JP2515719Y2 - Detachable discharge electrode - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a detachable plasma discharge electrode of a plasma CVD apparatus.

[Background of the invention]

The inventors of the present invention previously formed an amorphous or microcrystalline mixed-phase silicon thin film at a high deposition rate by performing plasma discharge decomposition of silane gas or the like using an uneven electrode having an uneven portion. This is an unexpected and surprising finding from the conventional common general knowledge that a uniform film formation can be achieved even in a large area regardless of the high deposition rate. This content is described, for example, in Japanese Patent Application No. 62-182329.
No. 62-256403 and the like. The present invention can be suitably applied to such a proposal, and its purpose is to have a concave and convex shape, and it is possible to easily change the width and depth of the concave portion. The present invention provides a detachable discharge electrode which can control a film forming speed by using the method and can be easily and detachably installed on an existing discharge electrode.

DISCLOSURE OF THE INVENTION That is, according to the present invention, there is provided a bottom plate having a groove on which at least a plurality of mold members can be mounted on at least a main surface, and a plurality of mold members that can be detachably mounted on the bottom plate. Type plasma discharge electrode,
A discharge electrode in which an uneven shape is formed on the bottom plate by a plurality of mounted mold materials, and a discharge electrode detachably mounted on the existing discharge electrode via the bottom plate. The gist is a discharge electrode provided with a through hole for tightly connecting a bottom plate to an existing discharge electrode.

[Description of Drawings]

FIG. 1 is a perspective view showing an example of a bottom plate of a detachable discharge electrode of the present invention, and FIG. 2, FIG. 3, FIG. 4, FIG.
6 and 7 are perspective views showing an example of the mold material used in the present invention. FIG. 8 is a perspective view of the mold member 5 having the groove 13 for inserting the flat mold member 2 and the insertion protrusion 14 for fixing to the bottom plate, and FIG. 9 shows a combination of the mold member 2 and the mold member 5. FIG. 7 is a perspective view showing an example in which the groove is inserted and fixed in a groove 11 on the bottom plate. FIG. 10 is a perspective view showing a state in which the mold material 7 is inserted into the groove 11 of the bottom plate and the flatness of the bottom plate is maintained. FIG. 11 is a sectional view showing a state in which the detachable discharge electrode of the present invention is attached to a conventional existing discharge electrode, and FIG. 12 is a perspective view thereof. 13 and 14 are perspective views showing an embodiment in which the detachable discharge electrode of the present invention is formed. FIG. 15 is a schematic view showing a conventional plasma CVD apparatus, and FIG. 16 is a schematic view showing a state in which the detachable discharge electrode of the present invention is attached to the conventional plasma CVD apparatus.

[Detailed description of the invention]

Hereinafter, embodiments of the present invention will be described with reference to the drawings while referring to constituent components of the present invention.

Bottom Plate (i) FIG. 11 is a view showing a state in which the bottom plate 1 of the detachable electrode of the present invention is attached and used to the existing discharge electrode in the plasma CVD apparatus, that is, the conventional discharge electrode 8. There are various methods of attaching (or fixing) to the electrode, such as screw fixing, clip fixing, and scissor fixing, but of course the method is not limited to these. In the plasma CVD device, in order to enhance the stability of plasma, the bottom plate 1
It is desirable to electrically and physically connect the existing discharge electrode 8 and the existing discharge electrode 8 (meaning that both are tightly integrated, or are connected or connected to each other to facilitate high-frequency current flow). For this reason, it is desirable that the bottom plate 1 has through holes 10 at its four corners as shown in FIG. 1 and can be fixed to an existing discharge electrode with a countersunk screw 15 as shown in FIG. Is desirable. In addition, in order to secure the flatness of the bottom plate, it is desirable to provide a notch 16 in the upper part of the through hole as shown in FIG. Further, as shown in FIG. 2 to FIG.
It is preferable to have a tap hole so that 6 can be attached, but a groove 11 may be used.

(Ii) The size of the bottom plate 1 is not particularly limited, and is appropriately determined in consideration of the size of the existing discharge electrode and the film forming chamber.

(Iii) The groove 11 is for tightly mounting the mold material on the bottom plate, but preferably, when there is a groove in which the mold material is not attached, it is shown in FIG. 10 in order to ensure the flatness of the bottom plate. As described above, it is preferable to use the mold material 7 so that the unused groove can be filled. The width and depth of the groove are, of course, appropriately determined according to the mold material and the bottom plate used.

(Iv) In the prior art, there is also a plasma CVD apparatus that supplies a raw material gas through a raw material gas supply hole provided through an existing discharge electrode, but in such a case, a bottom plate attached to the discharge electrode 1 can also be provided with a corresponding source gas supply hole 12. When the raw material gas supply hole 12 is provided, its position, arrangement, number, etc. are appropriately determined in accordance with that of the mold material used.

(V) As the material of the bottom plate, stainless alloy, aluminum, copper, heat-resistant metal or the like is preferably used.

Mold material (i) The shape of the mold material is flat plate mold 2 (Fig. 2), prismatic mold 3 (Fig. 3), donut mold 4 (Fig. 4), cylinder mold 5 (Fig. 5).
Various shapes such as (Fig.), Mesh 6 (Fig. 6), and cross shape (Fig. 7) are used to form the shape of the existing discharge electrode. For example, in the case shown in FIGS. 11 and 12, nine cylindrical mold materials and twelve flat mold materials are selected as mold materials, and four adjacent recessed areas having the same area are formed. is there. In the example shown in FIG. 13, 16 cylindrical mold members and 16 flat plate mold members are selected as the mold members, and 4 recessed regions at separate positions are independently formed. First
In the example shown in FIG. 14, eight columnar mold members and eight flat plate mold members 2 are selected as the mold members, and two concentric concave regions are formed. By doing so, the shape of the convex portion and the interval and depth of the concave portion can be arbitrarily changed.

Further, in the present invention, it is of course possible to attach a mold material larger than the existing discharge electrode and perform discharge film formation.

(Ii) In the present invention, the mold members 2, 3, 4, 5, 6, 7
Etc. are appropriately selected according to the purpose and attached to the bottom plate, that is, attached. There are various methods of attaching to the bottom plate or fixing methods, such as screw fixing, clip fixing, scissor fixing, and of course, not limited to these. In the case of a cylinder or the like, it may be screwed into a screw-in type, or in some cases, may simply be fitted or fitted. Further, as described above, the shape of the convex portion and the interval and depth of the concave portion can be arbitrarily changed by selecting the mold material.

(Iii) As for the hardness of the mold material, as we have already proposed, the film formation rate changes depending on the height of the convex portion of the uneven electrode to be formed. It is selected appropriately. The preferred range is 1 cm to 10 cm.

(Iv) The interval between the mold members has an optimum value depending on the discharge conditions, but is preferably 5 mm or more, and is appropriately selected within this range according to the film forming rate.

(V) As for the width of the convex portion, there is an optimum value depending on the discharge conditions, so that it is appropriately selected within this range according to the film forming rate. In general, it is preferable that the width is narrower, and a sharp end face may be used.

(Vi) As the material of the mold material, stainless alloy, aluminum, copper, heat-resistant metal, etc., or ceramics, insulators, etc. are preferably used.

[Preferred Embodiments of the Invention and Functions / Effects]

Next, a preferred embodiment of the present invention and its operation / effect will be described.

(I) First, as shown in FIGS. 11 and 12, the bottom plate 1 is installed on the existing discharge electrode 8. Next, an appropriate mold material, for example, mold materials 2 to 7 as shown in FIGS. 2 to 7 is selected and attached to the bottom plate 1. In this case, the mold material is appropriately determined in consideration of discharge conditions and the like. At this time, in order to secure the flatness in the unused groove 11 on the bottom plate, it is preferable to embed the mold material 7 as shown in FIG.

(Ii) Thus, the width and the depth of the mold material, that is, the width and the depth of the uneven portion formed by the mold material are appropriately selected to form the uneven electrode having a desired shape. Alternatively, the film formation rate of the microcrystalline mixed phase can be made uniform and large. If the desired film is not completely formed in the first trial, the shape of the electrode of the present invention can be easily attached and detached.
Optimum conditions can be easily determined by changing the width, depth, etc. and forming the film again. Also, the bottom plate of the present invention has a groove for inserting a mold material,
It is possible to form an uneven shape having any shape. Therefore, the optimum condition can be easily determined for any large-area electrode. For example, by having a lattice-like structure as shown in FIG. 12 and a concentric structure as shown in FIG. 14, by independently configuring the bottom plate as shown in FIG. 13, It is possible to form a uniform film over a wide range. The film forming rate depends largely on the discharge conditions, particularly the pressure, but the working pressure is preferably about 5 mTorr to 5 Torr.

[Brief description of drawings]

FIG. 1 is a perspective view showing an example of a bottom plate of a detachable discharge electrode of the present invention, and FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6, FIG. It is a perspective view showing an example of a mold material and a bottom plate used in the invention. FIG. 8 is a perspective view of a mold member 5 having a groove 13 for forming a concavo-convex shape and an insertion protrusion 14 for fixing the mold member to the bottom plate. FIG. 9 shows the mold member 2 on the bottom plate and on the mold member 5. It is a perspective view which shows an example fixed by being inserted in a groove. FIG. 10 is a perspective view showing a state in which the mold member 7 is inserted into the groove of the bottom plate and the flatness of the bottom plate is maintained. FIG. 11 is a sectional view showing a state in which the detachable discharge electrode of the present invention is attached to a conventional existing discharge electrode, and FIG. 12 is a perspective view thereof. 13 and 14 are perspective views showing an embodiment in which the detachable discharge electrode of the present invention is formed. FIG. 15 is a schematic diagram showing a conventional plasma CVD apparatus, and FIG. 16 is a schematic diagram showing a state in which the detachable discharge electrode of the present invention is attached to a conventional plasma CVD apparatus. In the figure, 1 ... bottom plate, 2-7 ... mold material, 8 ... existing discharge electrode, 9
... substrate, 10 ... through hole, 11 ... groove, 12 ... raw material gas supply hole. 13 …… groove, 14 …… insertion protrusion, 15 …… counter screw, 16 …… notch 17 …… indicates high frequency power supply.

Claims (2)

(57) [Scope of utility model registration request] 1. An existing discharge electrode, which comprises at least a main plate having a groove on which a plurality of mold members can be mounted, and a plurality of mold members that can be detachably mounted on the bottom plate. A detachable plasma discharge electrode that can be detachably attached via the bottom plate. 2. A discharge plate having an existing bottom plate, the bottom plate having at least a main surface provided with a groove into which a plurality of mold members can be mounted, and a plurality of mold members that can be detachably mounted on the bottom plate. Detachable plasma discharge electrode with a through hole for tight binding.