JP2841348B2 - Electro-optic electrode substrate - Google Patents

Electro-optic electrode substrate

Info

Publication number
JP2841348B2
JP2841348B2 JP17506390A JP17506390A JP2841348B2 JP 2841348 B2 JP2841348 B2 JP 2841348B2 JP 17506390 A JP17506390 A JP 17506390A JP 17506390 A JP17506390 A JP 17506390A JP 2841348 B2 JP2841348 B2 JP 2841348B2
Authority
JP
Japan
Prior art keywords
electrode substrate
electro
polyimide resin
parts
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17506390A
Other languages
Japanese (ja)
Other versions
JPH0462522A (en
Inventor
輝 奥野山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP17506390A priority Critical patent/JP2841348B2/en
Publication of JPH0462522A publication Critical patent/JPH0462522A/en
Application granted granted Critical
Publication of JP2841348B2 publication Critical patent/JP2841348B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】 [発明の効果] (産業上の利用分野) 本発明は、耐熱性、配向性、耐久性に優れた電気光学
用電極基板に関する。
DETAILED DESCRIPTION OF THE INVENTION [Effect of the Invention] (Industrial application field) The present invention relates to an electro-optical electrode substrate excellent in heat resistance, orientation, and durability.

(従来の技術) 最近、液晶の光学的異方性を利用した表示装置の応用
が各方面で進められている。この表示方法として主に用
いられているのは、負の誘電異方性を持ったネマチック
液晶化合物が電場に印加により光を散乱するダイナミッ
クスキャタリング現象を表示に利用したもの(DS型デバ
イスという)と、正の誘電異方性を持ったネマチック液
晶化合物を配向させることによって、旋光性を変化させ
て表示に利用したものの(FE型デバイスという)があ
る。DS型デバイスでは、動作原理上、液晶化合物の初期
配向の均一性を必ずしも必要としないが、FE型デバイス
では動作原理が電場により液晶化合物の初期配合を制御
もしくは再配列させ、その際の光学的性質の変化を利用
するものであるため、液晶化合物の初期配向の均一性が
特に重要である。
(Prior Art) In recent years, applications of display devices utilizing optical anisotropy of liquid crystal have been advanced in various fields. The main method used for this display is the use of a dynamic scattering phenomenon in which a nematic liquid crystal compound having negative dielectric anisotropy scatters light when applied to an electric field (referred to as a DS type device). There is also an FE device in which the optical rotation is changed and used for display by aligning a nematic liquid crystal compound having a positive dielectric anisotropy. DS-type devices do not necessarily require uniformity of the initial alignment of the liquid crystal compound due to the principle of operation, but FE-type devices control or rearrange the initial compounding of the liquid crystal compound by an electric field. Since the change in properties is used, uniformity of the initial alignment of the liquid crystal compound is particularly important.

従来、液晶化合物の初期配向の均一性を得る手段とし
て、電極基板を布などで一方光に摩擦する方法が知られ
ている。しかし、この方法では部分的に液晶化合物分子
の配向が異なって配向の均一性は十分でなく、また配向
が短時間のうちに失われてしまう欠点がある。この欠点
を改善するものとして、ある種の界面活性剤を併用して
電極基板を一方に摩擦する方法があるが、配向の均一性
はある程度改善されるものの、併用する界面活性剤に耐
熱性がなく、またこれが液晶化合物の劣化をまねくとい
う欠点がある。さらに、電界を印加し続けると界面活性
剤が電界により分解、変質を起こして配向が破壊されて
しまう欠点がある。
Conventionally, as a means for obtaining uniformity of the initial alignment of a liquid crystal compound, a method of rubbing one side of light with an electrode substrate with a cloth or the like is known. However, this method has the drawbacks that the alignment of liquid crystal compound molecules is partially different, the alignment uniformity is not sufficient, and the alignment is lost in a short time. As a method of improving this disadvantage, there is a method of rubbing the electrode substrate against one side by using a certain kind of surfactant in combination.However, although the uniformity of the orientation is improved to some extent, the surfactant used in combination has a heat resistance. However, there is a disadvantage that this leads to deterioration of the liquid crystal compound. Further, there is a disadvantage that if the electric field is continuously applied, the surfactant is decomposed and deteriorated by the electric field to destroy the orientation.

