JP2575653B2 - Method for forming a thin film on the inner surface of a metal cylindrical coated material - Google Patents
Method for forming a thin film on the inner surface of a metal cylindrical coated materialInfo
- Publication number
- JP2575653B2 JP2575653B2 JP61132418A JP13241886A JP2575653B2 JP 2575653 B2 JP2575653 B2 JP 2575653B2 JP 61132418 A JP61132418 A JP 61132418A JP 13241886 A JP13241886 A JP 13241886A JP 2575653 B2 JP2575653 B2 JP 2575653B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chamber
- coating material
- metal
- metal cylindrical
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、PVD法（物理的蒸着法）を用いて薄膜を
形成する薄膜形成方法に関するもので、特に金属製筒形
部品の筒内面へ薄膜を形成する金属製筒形被コーティン
グ材の筒内面への薄膜形成方法に係る。Description: TECHNICAL FIELD The present invention relates to a thin film forming method for forming a thin film using a PVD method (physical vapor deposition method), and particularly to a method for forming an inner surface of a metal cylindrical part. The present invention relates to a method for forming a thin film on the inner surface of a cylindrical metal coating material for forming a thin film.
従来から、金属窒化物，金属炭化物等の薄膜を部品の
表面に形成することにより部品表面の改質（硬度向上，
耐摩耗性向上，耐食性向上，摩擦係数低減，色調光沢改
善等）が行われている。このための薄膜形成方法として
PVD法があり、このPVD法の中にはアーク放電を利用した
電気アーク蒸着法がある。Conventionally, the surface of a component has been modified (hardness improvement, etc.) by forming thin films of metal nitride, metal carbide, etc. on the surface of the component.
Improvement of wear resistance, corrosion resistance, reduction of friction coefficient, improvement of color tone and gloss). As a method of forming a thin film for this purpose
There is a PVD method. Among the PVD methods, there is an electric arc evaporation method using arc discharge.
この電気アーク蒸着法を使用した金属製筒形被コーテ
ィング材の筒内面への薄膜形成方法を実施するための薄
膜形成装置の一例は、第２図に示すように、金属製の真
空槽１内の略中央に金属製の円筒形の被コーティング材
２を真空槽１と電気的に絶縁して配置するとともに、カ
ソードプレート3aの中央部に例えばTiからなる蒸発材料
3bを装着した蒸発源３を真空槽１の側壁に設けた貫通孔
1aに真空槽１と電気的に絶縁して配置し、さらにトリガ
電極（図示せず）を真空槽１と電気的に絶縁しかつ蒸発
源３と対向するように配置している。この場合、蒸発源
３は被コーティング材２の開口に臨むように配置され
る。As shown in FIG. 2, an example of a thin film forming apparatus for performing a method of forming a thin film on the inner surface of a metal cylindrical coating material using an electric arc evaporation method is shown in FIG. A metal cylindrical coating material 2 is electrically insulated from the vacuum chamber 1 substantially at the center of the cathode plate 3a.
Through-hole provided on the side wall of vacuum chamber 1 with evaporation source 3 mounted with 3b
A vacuum tank 1 is electrically insulated from the vacuum chamber 1, and a trigger electrode (not shown) is electrically insulated from the vacuum chamber 1 and opposed to the evaporation source 3. In this case, the evaporation source 3 is arranged so as to face the opening of the material 2 to be coated.
また、真空槽１には、真空ポンプ（図示せず）と、Ar
などの不活性ガスまたはN2などの反応性ガスを供給する
ガス供給部（図示せず）が設けられている。Further, a vacuum pump (not shown) and an Ar
A gas supply unit (not shown) for supplying an inert gas such as N 2 or a reactive gas such as N 2 is provided.
