JP2748448B2 - Method of manufacturing magneto-optical disk - Google Patents
Method of manufacturing magneto-optical diskInfo
- Publication number
- JP2748448B2 JP2748448B2 JP63277656A JP27765688A JP2748448B2 JP 2748448 B2 JP2748448 B2 JP 2748448B2 JP 63277656 A JP63277656 A JP 63277656A JP 27765688 A JP27765688 A JP 27765688A JP 2748448 B2 JP2748448 B2 JP 2748448B2
- Authority
- JP
- Japan
- Prior art keywords
- optical disk
- magneto
- film
- recording
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【発明の詳細な説明】 〔概要〕 光磁気ディスクの製造方法に関し、読出安定性がよ
く、記録感度の高い光磁気ディスクを得ることを目的と
し、厚さ方向に柱状構造化された希土類(RE)−遷移金
属(TM)アモルファス合金膜からなる記録膜を成膜する
にあたり、記録膜をスパッタ法により酸素濃度が8000〜
15000ppmの希土類−遷移金属アモルファス合金のターゲ
ットを用いて成膜するように構成する。DETAILED DESCRIPTION OF THE INVENTION [Summary] A method for manufacturing a magneto-optical disk is disclosed. The purpose of the present invention is to obtain a magneto-optical disk having good read stability and high recording sensitivity. )-In forming a recording film composed of a transition metal (TM) amorphous alloy film, the recording film was formed by sputtering to an oxygen concentration of 8000 to
A film is formed using a target of a 15,000 ppm rare earth-transition metal amorphous alloy.
本発明は光磁気ディスクの製造方法に関するものであ
る。The present invention relates to a method for manufacturing a magneto-optical disk.
光磁気ディスクは大容量の書き換え可能な記録媒体で
あり,コンピュータ等の外部記憶装置として用いられ
る。A magneto-optical disk is a large-capacity rewritable recording medium, and is used as an external storage device of a computer or the like.
光磁気ディスクは磁気ディスクのようにオーバライト
ができないため,データの転送速度が遅い。現状では光
磁気ディスクの高速転送の方法としてはディスクを高速
回転させることが考えられている。ところが,光磁気デ
ィスクの記録は熱磁気記録であるため,ディスクの高速
回転に対して記録感度を上げなければならない。A magneto-optical disk cannot be overwritten like a magnetic disk, and therefore has a low data transfer speed. At present, as a method of high-speed transfer of a magneto-optical disk, it is considered to rotate the disk at high speed. However, since recording on a magneto-optical disc is thermomagnetic recording, the recording sensitivity must be increased with respect to high-speed rotation of the disc.
一般に記録感度を上げるためには,記録膜の磁気特性
のキュリー温度を下げる方法がある。しかし,単純にキ
ュリー温度を下げると,読出を連続して行っている際,
記録した情報を消してしまうことがある。In general, to increase the recording sensitivity, there is a method of lowering the Curie temperature of the magnetic characteristics of the recording film. However, if the Curie temperature is simply lowered, when reading is performed continuously,
The recorded information may be erased.
従って,単純にキュリー温度を下げる方法でなく,読
出安定性のよい方法が必要になる。Therefore, not only a method of simply lowering the Curie temperature but also a method with good read stability is required.
本発明は,読出安定性が問題なく,記録感度の高い光
磁気ディスクを得ることを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a magneto-optical disk having high recording sensitivity without any problem of read stability.
上記課題の解決は,厚さ方向に柱状構造化された希土
類−遷移金属アモルファス合金膜からなる光磁気ディス
クの記録膜を成膜するにあたり、酸素濃度が8000〜1500
0ppm(重量比)の希土類−遷移金属アモルファス合金の
ターゲットを用いてスパッタ法により成膜する光磁気デ
ィスクの製造方法により達成される。In order to solve the above-mentioned problem, an oxygen concentration of 8000 to 1500 is required for forming a recording film of a magneto-optical disk composed of a rare earth-transition metal amorphous alloy film having a columnar structure in a thickness direction.
