JP2619740B2 - Magnetic polishing equipment - Google Patents
Magnetic polishing equipmentInfo
- Publication number
- JP2619740B2 JP2619740B2 JP2413584A JP41358490A JP2619740B2 JP 2619740 B2 JP2619740 B2 JP 2619740B2 JP 2413584 A JP2413584 A JP 2413584A JP 41358490 A JP41358490 A JP 41358490A JP 2619740 B2 JP2619740 B2 JP 2619740B2
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- tool
- magnetic
- polishing
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、パイプのような被加工
物の円形の内面を、前記内面により規定される空間内に
配置された研磨用工具を磁界により前記空間内において
回転させることにより、研磨する磁気研磨装置に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for rotating a circular inner surface of a workpiece such as a pipe in a space defined by the inner surface by rotating a polishing tool disposed in the space. And a magnetic polishing apparatus for polishing.
【0002】[0002]
【従来の技術】磁性砥粒と回転磁界とを用いて被加工物
の表面を研磨する装置が特開昭62−102969号公
報に記載されている。しかし、この装置では、磁性砥粒
自体を工具として用い、回転磁界により移動させるか
ら、研磨効率が悪い。2. Description of the Related Art An apparatus for polishing the surface of a workpiece using magnetic abrasive grains and a rotating magnetic field is described in Japanese Patent Application Laid-Open No. 62-102969. However, in this apparatus, since the magnetic abrasive grains themselves are used as a tool and are moved by a rotating magnetic field, the polishing efficiency is poor.
【0003】円形の内面すなわち被研磨面を有する被加
工物内に研磨用工具を配置し、この工具を被加工物の軸
線の周りを回転する磁界により被加工物内で回転させ、
それにより前記被研磨面を研磨する内面磁気研磨装置
は、精密工学会誌第55巻第10号148〜153頁に
記載されている。[0003] A polishing tool is arranged in a workpiece having a circular inner surface, that is, a surface to be polished, and the tool is rotated in the workpiece by a magnetic field rotating around the axis of the workpiece.
An inner surface magnetic polishing apparatus for polishing the surface to be polished thereby is described in Journal of Precision Engineering, Vol. 55, No. 10, pp. 148-153.
【0004】この公知の内面磁気研磨装置において、被
加工物はほぼ水平方向へ伸びるように支持されており、
工具は被研磨面に接触した状態で被加工物の軸線の周り
に回転される。研磨の間、被加工物または工具は、被加
工物の軸線方向へ少なくとも一回相対的に移動される。
これにより、被研磨面は、被加工物の軸線の周りにおけ
る工具の回転により研磨される。In this known inner surface magnetic polishing apparatus, a workpiece is supported so as to extend substantially in a horizontal direction.
The tool is rotated about the axis of the workpiece in contact with the surface to be polished. During polishing, the workpiece or tool is relatively moved at least once in the axial direction of the workpiece.
Thus, the polished surface is polished by rotation of the tool about the axis of the workpiece.
【0005】しかし、公知の内面磁気研磨装置では、工
具を被加工物内で回転させるとともに、被加工物または
工具を被加工物の軸線方向へ移動させるにすぎないか
ら、砥粒を含む液体すなわち加工液を用いて研磨する
と、砥粒が被加工物の内面に均一に分布されず、したが
って被研磨面を均一に研磨することができなく、研磨効
率も低い。However, in the known internal magnetic polishing apparatus, the tool is rotated within the workpiece and the workpiece or the tool is moved only in the axial direction of the workpiece. When polishing is performed using a processing liquid, the abrasive grains are not uniformly distributed on the inner surface of the workpiece, so that the surface to be polished cannot be uniformly polished and the polishing efficiency is low.
【0006】[0006]
【解決しようとする課題】本発明は、被研磨面を加工液
を用いて均一にかつ効率良く研磨することができる内面
磁気研磨装置を提供することを目的とする。SUMMARY OF THE INVENTION An object of the present invention is to provide an inner surface magnetic polishing apparatus capable of uniformly and efficiently polishing a surface to be polished using a working liquid.