さらに、蒸発源３のカソードプレート3aにアーク電源
５の陰極を接続するとともに真空槽１にアーク電源５の
陽極を接続し、真空槽１にバイアス電源６の陽極を接続
するとともに被コーティング材２にバイアス電源６の陰
極を接続している。Further, the cathode of the arc power source 5 is connected to the cathode plate 3a of the evaporation source 3, the anode of the arc power source 5 is connected to the vacuum chamber 1, the anode of the bias power source 6 is connected to the vacuum chamber 1, and the material 2 to be coated is connected. The cathode of the bias power supply 6 is connected.
この金属製筒形被コーティング材の筒内面への薄膜形
成方法では、アーク電源５によるアーク放電用電圧によ
って蒸発源３と真空槽１の内壁との間でアーク放電を行
わせる。通常は、蒸発源３と真空槽１との間で直接放電
が開始せず、放電を起動させるとともに放電を維持させ
る機能を果たすトリガ電極をトリガ駆動装置（図示せ
ず）によって蒸発源３に一旦接触させて電流を流し、こ
の後引き離すことにより、種火となるアークが蒸発源３
とトリガ電極との間で点弧し、このアークによって蒸発
源３に十分なエネルギが与えられ、蒸発源３からTiなど
の金属が蒸発してイオン化され、アークが蒸発源３と真
空槽１の内壁間へ移行する。このアークによって定常的
に蒸発源３の蒸発材料3bの表面のアークスポットから金
属蒸気が発生してイオン化されてプラズマを形成しボン
バード処理を施す。In this method of forming a thin film on the inner surface of a metal cylindrical coating material, an arc discharge is caused between the evaporation source 3 and the inner wall of the vacuum chamber 1 by an arc discharge voltage from an arc power supply 5. Normally, a discharge is not directly started between the evaporation source 3 and the vacuum chamber 1, and a trigger electrode which functions to start the discharge and maintain the discharge is once applied to the evaporation source 3 by a trigger driving device (not shown). By causing current to flow by contact and then separating, an arc that becomes a pilot flame is formed by the evaporation source 3.
And a trigger electrode, a sufficient energy is given to the evaporation source 3 by this arc, a metal such as Ti is evaporated from the evaporation source 3 and ionized, and the arc is formed between the evaporation source 3 and the vacuum chamber 1. Transfer between inner walls. With this arc, metal vapor is constantly generated from an arc spot on the surface of the evaporation material 3b of the evaporation source 3 and ionized to form plasma, and bombardment is performed.
この後ガス供給部からN2等の反応ガスが真空槽１内へ
送り込まれると、N2等もイオン化されることになり、金
属イオン粒子と反応ガスイオン粒子の混在したコーティ
ング用のプラズマが形成されることになる。破線で囲ん
だ斜線部Ａはプラズマ領域を示している。Thereafter, when a reaction gas such as N 2 is sent from the gas supply unit into the vacuum chamber 1, N 2 and the like are also ionized, and a plasma for coating in which metal ion particles and reaction gas ion particles are mixed is formed. Will be done. A hatched portion A surrounded by a broken line indicates a plasma region.
そして、このプラズマ中のイオン粒子が真空槽１と被
コーティング材２との間に与えられたバイアス電圧によ
って円筒形の被コーティング材２の方に引き寄せられ、
円筒形の被コーティング材２の筒内面に例えばチタンと
窒素との反応物である窒化チタン（TiN）薄膜が形成さ
れる。Then, the ion particles in the plasma are attracted toward the cylindrical workpiece 2 by the bias voltage applied between the vacuum chamber 1 and the workpiece 2,
For example, a titanium nitride (TiN) thin film, which is a reaction product of titanium and nitrogen, is formed on the inner surface of the cylindrical material 2 to be coated.
