JP2600525B2 - Manufacturing method of electrostatic deflection electrode - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam exposure apparatus having an electrostatic deflection electrode, and more particularly to a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode.

2. Description of the Related Art In the manufacture of semiconductor devices, electron beam exposure apparatuses have been used as means for forming various patterns. In recent years, as the degree of integration of semiconductor devices has increased, the various patterns constituting the devices have been further miniaturized. Therefore, quick response and higher accuracy are required for an electron beam exposure apparatus for forming a fine pattern.

An electron beam exposure apparatus provided for such a purpose usually has an in-lens type electrostatic deflection electrode incorporated in an electron lens, but the in-lens type electrostatic deflection electrode needs to be downsized as a whole. Requires high precision parts processing. Therefore, development of a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode is demanded.

[0004]

2. Description of the Related Art FIG. 3 is a side sectional view showing a part of an electron beam exposure apparatus, and FIG. 4 is a perspective view showing a conventional electrostatic deflection electrode.

As shown in FIG. 3 (a), a conventional electron beam exposure apparatus includes a seal cylinder 1 for keeping a region where an electron beam passes in a vacuum state, and an electron beam inserted outside the seal cylinder 1 and passing therethrough. Lens 2 that converges, and seal cylinder 1
And an electrostatic deflecting electrode 3 which is inserted into the inside and controls the direction of the electron beam.

The electrostatic deflecting electrode 3 is composed of a plurality of pairs of electrodes 31 opposed to each other with the electron beam passing area interposed therebetween.
Can improve the uniformity of the electric field inside.
Therefore, the electrostatic deflection electrode 3 is arranged outside the electron lens 2 so that the interval between the electrodes 31 can be arbitrarily determined.

However, the electrostatic deflecting electrode 3 having a large distance between the electrodes 31 applies a high driving voltage to each electrode 31 via a deflection amplifier (not shown) in order to impart a required electric field intensity to the electron beam passage area. There is a need to. as a result,
Since the deflection amplifier is required to have a large amplification degree, quick response cannot be expected.

In the ordinary electron beam exposure apparatus shown in FIG. 3A, an electron lens 2 and an electrostatic deflecting electrode 3 are arranged at a distance from each other, and an electrostatic deflecting electrode 3 for controlling the direction of the electron beam is provided. And the action point of the electron lens 2 that converges the electron beam is shifted, so that high deflection accuracy cannot be expected.

On the other hand, as shown in FIG. 3 (b), an electron beam exposure apparatus which requires quick response and higher accuracy converges the electron beam inserted into the seal cylinder 1 and the outside thereof and passing therethrough. Electronic lens 2 to be sealed and seal cylinder 1
And an in-lens type electrostatic deflecting electrode 4 fitted at the same position as the electron lens 2 inside.

The in-lens type electrostatic deflecting electrode 4 does not shift the point of action with the electron lens 2 and provides a high degree of deflection accuracy. Moreover, since the required electric field strength can be obtained by applying a relatively low driving voltage with a small interval between the electrodes 41 facing each other, it is not necessary to increase the amplification degree of the deflection amplifier, and an electron beam exposure apparatus having a quick response is configured. it can.

However, the in-lens type electrostatic deflection electrode needs to be reduced in size as a whole, and requires highly accurate component processing. For example, when a plurality of pairs of electrodes facing each other are individually formed, their dimensional errors and assembly errors are integrated. Therefore, in the conventional electrostatic deflection electrode, a plurality of pairs of electrodes facing each other are simultaneously formed as shown in FIG.

That is, as shown in FIG. 4A, a conventional in-lens type electrostatic deflecting electrode 4 has a metal cylinder 43 adhered to the inner wall of a cylinder 42 made of an insulator such as ceramic as shown in FIG.
As shown in (b), a plurality of insulating grooves 45 reaching the inner wall of the cylinder 42 from the electron beam passage area 44 penetrating the cylinder 43 are formed by electric discharge machining or the like.

By forming a plurality of insulating grooves 45 reaching the inner wall of the cylinder 42 from the electron beam passage area 44, the cylinder 43
Are cut to form a plurality of pairs of electrodes 41 opposed to each other with the electron beam passage area 44 interposed therebetween. However, all the electrodes 41 are bonded to the inner wall of the cylinder 42 in advance and are not separated apart.

When the wall surface of the cylinder 42 is seen from the electron beam passage area 44, the electric charge staying on the wall disturbs the direction of deflection of the electron beam. The inner wall of the cylinder 42 is bent so that the wall surface of the cylinder 42 cannot be seen directly from the electron beam passage area 44.

[0015]

However, the conventional in-lens type electrostatic deflecting electrode is provided with a cylinder made of an insulator which supports the electrode on the outside, and this cylinder is a constraint and the electrostatic deflecting electrode is restricted. There is a problem that further miniaturization is hindered.

An object of the present invention is to provide a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode.

[0017]

FIG. 1 is a perspective view showing a method of manufacturing an electrostatic deflection electrode according to the present invention. The same object is denoted by the same symbol throughout the drawings.

The above-mentioned problem is a problem in manufacturing an electrostatic deflection electrode for an electron beam exposure apparatus in which a plurality of electrodes 51 are arranged so as to surround an electron beam passage area 52. Electron beam passage area
52, a plurality of inner insulating grooves 55 extending outward from the side surface of the electron beam passage region 52, and a plurality of outer insulating grooves extending toward the electron beam passage region 52 from the side surface of the block 54
After forming the insulators 53 into the outer insulating grooves 56 and bonding the insulators 53 to the inner walls of the outer insulating grooves 56, a plurality of intermediate insulating grooves 57 are formed to form the corresponding inner insulating grooves.
55 and the outer insulating groove 56 are connected to each other,
The present invention is achieved by the method for manufacturing an electrostatic deflection electrode according to the present invention, in which a plurality of electrodes 51 surrounding the electrode 51 are formed.

[0019]

In FIG. 1, a circular block for passing an electron beam penetrates a block made of metal, a plurality of inner insulating grooves 45 extending outward from the side of the block, and an electron beam passing region from the side of the block. After forming a plurality of outer insulating grooves extending toward the outer insulating groove, each insulator is inserted into the outer insulating groove and the insulator is bonded to the inner wall of the outer insulating groove, and then a plurality of intermediate insulating grooves are formed to form a corresponding inner insulating groove. By connecting the outer insulating grooves, a cylinder made of an insulator provided outside to support the electrodes in the conventional electrostatic deflection electrode becomes unnecessary. Also, it becomes possible to simultaneously form a plurality of pairs of electrodes facing each other in the same manner as the conventional electrostatic deflection electrode. That is, it is possible to realize a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode.

[0020]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the accompanying drawings. FIG. 2 is a perspective view showing a modification of the electrostatic deflection electrode according to the present invention.

As shown in FIG. 1 (a), an electrostatic deflection electrode according to the present invention has a cylindrical block 54 made of metal and an electron beam having a circular cross section penetrating from one end face of the block 54 to the other end face. A passage region 52 and a plurality of inner insulating grooves 55 extending radially outward from a side surface of the electron beam passage region 52.
Then, a plurality of outer insulating grooves 56 extending from the side surface of the block 54 toward the electron beam passage area 52 are formed.

Next, as shown in FIG. 1B, an insulator 53 is inserted into each of the outer insulating grooves 56 and the insulator 53 is bonded to the inner wall of the outer insulating groove 56, and then a plurality of intermediate insulating grooves 57 are formed. The corresponding inner insulating groove 55 and outer insulating groove 56 are communicated to form the electrostatic deflection electrode 5 including the plurality of electrodes 51 surrounding the electron beam passage area 52.

The electrostatic deflecting electrode according to the present invention is formed by using a columnar block as shown in FIG. 1. For example, as shown in FIG. Alternatively, it may be formed by applying an insulating material 58 to the outside of the electrostatic deflection electrode as shown in FIG. 2 (b).

A circular electron beam passage area penetrating the block as described above, a plurality of inner insulating grooves 45 extending outward from the side surface of the electron beam passage area, and an electron beam passage area extending from the side surface of the block. After forming a plurality of outer insulating grooves extending toward the outer insulating groove, each insulator is inserted into the outer insulating groove and the insulator is bonded to the inner wall of the outer insulating groove, and then a plurality of intermediate insulating grooves are formed to form a corresponding inner insulating groove. By connecting the outer insulating grooves, a cylinder made of an insulator provided outside to support the electrodes in the conventional electrostatic deflection electrode becomes unnecessary. Also, it becomes possible to simultaneously form a plurality of pairs of electrodes facing each other in the same manner as the conventional electrostatic deflection electrode. That is, it is possible to realize a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode.

[0025]

As described above, according to the present invention, it is possible to provide a manufacturing method capable of easily forming a miniaturized electrostatic deflection electrode.

[Brief description of the drawings]

FIG. 1 is a perspective view illustrating a method for manufacturing an electrostatic deflection electrode according to the present invention.

FIG. 2 is a perspective view showing a modification of the electrostatic deflection electrode according to the present invention.

FIG. 3 is a side sectional view showing a part of the electron beam exposure apparatus.

FIG. 4 is a perspective view showing a conventional electrostatic deflection electrode.

[Explanation of symbols]

 5 Electrostatic deflection electrode 51 Electrode 52 Electron beam passage area 53 Insulator 54 Block 55 Inner insulating groove 56 Outer insulating groove 57 Intermediate insulating groove 58 Insulating material

Claims (3)

(57) [Claims] In the manufacture of an electrostatic deflection electrode for an electron beam exposure apparatus in which a plurality of electrodes (51) are arranged so as to surround an electron beam passage area (52), a block (54) made of metal is added to the block (54). (54) a circular electron beam passage area (52), a plurality of inner insulating grooves (55) extending outward from a side surface of the electron beam passage area (52), and a side surface of the block (54). A plurality of outer insulating grooves (56) extending from the outer insulating groove (52) toward the electron beam passage area (52), an insulator (53) is inserted into each of the outer insulating grooves (56), and the insulator (53) is After bonding to the inner wall of the outer insulating groove (56), a plurality of intermediate insulating grooves (57) are formed so that the corresponding inner insulating groove (55) and outer insulating groove (56) communicate with each other, and the electron beam passage area A method for manufacturing an electrostatic deflection electrode, comprising forming a plurality of electrodes (51) surrounding (52). 2. A method for manufacturing an electrostatic deflection electrode, wherein the block (54) according to claim 2 is cylindrical. 3. A method for manufacturing an electrostatic deflection electrode, wherein the block (54) according to claim 2 has a polygonal column shape.