JP2610552B2 - Cleaning method - Google Patents
Cleaning methodInfo
- Publication number
- JP2610552B2 JP2610552B2 JP3257745A JP25774591A JP2610552B2 JP 2610552 B2 JP2610552 B2 JP 2610552B2 JP 3257745 A JP3257745 A JP 3257745A JP 25774591 A JP25774591 A JP 25774591A JP 2610552 B2 JP2610552 B2 JP 2610552B2
- Authority
- JP
- Japan
- Prior art keywords
- water
- rinsing
- cleaning
- rinse
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/06—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using emulsions
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、油脂、機械油、切削
油、グリース、液晶、フラックス等の汚れが付着した電
子部品、精密部品又はこれらの組立、加工に使用される
治工具類等(以下、電子部品又は精密部品類という)の
洗浄方法に関し、さらに詳細には、すすぎ工程で出るリ
ンス排液の処理性に優れた洗浄方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to electronic parts and precision parts to which dirt such as oils and fats, machine oils, cutting oils, greases, liquid crystals, and fluxes adhere, and jigs and tools used for assembling and processing these parts. The present invention relates to a method for cleaning electronic parts or precision parts), and more particularly to a method for cleaning rinse drainage generated in a rinsing step.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来、
精密部品、治工具等の固体表面に存在する油脂、機械
油、切削油、グリース、液晶、フラックス等の有機物を
主体とする汚れの除去には、ケロシン、ベンゼン、キシ
レン等の炭化水素系溶剤;トリクロロエチレン、テトラ
クロロエチレン等の塩素系溶剤;トリクロロトリフルオ
ロエタン等のフロン系溶剤;界面活性剤やビルダーを配
合した水系の洗浄剤等が使用されている。特に、電子、
電気、機械等の部品には、その高洗浄性、難燃性という
特性を生かしてフロン系溶剤又は塩素系溶剤が使用され
てきた。2. Description of the Related Art
For removing dirt mainly containing organic substances such as oils and fats, machine oils, cutting oils, greases, liquid crystals, and fluxes present on solid surfaces such as precision parts and jigs, hydrocarbon solvents such as kerosene, benzene, and xylene; Chlorinated solvents such as trichloroethylene and tetrachloroethylene; Freon-based solvents such as trichlorotrifluoroethane; aqueous detergents containing surfactants and builders are used. In particular, electronic,
For components such as electric and mechanical parts, a chlorofluorocarbon-based solvent or a chlorine-based solvent has been used, taking advantage of its high detergency and flame retardancy.
【0003】しかしながら、フロン系及び塩素系の溶剤
を用いる洗浄剤は、安全性、毒性、環境汚染性等に大き
な問題を有している。また、炭化水素系溶剤、特にベン
ゼン、キシレン等は毒性が高く、労働安全衛生法上の有
害物に指定されている化合物であり、これを取り扱う作
業の危険性及び煩雑さを考慮すると、洗浄剤として用い
ることは好ましくない。[0003] However, a detergent using a chlorofluorocarbon-based or chlorine-based solvent has serious problems in safety, toxicity, environmental pollution and the like. In addition, hydrocarbon solvents, especially benzene and xylene, are highly toxic and are designated as hazardous substances under the Industrial Safety and Health Act.Considering the danger and complexity of handling these substances, cleaning agents Is not preferred.
【0004】一方、水系洗浄剤は、溶剤系洗浄剤に比較
して危険性や毒性が低く、界面活性剤やビルダー等の洗
浄剤構成成分を適宜選択することにより、優れた洗浄力
を併せ持たせることができる。しかし、この水系洗浄剤
は、一般に水への溶解性が良好であるため、被洗浄材に
付着した洗浄液を水系のリンス液ですすぎ洗い(リン
ス)した後のリンス液(以下、リンス排液という)の排
水処理性が極めて悪いという欠点があった。そして、そ
の処理は、例えば凝集沈澱、加圧浮上、活性汚泥、活性
炭処理法等を用いて行うことができるが、いずれの処理
法も多大な費用及び設備が必要とされる。[0004] On the other hand, aqueous detergents are less dangerous and less toxic than solvent-based detergents, and also have excellent detergency by appropriately selecting detergent components such as surfactants and builders. Can be made. However, since this water-based cleaning agent generally has good solubility in water, a rinsing solution after rinsing (rinsing) the cleaning solution attached to the material to be cleaned with a water-based rinsing solution (hereinafter referred to as rinsing drainage). ) Has the disadvantage that the wastewater treatment property is extremely poor. The treatment can be performed using, for example, coagulation sedimentation, pressure flotation, activated sludge, activated carbon treatment, or the like, but any treatment requires a great deal of cost and equipment.
【0005】従って、このような多大な処理費用、設備
を必要とせず、工業的に有利に電子部品又は精密部品等
を洗浄する方法が望まれていた。[0005] Accordingly, there has been a demand for a method for industrially and advantageously cleaning electronic parts or precision parts without requiring such a large processing cost and equipment.