なお、蒸発源３のカソードプレート3aには蒸発材料3b
と同軸に位置するドーナツ形の永久磁石７が埋め込まれ
ており、この永久磁石７による磁場によってアークスポ
ットを移動させ、蒸発材料3bの表面から一様に金属蒸気
が発生するようにしている。矢印Ｂは永久磁石７による
磁力線を示している。一点鎖線Ｃは、バイアス電源６に
よる被コーティング材２と真空槽１との間の等電位線を
示している。The cathode plate 3a of the evaporation source 3 has an evaporation material 3b
A doughnut-shaped permanent magnet 7 coaxially located is embedded, and an arc spot is moved by a magnetic field generated by the permanent magnet 7, so that metal vapor is uniformly generated from the surface of the evaporation material 3b. Arrow B indicates the line of magnetic force by the permanent magnet 7. A dashed line C indicates an equipotential line between the material to be coated 2 and the vacuum chamber 1 by the bias power supply 6.
第２図に示した従来の金属製筒形被コーティング材の
筒内面への薄膜形成方法では、円筒形の被コーティング
材２の筒内面への薄膜形成は、ガス圧にもよるが、20〜
40mTorrにおいて、開口から概略被コーティング材２の
内径と同程度の深さまで、すなわち開口周辺だけしか行
えない（薄膜形成部位をクロスハッチングで示してい
る）。この理由は以下のとおりである。すなわち、永久
磁石７による磁力線（矢印Ｂで示す）が開いており、被
コーティング材２の内部空間を通らないため、電子が磁
力線に巻きつき、イオン粒子は、減速されて円筒形の被
コーティング材２の筒内空間まで入り込みにくいので十
分なボンバード処理あるいはイオン粒子の引き寄せを行
えないからである。In the conventional method for forming a thin film on the inner surface of a cylindrical metal coating material shown in FIG. 2, the thin film formation on the inner surface of the cylindrical coating material 2 depends on the gas pressure.
At 40 mTorr, it can be performed only from the opening to a depth approximately equal to the inner diameter of the material 2 to be coated, that is, only around the opening (the thin film formation site is indicated by cross-hatching). The reason is as follows. That is, since the lines of magnetic force (indicated by the arrow B) by the permanent magnets 7 are open and do not pass through the inner space of the material to be coated 2, electrons are wound around the lines of magnetic force, and the ion particles are decelerated to form a cylindrical material to be coated. This is because it is difficult to sufficiently enter the in-cylinder space 2 and thus it is not possible to perform a sufficient bombarding process or to attract ion particles.
この発明の目的は、筒形の被コーティング材の筒内面
全面に薄膜を形成することができる金属製筒形被コーテ
ィング材の筒内面への薄膜形成方法を提供することであ
る。An object of the present invention is to provide a method of forming a thin film on the inner surface of a cylindrical metal coating material, which can form a thin film on the entire inner surface of the cylindrical material to be coated.
この発明の金属製筒形被コーティング材の筒内面への
薄膜形成方法は、金属製の真空槽内に金属製筒形被コー
ティング材を真空槽と電気的絶縁状態で配置し、真空槽
内にアーク放電型の蒸発源を真空槽と電気的絶縁状態で
かつ金属製筒形被コーティング材の開口に臨むように配
置し、真空槽の外周に磁界発生用コイルを金属製筒形被
コーティング材の中心軸と巻軸が平行となる状態で金属
製筒形被コーティング材を包囲するように配置し、蒸発
源にアーク電源からアーク放電用電圧を印加することに
より真空槽の内部にコーティング用のプラズマを生成
し、金属製筒形被コーティング材と真空槽との間にバイ
アス電源からバイアス電圧を印加することによりプラズ
マを金属製筒形被コーティング材の方に引き寄せるとと
もに、磁界発生用コイルによる磁力線を金属製筒形被コ
ーティング材の筒内空間に通すことによりプラズマを金
属製筒形被コーティング材の筒内空間の奥まで進入させ
て金属製筒形被コーティング材の筒内面にプラズマによ
る薄膜を形成することを特徴とする。According to the method of forming a thin film on the inner surface of a metal cylindrical coating material of the present invention, a metal cylindrical coating material is disposed in a metal vacuum chamber in an electrically insulated state from the vacuum chamber, and the metal chamber is placed in the vacuum chamber. An arc discharge type evaporation source is placed in an electrically insulated state from the vacuum chamber and facing the opening of the metal cylindrical coating material, and a magnetic field generating coil is provided on the outer periphery of the vacuum chamber of the metal cylindrical coating material. A metal-made cylindrical coating material is arranged so that the center axis and the winding axis are parallel to each other, and an arc discharge voltage is applied from an arc power source to an evaporation source, so that a plasma for coating is formed inside the vacuum chamber. And apply a bias voltage from a bias power supply between the metal cylindrical coating material and the vacuum chamber to draw plasma toward the metal cylindrical coating material and to generate a magnetic field generating coil. By passing the magnetic lines of force through the inner space of the metal cylindrical coating material, the plasma enters into the inner space of the metal cylindrical coating material and the plasma is generated on the inner surface of the metal cylindrical coating material by the plasma. It is characterized by forming a thin film.
