JP2752930B2 - Dicing equipment - Google Patents

Dicing equipment

Info

Publication number
JP2752930B2
JP2752930B2 JP22238395A JP22238395A JP2752930B2 JP 2752930 B2 JP2752930 B2 JP 2752930B2 JP 22238395 A JP22238395 A JP 22238395A JP 22238395 A JP22238395 A JP 22238395A JP 2752930 B2 JP2752930 B2 JP 2752930B2
Authority
JP
Japan
Prior art keywords
wafer
cleaning liquid
blade
chip removing
removing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP22238395A
Other languages
Japanese (ja)
Other versions
JPH0969499A (en
Inventor
薫 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
YAMAGUCHI NIPPON DENKI KK
Original Assignee
YAMAGUCHI NIPPON DENKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by YAMAGUCHI NIPPON DENKI KK filed Critical YAMAGUCHI NIPPON DENKI KK
Priority to JP22238395A priority Critical patent/JP2752930B2/en
Publication of JPH0969499A publication Critical patent/JPH0969499A/en
Application granted granted Critical
Publication of JP2752930B2 publication Critical patent/JP2752930B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Dicing (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体基板である
ウェハに形成された多数の集積回路を個々のチップに分
割するダイシング装置に関する。
The present invention relates to a dicing apparatus for dividing a large number of integrated circuits formed on a semiconductor substrate wafer into individual chips.

【0002】[0002]

【従来の技術】図3は従来の一例を示すダイシング装置
の斜視図である。従来、この種のダイシング装置は、特
開平4−240749号公報に従来の技術として開示さ
れている。このダイシング装置は、図3に示すように、
粘着シートに貼付けられたウェハ13を保持しX、Yお
よび回転し得るテーブル8と、ウェハ13を切断するブ
レード12をZ軸方向に移動しウェハ13に切込みを与
えるZ移動体10と、ウェハ13に洗浄液を滴下する洗
浄液供給部11と、洗浄液供給管を内蔵し洗浄液の吐出
口9aを有しZ移動体10から延在する除去板9とを備
えている。
2. Description of the Related Art FIG. 3 is a perspective view of a dicing apparatus showing an example of the prior art. Conventionally, a dicing apparatus of this type has been disclosed as a conventional technique in Japanese Patent Application Laid-Open No. H4-240749. This dicing apparatus, as shown in FIG.
A table 8 capable of holding and rotating the wafer 13 stuck on the adhesive sheet in X, Y and rotation directions; a Z moving body 10 for moving a blade 12 for cutting the wafer 13 in the Z-axis direction to cut the wafer 13; A cleaning liquid supply unit 11 for dropping the cleaning liquid into the cleaning liquid supply pipe 11 and a removal plate 9 having a built-in cleaning liquid supply pipe and having a discharge port 9a for the cleaning liquid and extending from the Z moving body 10 are provided.

【0003】次に、このダイシング装置の動作について
説明する。まず、テーブル8の載置面に粘着シートとと
もにウェハ13を載置する。次に、Z移動体10を下方
に移動し切り込みを与える。そして、テーブル8をX方
向に移動し洗浄液を供給しながらウェハ13を一方向に
切断する。一方向切断後切断方向と直交するY方向に相
対的に所定ピッチ送り、前と逆方向にテーブル8を移動
しウェハ13を切断する。このことを繰返して行ないウ
ェハ13の一方向の全てを切断する。次に、テーブル8
を90度回転し、前述と同様の切断動作を繰返して行な
い個々のチップに分割する。
Next, the operation of the dicing apparatus will be described. First, the wafer 13 is mounted on the mounting surface of the table 8 together with the adhesive sheet. Next, the Z moving body 10 is moved downward to make a cut. Then, the table 8 is moved in the X direction, and the wafer 13 is cut in one direction while supplying the cleaning liquid. After cutting in one direction, the wafer is fed by a predetermined pitch relatively in the Y direction orthogonal to the cutting direction, and the table 8 is moved in the direction opposite to the previous direction to cut the wafer 13. This is repeated to cut the wafer 13 in one direction. Next, Table 8
Is rotated 90 degrees, and the same cutting operation as described above is repeated to divide the chips into individual chips.

