JPH0648826Y2 - Detachable discharge electrode - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a detachable plasma discharge electrode of a plasma CVD apparatus.

[Background of the invention]

The inventors of the present invention previously formed an amorphous or microcrystalline mixed-phase silicon thin film at a high deposition rate by performing plasma discharge decomposition of silane gas or the like using an uneven electrode having an uneven portion. This is an unexpected and surprising finding from the conventional technical common sense that, even if the deposition rate is high, a substantially uniform film formation can be achieved even with a large area regardless of the high deposition rate. The contents of this are, for example, Japanese Patent Application No. Sho 62-182329.
No. 62-256403, etc. The present invention can be suitably applied to such a proposal, and the purpose thereof is to have an uneven shape, and it is possible to easily change the width and the depth of the recess, and to change this. Thus, the deposition rate can be controlled, and in particular, the removable discharge electrode can be easily and removably arranged on the existing discharge electrode.

[Disclosure of device]

That is, the present invention is a detachable plasma discharge electrode composed of at least a bottom plate and a plurality of mold members that can be detachably attached to the bottom plate, and the uneven shape is formed on the bottom plate by the plurality of mounted mold members. A discharge electrode having a tap hole for mounting a plurality of mold members on the bottom plate, and also detachably mounted on the existing discharge electrode via the bottom plate. The discharge electrode is the main point.

[Description of Drawings]

FIG. 1 is a plan view showing an example of a bottom plate of the detachable discharge electrode of the present invention, and FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. It is a perspective view which shows an example of the mold material used by a device. FIG. 8 is a perspective view showing a through hole formed in the mold material, and FIG. 9 is a sectional view showing an example in which the mold material and the bottom plate are fixed with a countersunk screw. FIG. 10 is a sectional view showing a state where a countersunk screw is attached to the tap hole of the bottom plate. FIG. 11 is a sectional view showing a state in which the detachable discharge electrode of the present invention is attached to a conventional existing discharge electrode, and FIG. 12 is a plan view thereof. 13 and 14 are perspective views showing an embodiment in which the detachable discharge electrode of the present invention is formed. First
Fig. 15 is a schematic diagram showing a conventional plasma CVD apparatus.
Figure 6 shows the detachable discharge electrode of the present invention
It is a schematic diagram which shows the state attached to the apparatus.

[Detailed description of the device]

Hereinafter, embodiments of the present invention will be described while explaining constituent elements of the present invention with reference to the drawings.

Bottom plate (i) FIG. 11 is a view showing an existing discharge electrode in the plasma CD removal device, that is, the conventional discharge electrode 8. As shown in the figure, the detachable electrode of the present invention has the bottom plate 1 already installed. It is used by being attached to the discharge electrode 8 of. There are various methods of attaching (or fixing) to the electrodes, such as screw fixing, clip fixing, and scissor fixing, but of course the method is not limited to these. In the plasma CVD apparatus, in order to enhance the stability of plasma, the bottom plate 1 and the existing discharge electrode 8 are electrically and physically tightly connected (the two are tightly integrated, joined or connected to facilitate high-frequency flow). It is preferable). For this reason, it is desirable that the bottom plate 1 has through holes 10 near its four corners and four midpoints of its sides as shown in FIG. 1, and as shown in FIG. Those that can be fixed with screws 15 etc. are desirable. Further, as shown in FIGS. 2 to 7, it is desirable to have a tap hole 11 so that the mold members 2 to 7 can be attached. In addition, 2 and 5 are mold materials as described later.

(Ii) The size of the bottom plate 1 is not particularly limited and is appropriately determined in consideration of the sizes of the existing discharge electrode and the film forming chamber.

(Iii) The tap hole 11 is for tightly mounting the mold material on the bottom plate, but preferably, if there is a tap hole to which the mold material is not attached, in order to ensure the flatness of the bottom plate,
As shown in the figure, it is preferable to use a countersunk screw 15 to provide a notch 13 for filling the unused tap hole. Further, it goes without saying that the positions of the tap holes are appropriately determined according to the mold material used.

(Iv) In the prior art, there is a plasma CVD apparatus that supplies a raw material gas through a raw material gas supply hole that penetrates through an existing discharge electrode, but in such a case,
The bottom plate 1 attached to the discharge electrode can also be provided with a corresponding source gas supply hole 12. Raw gas supply hole 12
In the case of providing, the position, arrangement, number and the like are appropriately determined according to the shape of the mold material used.

(V) As the material of the bottom plate, stainless alloy, aluminum, copper, heat-resistant metal or the like is preferably used.

Mold material (i) The shape of the mold material is a square frame mold 2 (Fig. 2), a prismatic mold 3 (Fig. 3), a donut mold 4 (Fig. 4), a cylinder 5 (Fig. 5),
Various shapes such as a dish screw 6 (FIG. 6) and a mesh 7 (FIG. 7) are appropriately selected according to the shape of the existing discharge electrode, and more preferably, a plurality of them are combined to form the concavo-convex electrode. Used for. For example, in the case shown in Fig. 11 and Fig. 12, as the mold material, nine cylindrical mold materials and one square frame mold material are selected, and the cylindrical molds are arranged in a grid pattern at the center of the bottom plate. , The square frame is arranged so as to surround it. In the example shown in Fig. 13, nine plate screws and one square frame are selected as the mold materials, the plate screws are arranged in a grid in the center of the bottom plate, and a square frame is arranged to surround them. It was done. In the example shown in FIG. 14, one rectangular column-shaped material is selected from three rectangular frame-shaped materials as a molding material and is fixed to the bottom plate. By doing so, the shape of the convex portion and the interval and depth of the concave portion can be arbitrarily changed. Furthermore, in the present invention, it is of course possible to attach a mold material larger than the existing discharge electrode and perform discharge film formation.

(Ii) In the present invention, the mold members 2, 3, 4, 5, 6, 7
Etc. are appropriately selected according to the purpose and attached to the bottom plate, that is, attached. There are various methods for attaching or fixing to the bottom plate, such as screw fixing, clip fixing, and scissor fixing, and of course, not limited to these. In the case of a cylinder or the like, it may be screwed into a screw-in type, or in some cases, may be fitted or fitted into a vehicle. In plasma CVD,
In order to improve the stability of plasma, it is necessary to bond the bottom plate and the mold member together. Therefore, preferably, as shown in FIG. 8, the mold member has through holes, and as shown in FIG.
Attach it to the bottom plate via a plate screw. Further, as described above, the shape of the convex portion and the interval and depth of the concave portion can be arbitrarily changed by selecting the mold material.

(Iii) As for the height of the mold material, as we have already proposed, the film formation rate changes depending on the height of the convex portion of the uneven electrode to be formed. It is selected appropriately.

(Iv) The interval between the mold members has an optimum value depending on the discharge conditions, and is therefore appropriately selected within this range according to the film forming rate.

(V) As the material of the mold material, stainless alloy, aluminum, copper, heat-resistant metal, etc., or ceramics, insulators, etc. are preferably used.

[Preferable Embodiments and Functions / Effects of the Invention]

Next, a preferred embodiment of the present invention and its operation / effect will be described.

(I) First, as shown in FIGS. 11 and 12, the bottom plate 1 is installed on the existing discharge electrode 8. Next, an appropriate mold material, for example, mold materials 2 to 7 as shown in FIGS. 2 to 7 is selected and attached to the bottom plate 1. In this case, the mold material is appropriately determined in consideration of discharge conditions and the like. At this time, in order to ensure flatness in the unused tap hole 11 on the bottom plate,
As shown in FIG. 10, it is preferable that the countersunk screws 15 are sufficiently embedded in advance.

(Ii) In this way, the width and depth of the mold material, that is, the width and depth of the uneven portion formed by the mold material are appropriately selected to form the uneven electrode having a desired shape. The film formation rate of the crystalline or microcrystalline mixed phase can be made uniform and large. If the desired film is not completely formed in the first trial, the shape of the electrode of the present invention can be easily attached and detached. The optimum condition can be easily determined by changing the value and forming the film again. Although the film forming rate largely depends on the discharge conditions, particularly the pressure, the working pressure is preferably about 5 mTorr to 5 Torr.

[Brief description of drawings]

FIG. 1 is a plan view showing an example of a bottom plate of the detachable discharge electrode of the present invention, and FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. It is a perspective view which shows an example of the mold material used by a device. FIG. 8 is a perspective view showing a through hole formed in the mold material, and FIG. 9 is a sectional view showing an example in which the mold material and the bottom plate are fixed with a countersunk screw. FIG. 10 is a sectional view showing a state where a countersunk screw is attached to the tap hole of the bottom plate. FIG. 11 is a sectional view showing a state in which the detachable discharge electrode of the present invention is attached to a conventional existing discharge electrode, and FIG. 12 is a plan view thereof. 13 and 14 are perspective views showing an embodiment in which the detachable discharge electrode of the present invention is formed. First
Fig. 15 is a schematic diagram showing a conventional plasma CVD apparatus.
Figure 6 shows the detachable discharge electrode of the present invention
It is a schematic diagram which shows the state attached to the apparatus. In the drawings, 1 ... Bottom plate, 2-7 ... Mold material, 8 ... Existing discharge electrode, 9 ... Substrate, 10 ... Through hole, 11 ... Tap hole, 12 ... Raw material gas supply hole are shown. 13 …… notches, 14 …… through holes, 15 …… disc screws, 16 …… show high frequency power supplies.

Claims (1)

[Scope of utility model registration request] 1. At least a bottom plate mounted on a parallel plate type discharge electrode, and i) detachably provided on the bottom plate.
At least one frame-shaped mold member and a plurality of columnar mold members placed in the frame mold; or ii) a plurality of frame-shaped mold members and a plurality of column-shaped mold members placed in the frame mold A detachable plasma discharge device in which an uneven shape is formed by a mold material.