また、従来の縮合型ポリイミノ樹脂を被覆した電極基
板を一方向に摩擦する方法が用いられている。この場合
は液晶化合物に対する配向効果および対熱性に優れてい
るという利点をもっているが、ポリイミド樹脂の硬化温
度が高くかつ樹脂が硬いため、フレキシブルな電極基板
には適用できないという欠点があった。
Further, a conventional method of rubbing an electrode substrate coated with a condensed polyimino resin in one direction has been used. This case has the advantage of being excellent in the alignment effect and heat resistance to the liquid crystal compound, but has the disadvantage that it cannot be applied to a flexible electrode substrate because the curing temperature of the polyimide resin is high and the resin is hard.

(発明が解決しようとする課題) 本発明は、上記の欠点を解決するためになされたもの
で、耐熱性、配向性、耐久性に優れるとともに、フレキ
シブルな電極基板にも使用可能な電気光学用電極基板を
提供することを目的としている。
(Problems to be Solved by the Invention) The present invention has been made in order to solve the above-mentioned drawbacks, and has excellent heat resistance, orientation, and durability, and can be used for a flexible electrode substrate. It is intended to provide an electrode substrate.

[発明の構成] (課題を解決するための手段) 本発明者は、上記の目的を達成しようと鋭意研究を重
ねた結果、新規なポリイミド樹脂を用いることによっ
て、上記目的を達成できることを見い出し、本発明を完
成したものである。
[Constitution of the Invention] (Means for Solving the Problems) The present inventors have conducted intensive studies to achieve the above object, and as a result, have found that the above object can be achieved by using a novel polyimide resin. The present invention has been completed.

すなわち、本発明は、 透明導電性膜を有する基板表面の一部又は全部に、 (A)(a)次の一般式で示されるイミド基とエポキシ
基を有する化合物及び(b)フェニレンジアクリル酸を
反応してなるポリイミド樹脂、 (但し、式中Rは、 を表す) (B)増感剤及び光開始剤 を含む耐熱感光性組成物の塗膜を有し、前記塗膜が配向
処理されてなることを特徴とする電気光学用電極基板で
ある。
That is, the present invention provides: (A) (a) a compound having an imide group and an epoxy group represented by the following general formula and (b) phenylenediacrylic acid on a part or all of the surface of a substrate having a transparent conductive film. A polyimide resin, (Where R is (B) An electro-optical electrode substrate comprising a coating film of a heat-resistant photosensitive composition containing a sensitizer and a photoinitiator, wherein the coating film is subjected to an orientation treatment.

以下、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail.

本発明に用いる透明導電膜としては、例えば、酸化イ
ジウム、酸化スズ、酸化スズと酸化インジウムの混合
物、酸化スズと酸化アンチモンの混合物、酸化チタン、
酸化ロジウム、酸化白金等の金属酸化物の金属性薄膜が
挙げられる。この透明導電膜が被覆される基板として
は、ガラス、セラミック、プラスチックフイルム等が使
用され、これらの基板上の蒸着法、スパッタリング法、
CVD法、スプレイ法等によって透明導電性膜が被覆され
る。
As the transparent conductive film used in the present invention, for example, indium oxide, tin oxide, a mixture of tin oxide and indium oxide, a mixture of tin oxide and antimony oxide, titanium oxide,
Metallic thin films of metal oxides such as rhodium oxide and platinum oxide are exemplified. Glass, ceramic, plastic film and the like are used as a substrate on which the transparent conductive film is coated, and a vapor deposition method, a sputtering method,
The transparent conductive film is coated by a CVD method, a spray method, or the like.