【0004】一方、この切断動作を行なっている間は、
Z移動体10に取り付けられた除去板9により粘着シー
トやウェハの切屑を含む汚れた洗浄液を受け、除去板9
の吐出口9aからの洗浄液により汚れた洗浄液を希釈し
押し流していた。
On the other hand, during this cutting operation,
The removal plate 9 attached to the Z-moving body 10 receives a dirty cleaning liquid including an adhesive sheet and chips from the wafer, and the removal plate 9
Dilutes and flushes the dirty cleaning liquid with the cleaning liquid from the discharge port 9a.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上述し
た従来のダイシング装置では、洗浄液を吐出する吐出口
をもつ除去板がブレードの一方向側に設けられているの
で、テーブルがブレードの方から除去板の方向に移動す
るときは、ウェハの切断直後の部分が除去板に近づき、
切断された部分の切屑がウェハに付着する前に有効に除
去するものの、テーブルが除去板からブレード方向に移
動するときには、ウェハの切断直後の部分が除去板から
遠ざかり、切屑を除去する除去板が有効に作用せず切屑
の除去が困難である。
However, in the above-mentioned conventional dicing apparatus, the removing plate having a discharge port for discharging the cleaning liquid is provided on one side of the blade, so that the table is moved from the blade toward the removing plate. When moving in the direction of, the part immediately after cutting the wafer approaches the removal plate,
Although the chips in the cut portion are effectively removed before adhering to the wafer, when the table moves in the blade direction from the removal plate, the portion immediately after the wafer is cut away from the removal plate, and the removal plate for removing the chips is removed. It does not work effectively and it is difficult to remove chips.

【0006】また、除去板で汚れた洗浄液を受けるにし
ても、除去板の壁面に汚れた洗浄液が付着し再び切断さ
れたウェハの面に滴下し汚染するという問題がある。こ
のウェハに切屑などの付着は、半導体装置の性能にに悪
影響を及ぼす。特に光学的性能に影響を及ぼす。その結
果、著しく歩留りの低下をもたらす。
Further, even if the cleaning liquid received by the removing plate is received, there is a problem that the dirty cleaning liquid adheres to the wall surface of the removing plate and drops again on the surface of the cut wafer to cause contamination. The attachment of chips or the like to the wafer adversely affects the performance of the semiconductor device. In particular, it affects optical performance. As a result, the yield is significantly reduced.

【0007】従って、本発明の目的は、切屑などの付着
させることなくウェハを切断分割することのできるダイ
シング装置を提供することである。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a dicing apparatus which can cut and divide a wafer without attaching chips or the like.

【0008】[0008]

【課題を解決するための手段】本発明の特徴は、ウエハ
を載置し一方向の往復移動および回転し得るるテーブル
と、前記ウェハを切断する回転ブレードを下方に移動し
前記ウェハに切込みを与えるZ移動体と、切断済みの前
記ウェハに洗浄液を滴下する第1の洗浄液供給部とを備
えるダイシング装置において、前記Z移動体から延在し
前記ブレードおよび切断済みの前記ウェハの所定の範囲
の領域を覆う箱形状の洗浄液飛散防止カバーと、この洗
浄液飛散防止カバーの前記ブレードの回転面と平行な側
壁の外方に内壁が平行に配設されるとともに側端部が前
記ウェハ面と所定の間隔をもつように下方に伸びる切屑
除去板と、この切屑除去板の外壁に沿って並べ配置され
る複数の洗浄液吐出口をもつ第2の洗浄液供給部とを備
えるダイシング装置である。
SUMMARY OF THE INVENTION The present invention is characterized in that a table on which a wafer is placed and which can reciprocate and rotate in one direction and a rotating blade for cutting the wafer are moved downward to cut the wafer. In a dicing apparatus comprising: a Z moving body to be provided; and a first cleaning liquid supply unit for dropping a cleaning liquid onto the cut wafer, a predetermined range of the blade and the cut wafer extending from the Z moving body. A box-shaped cleaning liquid scattering prevention cover covering an area, and an inner wall disposed parallel to a side wall of the cleaning liquid scattering prevention cover parallel to the rotation surface of the blade, and a side end thereof is defined by a predetermined distance from the wafer surface. A dicing apparatus comprising: a chip removing plate extending downward with an interval; and a second cleaning liquid supply unit having a plurality of cleaning liquid discharge ports arranged side by side along the outer wall of the chip removing plate. It is.