【0006】[0006]
【課題を解決するための手段】かかる実情において、本
発明者らは鋭意研究を行った結果、特定の洗浄剤を用い
て洗浄した後、5〜100 ℃の水ですすぎ、そのリンス排
液を20℃以上に保てば、リンス排液中の油状汚れ及び洗
浄剤等の有機物を容易に分離除去することができ、その
結果、排水処理性が著しく改善され、さらに分離除去さ
れた後のリンス液は再利用することができることを見出
し本発明を完成した。Means for Solving the Problems Under such circumstances, the present inventors have conducted intensive studies and as a result, after cleaning with a specific cleaning agent, rinsing with 5-100 ° C. water, If the temperature is maintained at 20 ° C. or higher, oily dirt and organic substances such as cleaning agents in the rinsing liquid can be easily separated and removed. As a result, the wastewater treatment property is remarkably improved, and the rinsing after separation and removal is further improved. It has been found that the liquid can be reused, and the present invention has been completed.
【0007】すなわち、本発明は、電子部品又は精密部
品類を洗浄剤で洗浄し(以下、洗浄工程という)、次い
で水を加えてすすぐこと(以下、リンス工程という)に
よる洗浄方法において、洗浄剤の活性成分として、非イ
オン性界面活性剤並びに炭化水素化合物、難水溶性のア
ルキルエステル類及びアルキルケトン類から選ばれる化
合物を含有し、かつ、その洗浄剤を水で希釈又は水を蒸
発させて活性成分の含有割合を5重量%(以下、単に%
で示す)にし、その洗浄剤水溶液を20〜100℃の温
度で30分静置したとき、含有している活性成分の50
%以上が水相から分離する性質を有する洗浄剤組成物を
用い、リンス液として5〜100℃の水を使用し、すす
ぎ洗い後のリンス排液を20℃以上に保って活性成分及
び有機系汚れ成分からなる有機物を分離すること(以
下、分離工程という)を特徴とする電子部品又は精密部
品類の洗浄方法を提供するものである。That is, the present invention provides a method of cleaning electronic parts or precision parts with a cleaning agent (hereinafter referred to as a cleaning step), followed by rinsing with water (hereinafter referred to as a rinsing step). Contains, as an active ingredient, a nonionic surfactant and a hydrocarbon compound, a compound selected from poorly water-soluble alkyl esters and alkyl ketones, and diluting or evaporating the water with the detergent. 5% by weight (hereinafter simply referred to as%
), And when the aqueous detergent solution is allowed to stand at a temperature of 20 to 100 ° C. for 30 minutes, 50% of the contained active ingredient is obtained.
% Or more of a cleaning composition having a property of separating from an aqueous phase, using water of 5 to 100 ° C. as a rinsing liquid, and keeping the rinse drainage after rinsing at 20 ° C. or more to maintain the active ingredient and the organic system. An object of the present invention is to provide a method for cleaning electronic components or precision components, which is characterized by separating an organic substance composed of a dirt component (hereinafter, referred to as a separation step).
【0008】本発明において、洗浄工程で用いられる洗
浄剤組成物は、洗浄剤の活性成分として、非イオン性界
面活性剤並びに炭化水素化合物、難水溶性のアルキルエ
ステル類及びアルキルケトン類から選ばれる化合物を含
有し、かつ、その洗浄剤を水で希釈又は水を蒸発させて
活性成分の含有割合を5%にし、その洗浄剤水溶液を2
0〜100℃の温度で30分静置したとき、含有してい
る活性成分の50%以上が水相から分離するものであ
る。分離する活性成分が50%未満のものでは、すすぎ
洗い後のリンス排液からの洗浄剤の活性成分の分離が充
分でなく、その結果、油汚れ等の有機系汚れ成分も水相
中に溶解、乳化、分散されやすく、排水処理性が充分改
善されず、また、分離処理後の水相をリンス液として再
利用しても有機物含有量が多く、リンス効果が著しく低
下する。排水処理性をより有効に改善し、リンス液の再
利用を可能にするためには、含有している有機物を70
%以上分離する洗浄剤を用いるのが好ましい。In the present invention, the cleaning composition used in the cleaning step is selected from nonionic surfactants and hydrocarbon compounds, poorly water-soluble alkyl esters and alkyl ketones as active ingredients of the cleaning agent. Containing the compound, and diluting the detergent with water or evaporating the water to make the content ratio of the active ingredient 5%.
When left at a temperature of 0 to 100 ° C. for 30 minutes, 50% or more of the contained active ingredient separates from the aqueous phase. When the active ingredient to be separated is less than 50%, the active ingredient of the detergent is not sufficiently separated from the rinse drainage after rinsing, and as a result, organic soil components such as oil stains are dissolved in the aqueous phase. It is easy to emulsify and disperse, does not sufficiently improve wastewater treatment properties, and has a large organic content even if the aqueous phase after the separation treatment is reused as a rinsing liquid, so that the rinsing effect is significantly reduced. In order to more effectively improve the wastewater treatment property and to enable the reuse of the rinsing solution, the contained organic matter must be reduced to 70%.
