JP2908995B2 - Mechanical chuck type loading device and vacuum device - Google Patents

Mechanical chuck type loading device and vacuum device

Info

Publication number
JP2908995B2
JP2908995B2 JP7011319A JP1131995A JP2908995B2 JP 2908995 B2 JP2908995 B2 JP 2908995B2 JP 7011319 A JP7011319 A JP 7011319A JP 1131995 A JP1131995 A JP 1131995A JP 2908995 B2 JP2908995 B2 JP 2908995B2
Authority
JP
Japan
Prior art keywords
vacuum
pressing member
vacuum chamber
locking claw
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7011319A
Other languages
Japanese (ja)
Other versions
JPH08199336A (en
Inventor
治朗 池田
洋次 瀧澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHIBAURA MEKATORONIKUSU KK
SONII DEISUKU TEKUNOROJII KK
Original Assignee
SHIBAURA MEKATORONIKUSU KK
SONII DEISUKU TEKUNOROJII KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHIBAURA MEKATORONIKUSU KK, SONII DEISUKU TEKUNOROJII KK filed Critical SHIBAURA MEKATORONIKUSU KK
Priority to JP7011319A priority Critical patent/JP2908995B2/en
Publication of JPH08199336A publication Critical patent/JPH08199336A/en
Application granted granted Critical
Publication of JP2908995B2 publication Critical patent/JP2908995B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manipulator (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はスパッタリング装置等の
被膜形成装置に用いる工作物のローディング装置びこ
ローディング装置を設けた真空装置に関する。
The present invention relates to a vacuum apparatus provided with a loading device beauty the loading device of the workpiece for use in film-forming apparatus such as sputtering apparatus.

【0002】[0002]

【従来の技術】最近デジタル化された音声信号や画像情
報を大量に記録するのに、広く使用されているコンパク
トディスク(以下CDと記載する)は、ポリカーボネイ
ト等の透明な合成樹脂製基板の表面に、例えばスパッタ
リング法等により光反射率の高いアルミニウム薄膜を形
成して完成する。この基板には、「1」と「0」とから
なるデジタル情報に合わせて、ビットと称する小さな孔
を開け、これを照射するレーザ孔の反射波の有無によっ
てこの小さな孔の有無を検出して、記録情報が読み出さ
れる。
2. Description of the Related Art A compact disk (hereinafter referred to as a CD), which is widely used for recording a large amount of recently digitized audio signals and image information, is provided on a surface of a transparent synthetic resin substrate such as polycarbonate. Then, an aluminum thin film having high light reflectance is formed by, for example, a sputtering method or the like to complete the process. A small hole called a bit is formed on this substrate in accordance with digital information consisting of "1" and "0", and the presence or absence of this small hole is detected by the presence or absence of a reflected wave of a laser hole for irradiating the bit. Then, the record information is read.

【0003】この透明なCD基板には、中央部に孔が
形成されており、これから一定の距離だけ離れた位置ま
での基板上にアルミニウム薄膜が形成されている。
[0003] The transparent CD substrate are holes in the central portion is formed, and an aluminum thin film is formed on a substrate to a position at a distance therefrom a fixed distance.

【0004】このCD用基板の表面に例えばアルミニウ
ム薄膜を連続スパッタリング法により形成するスパッタ
リング装置においては、CD用基板を装置にローディン
びアンローディングする必要があり、その作業に際
しては、CD用基板の露出された表面をバキュームチャ
ックにより吸引して受け渡す方式が採られている。
[0004] In the sputtering apparatus for forming a continuous sputtering for example, aluminum thin film on the surface of the CD substrate, it is necessary to load beauty unloading CD substrate in the apparatus, during its operation, the CD substrate A method is employed in which the exposed surface is suctioned and transferred by a vacuum chuck.

【0005】例えばこの連続スパッタリング装置を図9
び図10に示す概略の断面図を参照して説明する。
For example, this continuous sputtering apparatus is shown in FIG.
Referring to cross-sectional view schematically showing the beauty Figure 10 will be described.

【0006】図中8はスパッタリング装置で、スパッタ
ーを行なう真空室81内にはX1方向に反転反復すると
共にY1方向に上下動する駆動軸82、この軸82に軸
支されたCD用基板Dを載置する内部搬送ヘッド83が
設けられている。又、84は成膜室、85,86は開口
部である。
In the drawing, reference numeral 8 denotes a sputtering apparatus. A driving shaft 82 which repeats reversal in the X1 direction and moves up and down in the Y1 direction, and a CD substrate D supported by the shaft 82 are placed in a vacuum chamber 81 for performing sputtering. An internal transport head 83 for mounting is provided. Reference numeral 84 denotes a film forming chamber, and reference numerals 85 and 86 denote openings.

【0007】又、9はバキュームチャックを備えたロー
ディング装置で、X2方向に反転反復すると共にY2方
向に上下動する駆動軸91とこの軸91に軸支されたヘ
ッド部92,92を備えている。このヘッド部92,9
2は減圧装置及び加圧ラインに接続されていると共にそ
の下面側にはCD用基板Dを吸引するゴムパッド93,
93が設けられている。
Reference numeral 9 denotes a loading device provided with a vacuum chuck. The loading device 9 includes a drive shaft 91 that repeats reversal in the X2 direction and moves up and down in the Y2 direction, and head portions 92, 92 supported by the shaft 91. . The heads 92, 9
Reference numeral 2 denotes a rubber pad 93 which is connected to a pressure reducing device and a pressure line, and has a lower surface side for sucking a CD substrate D;
93 are provided.

【0008】又、7は同じくバキュームチャックを備え
下方側のローディング装置で、Z1方向に反転反復す
る駆動軸71と、この軸71に軸支されたヘッド部72
を備え、このヘッド部72は減圧装置及び加圧ラインに
接続されていると共にそのCD用基板Dを吸引するゴム
パッド73,73が設けられている。
Reference numeral 7 denotes a lower-side loading device also provided with a vacuum chuck, and a drive shaft 71 which is repeatedly inverted in the Z1 direction, and a head 72 supported by the shaft 71.
The head portion 72 is connected to a pressure reducing device and a pressure line, and is provided with rubber pads 73, 73 for sucking the CD substrate D.

【0009】又、99はベルトコンベヤー等の外部搬送
装置で、スパッター前のCD用基板Dを搬送してくる。
Reference numeral 99 denotes an external transfer device such as a belt conveyor for transferring the CD substrate D before sputtering.

