JP2660758B2 - Manufacturing method of PLZT display device - Google Patents

Description

The present invention relates to an electrode structure of a PLZT display device using birefringence of PLZT (transparent ceramic), and more particularly, to a drive voltage lowering and a finer structure. The present invention relates to a method for manufacturing a PLZT display device which enables a simple wiring pattern and can be used as a two-dimensional optical shutter array or a panel display.

[Prior art example] In recent years, a transparent ceramic PLZT (P
(bO, LaO, ZrO ₂ , TiO) are being used for optical shutters and displays. When this PLZT is used as an optical shutter or a display, for example, a surface electrode shown in FIG. 6 or a grooved electrode shown in FIG. 7 is employed. In FIG. 6, a drive electrode 2 and a common electrode (GND electrode) 3 are formed on a PLZT substrate 1 by a method such as vapor deposition. In FIG. 7, the PLZT substrate 1 has
For example, the drive electrode 4 and the common electrode (GN) in which an electrode is embedded in a groove formed by machining or etching of a dicing cutter or the like.
D) 5 is formed. This groove-type electrode structure has an advantage that the driving voltage can be reduced because the electric field distribution in the PLZT substrate 1 becomes better than the surface electrode structure.

[Problems to be Solved by the Invention] As shown in FIG. 8, when the above-mentioned optical shutter array or panel display is constructed, it is necessary to further reduce the driving voltage. The drive electrode 6 and the common electrode 7 are often used.

However, in the case of the above-mentioned surface electrode structure, although it is easy to make it into a comb shape, there is a limit to the reduction in low drive voltage.

In the case of the above-mentioned grooved electrode structure, complicated pattern processing is difficult by machining or etching of a dicing cutter or the like, and it is difficult to manufacture a fine optical shutter array or panel display.

The present invention has been made in view of the above problems, and an object of the present invention is to enable a low drive voltage and obtain a fine optical shutter array and a panel display.
An object of the present invention is to provide a method for manufacturing a PLZT display device.

Means for Solving the Problems In order to achieve the above object, the present invention provides a drive electrode and a common electrode each having a comb shape at a predetermined interval on a PLZT wafer and having an electrode lead-out portion. GND), and a PLZT film of a predetermined thickness is formed on the same electrode layer, and the same electrode layer as the above-mentioned electrode layer is formed on the PLZT film between the comb-shaped driving electrodes, The common electrodes and the electrode lead portions overlap each other, and the electrode lead portions are electrically connected to each other, and the PLZT film and the electrode layer are alternately and repeatedly laminated a predetermined number of times. .

[Action]

According to this configuration, since the electrode layer and the layer of the PLZT film are repeatedly laminated, the drive electrode and the common electrode of the electrode layer are in the vertical direction as shown by the two-dot chain line in FIG. And is shaped to correspond to the grooved electrode. That is, since the electric field distribution of the laminated electrode is comparable to that of the grooved electrode, a reduction in driving voltage can be expected as in the case of the grooved electrode. In addition, the drive voltage can be further reduced by increasing the number of layers.

In addition, the drive electrode and the common electrode can be made into a comb shape by thin film technology, etc., and a complicated wiring pattern is possible, making it possible to obtain a PLZT display device for an optical shutter array or panel display, which is difficult with a groove type electrode. it can.

Further, the electrode lead-out portion of the upper electrode layer and the electrode lead-out portion of the lower electrode layer are electrically connected with the lamination, so that it is not necessary to connect the electrode lead portions after the lamination.

Embodiment An embodiment of the present invention will be described below with reference to FIGS.

In FIG. 1, a PLZT display device has a comb-shaped drive electrode 9 and a common electrode on a PLZT wafer 8 of a predetermined size.
An electrode layer made of 10 is formed, and a PLZT film 11 is formed on this electrode layer.
The film 11 is formed alternately.

Therefore, as shown in FIGS. 2 and 3,
A drive electrode 9 and a common electrode 10 each having a comb shape on a PLZT wafer 8 and having electrode lead portions 91 and 101, respectively.
After the electrode layer made of is formed, a PLZT film 11 having a predetermined thickness is formed on the electrode layer by a sputtering method or the like.

Subsequently, as shown in FIGS. 4 and 5,
On the PLZT film 11, an electrode layer including a drive electrode 9 and a common electrode 10, which are also comb-shaped and each have electrode lead portions 92 and 102, is formed. At this time, as shown in FIG. 4A and FIG. 5A, each electrode lead portion 92 is connected to the lower electrode lead portion 91, and the electrode lead portion 102 is connected to the lower electrode lead portion 101. The electrode lead portions 92 and 102 are formed.

By repeating this stacking, a stacked PLZT display device as shown by the broken line in FIG. 1 is obtained.

Although FIGS. 1 to 5 illustrate a pair of electrodes, the same applies to a plurality of electrode pairs. Further, the drive electrode 9 and the common electrode 10 are not limited to the comb shape, but may have other shapes.

In this way, as shown by the two-dot chain line in FIG. 1, the same comb-shaped drive electrode 9 and common electrode 10 are stacked, so that the drive electrodes 9, 9,. 1
With 0,..., It is possible to obtain an electric field equivalent to that of the groove type electrode having a depth corresponding to the lamination. Therefore, the PLZT display device having an electrode structure comparable to the groove type electrode can drive a much lower voltage than the conventional flat type electrode.

Also, the comb-shaped drive electrodes 9, 9,... And the common electrodes 10, 1
Because a normal thin film process or the like can be used for 0,..., A complicated wiring pattern can be formed, and a fine optical shutter array, a panel display, and the like can be manufactured.

[Effect of the Invention] As described above, according to the method for manufacturing a PLZT display device of the present invention, a comb-shaped drive electrode and a common electrode are formed on a PLZT wafer, and a PLZT film is formed on this electrode layer. In the same manner, the electrode layer and the PLZT film-forming layer were laminated, and at the time of the lamination, the electrode lead portions of the drive electrode and the electrode lead portions of the common electrode were electrically connected to each other. Since the electrodes (driving electrode and common electrode) can obtain an effect comparable to that of a grooved electrode having a depth corresponding to the lamination, the driving voltage can be reduced by that amount, and the flat electrode forming technology and thin film process And the like can be used, so that a complicated wiring pattern can be formed, and there is an effect that a fine optical shutter array, a panel display, and the like can be manufactured.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of an electrode structure of a PLZT display device showing an embodiment of the present invention, and FIGS.
6 to 8 are schematic cross-sectional views and perspective views for explaining an electrode structure of a conventional PLZT display device, for explaining a manufacturing process of the ZT display device. In the drawing, 8 is a PLZT substrate, 9 is a drive electrode (comb type), 10 is a common electrode (GND; comb type), 11 is a PLZT film, and A is a connection portion (between electrodes).

Claims (1)

(57) [Claims] An electrode layer including a drive electrode and a common electrode (GND) each having a comb shape and having an electrode lead-out portion is formed on a PLZT wafer at a predetermined interval. A PLZT film having a predetermined thickness is formed on the PLZT film, and the same electrode layer as the above-mentioned electrode layer is formed on the PLZT film with the comb-shaped drive electrodes, the comb-shaped common electrodes, and the electrode lead portions overlapped with each other. A method for manufacturing a PLZT display device, wherein the PLZT film and the electrode layer are alternately and repeatedly laminated a predetermined number of times so that the lead portions are electrically connected to each other.