JP2740917B2 - Ceramic substrate - Google Patents

Ceramic substrate

Info

Publication number
JP2740917B2
JP2740917B2 JP1064678A JP6467889A JP2740917B2 JP 2740917 B2 JP2740917 B2 JP 2740917B2 JP 1064678 A JP1064678 A JP 1064678A JP 6467889 A JP6467889 A JP 6467889A JP 2740917 B2 JP2740917 B2 JP 2740917B2
Authority
JP
Japan
Prior art keywords
curvature
radius
ceramic substrate
rounded portion
rounded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1064678A
Other languages
Japanese (ja)
Other versions
JPH02241049A (en
Inventor
新一 内田
幸男 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP1064678A priority Critical patent/JP2740917B2/en
Publication of JPH02241049A publication Critical patent/JPH02241049A/en
Application granted granted Critical
Publication of JP2740917B2 publication Critical patent/JP2740917B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass

Landscapes

  • Structure Of Printed Boards (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はセラミック基板に関し、特に半導体素子を収
納するためのパッケージ用基板あるいは印刷配線基板等
に用いられるセラミック基板に関するものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic substrate, and more particularly to a ceramic substrate used for a package substrate or a printed wiring board for housing semiconductor elements.

〔従来の技術〕[Conventional technology]

セラミック基板は、搬送工程や組立工程において互い
に衝突することにより、ワレやカケが生じやすいため、
これらのワレ、カケを防止するための工夫がなされてい
た。
Ceramic substrates are susceptible to cracking and chipping by colliding with each other in the transport process and the assembly process.
A device has been devised to prevent these cracks and chips.

例えば、特開昭57−62546号公報によれば、第4図に
断面を示すように、半導体パッケージ用セラミック基板
40のキャビティを形成していない上面41と外周端面43と
の境界部に、曲率半径0.04〜0.06mm程度の2つの丸味部
44,45を形成することによって、この部分のワレ、カケ
を防止するようになっていた。
For example, according to Japanese Patent Application Laid-Open No. 57-62546, as shown in the cross section in FIG.
At the boundary between the upper surface 41 where the cavity 40 is not formed and the outer peripheral end surface 43, two rounded portions having a radius of curvature of about 0.04 to 0.06 mm
By forming 44 and 45, cracking and chipping of this portion were prevented.

〔従来技術の課題〕[Problems of the prior art]

ところが、上記の如き従来のセラミック基板40は上面
41側にしか丸味部44,45を形成しておらず、キャビティ
を形成した下面42と外周端面43との境界部はエッジ46と
なっていた。そのため、半導体パッケージとして組立て
るまでのセラミック基板40の搬送工程中に前記エッジ部
46にワレ、カケが発生しやすかった。
However, the conventional ceramic substrate 40 as described above has an upper surface.
The rounded portions 44 and 45 were formed only on the 41 side, and the boundary between the lower surface 42 where the cavity was formed and the outer peripheral end surface 43 was an edge 46. For this reason, the edge portion is required during the process of transporting the ceramic substrate 40 until assembly as a semiconductor package.
Cracking and chipping were easy to occur in 46.

なお下面42側にも同様に丸味部を形成しておけば、ワ
レ、カケを防止できるが、このような形状にするとセラ
ミック基板40をプレス成形した後取り出すときに、下面
42側の丸味部が下パンチにひっかかって取出しにくくな
るという問題点があった。
If a rounded portion is similarly formed on the lower surface 42 side, cracks and chips can be prevented.
There was a problem that the rounded portion on the 42 side caught the lower punch, making it difficult to remove.

また、上面41側の丸味部44,45も、曲率半径が0.04〜
0.06mmと非常に小さいものであったため、カケ、ワレを
防止する効果に乏しいものであった。
Also, the radius of curvature of the rounded portions 44 and 45 on the upper surface 41 side is 0.04 to 0.04.
Since it was as small as 0.06 mm, the effect of preventing chipping and cracking was poor.