【0010】このような構成において、ローディング装
置9が下方向Y2へと降下して外部搬送装置99により
順次送られてくるCD用基板Dを、減圧装置に接続して
いるヘッド部92のゴムパッド93,93で吸引して支
持する。そして、ローディング装置9が上方向Y2へ上
昇すると共に駆動軸91を中心としてX2方向へ180
度回転し、つぎに下降する。この下降したヘッド部92
の下にはローディング装置7のヘッド部72のゴムパッ
ド73,73が位置していて、ヘッド部92側の減圧を
解くと共にヘッド部72側を減圧装置に接続することに
より、CD用基板Dはヘッド部72のゴムパッド73,
73に吸引支持して送される。
In such a configuration, the loading device 9 descends in the downward direction Y2, and the CD substrate D sequentially sent by the external transport device 99 is transferred to the rubber pad 93 of the head portion 92 connected to the decompression device. , 93 for suction. Then, the loading device 9 moves upward in the upward direction Y2, and moves 180 degrees around the drive shaft 91 in the X2 direction.
And then descend. This lowered head portion 92
Rubber pads 73, 73 of the head unit 72 of the loading device 7 are located below. The CD substrate D is released by releasing the decompression on the head unit 92 side and connecting the head unit 72 side to the decompression device. Rubber pad 73 of part 72,
It is sent transportable by suction support 73.

【0011】そして、駆動軸71をZ1方向に半回転さ
せると共に下方に降下させると、この回転によりヘッド
部72も半回転し、CD用基板Dがヘッド部72の下側
に支持された状態となる。このヘッド部72がさらに下
降し、ヘッド部72の下面が真空室81に形成した開口
部85の周縁部を覆うと、真空室81内が気密閉塞され
た状態となる。この開口部85を閉塞した後、通路74
びゴムパッド73,73を含むヘッド部72内には加
圧ラインから送気されて減圧が解かれ、ゴムパッド7
3,73に支持されていたCD用基板Dを内部搬送ヘッ
ド83上に載置ローディングする。
When the drive shaft 71 is rotated half a turn in the Z1 direction and lowered downward, the rotation also causes the head 72 to rotate half a turn, and the CD substrate D is supported below the head 72. Become. When the head portion 72 further descends and the lower surface of the head portion 72 covers the periphery of the opening 85 formed in the vacuum chamber 81, the inside of the vacuum chamber 81 is airtightly closed. After closing the opening 85, the passage 74 is closed.
The in the head portion 72 including beauty rubber pads 73, 73 is released the vacuum is air from a pressurized line, the rubber pad 7
The substrate D for CD supported by 3, 73 is placed and loaded on the internal transport head 83.

【0012】この後、スパッタリング装置8の駆動軸8
2をX1方向に回転すると共にY1方向に上昇させ、内
部搬送ヘッド83を移動して上記CD用基板Dの上面側
を成膜室84側の開口部86側に対面させる。そして、
上記成膜室84内及び真空室81内を減圧して、所定の
真空度に達したら成膜室84内においてスパッタリング
を行い成膜室84側に面した基板D面側にアルミニウム
被膜を形成する。
After that, the driving shaft 8 of the sputtering device 8
2 is rotated in the X1 direction and raised in the Y1 direction, and the internal transport head 83 is moved so that the upper surface side of the CD substrate D faces the opening 86 side of the film forming chamber 84 side. And
The inside of the film forming chamber 84 and the inside of the vacuum chamber 81 are depressurized, and when a predetermined degree of vacuum is reached, sputtering is performed in the film forming chamber 84 to form an aluminum film on the substrate D side facing the film forming chamber 84 side. .

【0013】スパッタリングが終了したら、軸82をY
1方向に降下させると共にX1方向に反転し、再度軸8
2をY1方向に上昇させる。この軸82の動作に連動し
て内部搬送ヘッド83が移動して開口部85にCD用基
板Dが面したらローディング装置7のヘッド部72を減
圧して、ゴムパッド73,73により上記CD用基板D
を吸引支持させる。
When the sputtering is completed, the shaft 82 is moved to Y
It is lowered in one direction and reversed in the X1 direction.
2 is raised in the Y1 direction. When the internal transport head 83 moves in conjunction with the operation of the shaft 82 and the CD substrate D faces the opening 85, the head 72 of the loading device 7 is depressurized, and the CD substrate D is
Is supported by suction.

【0014】つぎに、ヘッド部72を上昇させCD用基
板Dの真空室81内の内部搬送ヘッド83からのアンロ
ーディングが行われると共に駆動軸71をZ1方向に半
回転させてゴムパッド73,73上にCD用基板Dが位
置するようにする。そして、ゴムパッド73,73の減
圧を解除し、図示しない他の送装置でもってCD用基
板Dを支持させ、次工程にCD用基板Dを搬送する。
Next, the head portion 72 is lifted to unload the CD substrate D from the internal transfer head 83 in the vacuum chamber 81, and the drive shaft 71 is rotated half a turn in the Z1 direction so that the CD pads D are placed on the rubber pads 73, 73. The CD substrate D is located at the right position. Then, to release the vacuum in the rubber pad 73, to support the substrate D for CD with by another conveyance device (not shown), transports the CD substrate D in the next step.

【0015】なお、上記ローディング装置9及び7のバ
キュームチャックを構成するヘッド部72や92は図1
0に示すような構成で、CD用基板Dの吸着及び離脱を
行わせている。このヘッド部72(92)は、内部に通
路74(94)が形成され、この通路74(94)はゴ
ムパッド73、73(93、93)に接続していると共
に、バルブ75(95)、76(96)を介して減圧装
置(図ではバキュームポンプと記載)並びに加圧ライン
と接続している。
The heads 72 and 92 constituting the vacuum chucks of the loading devices 9 and 7 are shown in FIG.
In the configuration shown in FIG. 5, the CD substrate D is adsorbed and desorbed. The head portion 72 (92) has a passage 74 (94) formed therein. The passage 74 (94) is connected to the rubber pads 73, 73 (93, 93), and the valves 75 (95), 76. It is connected to a decompression device (shown as a vacuum pump in the figure) and a pressurization line via (96).

【0016】又、上記の工程は連続して順次繰り返し行
われる。
The above steps are continuously and repeatedly performed.

【0017】[0017]

【発明が解決しようとする課題】このようなバキューム
チヤックを備えたローディング装置を使用してCD用基
板等の工作物をローディングやアンローディング等の
送をすると、以下の難点が生じる。
When a workpiece such as a substrate for a CD is transported by loading or unloading using a loading device having such a vacuum chuck, the following disadvantages arise. Occurs.

