JP2823173B2 - Hard substrate coating device - Google Patents

Hard substrate coating device

Info

Publication number
JP2823173B2
JP2823173B2 JP3012543A JP1254391A JP2823173B2 JP 2823173 B2 JP2823173 B2 JP 2823173B2 JP 3012543 A JP3012543 A JP 3012543A JP 1254391 A JP1254391 A JP 1254391A JP 2823173 B2 JP2823173 B2 JP 2823173B2
Authority
JP
Japan
Prior art keywords
hard substrate
bar
substrate
scraping
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3012543A
Other languages
Japanese (ja)
Other versions
JPH04235770A (en
Inventor
信哉 山崎
広文 熊谷
辰弥 江本
正文 尾崎
寛 松岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP3012543A priority Critical patent/JP2823173B2/en
Publication of JPH04235770A publication Critical patent/JPH04235770A/en
Application granted granted Critical
Publication of JP2823173B2 publication Critical patent/JP2823173B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ガラス基板を用いた液
晶表示板などの製造に用いられ、フォトレジストなどの
塗布液を硬基板に薄く均一に塗布するための硬基板塗布
装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hard substrate coating apparatus used for manufacturing a liquid crystal display panel using a glass substrate and for applying a coating liquid such as a photoresist to a hard substrate in a thin and uniform manner. is there.

【0002】[0002]

【従来の技術】液晶板の製造工程の中には、ガラス基板
などの硬基板にフォトレジストなどの塗布液を薄く均一
な厚さに塗布する工程がある。例えばカラー液晶板の製
造においては、透明電極を予め形成したガラス基板に、
フォトレジストの機能を有する赤のカラ−モザイク液を
均一に塗布した後、露光して赤に対応するカラ−モザイ
クを硬化させ、余分の液を除去することにより赤のカラ
ーモザイクを形成している。そしてこれと同様な処理を
緑、青などの他の色について繰り返している。このよう
にフォトレジストとなる塗布液を塗布する場合、この液
は均一な厚さ(例えば2μ±5%程度)に厳密に管理し
て薄く塗布する必要がある。この塗布の厚さが不均一で
あると、光の透過率のむらが生じ、品質の低下を招くこ
とになるからである。
2. Description of the Related Art In a manufacturing process of a liquid crystal plate, there is a process of applying a coating liquid such as a photoresist to a thin and uniform thickness on a hard substrate such as a glass substrate. For example, in the production of a color liquid crystal plate, a transparent electrode is formed on a glass substrate in advance,
After uniformly applying a red color mosaic liquid having the function of a photoresist, the color mosaic corresponding to the red color is cured by exposure, and an excess liquid is removed to form a red color mosaic. . The same processing is repeated for other colors such as green and blue. When a coating liquid to be a photoresist is applied as described above, it is necessary to strictly control this liquid to a uniform thickness (for example, about 2 μ ± 5%) and to apply the thin liquid. This is because if the thickness of the coating is non-uniform, the light transmittance becomes uneven, which leads to a deterioration in quality.

【0003】従来はこの塗布のためにスピンコータが用
いられていた。このスピンコータは回転させた基板の回
転中心付近に塗布液を滴下し、この液を遠心力を利用し
て飛散させることにより塗布するものである。しかしこ
のスピンコータを用いる方法では基板の交換に手間取り
作業能率が悪くなるばかりでなく、飛散して捨てられる
液の量が増えることになる。このためコストアップにな
るという問題があった。
Conventionally, a spin coater has been used for this coating. In this spin coater, a coating liquid is dropped near a rotation center of a rotated substrate, and the liquid is applied by scattering using a centrifugal force. However, in the method using the spin coater, not only the time and labor efficiency for replacing the substrate are deteriorated, but also the amount of the liquid scattered and discarded increases. For this reason, there was a problem that the cost was increased.

【0004】そこで水平に配設された上下一対のローラ
間に基板を挟んで塗布する装置(いわゆるギーサー)を
用いることが考えられている。この装置は下のローラと
なるマイクロロッドバーの下部を塗布液に浸漬し、この
マイクロロッドバーとこの上方に位置するニップローラ
との間に基板を挟んで送りながら、マイクロロッドバー
により基板の下面に塗布するものである。
In view of this, it has been considered to use an apparatus (so-called Gieser) for coating a substrate between a pair of upper and lower rollers disposed horizontally. In this device, the lower part of the micro rod bar, which is the lower roller, is immersed in the coating solution, and the substrate is sandwiched between the micro rod bar and the nip roller located above the micro rod bar. It is to be applied.