本発明に用いる耐熱感光性組成物としては、(A)ポ
リイミド樹脂と(B)増感剤及び光開始剤とからなるも
のを使用する。ここで用いる(A)ポリイミド樹脂は
(a)イミド基とエポキシ基を有する化合物と(b)フ
ェニレンジアクリル酸を付加反応させてなるものであ
る。(a)イミド基とエポキシ基を有する化合物として
は、次の一般式で示されるものを使用する。
As the heat-resistant photosensitive composition used in the present invention, a composition comprising (A) a polyimide resin, (B) a sensitizer and a photoinitiator is used. The (A) polyimide resin used here is obtained by subjecting (a) a compound having an imide group and an epoxy group and (b) phenylenediacrylic acid to an addition reaction. (A) As the compound having an imide group and an epoxy group, a compound represented by the following general formula is used.

(但し、式中Rは、 を表す) また(b)フェニレンジアクリル酸は、次の構造式で
示されるものである。
(Where R is (B) Phenylenediacrylic acid is represented by the following structural formula.

この付加反応は、上述したイミド基とエポキシ基を有
する化合物と、光重合性不飽和基を有するフェニレンジ
アクリル酸の略等モルを、有機溶媒中で150〜200℃の温
度下で3〜12時間付加反応させるものであり、ポリイミ
ドが得られる。この時、3級アミンのような塩基性の反
応触媒を使用することが好ましい。この付加反応で必要
であれば溶剤を使用することもできる。この場合の溶剤
としては、N−メチル−2−ピロリドン、ジメチルアセ
トアミド、ジメチルホルムアミド、ジオキサン、ジグラ
イム等が挙げられ、これらは単独又は2種以上混合して
使用することができる。
In this addition reaction, the above-mentioned compound having an imide group and an epoxy group and approximately equimolar amounts of phenylenediacrylic acid having a photopolymerizable unsaturated group are mixed in an organic solvent at a temperature of 150 to 200 ° C. for 3 to 12 minutes. The addition reaction is carried out for a time, and a polyimide is obtained. At this time, it is preferable to use a basic reaction catalyst such as a tertiary amine. If necessary in this addition reaction, a solvent can be used. Examples of the solvent in this case include N-methyl-2-pyrrolidone, dimethylacetamide, dimethylformamide, dioxane, diglyme, and the like, and these can be used alone or as a mixture of two or more.

本発明に用いる(B)増感剤及び光開始剤としては、
ベンゾイン、ベンゾインエチルエーテル、ベンゾインイ
ソプロピルエーテル、ベンゾインフェニルエーテル等の
ベンゾインアルキルエーテル類、ベンゾインチオエーテ
ル類、ベンゾフェノン、アセトフェノン、2−エチル−
アントラキンノン、塩化デシル、チオキサントン類等が
挙げられ、これは単独又は2種以上混合して使用すると
ができる。
The (B) sensitizer and photoinitiator used in the present invention include:
Benzoin alkyl ethers such as benzoin, benzoin ethyl ether, benzoin isopropyl ether, benzoin phenyl ether, benzoin thioethers, benzophenone, acetophenone, 2-ethyl-
Anthraquinone, decyl chloride, thioxanthones and the like can be mentioned, and these can be used alone or in combination of two or more.

本発明に用いる耐熱感光性組成物は、ポリイミド樹
脂、増感剤及び光開始剤を含むが、本発明の目的に反し
ない限度において、また必要に応じて、熱重合防止剤等
を添加配合することができる。
The heat-resistant photosensitive composition used in the present invention contains a polyimide resin, a sensitizer and a photoinitiator, but, as far as it does not violate the purpose of the present invention, and if necessary, further incorporates a heat polymerization inhibitor and the like. be able to.