【0018】CD用基板等の工作物をバキュームチャッ
クを構成するヘッドから脱離させる際、通路74やゴム
パッド73内にある加圧ライン側からの加圧気体が連続
スパッタリングを行う肝心の真空室及び成膜室内に入り
込んで真空度を一時的に悪化させるし、不純物が混入す
る頻度が高くなるとともに、成膜に悪影響を与える。こ
のような欠点を防止するために、工作物を脱離させた後
に、一定の真空度に到達するまで待ち時間を設定する方
法が採られている。このため作業時間が長くなる等生産
性の低下、大気の導入に伴う成膜室内の汚染並びに不確
実な動作、更に、合成樹脂からなる基板等に対するゴム
パッドの粘着等の難点が生じる。これに加えて、ゴムパ
ッドによる汚れは、スパッター膜や保護膜の外観を損う
という問題があった。
When a workpiece such as a CD substrate is detached from a head constituting a vacuum chuck, a pressurized gas from a pressurizing line in a passage 74 or a rubber pad 73 performs an essential vacuum chamber for performing continuous sputtering. it is temporarily deteriorated degree of vacuum enters the deposition chamber, to together the frequency with which impurities are mixed is high, adversely affect the film formation. In order to prevent such a defect, a method of setting a waiting time until a certain degree of vacuum is reached after the workpiece is detached has been adopted. For this reason, there are disadvantages such as a decrease in productivity such as an increase in work time, contamination in a film forming chamber due to introduction of air, uncertain operation, and adhesion of a rubber pad to a substrate made of a synthetic resin. In addition to this, there is a problem that dirt from the rubber pad impairs the appearance of the sputtered film and the protective film.

【0019】本発明はこのような事情に鑑み成されたも
ので、特に従来のバキュームチャックローディング装
置を用いる場合に比べより効率の向上を図った。
The present invention has been made in view of such circumstances, and has particularly improved efficiency as compared with the case where a conventional vacuum chuck type loading device is used.

【0020】[0020]

【課題を解決するための手段】本発明の請求項1に記載
のメカニカルチャック式ローディング装置は、上下動及
び回転する駆動軸に軸支されたヘッド及び仕切弁を有す
ローディング機構と;上記ヘッドの空洞部内に設けら
れた流体の出入により膨脹または収縮する弾性体と;こ
の弾性体内とは気密隔離して仕切弁内に設けられ、弾性
体の膨脹または収縮により動作する中央部に複数本の係
止用爪部材を有するメカニカルチャックと;を具備した
ことを特徴とする。
Means for Solving the Problems According to the first aspect of the present invention.
Mechanical chuck type loading device, vertical movement and a loading mechanism having a head and a gate valve which is rotatably supported by the drive shaft for rotation; elastic body expands or contracts by and out of the fluid provided in the hollow portion of the head And a mechanical chuck provided in the gate valve so as to be air-tightly separated from the elastic body and having a plurality of locking claw members at a central portion operated by expansion or contraction of the elastic body. And

【0021】また、本発明の請求項2に記載のメカニカ
ルチャック式ローディング装置は、メカニカルチャック
を構成する上記係止用爪部材は、屈曲してなり中間部に
おいて支持される部位を支点として回動することを特徴
とする。
Further, the mechanical mechanism according to claim 2 of the present invention.
The chuck type loading device is characterized in that the locking claw member constituting the mechanical chuck is bent and rotates around a portion supported at an intermediate portion as a fulcrum.

【0022】また、本発明の請求項3に記載の真空装置
は、減圧装置に接続されるとともに工作物出入用の開口
部を有する真空室と;この真空室の開口部に対向して設
けられ、真空室の開口部を気密に覆うとともに開口部内
に出入する工作物を支持送できる上記請求項1または
請求項2に記載のメカニカルチャック式ローディング
置と;を具備したことを特徴とする。
A vacuum device according to a third aspect of the present invention is connected to a decompression device and has a vacuum chamber having an opening for entering and exiting a workpiece; and is provided to face the opening of the vacuum chamber. , a mechanical chuck type loading instrumentation <br/> location according to the claim 1 or claim 2 workpiece can feed support transportable to and from the opening to cover the opening of the vacuum chamber airtight; that provided with the It is characterized by.

【0023】また、本発明の請求項4に記載の真空装置
は、前記メカニカルチャック式ローディング装置のロー
ディング機構空洞部内に設けられた流体の出入により
膨脹または収縮する弾性体と、前記仕切弁の内部に上記
弾性体の一部が臨む透孔が設けられたシールリングと、
このシールリングに押え部材を介し設けられた環状ケー
スと、シールリングと押え部材の間に設けられた加圧部
材と、この加圧部材に上端面が対面し、上記環状ケース
に当接支持されているとともに下端側をこのケースから
延出した複数本の係止用爪部材と、上記押え部材に設け
られ先端のボス部が上記係止用爪部材の内側面に当接し
ている押圧体とを具備したことを特徴とする。
Further, the vacuum apparatus according to claim 4 of the present invention, the low of the mechanical chuck type loading device
An elastic body that expands or contracts by the inflow and outflow of a fluid provided in the cavity of the loading mechanism , and a seal ring provided with a through-hole in which a part of the elastic body faces inside the gate valve.
An annular case provided on the seal ring with a pressing member interposed therebetween, a pressing member provided between the seal ring and the pressing member, and an upper end face facing the pressing member and abuttingly supported by the annular case. the lower end side together when it has a plurality of latching pawl member extending from the case, pressing the boss portion of the tip provided on the pressing member is in contact with the inner surface of the pawl member for the latch And a body.

【0024】さらに、本発明の請求項5に記載の真空装
置は、前記真空室がスパッタリング装置であり、前記工
作物が中央に孔部を有する合成樹脂製基板であることを
特徴とする。
Further, the vacuum apparatus according to claim 5 of the present invention is characterized in that the vacuum chamber is a sputtering apparatus, and the workpiece is a synthetic resin substrate having a hole in the center.

【0025】[0025]

【作用】このように、本発明に係るメカニカルチャック
式ローディング装置び真空装置の最大の特徴は、大気
と真空領域間に気密性を有するメカニカルチャックを設
置することにより真空領域内における真空度の低下を防
ぐとともにハンドリングを可能にした点にある。しかも
ローディング機構を付設することにより、係止用爪部材
で把持された工作物を別の製造装置に搬送できる。
As described above, the mechanical chuck according to the present invention
The biggest feature of the formula loading device beauty vacuum apparatus is that made it possible to handle while preventing a decrease in vacuum degree in the vacuum region by placing a mechanical chuck having airtightness between the atmosphere and the vacuum region. In addition, by providing the loading mechanism, the workpiece gripped by the locking claw member can be transported to another manufacturing apparatus.

【0026】工作物は例えば中央部に孔が形成された透
明な合成樹脂から成るCD用基板であり益々径が小さく
なる傾向にあるが、孔部を把持すれば搬送作業が容易に
行なえる。
The work is, for example, a CD substrate made of a transparent synthetic resin having a hole formed in the center, and the diameter of the work tends to become smaller and smaller. However, if the hole is gripped, the work can be easily carried out.