この発明によれば、金属製筒形被コーティング材の中
心軸と巻軸が平行となる状態で金属製筒形被コーティン
グ材を包囲するように磁界発生用コイルを真空槽の外周
に配置し、金属製筒形被コーティング材の開口に臨むよ
うにアーク放電型の蒸発源を配置するので、磁界発生用
コイルによる磁力線が金属製筒形被コーティング材の筒
内空間を通ることになり、プラズマを形成するイオン粒
子が減速されにくく、金属製筒形被コーティング材の筒
内空間の奥まで入りやすくなる。したがって金属製筒形
被コーティング材の筒内面全面に薄膜を形成することが
できる。According to the present invention, the magnetic field generating coil is arranged on the outer periphery of the vacuum chamber so as to surround the metal cylindrical coating material in a state where the central axis and the winding axis of the metal cylindrical coating material are parallel to each other, Since the arc discharge type evaporation source is arranged so as to face the opening of the metal cylindrical coating material, the magnetic field lines generated by the magnetic field generating coil pass through the space inside the metal cylindrical coating material, and the plasma is generated. The formed ion particles are not easily decelerated, and can easily enter the inner space of the metal cylindrical coating material. Therefore, a thin film can be formed on the entire inner surface of the metal cylindrical coating material.
また、磁界発生用コイルを真空槽外に設けているの
で、蒸発イオンによって磁界発生用コイルが汚染される
ことがなく、さらに磁界発生用コイルの取り付けが容易
である。Further, since the magnetic field generating coil is provided outside the vacuum chamber, the magnetic field generating coil is not contaminated by the evaporated ions, and the magnetic field generating coil can be easily mounted.
さらに、プラズマ源と蒸発源が同一で蒸発源からの磁
力線の向きと蒸着されるべき金属製筒形被コーティング
材内の磁力線の向きが同じ方向を向いているので、蒸発
源から発生した金属プラズマが磁力線に沿って全て金属
製筒形被コーティング材内に導かれることになり、金属
製筒形被コーティング材内面の蒸着を無駄なく高速にで
きる。Furthermore, since the plasma source and the evaporation source are the same, and the direction of the magnetic field lines from the evaporation source and the direction of the magnetic field lines in the metal cylindrical coating material to be deposited are in the same direction, the metal plasma generated from the evaporation source Is guided along the lines of magnetic force into the metallic tubular material to be coated, and vapor deposition on the inner surface of the metallic tubular material to be coated can be performed at high speed without waste.
