JP2652481B2 - Substrate development processing method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoresist film on a substrate surface while rotating a substrate for a semiconductor substrate, a glass substrate for a photomask, a substrate for an optical disk, a substrate for a liquid crystal display device (hereinafter simply referred to as a substrate). Or polyimide resin film,
More specifically, a so-called paddle type developing method, that is, a developing method of a substrate for developing a photosensitive resin film such as a color filter film, that is, a developing method in which a developing solution is not supplied to a rotating substrate while continuing to supply the developing solution to the substrate. The present invention relates to a method for stopping the supply of a developer when the upper surface is covered with the developer, and performing development with a developer held on a substrate in a meniscus shape by the action of surface tension.

[0002]

2. Description of the Related Art As a paddle type development processing method, for example, a method disclosed in JP-A-55-96944 has been conventionally known. That is, while rotating the substrate held by the spin chuck at a low speed (100 rpm), a developer is supplied onto the photoresist surface, and the photoresist surface of the substrate is covered with the developer by the surface tension (hereinafter, referred to as the substrate surface). The meniscus developer is called a meniscus),
In this development processing method, the supply of the developer is stopped in a state where the meniscus is formed, and then the substrate is rotated or stopped at a lower speed (50 rpm). Before such a paddle type developing method was proposed, mainly a developing method called a so-called spray type developing method, that is, a developing solution was continuously supplied to a substrate during development with a spray nozzle or the like. In contrast, the paddle type developing method has the following advantages. That is, in the paddle type developing method, the supply of the developing solution is stopped when the meniscus is formed on the substrate, so that the developing solution is constantly supplied to the substrate during the development as in the spray type developing method. Differently, the degree of damage to the photoresist film surface due to the force of the developing solution supplied toward the substrate is extremely low, and the development unevenness due to the uneven supply amount of the developing solution supplied is low, and It has advantages such as low developer consumption.

[0003]

As described above, the paddle type developing method is an excellent developing method, but has the following problems peculiar to the paddle type developing method. That is, the substrate is moved at a relatively low speed from the beginning so that the meniscus of the developing solution is easily formed and the formed meniscus does not collapse.
Since the developer is supplied onto the photoresist surface while rotating at (100 rpm), the effect that the developer spreads on the upper surface of the substrate due to centrifugal force cannot be expected at such a rotational speed. When the developer does not become familiar, the developer is partially repelled, a meniscus cannot be formed so as to cover the entire surface of the substrate, and a portion of the substrate that does not come into contact with the developer is formed, resulting in uneven development.

To solve this problem, a method of supplying a developing solution more than necessary to form a meniscus of the developing solution (hereinafter referred to as "improvement 1") or a method used in the above-mentioned spray developing method is used. A method (hereinafter referred to as "improvement 2") in which a method called "pre-wet" for developing without unevenness is diverted to a paddle type developing method is considered. The pre-wet method is described in, for example, Japanese Patent Application Laid-Open No. 57-1 filed earlier by the present applicant.
As described in No. 36646 (Title of Invention: "Positive Photoresist Developing Method"), when a developing solution is supplied to a substrate, a thin developing solution or a pre-wet liquid composed of pure water is applied to the substrate as a pretreatment. It is intended to make the surface of the photoresist film conform to the developer evenly by doing so.

However, the improvement 1 consumes a larger amount of developing solution than the amount required for forming a meniscus (volume of the meniscus), so that the running cost is high. On the other hand, in the improvement 2, the consumption of expensive developer can be reduced by supplying the pre-wet liquid to the substrate surface, and the developer can be easily adapted to the photoresist surface of the substrate. In this case, the pre-wet liquid and the developer are mixed in the early stage of the development, and the concentration of the developer becomes locally non-uniform, which causes uneven development. The present invention has been made in view of the circumstances peculiar to such a paddle type developing method. Eliminate unevenness in the developing solution caused by the inability to form a meniscus in a state where the developing solution covers the entire surface of the substrate; It is an object of the present invention to reduce the consumption of the developing solution as compared with the conventional method of avoiding development unevenness only by supplying a large amount of the developing solution.

[0006]

The present invention is configured as follows to solve the above-mentioned problems. That is, the first
A developing solution supply step including a step and a second step following the step, and a developing solution holding step of developing the photosensitive resin film surface of the substrate surface in a state where the supply of the developing solution is stopped. a method, in the first step, by disseminating the developer on the entire surface of the substrate a substrate by supplying a small amount of high speed quality one current image liquid photosensitive resin film surface of the developer substrate surface adapt to the entire surface, in the second step, by supplying the current image liquid in a state where the substrate is stopped low speed to rotate the meniscus of the liquid developer formed on the photosensitive resin layer surface, the developer holding The step is a substrate development processing method, wherein the photosensitive resin film surface is developed while the substrate is rotated at a low speed or stopped so that the meniscus of the developer is maintained.