【0027】本発明に係るメカニカルチャックでは、加
圧した流体により膨脹収縮が可能な部材に対応して移動
できる押え部材を設け、これに連動する係止用爪部材を
配置することにより中央部分に孔のある工作物を把持す
ることができる。この工作物が利用される成膜装置で
は、圧力変動が無く、工程の処理時間の短縮が可能にな
る。
In the mechanical chuck according to the present invention, a pressing member which can move correspondingly to a member which can be expanded and contracted by a pressurized fluid is provided, and a locking claw member interlocked with the pressing member is provided, so that a central portion is provided. Workpieces with holes can be gripped. In a film forming apparatus using this workpiece, there is no pressure fluctuation, and the processing time of the process can be reduced.

【0028】[0028]

【実施例】本発明は、図9中及び図10で示すバキュー
ムチャックを備えたローディング装置部分を改善したも
ので、図10のCD用基板にアルミニム薄膜を連続して
形成するスパッタリング装置に適用した実施例を図1乃
至図8を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention is an improvement of a loading device provided with a vacuum chuck shown in FIGS. 9 and 10, and is applied to a sputtering device for continuously forming an aluminum thin film on a CD substrate shown in FIG. An embodiment will be described with reference to FIGS.

【0029】図1は本発明に係るメカニカルチャック
ローディング装置の要部を示す断面図、図2はメカニカ
ルチャック部を主体とした拡大断面図、図3は部品(環
状ケース)を下方からみた斜視図、図4は部品(環状ケ
ースと係止用爪部材)の下面図、図5(a)、(b)は
係止用爪部材の動作を示す説明図、図6及び図7はメカ
ニカルチャックの動作を示す断面図、図8は係止用爪部
材及びその開閉手段の他の構成を示す説明図である。
FIG. 1 is a sectional view showing a main part of a mechanical chuck type loading device according to the present invention, FIG. 2 is an enlarged sectional view mainly showing a mechanical chuck part, and FIG. 3 is a part (annular case). FIG. 4 is a perspective view seen from below, FIG. 4 is a bottom view of components (annular case and locking claw member), and FIGS. 5A and 5B are explanatory views showing the operation of the locking claw member; FIG. 7 is a sectional view showing the operation of the mechanical chuck, and FIG. 8 is an explanatory view showing another configuration of the locking claw member and its opening / closing means.

【0030】図1において1、上下動及び回転する
駆動軸1Bに軸支されたヘッド1Aと仕切弁2からなる
ローディング機構で、このヘッド1A下方に仕切弁2
びメカニカルチャック5を備え、これらは一体化されて
本発明のメカニカルチャック式ローディング装置1を構
成している。又、このメカニカルチャック式ローディン
装置1は、真空室81上方の開放された開口部85を
上記仕切弁2が例えばゴム製のOリング25を介して覆
い気密を確保する。又、真空室81の内部には内部搬送
ヘッド83及び成膜室(図示しない。)が設けられてい
る。又、内部搬送ヘッド83の下方には工作物ここでは
中央に孔D1を有する合成樹脂製のCD用基板Dを支承
しかつ上下に動けるプッシャー(Pusher)89が
配置してある。
[0030] 1 0 in Figure 1, moves vertically and rotates
Consists of a head 1A supported on a drive shaft 1B and a gate valve 2.
In the loading mechanism includes a gate valve 2 <br/> beauty mechanical chuck 5 to the head 1A below, these constitute a mechanical chuck type loading device 1 of the present invention are integrated. Also, this mechanical chuck type loading
In the locking device 1, the gate valve 2 covers the opening 85 opened above the vacuum chamber 81 via, for example, an O-ring 25 made of rubber to ensure airtightness. Further, inside the vacuum chamber 81, an internal transfer head 83 and a film forming chamber (not shown) are provided. In addition, a pusher (Pusher) 89 that supports a synthetic resin CD substrate D having a hole D1 at the center thereof and that can move up and down is arranged below the internal transport head 83.

【0031】後で詳述する係止用爪部材4,…を備えた
メカニカルチャック5に把持されたCD用基板Dは、
カニカルチャック式ローディング装置1により上方に移
動されてから、駆動軸1Bの回転により図示しない他の
装置に搬送される。
The CD substrate D held by the mechanical chuck 5 with detail locking pawl member 4, ... the later, main
After being moved upward by the cannical chuck loading device 1, it is conveyed to another device (not shown) by the rotation of the drive shaft 1B.

【0032】更に、真空室81内に設けられた内部搬送
ヘッド83のホルダー上にCD用基板Dを載せ、これを
プッシャー89により押上げ係止用爪部材4,…に接触
かつ把持させた後、前記のように他の装置に搬送され
る。
Further, the CD substrate D is placed on the holder of the internal transfer head 83 provided in the vacuum chamber 81, and the CD substrate D is brought into contact with the pushing claw members 4,. , As described above.

【0033】さらに、図1を拡大した図2により細部を
説明する。
Further details will be described with reference to FIG. 2 which is an enlargement of FIG.

【0034】上記メカニカルチャック5は、メカニカル
チャック式ローディング装置1のヘッド1Aの主として
仕切弁2の中央の穴21内に設けられ、後述する加圧さ
れる弾性体3F、シールリング3A、加圧部材3E、押
え部材3B、環状ケース3C、押圧体3Dび工作物を
直接把持する係止用爪部材4,…から構成されている。
The mechanical chuck 5 is a mechanical chuck.
An elastic body 3F, a seal ring 3A, a pressing member 3E, a pressing member 3B, a pressing member 3B, an annular case 3C, which is provided mainly in the center hole 21 of the gate valve 2 of the head 1A of the chuck-type loading device 1 and will be described later. locking pawl member 4 for gripping the pressing body 3D beauty workpiece directly, and a ....

【0035】そして、メカニカルチャック式ローディン
装置1のメカニカルチャック5内には、ソレノイドバ
ルブ(図示しない。)により開閉制御して供給される加
圧流体が加圧ラインと接続した通路11を介して導入さ
れる。これはメカニカルチャック式ローディング装置1
内の空洞部12に上記通路11の先端と直結した例えば
ゴム等の部材からなる弾性体3Fが収容されていて、こ
の通路11を介する加圧流体により弾性体3Fは膨脹し
たり収縮するようになっている。
And, mechanical chuck type loading
In the mechanical chuck 5 of grayed device 1, the solenoid valve (not shown.) Pressurized fluid supplied closing control to is introduced through a passage 11 connected with the pressure line by. This is a mechanical chuck type loading device 1
An elastic body 3F made of a member such as rubber, which is directly connected to the tip of the passage 11, is housed in the hollow portion 12 inside the elastic body 3F. The elastic body 3F is expanded or contracted by the pressurized fluid passing through the passage 11. Has become.

【0036】、この空洞部12の下方には真中に孔3
1があるシールリング3Aが設けられていて、この孔3
1内に弾性体の一部が臨んでいる。そして、弾性体3F
が膨脹した時はシールリング3Aの孔31に大きく飛出
す。また、このシールリング3Aの下には後述する押え
部材3Bと環状ケース3Cが設けられている。
In addition , a hole 3 is provided in the middle below the hollow portion 12.
1 is provided with a seal ring 3A,
A part of the elastic body faces inside 1. And elastic body 3F
When it expands, it largely jumps out into the hole 31 of the seal ring 3A. In addition, a pressing member 3B and an annular case 3C, which will be described later, are provided below the seal ring 3A.

