JP2653602B2 - Thermosetting resin composition - Google Patents

Thermosetting resin composition

Info

Publication number
JP2653602B2
JP2653602B2 JP12192292A JP12192292A JP2653602B2 JP 2653602 B2 JP2653602 B2 JP 2653602B2 JP 12192292 A JP12192292 A JP 12192292A JP 12192292 A JP12192292 A JP 12192292A JP 2653602 B2 JP2653602 B2 JP 2653602B2
Authority
JP
Japan
Prior art keywords
resin
resin composition
water absorption
thermosetting resin
phenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12192292A
Other languages
Japanese (ja)
Other versions
JPH05310928A (en
Inventor
尚史 榎
憲一 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP12192292A priority Critical patent/JP2653602B2/en
Publication of JPH05310928A publication Critical patent/JPH05310928A/en
Application granted granted Critical
Publication of JP2653602B2 publication Critical patent/JP2653602B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、ガラス転移点(以下T
gという)が高く、低吸水性で、靭性に優れた半導体封
止用熱硬化性樹脂組成物に関するものである。
The present invention relates to a glass transition point (hereinafter referred to as T).
g hereinafter) is high, with low water absorption, the present invention relates to a semiconductor encapsulating thermosetting resin composition excellent in toughness.

【0002】[0002]

【従来の技術】近年IC、LSI、トランジスター、ダ
イオードなどの半導体素子や電子回路等の封止には、特
性、コスト等の点からエポキシ樹脂組成物が一般的に用
いられている。しかし、電子部品の量産性指向、高集積
化や表面実装化の方向に進んで来ており、これに伴い封
止樹脂に対する要求は厳しくなってきている。特に高集
積化に伴うチップの大型化、パッケージの薄肉化や表面
実装時における半田浸漬(200〜300℃)によって装置に
クラックが発生し易くなっており、信頼性向上のために
半導体封止用樹脂としては耐熱性、高靭性と低吸水性が
強く望まれている。
2. Description of the Related Art In recent years, epoxy resin compositions have been generally used for sealing semiconductor devices such as ICs, LSIs, transistors, diodes, and the like, electronic circuits, and the like, from the viewpoint of characteristics and cost. However, the trend toward mass production of electronic components, high integration, and surface mounting has been progressing, and accordingly, requirements for sealing resins have become strict. In particular, cracks are likely to occur in the equipment due to the increase in the size of chips due to high integration, thinning of packages and solder immersion (200 to 300 ° C) during surface mounting. As a resin, heat resistance, high toughness and low water absorption are strongly desired.

【0003】半導体封止用樹脂としては現在エポキシ樹
脂が主流である。しかし、エポキシ樹脂は、耐熱性と低
吸水性の点で改良に限界があり、表面実装時の半田浸漬
後の信頼性の高いものが得られていない。エポキシ樹脂
に代わる高耐熱性を有する樹脂としては、マレイミド樹
脂が注目されてきているが、吸水率が大きく、吸湿時の
半田浸漬でクラックを発生し、信頼性に乏しい欠点があ
る。この他に、エポキシ樹脂に代わる高耐熱性を有する
樹脂としては、シアネートエステル樹脂が公知である。
この樹脂は、積層板成形のように長いプレス時間をかけ
る場合には、Tgが高く、比較的低吸水性の硬化物とな
る。しかし、これを封止材などの短時間成形に用いる場
合は、硬化速度が非常に遅く、金型からの離型性も悪
い。硬化性を上げるため、ノニルフェノール、ナフテン
酸コバルト、ナフテン酸亜鉛などの硬化触媒を増やす
と、Tgが下がり、脆くなり、吸水率も大きくなるなど
の問題がある。
[0003] Epoxy resins are currently the mainstream as semiconductor encapsulation resins. However, there is a limit in improvement of epoxy resin in terms of heat resistance and low water absorption, and a highly reliable epoxy resin after solder immersion during surface mounting has not been obtained. As a resin having high heat resistance in place of epoxy resin, maleimide resin has been attracting attention, but has a disadvantage that it has a high water absorption rate, cracks due to solder immersion during moisture absorption, and has poor reliability. In addition, as a resin having high heat resistance in place of the epoxy resin, a cyanate ester resin is known.
This resin has a high Tg and becomes a cured product having relatively low water absorption when a long press time is applied as in the case of molding a laminate. However, when this is used for short-time molding of a sealing material or the like, the curing speed is extremely slow and the releasability from the mold is poor. Increasing the amount of a curing catalyst such as nonylphenol, cobalt naphthenate, or zinc naphthenate to increase the curability causes problems such as a decrease in Tg, brittleness, and an increase in water absorption.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的とすると
ころは、高耐熱性、高靭性で、かつ低吸水性を有し、半
田浸漬後の信頼性に非常に優れた半導体封止用樹脂組成
を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a resin for semiconductor encapsulation which has high heat resistance, high toughness, low water absorption, and excellent reliability after solder immersion. composition
To provide things .

【0005】[0005]

【課題を解決するための手段】本発明は、式(1)で示
されるジシアネートエステル化合物とフェノール変性
樹脂とからなることを特徴とする熱硬化性樹脂組成物
である。
The present invention relates to a dicyanate ester compound represented by the formula (1) and a phenol-modified stone.
A thermosetting resin composition comprising a carbon resin.

【0006】[0006]

【化1】 Embedded image

【0007】[0007]

【作用】本発明において用いられるジシアネートエステ
ル化合物は、式(1)で示されるものである。式(1)
の好ましいジシアネートエステル化合物の例として、ビ
ス(4-シアネートフェニル)メタン、ビス(3-メチル-4-シ
アネートフェニル)メタン、ビス(3-エチル-4-シアネー
トフェニル)メタン、ビス(3,5-ジメチル-4-シアネート
フェニル)メタン、1,1-ビス(4-シアネートフェニル)エ
タン、2,2-ビス(4-シアネートフェニル)プロパン、2,2-
ビス(4-シアネートフェニル)-1,1,1,3,3,3-ヘキサフル
オロプロパン、ジ(4-シアネートフェニル)エーテル、ジ
(4-シアネートフェニル)チオエーテル、4,4-ジシアネー
ト-ジフェニルなどが挙げられる。
The dicyanate ester compound used in the present invention is represented by the formula (1). Equation (1)
Examples of preferred dicyanate ester compounds include bis (4-cyanatephenyl) methane, bis (3-methyl-4-cyanatephenyl) methane, bis (3-ethyl-4-cyanatephenyl) methane, bis (3,5 -Dimethyl-4-cyanatephenyl) methane, 1,1-bis (4-cyanatephenyl) ethane, 2,2-bis (4-cyanatephenyl) propane, 2,2-
Bis (4-cyanatephenyl) -1,1,1,3,3,3-hexafluoropropane, di (4-cyanatephenyl) ether,
(4-Cyanatephenyl) thioether, 4,4-dicyanate-diphenyl, and the like.

【0008】本発明で用いられるフェノール変性石炭
脂は、石炭の分解油溜分に含まれるスチレン、ビニルト
ルエン、クマロン、インデンなどをフェノール類と付加
重合させたものである。
The phenol-modified coal resin used in the present invention is obtained by addition-polymerizing styrene, vinyltoluene, coumarone, indene, and the like contained in a cracked oil fraction of coal with phenols.

【0009】フェノール類としては、フェノール、クレ
ゾール、キシレノールなどが使用される。フェノール類
の含有量は、フェノール変性石炭樹脂中の5重量%以
上、50重量%以下で、かつ分子当り平均1〜3個付加した
ものが好ましい。フェノール類の含有量が5重量%未満
では、硬化性が悪く、Tgも低く、良好な靭性が得られ
ない。また50重量%を越えると、成形時の離型性が悪
く、成形品の吸水率が大きくなる。
As phenols, phenol, cresol, xylenol and the like are used. The content of phenols is preferably 5% by weight or more and 50% by weight or less in the phenol-modified coal resin, and is preferably added with an average of 1 to 3 phenols per molecule. If the phenol content is less than 5% by weight, the curability is poor, the Tg is low, and good toughness cannot be obtained. If it exceeds 50% by weight, the releasability at the time of molding is poor, and the water absorption of the molded article is increased.

【0010】フェノール変性石炭樹脂は、ジシアネート
エステル化合物100重量部に対し、5重量部以上50重量部
以下が好ましい。5重量部未満では、硬化性、離型性が
悪く、成形品の吸水率も大きくなる。また50重量部を越
えると、耐熱性が低下し、良好な靭性が得られない。
The phenol-modified coal resin is preferably used in an amount of 5 to 50 parts by weight based on 100 parts by weight of the dicyanate ester compound. If the amount is less than 5 parts by weight, the curability and the releasability will be poor, and the water absorption of the molded article will also increase. On the other hand, if it exceeds 50 parts by weight, the heat resistance is lowered and good toughness cannot be obtained.

【0011】ジシアネートエステル化合物とフェノール
変性石炭樹脂は、100〜200℃に加熱して、融点が50℃以
上100℃以下になるよう、予め反応させておくことが望
ましい。
It is desirable that the dicyanate ester compound and the phenol-modified coal resin be heated to 100 to 200 ° C. and reacted in advance so that the melting point becomes 50 ° C. or more and 100 ° C. or less.

【0012】本発明の熱硬化性樹脂組成物は、ナフテン
酸コバルト、ナフテン酸亜鉛などの硬化促進剤、シリカ
粉末などの無機充填材、滑剤、難燃剤、離型剤、シラン
カップリング剤、着色剤などを必要に応じて適宜配合添
加し、加熱混練することによって成形材料にすることが
できる。
The thermosetting resin composition of the present invention comprises a curing accelerator such as cobalt naphthenate and zinc naphthenate; an inorganic filler such as silica powder; a lubricant; a flame retardant; a release agent; a silane coupling agent; A molding material can be obtained by appropriately mixing and adding an agent or the like as necessary and kneading with heat.

【0013】本発明の熱硬化性樹脂組成物を用いた硬化
樹脂は、誘電率、誘電正接も小さいので、低誘電率積層
板用にも好適である。
A cured resin using the thermosetting resin composition of the present invention has a small dielectric constant and a small dielectric loss tangent, and is therefore suitable for a low dielectric constant laminated board.

【0014】[0014]

【実施例】(実施例1〜3)撹拌装置、減圧蒸留装置及
び温度計を付けた反応容器に、ジシアネートエステル化
合物とフェノール変性石炭樹脂、更に実施例1では、ナ
フテン酸コバルトを表1の処方に従って入れ、加熱す
る。減圧下(約20mmHg)、150℃で融点が70〜80℃にな
るよう反応させた。生成樹脂の融点は表1に示した。
EXAMPLES (Examples 1 to 3) A dicyanate ester compound and a phenol-modified coal resin were added to a reaction vessel equipped with a stirrer, a vacuum distillation apparatus and a thermometer. In Example 1, cobalt naphthenate was added as shown in Table 1. Add according to recipe and heat. The reaction was carried out under reduced pressure (about 20 mmHg) at 150 ° C so that the melting point was 70-80 ° C. The melting point of the resulting resin is shown in Table 1.

【0015】[0015]

【表1】 [Table 1]

【0016】(比較例1)ジシアネートエステル化合物
だけを、実施例1と同様に反応させた。生成樹脂の融点
は表1に示した。
(Comparative Example 1) Only a dicyanate ester compound was reacted in the same manner as in Example 1. The melting point of the resulting resin is shown in Table 1.

【0017】(実施例4〜6)表2に示す配合に従っ
て、実施例1〜3で得た樹脂に、硬化促進剤、シリカ粉
末、エポキシシラン及び離型剤を加え、熱ロールで混練
して成形材料を得た。得られた成形材料を、トランスフ
ァー成形により、180℃3分で成形し、外観の良好な成
形品が得られた。この成形品をさらに180℃、8時間後
硬化を行い、特性を評価した。結果を表2に示す。
(Examples 4 to 6) According to the composition shown in Table 2, a curing accelerator, silica powder, epoxysilane and a release agent were added to the resins obtained in Examples 1 to 3, and kneaded with a hot roll. A molding material was obtained. The obtained molding material was molded at 180 ° C. for 3 minutes by transfer molding, and a molded article having good appearance was obtained. The molded article was further cured at 180 ° C. for 8 hours, and the characteristics were evaluated. Table 2 shows the results.

【0018】[0018]

【表2】 [Table 2]

【0019】実施例4〜6の成形材料は、Tgが高く、
靭性(破断エネルギー)が大きく、しかも吸水率が小さ
い。65℃、95%RH、72時間の吸湿処理での耐半田クラ
ック性も良好であった。
The molding materials of Examples 4 to 6 have high Tg,
High toughness (breaking energy) and low water absorption. Solder crack resistance in a moisture absorption treatment at 65 ° C., 95% RH and 72 hours was also good.

【0020】(比較例2)比較例1のシアネートエステ
ル樹脂を用いて、実施例4と同様に成形材料化したが、
硬化不良で、離型性も悪く、成形が困難であった。
Comparative Example 2 A molding material was prepared in the same manner as in Example 4 using the cyanate ester resin of Comparative Example 1.
Poor curing, poor releasability, and difficulty in molding.

【0021】(比較例3)比較例1のシアネートエステ
ル樹脂を用い、硬化性を上げるため、硬化触媒を増やし
て、実施例4と同様に成形材料化した。結果を表2に示
す。硬化性は向上したが、離型性は良くなかった。Tg
はエポキシ樹脂と同程度に低く、靭性も大きくない。吸
水率もエポキシ樹脂と同程度に大きい。耐半田クラック
性も良くなかった。
Comparative Example 3 A molding material was produced in the same manner as in Example 4 by using the cyanate ester resin of Comparative Example 1 and increasing the curing catalyst in order to increase the curability. Table 2 shows the results. Although the curability was improved, the releasability was not good. Tg
Is as low as an epoxy resin and not as tough. The water absorption is as large as epoxy resin. The solder crack resistance was not good either.

【0022】(比較例4)エポキシ樹脂を用いて、実施
例4と同様に成形材料化した。結果を表2に示す。Tg
は実施例1〜3に比べて低く、吸水率は大きい。
Comparative Example 4 A molding material was prepared in the same manner as in Example 4 using an epoxy resin. Table 2 shows the results. Tg
Is lower than Examples 1 to 3 and the water absorption is large.

【0023】[0023]

【発明の効果】本発明による熱硬化性樹脂組成物の硬化
物は高Tgであり、靭性に優れ、しかも吸水率が小さ
い。これを半導体封止に用いた場合、半導体の耐半田ク
ラック性も良好であり、半導体封止用樹脂組成物として
非常に信頼性の高い優れたものである。
The cured product of the thermosetting resin composition according to the present invention has a high Tg, excellent toughness, and low water absorption. When this is used for semiconductor encapsulation, the semiconductor has good solder crack resistance, and is a highly reliable and excellent resin composition for semiconductor encapsulation.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 式(1)で示されるジシアネートエス
テル化合物とフェノール変性石炭樹脂とからなることを
特徴とする熱硬化性樹脂組成物。 【化1】
1. A formula (1) dicyanate ester compound and a thermosetting resin composition characterized by comprising a phenol-modified coal resin represented by. Embedded image
JP12192292A 1992-05-14 1992-05-14 Thermosetting resin composition Expired - Lifetime JP2653602B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12192292A JP2653602B2 (en) 1992-05-14 1992-05-14 Thermosetting resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12192292A JP2653602B2 (en) 1992-05-14 1992-05-14 Thermosetting resin composition

Publications (2)

Publication Number Publication Date
JPH05310928A JPH05310928A (en) 1993-11-22
JP2653602B2 true JP2653602B2 (en) 1997-09-17

Family

ID=14823238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12192292A Expired - Lifetime JP2653602B2 (en) 1992-05-14 1992-05-14 Thermosetting resin composition

Country Status (1)

Country Link
JP (1) JP2653602B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102267654B1 (en) * 2013-08-28 2021-06-21 신에쓰 가가꾸 고교 가부시끼가이샤 Resin compositions for sealing semiconductor and semiconductor device with the cured product thereof

Also Published As

Publication number Publication date
JPH05310928A (en) 1993-11-22

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