このような熱重合防止剤としては、p−メトキシフェ
ノール、ハイドロキノン、2,6−ジt−ブチル−4−メ
チルフェノール、メチルエーテルハイドロキノン、ベン
ゾエート、ベンゾキノン、4−ヒドロキシメチル−2,6
−ジt−ブチルフェノール等が挙げられ、これらは単独
又は2種以上混合して使用することができる。熱重合防
止剤の配合割合は、耐熱感光性組成物100重量部に対し
て0.05〜2.0重量部の範囲とすることがよい。
Examples of such a thermal polymerization inhibitor include p-methoxyphenol, hydroquinone, 2,6-di-tert-butyl-4-methylphenol, methyl ether hydroquinone, benzoate, benzoquinone, and 4-hydroxymethyl-2,6.
-Di-t-butylphenol and the like, and these can be used alone or in combination of two or more. The mixing ratio of the thermal polymerization inhibitor is preferably in the range of 0.05 to 2.0 parts by weight based on 100 parts by weight of the heat-resistant photosensitive composition.

耐熱感光性組成物は有機溶剤可溶性であり、絶縁保護
膜形成材料等として使用される場合には、有機溶媒に5
〜40重量%、好ましくは15〜30重量%の割合で溶解した
溶液(感光性樹脂液)として用いる。この有機溶媒とし
ては、N,N−ジメチルスルホオキシド、N,N−ジメチルホ
ルムアミド、N,N−ジエチルホルムアミド、N,N−ジメチ
ルアセトアミド、N,N−ジエチルアセトアミド、N−メ
チル−2−ピロリドン、ジグライム、ヘキサメチレンホ
スホアミド、γ−ブチルラクトン、シクロヘキサン等が
挙げられ、これらは単独又は、2種以上混合して使用す
ることができる。
The heat-resistant photosensitive composition is soluble in an organic solvent.
It is used as a solution (photosensitive resin liquid) dissolved at a ratio of 4040% by weight, preferably 15-30% by weight. Examples of the organic solvent include N, N-dimethylsulfoxide, N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-2-pyrrolidone, Examples thereof include diglyme, hexamethylenephosphamide, γ-butyllactone, cyclohexane, and the like, and these can be used alone or as a mixture of two or more.

感光性樹脂液を用いて電極基板上に保護塗膜を形成す
るには通常次のようにして形成する。感光性樹脂液を溶
媒に溶解して0.01〜25重量%の樹脂溶液とし、刷け塗り
法、浸漬法、オフセットやスタンプ等の印刷法、回転塗
布法、スプレー法等により電極基板上に塗布した後、60
〜100℃の温度で加熱処理して溶剤乾燥を行い、その後
例えば水圧水銀灯、中圧水銀灯、高圧水銀灯、超高圧水
銀灯、キセノンランプ等の紫外線を照射することにより
硬化塗膜を形成する。次いでこの塗膜面を布等で一定方
向に摩擦、配向させて、電気光学用電極基板性を製造す
ることができる。
In order to form a protective coating film on an electrode substrate using a photosensitive resin solution, it is usually formed as follows. The photosensitive resin solution was dissolved in a solvent to form a 0.01 to 25% by weight resin solution, which was applied to the electrode substrate by a brush coating method, an immersion method, a printing method such as offset or stamping, a spin coating method, a spray method, or the like. Later, 60
The solvent is dried by heat treatment at a temperature of 100100 ° C., and thereafter, a cured coating film is formed by irradiating ultraviolet rays such as a hydraulic mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp and a xenon lamp. Next, the coating film surface is rubbed and oriented in a certain direction with a cloth or the like, so that an electro-optical electrode substrate can be manufactured.

こうして製造された電気光学用電極基板一対の配向処
理面の間に、例えば正の誘電異方性を有するネマチック
液晶化合物を公知の方式で封入シールすることにより電
気光学的表示デバイスを作ることができる。このような
電極基板は、例えば電卓、腕時計、置時計、計数表示
板、パソコン等の電気光学的な種々の装置に有効に使用
することができる。
An electro-optical display device can be manufactured by sealing and sealing a nematic liquid crystal compound having a positive dielectric anisotropy between a pair of alignment-treated surfaces of the electro-optical electrode substrate manufactured as described above in a known manner. . Such an electrode substrate can be effectively used for various electro-optical devices such as a calculator, a wristwatch, a clock, a counting display, and a personal computer.

(作用) 本発明の電気光学用電極基板は、新規なポリイミド樹
脂を使用することによって耐熱性、配向性、耐久性に優
れたものとすることができた。
(Function) The electrode substrate for electro-optics of the present invention could be made excellent in heat resistance, orientation and durability by using a novel polyimide resin.

本発明は、前述した一般式で示されるイミド基板とエ
ポキシ基を有する化合物と光重合性不飽和基を有するフ
ェニレンジアクリル酸を反応させて、分子内に閉環した
イミド基と光硬化性の基を有するポリイミド樹脂とする
ことによって、界面活性剤の併用を必要としないので耐
熱性が付与され、また配向性に優れたものとすることが
できる。また低温で加熱乾燥した後、短時間で光硬化さ
せることができるため、被膜が硬くならずにフレキシブ
ルな基板にも適用できる。
The present invention provides a reaction between an imide substrate represented by the aforementioned general formula, a compound having an epoxy group, and a phenylenediacrylic acid having a photopolymerizable unsaturated group, to form a ring-closed imide group and a photocurable group in the molecule. By using a polyimide resin having the formula (1), heat resistance is imparted since a combined use of a surfactant is not required, and excellent orientation can be obtained. In addition, since the film can be photocured in a short time after being dried by heating at a low temperature, the film can be applied to a flexible substrate without becoming hard.

(実施例) 次に本発明を実施例によって具体的に説明するが、本
発明はこれらの実施例に限定されるものではない。以下
の実施例および比較例において「部」とは「重量部」を
意味する。
(Examples) Next, the present invention will be described specifically with reference to examples, but the present invention is not limited to these examples. In the following Examples and Comparative Examples, “parts” means “parts by weight”.

実施例 1 三口フラスコに乾燥窒素を通じてフラスコ内を窒素で
置換した後、ベンゾフェノンテトラカルボン酸無水物か
ら誘導されたイミド基とエポキシ基を有する化合物27.5
0部とフェニレンジアクリル酸6.97部とに、トリエチル
アミン0.03部を加えた。フラスコを150℃の温度に加熱
した後、20℃/1時間の昇温速度で200℃まで上げ、反応
による発熱を抑えながらそのまま200℃で4時間撹拌反
応させた。反応終了後、ジグライムを加えて冷却し、そ
れをメタノールと水の混合溶液に投入してポリイミド樹
脂を析出させた。析出物を乾燥して茶色のポリイミド樹
脂粉末34.0gを得た。このポリイミド樹脂粉末20部をジ
グライム80部に溶解し、光開始剤としてベンゾインイソ
プロピルエーテル2部を添加配合して感光性樹脂液を製
造した。
Example 1 After passing dry nitrogen through a three-necked flask and replacing the inside of the flask with nitrogen, a compound 27.5 having an imide group and an epoxy group derived from benzophenonetetracarboxylic anhydride was used.
0.03 part of triethylamine was added to 0 part and 6.97 parts of phenylenediacrylic acid. After heating the flask to a temperature of 150 ° C., the temperature was raised to 200 ° C. at a heating rate of 20 ° C./one hour, and the reaction was stirred at 200 ° C. for 4 hours while suppressing the heat generation due to the reaction. After the reaction was completed, diglyme was added and the mixture was cooled, and the mixture was poured into a mixed solution of methanol and water to precipitate a polyimide resin. The precipitate was dried to obtain 34.0 g of a brown polyimide resin powder. 20 parts of this polyimide resin powder was dissolved in 80 parts of diglyme, and 2 parts of benzoin isopropyl ether was added and blended as a photoinitiator to prepare a photosensitive resin liquid.

実施例 2 三口フラスコに乾燥窒素を通じてフラスコ内を窒素で
置換した後、ピロメット酸無水物から誘導されたイミド
基とエポキシ基を有する化合物23.93部とフェニレンジ
アクリル酸6.97部とに、トリエチルアミン0.03部を加え
た。フラスコ内を150℃の温度に加熱した後、20℃/1時
間の昇温速度で200℃まで上げ、反応による発熱を抑え
ながらそのまま200℃で4時間撹拌反応させた。反応終
了後、ジグライムを加えて冷却し、それをメタノールと
水の混合溶液に投入してポリイミド樹脂を析出させた。
析出物を乾燥し茶色のポリイミド樹脂粉末29.83gを得
た。このポリイミド樹脂粉末20部をジグライム80部に溶
解し、光開始剤としてベンゾインイソプロピルエーテル
2部を添加配合して感光性樹脂液を製造した。
Example 2 After the atmosphere in the flask was replaced with nitrogen by passing dry nitrogen through a three-necked flask, 23.93 parts of a compound having an imide group and an epoxy group derived from pyrometic anhydride and 6.97 parts of phenylenediacrylic acid were added to 0.03 part of triethylamine. added. After heating the inside of the flask to a temperature of 150 ° C., the temperature was raised to 200 ° C. at a heating rate of 20 ° C./one hour, and the reaction was stirred at 200 ° C. for 4 hours while suppressing the heat generated by the reaction. After the reaction was completed, diglyme was added and the mixture was cooled, and the mixture was poured into a mixed solution of methanol and water to precipitate a polyimide resin.
The precipitate was dried to obtain 29.83 g of a brown polyimide resin powder. 20 parts of this polyimide resin powder was dissolved in 80 parts of diglyme, and 2 parts of benzoin isopropyl ether was added and blended as a photoinitiator to prepare a photosensitive resin liquid.

実施例3 三口フラスコに乾燥窒素を通じてフラスコ内を窒素で
置換した後、4,4′−オキシジフタル酸無水物から誘導
されたイミド基とエポキシ基を有する化合物26.88部と
フェニレンジアクリル酸6.97部とに、トリエチルアミン
0.03部を加えた。フラスコを150℃の温度に加熱した
後、20℃/1時間の昇温速度で200℃まで上げ、反応によ
る発熱を抑えながらそのまま200℃で4時間撹拌反応さ
せた。反応終了後、ジグライムを投入して冷却し、それ
をメタノールと水との混合溶液に投入してポリイミド樹
脂を析出させた。析出物を乾燥し茶色のポリイミド樹脂
粉末33.0gを得た。このポリイミド樹脂粉末20部をジグ
ライム80部に溶解し、光開始剤としてベンゾインイソプ
ロピルエーテル2部を添加配合して感光性樹脂液を製造
した。
Example 3 After the atmosphere in the flask was replaced with nitrogen by passing dry nitrogen through a three-necked flask, 26.88 parts of a compound having an imide group and an epoxy group derived from 4,4'-oxydiphthalic anhydride and 6.97 parts of phenylenediacrylic acid were added. , Triethylamine
0.03 parts were added. After heating the flask to a temperature of 150 ° C., the temperature was raised to 200 ° C. at a heating rate of 20 ° C./one hour, and the reaction was stirred at 200 ° C. for 4 hours while suppressing the heat generation due to the reaction. After the completion of the reaction, diglyme was added and cooled, and then added to a mixed solution of methanol and water to precipitate a polyimide resin. The precipitate was dried to obtain 33.0 g of a brown polyimide resin powder. 20 parts of this polyimide resin powder was dissolved in 80 parts of diglyme, and 2 parts of benzoin isopropyl ether was added and blended as a photoinitiator to prepare a photosensitive resin liquid.

酸化インジウムの透明導電性膜を有するネサガラスを
パターン状にエッチングした後に通常の方法で洗浄した
電極基板を、実施例1〜3で製造した感光性樹脂液に浸
漬した。浸漬から引き上げて100℃の温度で30分間乾燥
を行った後、250Wの高圧水銀灯で感光硬化させ、電極基
板上に厚さ1000Aの耐熱感光性組成物の塗膜を形成し
た。この塗膜を形成した一対の電極基板を布で一方向に
摩擦し配向処理して電気光学用電極基板を製造した。そ
の後、摩擦方向が互いに直交するようにセル組みし、正
の誘電異方正を有するネマチック液晶化合物を封入し、
さらにセルの外側の両面に偏光膜を、偏光膜の偏光方位
がそれぞれ隣接する基板の摩擦方向に平行になるように
貼り合わせて、表示デバイスを製造した。これらの表示
デバイスについて耐湿性(60℃×95%RH×500H)、耐熱
性(80℃×500H)の試験をしたが、いずれの試験におい
ても配向の破壊は見られず、配向の均一性が良好で、耐
久性にも優れており、本発明の効果が確認された。
The electrode substrate, which was formed by etching a Nesa glass having a transparent conductive film of indium oxide in a pattern and then washed by a usual method, was immersed in the photosensitive resin solution manufactured in Examples 1 to 3. After being lifted from the dipping and dried at a temperature of 100 ° C. for 30 minutes, it was photosensitive-cured by a 250 W high-pressure mercury lamp to form a 1000 A thick heat-resistant photosensitive composition coating film on the electrode substrate. The pair of electrode substrates on which the coating film was formed was rubbed in one direction with a cloth and subjected to an orientation treatment to produce an electro-optical electrode substrate. Thereafter, the cells are assembled so that the friction directions are orthogonal to each other, and a nematic liquid crystal compound having a positive dielectric anisotropy is encapsulated.
Further, a polarizing film was attached to both outer surfaces of the cell such that the polarization directions of the polarizing films were respectively parallel to the friction directions of the adjacent substrates, thereby producing a display device. These display devices were tested for moisture resistance (60 ° C x 95% RH x 500H) and heat resistance (80 ° C x 500H). In any of the tests, no destruction of the orientation was observed, and uniformity of the orientation was observed. It was good and excellent in durability, and the effect of the present invention was confirmed.

比較例 1 酸化インジウムの透明導電膜を有するネサガラスを洗
浄後、配向処理剤としてポリオキシエチレンノニルフェ
ニルエーテルの0.5%水溶液に浸漬して塗布した後、真
空加熱乾燥し塗布面を布で一方向に摩擦して配向処理し
たネサガラスを作製した。こうして得られた一対のネサ
ガラスを、その摩擦方向が互いに直交するようにセル組
みし、正の誘電異方性を有するネマチック液晶化合物を
封入し、さらにセルの外側の両面に偏光膜を、偏光膜の
偏光方位がそれぞれ隣接する基板の摩擦方向に平行にな
るように貼り合わせて表示デバイスを製造した。この表
示デバイスは電極印加時に表示部分に明暗の配向ムラが
あり、また60℃×95%RH×100H経過後、配向が破壊し耐
久性が悪かった。
Comparative Example 1 Nesa glass having a transparent conductive film of indium oxide was washed, applied by immersing it in a 0.5% aqueous solution of polyoxyethylene nonylphenyl ether as an alignment treatment agent, then dried by heating under vacuum, and the coated surface was unidirectionally covered with a cloth. Nesa glass that was subjected to orientation treatment by friction was produced. The pair of Nesa glasses thus obtained is assembled into a cell such that the friction directions are orthogonal to each other, a nematic liquid crystal compound having a positive dielectric anisotropy is sealed, and a polarizing film is further provided on both outer surfaces of the cell. Were bonded to each other so that the polarization directions were parallel to the friction direction of the adjacent substrates to produce a display device. In this display device, unevenness of light and dark orientation was observed in a display portion when an electrode was applied, and after 60 ° C. × 95% RH × 100 H, the orientation was destroyed and durability was poor.

比較例 2 比較例1において、配向処理剤を使用せず、直接ネサ
ガラス面を布で一方向に摩擦して配向処理した以外は比
較例1と同一にして表示デバイスを作製した。この表示
デバイスは電極印加時に表示部分に明暗の配向ムラがあ
り、また50℃×3H経過後、配向が破壊しはじめ2日後で
完全に破壊してしまい、耐熱性、耐久性が悪かった。
Comparative Example 2 A display device was produced in the same manner as in Comparative Example 1, except that the alignment treatment was not performed and the Nesa glass surface was directly frictionally rubbed in one direction with a cloth. In this display device, there was light and dark alignment unevenness in the display portion when an electrode was applied, and after 50 ° C. × 3 H, the alignment began to be destroyed and completely destroyed two days later, resulting in poor heat resistance and durability.