【0037】又、シールリング3Aと仕切弁2との間及
びシールリング3Aと空洞部12との間にはゴム製のO
リング26,27が介在され、それぞれの間を気密状態
にしている。尚、上記弾性体3F内と通路11とは連通
しているが、これらと上記仕切弁2内や真空室81内と
は気密隔離されている。
A rubber O is provided between the seal ring 3A and the gate valve 2 and between the seal ring 3A and the cavity 12.
Rings 26 and 27 are interposed, and the space between them is airtight. Although the inside of the elastic body 3F and the passage 11 communicate with each other, they are airtightly isolated from the inside of the gate valve 2 and the inside of the vacuum chamber 81.

【0038】又、シールリング3Aの孔31内には、膨
脹したり収縮する弾性体3Fとある距離をおいて加圧部
材3Eが配置され、その中央部分には、突出部34が設
けられていて、上記弾性体3Fが膨脹したときこの突出
部34が押圧される状態にある。
A pressure member 3E is disposed in the hole 31 of the seal ring 3A at a certain distance from the elastic body 3F that expands and contracts, and a protruding portion 34 is provided at the center thereof. Thus, when the elastic body 3F expands, the protruding portion 34 is pressed.

【0039】又、上記環状ケース3Cは図3及び図4に
示すように、押え部材3Bと当接する縁部35有する
2段径の筒状をなすと共に小径側の周壁38は等間隔で
3ケ所の切欠部36,…と切欠部36,…から内方に向
かう突出片37,…が形成されていて、各切欠部36,
…及び突出片37,…に、ここでは120度の間隔を隔
てて3個の係止用爪部材4,…が介装されている。
As shown in FIGS. 3 and 4, the annular case 3C has a two-stage diameter cylindrical shape having an edge 35 which comes into contact with the pressing member 3B, and the small-diameter side peripheral wall 38 is formed at equal intervals. Are formed at each of the notches 36,... And projecting pieces 37,.
, And the protruding pieces 37, are interposed here with three locking claw members 4, spaced at 120 degrees.

【0040】又、この係止用爪部材4,…は、図5
(a)、(b)に示すように2つの水平部分41,42
に連続した2つの直立部分43,44の屈曲した階段状
をなし、上方の直立部分43が押え部材3Bの切欠部3
0を通って上端面が加圧部材3Eの下面と当接するよう
になっている。又、上方の水平部分41と下方の直立部
分44との内角付近が上記環状ケース3Cの突出片37
の頂部と当接している。そして、係止用爪部材4は、こ
の突出片37の頂部との当接部位を支点47として支持
されている。
The locking claw members 4,...
As shown in (a) and (b), two horizontal portions 41 and 42
The two upright portions 43 and 44 which are continuous with each other have a bent stepped shape, and the upper upright portion 43 is formed by the notch 3 of the pressing member 3B.
0, the upper end surface contacts the lower surface of the pressing member 3E. Further, the vicinity of the inner angle between the upper horizontal portion 41 and the lower upright portion 44 is defined by the projecting piece 37 of the annular case 3C.
Is in contact with the top of Further, the locking claw member 4 is supported with a contact portion with the top of the protruding piece 37 as a fulcrum 47.

【0041】又、図5(a)び(b)は、上記環状ケ
ース3Cと係止用爪部材4との当接状態を断面して示す
説明図で、図(a)は係止用爪部材4が閉じている状態
を、図(b)は係止用爪部材4が開いている状態を示
す。
[0041] Further, FIGS. 5 (a) Beauty (b) are explanatory view showing a cross section contact between the annular casing 3C and the engagement pawl member 4, FIG. (A) For locking FIG. 4B shows a state in which the claw member 4 is closed, and FIG. 4B shows a state in which the locking claw member 4 is open.

【0042】上記係止用爪部材4の動作は、上記弾性体
3Fの膨脹や収縮したりする動作が下方の加圧部材3E
を介し3個の係止用爪部材4,…に伝わる。すなわち、
弾性体3Fが膨脹したとき加圧部材3Eの突出部34が
押圧され、加圧部材3Eが下方に下がると、各係止用爪
部材4,…の上端面45を押すことになる。
The operation of the locking claw member 4 is such that the operation of expanding or contracting the elastic body 3F is performed by the lower pressing member 3E.
Through the three locking claw members 4. That is,
When the protrusion 34 of the pressing member 3E is pressed when the elastic body 3F is expanded and the pressing member 3E is lowered, the upper end surface 45 of each of the locking claw members 4,.

【0043】この図5(a)は加圧部材3Eが係止用爪
部材4の上端面45が押圧されていない状態を示し、係
止用爪部材4は突出片37頂部との当接部位を支点47
として下方の水平部分42が矢印a方向へと回動して外
方に開いている。すなわち、3個の係止用爪部材4,…
は拡開していて、3個の係止用爪部材4,…の下方の水
平部分42と下方の直立部分44との外角突端46,…
を結ぶ仮想円径は最大となっている。
FIG. 5A shows a state in which the pressing member 3E is not pressed on the upper end surface 45 of the locking claw member 4, and the locking claw member 4 is in contact with the top of the protruding piece 37. Fulcrum 47
The lower horizontal portion 42 rotates in the direction of arrow a and opens outward. That is, three locking claw members 4,...
Are expanded, and the outer corner protruding ends 46,... Of the lower horizontal portion 42 and the lower upright portion 44 of the three locking claw members 4,.
Is the largest.

【0044】又、図5(b)は加圧部材3Eが係止用爪
部材4の上端面45が押圧された状態を示し、このとき
係止用爪部材4は直立部分43の上方が外方向(図にお
いてに右方)に傾き、突出片37頂部との当接部位を支
点47として梃の原理により下方の水平部分42が矢印
b方向へと回動して内方に寄っている。すなわち、3個
の係止用爪部材4,…は閉じた状態で、3個の係止用爪
部材4,…の下方の水平部分42と下方の直立部分44
との外角突端46,…を結ぶ仮想円径は最小である。
FIG. 5B shows a state in which the pressing member 3E is pressed on the upper end surface 45 of the locking claw member 4. At this time, the locking claw member 4 has an upper part outside the upright portion 43. The horizontal portion 42 is tilted in the direction (to the right in the drawing), and the lower horizontal portion 42 is pivoted in the direction of the arrow b by the principle of leverage toward the inward direction by using the contact portion with the top of the protruding piece 37 as a fulcrum 47. That is, when the three locking claw members 4,... Are closed, the lower horizontal portion 42 and the lower upright portion 44 of the three locking claw members 4,.
Are the smallest.

