JP2655936B2 - Release method of substrate for optical recording medium - Google Patents

Release method of substrate for optical recording medium

Info

Publication number
JP2655936B2
JP2655936B2 JP18795790A JP18795790A JP2655936B2 JP 2655936 B2 JP2655936 B2 JP 2655936B2 JP 18795790 A JP18795790 A JP 18795790A JP 18795790 A JP18795790 A JP 18795790A JP 2655936 B2 JP2655936 B2 JP 2655936B2
Authority
JP
Japan
Prior art keywords
release agent
release
mold
substrate
air
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP18795790A
Other languages
Japanese (ja)
Other versions
JPH0474623A (en
Inventor
信幸 細井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP18795790A priority Critical patent/JP2655936B2/en
Publication of JPH0474623A publication Critical patent/JPH0474623A/en
Application granted granted Critical
Publication of JP2655936B2 publication Critical patent/JP2655936B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/83Lubricating means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光記録媒体用基板の成形方法に関し、特に
型(スタンパー)から光記録媒体用基板を離型する方法
に関するものである。
Description: TECHNICAL FIELD The present invention relates to a method for molding an optical recording medium substrate, and more particularly to a method for releasing an optical recording medium substrate from a mold (stamper).

〔従来の技術〕[Conventional technology]

従来、CD(コンパクトディスク)、ビデオディスク、
DRAWディスク、光磁気ディスク等の光学的に情報を記録
再生する光ディスクの基板の成形方法としては射出成形
法、2P法等が一般的に用いられている。
Conventionally, CD (compact disc), video disc,
Injection molding, 2P, and the like are generally used as a method for molding a substrate of an optical disk such as a DRAW disk or a magneto-optical disk that optically records and reproduces information.

射出成形法を用いて基板を成形する際、特に小さなピ
ットや案内溝を有する光ディスクの場合には、成形され
た基板とスタンパとの離型抵抗が大きくなるために芳香
族ポリカーボネートなどの成形材料中に離型剤と呼ばれ
る一種の界面活性剤を添加して離型を促すことが一般に
行なわれている。
When molding a substrate using an injection molding method, particularly in the case of an optical disc having small pits or guide grooves, the mold release resistance between the molded substrate and the stamper is increased, so that the molding material such as aromatic polycarbonate is used. It is a common practice to add a type of surfactant called a mold release agent to the mold to promote mold release.

しかしながら、離型剤を成形材料に内部添加して得ら
れた成形基板から離型剤を完全に除去することは困難で
あり、そのことがその後の光記録膜の成膜プロセスでト
ラブルを起こしたり、光ディスクの保存特性に悪影響を
及ぼすことが指摘されている。そのため成形基板から離
型剤をなるべく除去できるような洗浄プロセスの開発が
重要な課題となっていた。
However, it is difficult to completely remove the release agent from the molded substrate obtained by internally adding the release agent to the molding material, which may cause trouble in the subsequent optical recording film formation process. It is pointed out that the storage characteristics of the optical disk are adversely affected. Therefore, development of a cleaning process that can remove a release agent from a molded substrate as much as possible has been an important issue.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

前述のように、基板とスタンパとの離型の改善という
点では離型剤の効果は優れるものの、後工程や製品の安
定性を考えると極力添加量を少なくするか、もしくは添
加した離型剤をなるべく除去するような洗浄プロセスを
設定する必要があるが、離型剤無添加では離型が困難で
製造効率の低下や基板表面の荒れ等が生じ、又洗浄プロ
セスを設けた場合は製造プロセスの煩雑化を招く一方、
完全除去は困難で、残存した離型剤の影響は避けられな
かった。
As described above, although the effect of the release agent is excellent in terms of improving the release between the substrate and the stamper, considering the post-process and the stability of the product, the amount of the release agent should be reduced as much as possible or the added release agent It is necessary to set up a cleaning process that removes as much as possible, but without the release agent, it is difficult to release the mold, resulting in reduced production efficiency and roughening of the substrate surface. On the other hand,
Complete removal was difficult and the effects of the remaining release agent were unavoidable.