【0005】しかしこの場合基板の終端がマイクロロッ
ドバーから離れる際に、塗布液の表面張力や粘性のため
に塗布液が基板に厚く残り、基板終端付近で厚塗りにな
る性質があった。この厚塗り部分は、正規の塗布厚さに
対して設定された露光、洗浄などの種々の処理工程では
適切な処理ができず、この厚塗り部分の未処理による破
片や屑などの残留物が後の工程において塗布液に混入
し、不良製品を生む原因となっていた。このため製品の
歩留まりが低下するという問題があった。
However, in this case, when the end of the substrate separates from the micro rod bar, the coating liquid remains thick on the substrate due to the surface tension and viscosity of the coating liquid, and tends to be thickly coated near the end of the substrate. This thick-coated portion cannot be properly processed in various processing steps such as exposure and cleaning set for a regular coating thickness, and residues such as debris and debris due to unprocessed thick-coated portion are not obtained. In a later step, it was mixed with the coating solution, resulting in a defective product. For this reason, there has been a problem that the yield of products is reduced.

【0006】[0006]

【発明が解決しようとする課題】従って本発明が解決し
ようとする課題は、ギーサーを使って塗布液を塗布する
場合に、硬基板の終端付近に厚塗り部分が発生するのを
防止し、製品の歩留まりを向上させることである。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to prevent the formation of a thick coating near the end of a hard substrate when applying a coating solution using a geser, Is to improve the yield.

【0007】[0007]

【発明の構成】本発明によればこの目的は、下部が塗布
液槽に浸漬されたマイクロロッドバーと、このマイクロ
ロッドバーの上方に対向配置されたニップローラとの間
に硬基板を挟んで送ることにより、前記硬基板の下面に
塗布液を塗布する硬基板塗布装置において、前記マイク
ロロッドバーから前記硬基板の送り方向に離れた位置で
前記硬基板の下面に対して昇降可能に配設され、塗布液
を塗布した硬基板の前端から後端の直前付近までが通過
する間は下降して硬基板から離れ、硬基板の後端の直前
付近が通過する時に上昇して硬基板下面に接触し余分な
塗布液を除去するかきとり棒を備えることを特徴とする
硬基板塗布装置、により達成される。
According to the present invention, this object is achieved by sandwiching a hard substrate between a micro rod bar whose lower part is immersed in a coating solution tank and a nip roller arranged above and opposed to the micro rod bar. it makes lifting the hard substrate coating apparatus for applying a coating solution on the lower surface of the hard substrate, relative to the bottom surface of <br/> the hard substrate at a position apart in the feed direction of the hard substrate from the micro rod bar Arranged so that it can pass from the front end to just before the rear end of the hard substrate coated with the coating liquid
While moving away from the hard substrate, just before the rear end of the hard substrate.
Contacting the hard substrate lower surface increased when near passes extra
The present invention is achieved by a hard substrate coating apparatus including a scraper bar for removing a coating liquid .

【0008】ここにかきとり棒は基板送り方向に対して
逆向きに回転させて基板の下面に接触させるのがよい。
またかきとり棒はマイクロロッドバーやセラミック材製
の筒として筒内を負圧に吸引しうるようにすることが可
能である。
Here, it is preferable that the scraping rod is rotated in a direction opposite to the substrate feeding direction to contact the lower surface of the substrate.
The scraping rod can be a micro rod bar or a cylinder made of a ceramic material so that the inside of the cylinder can be sucked to a negative pressure.

【0009】[0009]

【作用】塗布液はギーサーによって硬基板の下面に塗布
され、ギーサーから基板が離れる時に基板下面に厚く残
る。この基板は所定距離送られるとその下面にかきとり
棒が上昇して接触し、厚塗り部分の余分な塗布液が除去
される。
The coating liquid is applied to the lower surface of the hard substrate by the Gieser, and remains thick on the lower surface of the substrate when the substrate is separated from the Gieser. When the substrate is fed a predetermined distance, the scraping bar rises and comes into contact with the lower surface thereof, and the excess coating liquid in the thickly coated portion is removed.

