JP2533864Y2 - Single crystal pulling device - Google Patents

Single crystal pulling device

Info

Publication number
JP2533864Y2
JP2533864Y2 JP1994004652U JP465294U JP2533864Y2 JP 2533864 Y2 JP2533864 Y2 JP 2533864Y2 JP 1994004652 U JP1994004652 U JP 1994004652U JP 465294 U JP465294 U JP 465294U JP 2533864 Y2 JP2533864 Y2 JP 2533864Y2
Authority
JP
Japan
Prior art keywords
single crystal
cooling
chamber
pulled
pulling apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1994004652U
Other languages
Japanese (ja)
Other versions
JPH071072U (en
Inventor
一浩 池澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP1994004652U priority Critical patent/JP2533864Y2/en
Publication of JPH071072U publication Critical patent/JPH071072U/en
Application granted granted Critical
Publication of JP2533864Y2 publication Critical patent/JP2533864Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【考案の詳細な説明】[Detailed description of the invention]

【0001】[0001]

【産業上の利用分野】本考案は、チョクラルスキー法に
よってルツボ内の原料融液から単結晶を引上げ成長させ
る単結晶引上装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a single crystal pulling apparatus for growing a single crystal from a raw material melt in a crucible by the Czochralski method.

【0002】[0002]

【従来の技術】従来、この種の単結晶引上装置として
は、例えば、特開昭57−205397号公報、特開昭
61−68389号公報に記載されたものが知られてい
る。これらの単結晶引上装置にあっては、黒鉛サセプタ
に保持された石英ルツボ内にシリコン融液が収容され、
この黒鉛サセプタの周囲にヒータ及び保温筒がそれぞれ
設けられ、かつ上記石英ルツボの上方に、この石英ルツ
ボ内のシリコン融液から引上げられた単結晶を冷却する
冷却手段が設けられており、この冷却手段で引上げ成長
中の単結晶を強制的に冷却することにより、結晶欠陥が
少なく、品質の良好な単結晶を速やかに得るようにして
いる。
2. Description of the Related Art Conventionally, as a single crystal pulling apparatus of this kind, those described in, for example, JP-A-57-205397 and JP-A-61-68389 are known. In these single crystal pulling apparatuses, a silicon melt is contained in a quartz crucible held by a graphite susceptor,
A heater and a heat retaining cylinder are provided around the graphite susceptor, and a cooling means for cooling a single crystal pulled from a silicon melt in the quartz crucible is provided above the quartz crucible. By forcibly cooling the single crystal being pulled and grown by means, a single crystal of good quality with few crystal defects can be obtained quickly.

【0003】[0003]

【考案が解決しようとする課題】ところで、従来の単結
晶引上装置のうち前者のもの(特開昭57−20539
7号)においては、単結晶の周囲に配置する冷却手段の
取付構造については明示されていない。また、後者の単
結晶引上装置(特開昭61−68389号)にあって
は、上記冷却手段が、上記石英ルツボ、黒鉛サセプタ、
ヒータ及び保温筒等を覆う水冷ジャケットの内壁に固定
されているので、引き上げられる単結晶の径の大小によ
り該単結晶と冷却手段との間隔が変化するため、冷却条
件が変わり、冷却効果に相違が生じてしまうという問題
点があった。
The conventional single crystal pulling apparatus is the former (Japanese Patent Laid-Open No. 57-20439).
No. 7) does not disclose the mounting structure of the cooling means arranged around the single crystal. Further, in the latter single crystal pulling apparatus (Japanese Patent Application Laid-Open No. 61-68389), the cooling means comprises the quartz crucible, the graphite susceptor,
Since it is fixed to the inner wall of the water cooling jacket that covers the heater and the heat retaining cylinder, the distance between the single crystal to be pulled and the cooling means changes depending on the diameter of the single crystal to be pulled, so that the cooling condition changes and the cooling effect differs. However, there is a problem that a problem occurs.