〔課題を解決するための手段〕[Means for solving the problem]

上記に鑑みて本発明は、セラミックスよりなる基板に
おいて、上面と外周面との稜部、および下面と外周面と
の稜部の双方に微小な段差を備えるとともに、曲率半径
が0.2〜1.0mmの丸味部を上記上下面に連続するように形
成して、ワレやカケの防止効果を高め、かつプレス成形
時に下パンチ側となる下面に連続する丸味部の曲率半径
を0.5mm以上としたことによってプレス成形時の取出し
を容易にしたものである。
In view of the above, the present invention, in a substrate made of ceramic, while having a small step on both the ridge between the upper surface and the outer peripheral surface, and the ridge between the lower surface and the outer peripheral surface, the radius of curvature is 0.2 to 1.0 mm By forming the rounded portion so as to be continuous with the upper and lower surfaces, enhancing the effect of preventing cracking and chipping, and by setting the radius of curvature of the rounded portion continuous to the lower surface which is the lower punch side during press molding to 0.5 mm or more This facilitates removal during press molding.

〔実施例〕〔Example〕

以下、本発明実施例を図によって説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

第1図はプラグイン型の半導体パッケージを示す分解
斜視図であり、このパッケージはセラミック基板10,20
を組合せてなるものである。
FIG. 1 is an exploded perspective view showing a plug-in type semiconductor package.
Are combined.

上記セラミック基板10にはダイアタッチ面Dを有し、
プレス成形時に下パンチ側となる下面12、上パンチ側と
なる上面11、および外周面13があり、それぞれの稜部に
は微小な段差および丸味部が形成されいる。即ち、第2
図に拡大断面を示すように、セラミック基板10の上面11
と外周面13との稜部には、段差14が形成され、該段差14
の上面11側には曲率半径0.2〜1mmの丸味部15が形成され
ており、外周面13側には曲率半径0.03〜0.2mmの微小丸
味部16が形成されている。同様に、下面12と外周面13と
の稜部にも段差17が形成され、該段差17の下面12側には
曲率半径0.5〜1mmの比較的大きい丸味部18が形成されて
おり、外周面13側には曲率半径0.03〜0.2mmの微小丸味
部19が形成されている。
The ceramic substrate 10 has a die attach surface D,
At the time of press molding, there are a lower surface 12 serving as a lower punch side, an upper surface 11 serving as an upper punch side, and an outer peripheral surface 13, and a minute step and a rounded portion are formed at each ridge. That is, the second
As shown in the figure in an enlarged cross section, the upper surface 11 of the ceramic substrate 10
A step 14 is formed at the ridge between the outer peripheral surface 13 and the step 14.
A rounded portion 15 having a curvature radius of 0.2 to 1 mm is formed on the upper surface 11 side, and a minute rounded portion 16 having a curvature radius of 0.03 to 0.2 mm is formed on the outer peripheral surface 13 side. Similarly, a step 17 is also formed on the ridge between the lower surface 12 and the outer peripheral surface 13, and a relatively large rounded portion 18 having a radius of curvature of 0.5 to 1 mm is formed on the lower surface 12 side of the step 17, On the 13th side, a minute rounded portion 19 having a curvature radius of 0.03 to 0.2 mm is formed.

このように稜部に、丸味部15,18や微小丸味部16,19を
形成したことによって、セラミック基板10同士が衝突し
たような場合でもカケ、ワレを防止する効果を高くでき
る。なお、カケ、ワレ防止のためには丸味部15,18の方
が重要であり、微小丸味部16,19の方は特に曲率半径を
大きくしなくても良いため、加工が容易となるように微
小な丸味としてある。
By forming the rounded portions 15 and 18 and the minute rounded portions 16 and 19 on the ridges in this manner, even when the ceramic substrates 10 collide with each other, the effect of preventing chipping and cracking can be enhanced. In addition, in order to prevent chipping and cracking, the rounded portions 15 and 18 are more important, and the minute rounded portions 16 and 19 do not particularly need to have a large radius of curvature, so that processing is facilitated. There is a slight roundness.

