JP2532244B2 - Method of manufacturing offset printing plates - Google Patents

Method of manufacturing offset printing plates

Info

Publication number
JP2532244B2
JP2532244B2 JP62118865A JP11886587A JP2532244B2 JP 2532244 B2 JP2532244 B2 JP 2532244B2 JP 62118865 A JP62118865 A JP 62118865A JP 11886587 A JP11886587 A JP 11886587A JP 2532244 B2 JP2532244 B2 JP 2532244B2
Authority
JP
Japan
Prior art keywords
offset printing
film
sulfonation
printing plates
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62118865A
Other languages
Japanese (ja)
Other versions
JPS63283989A (en
Inventor
穣二 井畑
泰樹 島村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP62118865A priority Critical patent/JP2532244B2/en
Priority to US07/171,590 priority patent/US4965322A/en
Priority to GB8807174A priority patent/GB2203438B/en
Priority to FR8804180A priority patent/FR2613498B1/en
Priority to DE3811423A priority patent/DE3811423A1/en
Priority to IT20096/88A priority patent/IT1217392B/en
Priority to FR8811914A priority patent/FR2619227B1/en
Publication of JPS63283989A publication Critical patent/JPS63283989A/en
Priority to US07/554,751 priority patent/US5025266A/en
Priority to US07/679,408 priority patent/US5187047A/en
Application granted granted Critical
Publication of JP2532244B2 publication Critical patent/JP2532244B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は感光性及び感熱性の改良されたオフセット印
刷用版材の製法に関するものである。さらに詳しく言え
ば、極めて低出力の可視及び近赤外領域のレーザー光に
もよく感応し、現像および定着処理を必要としないオフ
セット印刷用版材の製法に関するものである。
The present invention relates to a method for producing an offset printing plate material having improved photosensitivity and heat sensitivity. More specifically, the present invention relates to a method for manufacturing an offset printing plate material that is sensitive to laser light in an extremely low output visible and near-infrared region and does not require development and fixing processes.

〔従来の技術〕[Conventional technology]

従来、オフセット印刷に用いられる印刷版を得る方法
には、(1)所謂PS版法、(2)シルバーマスター方式
に代表される銀塩写真法、(3)エレクトロファックス
方式に代表される電子写真法等が開発され、商品化され
ている。
Conventionally, as a method for obtaining a printing plate used for offset printing, (1) a so-called PS plate method, (2) a silver salt photography method represented by a silver master method, and (3) an electrophotography represented by an electrofax method Laws have been developed and commercialized.

しかしながら、これらの方法は、露光により潜像を形
成し現像、定着処理を行った後、印刷版を得るため製版
工程が繁雑である他、製版機自体が大きくなり、且つ、
現像液の取り扱いに手を汚す等の問題点があった。
However, in these methods, after a latent image is formed by exposure, development, and fixing are performed, the plate making process for obtaining a printing plate is complicated, and the plate making machine itself becomes large, and
There was a problem that the handling of the developer became dirty.

そこで、本発明者らは上記問題点を解決すべく鋭意研
究を重ねた結果、現像、定着等の処理工程の不要なオフ
セット印刷版の製造方法を発明し、先に特許出願した
(特開昭60-102632号、特開昭60-132760号参照)。
Therefore, as a result of intensive studies to solve the above problems, the present inventors invented a method for producing an offset printing plate that does not require processing steps such as development and fixing, and applied for a patent in advance (Japanese Patent Laid-Open Publication No. Sho. 60-102632, JP-A-60-132760).

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

しかし、それらの印刷用版材でも、高エネルギー密度
の光エネルギーを必要としたため、実用的には、例えば
数百ワットのキセノンフラッシュランプまたは数ワット
以上の出力を有するレーザー発振機を装着しなければな
らないと言う改善すべき点があった。
However, even those printing plates require high energy density of light energy, so practically, for example, a xenon flash lamp of several hundred watts or a laser oscillator having an output of several watts or more must be installed. There was a point to be improved.

