JP2602442C - - Google Patents
Info
- Publication number
- JP2602442C JP2602442C JP2602442C JP 2602442 C JP2602442 C JP 2602442C JP 2602442 C JP2602442 C JP 2602442C
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- quartz
- bubble
- bubble content
- melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052904 quartz Inorganic materials 0.000 claims description 38
- 239000010453 quartz Substances 0.000 claims description 38
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 38
- 230000002093 peripheral Effects 0.000 claims description 22
- 238000002844 melting Methods 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 239000000843 powder Substances 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 4
- 238000002425 crystallisation Methods 0.000 description 10
- 230000005712 crystallization Effects 0.000 description 10
- 238000009826 distribution Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000000875 corresponding Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Family
ID=
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