【0009】また、前記切屑除去板の該側端部と前記ウ
ェハ面との間隔を調整する調整機構を備えることが望ま
しい。さらに、前記切屑除去板の内壁に取付けられる板
状の多孔質部材を備えることが望ましい。
It is preferable that an adjusting mechanism for adjusting a distance between the side end of the chip removing plate and the wafer surface is provided. Further, it is desirable to provide a plate-shaped porous member attached to the inner wall of the chip removing plate.

【0010】[0010]

【発明の実施の形態】次に本発明について図面を参照し
て説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings.

【0011】図1(a)および(b)は本発明の一実施
の形態を示すダイシング装置の部分破断斜視図および断
面図である。このダイシング装置は、図1に示すよう
に、Z移動体10から延在しブレード12および切断済
みのウェハ13の所定の範囲の領域13aを覆う箱形状
の洗浄液飛散防止のカバー1と、この洗浄液飛散防止の
カバー1のブレード12の回転面と平行な側壁1aの外
方に内壁2aが平行に配設されるとともに側端部2bが
ウェハ13の表面と所定の間隔dをもつように下方に伸
びる切屑除去板2と、この切屑除去板2の外壁2cに沿
って並べ配置される複数の洗浄液の吐出口5をもつ第2
の洗浄液供給部4を設けたことである。それ以外は従来
例と同じである。
FIGS. 1A and 1B are a partially cutaway perspective view and a sectional view of a dicing apparatus showing an embodiment of the present invention. As shown in FIG. 1, this dicing apparatus includes a box-shaped cleaning liquid scattering prevention cover 1 that extends from a Z moving body 10 and covers a blade 13 and a predetermined area 13a of a cut wafer 13; An inner wall 2a is disposed outside the side wall 1a of the scattering prevention cover 1 parallel to the rotation surface of the blade 12 so as to be parallel to the rotation surface of the blade 12, and the side end 2b is lowered downward so as to have a predetermined distance d with the surface of the wafer 13. A second chip having a chip removing plate 2 extending and a plurality of cleaning liquid discharge ports 5 arranged along the outer wall 2c of the chip removing plate 2.
Is provided. Otherwise, it is the same as the conventional example.

【0012】次に、このダイシング装置の切屑除去動作
について説明する。まず、従来例で説明したように、テ
ーブル8の載置面に沿って切断方向と直交する方向に相
対的に所定ピッチ送りされる毎にテーブル8とブレード
12との相対的に復動することによってウエハを所定の
幅にブレード12にてウェハ13切断する際に、洗浄液
供給部11から滴下される洗浄液14aは、ダイシング
の際に汚れや切屑を含み飛散しカバー1の側壁1aにて
受ける。カバー1の側壁1aに付着する洗浄液14bは
やがて自重により切断済みのウエハ13上にある洗浄液
14cに液だれされる。
Next, the chip removing operation of the dicing apparatus will be described. First, as described in the conventional example, the table 8 and the blade 12 relatively move back each time the table 8 is fed by a predetermined pitch in a direction orthogonal to the cutting direction along the mounting surface of the table 8. When the wafer 13 is cut into a predetermined width by the blade 12 using the blade 12, the cleaning liquid 14 a dropped from the cleaning liquid supply unit 11, including dirt and chips and scattered during dicing, is received by the side wall 1 a of the cover 1. The cleaning liquid 14b adhering to the side wall 1a of the cover 1 is dripped by its own weight into the cleaning liquid 14c on the cut wafer 13.

【0013】次に、矢印に示すように、テーブル8が1
ピッチ移動する毎に、切屑除去板2により切屑や汚れを
含んだ洗浄液14cを仕切ると同時に洗浄液供給部4の
吐出口5から洗浄液14dを噴射させウェハ13面外に
押し流す。そして、ウェハ13の一方向の切断が終了
し、テーブル8が紙面に対して右側へ到達しブレード1
2がテーブルより外れたら、Z移動体10を上昇させブ
レード12をウェハ13の表面より上げ、洗浄液供給部
4より洗浄液8dを供給しながらテーブル8を紙面に対
して左側に移動しウェハ13面を再度洗浄する。
Next, as shown by the arrow, table 8
Every time the pitch is moved, the cleaning liquid 14c containing chips and dirt is separated by the chip removing plate 2, and at the same time, the cleaning liquid 14d is ejected from the discharge port 5 of the cleaning liquid supply unit 4 and is pushed out of the wafer 13 surface. Then, the cutting of the wafer 13 in one direction is completed, the table 8 reaches the right side with respect to the paper surface, and the blade 1
2 is removed from the table, the Z moving body 10 is raised, the blade 12 is raised above the surface of the wafer 13, and the table 8 is moved to the left side with respect to the paper surface while supplying the cleaning liquid 8d from the cleaning liquid supply unit 4 to move the wafer 13 surface. Wash again.