[発明の効果] 以上の説明から明らかなように、本発明の電気光学用
電極基板は、耐熱性、耐向性、耐久性、耐湿性に優れて
おり、特に液晶化合物の初期配向の均一性が極めて良
く、かつ塗膜形成を光硬化で行うためにポリエステル等
の熱に弱いフイルム基板にも応用できるという特別の利
点がある。また電極基板の温度が上昇しても液晶化合物
の分子の配向効果に影響を与えることがなく、セル中の
液晶化合物の分子を長期間安定して存在させることがで
きた。
[Effects of the Invention] As is clear from the above description, the electro-optical electrode substrate of the present invention is excellent in heat resistance, direction resistance, durability, and moisture resistance, and particularly, uniformity of initial alignment of the liquid crystal compound. It has a special advantage that it can be applied to a film substrate which is weak to heat, such as polyester, because the film is formed by photo-curing. Also, even if the temperature of the electrode substrate was increased, the alignment effect of the molecules of the liquid crystal compound was not affected, and the molecules of the liquid crystal compound in the cell could be stably present for a long period of time.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】透明導電性膜を有する基板表面の一部又は
全部に、 (A)(a)次の一般式で示されるイミド基とエポキシ
基を有する化合物及び(b)フェニレンジアクリル酸を
反応してなるポリイミド樹脂、 (但し、式中Rは、 を表す) (B)増感剤及び光開始剤 を含む耐熱感光性組成物の塗膜を有し、前記塗膜が配向
処理されてなることを特徴とする電気光学用電極基板。
1. A method comprising: (A) (a) a compound having an imide group and an epoxy group represented by the following general formula and (b) phenylenediacrylic acid on a part or all of the surface of a substrate having a transparent conductive film. Polyimide resin that reacts, (Where R is (B) An electro-optical electrode substrate comprising: a coating film of a heat-resistant photosensitive composition containing (B) a sensitizer and a photoinitiator, wherein the coating film is subjected to an orientation treatment.
JP17506390A 1990-07-02 1990-07-02 Electro-optic electrode substrate Expired - Fee Related JP2841348B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17506390A JP2841348B2 (en) 1990-07-02 1990-07-02 Electro-optic electrode substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17506390A JP2841348B2 (en) 1990-07-02 1990-07-02 Electro-optic electrode substrate

Publications (2)

Publication Number Publication Date
JPH0462522A JPH0462522A (en) 1992-02-27
JP2841348B2 true JP2841348B2 (en) 1998-12-24

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Country Link
JP (1) JP2841348B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2814157B2 (en) * 1991-11-08 1998-10-22 キヤノン株式会社 Chiral smectic liquid crystal device
JPH08248423A (en) * 1995-03-13 1996-09-27 Dainippon Ink & Chem Inc Material for liquid crystal oriented film
US5903330A (en) * 1995-10-31 1999-05-11 Rolic Ag Optical component with plural orientation layers on the same substrate wherein the surfaces of the orientation layers have different patterns and direction
CN1072238C (en) * 1997-07-24 2001-10-03 中国科学院长春应用化学研究所 Process for preparing ester type photosensitive polyimide
JP4525906B2 (en) * 2004-07-06 2010-08-18 Jsr株式会社 Liquid crystal aligning agent and liquid crystal display element
JP5655284B2 (en) 2008-09-11 2015-01-21 三菱化学株式会社 Soluble imide skeleton resin, soluble imide skeleton resin solution composition, curable resin composition, and cured product thereof
KR102560883B1 (en) * 2015-06-16 2023-07-31 미쯔비시 케미컬 주식회사 Alignment film and composition for alignment film

Also Published As

Publication number Publication date
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