JP2025500209A5 - - Google Patents
Info
- Publication number
- JP2025500209A5 JP2025500209A5 JP2024535618A JP2024535618A JP2025500209A5 JP 2025500209 A5 JP2025500209 A5 JP 2025500209A5 JP 2024535618 A JP2024535618 A JP 2024535618A JP 2024535618 A JP2024535618 A JP 2024535618A JP 2025500209 A5 JP2025500209 A5 JP 2025500209A5
- Authority
- JP
- Japan
- Prior art keywords
- optionally substituted
- methyl
- chloride
- silyl
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163265558P | 2021-12-16 | 2021-12-16 | |
| US63/265,558 | 2021-12-16 | ||
| PCT/US2022/081845 WO2023115023A1 (en) | 2021-12-16 | 2022-12-16 | Development strategy for high-absorbing metal-containing photoresists |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2025500209A JP2025500209A (ja) | 2025-01-09 |
| JP2025500209A5 true JP2025500209A5 (enExample) | 2025-12-19 |
Family
ID=86773643
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024535618A Pending JP2025500209A (ja) | 2021-12-16 | 2022-12-16 | 高吸収金属含有フォトレジストに対する現像戦略 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250060673A1 (enExample) |
| JP (1) | JP2025500209A (enExample) |
| KR (1) | KR20240114785A (enExample) |
| TW (1) | TW202340879A (enExample) |
| WO (1) | WO2023115023A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI837391B (zh) | 2019-06-26 | 2024-04-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| EP4078292A4 (en) | 2020-07-07 | 2023-11-22 | Lam Research Corporation | Integrated dry processes for patterning radiation photoresist patterning |
| US20230107357A1 (en) | 2020-11-13 | 2023-04-06 | Lam Research Corporation | Process tool for dry removal of photoresist |
| JP7681106B2 (ja) | 2020-12-08 | 2025-05-21 | ラム リサーチ コーポレーション | 有機蒸気によるフォトレジストの現像 |
| KR102725782B1 (ko) | 2022-07-01 | 2024-11-05 | 램 리써치 코포레이션 | 에칭 정지 억제 (etch stop deterrence) 를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상 |
| JP7811164B2 (ja) * | 2022-08-26 | 2026-02-04 | 三菱ケミカル株式会社 | パターン基板の製造方法および半導体デバイスの製造方法 |
| US12604710B2 (en) * | 2022-09-21 | 2026-04-14 | Tokyo Electron Limited | Method and apparatus for in-situ dry development |
| US12474640B2 (en) | 2023-03-17 | 2025-11-18 | Lam Research Corporation | Integration of dry development and etch processes for EUV patterning in a single process chamber |
| JP7852072B2 (ja) | 2023-07-27 | 2026-04-27 | ラム リサーチ コーポレーション | 金属含有フォトレジストのためのオールインワン乾式現像 |
| FI20236200A1 (en) * | 2023-10-27 | 2025-04-28 | Pibond Oy | Solution-processable organometallic complexes and their use |
| US20250180987A1 (en) * | 2023-12-01 | 2025-06-05 | Applied Materials, Inc. | Dry development for metal-oxide photo resists |
| US20250201559A1 (en) * | 2023-12-18 | 2025-06-19 | International Business Machines Corporation | Semiconductor pattern structure preservation |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20160041471A1 (en) * | 2014-08-07 | 2016-02-11 | International Business Machines Corporation | Acidified conductive water for developer residue removal |
| JP6742748B2 (ja) * | 2016-02-17 | 2020-08-19 | 株式会社Ｓｃｒｅｅｎホールディングス | 現像ユニット、基板処理装置、現像方法および基板処理方法 |
| WO2021067632A2 (en) * | 2019-10-02 | 2021-04-08 | Lam Research Corporation | Substrate surface modification with high euv absorbers for high performance euv photoresists |
| EP4115242A4 (en) * | 2020-03-02 | 2024-03-13 | Inpria Corporation | PROCESSING ENVIRONMENT FOR THE FORMATION OF INORGANIC RESERVE PATTERNS |
| US11705332B2 (en) * | 2020-03-30 | 2023-07-18 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photoresist layer surface treatment, cap layer, and method of forming photoresist pattern |
-
2022
- 2022-12-14 TW TW111148087A patent/TW202340879A/zh unknown
- 2022-12-16 JP JP2024535618A patent/JP2025500209A/ja active Pending
- 2022-12-16 WO PCT/US2022/081845 patent/WO2023115023A1/en not_active Ceased
- 2022-12-16 KR KR1020247023722A patent/KR20240114785A/ko active Pending
- 2022-12-16 US US18/719,815 patent/US20250060673A1/en active Pending
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| JP2025500209A5 (enExample) | ||
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