JP2552731Y2 - Substrate development processing equipment - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION This invention relates to a process for manufacturing a color filter of a color liquid crystal display (LCD) or a semiconductor device by applying a photoengraving method to a substrate such as a liquid crystal glass substrate or a semiconductor substrate. The present invention relates to a substrate development processing apparatus used for developing a pattern-exposed photoresist layer formed on a surface thereof, and more particularly to a cleaning unit for cleaning the surface of a substrate after development processing with a developer is completed.

[0002]

2. Description of the Related Art A photolithography method is applied to, for example, a color L
In the case of manufacturing a color filter of a CD or the like, after exposing a photoresist layer formed on a surface of a substrate such as a glass substrate for a liquid crystal according to a predetermined pattern, and performing a developing process, a pattern formed on the edge of a pattern formed by development is formed. A scum-like residual film is generated and the pattern edge becomes saw-like. The black resist used for the boundary of the three colors of RGB of the color filter is dissolved by the original developing process on the substrate after the developing process and the substrate surface is exposed. In some cases, a sandy resist residue may be left as a development residue in a portion that must be processed. Therefore,
Conventionally, the scum-like residual film and the resist residue have been manually rubbed with a sponge or the like, or have been automatically removed with a roll-shaped sponge brush.

That is, the operation of manually rubbing the scum-like residual film and the resist residue using a sponge or the like is performed simultaneously with the development process, or the work process after a series of development, washing, and drying processes is completed. Or was added. In addition, a roll-shaped sponge brush is arranged in the developing chamber, or a brushing device is provided next to the drying chamber, so that the roll-shaped sponge brush is driven to rotate, and the surface of the conveyed substrate is conveyed. Was brought into contact with the surface of the brush for automatic brushing.
Furthermore, a method of spraying a developer at a pressure of 0.3 kg / cm ² or more on the surface of the substrate during the developing process and performing the developing process by a spray method has been conventionally attempted.

Further, for example, JP-A-59-53842 discloses that a resist remaining in a non-photosensitive portion after a development process is treated in an atmosphere containing ozone without using the physical method as described above. A method is disclosed for chemical removal.

[0005]

However, a method of manually scraping the scum-like residual film and the resist residue by a worker manually results in uneven work results, and is a major obstacle to automation of processing and mass production. . Further, in the method of brushing with a roll-shaped sponge brush, the time during which the substrate surface is in contact with the roll-shaped brush is short, so that a sufficient effect of removing the scum-like residual film and the resist residue cannot be obtained.
Further, the method of manually scraping the scum-like residual film and the resist residue during the development processing, brushing, or spraying the substrate surface by pressing the developing solution causes damage to a pattern to be formed. There is fear. Further, in the method of removing the scum-like residual film and the resist residue after washing with water, the residual film and the residue adhere to the substrate surface with a certain strong force once dried,
There is a problem that the residual film and the residue cannot be removed.

On the other hand, as disclosed in JP-A-59-53842, the method of exposing a resist to an atmosphere containing ozone to remove residual films and residues requires an ozone generator, It is necessary to provide a special treatment chamber for the oxidation treatment, and the configuration of the apparatus is complicated, and it is difficult to control the reaction.

The present invention has been made in view of the above circumstances, and effectively removes a scum-like residual film and a resist residue generated on the surface of a substrate after a development process without manual operation. It is a technical object of the present invention to provide a substrate development processing apparatus which does not cause damage to a pattern formed on a substrate surface and has a relatively simple structure.

[0008]

According to the present invention, a base for transporting a substrate to a cleaning chamber provided between a developing chamber and a drying chamber is provided.
Plate transfer means, and the substrate transfer means
0 against the al conveying surface of the substrate. 8 to 3.0 kg / c
a spray cleaning unit for supplying pressurized pressure cleaning liquid to a pressure of m ^2, the spray cleaning by the substrate transfer means
The surface of the substrate conveyed from the parts, and a brush unit for blanking lashing by <br/> spongy rotary member, the substrate transfer hand
Carry from the spray cleaning section to the brush section by step
The surface of the board being transported and the brush
The surface of the substrate is
Cleaning water supply means for supplying cleaning water to keep it wet
Transported from the brush section by the substrate transporting means
To surface of the substrate was provided and a deionized water cleaning unit for supplying pure water.

In the substrate developing apparatus having the above structure, the operation of removing the scum-like residual film and the resist residue is performed not in the developing process but in the cleaning stage, so that the pattern formed on the substrate is not damaged. In addition, in the washing step before drying, since the operation of removing the scum-like residual film and the resist residue is performed while keeping the surface of the substrate in a wet state, the scum-like residual film and the sand-like resist residue are removed from the substrate surface. Can be effectively removed. Since the operation of removing the scum-like residual film and the resist residue is performed by both spray cleaning and brushing, the scum-like residual film and the resist residue can be completely removed from the substrate.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic cross-sectional view showing one embodiment of the present invention and showing a schematic configuration of a substrate developing apparatus. This apparatus is configured such that a developing chamber 10, a cleaning chamber 12, and a drying chamber 14 are sequentially connected.

The developing chamber 10 has a pair of front and rear nip rollers.
An immersion tank 18 maintained at a predetermined liquid level by 16 and 16 is provided. The developer 20 that overflows the nip roller 16 from the immersion processing tank 18 and flows out to the auxiliary tank 22 is guided to a storage tank (not shown), and is returned from the storage tank to the immersion processing tank 18 again by a pump (not shown), thereby circulating. Let it be used. Then, the substrate W is introduced into the developing chamber 10.
Is carried in, the substrate W is fed into the immersion tank 18 by the nip roller 16, and is transported in the developer 20 in the immersion tank 18 by the transport rolls 24 in the horizontal direction.
The exposed photoresist layer formed on the surface of the substrate W is developed.

Next, a spray cleaning section 26,
A brush section 28 and a pure water cleaning section 30 are provided in this order. The spray cleaning unit 26 is provided with a 0.0.
A spray pipe 34 for supplying pressurized washing water at a pressure of 8 to 3.0 kg / cm ² , usually about 1.5 to 2.0 kg / cm ² is provided. A transfer roll for transferring the substrate W from the spray cleaning section 26
In the middle of the transport path for transporting to the next brush section 28 by 32,
In addition, a water supply pipe 36 for supplying cleaning water to the surface of the substrate W is provided in the brush unit 28, respectively. In addition, a disc-shaped sponge brush 38 is rotatably disposed around the vertical axis in the brush portion 28, and the disc-shaped sponge brush 38 is driven to rotate at a high speed by a motor (not shown). In addition, instead of this disc-shaped sponge brush 38,
The brush portion 28 may be provided with a roll-shaped sponge brush that is driven to rotate around a horizontal axis. Further, the next pure water cleaning section 30 is provided with a pure water supply pipe 40 for supplying pure water to the surface of the substrate W transported by the transport roll 32. If necessary, an ultrasonic cleaning unit having an ultrasonic generator and a water spray pipe or a water bath may be provided between the brush unit 28 and the pure water cleaning unit 30.

The developed substrate W is transferred from the developing chamber 10 to the cleaning chamber 12.
Is sent, first, in the spray cleaning section 26, unnecessary scum-like residual film and resist are peeled off from the surface of the substrate W by high pressure of the pressurized cleaning water, and the peeled residual film and resist are removed. The developer is washed away from the surface of the substrate W together with the developer attached to the surface of the substrate W. And the water pipe 36
When the cleaning water is supplied to the surface of the substrate W being transported from the substrate W, the substrate W is sent to the brush unit 28 while the surface is kept wet. In the brush unit 28, the cleaning water is supplied from the water supply pipe 36 to the surface of the substrate W, and the surface of the substrate W is brought into contact with the surface of the rotating disc-shaped sponge brush 38. The scum-like residual film and the resist residue remaining on the surface of W are completely removed. At this time, since the brushing is performed while the surface of the substrate W is wet, the substrate W has no portion to be dried, and the remaining film and the residue are efficiently removed, and the pattern formed on the substrate W may be damaged. Absent. Brush 28
Substrate W after brushing in
In 30, the surface is finished and cleaned by pure water supplied from a pure water supply pipe 40.

An air knife 42 is provided near the entrance of the drying chamber 14, and a supply device 44 for drying air is provided behind the air knife 42. By blowing pressurized air from an air knife 42 toward the surface of the cleaned substrate W transported from the cleaning chamber 12 to the drying chamber 14, the substrate W
After draining the surface, by blowing heated air from the drying air supply device 44 to the surface of the substrate W,
The surface of the substrate W is completely dried. Then, the substrate W on which the resist film having the predetermined pattern is formed is carried out from the drying chamber 14.

[0016]

Since the present invention is constructed and operates as described above, when the substrate developing apparatus of the present invention is used, a series of processes of development, washing and drying are completed, and a resist film having a required pattern is formed on the surface. On the surface of the substrate on which is formed, a scum-like residual film having a saw-shaped edge of the formed pattern and a sand-like resist residue as a development residue are not generated, and the formed pattern may be damaged. There is no. In addition, unlike the related art, there is no trouble or inefficiency in the operation of removing the resist residue by hand, and the configuration of the apparatus is relatively simple.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view showing a schematic configuration of a substrate developing apparatus according to an embodiment of the present invention.

[Explanation of symbols]

 10 Developing room 12 Washing room 14 Drying room 18 Immersion tank 20 Developing solution 24, 32 Transport roll 26 Spray cleaning unit 28 Brushing unit 30 Pure water cleaning unit 34 Spray tube 36 Water supply tube 38 Disc sponge brush 40 Pure water supply tube 42 Air knife 44 Drying air supply device

 ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Satoshi Suzuki 1 at 480 Takamiya-cho, Hikone-shi, Shiga Prefecture Dainippon Screen Manufacturing Co., Ltd. Hikone area business office (56) References JP 63-213847 (JP, A) JP-A-3-122648 (JP, A) JP-A-64-88547 (JP, A)

Claims (1)

(57) [Scope of request for utility model registration] 1. A developing chamber for supplying a developing solution to a surface of a substrate on which a photoresist layer having a pattern exposed on the surface is formed, and a developing solution is supplied to the surface of the substrate after the developing process. cleaning chamber and the surface of the substrate after cleaning draining to and cleansed, in order a substrate developing apparatus interconnects the drying chamber for drying, the cleaning chamber, a substrate transfer unit for transferring a substrate, the substrate A pressure of 0.8 to 3.0 kg / cm ² is applied to the surface of the substrate transferred from the developing chamber by the transfer unit.
A spray cleaning unit for supplying a pressurized cleaning liquid, and a transfer from the spray cleaning unit by the substrate transfer unit.
The surface of the substrate, and a brush unit for blanking La <br/> ashing by spongy rotary member, said from the spray cleaning unit by the substrate transfer means
The surface of the substrate being transported to the brush
Against the surface of the substrate being brushed
And supply cleaning water to keep the substrate surface moist.
Cleaning water supply means, which is transported from the brush portion by the substrate transport means.
A pure water cleaning unit for supplying pure water to the surface of the substrate.