JPS5950170A - Plasma arc device for coating painting - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a plasma arc apparatus for applying a metal coating mainly to a long and thin pressurized piece on liquid-added enoki mushrooms of various shapes. Pertains to.

The present invention is most conveniently used to apply toughening coatings, equipment Mji coatings and other coatings in the tool making industry, pharmaceuticals, jewelry and other fields.

A significant problem faced by those skilled in the art when developing plasma arc equipment for coating coatings is to ensure that the spray coated part has the required physical and mechanical properties. The goal is to improve the quality of the surface. The main reason that prevents the solution of this problem is the existence of giant electrically neutral particles.・F-17' is formed by the evaporated material, and small /l*+ and solid pieces of this material grow in the plasma flow. These giant forceps reduce the T↓ on the surface of liquid-added parts.
Zeru. By using the IF action, the plasma flow can be divided into neutral particles and charged particles, and parts can be processed using only the charged particles.

A plasma arc device is known that separates the plasma flow as it moves through a curved plasma kite equipped with a magnetic system (1973, "Pr 1bo").
ry i tekhnika eksper imeu
Published in ta'' No. S, No. 231.-.23]
Ustroystvo dly ochistk
iplasmy vakuumnoi dugi ot
See makrochastits. When this device is used, neutral particles adhere to the walls of the plasma plasmacid, but charged particles (or small particles adhere to the walls of the magnetic VCJ).
: The direction is changed and the plasma kite is directed towards the workpiece, following the plasma kite.

The hostage drawback of this device is that the plasma guide J (Saga IQ <However, due to the energy loss of charged particles,
The charged particles are attached to the wall of the razma-cide.
It means that a lot of electrical power is lost.

Furthermore, there is a processing chamber for the magnetically trained metal constituting the 'no' node, a consumable cathode disposed in this chamber with its firing surface facing the anode, and an arc starting electrode in contact with this cathode. Another plasma arc device for coating coatings is also known, which is equipped with a DC power source to sustain the arc, a gas power source to start the arc, and a magnetic system attached to the anode. ( / 9 ', ' g year, "Pr1b
ory i tekhnika eksperim
Vn○5ipov published in enta'' No. 2, page 1'73-/'73.

1 Jstanov of V, CI'', Padalka et al.
ka dly nanesenia pokryty
osazhdeniem 1onov,
izvlekavemykhiz plazmy va
Kuumnoi dugi is referred to.

In this device, a DC power source that maintains the arc is connected to the force node and the anode, and a flood power source that starts the arc is connected to the cathode and the arc lji] starting electrode. In this magnetic system, the charged plasma particles are redirected from the surface of the anode toward the workpiece. Cathode contact end: This is the evaporation surface.

The device is equipped with a further magnetic system which maintains the cathode spot on the still contact end surface of the cathode (this magnetic system is /Q'79 USSR Inventor's Certificate No.
(5 bows are explained in detail). The processing chamber that constitutes the anode of this device is shaped like a round button, and its contact☆:!
1i is provided with a lid. A broken egg evaporator is placed inward of this lid. A t,1,cup is also placed near the center of the lid. Inside this cup, a cathode made in the form of a relatively small cylinder is placed between the rod and the end. Placed.

During operation of the device 1°'1', a plasma stream containing vapor of cathode material is directed toward the anode. In this device, the positive isons contained in the t;1,)0 sism flow are redirected by the electric field in the positive-1 under the action of the magnetic field in the region of the circular button surface of the anode, and The operating conditions of the device are selected such that it is oriented in the direction J. 11 above
- The ions adhere to the extraction force 11 piece, but the giant O)'/child of the medium ze L is attached to the anode jTrj.

Several problems arise during the angular motion of this device, which impede the extensive 1j river of this device. Therefore, in this device)
, Plasma through process &
J-Ji of workpiece j1 Can only be used for processing fti.

In addition to the upper piece of force 11 <lii f place? At the end of the process, it is necessary to turn off the device and turn the workpiece over by hand or with the aid of special tools. For this reason, it is difficult to process a workpiece in the form of a rotating body.

Furthermore, the area of the working surface of the lid is so small that it is not possible to completely process a long and slender workpiece such as a rod, strip, core or band.

Also, in this device, the evaporation surface of the cathode is the contact end, and its area is usually less than 2 Q Q cni, so the efficiency of the device is substantially low, and therefore the energy consumption Note also that it may be necessary to increase This naturally has a negative effect on the evaporation process of the cathode material, which in turn leads to rapid wear of the cathode, frequent replacement of the cathode, and eventually a reduction in the Iffj of the surface subjected to the plasma spray process.

The purpose of the invention is to eliminate the above-mentioned drawbacks.

An object of the present invention is to change the shape of the cathode and anode and their mutual arrangement, thereby making it possible to rotate the flow around the workpiece. Coating application that ensures continuous processing on all sides of the piece, improves the quality of the surface of the work piece obtained by the spray no process, and also allows processing of long and narrow work pieces. The purpose of the present invention is to provide a plasma arc device for.

These purposes are: a processing chamber for non-magnetic metal constituting the anode, a consumable cathode placed in this chamber and with its evaporation surface turned around the anode, an arc starting electrode in contact with this cathode, and an anode and cathode. a DC power source connected to the DC power source to maintain the arc; a pulse power source connected to the cathode and the arc starting electrode to start the arc;
A magnetic system is attached to the anode and directs the charged plasma particles from the surface of the anode to the workpiece. The above-mentioned magnetic system is removed on its outer surface, and the cross-sectional shape of the cathode exactly matches the cross-sectional shape of the pipe. An opening is provided for installing the horn node L1 in the plasma arc apparatus such that the horn node L1 is axially aligned with the two-legged pyzo so that its side surface forms the evaporation surface, and the above 1ul1 surface [1J is shorter than the length of the anode. This is achieved by providing 41.

The term "pipe of uniform cross section" is used as a general geometric term to describe a pipe that has the same cross-sectional area over its entire length.・The cross-sectional shape of the Izo is not only circular, but may also be an ellipse, a square, a polygon, etc.

In this configuration of the plasma arc device, the plasma flow is rotated 1" around the workpiece in a plane perpendicular to the axis of the workpiece under the action of a magnetic field by an anode in the form of a tube (an enclosure). Therefore, by placing the workpiece in the opening of the cathode, all surfaces of the workpiece can be treated with plasma flow (plasma cloud).In this case, since the side of the cathode is the evaporation surface, the cathode material The evaporation conditions and the conditions of the Zolazu two-parting process are improved, which has a positive effect on the quality of the workpiece subjected to the plasma spray process.

The simplest form of apparatus for manufacturing the plasma arc apparatus shown in B-Plan 1'' is one in which the processing chamber constituting the anode has the shape of a circle f1.

When used in this embodiment of the device, the arc is very stable and the plasma spray process is good.

Here V (in the proposed device, it is preferable that the width of the side of the cathode is o, osh or 0,5 of the length of the anode. This ensures the best conditions for processing the workpiece. If the width of the side surface of the cathode is less than 0.0 of the length of the anode, the required efficiency of the plasma spray process cannot be ensured under the condition of manufacturing a series of products. If IJ is larger than 0.5 of the length of the anode, the processing zone of the device proposed here cannot be used effectively and the loss of evaporated material will be large.

When using/using the cylindrical anode embodiment of the device proposed here, it is preferred that the sides of the cathode are cylindrical or polygonal. Although from a technical standpoint a cylindrical cathode is most suitable, other shapes are suitable for forming the cathode from a length of strisozo material.

Preferably, all surfaces of the cathode other than the evaporation surface are covered with a screen. This not only improves the reliability of the equipment, but also improves the quality of the work piece that has undergone the plasma spray process.

Another arc-initiating electrode (-j), similar to the cathode described above, is located within the processing chamber constituting the anode, and these two-force nodes are aligned axially with respect to the circumference of the chamber. It has been found useful in history to have an embodiment of the device in which the A more uniform coating can be obtained in a shorter time.

A large number (3 or more) of +r:J-like cathodes with arc-initiating electrodes are axially aligned within the processing chamber and connected between themselves by means of a common current rod, and further, Alternative embodiments are also conceivable in which a control unit is connected to the arc initiation electrode of each cathode for switching these quads on and off sequentially. This embodiment of the device is particularly suitable for processing J11 of elongated workpieces.

When processing elongated workpieces, the processing chamber constituting the anode is divided into individual anode sections that are electrically insulated from each other, and a cathode with an arc-initiating electrode, similar to the cathode described above, is connected to the anode section. of a further device, the cathodes being electrically connected between themselves by a common current rod, each cathode being axially aligned in each anode section. Aspects can also be used.

In this aspect of the apparatus, when processing an elongated workpiece,
Achieve the highest efficiency by operating all electrical groups of the ``Anode Section - Cathode'' simultaneously! I can. Each group forms a rotating plasma cloud.

Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

The plasma arc device for film application according to the present invention comprises a first
Referring to the figure, a non-magnetic metal chamber 1 constituting the anode is shown.
, a consumable force node 2 , an arc initiating electrode 3 , and a DC power source 4 for maintaining the arc between the cathode 2 and the anode 1
and a pulsed electric current i1j;j5 for starting an arc between the cathode 2 and the anode 1.

The processing for forming the anode 41t1 has the shape of a mother eve with a uniform cross section, especially a cylindrical shape. This nozzle is closed at its front end with lids 6 and 7, and these lids are insulated from the chamber 1 by an insulating packing 8. The lid 6 has a port 9 for loading the cut workpiece 10 to be processed into the chamber 1, and the lid 7 has a port 9 for loading the cut workpiece 10 to be processed into the chamber 1, and the lid 7 has a port 9 for loading the cut workpiece 10 to be processed into the chamber 1. The gas bleed has a .xi.b connection which communicates with p, indicated by the arrow.

The cathode 2 is installed in the chamber 1 with the help of a current rod 12 attached to an insulating plug 13 located on the lid 6. A 1α current power source 4 is connected to the anode 1 and one of the rods 12, and a source 5 is connected to the other rod 12 and the arc starting electrode 3. The arc starting electrode 3 is made of ceramic and is in contact with the cathode 2;
It is fixed to the lid I and is passed through an insulating punching 14.

The cross-sectional shape of the cathode 2 substantially corresponds to the cross-sectional shape of the chamber 1 constituting the anode, and the cathode 2 has an opening 2a for placing the workpiece 10 in the processing position as shown in FIG. It is provided. Cathode 2 is the [111
The anode 2b is axially aligned with the anode 1 such that it becomes the evaporation surface. 11]ゝゝt'' of this side surface 2b is smaller than the length ゝゝt'' of the chamber 1 constituting the anode. SS t
/7 is the length of the anode 1 "L" from 0.0 da to 0.
Experiments have shown that the best results can be obtained with tide.

To prevent an accidental arc from being established between the anode and the other I+i of cathode 2, cathode 2 is covered with a scree 715.

The device includes an i.j.
A magnetic system is also provided, which is a solenoid 16 connected to a power source (not shown) and VC.

This magnetic system is 1. The purpose is to form a magnetic field in the chamber 1 that constitutes the anode, and this magnetic field L1 causes the charged particles of the plasma to flow from the surface of the anode 1.
It works to change the direction towards 0. It should be appreciated that this magnetic system may be constructed, for example, in the form of permanent magnets (not shown).

In order to obtain a good working condition of the cathode 2, it is preferable to cool the cathode with water, e.g. Indicated by arrow 1-).

When the chamber 1 constituting the anode has a cylindrical or cylindrical shape as described above, the side surface 2b of the cathode 2 is either circular (Fig. 2) or polygonal (Fig. 3). It is preferable to have one. In the polygonal case, the cathode 2 is constructed in the form of a permanent framework 2C and a consumable strip 2d made of /l'iIL material T↓ and fixed to this framework.

A cylindrical cathode 2 is the simplest one, while a polygonal cathode 2 is suitable if the cathode is formed from a piece of strip material, so as to substantially reduce its cost. Anode 1 and U1 (Fig. 7) If one is an oval or d, square, L, U4, another jh-shaped, P iso, the cathode 2 kj: and 1 in a circular shape.
-I want to be taught the truth about being weak.

This device operates as follows.

Fix the broken egg 10 (FIG. 1) to the holder 10a, follow the person 1-19 into the chamber 1, pass it through the opening 2a of the cathode 2 as shown, and at this time remove the holder 10a.
', L people [' is fixed at 9. Then, configure the anode 1
- After forming the required vacuum in the chamber 1, - supply the working voltage from the direct current source to the anode 1 and the cathode 2,
At this time, make Ru/id 16 a member.

Next, the cathode 2 and arc starting electrode 3-\arc starting voltage is supplied from the ZELS power supply 5. In this case, an electric arc is formed between cathode 2 and anode 1 Jl,
That cathode, J? The cathode 2 rotates on the side surface 2b of the cathode 2 under the action of the magnetic field of the solenoid 16. This cathode spont vaporizes the material at the cathode 2 and forms a plasma cloud 17 which rotates in a plane perpendicular to the axis of the chamber 1, as indicated schematically by the solid arrow. (
In the case of Fig. 7 9゜Q, a neutral giant shiba with a plasma flow of 1γ is applied to the inner surface of the chamber 1 constituting the anode, f = J.
However, due to the action of the magnetic field, the positive ions are deflected away from the potential barrier formed by the electric field in Zoshizuma, and as shown by the dotted line in FIG. ]
wear it. Due to the rotation of the plasma cloud, liquid addition] - Piece 10←1
, processed all around it. Force/'-do2's πp
The distance "δ" from i it' 112b to the inner surface of the chamber 1 constituting the anode (FIG. 1, 9) is chosen in such a way that the workpiece 10 is treated over its entire length t, //.

FIG. S shows another embodiment of the device of the invention.

In this embodiment, one cathode 2 similar to the cathode described above is arranged at both ends of the anode chamber 1.

Each of these cathodes 2 is electrically insulated from each other and has an arc initiating tower 3 and its own power supply unit containing power supplies 4 and 5!・I am doing

The operation of this device is basically the same as that described above. In this other aspect, how to handle 1j! 1 of 1
Since this is done simultaneously from both ends, the coating can be quickly and uniformly applied to the work piece 10. Furthermore, in this case, as the processing noon becomes wider/ζ,
Compared to the mode of operation of FIG. 1, 7.5 to 2 times the length of the extraction force I] piece 10 can be processed with no practical increase in the size of the device.

By using the embodiment of the apparatus shown in Figures 11 and 1, the most uniform coating is formed on the part of the workpiece 10 that is not in the shadow of the rod 12 against the nolasma flow. Please note that Seven parts of the ions of the 7' plasma attach to these rods.

This firstly reduces the thickness of the coating on the workpiece 10 below the rod 12, and a) considerably reduces the proportion of material in the cathode 2. If the number of cans 1' 2 should be increased (this is caused, for example, by the need to increase the processing efficiency of relatively long workpieces), the number of rods 12 should also be increased; It should be understood that this will result in a greater loss of material adhering to the wave loe strip 10 and will also result in poor coating uniformity.

In order to reduce these losses, especially when it is necessary to efficiently process long (>/m) workpieces with various cross sections, the apparatus shown in Figs. 4 and 7 is used. It is desirable to incorporate the advantages of FIG. 4 shows that in the chamber 1 constituting the anode, a large number (in this case seven) of similar cathodes
3 shows a further embodiment of a plasma arc device in which the cathodes are aligned in the direction and provided with arc starting electrodes 3;

In this case, since the number of current rods 18 does not increase with the increase in the number of cathodes 2, the loss of cathode material is not so great and the uniformity of the coating is even better.

During operation of the device shown in FIG.
With the help of
Furthermore, each section is processed continuously. The structure of a production unit will be obvious to those skilled in the art and may be selected from a number of control units based on specific requirements.

The aspect of the apparatus shown in FIG. 71 is substantially similar to that shown in FIG. 4, but the difference between the two is that in the case of FIG. , and that the chamber 1 constituting the anode is divided into individual anode sections 1a and -1d, and these sections are electrically insulated from each other by insulating packings 8. Each of these anode sections is provided with a GB gas system 16 and a DC power source 4 for assembling an arc. Although only seven pulsed electric currents W++i 5 are provided to start the arc, this may be due to the number of anode sections (so that a large number of such power sources may be provided). The number of anode sections 1a...-1d is similar to the number of anode sections 1a...-1d, and each cathode is aligned in the 1tl+ direction in each of the anode sections 1a...-1d.The functions of the power sources 4 and 5 are shown in FIG. It is obvious and no detailed explanation is necessary.

In this 1, u'fr, l't, '1 which processes the workpiece 10 in the morning, a large number of arcs are connected to the are generated simultaneously.Therefore, a large number of workpieces 10 (in this case, 1.
7), which makes the No. 0 Shismas Sollet process considerably more powerful, as well as the processing of long and narrow workpieces. Zoshizuma Spray 7″ Receive process / ζζ direction power 1-cho no 1
Improve t'↓ of the surface.

In the embodiment of the device shown in FIGS. Note that the cathode electrode of the embodiment of FIG. It is obvious that it is easy to do.

The shadow of the cathode 2 and the rod 18 on the surface of the workpiece 10 (Q''C) is to reduce the non-toughness of the formed coating. If you move the spider in one direction by a width smaller than 2, it is desirable to have J(J) periodically rotate 1llJ around its spine.

When the workpiece 10 has a uniform cross section over its entire length and is considerably long (long shaft, strip, wire, band, etc.), the present invention shown in FIG. J', L
Although this device is relatively small in size, it is a highly efficient continuous operating device.

In another embodiment, this 91 constitutes an anode.
1', 1 has a person [2 19a and an output Jl 9 b, and these input 11 and output D VC are Patsukin Department Month 20
is provided. The middle V of this device is moved through the chamber 1f in the lQi direction indicated by the arrow, and subjected to a continuous Zolazmus brane process. .

Misfire 11) In any of the embodiments described in 1. of the device of J,
It is possible to process one or more work pieces 10 at the same time (
Two ll-, <;'! Heat/Koi. When processing a large number of workpieces, the workpieces may be arranged in a 311-row relationship with each other, and the wave force 11 may be applied to keep the pieces of soil from moving during processing. Alternatively, it can be rotated around a general drive device (Q), such as a planetary gear. However, since various modifications will be apparent to those skilled in the art, the present invention is not limited to the embodiments disclosed herein or to the details thereof, but rather to the scope of the appended claims, which reflect the spirit and scope of the invention. The invention can also be implemented in other ways within the scope of the invention.

[Brief explanation of the drawing]

FIG. 1 shows a plasma arc apparatus for coating coatings according to the invention in the case of one cathode; FIGS. If there is one, this is used in the device of the present invention.
/ -t (showing D shape ft-crab/-l') Eii
illir178Is Figure q is a 1l)-+i+'i'i diagram taken along the line ■-IXI in Figure 1, and is a schematic diagram showing the operation of the unexploded 1/1 device. FIG. 4 shows a further embodiment of the device according to the invention in which there are 11 cathodes, and FIG. FIG. 7 is a cross-sectional view showing a further embodiment of the device of the present invention having a segmented anode; FIG. , and g-th Ik:J, which are similar to FIG. Door note 18-... 1d Anode division 2, cathode 2a, cathode opening 10 21), cathode (111 surface 3), arc starting electrodes 4, 5...power supply 10, work piece 16, magnetic system 18 - current rond 19 Continuing from page 1 of li control uninote Kusovyet Federation Kharkov Ulitsa Gultera 12 Cavy 32 ■Applicant Valentin Glebovitsch Paddle Power Soviet Union Kharkiv Ulitsa ° Danilevskogo 10 Cavi 122 ■Applicant Leonid Pavlovych Savlevso Vyet Federation Kharkov-Ulitsa Pe Morozova 3Kevy 3 ■Applicant Rimma Ivanovna Steyupaksovyet Federation Kharkov-Ulitsa-Gultera 12Kevy 32 Commissioner of the Patent Office Kazuo Wakasugi 1, Display of the case 1982 Year: Patent No. 161558 2, Title of the invention: Plasma arc device for coating coatings 3, Relationship with the amending case: Name of applicant: Gennaday Vasilyevy Noci Kurij,
- Chico (3 others) 4, agent 5, ? Date of 1i positive order Voluntary 6,? Di Correct Object Column 7 of the Detailed Description of the Invention in the Specification, Contents of Amendment (1) The specification of the present application, page 14, line 16, is corrected to read "pipe connection 91 to 1 pipe connection part 11." (2) "δ" on page 18, line 11 of the same book is corrected to rsJ. (3) In the same book, same page, lines 16-18, these are... Correct ゛ as follows. 1. Each of these cathodes 2 is provided with an arc-initiating electrode 3, each of these cathodes 2 is electrically insulated from each other, and each of these cathodes 2 has its own electrical current containing an electric current tA4 and 5. It has a power supply unit I~. (4) In the same book, p. 20, lines 1 to 5, “Especially the colors...
・Delicious. ” is corrected as follows: [Relatively long workpieces (longer than 1 m), especially when applying liquid to a workpiece whose cross section changes] To reduce these losses when processing two pieces efficiently. It is desirable to use the modification shown in FIGS. 6 and 7.The current rod 18 is not different in principle from the aforementioned rod 12 (see FIGS. 1 and 5). , are common to all cathodes 2.As a result, the cathodes 2 are coupled together.The device also includes a control unit for turning the cathodes 2 on and off continuously. (1) 9 is also provided. This control unit 19 is connected to the arc starting electrode 3 of each cathode 2, as indicated by the dotted line for only one arc starting electrode 3." (5) Ibid., p. 22 Correct “small °゛” in line 18 to “not small”.

Claims (1)

[Claims] (1) The non-magnetic metal that constitutes the anode [chamber 1]
and a consumable cathode 2 arranged in this chamber 1 and with 1 m of evaporation directed toward the anode 1, an arc starting electrode 3 in contact with this cathode 2, and connected to the anodes 1 and 0 and the cathode 2. DC power supply 4 that maintains the arc
A pulse power source 5 is connected to the cathode 2 and the arc starting type 4 @ 3 to start the arc, and a pulse power source 5 is attached to the anode 1 and connects it to the surface of the anode 1 to the workpiece 10. Magnetic system that changes the direction of charged plasma particles 1
6, the processing chamber 1 constituting the anode is a pipe with a uniform cross section, the magnetic system 16 is attached to the outer surface of the processing chamber 1, and the cross-sectional shape of the cathode 2 is the same as that of the pipe. The work piece 10 is placed at the processing position on the cathode 2, substantially matching the cross-sectional shape.
The cathode 2 is axially aligned with the pipe, and the side surface 2b of the cathode serves as an evaporation surface, and the width of this side surface 2b is shorter than the length of the anode 1. Plasma arc device. @11 on the side surface 2b of cathode 2] is 0.03 of the length of anode 1! Stone 0. The scope of the request for a ship license RJ that is S (1st
). (3) Processing chamber 1 is made in the shape of a cylindrical pipe.
The device according to claim (1) or (2). @) The device according to claim 3, in which the side surface 2b of the cathode 2 has a cylindrical shape (device according to claim 3). . (B) The device according to any one of claims (1), 11!1 to σ), in which all surfaces of the cathode 2 other than the evaporation surface 2b are covered with screens. (7) In the processing chamber 1 constituting the anode, another cathode 2 having an arc starting electrode 3f is arranged, similar to the cathode 2 described above, and these two-power swords 2 are similar to the cathode 2 described above. Cows aligned axially with respect to the circumference of chamber 1 and electrically insulated from each other) Huij! 'I seek flag encirclement (1)
The device described in any of paragraphs 1 to 2). (g) In the CC inside the processing chamber 1, which forms the anode I'f+, a large number of cans 1 and '2 with arc starting electrodes 3 similar to the above-mentioned force and node 2 are arranged, and all the cathodes 2
are connected between themselves and axially aligned by a common current rond 18, and furthermore, the cup 1
・An opening side unit 19 is connected to the arc starting electrode 3 of each cathode 2 so as to switch 2 sequentially on and off at θ(, Claims (1) to ω).
), T1'1. (9) The processing chamber 1 constituting the anode is electrically insulated by tiles and divided into individual anode sections 1a... 1d. , arc starting electrode 3 (comprising a large number of cathodes 2, the total number of these cathodes 2 being equal to the number of anodes 1 sections 1a - 1d, above) 7 nodes 2 are connected to a common current conductor 18 There is an electrical connection between themselves by 7, and each horn node 2 (, i each 7
2 anode (6th axis at 7 minutes 1a and -1d) J 1
ill l◇2 roast //,, ≦ life゛11i F r;r
The device described in any one of Items (1) to (B) of the scope of requirements.