また、下面12側の丸味部18は、上面側の丸味部15に比
べて曲率半径の大きなものとなっているが、これは、後
述するように製造工程中、プレス成形後の取出を容易に
するためである。
Further, the rounded portion 18 on the lower surface 12 has a larger radius of curvature than the rounded portion 15 on the upper surface, but this facilitates removal after press molding during the manufacturing process as described later. To do that.

さらに、段差14,17を形成してあるのは、プレス成形
によって容易に丸味部15,18を形成するために必要であ
り、また衝突した場合でも衝撃を分散させて、大きなカ
ケの発生を防止するためである。そのためには、これら
段差14,17の幅t1,t3は0.08mm以上必要であり、特に0.3
〜0.35mmとしたものがカケ防止効果に優れていた。さら
に段差14,17の高さt2,t4は0.1〜0.3mmとしたものが優れ
ていた。
Furthermore, the formation of steps 14, 17 is necessary to easily form the rounded parts 15, 18 by press molding, and disperses the impact even in the case of collision, preventing the occurrence of large chips To do that. For that purpose, the widths t 1 , t 3 of these steps 14, 17 need to be 0.08 mm or more, especially 0.3
Those having a thickness of ~ 0.35 mm were excellent in the effect of preventing chipping. Further, the heights t 2 and t 4 of the steps 14 and 17 of 0.1 to 0.3 mm were excellent.

ここで、上記セラミック基板10の製造方法を説明す
る。まず、アルミナ等のセラミック粉末に所定の焼結助
剤、バインダーを添加してなるセラミック原料粉末を用
意し、これをプレス成形機によって基板の形状に成形す
る。このプレス成形機は第3図に示すように、ダイ31、
上パンチ32、下パンチ33からなり、上パンチ32の外周に
は突出部32aおよび丸味形成部32bが、下パンチ33の外周
には突出部33aおよび丸味形成部33bがそれぞれ形成され
ており、セラミック原料粉末34をプレス形成するだけ
で、前記段差14,17および丸味部15,18を有する形状に成
形することができる。
Here, a method for manufacturing the ceramic substrate 10 will be described. First, a ceramic raw material powder prepared by adding a predetermined sintering aid and a binder to a ceramic powder such as alumina is prepared, and is formed into a substrate shape by a press forming machine. As shown in FIG. 3, this press molding machine has a die 31,
An upper punch 32 and a lower punch 33 are formed.A protrusion 32a and a round forming portion 32b are formed on the outer periphery of the upper punch 32, and a protrusion 33a and a round forming portion 33b are formed on the outer periphery of the lower punch 33, respectively. The raw material powder 34 can be formed into a shape having the steps 14, 17 and the rounded portions 15, 18 only by press forming.

また、加圧後の成形体を取り出すときは、下パンチ33
を上げて成形体をダイ31の上に出し、横から押出すよう
にするが、前記したように下面12側の丸味部18は大きな
曲率半径としてあるため、この部分がひっかかることな
く取出しやすい形状となっている。
When removing the compact after pressing, use the lower punch 33
The molded body is raised on the die 31 and extruded from the side, but since the rounded portion 18 on the lower surface 12 has a large radius of curvature as described above, this portion is easy to take out without getting caught. It has become.

次に、上記成形体を所定の条件で焼成し、最後にバレ
ル研磨を行うことによって、前記微小丸味部16,19を形
成すれば、セラミック基板10が完成する。
Next, the formed body is fired under predetermined conditions, and finally, barrel polishing is performed to form the fine round portions 16, 19, whereby the ceramic substrate 10 is completed.

実験例 本発明のセラミック基板10においては、前記したよう
に丸味部15,18の曲率半径が非常に重要な問題となって
くる。そこで、下記第1表のように丸味部15,18の曲率
半径をさまざまに変化させたものを試作し、衝撃試験を
行ったときのカケの発生率およびプレス成形後の取出の
容易さについて調べた。結果は第1表の通りである。
Experimental Example In the ceramic substrate 10 of the present invention, as described above, the radius of curvature of the round portions 15 and 18 is a very important problem. Therefore, as shown in Table 1 below, prototypes were manufactured with variously changed radii of curvature of the rounded portions 15 and 18, and the occurrence rate of chips when an impact test was performed and the ease of removal after press molding were examined. Was. The results are shown in Table 1.

