JP2789317B2 - Processing equipment for plating or cleaning - Google Patents
Processing equipment for plating or cleaningInfo
- Publication number
- JP2789317B2 JP2789317B2 JP7237298A JP23729895A JP2789317B2 JP 2789317 B2 JP2789317 B2 JP 2789317B2 JP 7237298 A JP7237298 A JP 7237298A JP 23729895 A JP23729895 A JP 23729895A JP 2789317 B2 JP2789317 B2 JP 2789317B2
- Authority
- JP
- Japan
- Prior art keywords
- processing tank
- plating
- rotating shaft
- cleaning
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子部品等の小物
であって、細小孔・袋孔を備えるワークに、めっき処
理、またはめっき処理を行うに先だって脱脂洗浄するた
めの処理装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a processing apparatus for degreasing and cleaning a workpiece, such as an electronic component, provided with small holes and blind holes, which is subjected to plating or plating.
【0002】[0002]
【従来の技術】従来、電子部品等の小物であって、細小
孔・袋孔を備えるワークに、めっき処理、またはめっき
処理に先だって行う脱脂洗浄する場合、、該細小孔・袋
孔に気泡が付着して、該気泡が付着する部分にめっきが
付かず、又はめっき処理を行うに先だって脱脂洗浄処理
を施す場合にも、該気泡によって洗浄液が該細小孔・袋
孔に入り込まず、この部分の脱脂洗浄が出来ないと言う
不具合がある。かかる不都合を解消する手段として、ワ
ークを入れる回転容器を回転させ、該回転容器内でワー
クを反転させて気泡を取除くものが知られている。2. Description of the Related Art Conventionally, when a workpiece such as an electronic component, which is provided with small holes and blind holes, is subjected to a plating treatment or a degreasing cleaning performed prior to the plating treatment, the small small holes or blind holes are formed. When bubbles are attached, plating is not applied to the portion to which the bubbles are attached, or even when performing a degreasing cleaning process prior to performing the plating process, the cleaning solution does not enter the small holes / bag holes due to the bubbles, There is a problem that this part cannot be degreased and washed. As means for solving such inconveniences, there has been known a method in which a rotary container in which a work is placed is rotated, and the work is inverted in the rotary container to remove bubbles.
【0003】[0003]
【発明が解決しようとする課題】しかし、回転容器内で
ワークを反転させるだけでは十分に気泡を除くことがで
きず上述する不具合が残る。本発明はかかる不具合を解
消した処理装置を提供することを目的とする。 [0008] However, simply reversing the workpiece rotating container is above mentioned can not be fully excluded bubbles defect remains. An object of the present invention is to provide a processing device that has solved such a problem .
【0004】[0004]
【課題を解決するための手段】本発明はかかる目的を達
成するため、上面の出入口を蓋で閉じて、気密に保ち得
るように構成した処理槽内に形成される上部空間を真空
ポンプに連通させると共に、該処理槽内に設けたワーク
を収容する回転容器を設けためっき又は洗浄用処理装置
において、該処理槽の中央底面から該処理槽内に起立す
る筒体を設け、該筒体に、その内面と少なくも一部で接
触するように挿通させて、処理槽外に設けた駆動装置に
連動して回転する回転軸を該処理槽内に突出させ、前記
回転容器の中央底面から上方に突出する有天井筒部に該
回転軸を嵌合させ、有天井筒部の有天井部と回転軸の上
端とを固定させることを特徴とする。かかる構成、特に
処理槽の中央底面から該処理槽内に起立する筒体を設
け、該筒体にその内面と少なくも一部で接触するように
挿通させて、処理槽外に設けた駆動装置に連動して回転
する回転軸を該処理槽内に突出させたことで、該回転軸
の挿通部から該処理槽内に空気が侵入することのないよ
うに、回転軸を処理槽内に突出させることができる。 According to the present invention, in order to achieve the above object, an upper space formed in a processing tank configured to be able to be kept airtight by closing an entrance on the upper surface with a lid is connected to a vacuum pump. And a plating or cleaning treatment apparatus provided with a rotating container for accommodating a work provided in the treatment tank.
In the above, standing in the processing tank from the center bottom surface of the processing tank
A cylindrical body is provided, and at least a part of the cylindrical body is in contact with the inner surface thereof.
Into the drive unit provided outside the processing tank.
The rotating shaft that rotates in conjunction with the projection is projected into the processing tank,
The cylindrical part with a ceiling projecting upward from the bottom of the center of the rotating container
Fit the rotating shaft, and place the
The end is fixed . Such a configuration, especially
A cylindrical body that stands inside the processing tank from the center bottom surface of the processing tank is installed.
And at least partially contact the inner surface of the cylindrical body.
Insert and rotate in conjunction with a drive device outside the processing tank
The rotating shaft is projected into the processing tank,
Air does not enter the treatment tank through the
Thus, the rotating shaft can be projected into the processing tank.
【0005】[0005]
【発明の実施の形態】本発明実施の形態を図面に付き説
明する。図面で1はめっき処理槽を示し、該めっき処理
槽1は上面の出入口1aを、耐蝕性のゴムパッキン2a
を備える蓋2で閉じて気密に保ち得るように構成し、処
理槽1内の上部空間を処理槽1外に設けた真空ポンプ3
に連通させると共に、該処理槽1内にワークを入れるバ
レル型の回転容器4を設け、該回転容器4を処理槽1外
に設けた駆動装置5に連動して回転させるようにした。Embodiments of the present invention will be described with reference to the drawings. In the drawing, reference numeral 1 denotes a plating tank, and the plating tank 1 has an entrance 1a on an upper surface and a corrosion-resistant rubber packing 2a.
A vacuum pump 3 which is configured to be closed by a lid 2 provided with
And a barrel-type rotary container 4 for putting a work in the processing tank 1 is provided, and the rotary container 4 is rotated in conjunction with a driving device 5 provided outside the processing tank 1.
【0006】これを更に説明すると、この処理槽1は、
山型状の基台15の一方の斜面に下端を固定支持させて
傾斜した状態に設置され、該処理槽1は、その上端の開
口1aに蓋2を施して内部を気密に保ち得るようにする
と共に、該槽1の上部空間を 真空ポンプ3に接続させ
た。 [0006] To explain this further, this processing tank 1
The lower end is fixedly supported on one slope of the mountain-shaped base 15.
The processing tank 1 is installed in an inclined state, and the upper end of the processing tank 1 is opened.
Cover 2 can be kept airtight by applying lid 2 to mouth 1a
At the same time, the upper space of the tank 1 is connected to a vacuum pump 3.
Was.
【0007】該処理槽1には、その中央底面から該処理
槽1内に起立する筒体1bを備え、該筒体1bにその内
面と少なくも一部で接触するように挿通させて、該処理
槽1外に設けた駆動装置としてのモータ18に連動して
回転する回転軸16を該処理槽1内に突出させ、前記回
転容器4の中央底面から上方に突出する有天井筒部4b
に該回転軸16を嵌合させ、有天井筒部4bの有天井部
と回転軸16の上端とを蝶ナット17で締付け固定させ
て、該回転容器4を回転軸16に取付ける。[0007] The treatment tank 1, the processing from the middle bottom surface
A cylinder 1b that stands up in the tank 1 is provided .
At least partly in contact with the surface
In conjunction with a motor 18 as a driving device provided outside the tank 1
The rotating shaft 16 is projected into the processing tank 1 and
Roofed cylindrical part 4b projecting upward from the center bottom surface of transfer container 4
The rotary shaft 16 is fitted to the
And the upper end of the rotating shaft 16 with the wing nut 17
Te, Ru mounting the rotary vessel 4 to the rotary shaft 16.
【0008】19は処理槽1内に設けたアノード電極と
連なる金属、20は回転容器4の底面に設けた電極を示
し、該電極20は回転軸16を介してカソード電極22
に接続させる。Reference numeral 19 denotes a metal connected to the anode electrode provided in the processing tank 1, reference numeral 20 denotes an electrode provided on the bottom surface of the rotary container 4, and the electrode 20 is connected to the cathode electrode 22 via the rotary shaft 16.
To be connected.
【0009】なお、脱脂洗浄を行う処理槽1は特に図示
しないが、電解洗浄を行うものは、上述のめっきを行う
ための2つの実施の形態の処理槽をそっくりそのまま利
用でき、化学的な脱脂を行うものでは、上記処理槽1か
ら電極を取除けばこれを化学的な脱脂用の処理槽とする
ことができる。Although the treatment tank 1 for performing degreasing cleaning is not particularly shown, the one for performing electrolytic cleaning can use the treatment tanks of the above-described two embodiments for plating in their entirety, and can perform chemical degreasing. When the electrode is removed from the treatment tank 1, the electrode can be used as a treatment tank for chemical degreasing.
【0010】[0010]
【発明の効果】上述する構成を備えためっき装置にあっ
ては、処理槽の中央底面から該処理槽内に起立する筒体
を設け、該筒体にその内面と少なくも一部で接触するよ
うに挿通させて、処理槽外に設けた駆動装置に連動して
回転する回転軸を該処理槽内に突出させたことで、唯一
外部から空気が侵入する恐れのある回転軸の挿通部から
該処理槽内に空気が侵入することのないように、回転軸
を処理槽内に突出させることができて、該理槽内を簡単
に真空とすることができる。 According to the plating apparatus having the above-described structure, the cylindrical body standing in the processing tank from the center bottom surface of the processing tank.
And at least partially contact the inner surface of the cylindrical body.
And then interlocked with the drive unit provided outside the processing tank
With the rotating shaft protruding into the processing tank, only
From the insertion part of the rotating shaft where air may enter from the outside
Rotating shaft to prevent air from entering the processing tank
Can be projected into the processing tank, making it easy to
Can be vacuumed.
【0011】そして、回転容器の回転に伴ってワークは
回転容器内で、位置・姿勢を変えつつ処理されるワーク
の細小孔・袋孔等に存在する気泡は、処理槽内の負圧に
よって泡となってワークから分離浮上するため、気泡に
よって、細小孔・袋孔部分の脱脂が十分に行われず、又
はめっきが施されないと言う従来の処理装置に見られる
不具合を解消できる。[0011] Then, with the rotation of the rotating container workpiece in a rotating vessel, bubbles existing in microangiopathy hole-bag hole, etc. of the workpiece to be processed while changing the position and posture, the negative pressure in the treatment tank Since the bubbles are separated and floated from the work, the bubbles can prevent the problem of the conventional processing apparatus in which the small holes and blind holes are not sufficiently degreased or plated.
【図1】 発明の実施の形態の一例を示す截断側面図FIG. 1 is a cut-away side view showing an example of an embodiment of the invention.
1 処理槽 2 蓋 3 真空
ポンプ 4 回転容器 5 駆動装置DESCRIPTION OF SYMBOLS 1 Processing tank 2 Lid 3 Vacuum pump 4 Rotary container 5 Drive
Claims (1)
得るように構成した処理槽内に形成される上部空間を真
空ポンプに連通させると共に、該処理槽内に設けたワー
クを収容する回転容器を設けためっき又は洗浄用処理装
置において、該処理槽の中央底面から該処理槽内に起立
する筒体を設け、該筒体に、その内面と少なくも一部で
接触するように挿通させて、処理槽外に設けた駆動装置
に連動して回転する回転軸を該処理槽内に突出させ、前
記回転容器の中央底面から上方に突出する有天井筒部に
該回転軸を嵌合させ、有天井筒部の有天井部と回転軸の
上端とを固定させることを特徴とするめっき又は洗浄用
処理装置。An upper space formed in a processing tank configured to be able to be kept airtight is communicated with a vacuum pump, and a work provided in the processing tank is accommodated. Processing equipment for plating or cleaning with rotating containers
And standing in the processing tank from the bottom center of the processing tank.
A cylindrical body is provided on the inner surface and at least a part of the cylindrical body.
A driving device that is inserted outside of the processing tank
A rotating shaft that rotates in conjunction with
The cylindrical container with a ceiling projecting upward from the bottom of the center of the rotating container
The rotating shaft is fitted, and the ceiling portion of the ceiling tube portion and the rotating shaft are
A plating or cleaning treatment apparatus characterized by fixing an upper end .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7237298A JP2789317B2 (en) | 1995-09-14 | 1995-09-14 | Processing equipment for plating or cleaning |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7237298A JP2789317B2 (en) | 1995-09-14 | 1995-09-14 | Processing equipment for plating or cleaning |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0978300A JPH0978300A (en) | 1997-03-25 |
JP2789317B2 true JP2789317B2 (en) | 1998-08-20 |
Family
ID=17013299
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7237298A Expired - Lifetime JP2789317B2 (en) | 1995-09-14 | 1995-09-14 | Processing equipment for plating or cleaning |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2789317B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107587186B (en) * | 2017-09-16 | 2023-07-11 | 广东保盈环保电镀设备有限公司 | Automatic electroplating production line for vacuum aqueous solution |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02217429A (en) * | 1989-02-17 | 1990-08-30 | Fujitsu Ltd | Plating method and apparatus |
JPH02236295A (en) * | 1989-03-07 | 1990-09-19 | Nec Corp | Electroplating method |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55116075U (en) * | 1979-02-05 | 1980-08-15 |
-
1995
- 1995-09-14 JP JP7237298A patent/JP2789317B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02217429A (en) * | 1989-02-17 | 1990-08-30 | Fujitsu Ltd | Plating method and apparatus |
JPH02236295A (en) * | 1989-03-07 | 1990-09-19 | Nec Corp | Electroplating method |
Also Published As
Publication number | Publication date |
---|---|
JPH0978300A (en) | 1997-03-25 |
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