% Is preferably used.
【0009】ここで用いられる洗浄剤組成物としては、
以上のような特性を有し、かつ満足できる洗浄性を有し
ている物であれば特に限定されないが、例えば曇点が1
00℃以下を示す非イオン性界面活性剤並びに油性の汚
れに対する洗浄性を改良するために使用される炭化水素
化合物、難水溶性のアルキルエステル類及びアルキルケ
トン類から選ばれる化合物を、洗浄剤の活性成分の50
%以上含有する洗浄剤が挙げられる。これらのうち、特
にリンス性を上げるため、これら成分を洗浄剤の活性成
分の70%以上含有するものがより好ましい。なお、こ
こで曇点とは、イオン交換水で20倍に希釈した洗浄剤
組成物10〜30mlを試験管にとり、1℃/分の昇温
速度で温度を上げていったとき、液がにごり出す温度を
いい、この温度以上の温度に保持すると、水溶液中の非
イオン性界面活性剤は水相から徐々に分離する。The cleaning composition used here includes:
There is no particular limitation as long as it has the above characteristics and satisfactory cleaning properties.
A nonionic surfactant showing a temperature of 00 ° C. or lower, a hydrocarbon compound used for improving the detergency against oily soil, a compound selected from poorly water-soluble alkyl esters and alkyl ketones, 50 of active ingredients
% Or more. Among these, those containing 70% or more of the active ingredient of the detergent are more preferable in order to particularly enhance the rinsing property. Here, the cloud point means that when 10 to 30 ml of the detergent composition diluted 20 times with ion-exchanged water is placed in a test tube and the temperature is raised at a rate of 1 ° C./min, the liquid becomes turbid. The temperature at which the solution is discharged. When the temperature is maintained at or above this temperature, the nonionic surfactant in the aqueous solution gradually separates from the aqueous phase.
【0010】非イオン性界面活性剤としては、例えばア
ルキルエーテル型、アルキルアリルエーテル型、アルキ
ルチオエーテル型等のエーテル型;アルキルエステル
型、ソルビタンアルキルエステル型等のエステル型;ポ
リオキシアルキレンアルキルアミン等のアミンとの縮合
型;ポリオキシアルキレンアルキルアマイド等のアミド
との縮合型;ポリオキシエチレンとポリオキシプロピレ
ンをランダム又はブロック縮合させたプルロニック又は
テトロニック型;ポリエチレンイミン系等の界面活性剤
が挙げられる。これらのうち、特に炭素数4〜22の炭化
水素基を有するものが好ましく、このような非イオン性
界面活性剤を含有する洗浄剤組成物は、油性汚れに対す
る親和性が増大して洗浄力が向上するとともに、これが
混入したすすぎ洗い後のリンス排液は明瞭な曇点を示
し、排水処理性が特に良好である。Examples of the nonionic surfactant include ether types such as alkyl ether type, alkyl allyl ether type and alkyl thioether type; ester types such as alkyl ester type and sorbitan alkyl ester type; polyoxyalkylene alkylamines and the like. Condensed forms with amines; Condensed forms with amides such as polyoxyalkylene alkyl amides; Pluronic or tetronic forms obtained by random or block condensation of polyoxyethylene and polyoxypropylene; Surfactants such as polyethyleneimine series . Among them, those having a hydrocarbon group having 4 to 22 carbon atoms are particularly preferable, and a detergent composition containing such a nonionic surfactant has an increased affinity for oily stains and has a higher detergency. In addition to the improvement, the rinse drainage after rinsing in which it is mixed shows a clear cloud point, and the drainage treatment property is particularly good.
【0011】また、炭化水素化合物としては、例えば洗
浄又はリンス工程の温度で液状である炭素数6〜30の直
鎖又は分岐鎖の飽和又は不飽和結合を有するパラフィン
類、オレフィン類、あるいは芳香族、脂環族を含む炭化
水素化合物が挙げられる。さらに、アルキルエステル類
としては、例えば洗浄又はリンス工程の温度で液状であ
る炭素数6〜40のモノエステル、ジエステル、トリエス
テルが挙げられ、特に炭素数6〜18の高級脂肪酸と炭素
数1〜18の高級アルコールのエステル;炭素数6〜18の
高級脂肪酸と炭素数2〜8のジオール又はトリオールと
のエステル;炭素数1〜18の高級アルコールと炭素数2
〜8のジカルボン酸又はトリカルボン酸とのエステルが
好ましい。アルキルケトン類としては、炭素数6〜40の
ジアルキルケトンが好ましい。洗浄剤組成物としては、
これら成分のほか、必要に応じて陰イオン性等の界面活
性剤、ビルダー、キレート剤、防錆剤、消泡剤等を含有
するものを使用することもできる。Examples of the hydrocarbon compound include paraffins, olefins, and aromatics having a linear or branched saturated or unsaturated bond having 6 to 30 carbon atoms which are liquid at the temperature of the washing or rinsing step. And hydrocarbon compounds containing an alicyclic group. Further, examples of the alkyl esters include monoesters, diesters, and triesters having 6 to 40 carbon atoms which are liquid at the temperature of the washing or rinsing step. Particularly, higher fatty acids having 6 to 18 carbon atoms and 1 to 1 carbon atoms are preferred. Esters of higher alcohols having 18 carbon atoms; esters of higher fatty acids having 6 to 18 carbon atoms and diols or triols having 2 to 8 carbon atoms; higher alcohols having 1 to 18 carbon atoms and 2 carbon atoms
Esters with dicarboxylic acids or tricarboxylic acids of ~ 8 are preferred. As the alkyl ketones, dialkyl ketones having 6 to 40 carbon atoms are preferable. As a cleaning composition,
In addition to these components, those containing a surfactant such as an anionic surfactant, a builder, a chelating agent, a rust inhibitor, an antifoaming agent, and the like can be used as necessary.
【0012】洗浄工程は特に限定されないが、例えば浸
漬法、超音波洗浄法、揺動法、スプレー法等を単独又は
組み合わせて行うことができる。Although the washing step is not particularly limited, for example, an immersion method, an ultrasonic cleaning method, an oscillating method, a spray method or the like can be performed alone or in combination.
【0013】リンス工程に用いられるリンス液とは、被
洗浄材上で汚れ及び/又は洗浄剤組成物を含む洗浄液を
すすぎ洗いするための液であり、具体的には洗浄性の面
から純水が好ましいが、排水処理性の面からは、リンス
排液から有機物を分離、除去した後の液を循環使用する
ことが好ましい。The rinsing liquid used in the rinsing step is a liquid for rinsing a cleaning liquid containing a stain and / or a cleaning composition on a material to be cleaned, and more specifically, pure water for cleaning. However, from the viewpoint of wastewater treatment, it is preferable to circulate and use the liquid after separating and removing organic substances from the rinse wastewater.
【0014】すすぎ洗いは、5〜100 ℃のリンス液を用
い、例えば浸漬法、超音波洗浄法、揺動法、スプレー法
等のリンス方法で行われる。リンス液の温度は5〜100
℃、好ましくは20〜70℃である。この範囲外の温度で
は、リンス液の加熱、冷却等に必要なコスト、設備等が
増大するので好ましくない。The rinsing is carried out by using a rinsing liquid at 5 to 100 ° C., for example, by a dipping method, an ultrasonic cleaning method, a oscillating method, a spray method or the like. Rinse liquid temperature is 5-100
° C, preferably 20-70 ° C. A temperature outside this range is not preferred because the cost, equipment, etc., required for heating, cooling, etc. of the rinsing liquid increase.
【0015】分離工程においては、すすぎ洗い後のリン
ス排液を、20〜100℃、好ましくは20〜70℃に
加熱又は冷却し、有機物を分離除去する。リンス排液を
100℃以上に加熱するには加圧等の設備が必要となる
ため、実用上有益でなく、また、20℃未満にするには
夏場等において冷却設備等を設置しなければならず、実
用上有効ではない。特に非イオン性界面活性剤の曇点以
上の温度に加温すると、より有効に分離が行われるので
好ましい。すなわち、曇点以上の温度になると、非イオ
ン性界面活性剤は水溶性を失い、この結果、リンス液中
に可溶化又は乳化していた油性汚れを水中に保持するこ
とができず、油性汚れはその比重の大小により水に浮い
たり沈んだりして分離する。また、非イオン性界面活性
剤自身も水溶性を失って水中から分離する。In the separation step, the rinse liquid after rinsing is heated or cooled to 20 to 100 ° C., preferably 20 to 70 ° C., to separate and remove organic substances. In order to heat the rinse drainage to 100 ° C. or more, equipment such as pressurization is required, which is not practically useful. In addition, to reduce the temperature to less than 20 ° C., cooling equipment must be installed in summer or the like. Not practically effective. In particular, it is preferable to heat the nonionic surfactant to a temperature higher than the cloud point of the nonionic surfactant because separation can be performed more effectively. That is, when the temperature becomes higher than the cloud point, the nonionic surfactant loses water solubility, and as a result, the oily stain solubilized or emulsified in the rinsing liquid cannot be held in water, and the oily stain Floats and sinks in water depending on the specific gravity, and separates. Further, the nonionic surfactant itself loses water solubility and separates from water.
【0016】このようにして分離された有機物、例えば
非イオン性界面活性剤、炭化水素化合物、油性の汚れ成
分等の除去は、リンス排液の受槽又は分離のための専用
槽で、槽の上部又は下部に集まった有機物をすくい取る
方法、連続的に抜き取る方法、分離膜等の補助設備を利
用する方法等を用いて行うことができる。これらの分離
を効率良く行うことにより、リンス排液は清浄化され、
再びリンス液として再使用、すなわち循環使用すること
ができる。循環使用にあたっては、必要により、リンス
液中の水溶性イオンや界面活性剤等の有機物の除去のた
め、イオン交換処理や活性炭による吸着処理又は膜分離
等の処理を行ってもよい。The removal of the organic substances separated in this manner, for example, nonionic surfactants, hydrocarbon compounds, oily dirt components, etc. is carried out in a rinsing drain receiving tank or a dedicated tank for separation, and the upper part of the tank is used. Alternatively, it can be performed by a method of scooping organic substances gathered at a lower portion, a method of continuously extracting organic substances, a method of using auxiliary equipment such as a separation membrane, or the like. By performing these separations efficiently, the rinse drainage is cleaned,
The rinsing liquid can be reused, that is, recycled. In circulating use, if necessary, treatment such as ion exchange treatment, adsorption treatment with activated carbon, or membrane separation may be performed to remove organic substances such as water-soluble ions and surfactants in the rinse solution.
【0017】本発明の洗浄方法は、精密部品及びその組
立加工工程に使用される治工具類等の洗浄時に特に優れ
た効果を有するが、ここで精密部品とは、例えば電子部
品、電機部品、精密機械部品、樹脂加工部品、光学部品
等をいう。電子部品とは、例えば電算機及びその周辺機
器、家電機器、通信機器、OA機器、その他電子応用機
器等に用いられるプリント配線基板;ICリードフレー
ム、抵抗器、コンデンサー、リレー等接点部材に用いら
れるフープ材;OA機器、時計、電算機器、玩具、家電
機器等に用いられる液晶表示器;映像・音声記録/再生
部品、その関連部品等に用いられる磁気記録部品;シリ
コンやセラミックスのウェハ等の半導体材料;水晶振動
子等の電歪用部品;CD、PD、複写機器、光記録機器
等に用いられる光電変換部品などをいう。電機部品と
は、例えばブラシ、ロータ、ステータ、ハウジング等の
電動機部品;販売機や各種機器に用いられる発券用部
品;販売機、キャッシュディスペンサ等に用いられる貨
幣検査用部品などをいう。精密機器部品とは、例えば精
密駆動機器、ビデオレコーダー等に用いられるベアリン
グ;超硬チップ等の加工用部品などをいう。樹脂加工部
品とは、例えばカメラ、自動車等に用いられる精密樹脂
加工部品などをいう。さらに、光学部品とは、例えばカ
メラ、眼鏡、光学機器等に用いられるレンズなどをい
い、その他の部品として、例えばメガネフレーム、時計
ケース、時計ベルト等が挙げられる。また、組立加工工
程に使用される治工具類とは、上述の各種部品例で示し
たような精密部品を製造、成形、加工、組立、仕上げ等
の各種工程において取り扱う治具、工具の他、これらの
精密部品を取り扱う各種機器、その部品等をいう。The cleaning method of the present invention has a particularly excellent effect when cleaning precision parts and jigs and the like used in the assembling process. Here, precision parts include, for example, electronic parts, electric parts, Precision machine parts, resin processed parts, optical parts, etc. Electronic components include, for example, printed wiring boards used in computers and their peripheral devices, home appliances, communication devices, OA devices, and other electronic devices; used in contact members such as IC lead frames, resistors, capacitors, and relays. Hoop material; Liquid crystal display used for OA equipment, clocks, computer equipment, toys, home appliances, etc .; Magnetic recording parts used for video / audio recording / reproduction parts and related parts; Semiconductors such as silicon and ceramic wafers Materials; electrostrictive components such as quartz oscillators; and photoelectric conversion components used for CDs, PDs, copying machines, optical recording devices, and the like. The electric components include, for example, electric motor components such as brushes, rotors, stators, and housings; ticketing components used in vending machines and various devices; and currency inspection components used in vending machines, cash dispensers, and the like. Precision equipment parts include, for example, bearings used in precision drive equipment, video recorders, and the like; machining parts such as carbide chips, and the like. The resin processed parts refer to precision resin processed parts used for cameras, automobiles, and the like, for example. Further, the optical component refers to, for example, a lens used for a camera, eyeglasses, an optical device, and the like, and the other component includes, for example, an eyeglass frame, a watch case, a watch belt, and the like. In addition, jigs and tools used in the assembling process include, in addition to jigs and tools used in various processes such as manufacturing, molding, processing, assembling, and finishing precision components as shown in the above-described various component examples, It refers to various devices that handle these precision parts and their parts.
【0018】本発明の洗浄方法は、特に上述のうち、フ
ラックスの残存したプリント配線基板やガラス基板に付
着した液晶等の洗浄時に好適な性能を発揮するが、本発
明の対象となる精密部品類及び治工具類は、これらの例
に限定されるものではなく、組立加工工程において各種
の加工油やフラックス等の後工程の妨害物質、又は製品
の特性を低下させる各種の油性汚染物質が付着している
一定形状の固体表面を有する精密部品類及び治工具類で
あれば、本発明の洗浄方法を適用することができる。こ
れらの汚染物質が、例えば油脂、機械油、切削油、グリ
ース、液晶、ロジン系フラックス等の、主として有機油
分の汚れである場合、本発明の洗浄方法の特徴が特に発
揮される。さらに、これらに金属粉、無機物粉等が混入
した汚れであっても有効である。The cleaning method of the present invention exhibits a suitable performance particularly for cleaning liquid crystal and the like adhering to a printed wiring board or a glass substrate with residual flux. Jigs and tools are not limited to these examples, and various types of oils and contaminants that may interfere with downstream processes such as processing oils and fluxes in the assembly processing process, or reduce the characteristics of products, may be attached. The cleaning method of the present invention can be applied to precision parts and jigs having a solid surface of a certain shape. When these contaminants are mainly organic oil stains such as oils and fats, machine oils, cutting oils, greases, liquid crystals, and rosin-based fluxes, the characteristics of the cleaning method of the present invention are particularly exhibited. Further, the present invention is effective even for dirt mixed with metal powder, inorganic powder, and the like.
【0019】[0019]
【実施例】次に、実施例を挙げて、本発明を更に詳細に
説明するが、本発明はこれら実施例に限定されるもので
はない。 実施例1〜4 表1に示す組成の洗浄剤組成物を調製し、これらをイオ
ン交換水で活性成分含有量が5%になるよう希釈し、そ
の洗浄剤水溶液を20〜100℃の温度で30分静置し
た。実施例1〜4はいずれも、含有している活性成分の
50%以上が水相から分離することが確認された。また
比較例1〜3の活性成分の分離率は5%以下であった。
次いで、表1に示す洗浄剤組成物を用い、ロジン系のフ
ラックスで処理したプリント基板(10cm×15c
m)〔テスト材1〕、ナフテン系鉱油(40℃、350
cSt)を塗布(1g/m2)した鋼製テストピース
(10cm×15cm)〔テスト材2〕及び液晶を塗布
(5g/m2)したガラス基板(10cm×10cm)
〔テスト材3〕を洗浄した。洗浄は40℃、3分間の超
音波洗浄とした。洗浄後の各被洗浄板(テスト材1〜
3)の各々を40℃のイオン交換水に浸漬し、1分間超
音波をあてながらすすぎ洗い(リンス)した。リンス後
の被洗浄板(テスト材1〜3)の外観はいずれも良好で
あった。次いで、使用後のリンス排液を50℃で30分
間静置した。このとき、実施例においては有機物が上層
又は下層に分離した。この水層をサンプリングしてその
COD(化学的酸素要求量)を測定し(A値)、前記処
理前のリンス液のCOD(B値)と比較し、有機物分離
率〔(B値−A値)÷(B値)〕×100を算定した。
結果を表1に示す。また、比較例の有機物分離率は表1
に示すとおりである。Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples. Examples 1 to 4 Detergent compositions having the composition shown in Table 1 were prepared, diluted with ion-exchanged water so that the active ingredient content became 5%, and the aqueous detergent solution was heated at a temperature of 20 to 100 ° C. It was left for 30 minutes. In each of Examples 1 to 4, it was confirmed that 50% or more of the contained active ingredient was separated from the aqueous phase. In addition, the separation ratio of the active components in Comparative Examples 1 to 3 was 5% or less.
Next, using a cleaning composition shown in Table 1, a printed circuit board (10 cm × 15 c) treated with a rosin-based flux
m) [Test material 1], naphthenic mineral oil (40 ° C, 350
cSt) (1 g / m 2 ) coated steel test piece (10 cm × 15 cm) [test material 2] and a glass substrate (10 cm × 10 cm) coated with liquid crystal (5 g / m 2 )
[Test material 3] was washed. The washing was performed by ultrasonic washing at 40 ° C. for 3 minutes. Each plate to be cleaned after cleaning (test materials 1 to
Each of 3) was immersed in ion-exchanged water at 40 ° C., and rinsed (rinsed) while applying ultrasonic waves for 1 minute. The appearance of the rinsed plates (test materials 1 to 3) after rinsing was all good. Next, the rinse drainage solution after use was allowed to stand at 50 ° C. for 30 minutes. At this time, in the example, the organic matter was separated into an upper layer and a lower layer. This aqueous layer is sampled, its COD (chemical oxygen demand) is measured (A value), and compared with the COD (B value) of the rinsing liquid before the treatment, the organic matter separation rate [(B value−A value) ) ÷ (B value)] × 100.
Table 1 shows the results. Table 1 shows the organic matter separation rate of the comparative example.
As shown in FIG.
【0020】[0020]
【表1】 [Table 1]
【0021】表1の結果から明らかなように、実施例1
〜4では、有機物の分離率が高く、また、分離して得ら
れたリンス液はCODが低いことから、有機物が少ない
ことが認められた。なお、分離率50%以上のもの(実施
例のすべて)は、その水層をリンス液として再使用して
も良好なリンス性を示し、特に分離率70%以上のものは
優秀であった。As is clear from the results in Table 1, Example 1
In Nos. To 4, it was recognized that the organic matter separation rate was high, and the rinse liquid obtained by separation had low organic matter because the COD was low. Incidentally, those having a separation rate of 50% or more (all of Examples) exhibited good rinsing properties even when the aqueous layer was reused as a rinsing liquid, and those having a separation rate of 70% or more were excellent.
【0022】[0022]
【発明の効果】本発明によれば、リンス排液中の有機物
を効率良く高濃度に分離除去することができ、後の排水
処理工程が簡素化できるため、特に油脂、機械油、切削
油、グリース、液晶、フラックス等の汚れが付着した電
子部品又は精密部品類を工業的に有利に洗浄することが
できる。さらに、本発明により分離処理したリンス排液
は、再びリンス液として使用することができるため、リ
ンスに使用する水の量を大幅に低減することができ、経
済性にも優れている。According to the present invention, it is possible to efficiently separate and remove high-concentration organic substances from the rinse wastewater, and to simplify the subsequent wastewater treatment process. Electronic components or precision components to which dirt such as grease, liquid crystal, or flux adheres can be industrially advantageously cleaned. Furthermore, since the rinse drainage separated according to the present invention can be used again as a rinse liquid, the amount of water used for the rinse can be greatly reduced, and the cost is excellent.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 C11D 7:24 7:26) (56)参考文献 特開 平4−122480(JP,A) 特開 平4−68097(JP,A) 特開 平2−63503(JP,A) 特開 平1−210004(JP,A) 特開 昭58−34182(JP,A) 特開 昭55−47104(JP,A) 特開 昭52−135844(JP,A) 特開 昭50−56744(JP,A) 特公 昭56−15792(JP,B2)──────────────────────────────────────────────────続 き Continuation of the front page (51) Int.Cl. 6 Identification code Agency reference number FI Technical indication location C11D 7:24 7:26) (56) References JP-A-4-122480 (JP, A) JP-A-4-68097 (JP, A) JP-A-2-63503 (JP, A) JP-A-1-210004 (JP, A) JP-A-58-34182 (JP, A) JP-A-55-47104 JP, A) JP-A-52-135844 (JP, A) JP-A-50-56744 (JP, A) JP-B-56-15792 (JP, B2)
Claims (2)
し、次いで水を加えてすすぐことによる洗浄方法におい
て、洗浄剤の活性成分として、非イオン性界面活性剤並
びに炭化水素化合物、難水溶性のアルキルエステル類及
びアルキルケトン類から選ばれる化合物を含有し、か
つ、その洗浄剤を水で希釈又は水を蒸発させて活性成分
の含有割合を5重量%にし、その洗浄剤水溶液を20〜
100℃の温度で30分静置したとき、含有している活
性成分の50重量%以上が水相から分離する性質を有す
る洗浄剤組成物を用い、リンス液として5〜100℃の
水を使用し、すすぎ洗い後のリンス排液を20℃以上に
保って活性成分及び有機系汚れ成分からなる有機物を分
離することを特徴とする電子部品又は精密部品類の洗浄
方法。1. A cleaning method in which electronic parts or precision parts are washed with a detergent, and then rinsed by adding water, wherein a nonionic surfactant, a hydrocarbon compound, and a poorly water-soluble compound are used as active components of the detergent. Containing a compound selected from acidic alkyl esters and alkyl ketones, and diluting the detergent with water or evaporating the water to make the content of the active ingredient 5% by weight.
A detergent composition having a property that 50% by weight or more of the contained active ingredient is separated from an aqueous phase when left at a temperature of 100 ° C for 30 minutes, and water of 5 to 100 ° C is used as a rinsing liquid. A method for cleaning electronic parts or precision parts, wherein the rinse drainage after rinsing is maintained at 20 ° C. or higher to separate organic substances composed of active components and organic dirt components.
分離除去した残りの液を、リンス液として循環使用する
ことを特徴とする請求項1記載の洗浄方法。2. The cleaning method according to claim 1, wherein the remaining liquid obtained by separating and removing the organic matter from the rinse waste liquid after the rinse is circulated and used as a rinse liquid.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3257745A JP2610552B2 (en) | 1991-10-04 | 1991-10-04 | Cleaning method |
| DE69216525T DE69216525T2 (en) | 1991-10-04 | 1992-10-02 | Cleaning process |
| EP92116881A EP0535689B1 (en) | 1991-10-04 | 1992-10-02 | Cleaning process |
| US08/334,442 US5522940A (en) | 1991-10-04 | 1994-11-04 | Process for cleaning electronic parts or precision parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3257745A JP2610552B2 (en) | 1991-10-04 | 1991-10-04 | Cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0596255A JPH0596255A (en) | 1993-04-20 |
| JP2610552B2 true JP2610552B2 (en) | 1997-05-14 |
Family
ID=17310514
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3257745A Expired - Lifetime JP2610552B2 (en) | 1991-10-04 | 1991-10-04 | Cleaning method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5522940A (en) |
| EP (1) | EP0535689B1 (en) |
| JP (1) | JP2610552B2 (en) |
| DE (1) | DE69216525T2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2736365B2 (en) | 1994-10-13 | 1998-04-02 | 花王株式会社 | Cleaning method and cleaning agent |
| JP2816928B2 (en) | 1993-09-16 | 1998-10-27 | 花王株式会社 | Cleaning method |
| JP2816805B2 (en) | 1993-12-29 | 1998-10-27 | 花王株式会社 | Cleaning method |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0750532B1 (en) * | 1994-03-18 | 2001-05-23 | Kao Corporation | Cleaning process |
| JP2726234B2 (en) * | 1994-04-28 | 1998-03-11 | アイシン化工株式会社 | Machine parts cleaning equipment |
| NO180595C (en) * | 1994-09-16 | 1997-05-14 | Norsk Hydro As | Method for controlling the surface properties of magnesium particles |
| AU1829500A (en) | 1998-11-25 | 2000-06-13 | Petroferm Inc. | Aqueous cleaning |
| EP1293589A3 (en) * | 2001-09-17 | 2004-10-13 | Nissan Motor Company, Limited | Apparatus for pretreatment prior to painting |
| EP1595940A1 (en) * | 2004-05-12 | 2005-11-16 | Malaysian Palm Oil Board | High performance cleaning agent |
| JP5725721B2 (en) * | 2010-02-22 | 2015-05-27 | 花王株式会社 | Liquid detergent composition |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5056744A (en) * | 1973-09-21 | 1975-05-17 | ||
| DE2927873A1 (en) * | 1979-07-11 | 1981-02-05 | Senkingwerk Gmbh Kg | POST WASHING MACHINE |
| US4414128A (en) * | 1981-06-08 | 1983-11-08 | The Procter & Gamble Company | Liquid detergent compositions |
| US4640719A (en) * | 1985-07-01 | 1987-02-03 | Petroleum Fermentations N.V. | Method for printed circuit board and/or printed wiring board cleaning |
| US4867800B1 (en) * | 1988-07-21 | 1995-02-14 | Du Pont | Cleaning composition of terpene compound and dibasic ester |
| US4983224A (en) * | 1988-10-28 | 1991-01-08 | Rd Chemical Company | Cleaning compositions and methods for removing soldering flux |
| GB8913881D0 (en) * | 1989-06-16 | 1989-08-02 | Unilever Plc | Detergent compositions |
| CA2024589A1 (en) * | 1989-09-05 | 1991-03-06 | Masaru Sugita | Cleaning compositions and applications thereof |
| JPH0457899A (en) * | 1990-06-27 | 1992-02-25 | Arakawa Chem Ind Co Ltd | Detergent for rosing solder flux and method for washing rosin solder flux using said detergent |
| DE69110359T2 (en) * | 1990-07-10 | 1996-03-21 | Kao Corp | Composition for cleaning electronic and precision parts and cleaning processes. |
| US5096501A (en) * | 1990-08-27 | 1992-03-17 | E. I. Du Pont De Nemours & Company | Environmentally safe cleaning process and cleaning composition useful therein |
-
1991
- 1991-10-04 JP JP3257745A patent/JP2610552B2/en not_active Expired - Lifetime
-
1992
- 1992-10-02 DE DE69216525T patent/DE69216525T2/en not_active Expired - Fee Related
- 1992-10-02 EP EP92116881A patent/EP0535689B1/en not_active Expired - Lifetime
-
1994
- 1994-11-04 US US08/334,442 patent/US5522940A/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2816928B2 (en) | 1993-09-16 | 1998-10-27 | 花王株式会社 | Cleaning method |
| JP2816805B2 (en) | 1993-12-29 | 1998-10-27 | 花王株式会社 | Cleaning method |
| JP2736365B2 (en) | 1994-10-13 | 1998-04-02 | 花王株式会社 | Cleaning method and cleaning agent |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0596255A (en) | 1993-04-20 |
| US5522940A (en) | 1996-06-04 |
| DE69216525T2 (en) | 1997-05-28 |
| DE69216525D1 (en) | 1997-02-20 |
| EP0535689B1 (en) | 1997-01-08 |
| EP0535689A2 (en) | 1993-04-07 |
| EP0535689A3 (en) | 1993-12-08 |
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