また、セラミック基板はアルミナセラミックスからな
り、大きさ19mm×6mm×2mmのものとした。
The ceramic substrate was made of alumina ceramic and had a size of 19 mm × 6 mm × 2 mm.

さらに、衝撃試験は、各試料を200個ずつ用意してお
いて、6個ずつ、長さ60cmの中空のプラスチック製半導
体パッケージ保持管に収納して、該保持管を上下方向に
90度/秒の角速度で25回転させた後、ワレの大きさ別に
発生率を調べた。また、プレス成形後の取出しやすさに
ついては、問題なくスムーズに取出せた場合は○、ひっ
かかって取出しにくい場合は×、これらの中間の場合は
△として評価した。
Furthermore, in the impact test, 200 samples were prepared, and 6 samples were stored in a hollow plastic semiconductor package holding tube having a length of 60 cm.
After 25 rotations at an angular speed of 90 degrees / second, the incidence was examined for each crack size. Further, the ease of removal after press molding was evaluated as ○ when smooth removal was possible without any problem, × when it was difficult to remove due to snagging, and Δ when intermediate between these.

第1表より試料1は段差や丸味部を全く形成しないも
のであり、大きなカケの発生率を高かった。
As shown in Table 1, Sample 1 had no step or rounded portion at all, and had a high incidence of large chips.

次に試料2は丸味部15,18を曲率半径0.07mmとしたも
のであるが、カケ発生率は高く、またプレス成形後の取
出しが困難となった。さらに、試料3は上面側の丸味部
15のみを曲率半径0.2mmとしたものであり、若干カケ発
生率は低くなったが、まだ不充分なものであった。
Next, in Sample 2, the rounded portions 15 and 18 had a radius of curvature of 0.07 mm, but the chipping rate was high, and it was difficult to remove after press molding. Further, the sample 3 has a rounded portion on the upper surface side.
Only 15 had a radius of curvature of 0.2 mm, and although the incidence of chipping was slightly lower, it was still insufficient.

これらに対し、試料4は上面側、下面側の両方の丸味
部15,18を曲率半径0.2mmとしたものであり、特に0.6mm
以上のカケ発生率が非常に低かったため実用上問題のな
いレベルに達していたが、この試料4でもプレス成形後
の取出しがやや困難であった。そこで、試料5,6のよう
に下面の丸味部18のみ曲率半径を0.5mm以上と大きくし
たところ、低いカケ発生率を保ったままプレス成形後の
取出しを容易にすることができた。
On the other hand, in Sample 4, both the upper and lower rounded portions 15, 18 had a radius of curvature of 0.2 mm, and in particular, 0.6 mm.
Since the above-mentioned chipping rate was very low, the level reached no problem in practical use. However, even with this sample 4, it was somewhat difficult to take out after press molding. Therefore, when the radius of curvature of only the rounded portion 18 on the lower surface was increased to 0.5 mm or more as in Samples 5 and 6, removal after press molding could be facilitated while maintaining a low chip generation rate.

以上の結果をまとめると、セラミック基板10のカケ発
生率を低くし、実用上充分なレベルとするためには、上
面側、下面側の丸味部15,18の曲率半径は0.2mm以上とし
たものが良く、また、プレス成形後の取出しを容易にす
るためには、下面側の丸味部18の曲率半径を0.5mm以上
と上面側の丸味部15よりも大きくしたものが優れてい
た。
Summarizing the above results, in order to reduce the chip generation rate of the ceramic substrate 10 and make it a practically sufficient level, the radius of curvature of the rounded portions 15, 18 on the upper surface side and the lower surface side should be 0.2 mm or more. In addition, in order to facilitate removal after press molding, it is better to use a rounded portion 18 on the lower surface side with a radius of curvature of 0.5 mm or more, which is larger than the rounded portion 15 on the upper surface side.

