JP2549093Y2 - Quartz extension tube - Google Patents

Quartz extension tube

Info

Publication number
JP2549093Y2
JP2549093Y2 JP1987095719U JP9571987U JP2549093Y2 JP 2549093 Y2 JP2549093 Y2 JP 2549093Y2 JP 1987095719 U JP1987095719 U JP 1987095719U JP 9571987 U JP9571987 U JP 9571987U JP 2549093 Y2 JP2549093 Y2 JP 2549093Y2
Authority
JP
Japan
Prior art keywords
extension tube
gas
tube
quartz extension
quartz
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1987095719U
Other languages
Japanese (ja)
Other versions
JPS64328U (en
Inventor
俊二 川上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP1987095719U priority Critical patent/JP2549093Y2/en
Publication of JPS64328U publication Critical patent/JPS64328U/ja
Application granted granted Critical
Publication of JP2549093Y2 publication Critical patent/JP2549093Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【考案の詳細な説明】 産業上の利用分野 この考案は、半導体製造装置に関するもので、更に述
べると、熱処理後のウエハを冷却したり、又は、該ウエ
ハの酸化を防止するために用いる石英延長管(エレファ
ントチューブとも称する)に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus, and more particularly, to a quartz extension used to cool a wafer after heat treatment or to prevent oxidation of the wafer. It relates to a tube (also called an elephant tube).

従来の技術 反応室1内で熱処理されたウエハWは、第4図に示す
ように、ポート2に乗せられ、N2ガスの注入されている
石英延長管3内に搬送される。
2. Description of the Related Art As shown in FIG. 4, a wafer W heat-treated in a reaction chamber 1 is loaded on a port 2 and transferred into a quartz extension tube 3 into which N2 gas is injected.

そして、そこでウエハを冷却した後、シャッタ4を開
けて、ポート2をクリーンベンチ(図示せず)に搬送す
る。
Then, after cooling the wafer there, the shutter 4 is opened and the port 2 is transported to a clean bench (not shown).

考案が解決しようとする問題点 従来例の石英延長管3は、1個の供給口5からガスを
供給しているので、ガスは、第4図、第5図に示すよう
に矢印A1方向に流れ、壁部3aに直接衝突して矢印A2方向
に巻き上がり、石英延長管内のガス流を乱す。
Problems to be Solved by the Invention Since the conventional quartz extension tube 3 supplies gas from one supply port 5, the gas flows in the direction of arrow A1 as shown in FIGS. The flow collides directly with the wall 3a and rolls up in the direction of arrow A2, disturbing the gas flow in the quartz extension tube.

そのため、反応生成物が、石英延長管の底部に堆積
し、ウエハの嫌うゴミが発生する。その上、石英延長管
の内壁部分は、ガスの流れが無い状態となるので、該管
開口部3bとシャッタ4との隙間から空気を巻き込む現象
が生じる。
As a result, the reaction product accumulates on the bottom of the quartz extension tube, generating dust that the wafer dislikes. In addition, since there is no gas flow in the inner wall portion of the quartz extension tube, a phenomenon occurs in which air is drawn in from the gap between the tube opening 3b and the shutter 4.

そのため、石英延長管内のウエハWが酸化してしま
う。
Therefore, the wafer W in the quartz extension tube is oxidized.

又、反応室内を流れるN2ガスが、石英延長管3内を流
れるときには、その先端部が第4図の一点鎖線に示す様
な半楕円状の流形となるので、壁部3a側が中央部側に比
し、N2ガス量が少なく酸素が多くなる。
When the N2 gas flowing through the reaction chamber flows through the inside of the quartz extension tube 3, the tip of the N2 gas has a semi-elliptical flow shape as shown by the one-dot chain line in FIG. As compared with, the amount of N2 gas is small and the amount of oxygen is large.

従って、石英延長管内のN2ガス濃度は不均一となるの
で、該管外に排出されるガスも不均一となる。
Therefore, since the N2 gas concentration in the quartz extension tube becomes non-uniform, the gas discharged outside the tube also becomes non-uniform.

この考案は、上記実情に鑑み、石英延長管内のガス流
の乱れを防止すると共に、ガス濃度の均一化を図ること
を目的とする。
The present invention has been made in view of the above circumstances, and aims at preventing gas flow in a quartz extension tube from being disturbed and attaining uniform gas concentration.