This is achieved by a method of manufacturing a magneto-optical disk in which a film is formed by a sputtering method using a target of a rare earth-transition metal amorphous alloy of 0 ppm (weight ratio).
第1図は柱状構造化した記録膜のSEM(走査型電子顕
微鏡)写真を摸写した模式断面図である。FIG. 1 is a schematic sectional view simulating an SEM (scanning electron microscope) photograph of a recording film having a columnar structure.
図において,基板1上に記録膜2が柱状構造に形成さ
れた状態が示される。In the drawing, a state in which a recording film 2 is formed in a columnar structure on a substrate 1 is shown.
(1) 本発明は,記録膜を柱状化することにより,記
録膜の密度が減少し,また熱伝導率も低下するため媒体
が温まり易くなり,記録感度を向上できることを利用し
たものである。(1) The present invention utilizes the fact that the density of the recording film is reduced and the thermal conductivity is lowered by forming the recording film into a columnar shape, so that the medium is easily heated and the recording sensitivity can be improved.
(2) 柱状構造化するには,例えばスパッタ成膜にお
いて,スパッタガスとして用いるArのガス圧を高くする
か,或いはArガスの他に酸素ガスを極微量混合したガス
を用いてスパッタする方法があるが,本発明者は酸素濃
度を増やした合金ターゲットを用いてスパッタしても同
等の効果が安定して得られ,且つ柱状構造が得られる酸
素濃度の範囲は8000〜15000ppm(重量比)であることを
SEM観測により明らかにした。(2) In order to form a columnar structure, for example, in sputtering film formation, a method of increasing the gas pressure of Ar used as a sputtering gas or performing sputtering using a gas in which an extremely small amount of oxygen gas is mixed in addition to Ar gas is used. However, the present inventor has found that the same effect can be stably obtained by sputtering using an alloy target with an increased oxygen concentration, and that the columnar structure can be obtained in an oxygen concentration range of 8,000 to 15,000 ppm (weight ratio). That there is
It was revealed by SEM observation.
柱状構造に成膜できる理由は,ターゲットに酸素を多
く含ませることにより,成膜時にターゲット柱の酸素を
膜に取り込ませることで,柱状化を助長することがで
き,上記のArと微量の酸素の混合ガスを用いてスパッタ
した場合と同じ効果が得られるものと考えられる。しか
し,ターゲットの酸素濃度を15000ppm以上にすると成膜
された膜が酸化してしまい,面内磁化成分が多くなるた
め,良好な光磁気特性が得られなくなる。The reason why the film can be formed on the columnar structure is that the target contains a large amount of oxygen, and the oxygen of the target column is taken into the film during film formation, thereby promoting the formation of the column. It is considered that the same effect as in the case of sputtering by using the mixed gas of the above is obtained. However, when the oxygen concentration of the target is set to 15,000 ppm or more, the formed film is oxidized and the in-plane magnetization component increases, so that good magneto-optical characteristics cannot be obtained.
(1) 実施例1: 第2図は実施例による光磁気ディスクの断面図であ
る。(1) Embodiment 1: FIG. 2 is a sectional view of a magneto-optical disk according to an embodiment.
光磁気ディスクの媒体はスパッタ装置により作製し
た。基板1には5インチのガラス基板11上に,レーザビ
ーム案内用のグルーブ13を形成したフォトポリマ12を被
着したものを用いた。The medium of the magneto-optical disk was produced by a sputtering device. The substrate 1 used was a 5-inch glass substrate 11 on which a photopolymer 12 having a groove 13 for guiding a laser beam was formed.
記録膜2には厚さ100nmのTbFeCo(Tb21Fe71Co8)膜を
用い,保護膜3,4には厚さ80nmのSiN膜を用いた。A 100 nm thick TbFeCo (Tb 21 Fe 71 Co 8 ) film was used for the recording film 2, and an 80 nm thick SiN film was used for the protective films 3 and 4.