【0014】なお、洗浄液14cに含むウェハ13の切
屑や粘着シートの切屑は、比較的に比重は小さく、洗浄
液14cの液層の表面に浮遊する。従って、切屑除去板
2の側端部2bとウェハ13の表面の間隔dは液層の厚
さに一致させとくと良い。また、洗浄液の表面張力やウ
ェハ13の表面状態で液層の厚さが変るので、切屑除去
板2の側端部2bとウェハ13面との間隔が調整できる
ように、例えば、カバー1のブラケット3と切屑除去板
2を取付ける止めねじによる調節機構6を設けることが
望ましい。
The chips of the wafer 13 and the chips of the adhesive sheet contained in the cleaning liquid 14c have a relatively small specific gravity and float on the surface of the liquid layer of the cleaning liquid 14c. Therefore, it is preferable that the distance d between the side end portion 2b of the chip removing plate 2 and the surface of the wafer 13 be equal to the thickness of the liquid layer. In addition, since the thickness of the liquid layer changes depending on the surface tension of the cleaning liquid and the surface state of the wafer 13, for example, the bracket of the cover 1 is adjusted so that the distance between the side end 2 b of the chip removing plate 2 and the surface of the wafer 13 can be adjusted. It is desirable to provide an adjusting mechanism 6 with a set screw for attaching the chip 3 and the chip removing plate 2.

【0015】図2は本発明の他の実施例の形態を示すダ
イシング装置の断面図である。このダイシング装置は、
図2に示すように、切屑除去板2の内壁2aに貼り付け
られ側端部2bから上に所定の長さの多項質板7を設け
たことである。それ以外は前述の実施の形態のダイシン
グ装置と同じである。
FIG. 2 is a sectional view of a dicing apparatus showing another embodiment of the present invention. This dicing device
As shown in FIG. 2, a polynomial plate 7 having a predetermined length is attached to the inner wall 2a of the chip removing plate 2 and is provided above the side end 2b. Otherwise, the configuration is the same as the dicing apparatus of the above-described embodiment.

【0016】この多項質板7を設けることによって、テ
ーブル8の移動によって洗浄液14cが盛り上り洗浄液
14cに含まれる汚れの物資を多孔質板7の表面の窪み
に捕集することである。なお、この多項質板は、スポン
ジあるいは軽石などが適用される。
By providing the polynomial plate 7, the cleaning liquid 14c rises due to the movement of the table 8, and the dirt contained in the cleaning liquid 14c is collected in the depressions on the surface of the porous plate 7. In addition, a sponge or a pumice is applied to the polynomial plate.

【0017】[0017]

【発明の効果】以上説明した様に本発明は、ブレード近
傍から滴下されダイシングによって飛散する洗浄液を受
けるカバーと、このカバーの外側にあって前記カバーよ
り落ちウェハ面に溜る洗浄液の表層をテーブルの移動に
伴なって撫で切る切屑除去板と、テーブルの移動に伴な
って切屑除去板から外側に排出される前記洗浄液を押し
出す洗浄液吐出口をもつ洗浄液供給部とを設けることに
よって、ウェハの表面に浮遊する切屑が無くなり、その
結果、切屑をウェハ面に付着させることなく切断分割す
ることができるという効果がある。
As described above, according to the present invention, the cover for receiving the cleaning liquid dropped from the vicinity of the blade and scattered by dicing, and the surface layer of the cleaning liquid which falls outside of the cover and drops from the cover and accumulates on the wafer surface are formed on the table. By providing a chip removing plate to be stroked with the movement and a cleaning liquid supply unit having a cleaning liquid discharge port for pushing out the cleaning liquid discharged from the chip removing plate to the outside as the table is moved, the surface of the wafer is provided. There is no floating chips, and as a result, there is an effect that the chips can be cut and divided without adhering to the wafer surface.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態を示すダイシング装置の
部分破断斜視図および断面図である。
FIG. 1 is a partially cutaway perspective view and a sectional view of a dicing apparatus showing an embodiment of the present invention.