【0007】[0007]
【解決手段、作用、効果】本発明の研磨装置は、非磁性
の被加工物の円形の内面により規定される空間内に配置
された研磨作用を有する磁性工具を、前記内面に接触さ
せた状態で、前記被加工物の軸線の周りに回転させる磁
界を発生する磁界発生手段と、前記被加工物と前記工具
との間に前記被加工物の軸線方向への相対的な往復運動
を生じさせるとともに前記被加工物をその軸線の周りに
回転させる駆動手段と、砥粒を含む液体を前記空間内に
供給する手段とを含む。A polishing apparatus according to the present invention is a state in which a magnetic tool having a polishing action disposed in a space defined by a circular inner surface of a non-magnetic workpiece is brought into contact with the inner surface. Magnetic field generating means for generating a magnetic field that rotates around the axis of the workpiece; and causing relative reciprocating motion of the workpiece in the axial direction between the workpiece and the tool. And a drive unit for rotating the workpiece around its axis, and a unit for supplying a liquid containing abrasive grains into the space.
【0008】砥粒を含む液体すなわち加工液は研磨に先
立ってまたは研磨時に被加工物の空間内へ供給される。The liquid containing the abrasive grains, ie, the working liquid, is supplied into the space of the workpiece prior to or during the polishing.
【0009】研磨時に被加工物が回転されないと、研磨
すべき内面すなわち被研磨面のうち上方の部位には、工
具に付着した加工液が工具の回転にともなって付着され
るにすぎないから、被研磨面の周方向における各部位へ
の液体付着量は不均一である。If the workpiece is not rotated at the time of polishing, only the machining fluid attached to the tool is attached to the inner surface to be polished, that is, the upper portion of the polished surface with the rotation of the tool. The amount of liquid adhering to each part in the circumferential direction of the polished surface is not uniform.
【0010】しかし、加工液が被加工物とともに回転さ
れない程度の速度で被加工物が回転されると、被加工物
内の加工液は自重により空間の底部に集り、加工液は被
研磨面の周方向全体にわたって均一に付着する。However, when the workpiece is rotated at such a speed that the processing fluid is not rotated together with the workpiece, the processing fluid in the workpiece collects at the bottom of the space by its own weight, and the processing fluid is removed from the surface to be polished. It adheres uniformly over the entire circumferential direction.
【0011】空間内の加工液は、また、被加工物と工具
との間の相対的な往復運動にともなって空間内を被加工
物の軸線方向へ移動されるから、被研磨面の軸線方向全
体にわたって均一に付着する。Since the working fluid in the space is moved in the axial direction of the workpiece along the relative reciprocating motion between the workpiece and the tool, the working fluid in the axial direction of the surface to be polished is also moved. Adheres uniformly throughout.
【0012】研磨時、工具が被加工物の軸線の周りに回
転されつつ、被加工物と工具とが被加工物の軸線方向へ
相対的に繰り返し往復移動されるから、被加工物と工具
との間には、工具が被研磨面上において螺旋状の軌跡を
描くような相対的な移動を生じる。被加工物または工具
が被加工物の軸線方向における一方へ移動されるときの
工具の軌跡と他方へ移動されるときの工具の軌跡とは、
互いに交差する。During polishing, the workpiece and the tool are reciprocated relatively in the axial direction of the workpiece while the tool is rotated around the axis of the workpiece. In between, relative movement occurs such that the tool follows a spiral trajectory on the surface to be polished. The trajectory of the tool when the workpiece or the tool is moved to one side in the axial direction of the workpiece and the trajectory of the tool when the workpiece or the tool is moved to the other,
Cross each other.
【0013】本発明によれば、工具が磁界により回転さ
れる間、被加工物をその軸線の周りに回転させるととも
に被加工物と工具とを被加工物の軸線方向へ相対的に繰
り返し往復移動させる駆動手段を設けたから、被加工物
の空間内に供給された加工液は被研磨面全体にわたって
均一に付着し、その結果砥粒は均一に分布される。した
がって、被研磨面を均一に研磨することができる。According to the present invention, while the tool is rotated by the magnetic field, the workpiece is rotated about its axis and the workpiece and the tool are reciprocated relatively and reciprocally in the axial direction of the workpiece. Since the driving means is provided, the processing liquid supplied into the space of the workpiece adheres uniformly over the entire surface to be polished, and as a result, the abrasive grains are uniformly distributed. Therefore, the surface to be polished can be uniformly polished.
【0014】本発明によれば、また、被加工物または工
具が被加工物の軸線方向における一方へ移動されるとき
の被研磨面上における工具の軌跡と他方へ移動されると
きの被研磨面上における工具の軌跡とが交差するから、
加工液が被研磨面全体に均一に付着することと相まって
単位時間当りの研磨距離が増大するとともに、研磨軌跡
の交差による個々の砥粒の切削効果が増大し、研磨効率
が著しく向上する。According to the present invention, the locus of the tool on the surface to be polished when the workpiece or the tool is moved to one side in the axial direction of the workpiece and the surface to be polished when the workpiece or the tool is moved to the other side Since the trajectory of the tool above intersects,
The polishing distance per unit time is increased in combination with the fact that the processing liquid is uniformly attached to the entire surface to be polished, and the cutting effect of the individual abrasive grains due to the intersection of the polishing trajectories is increased, thereby significantly improving the polishing efficiency.
【0015】前記駆動手段は、前記磁界発生手段に対し
前記被加工物の軸線方向へ移動可能に配置されたスライ
ダと、該スライダに前記軸線の周りに回転可能に支持さ
れ、前記被加工物を把持するチャックと、前記スライダ
を前記被加工物の軸線方向へ移動させる移動機構と、前
記チャックを前記軸線の周りに回転させる回転機構とを
備えることができる。この場合、被加工物と工具との間
の相対的な往復運動は、被加工物が磁界発生手段に対し
て移動されることにより生じる。The driving means is provided with a slider arranged to be movable in the axial direction of the workpiece with respect to the magnetic field generating means, and supported by the slider so as to be rotatable around the axis. A chuck for gripping, a moving mechanism for moving the slider in the axial direction of the workpiece, and a rotating mechanism for rotating the chuck about the axis may be provided. In this case, the relative reciprocating motion between the workpiece and the tool is caused by moving the workpiece with respect to the magnetic field generating means.
【0016】[0016]
【実施例】図1および図2を参照するに、磁気研磨装置
10は、該磁気研磨装置のための電源装置を収容してい
るボックス状のフレーム12を含む。フレーム12は、
その下面に取り付けられた複数のキャスタ14を利用し
て、床上を任意な位置へ移動させ、その位置に解除可能
に据え付けることができる。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIGS. 1 and 2, a magnetic polishing apparatus 10 includes a box-shaped frame 12 housing a power supply for the magnetic polishing apparatus. Frame 12
By utilizing the plurality of casters 14 attached to the lower surface, the floor can be moved to an arbitrary position on the floor and releasably installed at that position.
【0017】フレーム12の上には、回転磁界を発生す
る磁界発生器16が取り付けられている。A magnetic field generator 16 for generating a rotating magnetic field is mounted on the frame 12.
【0018】図1および図2に示すように、磁界発生器
16は、磁性体からなる環状のヨーク18と、ヨーク1
8に等角度間隔に配置された複数(図示の例では6つ)
の電磁石20とにより構成されており、ヨーク18の中
心軸線がほぼ水平方向へ伸びるように複数のブラケット
22によりフレーム12に取り付けられている。As shown in FIGS. 1 and 2, the magnetic field generator 16 includes an annular yoke 18 made of a magnetic material,
A plurality (six in the example shown) arranged at equal angular intervals in 8
, And is attached to the frame 12 by a plurality of brackets 22 so that the center axis of the yoke 18 extends substantially in the horizontal direction.
【0019】各電磁石20は、鉄心24にコイル26を
巻き付けたものである。各鉄心は、コネクタ28によ
り、ヨーク18の半径方向へ伸びるようにヨーク18に
取り付けられているとともに、ヨーク18に磁気的に接
続されている。Each electromagnet 20 is formed by winding a coil 26 around an iron core 24. Each iron core is attached to the yoke 18 by a connector 28 so as to extend in the radial direction of the yoke 18, and is magnetically connected to the yoke 18.
