JP2615241B2 - Vacuum deposition equipment - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hot shutter for blocking vapor of a vapor deposition material in a vacuum vapor deposition apparatus.

[Conventional technology]

FIG. 3 is a cutaway side view showing an example of a deposition chamber of a conventional continuous vacuum deposition apparatus, and FIG. 4 is a cutaway side view showing the operation of a hot shutter.

In these figures, in a vapor deposition chamber (101a) in a casing (101), a cooling roll (102) that rotates around a horizontal axis around a strip-shaped vapor deposition substrate (F) is provided, and a crucible ( 103), a heater (109) and a rectangular cylindrical partitioning room (104) are arranged. In addition, this deposition chamber (101
In a), a hot shutter (105) supported by a rotatable roller (108) is provided so as to be able to move laterally by an air cylinder (107).

The inside of the evaporation chamber (101a) is made substantially vacuum, and the evaporation material (M) such as aluminum in the crucible (103) is heated by the heater (109) to evaporate. And it runs while being cooled by being wound around the cooling roll (102).
For example, a deposition substrate (F) such as a plastic film
Then, the vapor that has risen from below through the partition chamber (104) is deposited. The partition (104) prevents the vapor of the vapor deposition material (M) from diffusing throughout the vapor deposition chamber (101a).

When the above-mentioned vapor deposition is interrupted to change the width of the vapor deposition substrate (F) or the like, as shown in FIG.
Is moved above the partition chamber (104) by the air cylinder (107) to cover the upper surface thereof, thereby blocking the rise of the vapor of the vapor deposition material (M).

[Problems to be solved by the invention]

In the conventional apparatus, since the flat hot shutter (105) is moved in the horizontal direction above the partition (104), the upper surface of the partition (104) must also be flat. On the other hand, the evaporation surface of the evaporation substrate (F) is a cooling roll (102)
It is wrapped around and has an arc shape. Accordingly, during the vapor deposition, as shown in FIG. 3, the gap (a ₀ ) between the upper surface of the partitioning chamber (104) and the cooling roll (102) and the vapor deposition substrate (F) becomes large, and the vapor of the vapor deposition material (M) becomes large. Leaks.

Further, when the vapor deposition is interrupted, the vapor of the vapor deposition material (M) condenses on the lower surface of the hot shutter (105).
When 5) is opened, the deposited vapor deposition material (M) falls on the lower surface. For this reason, the vapor deposition material (M) adheres to the inner surface of the casing (101) and contaminates the inside of the vapor deposition chamber (101a).

[Means for solving the problem]

SUMMARY OF THE INVENTION In order to solve the above-mentioned conventional problems, the present invention provides a cooling roll on which a strip-shaped deposition substrate can be wound around a horizontal axis and which is disposed below the cooling roll to generate vapor of a deposition material. A vapor deposition chamber is provided with a crucible and a partition room provided between the crucible and the cooling roll and formed by a pair of partition plates in a direction crossing the axis and a pair of partition plates parallel to the axis. Vacuum evaporation equipment,
Vacuum deposition, wherein one of the two pairs of partition plates is rotatable around a different horizontal axis from the above, and closes the upper surface of the crucible when the pair turns into a horizontal position. A device is proposed.

[Action]

During the vapor deposition work, a rotatable partition plate is set up to form a partition chamber, and the vapor of the vapor deposition material evaporated in the crucible is prevented from leaking into the vapor deposition chamber, and the vapor deposition material is vapor-deposited while preventing the vapor from the vapor. Deposit on the substrate. When the vapor deposition is interrupted to change the specification of the vapor deposition substrate or the like, the rotatable partition plate is tilted sideways to form a hot shutter, covering the upper surface of the crucible and blocking the rise of steam.

〔Example〕

Hereinafter, an embodiment of the present invention will be specifically described with reference to the drawings. FIG. 1 is a cutaway side view of the continuous vacuum evaporation apparatus, and FIG. 2 is a cutaway side view showing the operation of the hot shutter. The same members and parts as those of the device of the related art are denoted by the same reference numerals, and redundant description will be omitted.

In these figures, (4) is a pair of partitioning plates in a direction intersecting with the axis of the cooling roll (102), and the upper edge has a minimum gap (a) along the outer peripheral surface of the cooling roll (102). And is fixed above both ends of the crucible (103). (5) is a pair of partition plates parallel to the axis of the cooling roll (102), which is inserted between the pair of partition plates (4) and rotated about an axis parallel to the axis. It is possible. When it turns to the horizontal position, it becomes a hot shutter that closes the upper surface of the crucible (103), as shown in FIG. 2, and when it turns to the vertical position, as shown in FIG. A partition room is formed with the plate (4). (7) is an air cylinder for rotating the partition plate (5) via the link (8).

 Next, the operation of the device of the present embodiment will be described.

As shown in FIG. 1, a pair of rotatable partition plates (5)
Is rotated vertically by an air cylinder (7) to form a partition chamber together with a pair of fixed partition plates (4), and then the crucible (103) is evacuated to a substantially vacuum in the vapor deposition chamber (101a).
The evaporation material (M) in the inside is evaporated, and the evaporation substrate (F) wound around the cooling roll (102) and running while being cooled.
Then, the vapor that has risen from below through the partition chamber composed of the partition plates (4) and (5) is deposited. At this time, since the gap (a) between the partition plates (4) and (5) and the cooling roll (102) is extremely small, the vapor of the vapor deposition material (M) hardly leaks into the vapor deposition chamber (101a).

When the above vapor deposition is interrupted to change the width of the vapor deposition substrate (F) or the like, as shown in FIG. 2, the partition plate (5) is turned laterally by an air cylinder (7) to form a hot shutter. , Covering the upper surface of the crucible (103) to prevent the vapor of the vapor deposition material (M) from rising. In this case, even if the vapor of the vapor deposition material adheres to the lower surface of the partition plate (5) when the upper surface of the crucible is covered with the partition plate (5) as a hot shutter, the partition plate (5) stands up when vapor deposition is resumed. The liquid deposition material flows naturally into the crucible. Therefore the casing (10
1) No contamination inside.

In this embodiment, a pair of partition plates (4) that intersect with the axis of the cooling roll (102) are fixed, and a pair of partition plates (5) parallel to the axis of the cooling roll (102) rotate. Although it is possible, the partition plate (4) may be rotatable and the partition plate (5) may be fixed by reversing this.

〔The invention's effect〕

As described above, in the present invention, a part of the partition plate forming the partition chamber is made rotatable and also used as a hot shutter,
Since this is interposed between the cooling roll and the crucible, the gap between the partition chamber and the cooling roll can be reduced, so that the vapor of the vapor deposition material hardly leaks into the vapor deposition chamber.

Also, even if vapor of the vapor deposition material adheres when the upper surface of the crucible is covered with a rotatable partition plate, that is, a hot shutter, it is above the crucible when the hot shutter is set up,
The attached liquid deposition material naturally flows down into the crucible and is collected. Therefore, it is possible to prevent the deposition chamber outside the crucible from being contaminated.

[Brief description of the drawings]

FIG. 1 is a cutaway side view showing a deposition chamber of a continuous vacuum deposition apparatus as one embodiment of the present invention, and FIG. 2 is a cutaway side view showing the operation of a hot shutter. FIG. 3 is a cutaway side view showing a deposition chamber of an example of a conventional continuous vacuum deposition apparatus, and FIG. 4 is a cutaway side view showing the operation of a hot shutter. (4) ... fixed partition plate, (5) ... rotating partition plate (hot shutter), (101) ... casing, (101a) ... vapor deposition chamber, (102) ... cooling roll, (103) ... ... crucible, (F) ... vapor deposition substrate, (M) ... vapor deposition material.

Claims (1)

(57) [Claims] 1. A cooling roll rotatable around a horizontal axis and around which a strip-shaped deposition substrate is wound, a crucible arranged below the cooling roll to generate vapor of a deposition material, the crucible and the cooling roll And a partition chamber formed by a pair of partition plates provided in a direction intersecting with the axis and a pair of partition plates parallel to the axis in the vacuum deposition apparatus. A pair of the partition plates can rotate around a horizontal axis different from the above, and closes the upper surface of the crucible when the pair turns into a horizontal direction.