この発明の金属製筒形被コーティング材の筒内面への
薄膜形成方法の実施例を第１図に基づいて説明する。こ
の金属製筒形被コーティング材の筒内面への薄膜形成方
法を実施するための薄膜形成装置は、第１図に示すよう
に、金属製の真空槽１内の略中央に金属製の円筒形の被
コーティング材２を真空槽１と電気的に絶縁して配置す
るとともに、カソードプレート3aの中央部に例えばTiか
らなる蒸発部材3bを装着した蒸発源３を真空槽１の側壁
に設けた貫通孔1aに真空槽１と電気的に絶縁して配置
し、さらにトリガ電極（図示せず）を真空槽１と電気的
に絶縁しかつ蒸発源３と対向するように配置している。
この場合、蒸発源３は被コーティング材２の開口に臨む
ように配置される。An embodiment of the method for forming a thin film on the inner surface of a metal cylindrical coating material according to the present invention will be described with reference to FIG. As shown in FIG. 1, a thin film forming apparatus for carrying out the method for forming a thin film on the inner surface of a metal cylindrical coating target material has a metal cylindrical shape substantially at the center in a vacuum chamber 1 made of metal. The material 2 to be coated is electrically insulated from the vacuum chamber 1 and an evaporation source 3 having an evaporating member 3b made of, for example, Ti is provided at the center of the cathode plate 3a. A hole 1a is arranged so as to be electrically insulated from the vacuum chamber 1, and a trigger electrode (not shown) is arranged so as to be electrically insulated from the vacuum chamber 1 and to face the evaporation source 3.
In this case, the evaporation source 3 is arranged so as to face the opening of the material 2 to be coated.
また、真空槽１には、真空ポンプ（図示せず）と、Ar
などの不活性ガスまたはN2などの反応性ガスを供給する
ガス供給部（図示せず）が設けられている。Further, a vacuum pump (not shown) and an Ar
A gas supply unit (not shown) for supplying an inert gas such as N 2 or a reactive gas such as N 2 is provided.
さらに、蒸発源３のカソードプレート3aにアーク電源
５の陰極を接続するとともに真空槽１にアーク電源５の
陽極を接続し、真空槽１にバイアス電源６の陽極を接続
するとともに被コーティング材２にバイアス電源６の陰
極を接続している。Further, the cathode of the arc power source 5 is connected to the cathode plate 3a of the evaporation source 3, the anode of the arc power source 5 is connected to the vacuum chamber 1, the anode of the bias power source 6 is connected to the vacuum chamber 1, and the material 2 to be coated is connected. The cathode of the bias power supply 6 is connected.
また、真空槽１の外面には、被コーティング材２の中
心軸と巻軸が略平行となる状態で被コーティング材２を
包囲する磁界発生用コイル４を巻装している。A coil 4 for generating a magnetic field surrounding the material to be coated 2 is wound on the outer surface of the vacuum chamber 1 so that the center axis of the material to be coated 2 is substantially parallel to the winding axis.
以上のような構成の薄膜形成装置を用いて金属製筒形
被コーティング材の筒内面への薄膜形成方法を実施す
る。The method for forming a thin film on the inner surface of a metal cylindrical coating target material is performed using the thin film forming apparatus having the above-described configuration.
なお、第１図において、破線で囲んだ斜線部Ａ′はプ
ラズマ領域を示し、矢印Ｂ′は磁界発生用コイル４によ
る磁力線を示し、一点鎖線Ｃ′は、バイアス電源６によ
る被コーティング材２と真空槽１との間の等電位線を示
している。In FIG. 1, a hatched portion A 'surrounded by a broken line indicates a plasma region, an arrow B' indicates a line of magnetic force by the magnetic field generating coil 4, and a dashed line C 'indicates a line between the coating material 2 by the bias power source 6. 2 shows equipotential lines with the vacuum chamber 1.
この実施例の金属製筒形被コーティング材の筒内面へ
の薄膜形成方法では、金属製の筒形の被コーティング材
２の中心軸と巻軸が平行となる状態で被コーティング材
２を包囲するように磁界発生用コイル４を真空槽１の外
周に配置し、被コーティング材２の開口に臨むようにア
ーク放電型の蒸発源を配置したので、磁界発生用コイル
４による磁力線（矢印Ｂ′で示す）が筒形の被コーティ
ング材２の筒内空間を通ることになり、イオン粒子が減
速されにくく、被コーティング材２の筒内空間の奥まで
入りやすくなり、被コーティング材２の筒内空間の全体
にわたってプラズマ領域が形成されるので十分なボンバ
ード処理あるいはイオン粒子の引き寄せを行うことがで
きる。In the method of forming a thin film on the inner surface of a metal cylindrical coating material according to this embodiment, the coating material 2 is surrounded with the central axis and the winding axis of the metal cylindrical coating material 2 being parallel. The magnetic field generating coil 4 is arranged on the outer periphery of the vacuum chamber 1 and the arc discharge type evaporation source is arranged so as to face the opening of the material 2 to be coated. (Shown) passes through the cylindrical space of the coating target material 2, so that the ion particles are less likely to be decelerated, and easily enter the inner space of the coating target material 2, and the cylindrical space of the coating target material 2. Since the plasma region is formed over the entire surface, sufficient bombardment processing or ion particle attraction can be performed.