【0020】鉄心24の先端面すなわち磁極面は、その
内側に被加工物30を受け入れる空間を互いに共同して
規定する。被加工物30は、パイプのように円形の内面
すなわち被研磨面を有しており、また、ステンレス鋼の
ような非磁性材料からなる。The tip end face, ie, the pole face, of the iron core 24 jointly defines a space for receiving the workpiece 30 inside thereof. The workpiece 30 has a circular inner surface, that is, a polished surface like a pipe, and is made of a non-magnetic material such as stainless steel.
【0021】フレーム12の上には、また、長尺の被加
工物30を把持し、被加工物をその軸線方向へ移動さ
せ、さらに被加工物をその軸線の周りに回転させる駆動
機構32が配置されている。On the frame 12, a drive mechanism 32 for gripping the long workpiece 30, moving the workpiece in the axial direction thereof, and rotating the workpiece about the axis is also provided. Are located.
【0022】駆動機構32は、図3〜図5に示すよう
に、ヨーク18の中心軸線と平行な方向へ移動可能のス
ライダ34を備える。スライダ34は、フレーム12に
固定されたレール組立体36に支承されている。The drive mechanism 32 includes a slider 34 movable in a direction parallel to the center axis of the yoke 18, as shown in FIGS. The slider 34 is supported on a rail assembly 36 fixed to the frame 12.
【0023】レール組立体36は、図示の例では、互い
におよびヨーク18の中心軸線と平行に伸びる一対のレ
ール38をフレーム12に固定された一対のブラケット
40に支持させており、また、スライダ34をレール3
8に支持している。In the illustrated example, the rail assembly 36 supports a pair of rails 38 extending parallel to each other and to the center axis of the yoke 18 on a pair of brackets 40 fixed to the frame 12. The rail 3
8 support.
【0024】被加工物30を把持するチャック42は、
スライダ34から互いに平行に上方へ伸びる一対の支持
部材44に配置されており、また、支持部材44に取り
付けられたベアリング46(図5参照)により、被加工
物30の軸線の周りに回転可能に支持されている。The chuck 42 for gripping the workpiece 30 includes
It is arranged on a pair of support members 44 extending upward from the slider 34 in parallel with each other, and is rotatable about the axis of the workpiece 30 by bearings 46 (see FIG. 5) attached to the support members 44. Supported.
【0025】図3および図4に示すように、被加工物3
0をその軸線方向へ移動させる移動機構50は、電動機
および減速機を備える回転源52と、その回転軸に取り
付けられたカム円板54と、カム円板54の回転運動を
被加工物の軸線方向への往復運動に変換するクランクシ
ャフト56とを備える。As shown in FIGS. 3 and 4, the workpiece 3
A moving mechanism 50 for moving the rotation axis 0 in the axial direction includes a rotation source 52 having an electric motor and a speed reducer, a cam disk 54 attached to the rotation shaft, and the rotational movement of the cam disk 54, which is the axis of the workpiece. And a crankshaft 56 for converting the reciprocating motion in the direction.
【0026】クランクシャフト56の一端部はカム円板
52の外周縁部に連結されており、他端部はブラケット
58を介してスライダ34に連結されている。このた
め、スライダ34は、回転源52の回転により被加工物
30の軸線方向へ往復移動され、それによりチャック4
2も同方向へ往復移動される。One end of the crankshaft 56 is connected to the outer peripheral edge of the cam disk 52, and the other end is connected to the slider 34 via a bracket 58. For this reason, the slider 34 is reciprocated in the axial direction of the workpiece 30 by the rotation of the rotation source 52, whereby the chuck 4 is moved.
2 is also reciprocated in the same direction.
