JP2638180C - - Google Patents
Info
- Publication number
- JP2638180C JP2638180C JP2638180C JP 2638180 C JP2638180 C JP 2638180C JP 2638180 C JP2638180 C JP 2638180C
- Authority
- JP
- Japan
- Prior art keywords
- steel sheet
- coating
- silicon steel
- irradiation
- press
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 81
- 229910000831 Steel Inorganic materials 0.000 claims description 49
- 239000010959 steel Substances 0.000 claims description 49
- 238000000137 annealing Methods 0.000 claims description 44
- 239000011248 coating agent Substances 0.000 claims description 41
- 238000000576 coating method Methods 0.000 claims description 41
- 229910052742 iron Inorganic materials 0.000 claims description 37
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 27
- 229910052839 forsterite Inorganic materials 0.000 claims description 15
- 238000005096 rolling process Methods 0.000 claims description 13
- 238000010894 electron beam technology Methods 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000001678 irradiating Effects 0.000 claims description 2
- 230000001133 acceleration Effects 0.000 description 11
- 238000001953 recrystallisation Methods 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 9
- 230000005381 magnetic domain Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 229910052750 molybdenum Inorganic materials 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-K [O-]P([O-])([O-])=O Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 5
- 239000008119 colloidal silica Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052748 manganese Inorganic materials 0.000 description 5
- 239000010452 phosphate Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000005097 cold rolling Methods 0.000 description 4
- 239000011162 core material Substances 0.000 description 4
- 238000005261 decarburization Methods 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- 210000004940 Nucleus Anatomy 0.000 description 2
- 210000002381 Plasma Anatomy 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000011218 segmentation Effects 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 230000000875 corresponding Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000003966 growth inhibitor Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000149 penetrating Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N tin hydride Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Family
ID=
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