本発明は、親水性スルホン酸基を有する先のオフセッ
ト印刷用版材の製版性、特に感度を大幅に改良するもの
であり、出力数ミリワットの可視及び近赤外領域のレー
ザー光にもよく感応し、しかも現像定着処理を必要とし
ない、低出力レーザー光を用いた高速のオフセット印刷
版製造法を具現化することを目的としている。
INDUSTRIAL APPLICABILITY The present invention is to significantly improve the plate making property, particularly the sensitivity, of the above-mentioned plate material for offset printing having a hydrophilic sulfonic acid group, and is well sensitive to laser light in the visible and near infrared region with an output of several milliwatts. Moreover, it is an object of the present invention to realize a high-speed offset printing plate manufacturing method using a low-power laser beam, which does not require developing and fixing processing.

〔問題点を解決するための手段〕[Means for solving problems]

すなわち、本発明はポリアルキレンハライドを含有す
るフイルムの表面を、あらかじめ塩基で処理した後、ス
ルホン化することを特徴とするオフセット印刷用版材の
製法を提供するものである。
That is, the present invention provides a method for producing an offset printing plate material, which comprises treating the surface of a film containing a polyalkylene halide with a base in advance and then sulfonation.

本発明で使用されるポリアルキレンハライドとは、例
えば塩化ビニル、塩化ビニリデン、フッ化ビニル、フッ
化ビニリデン、三フッ化プロピレン、六フッ化プロピレ
ン、臭化ビニル等のアルキレンハライドの中から選ばれ
た一種または二種以上の単量体を重合又は共重合する
か、他の単量体、例えばエチレン、プロピレン、ブテン
−1、ヘキセン−1等の少なくとも一種と共重合するこ
とにより得られたものを主材とするものである。
The polyalkylene halide used in the present invention is selected from alkylene halides such as vinyl chloride, vinylidene chloride, vinyl fluoride, vinylidene fluoride, propylene trifluoride, propylene hexafluoride and vinyl bromide. Polymerization or copolymerization of one or two or more monomers, or those obtained by copolymerizing with at least one of other monomers such as ethylene, propylene, butene-1, and hexene-1 It is the main material.

塩基とは、例えば5〜40%の高濃度の苛性ソーダ、苛
性カリ等の無機塩基、トリエチルアミン、トリ−n−プ
ロピルアミン、トリ−n−ブチルアミン等の三級アミン
のほか、トリメチルベンジルアンモニウムヒドロキシド
等を水、メタノール、エタノール、ジメチルホルムアミ
ド等の極性の溶剤に溶解したものを使用する。使用され
る高分子化合物の種類によって処理条件は異なるが、一
般に処理時間が長くなるにつれてフィルムが着色してく
るから、少なくとも淡褐色を呈しているときを目安にす
る。
Examples of the base include high-concentration caustic soda of 5 to 40%, inorganic base such as caustic potash, tertiary amines such as triethylamine, tri-n-propylamine and tri-n-butylamine, and trimethylbenzylammonium hydroxide. Use the one dissolved in a polar solvent such as water, methanol, ethanol or dimethylformamide. The processing conditions vary depending on the type of polymer compound used, but generally the film becomes colored as the processing time becomes longer, so at least a light brown color is used as a guide.

前記の処理を受けたフィルムを十分に水洗し、風乾す
る。これらのフィルムの可視吸収スペクトルは、反射法
を用いて測定することができるが、同法において450nm
以上の波長の所に強い吸収を持っていることが好まし
い。、400nm以下の所に強い吸収を持つフィルムをさら
にスルホン化した場合には、版材として画像を形成する
ときの感度が低いため除かれる。
The film subjected to the above treatment is thoroughly washed with water and dried in air. The visible absorption spectra of these films can be measured using the reflection method, which uses 450 nm.
It is preferable to have strong absorption at the above wavelengths. When a film having a strong absorption at a wavelength of 400 nm or less is further sulfonated, it is excluded because the sensitivity when forming an image as a plate material is low.

これらのフィルムを他の基材、例えば紙、ガラスクロ
ス、ガラスペーパー、アルミニウム板等と貼り合わせ複
合材として用いてもよい。
These films may be laminated with other base materials such as paper, glass cloth, glass paper, and aluminum plates to be used as a composite material.

スルホン化の方法については特に制限はなく、例えば
所定の処理を終えた前記フィルムを発煙硫酸中に浸漬し
てもよいし、また無水硫酸をそのままか、あるいはクロ
ロホルム、四塩化炭素、二塩化エチレン等の無水硫酸に
対して比較的活性の少ない有機溶剤で希釈して用いても
良い。また、無水硫酸をジメチルホルムアミド、または
ジオキサン等との付加物としてスルホン化してもよい。
The sulfonation method is not particularly limited, and for example, the above-mentioned film which has been subjected to a predetermined treatment may be immersed in fuming sulfuric acid, or sulfuric acid anhydride as it is, or chloroform, carbon tetrachloride, ethylene dichloride, etc. It may be used after diluting it with an organic solvent having a relatively low activity with respect to sulfuric anhydride. Further, sulfuric acid anhydride may be sulfonated as an adduct with dimethylformamide, dioxane or the like.

スルホン化の条件は使用される高分子の種類、処理の
程度によって異なるが、スルホン化量が交換当量にして
5×10-5〜1×10-1ミリ当量/cm2であって、液適法に
よる水の接触角が40度以下、好ましくは30度以下である
ようにする。
The sulfonation conditions vary depending on the type of polymer used and the degree of treatment, but the sulfonation amount is 5 × 10 -5 to 1 × 10 -1 meq / cm 2 in terms of exchange equivalent, The contact angle of water with water is 40 degrees or less, preferably 30 degrees or less.

スルホン化度が5×10-5ミリ当量/cm2以下の場合に
は接触角が40度以上となるため好ましくない。
When the degree of sulfonation is 5 × 10 −5 meq / cm 2 or less, the contact angle becomes 40 ° or more, which is not preferable.

一方スルホン化量が1×10-1ミリ当量/cm2以上では
接触角は5度以下であり版材としての性能は特に問題は
ないが、経済的には好ましくないため除かれる。
On the other hand, when the sulfonation amount is 1 × 10 -1 meq / cm 2 or more, the contact angle is 5 degrees or less, and there is no particular problem with the performance as a plate material, but it is economically unfavorable and is therefore excluded.

尚、スルホン化量は次のようにして求める。すなわ
ち、表面をスルホン化したフィルム(表面積Mcm2)を
1規定の塩化カルシウム水溶液に浸漬して平衡状態と
し、その水溶液中に生じた塩化水素を、0.1規定の水酸
化ナトリウム水溶液(力価:f)で滴定して、指示薬フェ
ノールフタレインによる中和値(Xcc)を求め、次式で
算出する。
The sulfonation amount is obtained as follows. That is, a film whose surface is sulfonated (surface area Mcm 2 ) is immersed in a 1N calcium chloride aqueous solution to reach an equilibrium state, and hydrogen chloride generated in the aqueous solution is dissolved in a 0.1N sodium hydroxide aqueous solution (titer: f ), The neutralization value (Xcc) with the indicator phenolphthalein is obtained, and calculated by the following formula.

スルホン化量(ミリ当量/cm2)=(0.1×f×x)/M 〔実施例〕 以下実施例で本発明を具体的に説明するが、本発明は
これらに限定されるものではない。
Amount of sulfonation (milliequivalent / cm 2 ) = (0.1 × f × x) / M [Examples] The present invention will be specifically described below with reference to Examples, but the present invention is not limited thereto.

実施例1 市販されているポリ塩化ビニルフィルム(住友ベーク
ライト社製;スミライトVSS、吸水率0.1%以下)をステ
ンレス枠に保持し、40%苛性ソーダ水溶液中において80
℃で4時間加熱処理を行い褐色のフィルムを得た後、水
洗して60℃に設置された減圧乾燥器内で3時間乾燥を行
った。次に無水硫酸ガスの導入管を装着した4ッ口セパ
ラブルフラスコの中に、前記の苛性ソーダで処理された
ポリ塩化ビニルフィルムを保持したステンレス枠をセッ
トし、窒素ガスでフラスコ内部を冷却し内温0〜5℃に
保ちながら水銀柱350mmまで減圧した後、排気管を閉じ
て無水硫酸を水銀柱450mmに達するまで導入して、その
まま10分間保持し、スルホン化反応を行った。反応終了
後、該ステンレス枠を取り出し水洗した後、暗所で風乾
した。
Example 1 A commercially available polyvinyl chloride film (manufactured by Sumitomo Bakelite Co., Ltd .; Sumilite VSS, water absorption rate of 0.1% or less) was held in a stainless steel frame, and then put in a 40% caustic soda aqueous solution.
After heat treatment at 4 ° C for 4 hours to obtain a brown film, the film was washed with water and dried for 3 hours in a vacuum dryer installed at 60 ° C. Next, in a 4-neck separable flask equipped with an anhydrous sulfuric acid gas inlet tube, set the stainless steel frame holding the polyvinyl chloride film treated with caustic soda, cool the inside of the flask with nitrogen gas, and After reducing the pressure to 350 mm of mercury column while maintaining the temperature at 0 to 5 ° C., the exhaust pipe was closed and sulfuric acid anhydride was introduced until the column reached 450 mm of mercury column, and the mixture was kept for 10 minutes to carry out the sulfonation reaction. After completion of the reaction, the stainless steel frame was taken out, washed with water, and then air-dried in a dark place.

該フィルムのスルホン化量は4.1×10-3ミリ当量/cm2
であり、赤外吸収スペクトルに於て500nm付近に幅広く
強いバンドを示した。このフィルム表面の接触角を水液
適法により測定したところ10度以下であった。
The sulfonation amount of the film was 4.1 × 10 −3 meq / cm 2.
In the infrared absorption spectrum, a broad and strong band was shown near 500 nm. The contact angle on the surface of the film was measured by a water-liquid method, and it was 10 degrees or less.

このようにして得られたフィルムを回転ロールに貼り
付け、ロールの回転速度を15m/secに設定して、ヘリウ
ム・ネオンレーザ(NEC社製:GLG5400、出力10mw)のビ
ーム径を20μに集光して走査した。
The film thus obtained was attached to a rotating roll, the rotation speed of the roll was set to 15 m / sec, and the beam diameter of the helium-neon laser (NEC: GLG5400, output 10 mw) was focused to 20 μ. And scanned.

このようにして作製した版をオフセット印刷機(デュ
プロ社製:DP-3100)に取り付けて印刷を行ったところ線
巾約21μの鮮明な画線を得た。
The plate thus produced was attached to an offset printing machine (DP-3100 manufactured by Duplo Co., Ltd.) for printing, and a clear image line having a line width of about 21 μ was obtained.

実施例2 市販されているフッ素樹脂のフィルム(日東電気工業
社製;No.450)をトリメチルベンジルアンモニウムヒド
ロキシドの40%メタノール溶液中、60℃にて1時間処理
を行った後、水洗し、風乾した。次いで20%発煙硫酸中
にて2時間スルホン化処理を行った。更に水洗し、1規
定苛性ソーダを用いて中和した後、暗所にて風乾した。
Example 2 A commercially available fluororesin film (manufactured by Nitto Denki Kogyo; No. 450) was treated in a 40% methanol solution of trimethylbenzylammonium hydroxide at 60 ° C. for 1 hour and then washed with water, Air dried. Then, sulfonation treatment was performed in 20% fuming sulfuric acid for 2 hours. After further washing with water, neutralization with 1N caustic soda, and air drying in a dark place.

かくして得られたフィルムの吸収スペクトルは550nm
付近に幅広いバンドを示した。
The absorption spectrum of the film thus obtained is 550 nm.
A wide band was shown in the vicinity.

スルホン化量は2.6×10-3ミリ当量/cm2であり、水の接
触角は5度以下であった。
The sulfonation amount was 2.6 × 10 −3 meq / cm 2 , and the contact angle with water was 5 ° or less.

このフィルムを回転ロールに貼り付け、15m/secの速
度で回転させながら、半導体レーザ(シャープ社製:LT0
27MD/MF,出力10mw)を光学レンズを用いて20μの径に集
光して走査した。
Attach this film to a rotating roll and rotate it at a speed of 15 m / sec while using a semiconductor laser (LT0
27MD / MF, output 10mw) was focused and scanned to a diameter of 20μ using an optical lens.