【0004】本考案は上記の事情に鑑みてなされたもの
であって、引上げる単結晶の急冷する領域を制限するこ
とができ、かつ引上げる単結晶の径の大きさに応じて適
正な冷却効果を与えることができ、したがって単結晶の
品質を良好に保持できる単結晶引上装置を提供すること
にある。
The present invention has been made in view of the above circumstances, and it is possible to limit a region where a single crystal to be pulled is quenched, and to perform appropriate cooling according to the diameter of the single crystal to be pulled. It is an object of the present invention to provide a single crystal pulling apparatus which can provide an effect and can maintain good quality of a single crystal.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
に、本考案は次の様な単結晶引上装置を採用した。すな
わち、チョクラルスキー法によってルツボ内の原料融液
から単結晶を引上げ成長させる単結晶引上装置におい
て、上記ルツボを収納したチャンバーは上下に複数に分
割可能とされ、該チャンバーのうち下チャンバーの上フ
ランジの上端面に、上記単結晶を囲んだ状態で冷却する
冷却筒が取付部を介して着脱自在に設けられたことを特
徴としている。
In order to solve the above-mentioned problems, the present invention employs the following single crystal pulling apparatus. That is, in a single crystal pulling apparatus that pulls and grows a single crystal from a raw material melt in a crucible by the Czochralski method, the chamber containing the crucible can be divided into a plurality of upper and lower sections, and the lower chamber of the chamber is On the upper end surface of the upper flange, a cooling cylinder that cools the single crystal while surrounding the single crystal is detachably provided via a mounting portion.

【0006】[0006]

【作用】本考案の単結晶引上装置では、ルツボを収納す
るチャンバーを上下に複数に分割可能とし、該チャンバ
ーのうち下チャンバーの上フランジの上端面に、上記単
結晶を囲んだ状態で冷却する冷却筒を取付部を介して着
脱自在に設けたことにより、上記冷却筒は引上げる単結
晶の急冷する領域に合わせて設置され、上記単結晶の急
冷する領域を制限する。また、冷却筒は下チャンバーの
上フランジの上端面に着脱自在であるから、引上げる単
結晶の径の大きさに応じて適正な径の冷却筒を選択配置
し上記単結晶に適正な冷却効果を与える。これより、単
結晶の品質が良好に保持される。
In the single crystal pulling apparatus of the present invention, the chamber for accommodating the crucible can be divided into a plurality of upper and lower chambers, and the upper surface of the upper flange of the lower chamber of the chamber is cooled while surrounding the single crystal. By providing the cooling cylinder to be detachably attached via the mounting portion, the cooling cylinder is set in accordance with the region where the single crystal to be pulled is rapidly cooled, and the region where the single crystal is rapidly cooled is limited. In addition, since the cooling cylinder is detachable on the upper end surface of the upper flange of the lower chamber, a cooling cylinder having an appropriate diameter is selected and arranged according to the diameter of the single crystal to be pulled, and an appropriate cooling effect for the single crystal is obtained. give. Thereby, the quality of the single crystal is favorably maintained.

【0007】[0007]

【実施例】以下、本考案の一実施例の単結晶引上装置に
ついて図面に基づき説明する。図1は、例えば、100
mmの径の単結晶を引き上げる際に用いられる単結晶引
上装置を示す概略構成図であり、図において、1は炉本
体であり、この炉本体1は下チャンバー2、中チャンバ
ー3及び上チャンバー(図示せず)から構成され、それ
ぞれの内部が水冷ジャケット構造とされている。そし
て、上記炉本体1の内部のほぼ中央部には石英ルツボ4
が設けられており、この石英ルツボ4は、黒鉛サセプタ
(図示せず)を介して昇降自在かつ回転自在な下軸5に
取り付けられている。また、上記石英ルツボ4の周囲に
は、上記石英ルツボ4内のシリコン融液6を所定の温度
に加熱・保持するヒータ7が設置され、このヒータ7と
炉本体1との間には保温筒8が配置されている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A single crystal pulling apparatus according to an embodiment of the present invention will be described below with reference to the drawings. FIG. 1 shows, for example, 100
1 is a schematic configuration diagram showing a single crystal pulling apparatus used when pulling a single crystal having a diameter of 1 mm, in which 1 is a furnace body, and the furnace body 1 has a lower chamber 2, a middle chamber 3, and an upper chamber. (Not shown), each of which has a water-cooled jacket structure. A quartz crucible 4 is provided at a substantially central portion inside the furnace body 1.
The quartz crucible 4 is attached to a vertically movable and rotatable lower shaft 5 via a graphite susceptor (not shown). A heater 7 for heating and holding the silicon melt 6 in the quartz crucible 4 at a predetermined temperature is provided around the quartz crucible 4, and a heat insulating cylinder is provided between the heater 7 and the furnace body 1. 8 are arranged.