問題点を解決するための手段 この考案は、一端に反応管を接続し、他端にシャッタ
を設けた石英延長管において;該石英延長管に軸方向に
間隔をおいて複数の冷却用ガス供給手段が互いに独立に
配設され、前記冷却用ガス供給手段が、該石英延長管の
壁部に該管の軸心に対して垂直に設けられ、かつ、同一
円周上に間隔をあけて設けた複数の吹き出し穴と、該石
英延長管の外周面に設けられ、かつ、前記吹き出し穴と
連通するリング状のガス通路と、からなることを特徴と
する石英延長管、により上記問題点を解決せんとするも
のである。
SUMMARY OF THE INVENTION The present invention is directed to a quartz extension tube having a reaction tube connected to one end and a shutter provided at the other end; a plurality of cooling gas supply units spaced axially from the quartz extension tube. Means are provided independently of each other, and the cooling gas supply means is provided on the wall of the quartz extension tube perpendicular to the axis of the tube, and is provided at intervals on the same circumference. The above problem is solved by a quartz extension tube comprising: a plurality of blowout holes; and a ring-shaped gas passage provided on an outer peripheral surface of the quartz extension tube and communicating with the blowout hole. It is something you want to do.

作用 ガス通路にN2ガスなどの冷却ガスを流すと、該ガスは、
各吹き出し穴から石英延長管の軸心に向って垂直に吹き
出されるので、このガスは、石英延長管の壁部から中央
部に向いシャワー状となって噴出すると共に、該ガスは
該中央部で互いに衝突し合うので、直接壁部に激突する
ことはない。
When a cooling gas such as N2 gas is caused to flow through the working gas passage,
Since the gas is blown vertically from each blowout hole toward the axis of the quartz extension tube, this gas is ejected in a shower shape from the wall of the quartz extension tube toward the center, and the gas is discharged from the center portion of the quartz extension tube. Colliding with each other, so that it does not collide directly with the wall.

実施例 この考案の一実施例を添付図面により説明するが、同
一図面符号は、その名称も機能も同一である。
An embodiment of the present invention will be described with reference to the accompanying drawings, wherein the same reference numerals have the same names and functions.

円筒状の石英延長管(エレファントチューブとも称す
る)10の壁部10aに、間隔をあけて複数の吹き出し穴11
を同一円周上に形成する。
A plurality of blowout holes 11 are provided at intervals on a wall 10a of a cylindrical quartz extension tube (also referred to as an elephant tube) 10.
Are formed on the same circumference.

この吹き出し穴11は、夫々同径であり、該チューブ10
の軸心に対し垂直に形成されている。
The blowout holes 11 have the same diameter,
Are formed perpendicularly to the axis of.

石英延長管10の外周面10aに、ガス導入用リング12を
巻いて溶接し、前記吹き出し穴1と連通するガス通路13
を形成する。
A gas introduction ring 12 is wound around the outer peripheral surface 10a of the quartz extension tube 10 and welded, and a gas passage 13 communicating with the blowout hole 1 is formed.
To form

このガス導入用リング12は、軸方向に間隔をおいて複
数配設されるが、夫々のリング12には、ガス導入ポート
13が設けられている。
A plurality of the gas introduction rings 12 are arranged at intervals in the axial direction, and each ring 12 has a gas introduction port.
13 are provided.

次に、この実施例の作動について説明すると、石英延
長管10の一端に反応管(図示せず)を接続し、他端にシ
ャッタ(図示せず)を設け、該シャッタを閉めて反応管
内のウエハポート(図示せず)を石英延長管10に搬入す
る。
Next, the operation of this embodiment will be described. A reaction tube (not shown) is connected to one end of the quartz extension tube 10, a shutter (not shown) is provided at the other end, and the shutter is closed to close the inside of the reaction tube. A wafer port (not shown) is carried into the quartz extension tube 10.

そして、ガス導入ポート13から冷却用の不活性ガス、
例えば、N2ガスをガス通路13内に注入すると、該ガス
は、矢印A10に示すように、吹き出し穴11から該管10の
中央部に向って吹き出す。
And, an inert gas for cooling from the gas introduction port 13,
For example, when N2 gas is injected into the gas passage 13, the gas blows out from the blowout hole 11 toward the center of the pipe 10 as shown by an arrow A10.

そのため、酸素量の多い該管10の壁部10b側にもN2ガ
スが供給されるので、該管内のガス濃度は均一化され
る。
Therefore, the N2 gas is also supplied to the wall 10b side of the tube 10 having a large amount of oxygen, so that the gas concentration in the tube is made uniform.

又、各吹き出し穴11から噴出されるN2ガスは、所謂シ
ャワー状になりながら噴出されるとともに該延長管の中
央部で互いに衝突し、壁部に直接衝突しないため、従来
例のようにガスの巻き上がりもなくなるので、石英延長
管内のガス流は、乱れることがない。なお、ウエハが充
分冷却された後、シャッタが開かれボートは、クリンベ
ンチ(図示せず)に搬送される。
Further, the N2 gas ejected from each ejection hole 11 is ejected while forming a so-called shower and collides with each other at the central portion of the extension tube, and does not directly collide with the wall portion. Since the curling is also eliminated, the gas flow in the quartz extension tube is not disturbed. After the wafer is sufficiently cooled, the shutter is opened and the boat is transported to a clean bench (not shown).

なお、吹き出し穴11の形状などを変えることによりガ
スの流量や流れ方向を任意に調整してもよい。
Note that the flow rate and the flow direction of the gas may be arbitrarily adjusted by changing the shape of the blowout hole 11 and the like.

考案の効果 この考案は、以上のように構成したので、ガス流路を
流れるガスは、石英延長管の壁部から中央部に向い、シ
ャワー状となって供給される。
Effect of the Invention Since the invention is configured as described above, the gas flowing through the gas flow path is supplied from the wall of the quartz extension tube toward the central portion in the form of a shower.

従って、石英延長管内は、均一なガス濃度となり、該
管開口部に対してガスを均一に流せるので、ガスは該管
外に流れ出るときの不均一さが減少する。
Therefore, the inside of the quartz extension tube has a uniform gas concentration, and the gas can flow uniformly to the opening of the tube, so that non-uniformity of gas flowing out of the tube is reduced.

又、従来例のようにガスの巻き上がり現象が生じない
ので、石英延長管内のガス流が乱されない。従って、反
応生物が石英延長管内に堆積したり、又は、該管内壁部
がガス流の無い状態となって、該管開口部とシャッタと
の隙間から空気を巻き込むこともない。
Further, since the gas is not swirled as in the conventional example, the gas flow in the quartz extension tube is not disturbed. Therefore, the reaction product does not accumulate in the quartz extension tube or the inner wall of the tube has no gas flow, so that air is not entrained from the gap between the tube opening and the shutter.

【図面の簡単な説明】[Brief description of the drawings]

第1図〜第3図は、この考案の実施例を示す図で、第1
図は第3図のI−I線断面図、第2図は第3図のII−II
線断面図、第3図は斜視図、第4図、第5図は従来例を
示す図で、第4図は横断面図、第5図は従来例の縦断面
図である。 10……石英延長管 10a……石英延長管の外周面 10b……石英延長管の壁部 11……吹き出し穴 13……ガス通路
1 to 3 show an embodiment of the present invention.
FIG. 3 is a sectional view taken along the line II of FIG. 3, and FIG.
FIG. 3 is a perspective view, FIG. 4 and FIG. 5 are views showing a conventional example, FIG. 4 is a transverse sectional view, and FIG. 5 is a longitudinal sectional view of the conventional example. 10 ... quartz extension tube 10a ... outer peripheral surface of quartz extension tube 10b ... wall of quartz extension tube 11 ... blow-out hole 13 ... gas passage

Claims (2)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】一端に反応管を接続し、他端にシャッタを
設けた石英延長管において; 該石英延長管に軸方向に間隔をおいて複数の冷却用ガス
供給手段が互いに独立に配設され、 前記冷却用ガス供給手段が、該石英延長管の壁部に該管
の軸心に対して垂直に設けられ、かつ、同一円周上に間
隔をあけて設けた複数の吹き出し穴と、該石英延長管の
外周面に設けられ、かつ、前記吹き出し穴と連通するリ
ング状のガス通路と、からなることを特徴とする石英延
長管。
1. A quartz extension tube having a reaction tube connected to one end and a shutter provided at the other end; a plurality of cooling gas supply means arranged independently of each other at an axial interval on the quartz extension tube. The cooling gas supply means is provided on the wall of the quartz extension tube perpendicular to the axis of the tube, and a plurality of blowing holes provided at intervals on the same circumference, A ring-shaped gas passage provided on an outer peripheral surface of the quartz extension tube and communicating with the blowout hole.
【請求項2】複数の吹き出し穴が、同径であることを特
徴とする実用新案登録請求の範囲第1記載の石英延長
管。
2. A quartz extension tube according to claim 1, wherein the plurality of blowout holes have the same diameter.
JP1987095719U 1987-06-22 1987-06-22 Quartz extension tube Expired - Lifetime JP2549093Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987095719U JP2549093Y2 (en) 1987-06-22 1987-06-22 Quartz extension tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987095719U JP2549093Y2 (en) 1987-06-22 1987-06-22 Quartz extension tube

Publications (2)

Publication Number Publication Date
JPS64328U JPS64328U (en) 1989-01-05
JP2549093Y2 true JP2549093Y2 (en) 1997-09-24

Family

ID=30960602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987095719U Expired - Lifetime JP2549093Y2 (en) 1987-06-22 1987-06-22 Quartz extension tube

Country Status (1)

Country Link
JP (1) JP2549093Y2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6031261Y2 (en) * 1979-04-11 1985-09-18 三菱電機株式会社 gas replacement device
JPS5691418A (en) * 1979-12-25 1981-07-24 Nec Corp Heat treatment device
JPS57211729A (en) * 1981-06-23 1982-12-25 Fujitsu Ltd Furnace for semiconductor heat treatment

Also Published As

Publication number Publication date
JPS64328U (en) 1989-01-05

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