本発明は、上記従来技術の現状に鑑みなされたもの
で、新規な離型剤使用態様により、有効に基板を型から
離型する方法を提供するものである。
The present invention has been made in view of the above-mentioned state of the art, and provides a method of effectively releasing a substrate from a mold by using a novel release agent.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、離型剤を成形材料中に内部添加せず、射出
成形・離型の工程中に離型剤をガス状態にして金型内に
導入することを特徴とする。すなわち、第1の態様とし
て、射出成形により光記録媒体用基板を金型内で成形
し、該型から該基板を離型する工程において、射出成形
前に金型内に離型剤をガス状で導入することを特徴とす
る前記基板の離型方法、及び第2の態様として、同じく
射出成形、離型の工程において、ガス状の離型剤の存在
下で射出成形を行うことを特徴とする前記基板の離型方
法である。
The present invention is characterized in that the release agent is not added internally to the molding material, but is introduced into the mold in a gas state during the injection molding and release steps. That is, as a first embodiment, in a step of molding a substrate for an optical recording medium in a mold by injection molding and releasing the substrate from the mold, a release agent is injected into the mold in a gaseous state before injection molding. The method for releasing a substrate described above, and as a second aspect, also in the step of injection molding and release, performing injection molding in the presence of a gaseous release agent. A method of releasing the substrate.

この方法によれば、離型剤の使用量が少なくても優れ
た離型効果を発揮させることができると同時に基板中に
含浸される量も低減できるため、基板の洗浄も内添した
場合に比べプロセスが簡単で短時間化を図ることができ
る。
According to this method, even when the amount of the release agent used is small, an excellent release effect can be exhibited, and at the same time, the amount impregnated in the substrate can be reduced. The process is simpler and the time can be shortened.

まず、本発明において、対象となる光記録媒体用基板
としては、光学的には情報を記録、再生する各種光ディ
スク又は光カード用の基板であり、射出成形により金型
内で成形するものである。一般に、該金型はスタンパを
有する可動側半分と、固定側型半分から成り、基板を射
出成形後、可動側型半分を開いて基板を型より離型させ
る構造となっている。又、離型は通常圧縮エアーの吹出
によるガス圧力による作用及び機構的動作による作用の
両者により実施される。圧縮エアーの吹出は可動側と固
定側の両者から行われる。スタンパとしては通常用いら
れるものについて本発明を適用できる。
First, in the present invention, the target optical recording medium substrate is a substrate for various optical disks or optical cards for optically recording and reproducing information, and is formed in a mold by injection molding. . Generally, the mold comprises a movable half having a stamper and a fixed half, and after injection molding of the substrate, the movable half is opened to release the substrate from the mold. In addition, the mold release is usually carried out both by the action of gas pressure by blowing compressed air and by the action of mechanical operation. The compressed air is blown from both the movable side and the fixed side. The present invention can be applied to a commonly used stamper.

このような射出成形・離型工程において、本発明では
離型剤をガス状態で金型内へ導入する。導入のタイミン
グは、第1の態様として射出成形直前である。すなわ
ち、離型後、次の射出成形の始まる前に離型剤を含む気
流を金型内に導入して、スタンパ表面に数分子層の離型
剤被膜を形成させることによってその効果を発揮させる
ものである。この態様においては、離型剤を含むガスを
金型に設けられている離型エアー吹出通路(固定側、可
動側のどちらでもよい)を通じて金型内に導入してもよ
いし、又、別途専用パイプを設けて導入してもよい。離
型剤の該ガス中の濃度は10〜500mg/程度でよく、1回
の成形の金型中に導入する該ガスの量により適宜設定す
ればよい。導入ガスの圧力、流量は本質的な問題ではな
いが、離型剤分子層の効率的で均一な形成という見地か
ら、2〜7kg/cm2程度が好ましい。これにより、射出成
形用の樹脂が金型内に導入される前にスタンパ表面に有
効に離型剤分子層を形成することができる。離型剤分子
層は通常数分子層でよいが、薄すぎれば離型剤の離型効
果が得られず、厚すぎれば不均一化したり、成形品中に
必要以上に含浸されることになる。離型エアー中に離型
剤を含有させておく場合は、可動側離型エアー中に離型
剤を含有させることにより、成形後の基板を可動側から
離型すると同時に可動側のスタンパ表面に離型剤の数分
子層を被膜することができ、離型剤導入のステップを別
途設けなくてすむ。但し、この場合は、離型後の基板表
面にも離型剤含有エアーが当り離型剤が若干付着するこ
とになるが、これは洗浄プロセスで容易に除去できる。
In such an injection molding / release process, in the present invention, a release agent is introduced into a mold in a gaseous state. The timing of introduction is immediately before injection molding as the first mode. That is, after the release, before the start of the next injection molding, an air flow containing the release agent is introduced into the mold, and the effect is exhibited by forming a release layer of several molecular layers on the surface of the stamper. Things. In this embodiment, the gas containing the release agent may be introduced into the mold through a release air blowing passage (either fixed side or movable side) provided in the mold, or separately. A dedicated pipe may be provided and introduced. The concentration of the release agent in the gas may be about 10 to 500 mg /, and may be appropriately set according to the amount of the gas introduced into the mold for one molding. The pressure and flow rate of the introduced gas are not essential, but are preferably about 2 to 7 kg / cm 2 from the viewpoint of efficient and uniform formation of the release agent molecule layer. Thus, a release agent molecule layer can be effectively formed on the surface of the stamper before the resin for injection molding is introduced into the mold. The release agent molecule layer is usually a few molecular layers, but if it is too thin, the release effect of the release agent cannot be obtained, and if it is too thick, it becomes uneven or impregnated into the molded product more than necessary. . When the mold release agent is contained in the mold release air, the mold release agent is contained in the movable mold release air, so that the molded substrate is released from the mold mold at the same time as the mold release from the mold mold. Several molecular layers of the release agent can be coated, eliminating the need for a separate step of introducing the release agent. However, in this case, the release agent-containing air hits the surface of the substrate after release, and the release agent slightly adheres, but this can be easily removed by the cleaning process.

次に、本発明の別の態様では、ガス状の離型剤の存在
下で射出成形を行う。この場合は、離型剤含有エアーの
導入を成形と同時あるいは直前に行い、成形時に金型内
に離型剤がガス状で存在しているようにする。これによ
り樹脂が射出される際、スタンパと樹脂の界面に離型剤
分子が入り込むので、ほぼ前記と同様の効果を得ること
ができる。成形時に金型内に存在している離型剤濃度は
10〜500mg/程度でよい。
Next, in another embodiment of the present invention, injection molding is performed in the presence of a gaseous release agent. In this case, the release agent-containing air is introduced at the same time as or immediately before molding, so that the release agent is present in a gaseous state in the mold at the time of molding. Thus, when the resin is injected, the release agent molecules enter the interface between the stamper and the resin, so that substantially the same effect as described above can be obtained. The concentration of the release agent present in the mold during molding is
The dose may be about 10 to 500 mg /.

本発明において用いることのできる離型剤としては、
ステアリン酸ブチル、ステアリン酸アミル、パルミチン
酸ブチル、ミリスチン酸ブチル等、その他公知の離型剤
をいずれも用いうる。
As the release agent that can be used in the present invention,
Any other known release agents such as butyl stearate, amyl stearate, butyl palmitate, butyl myristate, and the like can be used.

離型剤をガス状にして導入する手段としては、第1図
に示す構成による装置を用いるとよい。即ち、離型剤3
を加熱手段2を備えた密ぺい容器に収納し、離型剤3を
加熱し、これに例えば離型エアー1を通過させ、バブリ
ングをし、離型剤を含有させたエアー4として取り出
し、これを金型内へ導入する。該容器に導入する気体は
エアーでよく、離型エアーでもよいし、又別個金型内へ
導入するエアーでもよい。加熱温度は離型剤の一部が気
化する程度までであり、具体的には例えば80〜150℃程
度でよい。エアー中の離型剤の濃度は加熱温度、エアー
導入圧力、バブリング程度により調整できる。又、金型
内の温度は好ましくは導入する離型剤含有エアーの温度
と同程度以上である。ガス状の離型剤を凝縮させないた
めである。
As a means for introducing the release agent in a gaseous state, an apparatus having the configuration shown in FIG. 1 may be used. That is, the release agent 3
Is placed in a tight container provided with a heating means 2 and the mold release agent 3 is heated, for example, the mold release air 1 is passed therethrough, bubbled, and taken out as air 4 containing the mold release agent. Is introduced into the mold. The gas introduced into the container may be air, release air, or air introduced into a separate mold. The heating temperature is such that a part of the release agent is vaporized, and specifically, may be, for example, about 80 to 150 ° C. The concentration of the release agent in the air can be adjusted by the heating temperature, the air introduction pressure, and the degree of bubbling. The temperature in the mold is preferably equal to or higher than the temperature of the release agent-containing air to be introduced. This is because the gaseous release agent is not condensed.

離型エアーの通路を利用して離型剤含有エアーを金型
内へ導入するには、離型エアーと離型剤含有エアーとを
バルブで切り換えるような配管をすればよいし、離型エ
アーをそのまま用いる場合は前述装置を途中に入れてお
けばよい。
In order to introduce the release agent-containing air into the mold by using the release air passage, a pipe that switches between the release air and the release agent-containing air with a valve may be used. In the case where is used as it is, the above device may be inserted in the middle.

離型剤をガス状でエアー中に含有させる手段としては
前述装置に限らず、例えば加熱雰囲気で噴霧してから大
きなミストを除去する等により実施してもよい。
The means for allowing the release agent to be contained in the air in gaseous form is not limited to the above-described apparatus, but may be implemented by, for example, spraying in a heated atmosphere and then removing large mist.

次に、本発明の離型方法により得られた成形基板は洗
浄プロセスに付するが、該プロセスは公知の技術に基づ
き行うことができる。但し、本発明による基板は離型剤
の含浸程度が、従来技術によるものと比較し著しく低減
しているため、洗浄プロセスの簡略化を図ることができ
る。洗浄プロセスの簡略化としては、洗浄時間の短縮、
洗浄槽の槽数減少等であるが、場合によってはまったく
洗浄プロセスをとらなくてもよい。
Next, the molded substrate obtained by the mold release method of the present invention is subjected to a cleaning process, which can be performed based on a known technique. However, since the degree of impregnation of the release agent in the substrate according to the present invention is significantly reduced as compared with that according to the prior art, the cleaning process can be simplified. The simplification of the cleaning process includes shortening the cleaning time,
Although the number of cleaning tanks is reduced, the cleaning process may not be required at all in some cases.

〔実施例〕〔Example〕

以下に示す、実施例1,2、比較例1,2において成形基板
を得、それぞれを評価した。
Molded substrates were obtained in Examples 1 and 2 and Comparative Examples 1 and 2 shown below, and each was evaluated.

実施例1 分子量20,000の芳香族ポリカーボネート樹脂を用い、
スタンパとしてアドレスピットと案内溝を有するNi型ス
タンパを使用し、厚さ1.2mm、直径130mmの光ディスク基
板を射出成形した。この際、金型温度を100℃に設定
し、離型エアー(可動側離型エアー)は第1図に示すよ
うに離型剤としてステアリン酸ブチル(100℃に加熱)
を満たした装置を通過させてから5kg/cm2の圧で使用し
た(離型エアー中の離型剤濃度は200mg/程度)。
Example 1 Using an aromatic polycarbonate resin having a molecular weight of 20,000,
A Ni-type stamper having an address pit and a guide groove was used as a stamper, and an optical disk substrate having a thickness of 1.2 mm and a diameter of 130 mm was injection-molded. At this time, the mold temperature was set to 100 ° C., and the release air (movable-side release air) was butyl stearate (heated to 100 ° C.) as a release agent as shown in FIG.
After passing through a device filled with, the pressure was used at a pressure of 5 kg / cm 2 (the release agent concentration in the release air was about 200 mg / cm 2).

実施例2 離型剤としてパルミチン酸ブチルを用いる以外は実施
例1と同様に成形を行なった。
Example 2 Molding was performed in the same manner as in Example 1 except that butyl palmitate was used as a release agent.

比較例1 離型剤としてステアリン酸ブチルを用い、実施例1で
使用した芳香族ポリカーボネート樹脂と同一の樹脂に0.
5wt%となるように離型剤を均一に予め内部添加した樹
脂組成物ならびに離型剤ガスを含まない離型エアーを使
用して、他は実施例1と同様に基板の成形を行なった。
Comparative Example 1 Using the same resin as the aromatic polycarbonate resin used in Example 1 except that butyl stearate was used as a mold release agent, 0.1% was used.
Substrates were formed in the same manner as in Example 1 except that a resin composition in which a release agent was uniformly added in advance so as to be 5 wt% and a release air containing no release agent gas were used.

比較例2 離型剤を全く使用しないで、他は実施例1と同様の条
件で基板の成形を行なった。
Comparative Example 2 A substrate was molded under the same conditions as in Example 1 except that no release agent was used.

以上の実施例および比較例で得られた基板を目視検査
により離型不良の判定をしたところ、比較例2において
はスジ状の離型不良根跡が多数観察されたが、実施例
1、2および比較例1にはいずれもそのような離型不良
はみられなかった。
When the substrate obtained in each of the above Examples and Comparative Examples was visually inspected to determine the release failure, in Comparative Example 2, many streaky traces of the release failure were observed. In Comparative Example 1, no such release failure was observed.

また、得られた基板をアニール(80℃、20hr.)し、
純水およびフロンによる同一の洗浄条件で洗浄した後、
下記の構成で光磁気記録膜および保護膜を成膜した。
The obtained substrate was annealed (80 ° C, 20hr.)
After washing under the same washing conditions with pure water and Freon,
A magneto-optical recording film and a protective film were formed in the following configuration.

PC/SiN(500Å)/TbFeCo(500Å)/SiN(500Å) それに裏打ち基板をホットメルト接着剤で貼り合わせ
て光磁気ディスクを得た。これらのディスクを70℃、90
%RHの環境中に1000hr.保存した後、記録膜の状態を目
視および光学顕微鏡観察にて比較した。その結果、比較
例1ではピンホール、膜フクレなどの不良が発生してい
たが、他はそのような膜不良はみられなかった。
PC / SiN (500Å) / TbFeCo (500Å) / SiN (500Å) A backing substrate was bonded with a hot melt adhesive to obtain a magneto-optical disk. Keep these discs at 70 ° C, 90
After being stored for 1000 hours in an environment of% RH, the states of the recording films were compared visually and with an optical microscope. As a result, in Comparative Example 1, defects such as pinholes and film blisters occurred, but no other film defects were observed.

以上の結果、本発明に基づく実施例1及び2では離型
が良好で、又洗浄も有効になし得、離型工程に起因する
弊害は認められなかった。
As a result, in Examples 1 and 2 based on the present invention, the mold release was good and the washing could be effectively performed, and no adverse effect due to the mold release step was observed.

〔発明の効果〕〔The invention's effect〕

以上説明したように、光ディスクの射出成形において
離型剤を含む気流を金型内に導入する工程を加えること
によって、基板内に残留する離型剤量を低減し保存安定
性に優れた光ディスク基板を得ることができる。さら
に、離型剤の洗浄プロセスの簡略化を図ることができ
る。又、離型剤は簡易な手段により離型エアー中に含有
させることができ、これにより基板製造プロセスを何ら
複雑化することなく、離型剤を金型内へ容易に導入する
ことができる。
As described above, by adding a step of introducing an air flow containing a release agent into a mold in injection molding of an optical disk, the amount of the release agent remaining in the substrate is reduced, and the optical disk substrate excellent in storage stability is added. Can be obtained. Further, the cleaning process of the release agent can be simplified. In addition, the release agent can be contained in the release air by a simple means, whereby the release agent can be easily introduced into the mold without complicating the substrate manufacturing process at all.

【図面の簡単な説明】[Brief description of the drawings]

第1図は離型エアー中に離型剤ガスを含ませるのに用い
ることのできる装置の構成を示す模式図である。 1:離型エアー 2:ヒーター 3:離型剤 4:離型剤ガスを含む離型エアー
FIG. 1 is a schematic diagram showing the configuration of an apparatus that can be used to contain a release agent gas in release air. 1: Release air 2: Heater 3: Release agent 4: Release air containing release agent gas

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】射出成形により光記録媒体用基板を金型内
で成形し、離型剤を用いて該型から該基板を離型する工
程において、離型剤をガス状態で金型内へ導入すること
を特徴とする前記基板の離型方法。
In a step of molding a substrate for an optical recording medium in a mold by injection molding and releasing the substrate from the mold using a release agent, the release agent is introduced into the mold in a gaseous state. The method for releasing a substrate, comprising: introducing the substrate;
【請求項2】前記ガス状態の離型剤が、基板の射出成形
前に予め金型内へ導入される請求項1に記載の離型方
法。
2. The method according to claim 1, wherein the release agent in a gaseous state is introduced into a mold before injection molding of the substrate.
【請求項3】前記ガス状態の離型剤が、基板の射出成形
時に金型内にガス状態で存在している請求項1に記載の
離型方法。
3. The method according to claim 1, wherein the release agent in a gaseous state is present in a gaseous state in a mold at the time of injection molding of the substrate.
【請求項4】前記ガス状態の離型剤の導入を、離型の際
に用いられる離型エアー中に含有させて行う請求項1に
記載の離型方法。
4. The release method according to claim 1, wherein the release agent in the gaseous state is introduced into release air used for release.
【請求項5】前記ガス状態の離型剤の濃度が、10〜500m
g/である請求項1に記載の離型方法。
5. The concentration of the release agent in the gaseous state is 10 to 500 m.
The release method according to claim 1, wherein g / g is used.
JP18795790A 1990-07-18 1990-07-18 Release method of substrate for optical recording medium Expired - Fee Related JP2655936B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18795790A JP2655936B2 (en) 1990-07-18 1990-07-18 Release method of substrate for optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18795790A JP2655936B2 (en) 1990-07-18 1990-07-18 Release method of substrate for optical recording medium

Publications (2)

Publication Number Publication Date
JPH0474623A JPH0474623A (en) 1992-03-10
JP2655936B2 true JP2655936B2 (en) 1997-09-24

Family

ID=16215126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18795790A Expired - Fee Related JP2655936B2 (en) 1990-07-18 1990-07-18 Release method of substrate for optical recording medium

Country Status (1)

Country Link
JP (1) JP2655936B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003109915A (en) * 2001-09-28 2003-04-11 National Institute Of Advanced Industrial & Technology Method and device for performing in-print lithography in releasable atmosphere
CN100395121C (en) * 2004-11-19 2008-06-18 鸿富锦精密工业(深圳)有限公司 Hot-press printing method
CN110435099A (en) * 2019-08-05 2019-11-12 义乌市拓一斯玩具有限公司 A kind of easily demoulding craft mould and its release method

Also Published As

Publication number Publication date
JPH0474623A (en) 1992-03-10

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