【図2】本発明の他の実施例の形態を示すダイシング装
置の断面図である。
FIG. 2 is a cross-sectional view of a dicing apparatus showing another embodiment of the present invention.

【図3】従来の一例を示すダイシング装置の斜視図であ
る。
FIG. 3 is a perspective view of a dicing apparatus showing an example of the related art.

【符号の説明】[Explanation of symbols]

1 カバー 1a 側壁 2 切屑除去板 2a 内壁 2b 側端部 3 ブラケト 4,11 洗浄液供給部 5 吐出口 6 調節機構 7 多孔質板 8 テーブル 9 除去板 10 Z移動体 12 ブレード 13 ウェハ 14a,14b,14c,14d 洗浄液 DESCRIPTION OF SYMBOLS 1 Cover 1a Side wall 2 Chip removal plate 2a Inner wall 2b Side end 3 Bracket 4,11 Cleaning liquid supply part 5 Discharge port 6 Adjusting mechanism 7 Porous plate 8 Table 9 Removal plate 10 Z moving body 12 Blade 13 Wafer 14a, 14b, 14c , 14d cleaning liquid

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ウエハを載置し一方向の往復移動および
回転し得るるテーブルと、前記ウェハを切断する回転ブ
レードを下方に移動し前記ウェハに切込みを与えるZ移
動体と、切断済みの前記ウェハに洗浄液を滴下する第1
の洗浄液供給部とを備えるダイシング装置において、前
記Z移動体から延在し前記ブレードおよび切断済みの前
記ウェハの所定の範囲の領域を覆う箱形状の洗浄液飛散
防止カバーと、この洗浄液飛散防止カバーの前記ブレー
ドの回転面と平行な側壁の外方に内壁が平行に配設され
るとともに側端部が前記ウェハ面と所定の間隔をもつよ
うに下方に伸びる切屑除去板と、この切屑除去板の外壁
に沿って並べ配置される複数の洗浄液吐出口をもつ第2
の洗浄液供給部とを備えることを特徴とするダイシング
装置。
1. A table on which a wafer can be placed and reciprocally moved and rotated in one direction, a Z-moving body for moving a rotating blade for cutting the wafer downward to make a cut in the wafer, First drop of cleaning liquid on wafer
A dicing apparatus comprising: a cleaning liquid scattering prevention cover having a box shape extending from the Z movable body and covering an area of a predetermined range of the blade and the cut wafer; A chip removing plate in which an inner wall is disposed in parallel outside the side wall parallel to the rotation surface of the blade and a side end extends downward so as to have a predetermined distance from the wafer surface; and a chip removing plate. A second having a plurality of cleaning liquid discharge ports arranged side by side along the outer wall;
And a cleaning liquid supply unit.
【請求項2】 前記切屑除去板の該側端部と前記ウェハ
面との間隔を調整する調節機構を備えることを特徴とす
る請求項1記載のダイシング装置。
2. The dicing apparatus according to claim 1, further comprising an adjusting mechanism for adjusting a distance between the side end of the chip removing plate and the wafer surface.
【請求項3】 前記切屑除去板の内壁に取付けられる板
状の多孔質部材を備えることを特徴とする請求項1記載
のダイシング装置。
3. The dicing apparatus according to claim 1, further comprising a plate-shaped porous member attached to an inner wall of the chip removing plate.
JP22238395A 1995-08-30 1995-08-30 Dicing equipment Expired - Fee Related JP2752930B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22238395A JP2752930B2 (en) 1995-08-30 1995-08-30 Dicing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22238395A JP2752930B2 (en) 1995-08-30 1995-08-30 Dicing equipment

Publications (2)

Publication Number Publication Date
JPH0969499A JPH0969499A (en) 1997-03-11
JP2752930B2 true JP2752930B2 (en) 1998-05-18

Family

ID=16781503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22238395A Expired - Fee Related JP2752930B2 (en) 1995-08-30 1995-08-30 Dicing equipment

Country Status (1)

Country Link
JP (1) JP2752930B2 (en)

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JP5757715B2 (en) * 2010-10-05 2015-07-29 株式会社ディスコ Cutting device and blade cover attaching / detaching method

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