【0010】[0010]

【実施例】図1は本発明の一実施例の全体配置図、図2
はそのギーサーの断面図、図3はかきとり棒付近の断面
図、図4は図2におけるIII −III線で断面した要部の
動作説明図である。
FIG. 1 is an overall layout view of an embodiment of the present invention, and FIG.
3 is a cross-sectional view of the gieser, FIG. 3 is a cross-sectional view of the vicinity of a scraper bar, and FIG. 4 is an operation explanatory view of a main part taken along line III-III in FIG.

【0011】図1において符号10はガラス基板、12
はローラコンベアであり、ガラス基板10はその下面の
左右の縁をコンベア12のローラに載せた状態で図上左
から右へ送られる。コンベア12の途中にはギーサー1
4が配設されている。このギーサ14は小径で断面円形
なマイクロロッドバー16と、その上方に対向する大径
のニップローラ18と、マイクロロッドバー16の上部
を残してほぼ全体が入る塗布液槽20とを有する。
In FIG. 1, reference numeral 10 denotes a glass substrate;
Is a roller conveyor, and the glass substrate 10 is sent from left to right in the figure with the left and right edges of the lower surface thereof placed on rollers of the conveyor 12. Gieser 1 in the middle of the conveyor 12
4 are provided. The gisa 14 includes a microrod bar 16 having a small diameter and a circular cross section, a nip roller 18 having a large diameter facing above the microrod bar 16, and a coating solution tank 20 in which almost the entirety of the microrod bar 16 is left except for the upper part.

【0012】ここにマイクロロッドバー16は、断面円
形のロッドの表面に細い金属線を密着するように巻き付
けたものであり、金属線間の溝による毛細管現象を利用
して塗布液を塗布するものである。
Here, the micro rod bar 16 is formed by winding a thin metal wire tightly around the surface of a rod having a circular cross section, and applying a coating liquid by utilizing a capillary phenomenon caused by a groove between the metal wires. It is.

【0013】塗布液槽20は、図2に示すように、基板
10の送り方向に直交する方向に長く浅い液溜め部22
を持ち、この液溜め部22には給液パイプ(図示せず)
から新しい液が供給される一方、排液口26から塗布液
が排出される。給液パイプは液溜め部22の一端寄りに
臨み、排液口26は他端寄りの底に開口する。このため
塗布液が液溜め部22をその長手方向に流れて液を均質
化するのに適する。なおこの塗布液の深さは図示しない
液面センサにより監視され、常に一定に管理される。
As shown in FIG. 2, the coating liquid tank 20 has a long and shallow liquid reservoir 22 in a direction orthogonal to the direction in which the substrate 10 is fed.
The liquid reservoir 22 has a liquid supply pipe (not shown).
Supplies a new liquid, while the coating liquid is discharged from the liquid discharge port 26. The liquid supply pipe is located near one end of the reservoir 22
The drain port 26 opens to the bottom near the other end. Therefore, the coating liquid is suitable for flowing in the liquid reservoir 22 in the longitudinal direction thereof to homogenize the liquid. The depth of the coating liquid is monitored by a liquid level sensor (not shown), and is constantly maintained at a constant level.

【0014】マイクロロッドバー16はその上部が液か
ら露出するように水平に保持されている。すなわち液溜
め部22の両端には上方に半円弧状に開いた凹部を有す
る軸受部30、32が設けられ、この軸受部30、32
とここに上方から被されるキャップ(図示せず)との間
にマイクロロッドバー16を回転自在に保持している。
またマイクロロッドバー16の中間部分はバックアップ
部材38(図4A,4B,4C参照)により下方から支
持されている。このバックアップ部材38は、摺動性に
優れた硬質の合成樹脂で作られ、その上面に長手方向に
沿って形成された半円形の溝がマイクロロッドバー16
に下方から当接してマイクロロッドバー16のたわみを
防止するものである。なおこのバックアップ部材38の
高さは、この下方に配列された多数の調整ねじ40(
4A,4B,4C参照)により塗布液槽20の下面から
微調整可能となっている。
The micro rod bar 16 is held horizontally so that its upper part is exposed from the liquid. That is, bearing portions 30 and 32 having concave portions that open upward in a semicircular arc are provided at both ends of the liquid reservoir portion 22, and the bearing portions 30 and 32 are provided.
The micro rod bar 16 is rotatably held between the micro rod bar 16 and a cap (not shown) which is covered from above.
The intermediate portion of the micro rod bar 16 is supported from below by a backup member 38 (see FIGS. 4A, 4B and 4C ). The backup member 38 is made of a hard synthetic resin having excellent slidability, and has a semicircular groove formed on the upper surface thereof along the longitudinal direction.
To prevent the micro rod bar 16 from bending. The height of the backup member 38 is adjusted by a number of adjustment screws 40 (see FIG.
4A, 4B, and 4C ), the fine adjustment can be performed from the lower surface of the coating solution tank 20.

【0015】マイクロロッドバー16の一端(図1にお
ける奥側の端)は塗布液槽20より後方へ突出し、この
突出端は着脱自在な継手42によって電動モータ44に
接続されている。この電動モータ44はガラス基板10
の送り速度がコンベア12と等速になるようにその回転
が管理されている。 前記ニップローラ18の表面は導
電性ゴムで作られ、マイクロロッドバー16との間にガ
ラス基板10を挟んだ状態でガラス基板10に所定の挟
圧力を付与するように保持されている。
One end (the end on the far side in FIG. 1) of the micro rod bar 16 protrudes rearward from the coating solution tank 20, and this protruding end is connected to an electric motor 44 by a detachable joint 42. This electric motor 44
Of the conveyor 12 is controlled so that the feed speed is equal to that of the conveyor 12. The surface of the nip roller 18 is made of conductive rubber, and is held so as to apply a predetermined clamping force to the glass substrate 10 with the glass substrate 10 sandwiched between the nip roller 18 and the micro rod bar 16.

【0016】50はかきとり棒である。このかきとり棒
50は図5A〜Dに示すように種々の構造のものが使用
できる。図5Aのかきとり棒50Aはステンレスなどの
金属ロッドで形成したものである。図5Bのかきとり棒
50Bは金属ロッド52の外周に細い金属線54を密に
巻き付けてマイクロロッドバーとしたものである。図5
Cのかきとり棒50Cは図5Bのものの金属ロッド52
を除き外周の金属線54のみを密に巻いて筒状にしたも
のである。図5Dのかきとり棒50Dは、通気性を有す
る多孔質のセラミックを使った筒で形成したものであ
る。
Reference numeral 50 denotes a scraping bar. As the scraper bar 50, various types of structures can be used as shown in FIGS. The scraping bar 50A in FIG. 5A is formed of a metal rod such as stainless steel. The scraping bar 50B of FIG. 5B is a micro rod bar in which a thin metal wire 54 is densely wound around the outer periphery of a metal rod 52. FIG.
5C is a metal rod 52 of FIG. 5B.
Except that only the outer metal wire 54 is densely wound into a cylindrical shape. The scraping bar 50D in FIG. 5D is formed by a cylinder using a porous ceramic having air permeability.

【0017】かきとり棒50は、図3に示すように洗浄
液槽56にその下部が洗浄液に浸るように保持される。
かきとり棒50の一端は継手58を介してモータ60に
より基板10の送り方向と逆方向に回動される。なおこ
のモータ60は洗浄液槽56と一体に保持され、全体が
ガイドレール62(図3にその一部のみ図示)により上
下に平行移動可能となっている。
As shown in FIG. 3, the scraping rod 50 is held in a cleaning liquid tank 56 so that its lower part is immersed in the cleaning liquid.
One end of the scraping bar 50 is rotated by a motor 60 via a joint 58 in a direction opposite to the direction in which the substrate 10 is fed. The motor 60 is held integrally with the cleaning liquid tank 56, and can be moved up and down by a guide rail 62 (only a part of which is shown in FIG. 3).

