透明導電膜611との間および
導電膜613と透明導電膜617との間に加えるそれぞれの電
愛を各画素毎に連続的に制御することにより、種々の色
が加法混色の原理〔例えば応用光学ハンドブック（吉永
弘編、朝倉書店）〕に従い実現できることは明らかであ
る。Therefore, according to the present embodiment, respective electric charges applied between the conductive film 601 and the transparent conductive film 605, between the conductive film 607 and the transparent conductive film 611, and between the conductive film 613 and the transparent conductive film 617 are respectively applied. It is clear that various colors can be realized in accordance with the principle of additive color mixture (for example, Applied Optics Handbook (edited by Hiroshi Yoshinaga, Asakura Shoten)) by continuously controlling each pixel.
さらに、本実施例では、三原色を表示する装置を縦に
積層するため、一画素を一つのドットで表現でき、実施
例１に比べて、光の利用効率が三倍となるため、高輝度
化が達成できる。なお、ここでは、n2≦n3の場合を例と
して示したが、n3≦n1の場合でも同様な表示動作が可能
なことは明らかである。さらに、n1＜n3＜n2の場合であ
ってもn3の値がn1あるいはn2の値に十分近ければ、やは
り同様な表示動作が可能なことは明らかである。Further, in the present embodiment, since the devices for displaying the three primary colors are vertically stacked, one pixel can be represented by one dot, and the light use efficiency is tripled as compared with the first embodiment. Can be achieved. Here, the case where n2 ≦ n3 is shown as an example, but it is clear that a similar display operation can be performed even when n3 ≦ n1. Further, even in the case of n1 <n3 <n2, if the value of n3 is sufficiently close to the value of n1 or n2, it is clear that the same display operation can be performed.
（実施例3:装置） 第３図に示した実施例２において、その動作を損なわ
ずに、透明導電膜601と透明導電膜611とを一つの膜で共
用させること、あるいは透明導電膜607と透明導電膜617
とを一つの膜で共用させることができることは明らかで
ある。第４図にその一例として透明導電膜701の膜で共
用させた場合を示す。本表示装置は黒色の膜719（例え
ばITO膜の裏面に黒色の顔料や染料を形成した膜、表面
を荒した金属膜あるいは炭素膜）上に第３の表示素子71
8を配し、第３の表示素子718の上に第２の表示素子712
を配し、第２の表示素子712の上に第１の表示素子706を
配してある。第１の表示素子706は、透明導電膜701（例
えばITO膜）上に屈折率n3の透明な膜702（例えばSiO
2膜）を配し、透明な膜702上に屈折率が電界によってn1
からn2（n1＜n2、n2≦n3）まで可変な透明な膜703（例
えば液晶）を配し、屈折率が可変な透明な膜703上に屈
折率n3の透明な膜704（例えばSio2膜）を配し、透明な
膜704上に透明導電膜705（例えばITO膜）を配してい
る。第１の表示素子706における透明な膜702、屈折率が
可変で透明な膜703、透明な膜704の膜厚は、屈折率が可
変で透明な膜703の屈折率がn1の場合に赤色を反射する
ような干渉フィルターの条件に応じて定められている
〔参照：光学薄膜（藤原史郎編、共立出版、1986
年）〕。第２の表示素子712は、透明導電膜707（例えば
ITO膜）上に屈折率n3の透明な膜708（例えばSiO2膜）を
配し、透明な膜708上に屈折率が電界によってn1からn2
（n1＜n2、n2≦n3）まで可変な透明な膜709（例えば液
晶）を配し、屈折率が可変で透明な膜709上に屈折率n3
の透明な膜710（例えばSiO2膜）を配している。第２の
表示素子712における透明な膜708、屈折率が可変で透明
な膜709、透明な膜710の膜厚は、屈折率が可変で透明な
膜708の屈折率がn1の場合に緑色を反射するような干渉
フィルターの条件に応じて定められている〔参照：光学
薄膜（藤原史郎編、共立出版、1986年）〕。第３の表示
素子718は、透明導電膜713（例えばITO膜）上に屈折率n
3の透明な膜714（例えばSiO2膜）を配し、透明な膜714
上に屈折率が電界によってn1からn2（n1＜n2、n2≦n3）
まで可変な透明な膜715（例えば液晶）を配し、屈折率
が可変で透明な膜715上に屈折率n3の透明な膜716（例え
ばSiO2膜）を配し、透明な膜716上に透明導電膜717（例
えばITO膜）を配している。第３の表示素子718における
透明な膜714、屈折率が可変で透明な膜715、透明な膜71
6の膜厚は、屈折率が可変で透明な膜715の屈折率がn1の
場合に青色を反射するような干渉フィルターの条件に応
じて定められている〔参照：光学薄膜（藤原史郎編、共
立出版、1986年）〕。この実施例に示した表示装置の動
作が第３図に一例を示した表示装置の動作と同様である
ことは明らかである。また、ここでは、n2≦n3の場合を
例として示したが、n3≦n1の場合でも同様な表示動作が
可能なことは明らかである。さらに、n1＜n3＜n2の場合
であってもn3の値がn1あるいはn2の値に十分近ければ、
やはり同様な表示動作が可能なことは明らかである。(Embodiment 3: Apparatus) In the embodiment 2 shown in FIG. 3, the transparent conductive film 601 and the transparent conductive film 611 can be shared by one film or the transparent conductive film 607 can be used without impairing the operation. Transparent conductive film 617
It can be clearly understood that these can be shared by one film. FIG. 4 shows an example in which the transparent conductive film 701 is shared. This display device has a third display element 71 on a black film 719 (for example, a film in which a black pigment or dye is formed on the back surface of an ITO film, a metal film or a carbon film having a rough surface).