【0045】又、加圧部材3Eの下方近くにある押え部
材3B下面の中央付近の凹部に、下方側に付勢するスプ
リング32が取付けられ、このスプリング32の先端側
に押圧体3Dが設けられていて、押圧体3D先端の円筒
状ボス部33が3個の係止用爪部材4,…の下方内側面
と当接している。
A downwardly biasing spring 32 is mounted in a recess near the center of the lower surface of the pressing member 3B near the lower side of the pressing member 3E, and a pressing body 3D is provided at the tip side of the spring 32. And the cylindrical boss 33 at the tip of the pressing body 3D is in contact with the lower inner surfaces of the three locking claw members 4,.

【0046】次に、上記動作をする係止用爪部材4,…
を有するメカニカルチャック5を備えたメカニカルチャ
ック式ローディング装置1について図6及び図7を参照
して説明する。
Next, the locking claw members 4,...
Mechanical Cha equipped with a mechanical chuck 5 with
The loading type loading device 1 will be described with reference to FIGS.

【0047】図6は、CD用基板Dの中央部の孔D1を
係止用爪部材4,…が把持した状態を示している。イ)
加圧ラインによる加圧はせず、ロ)弾性体3Fは膨脹し
ていない。ハ)加圧部材3Eが係止用爪部材4,…を押
圧している状態にはなく、環状ケース3Cの支点47に
よる梃の原理により下方側が矢印a方向の外方に向く力
が働いている。ニ)押圧体3Dは常時、下方へ力を働か
せていて、ホ)先端の円筒状ボス部33が3個の係止用
爪部材4,…の内側面と当接して下方へ下げる力を働か
せている。
FIG. 6 shows a state in which the locking claws 4,... Grip the hole D1 at the center of the CD substrate D. I)
No pressure is applied by the pressure line, and b) the elastic body 3F is not expanded. C) The pressing member 3E is not in a state of pressing the locking claw members 4,..., And the downward force acts outward in the direction of arrow a due to the principle of leverage by the fulcrum 47 of the annular case 3C. I have. D) The pressing body 3D constantly exerts a downward force, and e) a downwardly acting force of the cylindrical boss 33 at the tip abutting against the inner surfaces of the three locking claw members 4,. ing.

【0048】この図6は図5(a)に示す状態と同じ
で、3個の係止用爪部材4,…の下方は矢印a方向に回
動し最も拡開していて、3個の係止用爪部材4,…の外
角突端46,…を結ぶ仮想円径は最大でCD用基板Dの
孔D1径より大きい状態にある。したがって、各係止用
爪部材4,…の外面側がCD用基板Dの孔D1壁面に当
接していて、この状態でCD用基板Dをローディングや
アンローディングするとき、係止用爪部材4,…から下
方にずれて脱落することがない。
FIG. 6 is the same as the state shown in FIG. 5 (a). The lower part of the three locking claw members 4,... The virtual circle diameter connecting the outer corner protruding ends 46 of the locking claw members 4 is larger than the diameter of the hole D1 of the CD substrate D at the maximum. Therefore, the outer surface side of each of the locking claw members 4,... Contacts the wall surface of the hole D1 of the CD substrate D, and when loading or unloading the CD substrate D in this state, the locking claw members 4,. ... does not fall down and fall off.

【0049】図7は、係止用爪部材4,…がCD用基板
Dの中央部の孔D1から離れる状態を示している。イ)
加圧ラインから通路11を介し加圧流体が送られ、ロ)
弾性体3Fが膨脹し、シールリング3Aの透孔31内に
弾性体3Fの一部が膨出する。ハ)この膨出により加圧
部材3Eが押圧され、加圧部材3Eを介して係止用爪部
材4,…に下方に向かう力を働かせる。ニ)係止用爪部
材4,…が上方から押圧されることによって係止用爪部
材4,…の上方側は外方に傾き、環状ケース3Cの支点
47による梃の原理により下方側が矢印b方向に回動し
て内方に向く。ホ)常時、下方へ力を働かせ係止用爪部
材4,…と当接しているが、ヘ)押圧体3Dは上記加圧
部材3Eの押圧力に負けてスプリング32が収縮してそ
の応力を吸収する。
FIG. 7 shows a state in which the locking claw members 4,... Are separated from the center hole D1 of the CD substrate D. I)
The pressurized fluid is sent from the pressurized line via the passage 11 and
The elastic body 3F expands, and a part of the elastic body 3F swells into the through hole 31 of the seal ring 3A. C) The swelling presses the pressing member 3E, and exerts a downward force on the locking claw members 4,... Via the pressing member 3E. D) When the locking claw members 4 are pressed from above, the upper sides of the locking claw members 4 are inclined outward, and the lower side is indicated by an arrow b due to the principle of leverage by the fulcrum 47 of the annular case 3C. Turn in the direction and turn inward. E) The force is always exerted downward to abut against the locking claw members 4,... F) The pressing body 3D loses the pressing force of the pressing member 3E and the spring 32 contracts to reduce the stress. Absorb.

【0050】この図7は図5(b)に示す状態と同じ
で、3個の係止用爪部材4,…の下方は矢印b方向に最
も縮んでいて、3個の係止用爪部材4,…の外角突端4
6,…を結ぶ仮想円径は最小でCD用基板Dの孔D1径
より小さい状態にある。したがって、各係止用爪部材
4,…の外面側はCD用基板Dの孔D1壁面に接触する
ことなく孔D1の出入りが可能である。よって、CD用
基板Dの把持や開放を行うに際して、係止用爪部材4,
…を孔D1に容易に通過させることができる。
7 is the same as the state shown in FIG. 5B, the lower part of the three locking claw members 4,... Is most contracted in the direction of arrow b, and the three locking claw members 4,. 4, the outer corner tip 4
The virtual circle diameter connecting 6, 6,... Is at a minimum and smaller than the diameter of the hole D1 of the CD substrate D. Therefore, the outer surface side of each locking claw member 4,... Can enter and exit the hole D1 without contacting the wall surface of the hole D1 of the CD substrate D. Therefore, when gripping and releasing the CD substrate D, the locking claw members 4
... can easily pass through the hole D1.

【0051】そして、CD用基板Dのローディングやア
ンローディング時に、搬送及びチャックによる把持や開
放は上記図に示す動作連続かつ繰り返し行われる。
During the loading and unloading of the CD substrate D, the operations shown in the above figure are continuously and repeatedly performed for the transfer and the holding and opening by the chuck.

