JP2680004B2 - Irradiation beam diameter evaluation element and evaluation method - Google Patents

Description

TECHNICAL FIELD The present invention relates to measurement of an incident beam diameter in an analysis using a beam of X-rays, ions, electrons and light, and particularly, a beam diameter evaluation suitable for an analysis using a fine beam. Element and beam diameter evaluation method. [Prior Art] Conventionally, in the above-mentioned beam utilization analysis, the incident beam diameter on a sample is measured by directly irradiating a beam on a substrate coated with a fluorescent material, or a region which emits fluorescence when the beam is directly irradiated on the photographic film. The blackened area on the film was measured by an optical microscope or visually. Further, there is disclosed a charged beam diameter measurement marker having a flat surface formed by embedding a marker material having a backscattering coefficient of a charged beam different from that of a substrate material in a substrate and having a flat surface composed of the substrate material and the marker material. It is described in Japanese Patent Publication No. 200984. [Problems to be Solved by the Invention] In fine beam utilization analysis, it is important to measure the effective analysis area on the sample in a state in which the incident beam system, the sample system, and the detection system are integrated. However, in the conventional technique, it was possible to measure the diameter (area) of the incident beam itself, but it was difficult to evaluate the effective analysis region. Further, in the measurement method using a fluorescent plate, it is necessary to measure with an optical microscope at the time of beam irradiation. Since the sample system is in a vacuum chamber in an electron or ion beam utilization device, and it is dangerous in an X-ray utilization device, it is long. It is necessary to use a focusing microscope. as a result,
When the irradiation beam diameter on the fluorescent plate is 5 to 10 μm or less, there is a problem that it is difficult to measure the irradiation diameter. Further, in the photographic film method, it is not necessary to observe with a microscope during beam irradiation as described above, but it is difficult to measure a fine beam of several μm or less due to the size of silver particles coated on the film. An object of the present invention is to enable an effective analysis area measurement in which the entire system is included in an analyzer, and to measure a fine analysis area of several μm or less with high accuracy. [Means for Solving the Problems] The above object has a surface composed of two or more kinds of substances having different elements or states, and at least one kind of the substances in the surface is different from the other kind. Irradiation beam area evaluation, characterized in that a plurality of regions surrounded by a substance or substance group and having different areas are formed in the size before and after the assumed incident beam diameter made of the enclosed substance (enclosed substance) This is accomplished by making a device for use and evaluating the irradiation beam area using the device. The regions of the plurality of surrounding materials preferably have the same structure but different areas (that is, similar shapes). The element is formed by forming a film to be the surrounding material on a predetermined substrate, then removing a predetermined portion of the film by a lithography technique and an etching technique using plasma or the like, and then enclosing it only in a holed portion. The substance to be formed is embedded by the film forming technique and the pattern forming technique. [Operation] The element formed by the above method is set at the sample setting position of the analyzer for measuring the effective analysis area, and the beam is first irradiated to the surrounding substance area smaller than the incident beam diameter assumed on the element. Then, it is confirmed that the detector detects a signal composed of both the surrounding substance and the surrounding substance. Next, irradiate the beam to the area having a large area of the surrounding material,
Signals composed of both substances are detected in the same manner. The area of the substance to be enclosed is gradually increased, the signal of the enclosed substance disappears, and the area of the region where the signal of only the enclosed substance is detected is measured. This value becomes the effective analysis area that integrates the entire analyzer system. By applying an electron beam or X-ray exposure technique in producing the above device, the diameter of the material region to be enclosed can be finely formed to 0.1 to 0.2 μm. The embodiment of the present invention will be described above with reference to FIG. Al of 2 nm is deposited on Si substrate 1 by 500 nm, and 0.1 to 10 is deposited at a predetermined position of Al by the lithography technique using the electron beam exposure apparatus and the reactive ion etching technique.
Holes having different diameters of 0.1 μm were opened up to μm. Next, W and 3 were deposited to a thickness of 500 nm, Al was removed by the same patterning technique as described above, and W was left only in the portions where holes were formed, to form an analysis area evaluation element of the present invention. Applying this device to X-ray diffraction and fluorescent X-ray analysis equipment using fine-bundle X-ray beam, and measuring the effective analysis area of about 5 μm diameter with accuracy of 0.1 μm, which was previously impossible. I was able to. Also, the same device was applied to a secondary ion mass spectrometer using fine primary ions, and it was confirmed that this device can analyze a fine region with a diameter of 0.3 μm. In addition, it is desirable that the above-mentioned elements be a combination having the highest sensitivity in the target analyzer. [Advantages of the Invention] According to the present invention, the beam diameter is not evaluated by a substitute such as a fluorescent plate or a photographic film as in the conventional case, and the beam diameter is finer by about one digit or more than in the conventional method under the actual measurement conditions. Since the area of the analysis region can be measured with high accuracy, it is effective for beam irradiation, sample holding, and design of the detection system when developing an analysis device using ultrafine X-rays, ions, electrons, and a light beam.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows a cross-section of an analysis region evaluation element according to an embodiment of the present invention and a positional relationship between a beam source, a detector, an incident beam and a reflected beam of an analyzer. FIG. 2 is a top view of the same positional relationship. 1 ... Substrate, 2 ... Enclosing material, 3 ... Enclosed material,
4 ... Incident beam, 5 ... Reflected beam, 6 ... Beam source, 7 ... Detector, 8 ... Beam irradiation area.

   ────────────────────────────────────────────────── ─── Continuation of front page    (72) Inventor Yoshinori Hosokawa               2 Miyanohigashicho, Kichijoin, Minami-ku, Kyoto, Kyoto                 HORIBA, Ltd. (72) Inventor Kenji Yoshino               2 Miyanohigashicho, Kichijoin, Minami-ku, Kyoto, Kyoto                 HORIBA, Ltd.                (56) References JP-A-59-200984 (JP, A)                 62-109342 (JP, U)

Claims (1)

(57) [Claims] It is composed of a plurality of substances having different elements or states, at least one of the plurality of substances is an enclosing substance, other substances are enclosing substances, and a region of the enclosing substance is formed of the enclosing substance. A region having a surface surrounded by a region, the region made of the enclosed substance on the surface is constituted by a set of a plurality of regions having different areas in area, and the area of the plurality of regions is desired. An irradiation beam diameter evaluation element characterized in that the diameters thereof are made to differ stepwise at intervals of the diameter of measurement accuracy. 2. At least one of the plurality of substances is composed of a plurality of substances having different elements or states at a sample setting position of an apparatus that irradiates the sample with a beam of X-rays, ions, electrons, or light.
One substance is the surrounding substance, the other substance is the surrounding substance, and has a surface surrounded by a region consisting of the surrounding substance, the region consisting of the surrounding substance, the region consisting of the surrounding substance on the surface is , An irradiation beam diameter that is configured by a set of a plurality of regions having stepwise different areas, and the areas of the plurality of regions have stepwise different diameters at intervals of diameters of a desired measurement accuracy. Place an evaluation element, the beam, in a region consisting of the surrounding material on the element placed previously, smaller than the expected irradiation beam area to be measured, or stepwise from a large region, or Sequential irradiation to a small area region, detecting the signal generated from the element by irradiation of the beam, in the detected signal, when the signal component generated from the surrounding substance disappears, or the The signal component generated from 囲物 matter is irradiated with the beam for the first time entering time point based on the area of the region consisting of the surrounding material, the irradiation beam diameter evaluation method and obtaining the illumination beam diameter.