さらに、これら丸味部15,18の曲率半径を大きくして
ゆくと、セラミック基板10自体の寸法精度等に悪影響を
及ぼすという問題が生じてくるが、この点に関し、種々
実験の結果、上面側の丸味部15の曲率半径は0.2〜1mmの
範囲であれば問題なく、特に0.2〜0.4mmのものが優れて
いた。また、下面側の丸味部18の曲率半径は0.5〜1mmと
したものが優れていた。
Furthermore, increasing the radius of curvature of the rounded portions 15 and 18 causes a problem of adversely affecting the dimensional accuracy and the like of the ceramic substrate 10 itself. If the radius of curvature of the rounded portion 15 is in the range of 0.2 to 1 mm, there is no problem, and particularly, the radius of curvature of 0.2 to 0.4 mm is excellent. Also, the radius of curvature of the rounded portion 18 on the lower surface side was set to 0.5 to 1 mm, which was excellent.

さらに、上記実施例は、プラグイン型半導体パッケー
ジ用のセラミック基板についてのみ述べたが、他の半導
体パッケージ用のセラミック基板や、印刷配線基板につ
いても同様である。
Further, in the above embodiments, only the ceramic substrate for the plug-in type semiconductor package has been described, but the same applies to the ceramic substrate for other semiconductor packages and the printed wiring board.

〔発明の効果〕〔The invention's effect〕

叙上のように本発明によれば、セラミックスよりなる
基板において、プレス成形時に上パンチ側となる上面と
外周面との稜部に、微小な段差と上記上面に連続する曲
率半径が0.2〜1.0mmの丸味部を形成するとともに、下パ
ンチ側となる下面と外周面との稜部に、微小な段差と上
記下面に連続する曲率半径が0.5〜1.0mmの丸味部をそれ
ぞれ形成したことによって、搬送工程や組立工程中のカ
ケ、ワレを防止する効果を非常に大きくすることがで
き、また下面側の丸味部の曲率半径を0.5mm以上と上面
側よりも大きなものとしたことによって、プレス成形後
の取出しも容易となって、歩留りを向上させることがで
き、品質、信頼性に優れたセラミック基板を得ることが
できる。
As described above, according to the present invention, in a substrate made of ceramic, a ridge portion between the upper surface and the outer peripheral surface that are the upper punch side during press molding has a minute step and a radius of curvature continuous with the upper surface of 0.2 to 1.0. By forming a rounded portion of mm, and at the ridge of the lower surface and the outer peripheral surface on the lower punch side, by forming a rounded portion with a small step and a radius of curvature continuous with the lower surface of 0.5 to 1.0 mm, respectively, The effect of preventing chipping and cracking during the transportation and assembly processes can be greatly increased, and the radius of curvature of the rounded portion on the lower side is 0.5 mm or more, which is larger than that on the upper side, so press molding The subsequent removal is also facilitated, the yield can be improved, and a ceramic substrate excellent in quality and reliability can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例である半導体パッケージ用の
セラミック基板を示す斜視図、第2図は第1図中のX−
X線断面図である。 第3図は本発明のセラミック基板を成形するためのプレ
ス装置を示す断面図である。 第4図は従来の半導体パッケージ用セラミック基板を示
す断面図である。 10:セラミック基板、11:上面 12:下面、13:外周面 14,17:段差、15,18……丸味部
FIG. 1 is a perspective view showing a ceramic substrate for a semiconductor package according to an embodiment of the present invention, and FIG.
It is an X-ray sectional view. FIG. 3 is a sectional view showing a pressing device for forming the ceramic substrate of the present invention. FIG. 4 is a sectional view showing a conventional ceramic substrate for a semiconductor package. 10: ceramic substrate, 11: upper surface 12: lower surface, 13: outer peripheral surface 14, 17: step, 15, 18, ... rounded portion