したがって被コーティング材２の筒内面全面に薄膜を
形成することができる。Therefore, a thin film can be formed on the entire inner surface of the cylinder of the material to be coated 2.
なお、上記実施例は、被コーティング材２が円筒形で
あったが、これに限らず角筒形であっても同様に筒内面
に薄膜を形成できる。In the above embodiment, the material 2 to be coated has a cylindrical shape. However, the present invention is not limited to this.
この発明の金属製筒形被コーティング材の筒内面への
薄膜形成方法によれば、金属製筒形被コーティング材の
中心軸と巻軸が平行となる状態で金属製筒形被コーティ
ング材を包囲するように磁界発生用コイルを真空槽の外
周に配置し、金属製筒形被コーティング材の開口に臨む
ようにアーク放電型蒸発源を配置するので、磁界発生用
コイルによる磁力線が金属製筒形被コーティング材の筒
内空間を通ることになり、プラズマを形成するイオン粒
子が減速されにくく、金属製筒形被コーティング材の筒
内空間の奥まで入りやすくなる。したがって金属製筒形
被コーティング材の筒内面全面に薄膜を形成することが
できる。According to the method for forming a thin film on the inner surface of a metal cylindrical coating material of the present invention, the metal cylindrical coating material is surrounded with the central axis and the winding axis of the metal cylindrical coating material being parallel. The magnetic field generating coil is arranged on the outer periphery of the vacuum chamber and the arc discharge type evaporation source is arranged so as to face the opening of the metal cylindrical coating material. Since the ions pass through the inner space of the material to be coated, the ion particles forming the plasma are less likely to be decelerated, and can easily enter the inner space of the cylindrical material to be coated. Therefore, a thin film can be formed on the entire inner surface of the metal cylindrical coating material.
また、磁界発生用コイルを真空槽外に設けているの
で、蒸発イオンによって磁界発生用コイルが汚染される
ことがなく、さらに磁界発生用コイルの取り付けが容易
である。Further, since the magnetic field generating coil is provided outside the vacuum chamber, the magnetic field generating coil is not contaminated by the evaporated ions, and the magnetic field generating coil can be easily mounted.
さらに、プラズマ源と蒸発源が同一で蒸発源からの磁
力線の向きと蒸着されるべき金属製筒形被コーティング
材内の磁力線の向きが同じ方向を向いているので、蒸発
源から発生した金属プラズマが磁力線に沿って全て金属
製筒形被コーティング材内に導かれることになり、金属
製筒形被コーティング材内面の蒸着を無駄なく高速にで
きる。Furthermore, since the plasma source and the evaporation source are the same, and the direction of the magnetic field lines from the evaporation source and the direction of the magnetic field lines in the metal cylindrical coating material to be deposited are in the same direction, the metal plasma generated from the evaporation source Is guided along the lines of magnetic force into the metallic tubular material to be coated, and vapor deposition on the inner surface of the metallic tubular material to be coated can be performed at high speed without waste.