次に参考のため,記録膜を柱状構造にするための一般
的な周知のスパッタ条件を次表に示す。Next, for reference, the following table shows general well-known sputtering conditions for forming a recording film into a columnar structure.
(a) Ar圧を上げる場合 到達真空度(Pa) 1×10-5 Arガス圧 (Pa) 1.0 放電電力 (kW) 1.0 または, (b) Arに極微量酸素を混合する場合 到達真空度(Pa) 1×10-4 Arガス圧 (Pa) 0.2 放電電力 (kW) 1.0 ここで,スパッタのターゲットは6インチφのものを
用い,放電電力は周波数13.56MHzのrf電源より供給し
た。(A) When increasing Ar pressure Ultimate vacuum (Pa) 1 × 10 -5 Ar gas pressure (Pa) 1.0 Discharge power (kW) 1.0 or (b) When mixing trace amounts of oxygen with Ar Ultimate vacuum ( Pa) 1 × 10 -4 Ar gas pressure (Pa) 0.2 Discharge power (kW) 1.0 Here, a sputtering target with a diameter of 6 inches was used, and discharge power was supplied from a 13.56 MHz frequency rf power supply.
比較のために従来のスパッタ条件 到達真空度(Pa) 1×10-5 Arガス圧 (Pa) 0.2 放電電力 (kW) 1.0 でも光磁気ディスクを作製した。For comparison, a magneto-optical disk was produced with the conventional sputtering conditions, the ultimate vacuum (Pa), 1 × 10 -5 Ar gas pressure (Pa), 0.2 discharge power (kW), and 1.0.
(2)実施例2: スパッタのターゲットは,RE−TMアモルファス合金の
1つであるTbFeCo合金を使用した。この合金ターゲット
中の酸素濃度は普通2500ppm程度であるが,実施例では1
0000ppmのものを使用して,マグネトロンスパッタ法に
より記録膜を成膜した。(2) Example 2: A TbFeCo alloy, one of RE-TM amorphous alloys, was used as a sputtering target. The oxygen concentration in this alloy target is usually about 2500 ppm,
Using 0000 ppm, a recording film was formed by magnetron sputtering.
高濃度酸素のターゲットはTbFeCo合金を酸素中で焼結
して作製した。The high-concentration oxygen target was prepared by sintering a TbFeCo alloy in oxygen.
この膜構造は第1図のような柱状構造になっている。
一方,通常の酸素濃度のターゲットでは柱状構造になっ
ていない。This film structure has a columnar structure as shown in FIG.
On the other hand, a target having a normal oxygen concentration does not have a columnar structure.
上記の諸実施例においては,記録膜またはターゲット
にTbFeCo合金使用したが,希土類金属としてはTb,Gd,D
y,Hoの単体またはその混合であればよく,遷移金属とし
てはFe,Coまたはその混合が適用できる。In the above embodiments, a TbFeCo alloy was used for the recording film or target, but Tb, Gd, D
As long as it is a simple substance of y and Ho or a mixture thereof, Fe, Co or a mixture thereof can be applied as the transition metal.
上記の諸実施例の平均及び前記比較例の記録感度を次
表に示す。The average of the above Examples and the recording sensitivity of the Comparative Example are shown in the following table.
実施例の感度(mW) 3.0 比較例の感度(mW) 4.5 ここで,媒体速度は5m/sとし,記録感度はスペクトル
アナライザで再生波形の二次高調波が最小になるレーザ
パワーとした。Sensitivity of Example (mW) 3.0 Sensitivity of Comparative Example (mW) 4.5 Here, the medium speed was 5 m / s, and the recording sensitivity was a laser power at which the second harmonic of the reproduced waveform was minimized by a spectrum analyzer.