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】セラミックスよりなる基板において、プレ
ス成形時に上パンチ側となる上面と外周面との稜部に、
微小な段差と上記上面に連続する曲率半径が0.2〜1.0mm
の丸味部を形成するとともに、下パンチ側となる下面と
外周面との稜部に、微小な段差と上記下面に連続する曲
率半径が0.5〜1.0mmの丸味部をそれぞれ形成したことを
特徴とするセラミック基板。
In a substrate made of ceramics, a ridge between an upper surface and an outer peripheral surface which is an upper punch side at the time of press molding is provided.
The radius of curvature continuing from the minute step and the upper surface is 0.2 to 1.0 mm
In addition to forming the rounded portion, the ridge portion between the lower surface and the outer peripheral surface on the side of the lower punch, a minute step and a rounded portion having a radius of curvature continuous with the lower surface of 0.5 to 1.0 mm are formed. Ceramic substrate.
JP1064678A 1989-03-15 1989-03-15 Ceramic substrate Expired - Lifetime JP2740917B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1064678A JP2740917B2 (en) 1989-03-15 1989-03-15 Ceramic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1064678A JP2740917B2 (en) 1989-03-15 1989-03-15 Ceramic substrate

Publications (2)

Publication Number Publication Date
JPH02241049A JPH02241049A (en) 1990-09-25
JP2740917B2 true JP2740917B2 (en) 1998-04-15

Family

ID=13265067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1064678A Expired - Lifetime JP2740917B2 (en) 1989-03-15 1989-03-15 Ceramic substrate

Country Status (1)

Country Link
JP (1) JP2740917B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111300520B (en) * 2020-02-26 2021-07-20 杭州微芯测控电子有限公司 Fillet processing equipment for printed circuit board

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5762546A (en) * 1980-10-01 1982-04-15 Narumi China Corp Ceramic substrate for semiconductor package
JPS5925251A (en) * 1983-07-07 1984-02-09 Kyocera Corp Ceramic substrate

Also Published As

Publication number Publication date
JPH02241049A (en) 1990-09-25

Similar Documents

Publication Publication Date Title
US4703920A (en) Manufacturing method for integrated circuit chip carriers and work holder for use in the method
US6461940B1 (en) Dicing blade and method of producing an electronic component
EP1439575A3 (en) Semiconductor device with a lead frame and method of manufacturing the same
JP2740917B2 (en) Ceramic substrate
US4810616A (en) Manufacturing method for integrated circuit chip carriers
JP2523780B2 (en) Component recognition method in component mounting machine
JPH05338369A (en) Paste filling mask and paste filling method using same
US7390449B2 (en) Method of manufacturing ceramic material body
JP3325483B2 (en) Method of manufacturing glaze substrate for thermal head
JP3880799B2 (en) Method for manufacturing paper carrier tape
JPS61159341A (en) Manufacture of polygonal throw away tip having honing applied section
JP2003046206A (en) Ceramic substrate having dividing groove and its dividing method
JP2612843B2 (en) Ceramic substrate and insulating substrate for chip components
JPH08213719A (en) Ceramic board for chip-like electronic device and production thereof
JP3847210B2 (en) Ceramic substrate having divided grooves and manufacturing method thereof
JP3305673B2 (en) Ceramic substrate
JP4442964B2 (en) Ceramic substrate for electronic parts
JP3301927B2 (en) Method of manufacturing ceramic substrate having divided grooves
JPH0748409B2 (en) Ceramic substrate and manufacturing method thereof
JPS62196Y2 (en)
JP4683752B2 (en) Ceramic substrate having dividing grooves
JPH11163478A (en) Ceramic substrate having dividing groove
JPH0517594U (en) Nuclear fuel pellets
JP3007488B2 (en) Mold for cold isostatic pressing
JPH10156821A (en) Ceramic base having division grooves and resistor using the same

Legal Events

Date Code Title Description
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090130

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100130

Year of fee payment: 12

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100130

Year of fee payment: 12