【0018】この洗浄液槽56は例えばエアシリンダ6
4により上下動される。すなわちこの洗浄液槽56は
ギーサー14で塗布液を塗布した基板10の後端付近が
かきとり棒50に接近するまでの間は下降してかきとり
棒50を基板10の下面から離隔させる一方、基板10
の後端付近がかきとり棒50に接近すると、この洗浄液
槽56が上昇してかきとり棒50が基板10の送り方向
と逆の方向に回転しながら基板10の下面に接触する。
そして基板10がかきとり棒50から離れると洗浄液槽
56は下降して次の基板10の後端付近が来るまで待機
する。
The cleaning liquid tank 56 is, for example, an air cylinder 6
4 is moved up and down. That is, this cleaning liquid tank 56
Until the vicinity of the rear end of the substrate 10 on which the coating liquid is applied by the greaser 14 approaches the scraping rod 50, it is lowered and scraped.
While the rod 50 is separated from the lower surface of the substrate 10,
When the vicinity of the rear end approaches the scraping rod 50, the cleaning liquid tank 56 rises and the scraping rod 50 contacts the lower surface of the substrate 10 while rotating in the direction opposite to the direction in which the substrate 10 is fed.
When the substrate 10 separates from the scraping rod 50, the cleaning liquid tank 56 descends and waits until the vicinity of the rear end of the next substrate 10 comes.

【0019】次に本実施例の動作を説明する。ローラコ
ンベア12により図2で左側から右側へ送られるガラス
基板10は、マイクロロッドバー16とニップローラ1
8との間に進入する。マイクロロッドバー16の表面に
はその回転により液溜め部22の塗布液が付着している
から、このマイクロロッドバー16の回転に伴いガラス
基板10の下面にこの塗布液が塗布されて行く。ここに
塗布中には、基板10の進入側とマイクロロッドバー1
6とで挟まれる角に一定量の塗布液Rを保持している
(図4A)。液溜め部22の液面のレベルと、ニップロ
ーラ18による挟圧力とは一定に管理されているから、
ガラス基板10の下面に塗布される液の厚さは十分に薄
くかつ高精度に管理され得る。
Next, the operation of this embodiment will be described. The glass substrate 10 sent from the left side to the right side in FIG. 2 by the roller conveyor 12 includes the micro rod bar 16 and the nip roller 1.
Enter between 8. Since the application liquid in the liquid reservoir 22 is attached to the surface of the micro rod bar 16 by the rotation thereof, the application liquid is applied to the lower surface of the glass substrate 10 with the rotation of the micro rod bar 16. During the coating, the entry side of the substrate 10 and the micro rod bar 1
A predetermined amount of the coating liquid R is held at the corner between the coating liquids 6 and 6 (FIG. 4A). Since the liquid level of the liquid reservoir 22 and the squeezing pressure by the nip roller 18 are controlled to be constant,
The thickness of the liquid applied to the lower surface of the glass substrate 10 can be controlled to be sufficiently thin and with high precision.

【0020】基板10がギーサー14から離脱する際に
は、基板10とマイクロロッドバー16との間に溜って
いる塗布液Rの一部が表面張力あるいは液の粘性によっ
て基板10に付着し、これが厚塗り部分S(図4B)と
なる。この厚塗り部分Sがかきとり棒50に接近すると
エアシリンダ64により洗浄液槽56が上昇し、予め逆
方向へ回転されているかきとり棒50を基板10の下面
に接触させる。この結果厚塗り部分Sの塗布液はかきと
り棒50に付着して洗浄液槽56の洗浄液に溶出して除
去される。
When the substrate 10 separates from the geser 14, a part of the coating liquid R accumulated between the substrate 10 and the micro rod bar 16 adheres to the substrate 10 due to surface tension or viscosity of the liquid. It becomes the thickly painted portion S (FIG. 4B). When the thick portion S approaches the scraping bar 50, the cleaning liquid tank 56 is raised by the air cylinder 64, and the scraping bar 50, which has been rotated in the opposite direction in advance, comes into contact with the lower surface of the substrate 10. As a result, the coating liquid of the thick coating portion S adheres to the scraping rod 50 and elutes into the cleaning liquid in the cleaning liquid tank 56 and is removed.

【0021】ここに用いるかきとり棒50は前記したよ
うに図5Aに示す金属ロッドであってもよいが、図5B
に示すマイクロロッドバーの方が塗布液の付着が良好で
厚塗り部分Sの除去効果が大きい。
The scraping rod 50 used here may be the metal rod shown in FIG. 5A as described above,
The micro rod bar shown in (1) has better adhesion of the coating liquid and has a greater effect of removing the thickly coated portion S.

【0022】また図5C、5Dに示すかきとり棒50
C、50Dのように、通気性を有する筒で形成した場合
には、かきとり棒50C、50Dの筒内を負圧に吸引す
るのが望ましい。例えば図3に示すように、かきとり棒
50C、50Dの両端を気密に塞ぎ、その一部に設けた
小孔66を挟む気密室68を形成し、ここを空気ポンプ
70により負圧に吸引する。
The scraping bar 50 shown in FIGS.
When formed by a cylinder having air permeability like C and 50D, it is desirable to suction the inside of the cylinder of the scraping rods 50C and 50D to a negative pressure. For example, as shown in FIG. 3, both ends of the scraping rods 50C and 50D are airtightly closed, and an airtight chamber 68 that sandwiches a small hole 66 provided in a part of the airtight chamber 68 is formed.

【0023】この実施例によればかきとり棒50C、5
0Dの表面から塗布液が内側へ吸引されるから、厚塗り
部分Sの除去効果は一層大きくなる。
According to this embodiment, the scraping rods 50C, 5C
Since the coating liquid is sucked inward from the surface of 0D, the effect of removing the thick coating portion S is further enhanced.

【0024】またかきとり棒50は、ギーサー14から
の距離L(図1)を大きくして、厚塗り部分Sをやや乾
燥させてから除去するようにしてもよい。
Further, the scraping bar 50 may be removed from the thick-coated portion S after the distance L (FIG. 1) from the greaser 14 is increased and the thick-coated portion S is slightly dried.

【0025】なお本発明は洗浄液槽56を省いたり、か
きとり棒50だけを昇降させるものであってもよい。
In the present invention, the cleaning liquid tank 56 may be omitted, or only the scraping rod 50 may be moved up and down.

【0026】さらにかきとり棒50を基板10に接触さ
せる際に、基板10の搬送を停止してもよい。
Further, when the scraping rod 50 is brought into contact with the substrate 10, the transport of the substrate 10 may be stopped.

【0027】[0027]

【発明の効果】本発明は以上のように、ギーサーより基
板の送り方向に離れた位置にかきとり棒を昇降可能に設
け、基板後端付近にこのかきとり棒を接触させて厚塗り
部分を除去するから、製品の歩留まりを向上することが
できる(請求項1)。
As described above, according to the present invention, a scraping rod is provided at a position distant from the gieser in the substrate feeding direction so as to be able to move up and down. Therefore, the product yield can be improved (claim 1).

【0028】ここにかきとり棒29を基板送り方向と逆
向きに回転させれば厚塗り部分の除去はさらに良好にな
り(請求項2)、かきとり棒をマイクロロッドバーで形
成したり(請求項3)、セラミック材などの通気性をも
つ筒で形成して筒内を負圧に吸引すれば効果は一層大き
くなる(請求項4、5)。
If the scraping rod 29 is rotated in the direction opposite to the substrate feeding direction, the removal of the thick portion can be further improved (claim 2), and the scraping rod can be formed by a micro rod bar (claim 3). ), The effect can be further enhanced by forming the cylinder with a gas-permeable cylinder such as a ceramic material and sucking the inside of the cylinder with a negative pressure.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の全体配置図FIG. 1 is an overall layout diagram of an embodiment of the present invention.

【図2】そのギーサーの断面図FIG. 2 is a cross-sectional view of the gisa.

【図3】かきとり棒付近の断面図FIG. 3 is a cross-sectional view around a scraping bar.

【図4】図2におけるIII−III線で断面した要部
の動作説明図
FIG. 4 is an operation explanatory view of a main part taken along line III-III in FIG. 2;

【図5】FIG. 5 かきとり棒の種々の実施例を示す断面図Sectional view showing various embodiments of a scraper bar

【符号の説明】[Explanation of symbols]

10 ガラス基板 14 ギーサー 16 マイクロロッドバー 18 ニップローラ 50、50A〜D かきとり棒 DESCRIPTION OF SYMBOLS 10 Glass substrate 14 Gieser 16 Micro rod bar 18 Nip roller 50, 50A-D Scraping bar

フロントページの続き (72)発明者 尾崎 正文 神奈川県綾瀬市小園1005番地 富士マイ クログラフイックス株式会社内 (72)発明者 松岡 寛 神奈川県綾瀬市小園1005番地 富士マイ クログラフイックス株式会社内 (56)参考文献 特開 昭60−230658(JP,A) (58)調査した分野(Int.Cl.6,DB名) B05C 7/00 - 21/00 B05C 1/02 102 G03F 7/16 501Continued on the front page (72) Inventor Masafumi Ozaki 1005 Koizono, Ayase-shi, Kanagawa Prefecture Inside Fuji Mai Chromaix Co., Ltd. References JP-A-60-230658 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) B05C 7/00-21/00 B05C 1/02 102 G03F 7/16 501

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 下部が塗布液槽に浸漬されたマイクロロ
ッドバーと、このマイクロロッドバーの上方に対向配置
されたニップローラとの間に硬基板を挟んで送ることに
より、前記硬基板の下面に塗布液を塗布する硬基板塗布
装置において、前記マイクロロッドバーから前記硬基板
の送り方向に離れた位置で前記硬基板の下面に対して
降可能に配設され、塗布液を塗布した硬基板の前端から
後端の直前付近までが通過する間は下降して硬基板から
離れ、硬基板の後端の直前付近が通過する時に上昇して
硬基板下面に接触し余分な塗布液を除去するかきとり棒
を備えることを特徴とする硬基板塗布装置。
1. A hard substrate is sandwiched and sent between a micro rod bar whose lower part is immersed in a coating liquid tank and a nip roller opposed to and disposed above the micro rod bar. in hard substrate coating apparatus for applying a coating liquid, the hard substrate from the micro rod bar
Is temperature <br/> descending direction end to the lower surface of the hard substrate at a position apart in the feed direction of the front end of the hard substrate coated with a coating solution
While passing until the area immediately before the rear end, go down and
A hard substrate coating apparatus, comprising: a scraping bar which rises up when passing near the rear end of the hard substrate and comes into contact with the lower surface of the hard substrate to remove excess coating liquid .
【請求項2】 前記かきとり棒は前記硬基板の送り方向
に対して逆方向に回転しながら前記硬基板の後部下面に
接触する請求項1の硬基板塗布装置。
2. The hard substrate coating apparatus according to claim 1, wherein the scraping bar contacts a rear lower surface of the hard substrate while rotating in a direction opposite to a feed direction of the hard substrate.
【請求項3】 前記かきとり棒をマイクロロッドバーで
形成した請求項2の硬基板塗布装置。
3. The hard substrate coating apparatus according to claim 2, wherein said scraping bar is formed by a micro rod bar.
【請求項4】 前記かきとり棒を通気性を持つ筒で形成
し、この筒内を負圧に吸引する吸引手段を設けた請求項
2の硬基板塗布装置。
4. The hard substrate coating apparatus according to claim 2, wherein said scraping bar is formed of a cylinder having air permeability, and suction means for sucking the inside of said cylinder to a negative pressure is provided.
【請求項5】 前記かきとり棒を多硬質のセラミック材
で形成した請求項の硬基板塗布装置。
5. A hard substrate coating apparatus according to claim 4 , wherein said scraping bar is formed of a multi-hard ceramic material.
JP3012543A 1991-01-11 1991-01-11 Hard substrate coating device Expired - Fee Related JP2823173B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3012543A JP2823173B2 (en) 1991-01-11 1991-01-11 Hard substrate coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3012543A JP2823173B2 (en) 1991-01-11 1991-01-11 Hard substrate coating device

Publications (2)

Publication Number Publication Date
JPH04235770A JPH04235770A (en) 1992-08-24
JP2823173B2 true JP2823173B2 (en) 1998-11-11

Family

ID=11808254

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3012543A Expired - Fee Related JP2823173B2 (en) 1991-01-11 1991-01-11 Hard substrate coating device

Country Status (1)

Country Link
JP (1) JP2823173B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5455062A (en) * 1992-05-28 1995-10-03 Steag Microtech Gmbh Sternenfels Capillary device for lacquering or coating plates or disks

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50131369U (en) * 1974-04-17 1975-10-28
JPS60230658A (en) * 1984-04-28 1985-11-16 Ginya Ishii Device for coating printed circuit base with photosensitive coating fluid

Also Published As

Publication number Publication date
JPH04235770A (en) 1992-08-24

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