【0008】上記シリコン融液6から引き上げられる単
結晶9の近傍には、該単結晶9の急冷する領域を制限す
るために、該単結晶9を囲んだ状態で冷却する該単結晶
9より僅かに大径の円筒状の冷却筒10が配置され、該
冷却筒10の上端部には、水平方向外方へ延びる取付部
11が設けられ、該取付部11は下チャンバー2の上フ
ランジ部2aの上端面と中チャンバー3の下フランジ部
3aの下端面とにより挟持された状態で着脱自在に取り
付けられている。そして、上記中チャンバー3及び冷却
筒10の中央部には、単結晶9を保持しつつ引き上げる
ワイヤ12が昇降自在かつ回転自在に吊設されている。
In the vicinity of the single crystal 9 pulled up from the silicon melt 6, in order to limit the region where the single crystal 9 is quenched, the single crystal 9 is slightly cooled in a state surrounding the single crystal 9. A large-diameter cylindrical cooling cylinder 10 is arranged at the upper end of the cooling cylinder 10, and a mounting portion 11 extending outward in the horizontal direction is provided at the upper end portion. And is detachably attached in a state of being sandwiched between the upper end surface of the inner chamber 3 and the lower end surface of the lower flange portion 3a of the middle chamber 3. A wire 12 for holding and pulling up the single crystal 9 is suspended from the middle chamber 3 and the center of the cooling cylinder 10 so as to be able to move up and down and rotate freely.

【0009】上記のように構成された単結晶引上装置を
用いて単結晶を引き上げるには、まず、石英ルツボ4内
にシリコン融液6となるシリコン片(原料)13を収納
し、引き上げようとする単結晶9の径に応じて冷却筒1
0を石英ルツボ4の中央部上方に配置し、該冷却筒10
の上端部に設けられた取付部11を下チャンバー2の上
フランジ部2aの上端面と中チャンバー3の下フランジ
部3aの下端面とにより挟持する。次いで、炉本体1内
の空気をアルゴンガスで充分置換した後に、シリコン片
13をヒータ7により融解してシリコン融液6とし、該
シリコン融液6の温度を単結晶引き上げに適した温度に
保持する。
In order to pull up a single crystal using the single crystal pulling apparatus constructed as described above, first, a silicon piece (raw material) 13 to be a silicon melt 6 is stored in a quartz crucible 4 and pulled up. Cooling cylinder 1 according to the diameter of single crystal 9
0 is placed above the center of the quartz crucible 4 and the cooling cylinder 10
Of the lower chamber 2 and the lower end of the lower flange 3 a of the middle chamber 3. Then, after sufficiently replacing the air in the furnace body 1 with argon gas, the silicon piece 13 is melted by the heater 7 to form a silicon melt 6, and the temperature of the silicon melt 6 is maintained at a temperature suitable for pulling a single crystal. I do.

【0010】次いで、下軸5を所定の回転速度で回転さ
せ、黒鉛サセプタと共に石英ルツボ4を所定の回転速度
で回転させる。この状態において、上方より、ワイヤ1
2の下端にチャックを介して保持されている種結晶を下
降させ、シリコン融液6に浸漬する。そして、ワイヤ1
2を上記石英ルツボ4の回転方向と逆方向に所定の回転
速度で回転させながら上記種結晶を所定の速度で引き上
げることにより、単結晶9を成長させつつ引き上げる。
Next, the lower shaft 5 is rotated at a predetermined rotation speed, and the quartz crucible 4 is rotated at a predetermined rotation speed together with the graphite susceptor. In this state, wire 1
The seed crystal held at the lower end of 2 via a chuck is lowered and immersed in silicon melt 6. And wire 1
The seed crystal is pulled up at a predetermined speed while rotating the crystal 2 at a predetermined rotation speed in a direction opposite to the rotation direction of the quartz crucible 4, thereby pulling up the single crystal 9 while growing it.