このようにして製版されたものをオフセット印刷機に
セットして印刷を行ったところ22μの鮮明な画線を得
た。
When the plate thus prepared was set in an offset printing machine and printing was performed, a clear image line of 22μ was obtained.

〔発明の効果〕 本発明の方法により製造されたオフセット印刷用版材
は、出力が数ミリワットのレーザー光であって可視また
は、及び近赤外領域にも感応するため、例えば出力数ミ
リワットのHe-Neレーザ、または半導体レーザを用いて
画像形成を行うことにより、極めて短時間に高解像のオ
フセット印刷版を製造することができる。
(Effect of the invention) The plate material for offset printing produced by the method of the present invention is a laser beam having an output of several milliwatts and is sensitive to visible or near-infrared region. -By forming an image using a Ne laser or a semiconductor laser, a high resolution offset printing plate can be manufactured in an extremely short time.

更に本発明によって製造される印刷用版材は極めて低
出力のレーザ光を用いて高速で画像形成を行うことがで
きるため、コンピュータの打ち出し部に応用することが
可能となり、ネガフィルムを必要としないで直接製版に
より高品位な文字の印刷物の得られる簡便な自動製版・
印刷システムを提供することを可能とした。
Further, since the printing plate material manufactured by the present invention can form an image at high speed by using a laser beam having an extremely low output, it can be applied to a punching portion of a computer and does not require a negative film. A simple automatic plate-making process that allows you to obtain high-quality printed matter directly by plate-making.
It is possible to provide a printing system.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】ポリアルキレンハライドを含有するフイル
ムの表面を、あらかじめ塩基で処理した後スルホン化す
ることを特徴とするオフセット印刷用版材の製法。
1. A method for producing an offset printing plate material, which comprises subjecting a surface of a film containing a polyalkylene halide to a treatment with a base in advance and then sulfonation.
JP62118865A 1987-04-06 1987-05-18 Method of manufacturing offset printing plates Expired - Fee Related JP2532244B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP62118865A JP2532244B2 (en) 1987-05-18 1987-05-18 Method of manufacturing offset printing plates
US07/171,590 US4965322A (en) 1987-04-06 1988-03-22 Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
GB8807174A GB2203438B (en) 1987-04-06 1988-03-25 Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
FR8804180A FR2613498B1 (en) 1987-04-06 1988-03-30 LIGHT AND HEAT SENSITIVE POLYMERS, PROCESS FOR PREPARING THE SAME, AND INFORMATION RECORDING METHOD USING THE SAME
DE3811423A DE3811423A1 (en) 1987-04-06 1988-04-05 LIGHT SENSITIVE AND HEAT SENSITIVE POLYMERS, METHODS FOR THEIR PRODUCTION AND THEIR USE IN RECORDING METHODS
IT20096/88A IT1217392B (en) 1987-04-06 1988-04-05 PHOTOSENSITIVE AND THERMOSENSITIVE POLYMERS, PROCESS TO PRODUCE THEM AND PROCESS TO REGISTER INFORMATION WITH THE USE OF THE SAME
FR8811914A FR2619227B1 (en) 1987-04-06 1988-09-13 LIGHT AND HEAT SENSITIVE POLYMERS, THEIR PREPARATION METHOD AND INFORMATION RECORDING METHOD USING THEM.
US07/554,751 US5025266A (en) 1987-04-06 1990-07-20 Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
US07/679,408 US5187047A (en) 1987-04-06 1991-04-02 Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62118865A JP2532244B2 (en) 1987-05-18 1987-05-18 Method of manufacturing offset printing plates

Publications (2)

Publication Number Publication Date
JPS63283989A JPS63283989A (en) 1988-11-21
JP2532244B2 true JP2532244B2 (en) 1996-09-11

Family

ID=14747041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62118865A Expired - Fee Related JP2532244B2 (en) 1987-04-06 1987-05-18 Method of manufacturing offset printing plates

Country Status (1)

Country Link
JP (1) JP2532244B2 (en)

Also Published As

Publication number Publication date
JPS63283989A (en) 1988-11-21

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