【0052】又、係止用爪部材及びその開閉手段は図8
に示す構成であってもよい。図8に示す実施例は、一対
の係止用爪部材6,6が左右対照に配置される。この係
止用爪部材6は直線部61と傾斜部62及び短い直線部
63とからなり、直線部61の中間に支点を形成する固
定部64がある。両係止用爪部材6,6は先端の短い直
線部63,63が近接している構成で両傾斜部62,6
2の下側の間に両者を接近させるコイル状に巻いたスプ
リング65が張架してある。又、弾性体3Fが押圧する
加圧部材3Eに、下方先端両側に傾斜面39,39を形
成した押部材3Gが設けてある。
The locking claw member and its opening / closing means are shown in FIG.
The configuration shown in FIG. In the embodiment shown in FIG. 8, a pair of locking claw members 6, 6 are arranged in left-right contrast. The locking claw member 6 includes a straight portion 61, an inclined portion 62 and a short straight portion 63, and a fixing portion 64 that forms a fulcrum is provided between the straight portions 61. The locking claw members 6 and 6 have a configuration in which the straight portions 63 and 63 having short ends are close to each other.
A spring 65 wound in a coil shape for bringing the two close to each other is stretched between the lower sides of the two. Also, the pressure member 3E in which the elastic body 3F pressed, the pressing member 3G which is formed an inclined surface 39, 39 downwardly tip sides is provided.

【0053】そして、係止用爪部材6,6は、通常、先
端直線部63,63の間隔は狭く、CD用基板Dを支持
するときは、弾性体3Fを膨出させて加圧部材3Eを下
方に押圧すると押部材3G先端の傾斜面39,39が
両係止用爪部材6,6の両傾斜部62,62間に侵入し
て、両係止用爪部材6,6の短い直線部63,63を矢
印c方向の外方に開きCD用基板Dの孔D1内壁に当接
してチャックとローデイング及び搬送を行なうことがで
きる。又、チャックの解除は弾性体3Fを収縮させれば
加圧部材3Eが元に戻るため、押部材3Gの先端部も
両係止用爪部材6,6の直線部63,63から抜け出る
とともにスプリング65の力により元の幅が狭い状態と
なる。
The locking claw members 6, 6 usually have a narrow interval between the straight end portions 63, 63. When supporting the CD substrate D, the elastic members 3F are expanded to press the pressing members 3E. the is pressed downward the pressing member 3G tip of the inclined surfaces 39 and 39 to penetrate between both the inclined portions 62, 62 of the two locking pawl members 6, short both locking pawl members 6 The linear portions 63, 63 can be opened outward in the direction of arrow c to abut on the inner wall of the hole D1 of the CD substrate D to perform loading and transport with the chuck. Moreover, since releasing the chuck back to the pressure member 3E when caused to contract the elastic member 3F original, with even tip of the pressing member 3G exits the straight portion 63, 63 of the two locking pawl members 6 The original width is reduced by the force of the spring 65.

【0054】そして、本発明のメカニカルチャック式ロ
ーディング装置1及び真空室81を用いた場合は、メカ
ニカルチャック式ローディング装置1の離脱時に外気に
晒される部分は仕切弁2の下方からほぼプッシャー89
の上面の間の小さい容積であるので、CD用基板Dの入
替え時に真空室81内に入る大気は僅かで、バュームチ
ャック使用時の連通路を含む部分を排気するに比べ排
気作業に要する時間を大幅に短縮でき作業能率を向上で
きた。
Then, the mechanical chuck type b of the present invention
In the case of using over loading device 1 and the vacuum chamber 81, mechanical
The part exposed to the outside air when the loading device 1 is detached is substantially pushed from below the gate valve 2 by a pusher 89.
Since a small volume between the upper surface of the air entering the vacuum chamber 81 during the replacement of the CD substrate D is small, the time required for the exhaust working compared to evacuate a portion including a communication passage when Bayumuchakku use The work efficiency was greatly reduced and the work efficiency was improved.

【0055】このように、本発明に係るメカニカルチャ
ックを備えたメカニカルチャック式ローディング装置で
は、弾性体やスプリング等の膨脹したり収縮する部材の
組合わせにより縮小と拡開の動作を交互に行わせる機械
的な係止用爪部材により、工作物の着脱を行うので、ス
パッタリング装置等の成膜装置の真空室内における圧力
変動が従来のバキュームチャックローディング装置よ
り少なく、排気工程の時間短縮が可能になった。
As described above, in the mechanical chuck type loading device provided with the mechanical chuck according to the present invention, reduction and expansion operations are alternately performed by a combination of an expanding or contracting member such as an elastic body or a spring. the mechanical locking pawl, since the attachment and detachment of the workpiece, less pressure variation than conventional vacuum chuck type loading device in the vacuum chamber of the film formation apparatus such as a sputtering apparatus, the time can be shortened evacuation step became.

【0056】[0056]

【発明の効果】このようなメカニカルチャック式ローデ
ィング装置は、大気と真空領域間にメカニカルチャック
を設置することにより真空領域内におけるハンドリング
を可能にする特徴がある。これによりスパッタリング装
置等の成膜装置における圧力変動が、従来のバキューム
チャックローディング装置より少ないために以下の利
点を奏する。
The mechanical chuck type rode described above
Ingu device is characterized to allow handling in the vacuum region by placing a mechanical chuck between the atmosphere and the vacuum region. As a result, pressure fluctuations in a film forming apparatus such as a sputtering apparatus are smaller than those in a conventional vacuum chuck type loading apparatus, so that the following advantages are obtained.

【0057】1.スパッタリング装置に適用した場合、
スパッタ膜(成膜)の安定化(アーキング等)、ポンプ
の小形化(ターボポンプ1台で可)等、 2.サイクル
タイムの短縮化(スパッタリング作業中における大気導
入工程の廃止)等、 3.従来方式に比べて機械の動作
中断が無くなり稼働率の向上、更に作業のスピード向上
等の利点がある。
1. When applied to sputtering equipment,
1. Stabilization of sputtered film (film formation) (arcing etc.), downsizing of pump (one turbo pump is acceptable), etc. 2. Shortening of cycle time (elimination of air introduction process during sputtering), etc. Compared with the conventional method, there is an advantage that the operation of the machine is not interrupted, the operation rate is improved, and the operation speed is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】図1の要部を拡大した断面図である。FIG. 2 is an enlarged sectional view of a main part of FIG.

【図3】図1に示す環状ケースの斜視図である。FIG. 3 is a perspective view of the annular case shown in FIG. 1;

【図4】環状ケースに係止用爪部材が装着された状態を
示す下面図である。
FIG. 4 is a bottom view showing a state in which a locking claw member is attached to an annular case.

【図5】(a)、(b)は環状ケースと係止用爪部材と
の接触状態を断面して示す説明図である。
FIGS. 5A and 5B are explanatory views showing a cross-sectional state of contact between an annular case and a locking claw member.

【図6】図1に示した実施例の動作を説明する断面図で
ある。
FIG. 6 is a cross-sectional view for explaining the operation of the embodiment shown in FIG.

