JP2606116B2 - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2606116B2
JP2606116B2 JP33464993A JP33464993A JP2606116B2 JP 2606116 B2 JP2606116 B2 JP 2606116B2 JP 33464993 A JP33464993 A JP 33464993A JP 33464993 A JP33464993 A JP 33464993A JP 2606116 B2 JP2606116 B2 JP 2606116B2
Authority
JP
Japan
Prior art keywords
power supply
bypass capacitor
conductor layer
terminal
package
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP33464993A
Other languages
Japanese (ja)
Other versions
JPH07202072A (en
Inventor
浩亨 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP33464993A priority Critical patent/JP2606116B2/en
Publication of JPH07202072A publication Critical patent/JPH07202072A/en
Application granted granted Critical
Publication of JP2606116B2 publication Critical patent/JP2606116B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49109Connecting at different heights outside the semiconductor or solid-state body

Landscapes

  • Semiconductor Integrated Circuits (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明の半導体装置に関し、特に
半導体装置用のパッケージの内部に形成したバイパスコ
ンデンサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device of the present invention, and more particularly to a bypass capacitor formed inside a package for a semiconductor device.

【0002】[0002]

【従来の技術】従来、半導体装置用のパッケージの内部
にバイパスコンデンサを形成した構造としては、特開平
3−94452、特開昭59−211251がある。こ
の従来例に関し図面を用いて説明する。
2. Description of the Related Art Hitherto, as a structure in which a bypass capacitor is formed inside a package for a semiconductor device, there are JP-A-3-94452 and JP-A-59-211121. This conventional example will be described with reference to the drawings.

【0003】図6は、従来のパッケージ内部のバイパス
コンデンサの構造を示す断面図である。また、図7は、
従来のパッケージの電源、接地導体の回路図である。
FIG. 6 is a sectional view showing the structure of a conventional bypass capacitor inside a package. Also, FIG.
It is a circuit diagram of a power supply and a ground conductor of a conventional package.

【0004】図6によると、電源端子1に接続された電
源導体層2−a,bはセラミックあるいはポリカーボネ
ートなどで構成された絶縁層3をはさんで接地端子4に
接続された接地導体層5−a〜cと交互に積層されてい
る。信号端子6は、各々信号導体層7、ボンディングワ
イヤ8−cを介して半導体チップ9に接続される。同様
に、電源導体層2、接地導体層5は各々ボンディングワ
イヤ5−bを介して半導体チップ9に接続される。上記
の様に構成された電源導体層2と接地導体層5とは、積
層コンデンサを構成し半導体チップ9の直近に接続され
るため、パッケージの外部に接続するバイパスコンデン
サに比較し電源の高周波インピーダンスを低減する効果
が大きい。この効果を回路図を用いて説明する。図7に
示した回路で、端子V1′,G1′は各々半導体チップ
と接続する電源端子1、接地端子4、V2′,G2′は
各々プリント基板などに接続する電源端子1、接地端子
4である。一般的に半導体チップ内の素子の動作状態で
電源電流は変化するが、この電源電流の変化は電源端子
V1′を介しパッケージ内の電源導体に伝達される。伝
達された電源電流の変化は、電源導体のボンディングワ
イヤやボンディングステッチ部分のインダクタンス
V1′の逆起電力により電圧変動となり、プリント基板
などに接続される電源端子V2′へ導出される。この時
電源変動を抑える手段として、バイパスコンデンサ
B ′を電源導体と接地導体間に挿入し、電源変動(交
流成分)をバイパスコンデンサ側に伝達し、安定な電位
であるG2′端子側へ導出する。つまり、パッケージ内
の電源回路の交流的なインピーダンスは、電源導体の純
抵抗RV1′,RV2′およびインダクタンスLV1′,
V2′によるインピーダンスと、バイパスコンデンサC
B ′から接地導体への導出経路にあるLC1′,LC2′,
B ′,RG2′,LG2′とのインピーダンスの合成(並
列)インピーダンスとなり電源導体単体の場合よりイン
ピーダンスを低減することができる。以上述べた従来例
では、コンデンサを形成する絶縁体がパッケージ基体を
形成する絶縁体と同一の材料で構成され、一般的にはア
ルミナ等のセラミックを想定した構造を呈している。
According to FIG. 6, power supply conductor layers 2-a and 2-b connected to a power supply terminal 1 have a ground conductor layer 5 connected to a ground terminal 4 with an insulating layer 3 made of ceramic or polycarbonate interposed therebetween. -A to c are alternately stacked. The signal terminals 6 are connected to the semiconductor chip 9 via the signal conductor layers 7 and the bonding wires 8-c, respectively. Similarly, the power supply conductor layer 2 and the ground conductor layer 5 are connected to the semiconductor chip 9 via bonding wires 5-b, respectively. Since the power supply conductor layer 2 and the ground conductor layer 5 configured as described above constitute a multilayer capacitor and are connected in close proximity to the semiconductor chip 9, the high-frequency impedance of the power supply is lower than that of a bypass capacitor connected outside the package. The effect of reducing is large. This effect will be described with reference to a circuit diagram. In the circuit shown in FIG. 7, terminals V1 'and G1' are a power supply terminal 1 connected to a semiconductor chip, and a ground terminal 4, V2 'and G2' are a power supply terminal 1 and a ground terminal 4 connected to a printed circuit board or the like, respectively. is there. Generally, the power supply current changes depending on the operation state of the elements in the semiconductor chip, and the change in the power supply current is transmitted to the power supply conductor in the package via the power supply terminal V1 '. The change in the transmitted power supply current becomes a voltage fluctuation due to the back electromotive force of the inductance L V1 ′ of the bonding wire or bonding stitch portion of the power supply conductor, and is led to the power supply terminal V 2 ′ connected to a printed circuit board or the like. At this time, as a means for suppressing power fluctuation, a bypass capacitor C B ′ is inserted between the power conductor and the ground conductor to transmit the power fluctuation (AC component) to the bypass capacitor side and led out to a stable potential G2 ′ terminal side. I do. That is, the AC impedance of the power supply circuit in the package is determined by the pure resistances R V1 ′ and R V2 ′ and the inductance L V1 ′ of the power supply conductor.
The impedance due to LV2 'and the bypass capacitor C
'L C1 from the derivation path to ground conductors' B, L C2',
It becomes a combined (parallel) impedance of the impedances of C B ′, R G2 ′, and L G2 ′, and the impedance can be reduced as compared with the case of a single power supply conductor. In the conventional example described above, the insulator forming the capacitor is made of the same material as the insulator forming the package base, and generally has a structure assuming a ceramic such as alumina.

【0005】エポキシ樹脂などのプラスチックをパッケ
ージ基体とした従来例としては、特開昭57−4925
9がある。この従来例について図面を用いて説明する。
図8(a)はこの第二の従来例の平面図、(b)は断面
図である。
A conventional example using a package base made of a plastic such as an epoxy resin is disclosed in Japanese Patent Laid-Open No. 57-4925.
There are nine. This conventional example will be described with reference to the drawings.
FIG. 8A is a plan view of the second conventional example, and FIG. 8B is a sectional view.

【0006】この第二の従来例では、半導体チップ23
直下のダイパッド24部は、金属導体24−a〜cと誘
電体25−a,bの積層構造を呈しており、これにより
パッケージ内部にコンデンサを形成してボンディングワ
イヤ26−a〜eで半導体チップ23やリード27の接
地電位や電源電位との接続を行ないコンデンサとして機
能させている。この第二の従来例では、コンデンサをパ
ッケージ内部に有することによる効果は先に述べた従来
例などと同様の効果を有しているものと思われるが、電
気的接続がボンディングワイヤのみで行われるためイン
ダクタンスが大きくなり易く、所望の効果を得られない
可能性もある。また、プラスチックパッケージの簡便な
構造による安価さなどを損なっていることも事実であ
る。
In this second conventional example, the semiconductor chip 23
The die pad 24 directly below has a laminated structure of metal conductors 24-ac and dielectrics 25-a and 25b, whereby a capacitor is formed inside the package and the semiconductor chip is bonded by bonding wires 26-ae. The connection to the ground potential and the power supply potential of the leads 23 and the leads 27 is made to function as a capacitor. In this second conventional example, it is considered that the effect of having the capacitor inside the package has the same effect as that of the above-described conventional example, but the electrical connection is made only by the bonding wire. Therefore, the inductance is likely to be large, and the desired effect may not be obtained. It is also true that the simple structure of the plastic package impairs the cost and the like.

【0007】[0007]

【発明が解決しようとする課題】一般的に、バイパスコ
ンデンサをパッケージ内部に構成することにより電源導
体の高周波インピーダンスを低減し、半導体チップの動
作状態による電源電位変動を小さくできる。バイパスコ
ンデンサによって電源インピーダンスを低減し電源電位
変動を抑制する場合、その充分な効果を得るためには電
源インピーダンスに比べバイパスコンデンサを介したイ
ンピーダンスが広い周波数帯域にわたって小さくなるこ
とが望ましい。しかしなから、従来の半導体装置用パッ
ケージに内蔵されたバイパスコンデンサの場合、パッケ
ージ内で単一的な構造でバイパスコンデンサを形成して
いるため電源導体のインダクタンスとバイパスコンデン
サの静電容量の比率がパッケージ内で一定となる。これ
により、バイパスコンデンサを介したインピーダンスの
共振は一点のみとなり、電源導体単体のインピーダンス
と同等またはそれ以下となる周波数帯域は狭くなる欠点
があった。
Generally, a high-frequency impedance of a power supply conductor is reduced by forming a bypass capacitor inside a package, and a fluctuation in power supply potential due to an operation state of a semiconductor chip can be reduced. When the power supply impedance is reduced by the bypass capacitor to suppress the power supply potential fluctuation, it is desirable that the impedance via the bypass capacitor be smaller than the power supply impedance over a wide frequency band in order to obtain a sufficient effect. However, in the case of a bypass capacitor built into a conventional semiconductor device package, the ratio of the inductance of the power supply conductor and the capacitance of the bypass capacitor is reduced because the bypass capacitor is formed in a single structure in the package. It is constant within the package. As a result, the impedance resonance via the bypass capacitor becomes only one point, and there is a disadvantage that the frequency band in which the impedance is equal to or less than the impedance of the power supply conductor alone is narrowed.

【0008】[0008]

【課題を解決するための手段】本発明の半導体装置用パ
ッケージでは、半導体装置の電源−接地電位間に取り付
けるバイパスコンデンサを半導体装置用パッケージ内に
形成し、このバイパスコンデンサの静電容量値をパッケ
ージ内の場所により変化させた構造を有している。
In a semiconductor device package according to the present invention, a bypass capacitor attached between a power supply and a ground potential of the semiconductor device is formed in the semiconductor device package, and the capacitance value of the bypass capacitor is measured by the package. It has a structure that changes depending on the location inside.

【0009】[0009]

【実施例】本発明の半導体用パッケージにおけるバイパ
スコンデンサ内蔵構造について図面を用いて説明する。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a semiconductor package according to the present invention;

【0010】図1によると、電源端子1に電源配線10
を介して接続された金属(金、アルミ等)層または半導
体(ポリシリコン等)層からなる電源導体層2−a,b
は、セラミックあるいはポリカーボネート等で構成され
た絶縁層3をはさんで金属からなる接地端子4に接地1
1を介して接続された接地導体層5−a,b,cと交互
に積層されている。信号端子6は各々信号配線12、信
号導体層7、金もしくは金との合金でなるボンディング
ワイヤ8−cを介して半導体チップ9に接続される。同
様に、電源導体層2−a,b、接地導体層5−a,b,
cは各々電源配線13、接地配線14、ボンディングワ
イヤ8−a,8−bを介して半導体チップに接続され
る。電源導体層2−a,bと接地導体層5−a,b,c
は、絶縁層を挟んで積層されるが半導体チップ9の直下
部分と端子近傍の周辺部分とで積層数を変えている。す
なわち、電源導体層2−bと接地導体層5−cとは、半
導体チップ9の直下部分において導体パターンの形成を
行っていない。これに対応する斜視図を図2に示す。こ
こでスルーホール17は、外部端子16を特定の導電地
層に接続するために接続を必要としない導電体層に外部
端子16からの配線を通過させるために設けている。ボ
ンディングステッチ18は、外部端子16を半導体チッ
プ9と接続するために設けている。蓋19は金属等で構
成されている。その他の部分は図1に示したものと同一
であるため説明を省略する。これにより、チップ直下部
分と端子周辺部分とで単位面積当たりの静電容量と導体
のインダクタンスの比率を変えることが可能となり、便
宜的に二つの共振周波数を得ることができる。この電源
導体、接地導体を回路図で表したものが図3である。図
3によると、半導体チップ9で発生した電源電流は半導
体チップと接続される電源端子V1からパッケージへ流
入する。半導体チップ9の動作状態により電源電流は変
化し、これによりボンディングワイヤ8−a,b,c、
各導体層2,5,7および各配線10,11,12,1
3,14等のインダクタンスLV1の逆起電力が発生し電
源電圧変動となる。この変動を効果的に低減するには、
バイパスコンデンサを電源導体と接地導体間に挿入し電
源電圧変動成分(交流成分)をバイパスコンデンサ側に
伝達し、安定な電位であるG2端子側へ導出する経路を
設けて置けば良い。本実施例においては、バイパスコン
デンサの構成が単位面積あたりの容量値の違いや周囲の
インダクタンスの違いによりCB1とCB2と2つのコンデ
ンサで構成されることになる。
According to FIG. 1, a power supply wiring 10 is connected to a power supply terminal 1.
Power supply conductor layers 2-a, b made of a metal (gold, aluminum, etc.) layer or a semiconductor (polysilicon, etc.) layer
Is connected to a ground terminal 4 made of metal with an insulating layer 3 made of ceramic, polycarbonate or the like interposed therebetween.
1 and are alternately stacked with the ground conductor layers 5-a, b, and c connected to each other. Each of the signal terminals 6 is connected to the semiconductor chip 9 via a signal wiring 12, a signal conductor layer 7, and bonding wires 8-c made of gold or an alloy with gold. Similarly, the power supply conductor layers 2-a, b, the ground conductor layers 5-a, b,
c is connected to the semiconductor chip via a power supply line 13, a ground line 14, and bonding wires 8-a and 8-b, respectively. Power supply conductor layers 2-a, b and ground conductor layers 5-a, b, c
Are stacked with an insulating layer interposed therebetween, but the number of layers is changed between a portion directly below the semiconductor chip 9 and a peripheral portion near the terminals. That is, the power supply conductor layer 2-b and the ground conductor layer 5-c do not form a conductor pattern immediately below the semiconductor chip 9. FIG. 2 shows a corresponding perspective view. Here, the through-hole 17 is provided to allow the wiring from the external terminal 16 to pass through a conductor layer that does not need to be connected to connect the external terminal 16 to a specific conductive ground layer. The bonding stitch 18 is provided for connecting the external terminal 16 to the semiconductor chip 9. The lid 19 is made of metal or the like. The other parts are the same as those shown in FIG. This makes it possible to change the ratio of the capacitance per unit area and the inductance of the conductor between the portion immediately below the chip and the portion around the terminals, and two resonance frequencies can be obtained for convenience. FIG. 3 is a circuit diagram showing the power conductor and the ground conductor. According to FIG. 3, the power supply current generated in the semiconductor chip 9 flows into the package from the power supply terminal V1 connected to the semiconductor chip. The power supply current changes depending on the operation state of the semiconductor chip 9, whereby the bonding wires 8-a, b, c,
Each conductor layer 2, 5, 7 and each wiring 10, 11, 12, 1
The back electromotive force of the inductance L V1 such as 3, 14 is generated, and the power supply voltage fluctuates. To effectively reduce this variation,
A bypass capacitor may be inserted between the power supply conductor and the ground conductor to transmit a power supply voltage fluctuation component (AC component) to the bypass capacitor side, and a path may be provided for leading to a stable potential G2 terminal side. In this embodiment, the configuration of the bypass capacitor is composed of two capacitors, C B1 and C B2 , due to the difference in capacitance value per unit area and the difference in the surrounding inductance.

【0011】図1に示した本発明の半導体装置用のパッ
ケージと図6に示した従来の半導体装置用パッケージの
バイパスコンデンサの効果の違いについてグラフを用い
て説明する。図1と図6に示したパッケージにおいて異
なる点はバイパスコンデンサの構成のみで、図1のパッ
ケージでは図6のパッケージと比べ半導体チップ直下部
分の静電容量を2分の1としてある。この時の電源イン
ピーダンスの周波数変化を図4に示す。これによると電
源導体単位のインピーダンス特性(点線で記入)は、従
来の本発明ではほぼ等しく、従来のパッケージのバイパ
スコンデンサを介したインピーダンス特性(一点鎖線で
記入)のほうが共振周波数は低くそのときのインピーダ
ンスも小さくなっている。しかし、本発明のパッケージ
のバイパスコンデンサを介したインピーダンス特性(実
線で記入)は、二つの共振周波数を有しその周波数が比
較的近接しているので電源導体単体のインピーダンスと
同等以下の値となる周波数帯域幅Bは、従来パッケージ
における周波数帯域幅B′と比べ2倍程度広くなる。
The difference in the effect of the bypass capacitor between the semiconductor device package of the present invention shown in FIG. 1 and the conventional semiconductor device package shown in FIG. 6 will be described with reference to a graph. The only difference between the packages shown in FIGS. 1 and 6 is the configuration of the bypass capacitor. In the package of FIG. 1, the capacitance immediately below the semiconductor chip is halved compared to the package of FIG. FIG. 4 shows the frequency change of the power source impedance at this time. According to this, the impedance characteristics of each power supply conductor (filled by a dotted line) are almost the same in the present invention, and the impedance characteristics via a bypass capacitor of a conventional package (filled by a dashed line) have a lower resonance frequency. The impedance has also become smaller. However, the impedance characteristic (filled with a solid line) of the package of the present invention via the bypass capacitor has a value equal to or less than the impedance of the power supply conductor alone since it has two resonance frequencies and the frequencies are relatively close to each other. The frequency bandwidth B is about twice as wide as the frequency bandwidth B 'in the conventional package.

【0012】次に本発明の第2の実施例について説明す
る。図5では、半導体装置用パッケージ内でバイパスコ
ンデンサの静電容量値を変化させるためにパッケージ基
体15の外部端子16の設けられ領域に電源導体層2−
bと接地導体層5−c,dから成るバイパスコンデンサ
を形成し、かつ半導体チップ9直下部分からパッケージ
端面に至る部分にも電源導体層2−a、接地導体層5−
a,bによりバイパスコンデンサを構成している。この
様にバイパスコンデンサを構成することにより、さきの
実施例で述べた効果はもとより、外部端子16側から流
入する雑音成分に対しても低減効果が得られる特徴があ
る。これは、外部端子16の直近に静電容量成分を有し
インダクタンス成分としては外部端子16のみであるの
で比較的広い周波数帯域でバイパスコンデンサのインピ
ーダンスを小さくすることが可能であるからである。
Next, a second embodiment of the present invention will be described. In FIG. 5, in order to change the capacitance value of the bypass capacitor in the semiconductor device package, the power supply conductor layer 2-
b and the grounding conductor layers 5-c and d are formed, and the power supply conductor layer 2-a and the grounding conductor layer 5-
a and b constitute a bypass capacitor. By configuring the bypass capacitor in this manner, the effect of reducing the noise component flowing from the external terminal 16 as well as the effect described in the previous embodiment can be obtained. This is because the impedance of the bypass capacitor can be reduced in a relatively wide frequency band since the external terminal 16 has a capacitance component in the immediate vicinity of the external terminal 16 and has only the external terminal 16 as an inductance component.

【0013】本発明の第1及び第2の実施例では、半導
体パッケージ内の電源導体層と接地導体層の積層数を部
分的に変化させることによって異なる静電容量のバイパ
スコンデンサを得ているが、部分的に電源導体層と接地
導体層の間隔を変化させてもよいし、部分的に電源導体
層と接地導体層との間の絶縁膜の誘電率を変化させて異
なる静電容量のバイパスコンデンサを得てもよい。
In the first and second embodiments of the present invention, a bypass capacitor having different capacitance is obtained by partially changing the number of layers of the power supply conductor layer and the ground conductor layer in the semiconductor package. Alternatively, the distance between the power supply conductor layer and the ground conductor layer may be partially changed, or the dielectric constant of the insulating film between the power supply conductor layer and the ground conductor layer may be partially changed to bypass different capacitances. A capacitor may be obtained.

【0014】[0014]

【発明の効果】以上説明したように、本発明の半導体装
置用のパッケージにおけるバイパスコンデンサの構造
は、パッケージ内に静電容量値の異なるコンデンサを複
数構成することにより、バイパスコンデンサと導体部イ
ンダクタンスの共振周波数を複数にすることができる。
この複数の共振周波数は、バイパスコンデンサの静電容
量値を適宜調整することにより2〜10倍の間で設定可
能である。従って、本発明のバイパスコンデンサの構成
を施すことにより従来のバイパスコンデンサの構成に比
べ周波数帯域を広げることが可能で、広範囲の周波数帯
域において電源電圧の抑制効果を大きくすることができ
る。
As described above, the structure of the bypass capacitor in the package for a semiconductor device according to the present invention is such that a plurality of capacitors having different capacitance values are formed in the package so that the inductance of the bypass capacitor and the inductance of the conductor part are reduced. A plurality of resonance frequencies can be provided.
The plurality of resonance frequencies can be set between 2 and 10 times by appropriately adjusting the capacitance value of the bypass capacitor. Therefore, by applying the configuration of the bypass capacitor of the present invention, the frequency band can be expanded as compared with the configuration of the conventional bypass capacitor, and the power supply voltage suppressing effect can be increased in a wide frequency band.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を示す半導体装置用パッケー
ジの断面図。
FIG. 1 is a cross-sectional view of a semiconductor device package according to an embodiment of the present invention.

【図2】図1の斜視図。FIG. 2 is a perspective view of FIG. 1;

【図3】図1の半導体装置用パッケージの電源・接地導
体の回路図。
FIG. 3 is a circuit diagram of power and ground conductors of the semiconductor device package of FIG. 1;

【図4】バイパスコンデンサのインピーダンスの周波数
特性を示すグラフ。
FIG. 4 is a graph showing frequency characteristics of impedance of a bypass capacitor.

【図5】本発明の第2の実施例を示す半導体装置用のパ
ッケージの断面図。
FIG. 5 is a sectional view of a semiconductor device package according to a second embodiment of the present invention.

【図6】従来の半導体装置用パッケージの断面図。FIG. 6 is a cross-sectional view of a conventional semiconductor device package.

【図7】図5の半導体装置用パッケージの電源・接地導
体の回路図。
FIG. 7 is a circuit diagram of a power supply / ground conductor of the semiconductor device package of FIG. 5;

【図8】(a)は第二の従来例の半導体装置用パッケー
ジの平面図、(b)は(a)の断面図。
8A is a plan view of a second conventional semiconductor device package, and FIG. 8B is a cross-sectional view of FIG. 8A.

【符号の説明】[Explanation of symbols]

1 電源端子 2−a,b 電源導体層 3 絶縁層 4 接地端子 5−a,b,c 接地導体層 6 信号端子 7 信号導体層 8−a,b,c ボンディングワイヤ 9 半導体チップ 10 パッケージ基体 16 外部端子 23 半導体チップ 24−a,b,c 金属導体(ダイパッド) 25−a,b 誘電体 26−a,b,c,d,e ボンディングワイヤ 27 リード DESCRIPTION OF SYMBOLS 1 Power terminal 2-a, b Power conductor layer 3 Insulating layer 4 Ground terminal 5-a, b, c Ground conductor layer 6 Signal terminal 7 Signal conductor layer 8-a, b, c Bonding wire 9 Semiconductor chip 10 Package base 16 External terminal 23 Semiconductor chip 24-a, b, c Metal conductor (die pad) 25-a, b Dielectric 26-a, b, c, d, e Bonding wire 27 Lead

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 パッケージ基体と、前記パッケージ基体
内に配置された半導体チップと、前記半導体チップに電
源電位を供給するために前記パッケージ基体の外部に設
けられた電源端子と、前記半導体チップに接地電位を供
給するために前記パッケージ基体の外部に設けられた接
地端子と、前記半導体チップに信号の入出力をするため
の信号端子と、前記電源端子が接続される電源導電体層
と、前記接地端子が接続される接地導電体層と、前記電
源端子、接地端子および信号端子が設けられる前記パッ
ケージ基体の第1の領域に絶縁体層を挟んで設けられた
前記導電体層および前記接地導体層からなる第1のバイ
パスコンデンサと、前記半導体チップが搭載される前記
パッケージ基体の第2の領域に前記絶縁体層を挟んで設
けられた前記導電体層および前記接地導体層からなる第
2のバイパスコンデンサとを備え、前記第1のバイパス
コンデンサと前記第2のバイパスコンデンサの静電容量
が異なることを特徴とする半導体装置。
1. A package base, a semiconductor chip disposed in the package base, a power supply terminal provided outside the package base for supplying a power supply potential to the semiconductor chip, and a ground connected to the semiconductor chip. A ground terminal provided outside the package base for supplying a potential, a signal terminal for inputting / outputting a signal to / from the semiconductor chip, a power conductor layer to which the power terminal is connected, and A ground conductor layer to which a terminal is connected; and the conductor layer and the ground conductor layer provided with an insulator layer interposed therebetween in a first region of the package base where the power supply terminal, the ground terminal, and the signal terminal are provided. And a conductor provided in a second region of the package base on which the semiconductor chip is mounted with the insulator layer interposed therebetween. A second bypass capacitor comprising a first bypass capacitor and a ground conductor layer, wherein the first bypass capacitor and the second bypass capacitor have different capacitances.
【請求項2】 前記第1のバイパスコンデンサと前記第
2のバイパスコンデンサは、前記導電体層と前記絶縁体
層との積層数を前記第1の領域と前記第2の領域とで異
ならせることを特徴とする請求項1に記載の半導体装
置。
2. The first bypass capacitor and the second bypass capacitor, wherein the number of layers of the conductor layer and the insulator layer is different between the first region and the second region. The semiconductor device according to claim 1, wherein:
【請求項3】 前記第1のバイパスコンデンサと前記第
2のバイパスコンデンサは、前記導電体層と前記絶縁体
層の対向する面積を前記第1の領域と前記第2の領域と
で異ならせることを特徴とする請求項1に記載の半導体
装置。
3. The first bypass capacitor and the second bypass capacitor have different areas of the conductor layer and the insulator layer facing each other between the first region and the second region. The semiconductor device according to claim 1, wherein:
JP33464993A 1993-12-28 1993-12-28 Semiconductor device Expired - Lifetime JP2606116B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33464993A JP2606116B2 (en) 1993-12-28 1993-12-28 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33464993A JP2606116B2 (en) 1993-12-28 1993-12-28 Semiconductor device

Publications (2)

Publication Number Publication Date
JPH07202072A JPH07202072A (en) 1995-08-04
JP2606116B2 true JP2606116B2 (en) 1997-04-30

Family

ID=18279727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33464993A Expired - Lifetime JP2606116B2 (en) 1993-12-28 1993-12-28 Semiconductor device

Country Status (1)

Country Link
JP (1) JP2606116B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002026251A (en) * 2000-07-11 2002-01-25 Toshiba Corp Semiconductor device
JP5055787B2 (en) 2006-02-20 2012-10-24 富士通セミコンダクター株式会社 Semiconductor device
JP6108887B2 (en) * 2013-03-13 2017-04-05 キヤノン株式会社 Semiconductor package and printed circuit board

Also Published As

Publication number Publication date
JPH07202072A (en) 1995-08-04

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