第１図はこの発明の金属製筒形被コーティング材の筒内
面への薄膜形成方法を実施するための薄膜形成装置の概
略断面図、第２図は従来の金属製筒形被コーティング材
の筒内面への薄膜形成方法の一例を実施するための薄膜
形成装置の概略断面図である。 １……真空槽、２……被コーティング材、３……蒸発
源、４……磁界発生用コイル、５……アーク電源、６…
…バイアス電源FIG. 1 is a schematic cross-sectional view of a thin film forming apparatus for carrying out a method of forming a thin film on the inner surface of a cylindrical metal material to be coated according to the present invention, and FIG. It is a schematic sectional drawing of the thin film formation apparatus for implementing an example of the method of forming a thin film on an inner surface. DESCRIPTION OF SYMBOLS 1 ... Vacuum chamber, 2 ... Coating material, 3 ... Evaporation source, 4 ... Magnetic field generating coil, 5 ... Arc power supply, 6 ...
… Bias power supply
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭59−50170（ＪＰ，Ａ) 特開 昭61−284570（ＪＰ，Ａ) 特開 昭61−183472（ＪＰ，Ａ) ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-59-50170 (JP, A) JP-A-61-284570 (JP, A) JP-A-61-183472 (JP, A)
Claims (1)
ング材を前記真空槽と電気的絶縁状態で配置し、前記真
空槽内にアーク放電型の蒸発源を前記真空槽と電気的絶
縁状態でかつ前記金属製筒形被コーティング材の開口に
臨むように配置し、前記真空槽の外周に磁界発生用コイ
ルを前記金属製筒形被コーティング材の中心軸と巻軸が
平行となる状態で前記金属製筒形被コーティング材を包
囲するように配置し、前記蒸発源にアーク電源からアー
ク放電用電圧を印加することにより前記真空槽の内部に
コーティング用のプラズマを生成し、前記金属製筒形被
コーティング材と前記真空槽との間にバイアス電源から
バイアス電圧を印加することにより前記プラズマを前記
金属製筒形被コーティング材の方に引き寄せるととも
に、前記磁界発生用コイルによる磁力線を前記金属製筒
形被コーティング材の筒内空間に通すことにより前記プ
ラズマを前記金属製筒形被コーティング材の筒内空間の
奥まで進入させて前記金属製筒形被コーティング材の筒
内面に前記プラズマによる薄膜を形成することを特徴と
する薄膜形成方法。1. A metal tubular coating material is disposed in a metal vacuum chamber in an electrically insulated state from said vacuum chamber, and an arc discharge type evaporation source is electrically connected to said vacuum chamber in said vacuum chamber. It is arranged in an insulated state so as to face the opening of the metal cylindrical coating material, and the magnetic field generating coil is arranged on the outer periphery of the vacuum chamber so that the central axis and the winding axis of the metal cylindrical coating material are parallel. In the state, it is arranged so as to surround the metal tubular coating material, and a plasma for coating is generated inside the vacuum chamber by applying an arc discharge voltage from an arc power source to the evaporation source, thereby generating a plasma for coating. By applying a bias voltage from a bias power supply between the cylindrical coating material and the vacuum chamber, the plasma is drawn toward the metal cylindrical coating material, and the magnetic field is generated. By passing the lines of magnetic force of the yl through the internal space of the metal cylindrical coated material, the plasma is allowed to enter deep into the internal space of the metal cylindrical coated material and the metal cylindrical coated material is A method of forming a thin film, comprising forming a thin film by the plasma on an inner surface of a cylinder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61132418A JP2575653B2 (en) | 1986-06-06 | 1986-06-06 | Method for forming a thin film on the inner surface of a metal cylindrical coated material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61132418A JP2575653B2 (en) | 1986-06-06 | 1986-06-06 | Method for forming a thin film on the inner surface of a metal cylindrical coated material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62290866A JPS62290866A (en) | 1987-12-17 |
| JP2575653B2 true JP2575653B2 (en) | 1997-01-29 |
Family
ID=15080909
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61132418A Expired - Fee Related JP2575653B2 (en) | 1986-06-06 | 1986-06-06 | Method for forming a thin film on the inner surface of a metal cylindrical coated material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2575653B2 (en) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7444955B2 (en) * | 2004-05-19 | 2008-11-04 | Sub-One Technology, Inc. | Apparatus for directing plasma flow to coat internal passageways |
