JP2639501C - - Google Patents
Info
- Publication number
- JP2639501C JP2639501C JP2639501C JP 2639501 C JP2639501 C JP 2639501C JP 2639501 C JP2639501 C JP 2639501C
- Authority
- JP
- Japan
- Prior art keywords
- light
- die
- lens
- pattern
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 95
- 230000007547 defect Effects 0.000 claims description 80
- 238000007689 inspection Methods 0.000 claims description 68
- 230000004075 alteration Effects 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 24
- 238000005286 illumination Methods 0.000 claims description 13
- 239000004065 semiconductor Substances 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 4
- 238000003384 imaging method Methods 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 88
- 238000013461 design Methods 0.000 description 26
- 238000013519 translation Methods 0.000 description 19
- 238000012546 transfer Methods 0.000 description 12
- 239000011521 glass Substances 0.000 description 11
- 239000004973 liquid crystal related substance Substances 0.000 description 10
- 238000012937 correction Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 206010010071 Coma Diseases 0.000 description 6
- 201000009310 astigmatism Diseases 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000004990 Smectic liquid crystal Substances 0.000 description 5
- 230000005499 meniscus Effects 0.000 description 5
- 230000001902 propagating effect Effects 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 210000001747 pupil Anatomy 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 210000003205 muscle Anatomy 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001356 surgical procedure Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
Family
ID=
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2639501B2 (ja) | 欠陥検査方法及び装置 | |
KR102013083B1 (ko) | Euv 이미징을 위한 장치 및 이의 이용 방법 | |
JP5749641B2 (ja) | 光学検査システム及び方法 | |
JP5249015B2 (ja) | 広帯域のウェーハ検査用反射光学システム | |
USRE33956E (en) | Inspection system for array of microcircuit dies having redundant circuit patterns | |
TWI449900B (zh) | 檢測系統、微影系統、器件製造方法及原位污染物檢測系統 | |
TWI588467B (zh) | 光學系統,檢測系統,微影裝置及製造方法 | |
US6064477A (en) | Method of and apparatus for inspecting reticle for defects | |
US20070121107A1 (en) | Excimer laser inspection system | |
JP3744966B2 (ja) | 半導体基板の製造方法 | |
JP2008534963A5 (enrdf_load_stackoverflow) | ||
JP2003114200A (ja) | 多層膜マスク欠陥検査方法及び装置 | |
JP2009251412A (ja) | マスクブランク検査装置および方法、反射型露光マスクの製造方法ならびに半導体集積回路の製造方法 | |
EP1606605A2 (en) | System for detection of wafer defects | |
US20150192459A1 (en) | Extreme ultra-violet (euv) inspection systems | |
US6738135B1 (en) | System for inspecting EUV lithography masks | |
US20140264051A1 (en) | Segmented mirror apparatus for imaging and method of using the same | |
US7940384B2 (en) | Systems and methods for blocking specular reflection and suppressing modulation from periodic features on a specimen | |
JP4444984B2 (ja) | レチクル欠陥検査装置およびこれを用いた検査方法 | |
US7016030B2 (en) | Extended surface parallel coating inspection method | |
JP2639501C (enrdf_load_stackoverflow) | ||
JP2001083098A (ja) | 光学的表面検査機構及び光学的表面検査装置 | |
JP2019158431A (ja) | 検査装置、検査方法及び反射型光学部材の加工方法 |