JP2523910B2 - Electronic beam drawing method - Google Patents
Electronic beam drawing methodInfo
- Publication number
- JP2523910B2 JP2523910B2 JP1327936A JP32793689A JP2523910B2 JP 2523910 B2 JP2523910 B2 JP 2523910B2 JP 1327936 A JP1327936 A JP 1327936A JP 32793689 A JP32793689 A JP 32793689A JP 2523910 B2 JP2523910 B2 JP 2523910B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- movement
- drawn
- repeated
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Electron Beam Exposure (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は電子ビーム描画方法に関するものである。The present invention relates to an electron beam writing method.
従来の技術 電子ビーム描画方法には、試料台の移動の仕方から、
ステップ・アンド・リピート方法と、連続移動方法の2
種類がある。In the conventional electron beam writing method, the method of moving the sample table
Step-and-repeat method and continuous movement method 2
There are types.
ステップ・アンド・リピート方式は、例えばX方向に
ステップ移動を繰り返しながら描画領域をつないでゆ
き、試料端部でY方向に1回ステップ移動し、続いて−
X方向にステップ移動を繰り返してゆく。そして試料端
部に達するとY方向に1回ステップ移動を行なう。以上
の動作を繰り返して、試料全面を描画する。In the step-and-repeat method, for example, the drawing areas are connected while repeating the step movement in the X direction, the step ends are moved once in the Y direction at the end of the sample, and then −
Repeat the step movement in the X direction. When it reaches the end of the sample, it moves once in the Y direction. The above operation is repeated to draw the entire surface of the sample.
連続移動方式は、例えばX方向に試料台を連続移動し
ながら一定幅のストライプ状の領域を描画し、試料端部
まで来ると、Y方向にステップ移動を行なう。続いて、
−X方向に連続移動してゆく。以上の動作を繰り返して
試料全面を描画する。In the continuous movement method, for example, a striped area having a constant width is drawn while continuously moving the sample table in the X direction, and when the sample edge is reached, step movement is performed in the Y direction. continue,
-Move continuously in the X direction. The above operation is repeated to draw the entire surface of the sample.
いずれの方式においても、全体的な描画の動作は、試
料をX方向に長いストライプ状の領域に分割し、この領
域をつないで全描画を行なう。In either method, the entire writing operation divides the sample into striped regions that are long in the X direction and connects these regions to perform the entire writing.
描画精度を高める上で、両描画方式ともに、試料台の
ステップ移動に伴う精度劣化を防ぐことが重要になる。
この観点から、ステップ移動量をストライプ幅より小さ
くすることによりストライプを重畳させ、多重描画させ
ることで高精度化を図った試みが提案されている。In order to improve the drawing accuracy, it is important to prevent the accuracy deterioration due to the step movement of the sample table in both drawing methods.
From this point of view, an attempt has been proposed in which the step movement amount is made smaller than the stripe width so that the stripes are overlapped and multiple writing is performed to improve the accuracy.
発明が解決しようとする課題 このような従来の電子ビーム描画方法では、X方向の
描画が時間的に連続しているのに対し、Y方向の描画は
必ずしも連続しておらず、試料と試料台との位置ずれの
発生や、描画中の試料温度変化による膨張など種々な誤
差要因がY方向の繋ぎ部に発生するため、ストライプ状
描画領域の重畳回数を増さなければ精度向上は難しく、
このため描画時間が著しく長くなり、スループットが低
下するという問題があった。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In such a conventional electron beam drawing method, drawing in the X direction is continuous in time, whereas drawing in the Y direction is not necessarily continuous, and the sample and the sample table are not necessarily continuous. Since various error factors such as the occurrence of a positional deviation with and the expansion due to the change in the sample temperature during drawing occur in the connecting portion in the Y direction, it is difficult to improve the accuracy unless the number of overlapping stripe-shaped drawing regions is increased.
Therefore, there is a problem that the drawing time becomes extremely long and the throughput decreases.
課題を解決するための手段 このような課題を解決するために、本発明の電子ビー
ム描画方法は、一方向または逆方向に試料が連続に移動
するまたはステップ移動を繰り返す第1の試料移動と前
記試料の端部で前記第1の試料移動の方向と直交する方
向にステップ移動する第2の試料移動とを繰り返して前
記試料の全面を描画する第1の描画と、前記第1の試料
移動と直交する方向に連続に移動するまたはステップ移
動を繰り返す第3の試料移動と前記試料の端部で前記第
3の試料移動の方向と直交する方向にステップ移動する
第4の試料移動とを繰り返して前記試料の全面を描画す
る第2の描画とを重畳するものである。Means for Solving the Problems In order to solve the above problems, the electron beam drawing method of the present invention includes a first sample movement in which a sample continuously moves in one direction or an opposite direction or step movement is repeated, and A first drawing in which the entire surface of the sample is drawn by repeating a second sample moving in which a step moves in a direction orthogonal to the first sample moving direction at the end of the sample; and the first sample moving, The third sample movement which moves continuously in the orthogonal direction or repeats the step movement and the fourth sample movement which moves stepwise in the direction orthogonal to the direction of the third sample movement at the end of the sample are repeated. The second drawing for drawing the entire surface of the sample is overlapped.
作用 この方法によって、Y方向の描画にも時間的連続性を
持たせることができ、少ない重畳回数で高精度な描画を
実現できる。By this method, drawing in the Y direction can be provided with temporal continuity, and highly accurate drawing can be realized with a small number of superimpositions.
実施例 第1図(a),(b)は本発明の電子ビーム描画方法
の一実施例を説明するための描画パターン図である。Embodiments FIGS. 1A and 1B are drawing pattern diagrams for explaining an embodiment of an electron beam drawing method of the present invention.
この実施例では、試料移動方式は連続移動方式、重畳
回数はX方向,Y方向各1回ずつで合計2回としている。
第1図(a),(b)の各図において、1は試料、2,3
は描画パターン、4〜9はストライプ状の描画領域であ
る。In this embodiment, the sample moving method is a continuous moving method, and the number of times of superposition is once in the X direction and once in the Y direction for a total of two.
In each of FIGS. 1 (a) and 1 (b), 1 is a sample and 2, 3
Is a drawing pattern, and 4 to 9 are stripe-shaped drawing areas.
第1描画は、第1図(a)のように、Y方向のストラ
イプ状の描画領域をつなぎ合わせて行なう。すなわち、
ストライプ4を−Y方向(矢印B1)に試料を移動しなが
らパターン2などを描画する。試料端まで達するとX方
向(矢印A1)にステップ移動を行ない、続いてY方向
(矢印B2)に試料を連続移動を行ないながらストライプ
5の描画を行なう。以下同様の動作を繰り返して試料全
面を描画する。The first drawing is performed by connecting stripe-shaped drawing regions in the Y direction, as shown in FIG. That is,
The pattern 2 and the like are drawn while moving the sample on the stripe 4 in the -Y direction (arrow B 1 ). When reaching the sample end, the stripe 5 is drawn while stepwise moving in the X direction (arrow A 1 ) and then continuously moving the sample in the Y direction (arrow B 2 ). Thereafter, the same operation is repeated to draw the entire surface of the sample.
第2描画は、第1図(b)のように、X方向のストラ
イプ状の描画領域をつなぎ合わせて行なう。すなわち、
試料の移動は、矢印D1,C1,D2,C2,D3のように、第1描画
とX,Yを入れ替えた動きをする。そうして試料全面を描
画する。The second drawing is performed by connecting stripe-shaped drawing regions in the X direction as shown in FIG. 1 (b). That is,
The movement of the sample is such that the first drawing and the X and Y are exchanged as indicated by arrows D 1 , C 1 , D 2 , C 2 , and D 3 . Then, the entire surface of the sample is drawn.
各描画は、使用する電子ビームレジストの最適露光量
の1/2の露光量で行なわれる。従って解像するパターン
は各描画の重なった部分となり、位置精度の高いものと
なる。その様子を第2図を用いて説明する。Each drawing is performed with an exposure amount that is half the optimum exposure amount of the electron beam resist used. Therefore, the pattern to be resolved becomes an overlapping portion of each drawing, and the position accuracy is high. This will be described with reference to FIG.
第2図において、11a〜14aは第1描画により描画され
たパターン、11b〜14bは第2描画により描画されたパタ
ーン、11c〜14cは解像するパターンを表わす。In FIG. 2, 11a to 14a represent patterns drawn by the first drawing, 11b to 14b represent patterns drawn by the second drawing, and 11c to 14c represent patterns to be resolved.
第1描画により描画されたパターン11a〜14aは、Y方
向には時間的に連続して描画されるために、Y方向の位
置精度は極めて高いが、X方向の位置精度はやや劣る。
一方、第2描画により描画されたパターン11b〜14bはX
方向に位置精度が高く、Y方向にやや劣るものとなる。
従って、両者の重なった部分11c〜14cが解像するが、両
者の位置誤差が平均化され1/2となる。同一方向のスト
ライプのみを重畳した場合に比べて、本発明ではX方向
に高精度な描画パターンとY方向に高精度なパターンと
を重ねるため、位置誤差の改善の度合は極めて大きい。Since the patterns 11a to 14a drawn by the first drawing are drawn continuously in time in the Y direction, the positional accuracy in the Y direction is extremely high, but the positional accuracy in the X direction is slightly inferior.
On the other hand, the patterns 11b to 14b drawn by the second drawing are X
The positional accuracy is high in the Y direction and slightly inferior in the Y direction.
Therefore, the overlapping portions 11c to 14c are resolved, but the positional errors of both are averaged to be 1/2. Compared with the case where only stripes in the same direction are superimposed, in the present invention, the highly accurate drawing pattern in the X direction and the highly accurate pattern in the Y direction are overlapped, so the degree of improvement in the position error is extremely large.
なお、ステップ・アンド・リピート方式においても、
全く同様にして大きな精度向上が得られる。Even in the step-and-repeat method,
A great improvement in accuracy can be obtained in exactly the same manner.
なお、各描画において、ストライプ状描画領域をつな
ぐステップ移動量をストライプ幅よりも小さくし、同一
方向のストライプを重畳するという従来法を合わせて実
施するとさらに大きな精度向上が得られる。It should be noted that, in each drawing, if the conventional method in which the step movement amount connecting the stripe-shaped drawing regions is made smaller than the stripe width and the stripes in the same direction are superposed together, the accuracy can be further improved.
発明の効果 本発明の電子ビーム描画方法によれば、試料移動に伴
う誤差を平均化することにより、パターン位置精度の高
い描画が可能となる。EFFECTS OF THE INVENTION According to the electron beam writing method of the present invention, it is possible to perform writing with high pattern position accuracy by averaging errors due to sample movement.
第1図は本発明の一実施例における電子ビーム描画方法
を示す描画パターン図、第2図は一実施例における描画
パターンを示す平面図である。 1……試料、11a〜14a……第1描画パターン、11b〜14b
……第2描画パターン、11c〜14c……解像パターン。FIG. 1 is a drawing pattern diagram showing an electron beam drawing method in one embodiment of the present invention, and FIG. 2 is a plan view showing a drawing pattern in one embodiment. 1 ... Sample, 11a-14a ... First drawing pattern, 11b-14b
...... Second drawing pattern, 11c to 14c ...... Resolution pattern.
Claims (1)
るまたはステップ移動を繰り返す第1の試料移動と前記
試料の端部で前記第1の試料移動の方向と直交する方向
にステップ移動する第2の試料移動とを繰り返して前記
試料の全面を描画する第1の描画と、前記第1の試料移
動と直交する方向に連続に移動するまたはステップ移動
を繰り返す第3の試料移動と前記試料の端部で前記第3
の試料移動の方向と直交する方向にステップ移動する第
4の試料移動とを繰り返して前記試料の全面を描画する
第2の描画とを重畳することを特徴とする電子ビーム描
画方法。1. A first sample movement in which a sample continuously moves in one direction or an opposite direction or repeats step movement, and a step moves in an end portion of the sample in a direction orthogonal to the direction of the first sample movement. A first drawing in which the entire surface of the sample is drawn by repeating the second sample movement, and a third sample movement in which the first movement is repeated or a step movement is repeated in a direction orthogonal to the first sample movement and the sample At the end of the third
An electron beam drawing method, characterized in that the fourth sample movement of stepwise moving in a direction orthogonal to the sample movement direction is repeated to overlap a second drawing of the entire surface of the sample.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1327936A JP2523910B2 (en) | 1989-12-18 | 1989-12-18 | Electronic beam drawing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1327936A JP2523910B2 (en) | 1989-12-18 | 1989-12-18 | Electronic beam drawing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03188617A JPH03188617A (en) | 1991-08-16 |
JP2523910B2 true JP2523910B2 (en) | 1996-08-14 |
Family
ID=18204665
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1327936A Expired - Fee Related JP2523910B2 (en) | 1989-12-18 | 1989-12-18 | Electronic beam drawing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2523910B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001242313A (en) | 2000-02-28 | 2001-09-07 | Dainippon Printing Co Ltd | Method of manufacturing phase mask for processing of optical fiber and optical fiber with bragg diffraction grating manufactured by using that phase mask for processing of optical fiber |
-
1989
- 1989-12-18 JP JP1327936A patent/JP2523910B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH03188617A (en) | 1991-08-16 |
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