【0027】図3および図5に示すように、被加工物3
0をその軸線の周りに回転させる回転機構60は、電動
機および減速機を備える回転源62と、その回転軸に取
り付けられたプーリ64と、チャック42の外周面に取
り付けられたプーリ66と、両プーリ64,66に巻き
掛けられた無端ベルト68とを備えており、回転源62
の回転によりチャック42を被加工物30の軸線の周り
に回転させる。As shown in FIGS. 3 and 5, the workpiece 3
A rotation mechanism 60 for rotating the rotation axis 0 around its axis includes a rotation source 62 having an electric motor and a reduction gear, a pulley 64 attached to the rotation axis, and a pulley 66 attached to the outer peripheral surface of the chuck 42. And an endless belt 68 wound around pulleys 64 and 66.
Rotates the chuck 42 around the axis of the workpiece 30.
【0028】図1に示すように、研磨に先立って、被加
工物30は、チャック42と、鉄心24の磁極面により
規定される空間とを貫通して伸びるとともに水平線に対
しわずかに傾斜するように、チャック42に把持され
る。As shown in FIG. 1, prior to polishing, the workpiece 30 extends through the chuck 42 and the space defined by the pole faces of the iron core 24 and is slightly inclined with respect to the horizontal. Then, it is gripped by the chuck 42.
【0029】次いで、研磨用工具70が被加工物30内
に配置されるとともに所定量の加工液が注入器72によ
り被加工物30内にその長手方向の一端の側から供給さ
れる。Next, the polishing tool 70 is placed in the workpiece 30 and a predetermined amount of working fluid is supplied into the workpiece 30 by the injector 72 from one end in the longitudinal direction.
【0030】工具70は、磁性材料または永久磁石材料
を含む。工具70が永久磁石材料を含む場合、その永久
磁石材料を磁化させ、工具70を永久磁石として作用さ
せる。The tool 70 includes a magnetic material or a permanent magnet material. When the tool 70 includes a permanent magnet material, the permanent magnet material is magnetized, and the tool 70 acts as a permanent magnet.
【0031】工具70の形状は、三角柱状等任意である
が、たとえば、図6に示すように直方体状とすることが
できる。図6に示す工具70は、弧面とされた4つの部
位74,74,76,76を有しており、部位74,7
4または76,76が被加工物30の内面に当接するよ
うに配置される。The shape of the tool 70 is arbitrary, such as a triangular prism, but can be, for example, a rectangular parallelepiped as shown in FIG. The tool 70 shown in FIG. 6 has four portions 74, 74, 76, 76 which are formed as arc surfaces.
4 or 76, 76 are arranged so as to contact the inner surface of the workpiece 30.
【0032】注入器72は、加工液の供給量を調節する
バルブ等の調節具を備えることが好ましい。加工液とし
て、砥粒を含むスラリーを用いることができる。It is preferable that the injector 72 includes an adjusting device such as a valve for adjusting the supply amount of the processing liquid. A slurry containing abrasive grains can be used as the working liquid.
【0033】被加工物30は、注入器72が配置されて
いる側の部位の高さ位置がその反対の側の部位の高さ位
置よりわずかに上方となるように支持されている。この
ため、加工液は、時間の経過とともに被加工物30内を
移動する。The workpiece 30 is supported such that the height of the part on the side where the injector 72 is disposed is slightly higher than the height of the part on the opposite side. For this reason, the working fluid moves in the workpiece 30 with the passage of time.
【0034】研磨時、電磁石20の各コイル26に、鉄
心24の磁極面から回転磁界を発生させるべく三相交流
が供給される。コイル26と三相交流電源との接続法
は、たとえば、特開昭62−102969号公報に記載
されている。At the time of polishing, a three-phase alternating current is supplied to each coil 26 of the electromagnet 20 to generate a rotating magnetic field from the pole face of the iron core 24. The connection method between the coil 26 and the three-phase AC power supply is described in, for example, JP-A-62-102969.
【0035】これにより、電磁石20の極性が変化する
ことにより回転磁界が発生され、被加工物30内に配置
された工具70は回転磁界の移動にともなって、被加工
物30の内面に接触した状態で内面に沿って周方向に回
転される。工具70の回転速度は、電磁石に供給する交
流の周波数を変更することにより変えることができる。As a result, a rotating magnetic field is generated by changing the polarity of the electromagnet 20, and the tool 70 arranged in the workpiece 30 comes into contact with the inner surface of the workpiece 30 with the movement of the rotating magnetic field. In this state, it is rotated in the circumferential direction along the inner surface. The rotation speed of the tool 70 can be changed by changing the frequency of the alternating current supplied to the electromagnet.
【0036】研磨の間、スライダ34が移動機構50に
より工具70の回転周波数より低い周波数で往復移動さ
れる。これにより、被加工物30はその軸線方向へ往復
移動される。During the polishing, the slider 34 is reciprocated by the moving mechanism 50 at a frequency lower than the rotation frequency of the tool 70. Thereby, the workpiece 30 is reciprocated in the axial direction.
【0037】しかし、被加工物30内に配置された工具
70は、電磁石20により発生される磁束に拘束されて
電磁石20に対し被加工物30の軸線方向へ変位しな
い。このため、被加工物30と工具70との間に被加工
物30の軸線方向への相対的な移動が生じる。However, the tool 70 disposed in the workpiece 30 is not displaced in the axial direction of the workpiece 30 with respect to the electromagnet 20 because of the magnetic flux generated by the electromagnet 20. Therefore, a relative movement of the workpiece 30 in the axial direction occurs between the workpiece 30 and the tool 70.
【0038】研磨の間、また、チャック42が回転機構
60により工具70の回転周波数より低い周波数で被加
工物30の軸線の周りに回転される。これにより、被加
工物30はその軸線の周りに回転される。被加工物の回
転周波数は、内部の加工液が遠心力により被加工物30
とともに回転されない値である。During polishing, the chuck 42 is also rotated by the rotation mechanism 60 about the axis of the workpiece 30 at a frequency lower than the rotation frequency of the tool 70. Thereby, the workpiece 30 is rotated around its axis. The rotation frequency of the workpiece is such that the inner working fluid is
It is a value that is not rotated with.
【0039】工具70の回転周波数、被加工物30の往
復運動周波数および被加工物30の回転周波数は、たと
えば、それぞれ、30〜50Hz,1〜2Hzおよび
0.1〜1Hz程度とすることができる。The rotational frequency of the tool 70, the reciprocating motion frequency of the workpiece 30, and the rotational frequency of the workpiece 30 can be, for example, about 30 to 50 Hz, 1 to 2 Hz, and 0.1 to 1 Hz, respectively. .
【0040】被加工物30の回転方向は、工具の回転方
向と同じであってもよいし、逆であってもよい。また、
被加工物30の回転運動および往復運動は、連続的であ
ってもよいし、間欠的であってもよい。The direction of rotation of the workpiece 30 may be the same as the direction of rotation of the tool, or may be reversed. Also,
The rotation and reciprocation of the workpiece 30 may be continuous or intermittent.
【0041】被加工物30内の加工液は、被加工物30
が回転されても、自重により被研磨面の底部に集まるか
ら、被加工物30の回転にともなって、被研磨面の周方
向全体に付着する。また、被加工物30内の加工液は、
被加工物30と工具70との相対的な往復運動によりお
よび被加工物30が水平線に対し傾斜されていることに
より、被加工物30の長手方向へ移動される。これらの
結果、被加工物30内の加工液は、被研磨面全体にわた
って均一に付着する。The working fluid in the workpiece 30 is
Is rotated, it gathers at the bottom of the polished surface due to its own weight, and adheres to the entire surface of the polished surface in the circumferential direction as the workpiece 30 rotates. Also, the working fluid in the workpiece 30 is
Due to the relative reciprocation of the workpiece 30 and the tool 70 and the fact that the workpiece 30 is inclined with respect to the horizontal line, the workpiece 30 is moved in the longitudinal direction. As a result, the processing liquid in the workpiece 30 adheres uniformly over the entire polished surface.
【0042】工具70の回転と、被加工物30の往復運
動とにより、被加工物30と工具70との間には、工具
70が被研磨面上に螺旋状の軌跡を描くような、相対的
な移動が生じる。被加工物30がその軸線方向における
一方へ移動されるときの工具の軌跡と他方へ移動される
ときの工具の軌跡とは、互いに交差する。Due to the rotation of the tool 70 and the reciprocating motion of the workpiece 30, the relative movement between the workpiece 30 and the tool 70 is such that the tool 70 draws a spiral path on the surface to be polished. Movement occurs. The trajectory of the tool when the workpiece 30 is moved to one side in the axial direction and the trajectory of the tool when the workpiece 30 is moved to the other side cross each other.
【0043】研磨の間、加工液を連続的または間欠的に
被加工物30内に供給することが好ましい。また、被加
工物から流出する加工液を受けるシュートおよび容器を
注入器72の側と反対の側に配置することが好ましい。During the polishing, it is preferable to supply the working liquid to the workpiece 30 continuously or intermittently. Further, it is preferable to arrange a chute and a container for receiving the machining fluid flowing out of the workpiece on the side opposite to the injector 72 side.
【0044】移動機構50による被加工物30のストロ
ークの範囲内の研磨が終了すると、チャック42への被
加工物30の把持位置が変更されて、次の範囲内の研磨
が行われる。When the polishing of the workpiece 30 within the range of the stroke by the moving mechanism 50 is completed, the gripping position of the workpiece 30 on the chuck 42 is changed, and the polishing within the following range is performed.
【0045】被加工物30の往復運動の範囲は、たとえ
ば、カム円板54へのクランクシャフト56の取り付け
位置を変更可能にすることにより、調節することができ
る。The range of the reciprocating movement of the workpiece 30 can be adjusted, for example, by allowing the position at which the crankshaft 56 is attached to the cam disk 54 to be changed.
【0046】磁気研磨装置10によれば、被加工物30
の回転と、被加工物30の往復移動とにより、被加工物
30内の加工液は、被研磨面全体にわたって均一に付着
する。また、一方向への被加工物30の移動時の工具7
0の軌跡と他方への移動時の工具70の軌跡とが交差す
るから、加工液が被研磨面全体に均一に付着することと
相まって研磨効率が著しく向上する。According to the magnetic polishing apparatus 10, the workpiece 30
Due to the rotation of the workpiece and the reciprocating movement of the workpiece 30, the processing liquid in the workpiece 30 uniformly adheres to the entire polished surface. In addition, the tool 7 when the workpiece 30 is moved in one direction
Since the trajectory of 0 and the trajectory of the tool 70 at the time of moving to the other cross, the polishing efficiency is remarkably improved in combination with the fact that the working liquid uniformly adheres to the entire surface to be polished.
【0047】図示の例では、1つの磁界発生器16を用
いているが、複数の磁界発生器16を被加工物に軸線方
向へ順次配置してもよい。この場合、工具70を磁界発
生器毎に配置してもよいし、1つの工具を複数の磁界発
生器で共同して回転させてもよい。Although one magnetic field generator 16 is used in the illustrated example, a plurality of magnetic field generators 16 may be sequentially arranged on the workpiece in the axial direction. In this case, the tool 70 may be arranged for each magnetic field generator, or one tool may be rotated jointly by a plurality of magnetic field generators.
【図1】本発明の磁気研磨装置の一実施例を示す正面図
である。FIG. 1 is a front view showing an embodiment of a magnetic polishing apparatus according to the present invention.
【図2】磁界発生器の一実施例を示す拡大図である。FIG. 2 is an enlarged view showing one embodiment of a magnetic field generator.
【図3】駆動機構の一実施例を示す斜視図である。FIG. 3 is a perspective view showing one embodiment of a driving mechanism.
【図4】移動機構の一実施例を示す斜視図である。FIG. 4 is a perspective view showing one embodiment of a moving mechanism.
【図5】回転機構の一実施例を示す斜視図である。FIG. 5 is a perspective view showing one embodiment of a rotation mechanism.
【図6】研磨用工具の一実施例を示す斜視図である。FIG. 6 is a perspective view showing one embodiment of a polishing tool.
10 磁気研磨装置 12 フレーム 16 磁界発生器 18 ヨーク 20 電磁石 30 被加工物 32 駆動機構 34 スライダ 36 レール組立体 42 チャック 50 移動機構 60 回転機構 70 研磨用工具 72 加工液の注入器 DESCRIPTION OF SYMBOLS 10 Magnetic polishing apparatus 12 Frame 16 Magnetic field generator 18 Yoke 20 Electromagnet 30 Workpiece 32 Drive mechanism 34 Slider 36 Rail assembly 42 Chuck 50 Moving mechanism 60 Rotary mechanism 70 Polishing tool 72 Injector of working fluid
Claims (2)
る磁気研磨装置であって、前記内面により規定される空
間内に配置された研磨作用を有する磁性工具を、前記内
面に接触させた状態で、前記被加工物の軸線の周りに回
転させる磁界を発生する磁界発生手段と、前記被加工物
をその軸線の周りに回転させつつ、前記被加工物と前記
工具との間に前記被加工物の軸線方向への相対的な往復
運動を繰り返し生じさせる駆動手段と、砥粒を含む液体
を前記空間内に供給する手段とを含む、磁気研磨装置。1. A magnetic polishing apparatus for polishing a circular inner surface of a non-magnetic workpiece, wherein a magnetic tool having a polishing action arranged in a space defined by the inner surface is brought into contact with the inner surface. Magnetic field generating means for generating a magnetic field that rotates around the axis of the work piece, and rotating the work piece around the axis while the work piece and the tool are between the work piece and the tool. A magnetic polishing apparatus, comprising: driving means for repeatedly causing a relative reciprocating motion of a workpiece in an axial direction; and means for supplying a liquid containing abrasive grains into the space.
物の軸線方向へ移動可能に支持されたスライダと、該ス
ライダに前記軸線の周りに回転可能に支持され、前記被
加工物を杷持するチャックと、前記スライダを前記被加
工物の軸線方向へ移動させる移動機構と、前記チャック
を前記軸線の周りに回転させる回転機構とを備える、請
求項1に記載の磁気研磨装置。2. The driving device according to claim 1, wherein the driving unit is supported by a frame so as to be movable in an axial direction of the workpiece, and is supported by the slider so as to be rotatable around the axis, and holds the workpiece. 2. The magnetic polishing apparatus according to claim 1, further comprising: a chuck that moves the slider in an axial direction of the workpiece; and a rotation mechanism that rotates the chuck around the axis. 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2413584A JP2619740B2 (en) | 1990-12-07 | 1990-12-07 | Magnetic polishing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2413584A JP2619740B2 (en) | 1990-12-07 | 1990-12-07 | Magnetic polishing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04256569A JPH04256569A (en) | 1992-09-11 |
JP2619740B2 true JP2619740B2 (en) | 1997-06-11 |
Family
ID=18522192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2413584A Expired - Fee Related JP2619740B2 (en) | 1990-12-07 | 1990-12-07 | Magnetic polishing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2619740B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7094476B2 (en) | 2002-06-27 | 2006-08-22 | Asahi Tec Corporation | Surface-treated product, surface-treatment method, and surface-treatment apparatus |
CN1321271C (en) * | 2002-06-27 | 2007-06-13 | 旭技术株式会社 | Surface processed part, surface processing method and its device |
CN101410223A (en) * | 2006-03-30 | 2009-04-15 | 旭技术株式会社 | Vertically shaking working device |
CN113894693B (en) * | 2021-10-19 | 2024-03-15 | 中国航发沈阳黎明航空发动机有限责任公司 | Processing method of radial texture of aero-engine disc part |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61260974A (en) * | 1985-05-16 | 1986-11-19 | Toyo Kenmazai Kogyo Kk | Method for polishing internal surface |
JPS62102969A (en) * | 1985-10-30 | 1987-05-13 | Toyo Kenmazai Kogyo Kk | Magnetic polishing method |
-
1990
- 1990-12-07 JP JP2413584A patent/JP2619740B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH04256569A (en) | 1992-09-11 |
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