JP2602013B2 - Aluminum foil for electrolytic capacitors for etching - Google Patents
Aluminum foil for electrolytic capacitors for etchingInfo
- Publication number
- JP2602013B2 JP2602013B2 JP61152582A JP15258286A JP2602013B2 JP 2602013 B2 JP2602013 B2 JP 2602013B2 JP 61152582 A JP61152582 A JP 61152582A JP 15258286 A JP15258286 A JP 15258286A JP 2602013 B2 JP2602013 B2 JP 2602013B2
- Authority
- JP
- Japan
- Prior art keywords
- foil
- etching
- aluminum foil
- less
- capacitance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、エッチング処理用の電解コンデンサ用アル
ミニウム箔に関する。Description: TECHNICAL FIELD The present invention relates to an aluminum foil for an electrolytic capacitor for an etching process.
従来の技術とその問題点 電解コンデンサ用アルミニウム箔(以下単にAl箔とい
う)としては、一般にエツチングによる粗面化により表
面積を拡大し、もつて静電容量の向上を図つている。従
来、エツチング性の改善は、主にAl箔に微量の合金元素
を添加することにより行なわれているが、同じ成分のア
ルミニウム箔を用いても、製箔工程の違いによつて静電
容量が変動することが知られている。2. Description of the Related Art Conventional technology and its problems In general, an aluminum foil for an electrolytic capacitor (hereinafter simply referred to as an aluminum foil) has a surface area enlarged by roughening by etching, thereby improving the capacitance. Conventionally, etching properties have been improved mainly by adding a small amount of alloying elements to Al foil.However, even when aluminum foil of the same component is used, the capacitance is increased due to differences in the foil making process. It is known to fluctuate.
問題点を解決するための手段 本発明者は、Al箔のエツチング性に及ぼす製箔工程中
の各種要因について研究を重ねた結果、Fe等の不純物含
有量を一定限度以下としたAl箔に特定の耐電圧を有する
酸化皮膜を形成させる場合には、エツチング性の改善と
それに伴う静電容量の増大が可能となることを見出し
た。即ち、本発明は、純度99.7%以上で、Fe 0.17%以
下、Si 0.07%以下かつCu 0.005%以下のアルミニウム
箔表面に皮膜耐電圧が0.5〜1.0Vである酸化皮膜を形成
されたエッチング処理用の電解コンデンサ用アルミニウ
ム箔に係る。Means for Solving the Problems The present inventor has conducted studies on various factors during the foil making process affecting the etching properties of the Al foil, and as a result, the inventors have specified that the content of impurities such as Fe is less than a certain limit. It has been found that when an oxide film having a withstand voltage is formed, the etching property can be improved and the capacitance can be increased accordingly. That is, the present invention is directed to an etching treatment in which an oxide film having a withstand voltage of 0.5 to 1.0 V is formed on an aluminum foil surface having a purity of 99.7% or more, Fe 0.17% or less, Si 0.07% or less, and Cu 0.005% or less. And aluminum foil for electrolytic capacitors.
本発明で使用するAl箔は、純度99.7%以上で、Fe 0.1
7%以下、Si 0.07%以下かつCu 0.005%以下であること
を要する。Fe、Si及びCuのいずれか1種の含有量がこれ
等の上限値を上回る場合には、エツチングの際の粗面化
効率が低下してしまうこと及び電解コンデンサの安定性
を阻害してしまうという問題があり、実用性がない。The Al foil used in the present invention has a purity of 99.7% or more and a Fe 0.1%.
It must be 7% or less, Si 0.07% or less and Cu 0.005% or less. If the content of any one of Fe, Si and Cu exceeds these upper limits, the surface roughening efficiency at the time of etching is reduced and the stability of the electrolytic capacitor is hindered. There is a problem that it is not practical.
また、Al箔表面に形成される酸化皮膜の耐電圧は、0.
5〜1.0ボルトであることを要する。この耐電圧が0.5ボ
ルト未満の場合には、エツチング操作時にAl箔の腐食が
過度に進行するので、粗面化による静電容量の増大が期
待できない。一方、耐電圧が1.0ボルトを上回る場合に
は、不純物、特にFeの析出が促進されてAl箔の化学溶解
性を増すため、静電容量が低下してしまう。The withstand voltage of the oxide film formed on the Al foil surface is 0.
Must be 5 to 1.0 volts. If the withstand voltage is less than 0.5 volts, corrosion of the Al foil proceeds excessively during the etching operation, so that an increase in capacitance due to roughening cannot be expected. On the other hand, if the withstand voltage exceeds 1.0 volt, the precipitation of impurities, particularly Fe, is promoted to increase the chemical solubility of the Al foil, so that the capacitance is reduced.
本発明における酸化皮膜の形成方法としては、Al箔を
空気中約100〜200℃で約0.5〜24時間保持する方法、Al
箔を陽極酸化処理する方法等が挙げられる。As a method of forming an oxide film in the present invention, a method of holding an Al foil at about 100 to 200 ° C. in air for about 0.5 to 24 hours, Al
Examples include a method of anodizing the foil.
なお、本発明のAl箔は、常法に従つて、エツチング処
理することにより、高い静電容量を呈する。そして、本
発明のAl箔をエツチング処理して得られるエツチド箔
は、電解コンデンサの陽極箔又は陰極箔として使用する
場合には、既存のAl箔と同様にして使用され得る。The Al foil of the present invention exhibits a high capacitance by being subjected to an etching treatment according to a conventional method. When the aluminum foil of the present invention is used as an anode foil or a cathode foil of an electrolytic capacitor, it can be used in the same manner as an existing aluminum foil.
発明の効果 本発明によれば、純度99.7%のAl陰極箔から純度99.9
9%の中低圧陽極箔にいたる広範なコンデンサ用Al箔の
静電容量を著るしく向上させることができる。Effect of the Invention According to the present invention, a purity of 99.9%
Capacitance of a wide range of Al foils for capacitors up to 9% medium and low pressure anode foils can be significantly improved.
実施例 以下、実施例を示し、本発明の特徴とするところをよ
り一層明らかにする。Examples Hereinafter, examples will be shown to further clarify features of the present invention.
実施例1 純度99.98%、Fe 0.006%、Si 0.005%、Cu 0.005%
の圧延上りAl箔(厚さ0.1mm)を空気中種々の温度で8
時間にわたり加熱処理し、酸化皮膜を形成させた。Example 1 99.98% purity, 0.006% Fe, 0.005% Si, 0.005% Cu
Rolled aluminum foil (thickness 0.1mm) at various temperatures in air
Heat treatment was performed for a time to form an oxide film.
上記の様にして加熱処理したAl箔をHCl 10%、AlCl3
・6H2O 5%及びH3PO4 1%の浴にて温度50℃、電流密度5
0A/dm2で3分間交流エツチング処理した。The heat-treated Al foil is treated with HCl 10%, AlCl 3
・ 6H 2 O 5% and H 3 PO 4 1% bath temperature 50 ℃, current density 5
AC etching treatment was performed at 0 A / dm 2 for 3 minutes.
次いで、上記エツチング処理Al箔を8%ホウ酸アンモ
ニウム液中30℃で50Vの直流電流を20分間印加して、化
成処理した。加熱処理後のAl箔の皮膜耐電圧と得られた
化成処理箔の静電容量との関係を表1に示す。Next, the etching-treated Al foil was subjected to a chemical conversion treatment in an 8% ammonium borate solution by applying a direct current of 50 V at 30 ° C. for 20 minutes. Table 1 shows the relationship between the coating withstand voltage of the Al foil after the heat treatment and the capacitance of the resulting chemical conversion treated foil.
実施例2 純度99.98%、Fe 0.006%、Si 0.005%、Cu 0.005%
の圧延上りAl箔(厚さ0.1mm)を空気中種々の温度で加
熱処理し、酸化皮膜を形成させた。 Example 2 99.98% purity, 0.006% Fe, 0.005% Si, 0.005% Cu
Was heat-treated at various temperatures in the air to form an oxide film.
処理後のAl箔を20%NaClの浴にて温度95℃、電流密度
50A/dm2で2分間直流エツチング処理した。次いで実施
例1と同じ条件で化成処理した。得られた化成処理箔の
静電容量を測定し、その結果を表2に示す。Treated Al foil in a 20% NaCl bath at a temperature of 95 ° C and current density
DC etching treatment was performed at 50 A / dm 2 for 2 minutes. Next, a chemical conversion treatment was performed under the same conditions as in Example 1. The capacitance of the resulting chemical conversion treated foil was measured, and the results are shown in Table 2.
実施例3 純度99.75%、Fe 0.16%、Si 0.06%、Cu 0.00%の圧
延上りAl箔(厚さ0.05mm)を種々の温度で加熱処理し、
酸化皮膜を形成させた。 Example 3 Rolled Al foil (thickness 0.05 mm) having a purity of 99.75%, Fe 0.16%, Si 0.06%, and Cu 0.00% was subjected to heat treatment at various temperatures.
An oxide film was formed.
上記の様にして加熱処理したAl箔をHCl 10%、AlCl3
・6H2O 5%及びH3PO4 1%の浴にて温度50℃、電流密度5
0A/dm2で2分間交流エツチング処理した。The heat-treated Al foil is treated with HCl 10%, AlCl 3
・ 6H 2 O 5% and H 3 PO 4 1% bath temperature 50 ℃, current density 5
AC etching treatment was performed at 0 A / dm 2 for 2 minutes.
加熱処理後のAl箔の皮膜耐電圧と得られたエツチド箔
の無化成静電容量との関係を表3に示す。Table 3 shows the relationship between the coating withstand voltage of the Al foil after the heat treatment and the non-chemical capacitance of the obtained etch foil.
実施例4 純度99.98%の圧延上りAl箔を5%のホウ酸浴中にて
陽極酸化を行ない、0,5〜5Vの皮膜を付与した。実施例
1と同様にして、エツチングおよび化成処理を施した。
結果を表4に示す。 Example 4 Anodized aluminum foil having a purity of 99.98% was rolled and anodized in a 5% boric acid bath to give a film of 0.5 to 5V. Etching and chemical conversion treatment were performed in the same manner as in Example 1.
Table 4 shows the results.
実施例1〜4に示した如く、皮膜耐電圧が0.5〜1.0Vo
ltの範囲内の酸化皮膜を有するAl箔(純度99.7%以上)
は、電解エツチングの際の粗面化効率が優れており、高
い静電容量を示すことが明らかである。 As shown in Examples 1 to 4, the film withstand voltage was 0.5 to 1.0 Vo
Al foil with an oxide film within the range of lt (purity 99.7% or more)
Is excellent in the surface roughening efficiency at the time of electrolytic etching and clearly shows a high capacitance.
Claims (1)
07%以下かつCu 0.005%以下のアルミニウム箔表面に皮
膜耐電圧が0.5〜1.0Vである酸化皮膜を形成させたエッ
チング処理用の電解コンデンサ用アルミニウム箔。(1) Purity is 99.7% or more, Fe is 0.17% or less, Si is 0.1% or less.
Aluminum foil for an electrolytic capacitor for etching processing, in which an oxide film with a film withstand voltage of 0.5 to 1.0 V is formed on the surface of an aluminum foil of 07% or less and Cu of 0.005% or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61152582A JP2602013B2 (en) | 1986-06-27 | 1986-06-27 | Aluminum foil for electrolytic capacitors for etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61152582A JP2602013B2 (en) | 1986-06-27 | 1986-06-27 | Aluminum foil for electrolytic capacitors for etching |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS637614A JPS637614A (en) | 1988-01-13 |
JP2602013B2 true JP2602013B2 (en) | 1997-04-23 |
Family
ID=15543614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61152582A Expired - Lifetime JP2602013B2 (en) | 1986-06-27 | 1986-06-27 | Aluminum foil for electrolytic capacitors for etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2602013B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0422758U (en) * | 1990-06-14 | 1992-02-25 | ||
JP2602357B2 (en) * | 1990-11-09 | 1997-04-23 | 昭和アルミニウム株式会社 | Aluminum alloy foil for electrolytic capacitor electrodes |
JP4774664B2 (en) * | 2001-09-27 | 2011-09-14 | 日本ケミコン株式会社 | Manufacturing method of solid electrolytic capacitor |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53112452A (en) * | 1977-03-14 | 1978-09-30 | Mitsubishi Keikinzoku Kogyo | Aluminum cathode foil for electrolytic capacitor |
JPS5649508A (en) * | 1979-09-28 | 1981-05-06 | Matsushita Electric Ind Co Ltd | Electrolytic condenser |
-
1986
- 1986-06-27 JP JP61152582A patent/JP2602013B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS637614A (en) | 1988-01-13 |
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Legal Events
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---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
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EXPY | Cancellation because of completion of term |