JP2785925B2 - Seal mechanism - Google Patents

Seal mechanism

Info

Publication number
JP2785925B2
JP2785925B2 JP7011318A JP1131895A JP2785925B2 JP 2785925 B2 JP2785925 B2 JP 2785925B2 JP 7011318 A JP7011318 A JP 7011318A JP 1131895 A JP1131895 A JP 1131895A JP 2785925 B2 JP2785925 B2 JP 2785925B2
Authority
JP
Japan
Prior art keywords
hollow
lid
substrate
contact
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7011318A
Other languages
Japanese (ja)
Other versions
JPH08199335A (en
Inventor
洋次 瀧澤
治朗 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SONII DEISUKU TEKUNOROJII KK
Shibaura Mechatronics Corp
Original Assignee
SONII DEISUKU TEKUNOROJII KK
Shibaura Engineering Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SONII DEISUKU TEKUNOROJII KK, Shibaura Engineering Works Co Ltd filed Critical SONII DEISUKU TEKUNOROJII KK
Priority to JP7011318A priority Critical patent/JP2785925B2/en
Publication of JPH08199335A publication Critical patent/JPH08199335A/en
Application granted granted Critical
Publication of JP2785925B2 publication Critical patent/JP2785925B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Gasket Seals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、真空等の減圧領域を形
成するゴム製Oリング等の弾性体を利用するシール機構
に係り、特に弾性体の粘着を防止するのに好適する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a sealing mechanism using an elastic body such as a rubber O-ring for forming a reduced pressure region such as a vacuum , and is particularly suitable for preventing adhesion of the elastic body.

【0002】[0002]

【従来の技術】例えば、最近デジタル化された音声信号
や画像情報を大量に記録するのに、広く使用されている
コンパクトディスク(以下CDと記載する)は、ポリカ
ーボネイト等の透明な合成樹脂性基板の表面に、スパッ
タリング等により光反射率の高いアルミニウム薄膜を
して作られる。そして、「1]と「0]からなるデジ
タル情報に合わせて、この基板にビットと称する小さな
孔を開け、これを照射するレーザ光の反射波の有無によ
ってこの小さな孔の有無を検出するこにより、記録情報
が読み出される。
2. Description of the Related Art For example, a compact disk (hereinafter referred to as a CD) widely used for recording a large amount of recently digitized audio signals and image information is a transparent synthetic resin substrate such as polycarbonate. on the surface of, form a high aluminum thin film light reflectance by sputtering or the like
It is made by forming. Then, a small hole called a bit is made in this substrate in accordance with the digital information consisting of "1" and "0", and the presence or absence of this small hole is detected by the presence or absence of a reflected wave of the laser light irradiating the bit. Then, the record information is read.

【0003】この透明なCD基板には、中央部に孔が形
成されており、これから一定の距離だけ離れた位置まで
のCD基板上には、アルミニウム薄膜が形成されてい
る。
[0003] A hole is formed in the center of this transparent CD substrate, and an aluminum thin film is formed on the CD substrate up to a position separated by a predetermined distance therefrom.

【0004】このCD基板にアルミニウム薄膜を例えば
連続スパッタリング装置により形成する作業の概略を図
4および図5を参照して説明する。このスパッタリング
工程におけるCD基板の搬送に際しては、CD基板を真
空チャックにより把持する方式が採用されている。
The outline of the operation of forming an aluminum thin film on this CD substrate by, for example, a continuous sputtering apparatus is shown in FIG.
4 and with reference to FIG. 5 will be described. This sputtering
When the CD substrate is transported in the process, a method is employed in which the CD substrate is held by a vacuum chuck.

【0005】図4は連続スパッタリング装置を一部断面
して示す説明図、図5は要部の断面図である。図におい
て81はベルトコンベヤー等の外部搬送装置、82はア
ーム状をなし減圧装置に接続する通路(図示せず)が形
成され下方にゴムパッドからなる真空チヤック83が設
けられた工作物搬送装置である。この真空チヤック83
は軸84を中心とする回転運動X1と、上下方向Y1へ
の移動とができる。
FIG . 4 is a partial cross section of a continuous sputtering apparatus.
FIG. 5 is a sectional view of a main part. Figure smell
81 is an external conveying device such as a belt conveyor , and 82 is
Vacuum Chuck 83 is set to passage connecting to the vacuum apparatus without the over arm-like (not shown) is made of a rubber pad downwardly formed
It is a work transfer device that has been shaken. This vacuum chuck 83
Represents the rotational motion X1 about the axis 84 and the vertical direction Y1.
Can be moved.

【0006】また、9は中間搬送装置で、蓋状体91部
分に上記と同様なゴムパッドからなる真空チヤック92
を有し、この蓋状体91および真空チヤック92部分は
水平に支持されるとともに回転できる。また、Sはスパ
ッタリング装置で、真空を形成する真空槽1の真空室1
1内の回転軸23に軸支された内部搬送装置4および成
膜室14を備えている。
Reference numeral 9 denotes an intermediate transfer device, which has a cover 91
Vacuum chuck 92 made of a rubber pad similar to the above.
The lid 91 and the vacuum chuck 92 are
It is supported horizontally and can rotate. S is a spa
The vacuum chamber 1 of the vacuum chamber 1 for forming a vacuum by a
1 and the internal transfer device 4 supported by the rotating shaft 23 in the
A membrane chamber 14 is provided.

【0007】そして、この連続スパッタリング装置Sに
おいては、工作物搬送装置82の真空チヤック83が下
降してベルトコンベヤー81により順次送られてくる工
作物であるCD用基板5を吸引保持して上方向Y1へ上
昇させる。次に、軸84をX1方向に回転し、Y1方向
へ下降させることによってCD用基板5を中間搬送装置
9の真空チヤック92と対応させ、搬送装置82側の真
空チヤック83を加圧して保持を解除させるとともに対
向した真空チヤック92側を減圧してCD用基板5を保
持させる。次に、真空チヤック92をY2方向に下降さ
せるとともにX2方向に反転させ、CD用基板5側を下
方の状態にして、蓋状体91を真空槽1 の窓部13上に
気密に接触させる。
[0007] The continuous sputtering apparatus S
The vacuum chuck 83 of the workpiece transfer device 82
The work that descends and is sequentially sent by the belt conveyor 81
The substrate 5 for CD, which is a crop, is suction-held and moved upward in the upward direction Y1.
Raise it. Next, the shaft 84 is rotated in the X1 direction,
To transport the CD substrate 5 to the intermediate transport device
9 corresponding to the vacuum chuck 92 of the transfer device 82 side.
Pressing the empty chuck 83 to release the holding
The side of the vacuum chuck 92 facing down is decompressed to hold the CD substrate 5.
Hold. Next, the vacuum chuck 92 is lowered in the Y2 direction.
And invert in the X2 direction, with the CD substrate 5 side down.
And put the lid 91 on the window 13 of the vacuum chamber 1
Make airtight contact.

【0008】次に、窓部13上に蓋状体91が合致した
状態で、真空チヤック92を加圧してCD用基板5の保
持を解除させる。この加圧により真空チヤック92から
離れたCD用基板5は、内部搬送装置4のホルダー41
上にローディングすなわち載置される。
Next, the lid 91 is fitted on the window 13.
In this state, the vacuum chuck 92 is pressed to maintain the CD substrate 5.
Release the holding. With this pressurization, the vacuum chuck 92
The separated CD substrate 5 is placed on the holder 41 of the internal transport device 4.
Loading or resting on top.

【0009】この後、内部搬送装置4がY3方向に下降
するとともにX3方向に回転して成膜室14と対面した
位置において、CD用基板5にアルミニウムがスパッタ
ーされ、CD用基板5にアルミニウム薄膜が形成され
る。
Thereafter , the internal transport device 4 is lowered in the Y3 direction.
And rotated in the X3 direction to face the film forming chamber 14.
At the position, aluminum is sputtered on the CD substrate 5.
And an aluminum thin film is formed on the CD substrate 5.
You.

【0010】このようなCD用基板5上記中間搬送装
置91の真空チャック92により吸引する方法を図
よりさらに詳述する。中間搬送装置9は、バルブ93、
94を介して図示しない減圧装置(図にはバキューム
ポンプと記載)および加圧ラインに連通する通路95
形成されており、その先端にゴムパッドからなる真空チ
ヤック92が設置されている。これは、図示するように
中空状にして、減圧装置及ぴ加圧ラインの作動により
D用基板5の引と離脱が行われる。
[0010] Such a CD substrate 5 is transferred to the intermediate transfer device.
More detail by Figure 5 how to suction by the vacuum chuck 92 of the location 91. The intermediate conveyance device 9 includes a valve 93,
94 decompression apparatus (not shown) via a (described as vacuum pumps in FIG. 5) and the passage 95 which communicates is formed in the pressure line, a vacuum switch comprising a rubber pad on its distal end
Ru Tei Yak 92 is installed. C This is the hollow as illustrated, by the operation of the decompressor及Pi pressure line
Aspirate of D for the substrate 5 and the withdrawal Ru is carried out.

【0011】そして、一般に減圧された気密な状態を得
るには真空槽が不可欠で、上記スパッタリング装置
の真空槽1にあっても、図4に示す窓部13と蓋状体9
1が気密弁を兼用構成する中間搬送装置9との接触面あ
るいは窓部13とCD用基板5を保持する内部搬送装置
4との接触面等、部材が接離する部分には例えばゴム
のOリング(以下弾性体と記載する)からなるシール
設けられている。
[0011] Then, in general, an airtight state under reduced pressure is obtained.
To the vacuum vessel 1 is essential, upper Symbol sputtering apparatus S
Window 13 and the lid 9 shown in FIG.
1 is a contact surface with the intermediate transfer device 9 which also serves as an airtight valve.
Or an internal transfer device for holding the window 13 and the CD substrate 5
The contact surface or the like of a 4, members are (hereinafter referred to elastic body) such as O-ring of rubber <br/> to toward or away from the portion made of the seal portion
Materials are provided .

【0012】[0012]

【発明が解決しようとする課題】しかし、この弾性体は
経時変化により劣化し、設置された部と粘着して離脱
しにくくなるのを防止する策としては、弾性体の材質を
変えたり、弾性体に塗布するグリス等を除去する等のこ
とが行われているが、粘着を無くすること難しい。特
に、ゴム製のOリング等の弾性体中に含まれる加硫材
は、経時変化により浸み出して、長時間シールを行った
場合等には粘着度が大きくなって、なかなか離れない
いう問題があった
[SUMMARY OF THE INVENTION] However, the elastic member is deteriorated due to aging, withdrawal and adhesive with the installed part material
As measures to prevent the difficulty, it is necessary to change the material of the elastic body , remove grease or the like applied to the elastic body , etc.
However, it is difficult to eliminate stickiness. In particular, it vulcanized contained in the elastic body of rubber O-ring or the like, out soak by aging, long time if such were seal becomes large tackiness, unless away easily
There was a problem .

【0013】本発明はこのような事情に鑑み成されたも
ので、特に、シール機構を構成する弾性体の粘着度を下
げる新規な構造を提供する。
The present invention has been made in view of such circumstances, and in particular, provides a novel structure for reducing the degree of adhesion of an elastic body constituting a sealing mechanism.

【0014】[0014]

【課題を解決するための手段】本発明の第1の発明のシ
ール機構は、中空状体および蓋状体からなる部材の接触
面間に、弾性体からなるシール部材を介して真空槽を形
成したものにおいて、上記シール部材に近接した接触面
間に押圧により両部材を離す反発機構を設たことを特
徴とする。
According to a first aspect of the present invention, there is provided a sealing mechanism in which a vacuum chamber is formed between contact surfaces of a hollow body and a lid-like member via a sealing member made of an elastic body. in what was characterized by digits set repulsion mechanism separating the both members by pressing between the contact surfaces in proximity to the seal member.

【0015】本発明の第2の発明のシール機構は、反発
機構の一端側が中空状体または蓋状体からなる一方の部
材の接触面に埋設され、他端側が中空状体または蓋状体
からなる他方の部材の接触面にシール部材の粘着力より
も大きい反発力を持つて当接していることを特徴とす
る。
The sealing mechanism of the second aspect of the present invention, repulsive
One part consisting of a hollow or lid-like body at one end of the mechanism
Buried in the contact surface of the material, the other end is hollow or lid-like
The contact surface of the other member consisting of
Is characterized by having a large repulsive force and contacting
You.

【0016】本発明の第3の発明のシール機構は、反発
機構が、一端側に窓を有する中空状の容器内に球状体と
スプリングとを収容したものからなり、容器を中空状体
または蓋状体からなる一方の部材の接触面に埋設してい
るとともにスプリングに押圧され窓部から突出している
球状体を中空状体または蓋状体からなる他方の部材の接
触面に当接していることを特徴とする。
The sealing mechanism of the third aspect of the present invention, repulsive
The mechanism is a spherical body in a hollow container having a window on one end.
The container is made of a hollow body
Or embedded in the contact surface of one of the lid
And is pushed by the spring and protrudes from the window
The spherical body is connected to the other member consisting of a hollow body or a lid.
It is characterized by being in contact with the contact surface.

【0017】[0017]

【作用】大気と減圧雰囲気を隔離する例えば真空槽は、
中空状体や蓋状体からなる部材の接触面間に槽内の真空
度を維持するために、ゴム製のOリングからなる弾性
体(シール部材)を介し気密に構成されている。そし
て、真空槽構成部材の接触面間の弾性体に近接した位置
に、弾性体の粘着度より大きな力の押圧作用をする反発
機構を設置することによって、弾性体の残留粘着により
粘着しているホルダー等が容易に離脱できるようにし
て、ホルダー等を確実に搬送できる状態にする。
[Action] For example, a vacuum chamber that separates the atmosphere from the reduced pressure atmosphere
In order to maintain the degree of vacuum in the tank between the contact surfaces of the members formed of a hollow body or a lid, the airtight structure is provided via an elastic body (seal member) such as a rubber O-ring. Then, at a position close to the elastic body between the contact surfaces of the vacuum chamber components, by placing the repulsive mechanism you a pressing action of a large force from the tackiness of the elastic body, and the adhesive by residual adhesive of the elastic body So that the holder and the like can be easily removed and the holder and the like can be transported reliably.

【0018】[0018]

【実施例】本発明に係る実施例をCD用基板等の工作
物に連続スパッタリングを行う連続スパッタリング装置
を参照して説明する連続スパッタリング装置の全体構
成は図4と略同じで、図1はスパッタリング装置Sの要
部の断面図、図2はシール機構の要部を構成する反発機
構の断面図、図3は図2に示す反発機構の斜視図で、図
中、図4および図5と同一の部分は同一の符号を付して
その説明は省略する。
EXAMPLES continuous sputtering apparatus of an embodiment according to the present invention the workpiece such as a substrate for CD performing continuous sputtering
This will be described with reference to FIG . Overall structure of continuous sputtering equipment
The configuration is substantially the same as that of FIG.
FIG. 2 is a cross-sectional view of a part, and FIG.
FIG. 3 is a perspective view of the repulsion mechanism shown in FIG.
4 and FIG. 5 are denoted by the same reference numerals.
The description is omitted.

【0019】CD用連続スパッタリング装置は、真空
の中空状体をなす真空室11内に上下動するプッシ
ャー(Pusher)21が配置され、更に、真空室1
1の上方側の環状壁12より形成された窓部13は、
接離する蓋状体をなす仕切り弁3により覆われている。
The continuous sputtering apparatus S for CD is a vacuum
Pusher (Pusher) 21 you vertically moving the vacuum chamber 11 forming a hollow body of the tank 1 is disposed, further, the vacuum chamber 1
1 of the window portion 13 which is more formed on the upper side of the annular wall 12,
It is covered with a gate valve 3 that forms a lid-like body that comes and goes .

【0020】又、真空室1内には、工作物としてのC
D用基板5が載せられるホルダー(Holder)41
を備えた内部搬送装置が配置されている。上記プッシ
ャ−21は、上下に移動できる軸23に固定することに
より上下に移動可能であり、プッシャ−21の周縁には
ホルダ−41に接触可能なように環状の段部22が設け
られている。
[0020] Further, the vacuum chamber 1 in 1, C as workpiece
Holder 41 on which D substrate 5 is placed
Ru Tei inner transfer unit 4 is disposed with the. The Pusshi <br/> catcher - 21 is movable up and down by fixed to the shaft 23 which can be moved up and down, the pusher - the peripheral edge of the 21 holder - circular so as to be in contact with the 41 step 22 Provided
Is not that.

【0021】又、仕切り弁の中心部分には、穿孔部
を設けて、図示しない爪機構又は真空チャックを配置
して、保持されたCD用基板5を別の装置に転送可能に
なっている。
The center of the gate valve 3 is provided with a perforated portion 3.
1 is provided, and a claw mechanism or a vacuum chuck (not shown) is arranged so that the held CD substrate 5 can be transferred to another device.
That it has been in.

【0022】又、環状壁12の上下面並びにプッシャ−
21の環状の段部22にそれぞれゴム製のシール部材例
えばOリングから成る弾性体6a、6b、6cが設けら
れ、これ等に対応する仕切り弁3および内部搬送装置4
のホルダ−41の上下面間の接触面において気密性を確
保する。尚、このとき弾性体6a、6b、6cが介在さ
れる環状壁12の上下面、ホルダ−41の上下面および
段部22の面は、摺り 合せ面であるのが好ましい。
The upper and lower surfaces of the annular wall 12 and the pusher
Examples of rubber seal members for the annular step portions 21
For example, elastic bodies 6a, 6b, 6c made of O-rings are provided.
Gate valve 3 and internal transfer device 4 corresponding to these.
Airtightness at the contact surface between the upper and lower surfaces of the holder 41
Keep. At this time, the elastic bodies 6a, 6b, 6c are interposed.
Upper and lower surfaces of the annular wall 12, upper and lower surfaces of the holder 41, and
The surface of the step portion 22 is preferably a rubbing surface.

【0023】更に、真空室11を形成する環状壁12の
下面と、内部搬送装置4のホルダ−41の上面との弾性
体6bが設けられた近傍の接触面間には、反発機構7、
7を設置する。この反発機構7は図2および図3に示す
ように、環状壁12側に設けられ、一端側に窓72を有
する中空状の容器71内に球状体73とコイル状に巻回
したスプリング74とを収容したものからなる。そし
て、球状体73は常時スプリング74で押圧され、無負
荷時には、球状体73の半分近くが窓72から突出し、
環状壁12とホルダ−41とが接近してくると球状体7
3がホルダ−41の上面側を弾性押圧する状態となる。
なお、この球状体73の押圧は、スプリング74の外に
ばね等のような弾性力のあるものならば使用できる。
Further, between the lower surface of the annular wall 12 forming the vacuum chamber 11 and the upper surface of the holder 41 of the internal transfer device 4, there is a repulsion mechanism 7, between the contact surface near the elastic body 6b.
7 is installed. As shown in FIGS. 2 and 3, the repulsion mechanism 7 includes a spherical body 73 and a spring 74 wound in a coil shape in a hollow container 71 provided on the annular wall 12 side and having a window 72 on one end side. Consisting of Then, the spherical body 73 is constantly pressed by the spring 74, and when no load is applied, nearly half of the spherical body 73 protrudes from the window 72,
When the annular wall 12 and the holder 41 come close to each other, the spherical body 7
3 ing a state in which elastic pressing the upper surface of the holder -41.
Note that the pressing of the spherical body 73 can be used as long as it has an elastic force such as a spring outside the spring 74.

【0024】このようなCD用連続スパッタリング装置
Sは、減圧装置に接続され、真空槽1を構成する中空状
体や蓋状体の接触面間に介在させた弾性体6a、6b、
6cにより必要な真空度が確保される。そして、スパッ
タリング装置SへのCD用基板5のローディングやアン
ローディング時等の、真空室11の開放時に、例えば図
1においてCD用基板5が爪機構又は真空チャックで保
持後、プッシャ−21が下がれば今までホルダ−41に
よりスプリング74に抗して容器71内側に押圧されて
いた球状体73が、スプリング74が伸びることにより
窓72側へと押圧され、この押圧力がホルダ−41に加
わる。そして、例えば粘着力が増した弾性体6bであっ
ても、ホルダ−41が反発機構7、7の球状体73、7
3により押圧され、弾性体6bから簡単に離れるように
なる。
Such a continuous sputtering apparatus for CDs
S is a hollow member connected to the decompression device and forming the vacuum chamber 1.
Elastic bodies 6a and 6b interposed between the contact surfaces of the body and the lid,
The necessary degree of vacuum is secured by 6c. And
Loading and unloading of the CD substrate 5 into the taring device S
When the vacuum chamber 11 is opened, such as during loading,
In step 1, the CD substrate 5 is held by a nail mechanism or a vacuum chuck.
After holding, if pusher-21 goes down,
Is pressed further inside the container 71 against the spring 74
When the spring 74 extends, the spherical body 73
The pressing force is applied to the window 72, and the pressing force is applied to the holder 41.
Wrong. Then, for example, the elastic body 6b having increased adhesive strength is used.
However, the holder 41 has the spherical bodies 73, 7 of the repulsion mechanisms 7, 7.
3 so that it is easily separated from the elastic body 6b.
Become.

【0025】なお、この反発機構7、7の設置箇所は弾
性体6a、6b、6cになるべく近いのが望ましく、離
れるにしたがって反発する効果が薄らぐ。
The location of the repulsion mechanisms 7, 7 is
It is desirable to be as close as possible to the sex bodies 6a, 6b, 6c.
The effect of repulsion diminishes as it is received.

【0026】上記の反発機構7、7を設けたCD用連続
スバッタリング装置では、ホルダ−41が内部搬送装
により穿孔部31に対応する位置に搬送された後、
23によりプッシャ−21上方へ移動させることに
より、ホルダ−41を真空室1の一面を形成するため
の環状壁12と、プッシャ−21に形成される環状の段
22の上面間に挟み付けることにより大気と真空の隔
離が完了する。
In the continuous CD sputtering apparatus S provided with the repulsion mechanisms 7, 7 , after the holder 41 is transported by the internal transport device 4 to a position corresponding to the perforated portion 31 ,
By moving the 21 upward, the holder - - pusher by a shaft 23 41 and annular wall 12 to form one surface of the vacuum chamber 1 1, the pusher - 21 between the upper surface of the annular step portion 22 formed on The isolation between the atmosphere and the vacuum is completed by pinching.

【0027】この際図示するようにプッシャ−21
環状の段部22上面および真空室1の一面を形成する
ための環状壁12の下面すなわち反発機構7、7に
い位置にOリングから成る弾性体6b記のように配
置してあるので両者は密接した形となり、真空室1
真空度を所定の値に維持させることができる
[0027] At this time, the pusher as shown - the lower surface of the annular wall 12 to form a 21 annular step 22 the upper surface and one side of the vacuum chamber 1 1, i.e. close to the repulsive mechanism 7, 7 <br /> since the elastic body 6b made of O-ring to have positions are arranged as above Symbol both become close form, it is possible to maintain the degree of vacuum in the vacuum chamber 1 1 to a predetermined value.

【0028】そして、ホルダ−41上に爪機構又は真空
チャックにより工作物であるCD用基板5がローディン
グされ、環状壁12により形成された窓部13は仕切り
弁3により覆われる。つぎに、プッシャ−21軸23
が下方に移動すると、反発機構7、7の働きによりCD
用基板5が載ったホルダ−41が下方に押し下げられ内
部搬送装置4に戻る。この後、内部搬送装置4が回転し
成膜室14に搬送されアルミニウムのスパッタリング
が行われる。
Then, a claw mechanism or a vacuum is placed on the holder 41.
The CD substrate 5 as a workpiece is loaded by the chuck.
Window 13 formed by the annular wall 12 is partitioned
Covered by valve 3. Next, the shaft 23 of the pusher 21
Is moved downward, the repulsion mechanism 7,
Holder -41 the use substrate 5 resting returns to the inner transfer unit 4 is lowered pushed downward. Thereafter, the internal transfer device 4 rotates.
Sputtering is conveyed aluminum Te in the film deposition chamber 14
Is Ru is carried out.

【0029】上記のような反発機構7、7の動作で、C
D用基板5が載ったホルダ−41に対して下向きの力が
働いて落下の不安定性を抑制することができ、ホルダ−
41を確実に押し下げる2段の働きがる。
With the operation of the repulsion mechanisms 7, 7 as described above , C
A downward force acts on the holder 41 on which the substrate for D 5 is placed, so that the instability of the drop can be suppressed.
Work of the two-stage pushing down the 41 to ensure that Ru Oh.

【0030】このようなCD用基板の連続スパッタリン
グ装置は、減圧装置に接続され、要所に弾性体6a、6
b、6cを設置して必要な真空度が確保される外に本発
明に係る反発機構7、7を配設することにより、真空室
11を構成する中空状体や蓋状体等の部材で開放や閉塞
等接離する部材の粘着を押圧して強制的に排除し離脱さ
せることができる。
Such a continuous sputtering apparatus for a CD substrate is connected to a decompression device, and elastic members 6a, 6
By providing the repulsion mechanisms 7 and 7 according to the present invention in addition to providing the required degree of vacuum by installing b and 6c, members such as a hollow body and a lid-like body constituting the vacuum chamber 11 can be provided. It is possible to forcibly remove and separate the members that are in contact with and separated from each other, such as opening and closing, by pressing the adhesive.

【0031】尚、弾性体6bおよび反発機構7の設置場
所は、図1では環状壁12の下面に設けてあるのが例示
されているが、これらはホルダー41側に設けてあって
もあるいは一方に弾性体6bを他方に反発機構7を設け
ても、その効果は上記したと同様である。
The place where the elastic body 6b and the repulsion mechanism 7 are installed
The place is illustrated on the lower surface of the annular wall 12 in FIG.
These are provided on the holder 41 side
Elastic body 6b on one side and repulsion mechanism 7 on the other
However, the effect is the same as described above.

【0032】又、反発機構は、実施例に記載したCD
基板の連続スパッタリング装置だけでなく、いわゆる
ベルジャーや、例えば大気により一定の圧力雰囲気を持
った特定領域を一対の中空物体により構成する場合にも
適用でき、いずれの場合にも一対の中空物体の境界面に
設置するOリングから成る弾性体に近い場所に反発機構
ければい。この場合、記のように両者の境界面
を摺り合せ面とする方が定の圧力雰囲気を形成するの
に好適である。
Further , the repulsion mechanism 7 is provided with the CD described in the embodiment.
It can be applied not only to a continuous sputtering apparatus for a substrate, but also to a so-called bell jar, for example, when a specific region having a certain pressure atmosphere by the atmosphere is constituted by a pair of hollow objects, and in any case, a pair of hollow objects. a location near the elastic body consisting of O-ring to be installed at the interface have good if Kere set repulsion mechanism. In this case, it is suitable for the mutual sliding mating surfaces of both of the boundary surfaces as above SL forms a pressure atmosphere of Jo Tokoro.

【0033】[0033]

【発明の効果】本発明に係るシール機構は、Oりング等
のゴムシール部材の経時変化に伴う粘着防止を、簡単な
反発機構の設置により強制的に防ぎ、これによりCD用
基板等の工作物が落下する事故を防いで搬送の信頼性を
向上できる。
The seal mechanism according to the present invention forcibly prevents the sticking of the rubber seal member such as an O-ring due to a change with time by installing a simple repulsion mechanism .
Workpiece, such as a substrate is Ru can improve the reliability of the conveying prevent accidents falling.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係るシール機構を設置した連続スバッ
タリング装置の部の断面図である。
1 is a cross-sectional view of a main part of the continuous scan grasshopper ring device and the sealing mechanism is installed in accordance with the present invention.

【図2】本発明に係るシール機構の要部を構成する反発
機構の断面図である。
FIG. 2 is a cross-sectional view of a repulsion mechanism constituting a main part of the seal mechanism according to the present invention.

【図3】図2に示す反発機構の斜視図である。FIG. 3 is a perspective view of a repulsion mechanism shown in FIG. 2;

【図4】連続スパッタリング装置の一部を断面して示す
説明図である。
FIG. 4 shows a cross section of a part of a continuous sputtering apparatus.
It is an explanatory diagram.

【図5】図4の要部を示す断面図である。FIG. 5 is a sectional view showing a main part of FIG . 4 ;

【符号の説明】1:真空槽:真空室 12:環状壁21 :プッシヤー22 :段部 :仕切り弁 :内部搬送装置41 :ホルダー :工作物(CD用基板) 6a、6b、6c :弾性体(シール部材) :反発機構73 :球状体[Description of Signs] 1: Vacuum chamber 1 1 : Vacuum chamber 12: Annular wall 21 : Pusher 22 : Stepped part 3 : Gate valve 4 : Internal transfer device 41 : Holder 5 : Workpiece (substrate for CD) 6a, 6b, 6c : elastic body (seal member) 7 : repulsion mechanism 73 : spherical body

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭63−47591(JP,A) 実開 昭61−188072(JP,U) (58)調査した分野(Int.Cl.6,DB名) C23C 14/00 - 14/58──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-63-47591 (JP, A) JP-A-61-188072 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) C23C 14/00-14/58

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 中空状体および蓋状体からなる部材の接
触面間に、弾性体からなるシール部材を介して真空槽を
形成したものにおいて、上記シール部材に近接した接触
面間に押圧により両部材を離す反発機構を設たことを
特徴とするシール機構。
Between 1. A contact surface of a hollow-shaped body and the lid-like member, in which the formation of the vacuum chamber via a sealing member made of an elastic body, the pressing between the contact surfaces in proximity to the seal member sealing mechanism, characterized in that the repulsion mechanism separating the two members digits set.
【請求項2】 前記反発機構は、一端側が中空状体また
は蓋状体からなる一方の部材の接触面に埋設され、他端
側が中空状体または蓋状体からなる他方の部材の接触面
にシール部材の粘着力よりも大きい反発力を持つて当接
していることを特徴とする請求項1に記載のシール機
構。
2. The repulsion mechanism has one end embedded in a contact surface of one member formed of a hollow body or a lid, and the other end formed in a contact surface of another member formed of a hollow body or a lid. 2. The sealing mechanism according to claim 1, wherein the sealing member has a repulsive force greater than the adhesive force of the sealing member and is in contact with the sealing member.
【請求項3】 前記反発機構は、一端側に窓を有する中
空状の容器内に球状体とスプリングとを収容したものか
らなり、容器を中空状体または蓋状体からなる一方の部
材の接触面に埋設しているとともにスプリングに押圧さ
れ窓部から突出している球状体を中空状体または蓋状体
からなる他方の部材の接触面に当接していることを特徴
とする請求項1または請求項2に記載のシール機構。
3. The repulsion mechanism comprises a hollow container having a window on one end side and a spherical body and a spring housed in a hollow container, and the container comes into contact with one of a hollow member and a lid member. The spherical body buried in the surface and pressed by a spring and projecting from the window portion is in contact with the contact surface of the other member made of a hollow body or a lid-like body. Item 3. The sealing mechanism according to Item 2.
JP7011318A 1995-01-27 1995-01-27 Seal mechanism Expired - Fee Related JP2785925B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7011318A JP2785925B2 (en) 1995-01-27 1995-01-27 Seal mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7011318A JP2785925B2 (en) 1995-01-27 1995-01-27 Seal mechanism

Publications (2)

Publication Number Publication Date
JPH08199335A JPH08199335A (en) 1996-08-06
JP2785925B2 true JP2785925B2 (en) 1998-08-13

Family

ID=11774681

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7011318A Expired - Fee Related JP2785925B2 (en) 1995-01-27 1995-01-27 Seal mechanism

Country Status (1)

Country Link
JP (1) JP2785925B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347591A (en) * 1986-08-13 1988-02-29 株式会社日立製作所 Flange for ultra-high vacuum

Also Published As

Publication number Publication date
JPH08199335A (en) 1996-08-06

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