| EP2251452B1 (en) | 2009-05-13 | 2018-07-18 | SiO2 Medical Products, Inc. | Pecvd apparatus for vessel coating |
| US9545360B2 (en) | 2009-05-13 | 2017-01-17 | Sio2 Medical Products, Inc. | Saccharide protective coating for pharmaceutical package |
| US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
| US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
| US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
| US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
| US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
| EP2776603B1 (en) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS |
| US9664626B2 (en) | 2012-11-01 | 2017-05-30 | Sio2 Medical Products, Inc. | Coating inspection method |
| WO2014078666A1 (en) | 2012-11-16 | 2014-05-22 | Sio2 Medical Products, Inc. | Method and apparatus for detecting rapid barrier coating integrity characteristics |
| KR102211950B1 (en) | 2012-11-30 | 2021-02-04 | 에스아이오2 메디컬 프로덕츠, 인크. | Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like |
| US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
| EP2961858B1 (en) | 2013-03-01 | 2022-09-07 | Si02 Medical Products, Inc. | Coated syringe. |
| CN105392916B (en) | 2013-03-11 | 2019-03-08 | Sio2医药产品公司 | Coat packaging materials |
| US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
| EP2971227B1 (en) | 2013-03-15 | 2017-11-15 | Si02 Medical Products, Inc. | Coating method. |
| WO2015148471A1 (en) | 2014-03-28 | 2015-10-01 | Sio2 Medical Products, Inc. | Antistatic coatings for plastic vessels |
| CA3204930A1 (en) | 2015-08-18 | 2017-02-23 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5950170A (en) * | 1982-09-16 | 1984-03-23 | ゲンナデイ・ヴアシリエヴイツチ・クリユ−チコ | Plasma arc device for coating painting |
-
1986
- 1986-06-06 JP JP61132418A patent/JP2575653B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62290866A (en) | 1987-12-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2575653B2 (en) | Method for forming a thin film on the inner surface of a metal cylindrical coated material | |
| JP4355036B2 (en) | Ionization sputtering equipment | |
| JP3968224B2 (en) | Magnetron sputtering reactor biased shield | |
| JP3159949B2 (en) | Thin film deposition equipment using cathodic arc discharge | |
| JP5068404B2 (en) | Coaxial electromagnet in magnetron sputtering reactor | |
| US20140332370A1 (en) | Filtered Cathodic Arc Deposition Apparatus and Method | |
| TW200415248A (en) | Method and apparatus of plasma-enhanced coaxial magnetron for sputter-coating interior surfaces | |
| JPH0841636A (en) | Method and apparatus for reactive sputtering | |
| JPH0627323B2 (en) | Sputtering method and apparatus | |
| JP2009543951A (en) | Electrical insulation film deposition method | |
| US6988463B2 (en) | Ion beam source with gas introduced directly into deposition/vacuum chamber | |
| WO2010070845A1 (en) | Sputtering device and sputtering method | |
| JP2002512658A (en) | Sputter coating apparatus and method using substrate electrode | |
| US5896012A (en) | Metal ion plasma generator having magnetic field forming device located such that a triggering is between the magnetic field forming device and an anode | |
| KR20060066632A (en) | Method and apparatus for cathodic arc deposition of materials on a substrate | |
| JPH079062B2 (en) | Spatter device | |
| JPH09176840A (en) | Vacuum coating apparatus | |
| JP4019457B2 (en) | Arc type evaporation source | |
| JP4019464B2 (en) | Arc type evaporation source | |
| JPH0735570B2 (en) | Thin film forming equipment | |
| JPH1088342A (en) | Sputtering system and method | |
| JP2001107229A (en) | Substrate processing device, and sputtering device | |
| JPH07116598B2 (en) | Sputtering device | |
| JP6713623B2 (en) | Plasma CVD apparatus, magnetic recording medium manufacturing method and film forming method | |
| JP2005179767A (en) | Sputtering-ion plating device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |