JP2722557B2 - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JP2722557B2
JP2722557B2 JP63289476A JP28947688A JP2722557B2 JP 2722557 B2 JP2722557 B2 JP 2722557B2 JP 63289476 A JP63289476 A JP 63289476A JP 28947688 A JP28947688 A JP 28947688A JP 2722557 B2 JP2722557 B2 JP 2722557B2
Authority
JP
Japan
Prior art keywords
photosensitive resin
wiring board
printed wiring
resin layer
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63289476A
Other languages
Japanese (ja)
Other versions
JPH02134638A (en
Inventor
智明 浅野
圭祐 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP63289476A priority Critical patent/JP2722557B2/en
Publication of JPH02134638A publication Critical patent/JPH02134638A/en
Application granted granted Critical
Publication of JP2722557B2 publication Critical patent/JP2722557B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、印刷配線板の製造方法に関し、特に感光性
樹脂を使用したソルダーレジストの形成方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a printed wiring board, and more particularly to a method for forming a solder resist using a photosensitive resin.

〔従来の技術〕 従来、印刷配線基板への感光性樹脂を使用したソルダ
ーレジストの形成は、第2図に示すように、配線パター
ンを形成した印刷配線基板1上に、例えばスクリーン印
刷等の手段を用いて感光性樹脂層2を被着形成し(第2
図(A))、しかる後にフォトマスク3を介して紫外線
により露光し(第2図(B))、感光性樹脂層2の所望
部分のみを光重合させ、光重合していない部分を現像除
去する(第2図(C))ことにより形成していた。
[Prior Art] Conventionally, formation of a solder resist using a photosensitive resin on a printed wiring board is performed by, for example, screen printing or the like on a printed wiring board 1 on which a wiring pattern is formed as shown in FIG. To form a photosensitive resin layer 2 by using
(FIG. 2 (A)), and thereafter, it is exposed to ultraviolet rays through the photomask 3 (FIG. 2 (B)), and only the desired portion of the photosensitive resin layer 2 is photopolymerized, and the non-photopolymerized portion is removed by development. (FIG. 2C).

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

しかしながら、従来の印刷配線基板へのソルダーレジ
ストの形成方法では、露光−未露光の境界部においてエ
ッジの立ち上がりが甘くなり(アンダーカット量が大き
くなり)、高密度のソルダーレジスト被膜の形成が困難
であるという欠点を有していた。
However, in the conventional method of forming a solder resist on a printed wiring board, the rise of the edge is weak at the exposed-unexposed boundary (the amount of undercut is increased), and it is difficult to form a high-density solder resist film. There was a disadvantage that there is.

〔課題を解決するための手段〕 本発明はソルダーレジストの形成工程を含む印刷配線
板の製造方法において、配線パターンの形成された印刷
配線基板上に感光性樹脂層を被着形成させる工程と、こ
の感光性樹脂層を第1のフォトマスクを用いて密着露光
し光重合させる工程と、第1のフォトマスク上のパター
ンの輪郭線をパターンとした第2のフォトマスクを用い
て密着露光し、光重合させる工程と、感光性樹脂層の光
重合していない部分を現像除去する工程とを有すること
を特徴としている。
[Means for Solving the Problems] The present invention relates to a method for manufacturing a printed wiring board including a step of forming a solder resist, wherein a step of forming a photosensitive resin layer on a printed wiring board on which a wiring pattern is formed, A step of subjecting the photosensitive resin layer to close contact exposure using a first photomask and photopolymerizing, and a close contact exposure using a second photomask having a contour of a pattern on the first photomask as a pattern; The method is characterized by including a step of photopolymerizing and a step of developing and removing a non-photopolymerized portion of the photosensitive resin layer.

〔実施例〕〔Example〕

次に本発明について図面を参照して説明する。第1図
(A)〜(D)は本発明の第1の実施例の工程を示す断
面図である。まず、配線パターンを形成した印刷配線基
板1上に、スクリーン印刷により感光性樹脂層2を被着
形成した。ここで感光性樹脂層2としては大陽インキ
(株)製PSR−1000(商標)を使用し、スクリーン印刷
は、100メッシュのテトロンスクリーンにより硬度60の
スキージを用いて行なった。スクリーン印刷の後、90
℃,20分間の乾燥を行ない調粘用溶剤の除去を行なった
(第1図(A))。次に第1のフォトマスク4を感光性
樹脂層2に密着し、紫外線照射を行なった(第1図
(B))。さらに第1のフォトマスク4上に形成された
パターンの輪郭線をパターンとした第2のフォトマスク
5を感光性樹脂層2に密着し、紫外線照射を行なった
(第1図(C))。しかるのち、感光性樹脂層2の光重
合されていない部分を現像除去し、所望のソルダーレジ
スト6を得た。ここで、現像液としては、旭化成工業
(株)製エターナIR(商標)を使用した(第1図
(D))。
Next, the present invention will be described with reference to the drawings. FIGS. 1A to 1D are cross-sectional views showing the steps of the first embodiment of the present invention. First, the photosensitive resin layer 2 was formed on the printed wiring board 1 on which the wiring pattern was formed by screen printing. Here, PSR-1000 (trade name) manufactured by Taiyo Ink Co., Ltd. was used as the photosensitive resin layer 2, and screen printing was performed using a 100 mesh Tetron screen using a squeegee having a hardness of 60. After screen printing, 90
The mixture was dried at a temperature of 20 ° C. for 20 minutes to remove the viscosity adjusting solvent (FIG. 1 (A)). Next, the first photomask 4 was brought into close contact with the photosensitive resin layer 2 and irradiated with ultraviolet rays (FIG. 1 (B)). Further, a second photomask 5 having a pattern formed by the contour of the pattern formed on the first photomask 4 was brought into close contact with the photosensitive resin layer 2 and irradiated with ultraviolet rays (FIG. 1C). Thereafter, a portion of the photosensitive resin layer 2 where photopolymerization was not performed was removed by development to obtain a desired solder resist 6. Here, Eterna IR (trademark) manufactured by Asahi Kasei Kogyo Co., Ltd. was used as the developer (FIG. 1 (D)).

第1表は、本発明の第1の実施例1により形成したソ
ルダーレジストの形状を比較したものである。従来例で
は200mJ/cm2の紫外線照射では、100μ幅パターンの形成
は不可能であった。300mJ/cm2の照射により100μ幅パタ
ーンの形成は可能になったが、30μのアンダーカットを
生じている。一方、第1の実施例では、いずれの照射露
光量でも100μ幅パターンの形成は可能となり、 次に本発明の第2の実施例について説明する。第1の
実施例と同様に配線パターンを形成した印刷配線基板1
を用意し、デュポン(Du・pont)社製VACREL(商標)−
930ドライフィルムを100℃,2Kg/cm2の条件下でホットロ
ールラミネートし感光性樹脂層2を被着形成した(第1
図(A))。次に第1のフォトマスク4を感光性樹脂層
2に密着し、紫外線照射を行なった(第1図(B))。
さらに第1のフォトマスク4上に形成されたパターンの
輪郭線をパターンとした第2のフォトマスク5を感光性
樹脂層2に密着し、紫外線照射を行なった(第1図
(C))。しかるのち、感光性樹脂層2の光重合されて
いない部分を現像除去し所望のソルダーレジスト6を得
た。ここで現像液としては旭化成工業(株)製エターナ
NV(商標)を使用した(第1図(D))。
Table 1 compares the shapes of the solder resists formed according to the first embodiment of the present invention. In the conventional example, it was impossible to form a 100 μ width pattern by irradiating with 200 mJ / cm 2 ultraviolet rays. Irradiation at 300 mJ / cm 2 made it possible to form a pattern with a width of 100 μm, but caused an undercut of 30 μm. On the other hand, in the first embodiment, it is possible to form a pattern having a width of 100 μ at any exposure dose. Next, a second embodiment of the present invention will be described. Printed wiring board 1 on which a wiring pattern is formed as in the first embodiment
Prepared by DuPont's VACREL (trademark)-
A 930 dry film was hot roll-laminated under the conditions of 100 ° C. and 2 kg / cm 2 to form a photosensitive resin layer 2 (No. 1).
Figure (A)). Next, the first photomask 4 was brought into close contact with the photosensitive resin layer 2 and irradiated with ultraviolet rays (FIG. 1 (B)).
Further, a second photomask 5 having a pattern formed by the contour of the pattern formed on the first photomask 4 was brought into close contact with the photosensitive resin layer 2 and irradiated with ultraviolet rays (FIG. 1C). Thereafter, a portion of the photosensitive resin layer 2 where photopolymerization was not performed was removed by development to obtain a desired solder resist 6. Here, as a developing solution, Eterna manufactured by Asahi Kasei Corporation
NV ™ was used (FIG. 1 (D)).

第2表は、本発明の第2の実施例により形成したソル
ダーレジストの形状を比較したものである。従来例で
は、いずれの照射露光量でも100μ幅パターンの形成は
できたが、40μの大きなアンダーカットを生じた。これ
に対して第2の実施例では、アンダーカット量が10〜0
μと大幅に改善された。
Table 2 compares the shapes of the solder resists formed according to the second embodiment of the present invention. In the conventional example, a pattern having a width of 100 μm could be formed at any irradiation exposure amount, but a large undercut of 40 μm occurred. On the other hand, in the second embodiment, the undercut amount is 10 to 0.
μ was greatly improved.

〔発明の効果〕 以上説明したように、本発明によれば、感光性樹脂層
の露光−未露光境界部分において生じる半重合部分をエ
ッジ部分のみ二重に露光することによって重合を完全に
しアンダーカット量を減少せしめ高密度のソルダーレジ
ストの形成が可能になった。
[Effects of the Invention] As described above, according to the present invention, by partially exposing only the edge portion of the semi-polymerized portion generated at the exposed-unexposed boundary portion of the photosensitive resin layer, the polymerization is completed and the undercut is performed. The amount can be reduced and a high-density solder resist can be formed.

【図面の簡単な説明】[Brief description of the drawings]

第1図(A)〜(D)は、本発明の第1および第2の実
施例を工程順に示す縦断面図、第2図(A)〜(C)
は、従来例を工程順に示す縦断面図である。 1……印刷配線基板、2……感光性樹脂層、3……フォ
トマスク、4……第1のフォトマスク、5……第2のフ
ォトマスク、6……ソルダーレジスト。
1 (A) to 1 (D) are longitudinal sectional views showing the first and second embodiments of the present invention in the order of steps, and FIGS. 2 (A) to 2 (C).
1 is a longitudinal sectional view showing a conventional example in the order of steps. DESCRIPTION OF SYMBOLS 1 ... Printed wiring board, 2 ... Photosensitive resin layer, 3 ... Photomask, 4 ... First photomask, 5 ... Second photomask, 6 ... Solder resist.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】感光性ソルダーレジストの形成工程を含む
印刷配線板の製造方法において、配線パターンの形成さ
れた印刷配線基板上に感光性樹脂層を被着形成させる工
程と、前記感光性樹脂層を第1のフォトマスクを用いて
密着露光し光重合させる工程と、第1のフォトマスク上
のパターンの輪郭線をパターンとした第2のフォトマス
クを用いて密着露光し光重合させる工程と、前記感光性
樹脂層の光重合していない部分を現像除去する工程とを
有することを特徴とする印刷配線板の製造方法。
1. A method of manufacturing a printed wiring board including a step of forming a photosensitive solder resist, wherein a step of forming a photosensitive resin layer on a printed wiring board on which a wiring pattern is formed is provided. A step of photo-polymerizing by contact exposure using a first photomask; and a step of photo-polymerizing by contact exposure using a second photomask having a contour line of a pattern on the first photo mask as a pattern. Developing and removing the non-photopolymerized portion of the photosensitive resin layer.
JP63289476A 1988-11-15 1988-11-15 Manufacturing method of printed wiring board Expired - Fee Related JP2722557B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63289476A JP2722557B2 (en) 1988-11-15 1988-11-15 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63289476A JP2722557B2 (en) 1988-11-15 1988-11-15 Manufacturing method of printed wiring board

Publications (2)

Publication Number Publication Date
JPH02134638A JPH02134638A (en) 1990-05-23
JP2722557B2 true JP2722557B2 (en) 1998-03-04

Family

ID=17743767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63289476A Expired - Fee Related JP2722557B2 (en) 1988-11-15 1988-11-15 Manufacturing method of printed wiring board

Country Status (1)

Country Link
JP (1) JP2722557B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5743208B2 (en) * 2011-06-27 2015-07-01 日立化成株式会社 Circuit board manufacturing method

Also Published As

Publication number Publication date
JPH02134638A (en) 1990-05-23

Similar Documents

Publication Publication Date Title
US4264714A (en) Process for the manufacture of precision templates
JPH07261393A (en) Negative resist composition
NZ224921A (en) Photorelief plate: exposed from front and rear
JPS5569265A (en) Pattern-forming method
JP2722557B2 (en) Manufacturing method of printed wiring board
JP2000156377A (en) Resist pattern, its forming method and forming method of wiring pattern
JPH0810789B2 (en) Method for manufacturing printed wiring board
JPH0357697A (en) Printing metal mask and preparation thereof
JP3592805B2 (en) Photoresist pattern forming method
JPS62245251A (en) Resist pattern forming method
JP3183905B2 (en) Manufacturing method of metal printing plate
JP3170940B2 (en) Method of forming fine pattern
JP4013176B2 (en) Method for manufacturing printed wiring board
JPH0353587A (en) Formation of resist pattern
JPH01195450A (en) Photomask pattern producing method
JPH04303993A (en) Manufacture of printed wiring board
JPS6147692A (en) Method of producing printed circuit board
EP0559934A1 (en) Method and apparatus for deep UV image reversal patterning
US1532188A (en) Lithographic printing plate and process of preparing the same
JP2583365B2 (en) Manufacturing method of printed wiring board
JPH02144989A (en) Method of treating printed circuit board
US1426979A (en) Duplicating, manifolding, and the like
JPS61156044A (en) Production of resist stencil mask
JPS592395B2 (en) Method of forming thick film pattern
JP2551117B2 (en) Resist pattern formation method

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees