JP2564912Y2 - Rotary substrate processing equipment - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a method for applying pure water or the like to a substrate such as a glass substrate for a liquid crystal display panel, a semiconductor wafer, a printed substrate, and a mask substrate for a semiconductor manufacturing apparatus by utilizing centrifugal force caused by rotation. The present invention relates to a rotary substrate processing apparatus such as a so-called spin dryer for shaking off and drying a liquid to be processed.

[0002]

2. Description of the Related Art In this type of rotary substrate processing apparatus, a substrate is supported by support pins in order to dry the back surface of the substrate, but conventionally, the substrate is stably supported. From the viewpoint, a large number of support pins are provided in a state of being uniformly dispersed on the turntable.

[0003]

However, after the drying process, pin marks are left on the back surface of the substrate, and furthermore, the portion outside the support pins when viewed from the rotation axis is hard to be dried, resulting in drying defects. Was.

The present invention has been made in view of such circumstances, and the rotary substrate processing apparatus according to the invention according to claim 1 has a small number of pin marks after a drying process by a reasonable improvement. In addition, it is an object of the present invention to avoid adverse effects due to drying unevenness, and a rotary substrate processing apparatus according to the invention according to claim 2 satisfactorily performs drying processing on a square substrate without deteriorating quality. The purpose is to be able to.

[0005]

According to a first aspect of the present invention, there is provided a rotary substrate processing apparatus comprising: a rotary table rotatable around a vertical axis; In a rotary substrate processing apparatus provided with support pins for placing and supporting a substrate in a horizontal direction on a turntable, a support pin is provided with a center support pin for supporting the center of the substrate at a position corresponding to a rotation axis, and a peripheral portion of the substrate. And a peripheral support pin for supporting the edge side, and the height of the center support pin is configured to be lower than that of the peripheral support pin.

According to a second aspect of the present invention, there is provided a rotary substrate processing apparatus for processing a rectangular substrate by using a peripheral edge supporting pin to form a corner of the rectangular substrate. It is configured to be supported at a position close to.

[0007]

According to the structure of the rotary substrate processing apparatus of the present invention, at the beginning of the drying process, the substrate is heavier by the liquid to be processed such as pure water, and the substrate is supported at the center. The substrate is supported by the pins and the peripheral support pins, and as the substrate becomes lighter as the drying progresses, the center of the substrate floats more than the tip of the center support pin and comes into a non-contact state, and the peripheral portion deviates from the final product effective area. Can be supported only by the peripheral support pins.

Further, according to the configuration of the rotary substrate processing apparatus of the present invention, at the beginning of drying, the square substrate is positioned at a position close to the center of the square substrate and the corner deviating from the final product effective area. And finally can be supported only by the peripheral support pins located near the corners.

[0009]

Next, an embodiment of the present invention will be described in detail with reference to the drawings.

FIG. 1 is an overall schematic longitudinal sectional view showing an embodiment of a rotary substrate processing apparatus according to the present invention, and FIG. 2 is a plan view of a main part. The upper rotary plate 3 is provided above the rotary table 2 in parallel with the rotary table 2, and the upper rotary plate 3 is mounted on the rotary table 2 on the upper support plate. A waste liquid collecting case 5 is provided so as to be integrally rotatable via the rotary member 4 and surrounds a lower portion and a peripheral portion of the rotary member from the outside. The rotary table 2 has an output shaft 6 as a vertical rotary shaft. The electric motor 7 is connected via the.

The turntable 2 is configured as an outer disk having a shape sufficiently larger than the outer shape of the square substrate 1. A center support pin 8 a is provided at a position corresponding to the rotation axis on the upper surface of the turntable 2. A peripheral support pin 8b is provided at a position corresponding to each of the four corners of the rectangular substrate 1, and the rectangular substrate 1 is placed and supported on the center support pin 8a and the four peripheral support pins 8b. Has become. In addition, turntable 2
A pair of positioning pins 9, 9... Are provided at each of the four corners of the rectangular substrate 1 so that the rectangular substrate 1 is horizontally rotated integrally with the turntable 2 by the positioning pins 9, 9,. It has become.

Further, on the outer peripheral upper surface of the turntable 2, the turntable 2
The spacer ring 10a and the ring plate 10b having the same outer diameters as those described above are connected at a plurality of locations on concentric circles, and the upper support plate 4 is removably attached to the ring plate 10b via knob bolts 11. By removing the substrate 4, the substrate 1 can be taken in and out from the central opening of the ring plate 10b.

The upper rotating plate 3 is formed as a disk having a diameter larger than the outer shape of the substrate 1, and a collar 1 is provided on the lower surface of the upper supporting plate 4.
2 are connected by bolts. The bottom of the waste liquid recovery case 5 is narrowed down, and a waste liquid discharge port 13 is formed at the lower end thereof, and an exhaust port 14 for discharging a solvent gas or a coating liquid mist evaporated from the coating liquid is formed at a plurality of locations in the circumferential direction. ing.

As shown in the enlarged side view of the main part of FIG. 3, the height of the center support pin 8a is equal to that of the peripheral support pins 8b.
When the rectangular substrate 1 is rotated at a high speed to perform a drying process after the cleaning process is performed by supplying pure water, at the start, the rectangular substrate 1 contains pure water as shown in FIG. Due to the weight, the center of the rectangular substrate 1 is lowered,
The lowered center portion is supported by the center support pins 8a, and portions near the four corners of the rectangular substrate 1 are supported by the peripheral edge support pins 8b. And
As the rectangular substrate 1 becomes lighter with the drying, as shown in FIG. 3B, the central portion of the rectangular substrate 1 floats, and the back surface of the central portion and the upper end of the central support pin 8a are separated. In a non-contact state, the drying process is performed in a state where the portions near the four corners of the rectangular substrate 1 are supported only by the peripheral support pins 8b. The height of the center support pin 8a may be such that the distance between the upper end of the center support pin 8a and the back surface of the rectangular substrate 1 after drying is about 0.5 to 1.0 mm.

With the above structure, in the initial stage of the drying process, the heavy rectangular substrate 1 is placed on the center supporting pins 8a and the peripheral supporting pins 8b.
From the middle of the drying process, while stably supporting by
The center support pins 8a and the back surface of the square substrate 1 are brought into a non-contact state, and finally, the occurrence of pin marks by the center support pins 8a can be eliminated.

The present invention can be applied not only to the rectangular substrate 1 but also to a rotary substrate processing apparatus for a circular substrate.

[0017]

As is apparent from the above description, according to the rotary substrate processing apparatus of the invention according to the first aspect, the weight of the substrate changes with the drying process, and the center of the substrate accordingly changes. Focusing on the rise, the height of the center support pin that supports the center of the substrate is made lower than the peripheral support pins,
It becomes non-contact with the back surface of the substrate with the drying process, does not generate pin traces by the center support pin, and also, when viewed from the rotation center than the pin trace by the peripheral support pin, and the support position by the peripheral support pin Drying unevenness of the outer part occurs, but the supporting point is the peripheral part that deviates from the final product effective area, and by rational improvement, pin marks after drying processing can be reduced and the adverse effect of drying unevenness can be avoided. , Quality can be improved.

According to the rotary substrate processing apparatus of the present invention, the rectangular substrate is supported at a position close to the center of the substrate and the corner deviating from the final product effective area. With this number, the rectangular substrate can be stably supported, and the rectangular substrate can be dried well without deteriorating the quality.

[Brief description of the drawings]

FIG. 1 is an overall schematic vertical sectional view showing an embodiment of a rotary substrate processing apparatus according to the present invention.

FIG. 2 is a plan view of a main part.

FIG. 3 is a side view of a main part.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Square board 2 ... Rotating stand 8a ... Center support pin 8b ... Peripheral support pin P ... Vertical axis core

Claims (2)

(57) [Scope of request for utility model registration] 1. A rotary substrate processing apparatus, comprising: a rotary table provided rotatably around a vertical axis; and a support pin for horizontally supporting and disposing a substrate on the rotary table. The support pin includes a center support pin for supporting the center of the substrate at a position corresponding to the rotation axis, and a peripheral support pin for supporting a peripheral side of the substrate, and the height of the center support pin is set to the peripheral support. A rotary substrate processing apparatus characterized by being lower than pins. 2. The rotary substrate processing apparatus according to claim 1, wherein the substrate according to claim 1 is a rectangular substrate, and the peripheral edge support pins support the rectangular substrate at a position near a corner thereof.