[0007]

According to the present invention, the developer supply step comprises the first step and the second step.
It consists of a step, while rotating the substrate at high speed at the first step, supplying a small amount of current image liquid onto the substrate. In other words, in the first step, the developer does not form a meniscus, but the developer spreads from the center of rotation of the substrate toward the end by a centrifugal force so as to instantaneously form a thin layer of the developer. hand,
The entire surface of the photosensitive resin film on the substrate is securely and thoroughly contacted with the developing solution, so that the entire surface of the photosensitive resin film becomes easily compatible with the developing solution.

[0008] Then, in the second step, in a state where the substrate is stopped low speed or rotation, since its entire surface to supply the current image liquid developing solution and familiar becomes easily state photosensitive resin film plane, short A meniscus of the developing solution is formed on the photosensitive resin film surface of the substrate in a short time. Thus, the developer can be held in a meniscus shape so as to cover the entire surface of the substrate over the entire surface of the substrate, so that development unevenness can be prevented. Further, as described above, since the meniscus is formed in the second step after the entire surface of the photosensitive resin film becomes easily compatible with the developer in the first step, a large amount of the developer is supplied as in the conventional example. Unlike forming a meniscus by a physical method, the developer can be saved.

[0009]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a process diagram illustrating a substrate development processing method according to an embodiment of the present invention, and FIG. 2 is a schematic diagram of the development processing apparatus. As shown in FIG. 2, the developing apparatus includes a rotation processing unit 1, a developing solution discharge nozzle 6, a developing solution tank
And a liquid supply pipe 7 for connecting and connecting the developer discharge nozzle 6 and the developer tank 10, and a temperature controller 12, a filter 13, and a flow meter 14 respectively attached to the liquid supply pipe 7. .

The rotation processing unit 1 includes a spin chuck 2, a drive motor 3 for rotating the spin chuck 2,
A cup 4 provided so as to surround the spin chuck 2. The spin chuck 2 sucks and holds the substrate W and horizontally rotates, while supplying a developing solution or a rinsing liquid to perform a predetermined surface treatment. Have been.

The developing solution discharge nozzle 6 has a bottomed cylindrical shape, is arranged upright with respect to the substrate W, and has a nozzle tip provided so as to be close to the substrate by a nozzle elevating means (not shown). A plurality of discharge holes 6 formed in the cylinder wall of the main body
The developer 5 is configured to be discharged from a. That is, when supplying the developing solution 5, the developing solution discharge nozzle 6 is brought close to the substrate W so that the head is reduced so as to minimize the impact of the supplying of the developing solution. Is used to weaken the flow of the liquid by once hitting the bottom surface in the bottomed cylindrical nozzle 6 and reduce the discharge hole 6 in the nozzle cylindrical wall.
The developing solution 5 can be sufficiently supplied over the entire surface of the substrate W so as to gradually and uniformly overflow from the group a.

The liquid supply pipe 7 has two branch pipes 7 on the upstream side.
a, 7b, each of which is provided with an on-off valve 8a, 8b.
It is provided so as to be immersed in the developing solution 5 therein. The developing tank 10 is hermetically sealed by an upper lid 11 so as to be opened and closed.
1 gas inlet tube 11a from the inert gas N _2, which is attached by press-fitting to, and is configured to pump the current image liquid 5 through the respective shunt tubes 7a · 7b. Here, the developer is
A developer usual concentration used in the developing process rather than rewetting liquid (hereinafter, the same).

Referring now to FIG. 1, a description will be given of a developing procedure by the apparatus of the present embodiment. Developing method of this embodiment, the developing solution supply step comprising a first step S ₁ and the second step S ₂ Metropolitan following this, the development by the action of surface tension at by stopping the supply of the developing solution on the substrate Developer holding step S for holding the liquid
_3, consisting of shaking off step S ₄ Metropolitan spin off by centrifugal force a developer held on the substrate by rotating the substrate. Incidentally, after a series of development processing consisting of the S ₁ to S ₄ is rinsing step S ₆ to wash away the ingredients of the developer from the substrate is performed. First, at the first step S _1, while rotating at a relatively high speed of the substrate W held by the spin chuck 2 (1000 rpm), a relatively low flow the current image liquid 5 on the photoresist surface (2
(2 ml) with a continuous flow of 50 ml / min). This allows
The developing solution 5 instantaneously spreads over the entire surface of the substrate by the strong centrifugal force, and the photoresist film surface is adapted to the developing solution 5.

[0014] Then the second step S _2, the substrate W in a state of low-speed rotation (30 rpm) to rotation stop, relatively multi rate (650 ml / mi the current image liquid 5 in the photoresist film plane
Feed for 2 seconds with continuous flow of n). Then in the next developer holding step S _3, to stop the supply of the developing solution 5, and the spin chuck previous second step S ₂ and more slow to not the speed (0
Rotation or stop at about 30 rpm)
Hold for seconds. As a result, the developing solution 5 is in a state of forming a meniscus on the photoresist film surface of the substrate W due to its surface tension as shown by the broken line in FIG. 2, and the entire surface of the substrate W is uniformly developed. Incidentally, the developer supplied in the first step S ₁ and the developer supply in the second step S _2, both the
Since a developer usual concentrations, even developing solution and developing solution supplied in the second step S ₂ of the second step S ₂ initial supplied in the first step S ₁ is mixed, the concentration difference In other words, since the development density does not locally become nonuniform, uniform development can be performed over the entire surface of the substrate.

Next, in the shaking-off step S ₄ , the developing solution 5 is removed from the substrate surface by rotating the substrate W at a relatively high speed (1000 rpm) for 2 seconds. In step S _5, the number N of repeating the process of step S ₂ to S ₄ are preset or the determined reached required number C of the above series of development processing if reached is terminated, the next Step S of the rinsing process
_Move to ₆ . However, as in step S ₂ to S repeated ₄ steps preset required number C (1 or more integer), the
The number of repetitions necessary to obtain the intended good development result was determined in advance by an experimental method, etc.
It is determined by the influence of factors such as the type of the photoresist and the concentration of the developer. It is to be noted that the step S ₂ to S ₄
Instead of repeating the steps may be repeated a process of Step S ₁ to S _4, or may be repeated. Finally, in the rinsing step S _6, by supplying a rinse liquid to the surface of the rotating substrate W than another nozzle (not shown), the surface for about 10 seconds rinsing of the substrate W, then liquid cut dry.

The present invention is not limited to the above-described embodiment, but can be carried out by appropriately changing the flow rate Q of the developing solution 5 and the rotation speed n of the substrate W according to the size of the substrate W and the like. Does not require multiple words. Further, the piping system for supplying the developer is not limited to the above-described embodiment. For example, a configuration using one open / close valve having a flow rate adjusting function without branching the liquid supply pipe 7 into the branch pipes 7a and 7b may be used. In short, any structure may be used as long as the flow rate of the developing amount supplied in the first step and the second step can be changed.

In the above example, the diameter of the substrate W is 6
In the case of inches, the consumption of the developer is about 20
% Savings. This means a significant reduction in running costs. Although the above embodiments relate to the development of a photoresist film, the present invention is applicable to the development of various photosensitive resin films such as a polyimide resin film and a color filter film. In the above embodiment, after the developer holding step S _3, shaking off step S ₄ step rinsing from via S
Although shifts to _6, omitting the shaking step S _4, the developer holding step S _3, it may be immediately shifted to the rinsing step S _6.

[0019]

The present invention has the following effects. I. In the present invention, by spread the developing solution on the entire surface of the substrate the substrate in the first step by supplying a small amount of high speed quality one current image solution, a developing solution to the entire surface of the photosensitive resin film surface of the substrate surface familiarizing the substrate in the second step by supplying the current image liquid in a state of low-speed rotation to the rotation stopping the meniscus of the liquid developer formed on the photosensitive resin layer surface, the meniscus of the liquid developer in the developer holding step since developing the photosensitive resin layer surface in a state where the substrate to the extent of maintaining stopping low speed to rotate, despite holding a developer by supplying a current image liquid onto the substrate to a meniscus shape Thus, the problem of uneven development can be solved. B. After the entire surface of the photosensitive resin layer in the current image liquid and familiar prone state in the first step, because it forms a meniscus in the second step, compared with the conventional example in which a large amount of supplying a developing solution until no cause the uneven development Thus, the developer can be saved. C. Further, a developing solution to be supplied in the first step, since the developing solution supplied in the second step are both current image solution of the same concentration was supplied in the first step at the beginning of the second step development liquid and even developing solution supplied in the second step are mixed, a uniform development over locally developer developer density difference occurs arise problems such as a nonuniform this and without the entire substrate surface Can be realized.

[Brief description of the drawings]

FIG. 1 is a process chart of a development processing method according to the present invention.

FIG. 2 is a schematic diagram showing an embodiment of a developing apparatus for carrying out the present invention.

[Explanation of symbols]

W: substrate, 5: developer, S ₁ ...
First step, S ₂ ... second step, S ₃ ... developer holding step, S ₄ ...
Shaking-off process, S ₆ rinsing process.

 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-58-88749 (JP, A) JP-A-55-96944 (JP, A) JP-A-2-303116 (JP, A)

Claims (1)

(57) [Claims] 1. A developer supply step comprising a first step and a second step subsequent thereto, and a developer holding step of developing a photosensitive resin film surface on a substrate surface in a state where the supply of the developer is stopped. a comprising at developing method of the substrate, in the first step, the substrate and the substrate by supplying a small amount of high speed quality one current image liquid by disseminating the developer on the entire surface of the substrate, the developer adapt the entire surface of the photosensitive resin film surface of the surface, in the second step, the meniscus of the liquid developer on the substrate a low-speed rotation or in a state in which rotation is stopped by supplying the current image liquid photosensitive resin film plane Forming the developing solution, wherein the developing solution holding step includes developing the photosensitive resin film surface in a state where the substrate is rotated at a low speed or stopped so as to maintain a meniscus of the developing solution. .