JP2583543B2 - Heat treatment method for ZnSe or ZnS compound crystal - Google Patents

Heat treatment method for ZnSe or ZnS compound crystal

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Publication number
JP2583543B2
JP2583543B2 JP32805487A JP32805487A JP2583543B2 JP 2583543 B2 JP2583543 B2 JP 2583543B2 JP 32805487 A JP32805487 A JP 32805487A JP 32805487 A JP32805487 A JP 32805487A JP 2583543 B2 JP2583543 B2 JP 2583543B2
Authority
JP
Japan
Prior art keywords
heat treatment
znse
compound
crystal
treatment method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP32805487A
Other languages
Japanese (ja)
Other versions
JPH01169933A (en
Inventor
徳男 淀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP32805487A priority Critical patent/JP2583543B2/en
Publication of JPH01169933A publication Critical patent/JPH01169933A/en
Application granted granted Critical
Publication of JP2583543B2 publication Critical patent/JP2583543B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はII−VI族化合物結晶の熱処理方法に関し、特
にZnSeまたはZnSの化合物結晶中の不純物元素を活性化
させる等の目的で行なう熱処理において、結晶の構造欠
陥等の増加を防止するZnSeまたはZnSの化合物結晶の熱
処理方法に関する。
Description: TECHNICAL FIELD The present invention relates to a heat treatment method for II-VI group compound crystals, and particularly to a heat treatment method for the purpose of activating an impurity element in a ZnSe or ZnS compound crystal. The present invention also relates to a heat treatment method for a ZnSe or ZnS compound crystal for preventing an increase in crystal structural defects and the like.

[従来の技術] 従来、Si等の半導体に、ドナー又はアクセプタを作成
するための不純物を、イオンとして打込んだり拡散源か
ら拡散させたりして導入した後、熱処理を行なって該不
純物を活性化させる半導体の熱処理が行なわれている。
該熱処理の条件は、該熱処理中に結晶の構造欠陥等が増
加すると得られる半導体素子の性能が劣化するため、非
常に重要な条件であり、種々の研究が報告されている。
(例えば「エレクトロニクス技術全書8巻「イオン注入
技術」61〜107頁、工業調査会(1975)) しかしながら、上記研究報告の大部分は現在の半導体
産業で最も一般的なシリコンに関するものであり、化合
物半導体の熱処理に関するものは少ない。又該化合物半
導体の報告においても、その大部分をしめるものはGaA
s,InP等に関する報告であり、ZnSe等のII−VI族化合物
結晶に関する報告はみられない。
[Prior art] Conventionally, impurities for forming a donor or an acceptor are implanted into a semiconductor such as Si as ions or diffused from a diffusion source and introduced, and then heat treatment is performed to activate the impurities. The heat treatment of the semiconductor to be performed is performed.
The condition of the heat treatment is a very important condition because the performance of the obtained semiconductor element is deteriorated when the crystal structural defects increase during the heat treatment, and various studies have been reported.
(For example, “Electronic Technology, Vol. 8,“ Ion Implantation Technology, ”pp. 61-107, Industrial Research Institute (1975)) However, most of the above research reports are related to silicon, which is the most common in the current semiconductor industry, and There are few related to heat treatment of semiconductors. Also, in the report of the compound semiconductor, most of the
This is a report on s, InP and the like, and there is no report on II-VI group compound crystals such as ZnSe.

[発明が解決しようとする問題点] 本発明は、ZnSeを用いた電気素子(例えば青色発光素
子)等を用いた電気素子の製造において、イオン注入後
の熱処理、電極形成時の熱処理等その製造工程中で必要
とされる熱処理の際のZnSe化合物等の構造欠陥の増加を
防止できる熱処理方法を提供することを目的とする。
[Problems to be Solved by the Invention] The present invention relates to the manufacture of an electric element using an electric element using ZnSe (for example, a blue light emitting element), such as a heat treatment after ion implantation and a heat treatment at the time of forming an electrode. An object of the present invention is to provide a heat treatment method capable of preventing an increase in structural defects such as a ZnSe compound during a heat treatment required in the process.

[問題点を解決するための手段] 本発明は上記問題点を解決するためになされたもので
あって、ZnSeまたはZnSの化合物結晶を加熱して熱処理
を行なう方法において、該熱処理を前記化合物中の相対
的に蒸気圧の低いZn元素の化合物を含む雰囲気中で行な
っている。
Means for Solving the Problems The present invention has been made to solve the above problems, and in a method of performing heat treatment by heating a ZnSe or ZnS compound crystal, the heat treatment is performed in the compound. Is performed in an atmosphere containing a compound of a Zn element having a relatively low vapor pressure.

該亜鉛の化合物としては、ジメチル亜鉛、ジエチル亜
鉛等の亜鉛の有機化合物が好まれて使用される。
As the zinc compound, an organic compound of zinc such as dimethyl zinc and diethyl zinc is preferably used.

又該Zn元素の化合物を含む雰囲気は、ZnSeまたはZnS
の化合物結晶の酸化等を防止するために非酸化性の雰囲
気とされる必要があり、特にN2,Ar,He,Ne等の不活性ガ
スを用いた不活性ガス雰囲気中に微量のZn化合物を混合
させた雰囲気が好ましい。
The atmosphere containing the Zn element compound is ZnSe or ZnS.
In order to prevent oxidation of the compound crystal of the non-oxidizing atmosphere, it is necessary to use a non-oxidizing atmosphere, and in particular, a trace amount of a Zn compound in an inert gas atmosphere using an inert gas such as N2, Ar, He, Ne, etc. A mixed atmosphere is preferred.

[作 用] 本発明は、例えばN2,He,Ar,Ne等の不活性ガス雰囲気
下での加熱によって生じるZnSeまたはZnSの結晶の構造
欠陥の発生が、表面に生じる空孔発生に基づくものが主
であることに鑑みなされたもので、Zn元素の化合物を含
む雰囲気で熱処理を行なうことにより、Zn元素の空孔の
発生を防止している。
[Operation] In the present invention, the generation of structural defects of ZnSe or ZnS crystals caused by heating in an atmosphere of an inert gas such as N2, He, Ar, Ne, etc. is based on the generation of vacancies generated on the surface. In view of the fact that it is mainly used, the heat treatment is performed in an atmosphere containing a compound of the Zn element, thereby preventing the generation of vacancies of the Zn element.

[実 施 例] 第2図は本実施例において使用した熱処理装置の概略
を示す断面図である。
FIG. 2 is a cross-sectional view schematically showing a heat treatment apparatus used in this example.

セレン化亜鉛結晶4は、支持台3上に置かれた後炉心
管6内に設置される。熱処理中は、H2ガス4l/分にジメ
チル亜鉛を2×10-5モル/分で混合させた混合ガスを雰
囲気用ガスとして気体導入管1から炉心管6に導入し
た。(排気口の圧力は常圧とした。)加熱には赤外線ラ
ンプ2を用い、支持台3内に内蔵された熱電対7により
温度が測定された。
The zinc selenide crystal 4 is placed in the furnace core tube 6 after being placed on the support 3. During the heat treatment, a mixed gas in which dimethylzinc was mixed at a rate of 2 × 10 −5 mol / min with 4 l / min of H 2 gas was introduced into the furnace core tube 6 from the gas introduction pipe 1 as an atmosphere gas. (The pressure at the exhaust port was normal pressure.) The infrared lamp 2 was used for heating, and the temperature was measured by a thermocouple 7 built in the support 3.

上記条件でセレン化亜鉛結晶が700℃となるまで加熱
し、5分間保持した後放冷した。
Under the above conditions, the zinc selenide crystal was heated until it reached 700 ° C., kept for 5 minutes, and allowed to cool.

上記熱処理を行なったセレン化亜鉛結晶を用いて発光
素子を作成し、発光光線の分光光度を測定した。その結
果を第1図に示す。
A light-emitting device was prepared using the heat-treated zinc selenide crystal, and the spectral intensity of the emitted light was measured. The result is shown in FIG.

比較例−1 雰囲気ガスとしてH2ガスを4l/分流すことに変えた以
外は実施例と同様の条件でセレン化亜鉛結晶を熱処理し
た。
Comparative Example-1 A zinc selenide crystal was heat-treated under the same conditions as in the example except that the flow rate of H2 gas was changed to 4 l / min as an atmosphere gas.

該セレン化亜鉛結晶を用いた発光素子の分光光度を第
3図に示す。第3図からあきらかな通り、本比較例の熱
処理では結晶性が悪化していることを示す自己補償効果
による発光(Self Activated発光;以後SA発光と略
称)が強く生じていることがわかる。
FIG. 3 shows the spectral luminous intensity of a light emitting device using the zinc selenide crystal. It is apparent from FIG. 3 that the heat treatment of this comparative example strongly generates light emission (Self Activated light emission; hereinafter abbreviated as SA light emission) due to the self-compensation effect, which indicates that the crystallinity is deteriorated.

又上記比較例においては、熱処理温度を700℃として
いるが、ZnSe結晶は500℃以上の熱処理温度でH2雰囲気
で処理するとZnSeの構造欠陥が増加してしまうことが確
認され、又熱処理時間と共に顕著になることがわかっ
た。そこでZnSeの熱処理方法においては500℃以上の熱
処理に対して本発明の効果が表われることがわかった。
Further, in the above comparative example, the heat treatment temperature was 700 ° C., but it was confirmed that when the ZnSe crystal was treated in a H2 atmosphere at a heat treatment temperature of 500 ° C. or more, the structural defects of ZnSe increased, and the remarkable with the heat treatment time. It turned out to be. Thus, it was found that the effect of the present invention was exhibited in the heat treatment method of ZnSe with respect to the heat treatment at 500 ° C. or more.

また硫化亜鉛結晶の熱処理の場合においては、H2雰囲
気下において450℃以上の熱処理で構造欠陥が増加する
ことが確認され、本実施例と同様の条件で熱処理するこ
とでSA発光を抑制できることが確認された。
In the case of heat treatment of zinc sulfide crystals, it was confirmed that heat treatment at 450 ° C. or more in an H2 atmosphere increased structural defects, and that heat treatment under the same conditions as in this example could suppress SA emission. Was done.

また上記実施例においては、結晶の加熱に対し赤外ラ
ンプを用いているが、該加熱方式は本発明に実質的な影
響を持たず、抵抗加熱、高周波加熱等任意の加熱方法が
使用できる。
In the above embodiment, an infrared lamp is used for heating the crystal. However, the heating method does not substantially affect the present invention, and any heating method such as resistance heating and high frequency heating can be used.

また上記実施例においては、熱処理時の圧力を常圧と
したが、該雰囲気は減圧状態であってもかまわない。又
雰囲気中のZn元素化合物の濃度も上記実施例にかぎら
ず、圧力、共存気体の種類、熱処理温度等に基づき調整
される。
Further, in the above embodiment, the pressure during the heat treatment was normal pressure, but the atmosphere may be in a reduced pressure state. Further, the concentration of the Zn element compound in the atmosphere is not limited to the above embodiment, but is adjusted based on the pressure, the type of coexisting gas, the heat treatment temperature and the like.

[発明の効果] 本発明によれば、ZnSeまたはZnSの化合物に対するイ
オン注入後の熱処理等ZnSeまたはZnSの化合物の高温熱
処理が、構造欠陥の増加することなく行なえ、特性の良
好な電子素子(例えば青色発光素子)を作成することが
できる。
[Effects of the Invention] According to the present invention, a high-temperature heat treatment of a ZnSe or ZnS compound such as a heat treatment after ion implantation on a ZnSe or ZnS compound can be performed without increasing structural defects, and an electronic device having good characteristics (for example, Blue light-emitting element).

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明を用いて700℃で熱処理したZnSe発光素
子の発光光の分光光度を示す図、第2図は実施例で用い
た熱処理装置の概略を示す断面図、第3図はH2雰囲気で
700℃の熱処理したZnSe発光素子の発光光の分光光度を
示す図である。
FIG. 1 is a diagram showing the spectral intensity of emitted light of a ZnSe light emitting device heat-treated at 700 ° C. using the present invention, FIG. 2 is a cross-sectional view schematically showing a heat treatment apparatus used in the embodiment, and FIG. In the atmosphere
FIG. 3 is a diagram showing the spectral photometric intensity of light emitted from a ZnSe light emitting device that has been heat-treated at 700 ° C.

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】ZnSeまたはZnSの化合物結晶またはこれら
の混晶を、ZnまたはZnの化合物を含む雰囲気中で加熱す
ることを特徴とするZnSeまたはZnSの化合物結晶の熱処
理方法。
1. A heat treatment method for a ZnSe or ZnS compound crystal, comprising heating a ZnSe or ZnS compound crystal or a mixed crystal thereof in an atmosphere containing Zn or Zn compound.
【請求項2】前記Znの化合物がジメチル亜鉛またはジエ
チル亜鉛である特許請求の範囲第1項記載のZnSeまたは
ZnSの化合物結晶の熱処理方法。
2. The ZnSe or the Zn compound according to claim 1, wherein the Zn compound is dimethyl zinc or diethyl zinc.
Heat treatment method for ZnS compound crystal.
JP32805487A 1987-12-24 1987-12-24 Heat treatment method for ZnSe or ZnS compound crystal Expired - Lifetime JP2583543B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32805487A JP2583543B2 (en) 1987-12-24 1987-12-24 Heat treatment method for ZnSe or ZnS compound crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32805487A JP2583543B2 (en) 1987-12-24 1987-12-24 Heat treatment method for ZnSe or ZnS compound crystal

Publications (2)

Publication Number Publication Date
JPH01169933A JPH01169933A (en) 1989-07-05
JP2583543B2 true JP2583543B2 (en) 1997-02-19

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Application Number Title Priority Date Filing Date
JP32805487A Expired - Lifetime JP2583543B2 (en) 1987-12-24 1987-12-24 Heat treatment method for ZnSe or ZnS compound crystal

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Country Link
JP (1) JP2583543B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6791257B1 (en) 1999-02-05 2004-09-14 Japan Energy Corporation Photoelectric conversion functional element and production method thereof
JP6005015B2 (en) 2013-09-04 2016-10-12 三菱日立パワーシステムズ株式会社 Duct wall structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59131150U (en) * 1983-02-22 1984-09-03 三洋電機株式会社 Compound semiconductor heat treatment equipment
JPS6286830A (en) * 1985-10-14 1987-04-21 Nippon Mining Co Ltd Heat treating implement for compound semiconductor

Also Published As

Publication number Publication date
JPH01169933A (en) 1989-07-05

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