【0011】この単結晶引上装置では、炉本体1を下チ
ャンバー2、中チャンバー3及び上チャンバーから構成
し、下チャンバー2の上フランジ2aの上端面に冷却筒
10を取付部11を介して着脱自在に設けたことによ
り、引上げる単結晶9の径及び急冷する領域に合わせて
適正な冷却筒10を選択配置し、上記単結晶9の急冷す
る領域を制限し、適正な冷却効果を与える。これより、
引き上げる単結晶9の品質が良好に保持される。
In this single crystal pulling apparatus, the furnace body 1 is composed of a lower chamber 2, a middle chamber 3 and an upper chamber, and a cooling cylinder 10 is mounted on an upper end surface of an upper flange 2a of the lower chamber 2 via a mounting portion 11. By being detachably provided, an appropriate cooling cylinder 10 is selectively arranged in accordance with the diameter of the single crystal 9 to be pulled and the region to be quenched, restricting the region of the single crystal 9 to be quenched, and giving an appropriate cooling effect. . Than this,
The quality of the single crystal 9 to be pulled is kept good.

【0012】以上説明した様に、この一実施例の単結晶
引上装置によれば、炉本体1を下チャンバー2、中チャ
ンバー3及び上チャンバーから構成し、下チャンバー2
の上フランジ2aの上端面に冷却筒10を取付部11を
介して着脱自在に設けたので、引上げる単結晶9の径及
び該単結晶9の冷却プロファイルの急冷を必要とする領
域に合った冷却筒10を選択配置することができ、上記
単結晶9の急冷する領域を制限し、適正な冷却効果を与
えることができる。したがって、引き上げる単結晶9内
に格子不整や格子欠陥等が発生するのを防止し該単結晶
9の結晶の均一性を向上させることができ、該単結晶9
の品質を容易かつ良好に保持することができる。しか
も、この冷却筒10は短いので、上記単結晶9の急冷を
必要とする領域のみを有効に冷却することができる。
As described above, according to the single crystal pulling apparatus of this embodiment, the furnace main body 1 is composed of the lower chamber 2, the middle chamber 3, and the upper chamber.
Since the cooling cylinder 10 is detachably provided on the upper end surface of the upper flange 2a via the mounting portion 11, the cooling cylinder 10 is adapted to the diameter of the single crystal 9 to be pulled up and the region where the cooling profile of the single crystal 9 requires rapid cooling. The cooling cylinder 10 can be selectively arranged, so that the region where the single crystal 9 is rapidly cooled can be limited, and an appropriate cooling effect can be provided. Therefore, it is possible to prevent lattice irregularities and lattice defects from being generated in the single crystal 9 to be pulled, and to improve the uniformity of the single crystal 9.
Can easily and satisfactorily be maintained. Moreover, since the cooling cylinder 10 is short, only the region where the single crystal 9 needs to be rapidly cooled can be effectively cooled.

【0013】また、取付部11を下チャンバー2の上フ
ランジ部2aの上端面に取り付け及び取り外しするだけ
で、チャンバーの大掛かりな分解を伴うことなく該冷却
筒10の交換を容易に行うことができ、作業効率が向上
する効果がある。
Further, by simply attaching and detaching the mounting portion 11 to and from the upper end surface of the upper flange portion 2a of the lower chamber 2, the cooling cylinder 10 can be easily replaced without major disassembly of the chamber. This has the effect of improving work efficiency.

【0014】[0014]

【考案の効果】以上説明した様に、本考案の単結晶引上
装置によれば、ルツボを収納したチャンバーを上下に複
数に分割可能とし、該チャンバーのうち下チャンバーの
上フランジの上端面に、上記単結晶を囲んだ状態で冷却
する冷却筒を取付部を介して着脱自在に設けたので、引
上げる単結晶の径及び該単結晶の冷却プロファイルの急
冷を必要とする領域に合った冷却筒を選択配置すること
ができ、上記単結晶の急冷する領域を制限し、適正な冷
却効果を与えることができる。したがって、引き上げる
単結晶内に格子不整や格子欠陥等が発生するのを防止し
該単結晶の結晶の均一性を向上させることができ、該単
結晶の品質を容易かつ良好に保持することができる。
As described above, according to the single crystal pulling apparatus of the present invention, the chamber accommodating the crucible can be divided into a plurality of upper and lower portions, and the upper end surface of the upper flange of the lower chamber among the chambers. Since the cooling cylinder for cooling the single crystal in a state surrounding the single crystal is detachably provided through the mounting portion, the cooling is adapted to the diameter of the single crystal to be pulled up and the area which requires rapid cooling of the cooling profile of the single crystal. The tube can be selectively arranged, and the region where the single crystal is rapidly cooled can be limited, and an appropriate cooling effect can be given. Therefore, it is possible to prevent lattice irregularities and lattice defects from being generated in the single crystal to be pulled, to improve the uniformity of the single crystal, and to easily and satisfactorily maintain the quality of the single crystal. .

【0015】また、取付部を下チャンバーの上フランジ
の上端面に取り付け及び取り外しするだけで、チャンバ
ーの大掛かりな分解を伴うことなく該冷却筒の交換を容
易に行うことができ、作業効率が向上する効果がある。
Further, by simply attaching and detaching the mounting portion to and from the upper end surface of the upper flange of the lower chamber, the cooling cylinder can be easily replaced without large-scale disassembly of the chamber, thereby improving work efficiency. Has the effect of doing

【図面の簡単な説明】[Brief description of the drawings]

【図1】本考案の一実施例の単結晶引上装置を示す概略
構成図である。
FIG. 1 is a schematic configuration diagram showing a single crystal pulling apparatus according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

2 下チャンバー 2a 上フランジ部 3 中チャンバー 3a 下フランジ部 4 石英ルツボ 6 シリコン融液 9 単結晶 10 冷却筒 11 取付部 2 Lower chamber 2a Upper flange part 3 Middle chamber 3a Lower flange part 4 Quartz crucible 6 Silicon melt 9 Single crystal 10 Cooling cylinder 11 Mounting part

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】 チョクラルスキー法によってルツボ内の
原料融液から単結晶を引上げ成長させる単結晶引上装置
において、上記ルツボを収納したチャンバーは上下に複
数に分割可能とされ、該チャンバーのうち下チャンバー
の上フランジの上端面に、上記単結晶を囲んだ状態で冷
却する冷却筒が取付部を介して着脱自在に設けられたこ
とを特徴とする単結晶引上装置。
In a single crystal pulling apparatus for pulling and growing a single crystal from a raw material melt in a crucible by the Czochralski method, a chamber accommodating the crucible can be vertically divided into a plurality of chambers. A single crystal pulling apparatus, wherein a cooling cylinder for cooling the single crystal in a state surrounding the single crystal is detachably provided on an upper end surface of an upper flange of the lower chamber via a mounting portion.
JP1994004652U 1994-04-28 1994-04-28 Single crystal pulling device Expired - Lifetime JP2533864Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1994004652U JP2533864Y2 (en) 1994-04-28 1994-04-28 Single crystal pulling device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1994004652U JP2533864Y2 (en) 1994-04-28 1994-04-28 Single crystal pulling device

Publications (2)

Publication Number Publication Date
JPH071072U JPH071072U (en) 1995-01-10
JP2533864Y2 true JP2533864Y2 (en) 1997-04-23

Family

ID=18527007

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1994004652U Expired - Lifetime JP2533864Y2 (en) 1994-04-28 1994-04-28 Single crystal pulling device

Country Status (1)

Country Link
JP (1) JP2533864Y2 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51114254A (en) * 1974-05-20 1976-10-07 Satake Eng Co Ltd Separator of unhusked rice and unpolished rice of shaking type
JPS5567597A (en) * 1978-11-09 1980-05-21 Chiyou Lsi Gijutsu Kenkyu Kumiai Single crystal rod producing device
JPS5750759A (en) * 1980-09-10 1982-03-25 Hitachi Ltd Charged particle irradiator
JPS6296389A (en) * 1985-10-18 1987-05-02 Mitsubishi Metal Corp Apparatus for production of single crystal
JPS62138385A (en) * 1985-12-11 1987-06-22 Shin Etsu Handotai Co Ltd Device for pulling semiconductor single crystal

Also Published As

Publication number Publication date
JPH071072U (en) 1995-01-10

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