8 and the second display element 712 on the third display element 718.
Are arranged, and the first display element 706 is arranged on the second display element 712. The first display element 706 includes a transparent film 702 (for example, SiO2) having a refractive index of n3 on a transparent conductive film 701 (for example, an ITO film).
2 film), and the refractive index is n1 on the transparent film 702 by the electric field.
To n2 (n1 <n2, n2 ≦ n3), a transparent film 703 (for example, liquid crystal) is disposed, and a transparent film 704 having a refractive index of n3 (for example, a Sio 2 film) is disposed on the transparent film 703 having a variable refractive index. ), And a transparent conductive film 705 (for example, an ITO film) is provided on the transparent film 704. The thicknesses of the transparent film 702, the transparent film 703 having a variable refractive index, and the transparent film 704 in the first display element 706 are red when the refractive index of the transparent film 703 having a variable refractive index is n1. It is determined according to the conditions of the interference filter that reflects light. [Ref: Optical thin film (edited by Shiro Fujiwara, edited by Kyoritsu Shuppan, 1986)
Year)〕. The second display element 712 includes a transparent conductive film 707 (for example,
A transparent film 708 (for example, SiO 2 film) having a refractive index of n3 is disposed on the ITO film), and the refractive index is changed from n1 to n2 by an electric field on the transparent film 708.
(N1 <n2, n2 ≦ n3), a transparent film 709 (for example, liquid crystal) that can be changed is arranged, and the refractive index n3 is formed on the transparent film 709 with a variable refractive index.
A transparent film 710 (for example, an SiO 2 film) is disposed. The thicknesses of the transparent film 708, the transparent film 709 with a variable refractive index, and the transparent film 710 in the second display element 712 are green when the refractive index of the transparent film 708 with a variable refractive index is n1. It is determined according to the conditions of an interference filter that reflects light [see: Optical Thin Film (ed. By Shiro Fujiwara, Kyoritsu Shuppan, 1986)]. The third display element 718 has a refractive index n on a transparent conductive film 713 (for example, an ITO film).
3 transparent film 714 (for example, SiO 2 film)
The refractive index is from n1 to n2 depending on the electric field (n1 <n2, n2 ≦ n3)
A transparent film 715 (for example, liquid crystal) having a variable refractive index is disposed, and a transparent film 716 (for example, SiO 2 film) having a refractive index of n3 is disposed on the transparent film 715 having a variable refractive index. A transparent conductive film 717 (for example, an ITO film) is provided. The transparent film 714, the transparent film 715 having a variable refractive index, and the transparent film 71 in the third display element 718.
The film thickness of 6 is determined according to the condition of an interference filter that reflects blue when the refractive index of the transparent film 715 is n1 and the refractive index is variable [Ref: Optical thin film (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1986)]. It is clear that the operation of the display device shown in this embodiment is similar to the operation of the display device whose example is shown in FIG. Here, the case where n2 ≦ n3 is shown as an example, but it is clear that a similar display operation can be performed even when n3 ≦ n1. Furthermore, even if n1 <n3 <n2, if the value of n3 is sufficiently close to the value of n1 or n2,
Obviously, a similar display operation is possible.
（実施例4:製造方法） 実施例１〜３で示した表示装置における干渉フィルタ
ーに用いられる多層膜の膜厚は、光の波長より薄い方が
特定の波長領域における反射率を大きくできる。しかし
ながら、液状の液晶を用いて通常の方法によりこのよう
な薄い膜を形成することは困難である。一方、高分子強
誘電性液晶は、スピンコートとその後の硬化工程（例え
ば溶媒の蒸発あるいは紫外線照射等による重合の促進
等）により形成でき、薄い膜の形成が比較的容易であ
る。そこで、以下に高分子強誘電性液晶を用いた本発明
の表示装置の製造方法を示す。(Example 4: Manufacturing method) When the thickness of the multilayer film used for the interference filter in the display device shown in Examples 1 to 3 is smaller than the wavelength of light, the reflectance in a specific wavelength region can be increased. However, it is difficult to form such a thin film by using a liquid crystal in a usual manner. On the other hand, a polymer ferroelectric liquid crystal can be formed by spin coating and a subsequent curing step (for example, evaporation of a solvent or promotion of polymerization by irradiation of ultraviolet rays, etc.), and the formation of a thin film is relatively easy. Therefore, a method for manufacturing a display device of the present invention using a polymer ferroelectric liquid crystal will be described below.
第５図は本発明による反射型カラー表示装置の製造方
法の一実施例を説明するための概略図である。まず、第
５図（ａ）に示すように、基板806（例えばガラス基板
やプラスチック基板）上に導電膜801（例えばITO膜、IT
O膜の薄面に黒色や顔料や染料を形成した後、表面を荒
した金属膜あるいは炭素膜）のパタンを形成する。つぎ
に、第５図（ｂ）に示すように、導電膜801のパタンを
有する基板806上に屈折率n3の透明な膜802（例えばSiO2
膜あるいは高分子膜）を形成し、透明な膜802のパタン
上に屈折率が電界によってn1からn2（n1≠n2）まで可変
で透明な高分子強誘電性液晶803を例えばスピンコート
とその後の硬化工程により形成する。つぎに、高分子強
誘電性液晶803の上に屈折率n3の透明な膜804（例えばSi
O2膜あるいは高分子膜）を形成する。この工程を繰り返
すことにより、屈折率n3の透明な膜と高分子強誘電性液
晶との多層膜を形成できることは明らかである。つぎ
に、第５図（ｃ）に示すように、屈折率n3の透明な膜80
2、804と高分子強誘電性液晶803との多層膜の上に透明
導電膜805のパタンを形成する。このようにして、実施
例１〜３で示した表示装置に必要される屈折率の可変な
膜を含む多層膜からなる干渉フィルターを製造できる。FIG. 5 is a schematic diagram for explaining one embodiment of a method of manufacturing a reflection type color display device according to the present invention. First, as shown in FIG. 5A, a conductive film 801 (for example, an ITO film, an IT film) is formed on a substrate 806 (for example, a glass substrate or a plastic substrate).
After forming a black color, a pigment or a dye on the thin surface of the O film, a pattern of a metal film or a carbon film whose surface is roughened is formed. Next, as shown in FIG. 5B, a transparent film 802 having a refractive index of n3 (for example, SiO 2 ) is formed on a substrate 806 having a pattern of a conductive film 801.
Film or polymer film), and a transparent polymer ferroelectric liquid crystal 803 whose refractive index is variable from n1 to n2 (n1 ≠ n2) by an electric field is formed on the pattern of the transparent film 802 by, for example, spin coating and subsequent coating. It is formed by a curing process. Next, a transparent film 804 having a refractive index of n3 (for example, Si
O 2 film or polymer film). It is clear that by repeating this step, a multilayer film of a transparent film having a refractive index of n3 and a polymer ferroelectric liquid crystal can be formed. Next, as shown in FIG. 5 (c), a transparent film 80 having a refractive index of n3 is formed.
A pattern of a transparent conductive film 805 is formed on a multilayer film of 2, 804 and a polymer ferroelectric liquid crystal 803. In this way, an interference filter composed of a multilayer film including a film having a variable refractive index required for the display devices shown in Examples 1 to 3 can be manufactured.
（実施例5:製造方法） 実施例１〜３で示した表示装置における干渉フィルタ
ーに用いられる多層膜の膜厚は、光の波長より薄い方が
特定の波長領域における反射率を大きくできる。しかし
ながら、液状の液晶を用いてこのような薄い液晶層を形
成することは、通常の液晶組立・注入工程では困難であ
る。そこで、以下に液状の液晶を用いて本発明の表示装
置を製造する方法を示す。(Example 5: Manufacturing method) When the thickness of the multilayer film used for the interference filter in the display device described in Examples 1 to 3 is smaller than the wavelength of light, the reflectance in a specific wavelength region can be increased. However, it is difficult to form such a thin liquid crystal layer using a liquid crystal in a normal liquid crystal assembling / injecting process. Therefore, a method for manufacturing the display device of the present invention using liquid crystal will be described below.
第６図は本発明による反射型カラー表示装置の製造方
法の一実施例を説明するための概略図である。まず、第
６図（ａ）に示すように、基板908（例えばガラス基板
やプラスチック基板）上に導電膜901（例えばITO膜、IT
O膜の裏面に黒色の顔料や染料を形成した膜、表面を荒
した金属膜あるいは炭素膜）のパタンを形成する。つぎ
に、第６図（ｂ）に示すように、導電膜901のパタンを
有する基板908上に屈折率n3の透明な膜902（例えばSiO2
膜）のパタンを形成し、透明な膜902のパタン上にスペ
ーサ膜906（例えばMo膜、Si膜あるいは高分子膜）を形
成し、スペーサ膜906上に屈折率n3の透明な膜904（例え
ばSiO2膜）のパタンを形成する。つぎに、第６図（ｃ）
に示すように、透明な膜904上に透明導電膜905のパタン
を形成した後、これら基板908、導電膜901、透明な膜90
2、透明な膜904および透明導電膜905を残してスペーサ
膜906がエッチングできる方法（例えば過酸化水素水（M
o膜の場合）、弗硝酸（Si膜の場合）あるいはアセトン
（高分子膜の場合）によるエッチング方法）を用いて、
スペーサ膜906をオーバエッチングする。つぎに、第６
図（ｄ）に示すように、上記導電膜901、透明な膜902、
透明な膜904、透明導電膜905およびスペーサ膜906を有
する基板908を、屈折率が電界によってn1からn2（n1≠n
2）まで可変で透明な物質（例えば液晶を含む液）中に
浸すとともに、透明基板909（例えばガラス基板あるい
はプラスチック基板）で屈折率が可能で透明な物質を封
止し、上記透明な膜902と透明な膜904とスペーサ膜906
とで囲まれる領域に屈折率が電界によって可変で透明な
膜903を形成する。このようにして、実施例１〜３で示
した表示装置に必要される屈折率の可変な膜を含む多層
膜からなる干渉フィルターを形成できる。FIG. 6 is a schematic diagram for explaining one embodiment of a method of manufacturing a reflection type color display device according to the present invention. First, as shown in FIG. 6A, a conductive film 901 (eg, an ITO film, an IT film) is formed on a substrate 908 (eg, a glass substrate or a plastic substrate).
A pattern of a black pigment or dye formed on the back surface of the O film, a metal film or a carbon film having a rough surface is formed. Next, as shown in FIG. 6B, a transparent film 902 having a refractive index n3 (for example, SiO 2 ) is formed on a substrate 908 having a pattern of a conductive film 901.
Film), a spacer film 906 (for example, a Mo film, a Si film or a polymer film) is formed on the pattern of the transparent film 902, and a transparent film 904 (for example, having a refractive index of n3) is formed on the spacer film 906. An SiO 2 film pattern is formed. Next, FIG. 6 (c)
As shown in FIG. 7, after a pattern of a transparent conductive film 905 is formed on the transparent film 904, the substrate 908, the conductive film 901 and the transparent film 90 are formed.
2. A method of etching the spacer film 906 while leaving the transparent film 904 and the transparent conductive film 905 (for example, a hydrogen peroxide solution (M
o film), etching method using hydrofluoric acid (for Si film) or acetone (for polymer film))
The spacer film 906 is over-etched. Next, the sixth
As shown in FIG. 3D, the conductive film 901, the transparent film 902,
The substrate 908 having the transparent film 904, the transparent conductive film 905, and the spacer film 906 is changed in refractive index from n1 to n2 (n1 ≠ n) by an electric field.
2) While immersing in a variable and transparent substance (for example, a liquid containing a liquid crystal) up to 2), the transparent substrate 909 (for example, a glass substrate or a plastic substrate) is used to seal the transparent substance having a refractive index, and the transparent film 902 is formed. And transparent film 904 and spacer film 906
A transparent film 903 whose refractive index is variable by an electric field is formed in a region surrounded by. In this way, an interference filter composed of a multilayer film including a film having a variable refractive index required for the display devices shown in Examples 1 to 3 can be formed.
（実施例6:製造方法） つぎに、液状の液晶を用いて本発明の表示装置を製造
する他の方法を示す。(Example 6: Manufacturing method) Next, another method for manufacturing the display device of the present invention using liquid crystal will be described.
第７図は本発明による反射型カラー表示装置の製造方
法の一実施例を説明するための概略図である。まず、第
７図（ａ）に示すように、基板1008（例えばガラス基板
やプラスチック基板）上に導電膜1001（例えばITO膜、I
TO膜の裏面に黒色や顔料や染料を形成した膜、表面を荒
した金属膜あるいは炭素膜）のパタンを形成する。つぎ
に、第７図（ｂ）に示すように、導電膜1001のパタンを
有する基板1008上にリフトオフ膜1010（例えばMo膜、Si
膜あるいは高分子膜）のパタンを次に形成する多層膜全
体の厚さよりも十分厚く形成し、これらの膜の上に屈折
率n3の透明な膜1002（例えばSiO2膜）、スペーサ膜1006
（例えばMo膜、Si膜あるいは高分子膜）、屈折率n3の透
明な膜1004（例えばSiO2膜）のパタンを順次形成する。
つぎに、第７図（ｃ）に示すように、透明な膜1004上に
透明導電膜1005のパタンを形成した後、これら基板100
8、導電膜1001、透明な膜1002、透明な膜1004および透
明導電膜1005を残してリフトオフ膜1010がエッチングで
きる方法（例えば過酸化水素水（Mo場合）、弗硝酸（Si
膜の場合）あるいはアセトン（高分子膜の場合）により
エッチング方法）を用いて、リフトオフ膜1010をエッチ
ング除去し、かつリフトオフ膜1010上に形成された膜を
リフトオフする。つぎに、第７図（ｄ）に示すように、
基板1008、導電膜1001、透明な膜1002、透明な膜1004お
よび透明導電膜1005を残してスペーサ膜1006がエッチン
グできる方法（例えば過酸化水素水（Mo場合）、弗硝酸
（Si膜の場合）あるいはアセトン（高分子膜の場合）に
よりエッチング方法）を用いて、スペーサ膜1006をオー
バーエッチングする。つぎに、第７図（ｅ）に示すよう
に、上記導電膜1001と透明な膜1002と透明な膜1004と透
明導電膜1005とスペーサ膜1006とを有する基板1008を、
屈折率が電界によってn1からn2（n1≠n2）まで可変で透
明な物質1007（例えば液晶）を含む液中に浸すととも
に、透明基板1009（例えばガラス基板あるいはプラスチ
ック基板）で上記屈折率が可変で透明な物質1007を封止
し、上記透明な膜1002と透明な膜1004とスペーサ膜1006
とで囲まれる領域に屈折率が電界によって可変で透明な
膜1003を形成する。このようにして、実施例１〜３で示
した表示装置に必要される屈折率の可変な膜を含む多層
膜からなる干渉フィルターを形成できる。なお、リフト
オフ膜1010とスペーサ膜1006とを同一材料とすることに
より、第７図（ｃ）で示した工程と第７図（ｄ）で示し
た工程とを同時に行なうことができることは明らかであ
る。FIG. 7 is a schematic diagram for explaining one embodiment of a method of manufacturing a reflection type color display device according to the present invention. First, as shown in FIG. 7A, a conductive film 1001 (for example, an ITO film, an I.D. film) is formed on a substrate 1008 (for example, a glass substrate or a plastic substrate).
A pattern of black, pigment or dye film, metal film or carbon film with rough surface is formed on the back surface of TO film. Next, as shown in FIG. 7B, a lift-off film 1010 (eg, a Mo film, a Si film) is formed on a substrate 1008 having a pattern of a conductive film 1001.
(A film or a polymer film) is formed sufficiently thicker than the entire multilayer film to be formed next, and a transparent film 1002 (for example, SiO 2 film) having a refractive index of n3 and a spacer film 1006 are formed on these films.
(Eg, a Mo film, a Si film, or a polymer film) and a transparent film 1004 (eg, a SiO 2 film) having a refractive index of n3 are sequentially formed.
Next, as shown in FIG. 7C, after a pattern of a transparent conductive film 1005 is formed on the transparent film 1004, the substrate 100
8, a method in which the lift-off film 1010 can be etched while leaving the conductive film 1001, the transparent film 1002, the transparent film 1004, and the transparent conductive film 1005 (for example, hydrogen peroxide solution (for Mo),
The lift-off film 1010 is removed by etching using a film (in the case of a film) or acetone (in the case of a polymer film) (etching method), and the film formed on the lift-off film 1010 is lifted off. Next, as shown in FIG.
A method in which the spacer film 1006 can be etched while leaving the substrate 1008, the conductive film 1001, the transparent film 1002, the transparent film 1004, and the transparent conductive film 1005 (for example, hydrogen peroxide solution (for Mo), hydrofluoric acid (for Si film)) Alternatively, the spacer film 1006 is over-etched using an etching method with acetone (in the case of a polymer film). Next, as shown in FIG. 7E, a substrate 1008 having the conductive film 1001, the transparent film 1002, the transparent film 1004, the transparent conductive film 1005, and the spacer film 1006 is
The refractive index is variable from n1 to n2 (n1 ≠ n2) by an electric field, and is immersed in a liquid containing a transparent substance 1007 (for example, liquid crystal), and the refractive index is variable with a transparent substrate 1009 (for example, a glass substrate or a plastic substrate). Transparent substance 1007 is sealed, and the above transparent film 1002, transparent film 1004, and spacer film 1006 are sealed.
A transparent film 1003 whose refractive index is variable by an electric field is formed in a region surrounded by. In this way, an interference filter composed of a multilayer film including a film having a variable refractive index required for the display devices shown in Examples 1 to 3 can be formed. It should be noted that by using the same material for the lift-off film 1010 and the spacer film 1006, it is clear that the step shown in FIG. 7C and the step shown in FIG. 7D can be performed simultaneously. .
なお、実施例１〜５では、干渉フィルターとして三層
膜を例として本発明による表示装置を説明したが、波長
選択性および反射波長帯域幅等を表示装置に適合したも
のにするために、他の膜を加えたりあるいはさらに多層
構造にしても良いことは明らかである。In the first to fifth embodiments, the display device according to the present invention has been described using a three-layer film as an example of the interference filter. However, in order to make the wavelength selectivity and the reflection wavelength bandwidth suitable for the display device, It is clear that a film of the above-mentioned type may be added or a multilayer structure may be further provided.
さらに、第２図〜第４図に実施例を示した反射型カラ
ー表示装置において、これらの導電膜501等、601等、70
1等を画素電極とし、かつ例えば薄膜トランジスタをア
クティブ素子とするアクティブマトリックスを配して各
画素を駆動することにより、各画素を独立に制御できる
ため、同装置のコントラスト比が高くでき、かつクロス
トークなどを阻止できる。Further, in the reflection type color display device shown in FIG. 2 to FIG.
Each pixel can be controlled independently by driving each pixel by arranging an active matrix having, for example, 1 as a pixel electrode and, for example, a thin film transistor as an active element, so that the contrast ratio of the device can be increased and crosstalk can be achieved. And so on.
以上説明したように、本発明に係る表示装置において
は、バックライトを用いないから、軽薄化、携帯化が容
易であり、また偏光板が不要でかつ光の利用効率が高い
から、高輝度な表示装置を実現できる。As described above, in the display device according to the present invention, a backlight is not used, so that it is easy to reduce the weight and portability, and since a polarizing plate is unnecessary and light use efficiency is high, high brightness is achieved. A display device can be realized.
また、屈折率の異なる複数の膜を積層した多層膜であ
って、かつ少なくともその中の一つの膜が屈折率の可変
な膜である干渉フィルターを用いた表示素子を黒あるい
は灰色の膜上に複数設置し、上記各表示素子の干渉フィ
ルターの反射率が高い色を赤色、緑色、青色とし、上記
屈折率の可変な膜の屈折率の可変範囲がn1からn2（n1＜
n2）までの場合に、上記屈折率の可変な膜と接して積層
する膜の屈折率n3との関係をn3≦n1あるいはn2≦n3と
し、または屈折率の異なる複数の膜を積層した多層膜で
あって、かつ少なくともその中の一つの膜が屈折率の可
変な膜である干渉フィルターを用いた表示素子を黒ある
いは灰色の膜上に複数積層して設置し、上記各表示素子
の干渉フィルターの反射率が高い色を赤色、緑色、青色
とし、上記屈折率の可変な膜の屈折率の可変範囲がn1か
らn2（n1＜n2）までの場合に、上記屈折率の可変な膜と
接して積層する膜の屈折率n3との関係をn3≦n1あるいは
n2≦n3とすれば、種々の色が加法混色の原理に従い実現
できるから、高輝度な反射型カラー表示装置を実現でき
る。Further, a display element using an interference filter which is a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is a film having a variable refractive index, is formed on a black or gray film. A plurality of the filters are provided, and the colors with high reflectance of the interference filters of the display elements are red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1 to n2 (n1 <
In the case up to n2), the relationship with the refractive index n3 of the film laminated in contact with the film having the variable refractive index is n3 ≦ n1 or n2 ≦ n3, or a multilayer film in which a plurality of films having different refractive indexes are laminated. A plurality of display elements using an interference filter in which at least one of the films is a film having a variable refractive index is stacked and installed on a black or gray film, and the interference filter of each of the display elements is provided. The colors with high reflectivity are red, green, and blue, and when the variable range of the refractive index of the variable refractive index film is from n1 to n2 (n1 <n2), the film is in contact with the variable refractive index film. The relationship with the refractive index n3 of the film to be laminated is n3 ≦ n1 or
If n2 ≦ n3, various colors can be realized in accordance with the principle of additive color mixture, so that a high-luminance reflective color display device can be realized.
これらの場合、屈折率が可変な膜として液晶を用い、
または屈折率が可変な膜として強誘電体を用いれば、よ
り確実に特定の波長帯域の光の反射、透過を制御できる
から、より高輝度な表示装置を実現できる。In these cases, liquid crystal is used as a film having a variable refractive index,
Alternatively, when a ferroelectric substance is used as a film having a variable refractive index, the reflection and transmission of light in a specific wavelength band can be more reliably controlled, so that a display device with higher luminance can be realized.
また、本発明に係る表示装置の製造方法においては、
容易に高輝度な表示装置を製造することができるから、
製造コストが安価になる。In the method for manufacturing a display device according to the present invention,
Because a high-luminance display device can be easily manufactured,
Manufacturing costs are reduced.
このように、この発明の結果は顕著である。 Thus, the results of the present invention are remarkable.
第１図は本発明による反射型カラー表示装置の表示素子
の動作原理を示す概略図、第２図〜第４図は第１図に示
した表示素子を用いた反射型カラー表示装置の実施例を
示す概略図、第５図〜第７図は第２図〜第４図に示した
本発明の表示装置の製造方法の実施例を説明するための
概略図、第８図は従来の透過型表示装置の一例を示す
図、第９図は従来の反射型表示装置の一例を示す図、第
10図は高分子分散型液晶を用いた従来の反射型表示装置
の一例を示す図である。 401……導電膜 402……透明な膜 403……屈折率が可変で透明な膜 404……透明な膜 405……透明導電膜 501……導電膜 501……透明な膜 503……屈折率が可変で透明な膜 504……透明な膜 505……透明導電膜 506……第１の表示素子 507……導電膜 508……透明な膜 509……屈折率が可変で透明な膜 510……透明な膜 511……透明導電膜 512……第２の表示素子 513……導電膜 514……透明な膜 515……屈折率が可変で透明な膜 516……透明な膜 517……透明導電膜 518……第３の表示素子 519……絶縁基板 601……透明導電膜 602……透明な膜 603……屈折率が可変で透明な膜 604……透明な膜 605……透明導電膜 606……第１の表示素子 607……透明導電膜 608……透明な膜 609……屈折率が可変で透明な膜 610……透明な膜 611……透明導電膜 612……第２の表示素子 613……透明導電膜 614……透明な膜 615……屈折率が可変で透明な膜 616……透明な膜 617……透明導電膜 618……第３の表示素子 619……黒色の膜 701……透明導電膜 702……透明な膜 703……屈折率が可変で透明な膜 704……透明な膜 705……透明導電膜 706……第１の表示素子 707……透明導電膜 708……透明な膜 709……屈折率が可変で透明な膜 710……透明な膜 712……第２の表示素子 713……透明導電膜 714……透明な膜 715……屈折率が可変で透明な膜 716……透明な膜 717……透明導電膜 718……第３の表示素子 719……黒色の膜 801……導電膜 802……透明な膜 803……屈折率が可変で透明な膜 804……透明な膜 805……透明導電膜 806……基板 901……導電膜 902……透明な膜 903……屈折率が可変で透明な膜 904……透明な膜 905……透明導電膜 906……スペーサ膜 908……基板 909……透明基板 1001……導電膜 1002……透明な膜 1003……屈折率が可変で透明な膜 1004……透明な膜 1005……透明導電膜 1006……スペーサ膜 1008……基板 1009……透明基板 1010……リフトオフ膜FIG. 1 is a schematic view showing the principle of operation of a display element of a reflection type color display device according to the present invention, and FIGS. 2 to 4 are embodiments of a reflection type color display device using the display element shown in FIG. 5 to 7 are schematic views for explaining an embodiment of the method of manufacturing the display device of the present invention shown in FIGS. 2 to 4, and FIG. 8 is a conventional transmission type. FIG. 9 is a diagram illustrating an example of a display device, FIG. 9 is a diagram illustrating an example of a conventional reflective display device, and FIG.
FIG. 10 is a diagram showing an example of a conventional reflective display device using a polymer dispersed liquid crystal. 401 conductive film 402 transparent film 403 transparent film with variable refractive index 404 transparent film 405 transparent conductive film 501 conductive film 501 transparent film 503 refractive index Is a transparent film 504, a transparent film 505, a transparent conductive film 506, a first display element 507, a conductive film 508, a transparent film 509, a transparent film 510 having a variable refractive index. … Transparent film 511… transparent conductive film 512… second display element 513… conductive film 514… transparent film 515… transparent film with variable refractive index 516… transparent film 517… transparent Conductive film 518 Third display element 519 Insulating substrate 601 Transparent conductive film 602 Transparent film 603 Transparent film with variable refractive index 604 Transparent film 605 Transparent conductive film 606 first display element 607 transparent conductive film 608 transparent film 609 transparent film with variable refractive index 610 transparent film 611 transparent conductive film 612 second display Element 613 …… Transparent conductive film 614 transparent film 615 transparent film with variable refractive index 616 transparent film 617 transparent conductive film 618 third display element 619 black film 701 transparent conductive film 702 … Transparent film 703… transparent film with variable refractive index 704… transparent film 705… transparent conductive film 706… first display element 707… transparent conductive film 708… transparent film 709… … Transparent film with variable refractive index 710… transparent film 712… second display element 713… transparent conductive film 714… transparent film 715… transparent film with variable refractive index 716… transparent Transparent conductive film 718 Third display element 719 Black film 801 Conductive film 802 Transparent film 803 Transparent film with variable refractive index 804 Transparent film 805: transparent conductive film 806: substrate 901: conductive film 902: transparent film 903: transparent film with variable refractive index 904: transparent film 905: transparent conductive film 906: spacer film 908 …… Substrate 909 …… Transparent Substrate 1001 ... Conductive film 1002 ... Transparent film 1003 ... Transparent film with variable refractive index 1004 ... Transparent film 1005 ... Transparent conductive film 1006 ... Spacer film 1008 ... Substrate 1009 ... Transparent substrate 1010 …… lift-off membrane
フロントページの続き (56)参考文献 特開 昭53−72598（ＪＰ，Ａ) 特開 昭51−48995（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) G02F 1/1333 G02F 1/1335 G02F 1/21 G02F 1/141Continuation of front page (56) References JP-A-53-72598 (JP, A) JP-A-51-48995 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) G02F 1 / 1333 G02F 1/1335 G02F 1/21 G02F 1/141
Claims (8)
であって、かつ少なくともその中の一つの膜が屈折率の
可変な膜である干渉フィルターを用いた表示素子を具備
し、上記屈折率の可変な膜の屈折率の可変範囲がn1から
n2（n1＜n2）までの場合に、上記屈折率の可変な膜と接
して積層する膜の屈折率n3との関係をn3≦n1あるいはn2
≦n3としたことを特徴とする表示装置。1. A display device using an interference filter which is a multilayer film in which a plurality of films having different refractive indexes are stacked, and at least one of the films is a film having a variable refractive index. Variable refractive index range of film with variable refractive index is from n1
In the case of n2 (n1 <n2), the relationship with the refractive index n3 of the film laminated in contact with the variable refractive index film is expressed as n3 ≦ n1 or n2.
≤ n3.
であって、かつ少なくともその中の一つの膜が屈折率の
可変な膜である干渉フィルターを用いた表示素子を黒あ
るいは灰色の膜上に複数設置し、上記各表示素子の干渉
フィルターの反射率が高い色を赤色、緑色、青色とし、
上記屈折率の可変な膜の屈折率の可変範囲がn1からn2
（n1＜n2）までの場合に、上記屈折率の可変な膜と接し
て積層する膜の屈折率n3との関係をn3≦n1あるいはn2≦
n3としたことを特徴とする表示装置。2. A display device using an interference filter, which is a multilayer film in which a plurality of films having different refractive indexes are laminated and at least one of the films is a film having a variable refractive index, is used for a black or gray display device. A plurality of colors are installed on the film, and the colors with high reflectance of the interference filter of each display element are red, green, and blue,
The variable range of the refractive index of the variable refractive index film is n1 to n2.
In the case of (n1 <n2), the relationship with the refractive index n3 of the film laminated in contact with the variable refractive index film is expressed as n3 ≦ n1 or n2 ≦
A display device having n3.
であって、かつ少なくともその中の一つの膜が屈折率の
可変な膜である干渉フィルターを用いた表示素子を黒あ
るいは灰色の膜上に複数積層して設置し、上記各表示素
子の干渉フィルターの反射率を高い色を赤色、緑色、青
色とし、上記屈折率の可変な膜の屈折率の可変範囲がn1
からn2（n1＜n2）までの場合に、上記屈折率の可変な膜
と接して積層する膜の屈折率n3との関係をn3≦n1あるい
はn2≦n3としたことを特徴とする表示装置。3. A display element using an interference filter which is a multilayer film in which a plurality of films having different refractive indices are stacked and at least one of the films is a film having a variable refractive index is used as a black or gray display device. A plurality of layers are placed on the film, the reflectance of the interference filter of each display element is set to a high color of red, green, and blue, and the variable range of the refractive index of the variable refractive index film is n1.
And n2 (n1 <n2), wherein the relationship with the refractive index n3 of the film laminated in contact with the variable refractive index film is n3 ≦ n1 or n2 ≦ n3.
ことを特徴とする請求項第１項、第２項または第３項記
載の表示装置。4. The display device according to claim 1, wherein liquid crystal is used as the film having a variable refractive index.
いたことを特徴とする請求項第１項、第２項または第３
項記載の表示装置。5. The method according to claim 1, wherein a ferroelectric material is used as the film having a variable refractive index.
The display device according to the item.
する上記基板上に第１の透明な膜を形成し、上記第１の
透明な膜上に高分子強誘電性液晶を形成し、上記高分子
強誘電性液晶上に第２の透明な膜を形成し、上記第２の
透明な膜上に透明導電膜を形成することを特徴とする表
示装置の製造方法。6. A conductive film is formed on a substrate, a first transparent film is formed on the substrate having the conductive film, and a polymer ferroelectric liquid crystal is formed on the first transparent film. Forming a second transparent film on the polymer ferroelectric liquid crystal; and forming a transparent conductive film on the second transparent film.
する上記基板上に第１の透明な膜を形成し、上記第１の
透明な膜上にスペーサ膜を形成し、上記スペーサ膜上に
第２の透明な膜のパタンを形成し、上記第２の透明な膜
上に透明導電膜のパタンを形成し、上記スペーサ膜をオ
ーバエッチングし、上記基板を屈折率が電界によって可
変で透明な物質中に浸し、透明基板で上記屈折率が電界
によって可変で透明な物質を封止することを特徴とする
表示装置の製造方法。7. A method for forming a conductive film on a substrate, forming a first transparent film on the substrate having the conductive film, forming a spacer film on the first transparent film, Forming a second transparent film pattern on the film, forming a transparent conductive film pattern on the second transparent film, over-etching the spacer film, and changing the refractive index of the substrate by an electric field; A method for manufacturing a display device, comprising: immersing a transparent material in a transparent substrate, and sealing the transparent material with the refractive index variable by an electric field on a transparent substrate.
する上記基板上に次に形成する多層膜全体の厚さよりも
厚いリフトオフ膜のパタンを形成し、上記導電膜上に第
１の透明な膜を形成し、上記第１の透明な膜上にスペー
サ膜を形成し、上記スペーサ膜上に第２の透明な膜を形
成し、上記第２の透明な膜上に透明導電膜を形成し、上
記リフトオフ膜をエッチングし、上記スペーサ膜をオー
バエッチングし、上記基板を屈折率が電界によって可変
で透明な物質中に浸し、透明基板で上記屈折率が電界に
よって可変で透明な物質を封止することを特徴とする表
示装置の製造方法。8. A conductive film is formed on a substrate, a lift-off film pattern thicker than the entire thickness of a multilayer film to be formed next is formed on the substrate having the conductive film, and a first film is formed on the conductive film. A transparent film is formed on the first transparent film, a spacer film is formed on the first transparent film, a second transparent film is formed on the spacer film, and a transparent conductive film is formed on the second transparent film. Is formed, the lift-off film is etched, the spacer film is over-etched, and the substrate is immersed in a transparent material whose refractive index is variable by an electric field. A method for manufacturing a display device, characterized by sealing a device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2306265A JP2846943B2 (en) | 1990-11-14 | 1990-11-14 | Display device and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2306265A JP2846943B2 (en) | 1990-11-14 | 1990-11-14 | Display device and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04178623A JPH04178623A (en) | 1992-06-25 |
| JP2846943B2 true JP2846943B2 (en) | 1999-01-13 |
Family
ID=17955000
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2306265A Expired - Fee Related JP2846943B2 (en) | 1990-11-14 | 1990-11-14 | Display device and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2846943B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1090677A (en) | 1996-09-04 | 1998-04-10 | Internatl Business Mach Corp <Ibm> | Reflection type display device and its color development method |
| JP3564905B2 (en) * | 1996-09-05 | 2004-09-15 | セイコーエプソン株式会社 | Display device |
| AU3477600A (en) * | 1999-02-01 | 2000-08-18 | Mcnc | A tunable electrooptic interference filter and method of manufacturing same |
| CN114141967A (en) * | 2021-11-19 | 2022-03-04 | Oppo广东移动通信有限公司 | Electronic equipment, display module and display panel |
-
1990
- 1990-11-14 JP JP2306265A patent/JP2846943B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04178623A (en) | 1992-06-25 |
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