【図7】図1に示した実施例の他の動作を説明する断面
図である。
FIG. 7 is a sectional view for explaining another operation of the embodiment shown in FIG. 1;

【図8】加圧部材と係止用爪部材の他の実施例を示す説
明図である。
FIG. 8 is an explanatory view showing another embodiment of a pressing member and a locking claw member.

【図9】スパッタリング装置の要部を示す説明図であ
る。
FIG. 9 is an explanatory diagram showing a main part of the sputtering apparatus.

【図10】従来のバキュームチャックローデイング装
置を断面して示す説明図である。
FIG. 10 is an explanatory view showing a cross section of a conventional vacuum chuck type loading device.

【符号の説明】[Explanation of symbols]

1:メカニカルチャック式ローディング装置 1A:ヘッド1B:駆動軸 10:ローディング機構 12:空洞部 2:仕切弁 3A:シールリング 31:透孔 3B:押え部材 3C:環状ケース 3D:押圧体 3E:加圧部材 3F:弾性体 3G:押部材 4,6:係止用爪部材 47:当接部位(支点) 5:メカニカルチャック 8:スパッタリング装置 81:真空室85:開口部 D:工作物(CD用基板) D1:孔1: Mechanical chuck type loading device 1A: Head 1B: Drive shaft 10: Loading mechanism 12: Cavity 2: Gate valve 3A: Seal ring 31: Through hole 3B: Holding member 3C: Annular case 3D: Pressing body 3E: Pressurization member 3F: elastic 3G: the pressing members 4 and 6: the locking pawl 47: contact portion (fulcrum) 5: mechanical chuck 8: sputtering device 81: vacuum chamber 85: the opening D: workpiece (for CD Substrate) D1: Hole

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H01L 21/68 H01L 21/68 A (56)参考文献 特開 平5−33135(JP,A) 特開 昭62−222624(JP,A) (58)調査した分野(Int.Cl.6,DB名) C23C 14/00 - 14/58 B25J 15/08 H01L 21/68 ──────────────────────────────────────────────────続 き Continuation of the front page (51) Int.Cl. 6 Identification symbol FI H01L 21/68 H01L 21/68 A (56) References JP-A-5-33135 (JP, A) JP-A-62-222624 ( JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C23C 14/00-14/58 B25J 15/08 H01L 21/68

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 上下動及び回転する駆動軸に軸支された
ヘッド及び仕切弁を有するローディング機構と; 上記ヘッドの空洞部内に設けられた流体の出入により膨
脹または収縮する弾性体と; この弾性体内とは気密隔離して仕切弁内に設けられ、弾
性体の膨脹または収縮により動作する中央部に複数本の
係止用爪部材を有するメカニカルチャックと;を具備し
たことを特徴とするメカニカルチャック式ローディング
装置。
A loading mechanism having a head and a gate valve supported by a vertically moving and rotating drive shaft; and an elastic body provided in a cavity of the head , which expands or contracts due to a fluid flowing in and out; mechanical characterized by comprising a; the elastic body provided in the hermetically isolated to the gate valve, a mechanical chuck having a plurality of locking pawl member to a central portion which operates by expansion or contraction of the elastic member Chuck type loading device.
【請求項2】 メカニカルチャックを構成する上記係止
用爪部材は、屈曲してなり中間部において支持される部
位を支点として回動することを特徴とする請求項1に記
載のメカニカルチャック式ローディング装置。
2. The mechanical chuck type loading according to claim 1, wherein the locking claw member constituting the mechanical chuck is bent and rotates around a portion supported at an intermediate portion as a fulcrum. apparatus.
【請求項3】 減圧装置に接続されるとともに工作物出
入用の開口部を有する真空室と; この真空室の開口部に対向して設けられ、真空室の開口
部を気密に覆うとともに開口部内に出入する工作物を支
送できる上記請求項1または請求項2に記載のメカ
ニカルチャック式ローディング装置と; を具備したことを特徴とする真空装置。
A vacuum chamber connected to the decompression device and having an opening for entering and exiting the workpiece; and a vacuum chamber provided opposite to the opening of the vacuum chamber to hermetically cover the opening of the vacuum chamber and in the opening. mechanism described in claim 1 or claim 2 workpiece can feed support transportable to and from
A vacuum apparatus, comprising: a nial chuck type loading apparatus.
【請求項4】 前記メカニカルチャック式ローディング
装置のローディング機構空洞部内に設けられた流体の
出入により膨脹または収縮する弾性体と、前記仕切弁の
内部に上記弾性体の一部が臨む透孔が設けられたシール
リングと、このシールリングに押え部材を介し設けられ
た環状ケースと、シールリングと押え部材の間に設けら
れた加圧部材と、この加圧部材に上端面が対面し、上記
環状ケースに当接支持されているとともに下端側をこの
ケースから延出した複数本の係止用爪部材と、上記押え
部材に設けられ先端のボス部が上記係止用爪部材の内側
面に当接している押圧体とを具備したことを特徴とする
請求項3に記載の真空装置。
4. An elastic body provided in a cavity of a loading mechanism of the mechanical chuck-type loading device, which expands or contracts by entering and exiting a fluid, and a part of the elastic body inside the gate valve. A seal ring provided with a through-hole facing the same, an annular case provided on the seal ring via a pressing member, a pressing member provided between the seal ring and the pressing member, and an upper end surface provided on the pressing member. There faces, and a plurality of latching pawl member extending the lower side together when held in contact supported on said annular casing from the casing, a boss portion the engaging tip disposed on the pressing member 4. The vacuum device according to claim 3, further comprising a pressing body in contact with an inner surface of the claw member.
【請求項5】 前記真空室がスパッタリング装置であ
り、前記工作物が中央に孔部を有する合成樹脂製基板で
あることを特徴とする請求項3または請求項4に記載の
真空装置。
5. The vacuum apparatus according to claim 3, wherein the vacuum chamber is a sputtering apparatus, and the workpiece is a synthetic resin substrate having a hole in the center.
JP7011319A 1995-01-27 1995-01-27 Mechanical chuck type loading device and vacuum device Expired - Fee Related JP2908995B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7011319A JP2908995B2 (en) 1995-01-27 1995-01-27 Mechanical chuck type loading device and vacuum device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7011319A JP2908995B2 (en) 1995-01-27 1995-01-27 Mechanical chuck type loading device and vacuum device

Publications (2)

Publication Number Publication Date
JPH08199336A JPH08199336A (en) 1996-08-06
JP2908995B2 true JP2908995B2 (en) 1999-06-23

Family

ID=11774712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7011319A Expired - Fee Related JP2908995B2 (en) 1995-01-27 1995-01-27 Mechanical chuck type loading device and vacuum device

Country Status (1)

Country Link
JP (1) JP2908995B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000133693A (en) * 1998-08-19 2000-05-12 Shibaura Mechatronics Corp Vacuum device and mechanism for driving the same

Also Published As

Publication number Publication date
JPH08199336A (en) 1996-08-06

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