以上説明したように本発明によれば,記録パワーを約
35%低下させることができ,記録感度が大幅に向上した
光磁気ディスク及びその製造方法が得られる。As described above, according to the present invention, the recording power is reduced
A magneto-optical disk whose recording sensitivity can be greatly reduced by 35% and a manufacturing method thereof can be obtained.
第1図は柱状構造化した記録膜のSEM(走査型電子顕微
鏡)写真を摸写した模式断面図, 第2図は実施例による光磁気ディスクの断面図である。 図において, 1は基板, 11はガラス基板, 12はフォトポリマ, 13はグルーブ, 2は記録膜でTbFeCo膜, 3,4は保護膜でSiN膜 である。FIG. 1 is a schematic sectional view simulating an SEM (scanning electron microscope) photograph of a recording film having a columnar structure, and FIG. 2 is a sectional view of a magneto-optical disk according to an embodiment. In the figure, 1 is a substrate, 11 is a glass substrate, 12 is a photopolymer, 13 is a groove, 2 is a TbFeCo film as a recording film, and 3 and 4 are SiN films as protective films.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 三原 基伸 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 堤 正己 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (72)発明者 中島 英一 神奈川県川崎市中原区上小田中1015番地 富士通株式会社内 (56)参考文献 特開 昭60−140706(JP,A) 特開 平1−118240(JP,A) 特開 昭63−316342(JP,A) 特開 昭63−316340(JP,A) ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Motonobu Mihara 1015 Uedanaka Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Fujitsu Limited (72) Inventor Masami Tsutsumi 1015 Kamodanaka Nakahara-ku, Kawasaki City, Kanagawa Fujitsu Limited ( 72) Inventor Eiichi Nakajima 1015 Uedanaka, Nakahara-ku, Kawasaki City, Kanagawa Prefecture Inside Fujitsu Limited (56) References JP-A-60-140706 (JP, A) JP-A-1-118240 (JP, A) JP-A-63-316342 (JP, A) JP-A-63-316340 (JP, A)
Claims (1)
金属アモルファス合金からなる光磁気ディスクの記録膜
を成膜するにあたり、酸素濃度が8000〜15000ppm(重量
比)の希土類−遷移金属アモルファス合金のターゲット
を用いてスパッタ法により成膜することを特徴とする光
磁気ディスクの製造方法。In forming a recording film of a magneto-optical disk comprising a rare earth-transition metal amorphous alloy having a columnar structure in a thickness direction, a rare earth-transition metal amorphous having an oxygen concentration of 8,000 to 15,000 ppm (weight ratio). A method of manufacturing a magneto-optical disk, comprising forming a film by a sputtering method using an alloy target.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63277656A JP2748448B2 (en) | 1988-11-02 | 1988-11-02 | Method of manufacturing magneto-optical disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63277656A JP2748448B2 (en) | 1988-11-02 | 1988-11-02 | Method of manufacturing magneto-optical disk |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02123542A JPH02123542A (en) | 1990-05-11 |
JP2748448B2 true JP2748448B2 (en) | 1998-05-06 |
Family
ID=17586467
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63277656A Expired - Lifetime JP2748448B2 (en) | 1988-11-02 | 1988-11-02 | Method of manufacturing magneto-optical disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2748448B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03171450A (en) * | 1989-11-29 | 1991-07-24 | Kao Corp | Optical recording medium |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60140706A (en) * | 1983-12-27 | 1985-07-25 | Sumitomo Metal Mining Co Ltd | Magnetic medium for vertically magnetic recording |
JPS63316342A (en) * | 1987-06-18 | 1988-12-23 | Seiko Epson Corp | Magneto-optical recording medium |
JPS63316340A (en) * | 1987-06-18 | 1988-12-23 | Seiko Epson Corp | Magneto-optical recording medium |
JP2673807B2 (en) * | 1987-10-30 | 1997-11-05 | パイオニア株式会社 | Method for manufacturing magneto-optical recording medium |
-
1988
- 1988-11-02 JP JP63277656A patent/JP2748448B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH02123542A (en) | 1990-05-11 |
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