JP2024544616A5 - - Google Patents
Info
- Publication number
- JP2024544616A5 JP2024544616A5 JP2024531442A JP2024531442A JP2024544616A5 JP 2024544616 A5 JP2024544616 A5 JP 2024544616A5 JP 2024531442 A JP2024531442 A JP 2024531442A JP 2024531442 A JP2024531442 A JP 2024531442A JP 2024544616 A5 JP2024544616 A5 JP 2024544616A5
- Authority
- JP
- Japan
- Prior art keywords
- mfc2
- station
- mfcs
- manifold
- reaction gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163264780P | 2021-12-01 | 2021-12-01 | |
| US63/264,780 | 2021-12-01 | ||
| PCT/US2022/080198 WO2023102325A1 (en) | 2021-12-01 | 2022-11-19 | Dry process tool with adjustable flow valve |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024544616A JP2024544616A (ja) | 2024-12-03 |
| JP2024544616A5 true JP2024544616A5 (https=) | 2025-11-14 |
Family
ID=86613139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024531442A Pending JP2024544616A (ja) | 2021-12-01 | 2022-11-19 | 調節可能なフローバルブをもつドライプロセスツール |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20250003069A1 (https=) |
| JP (1) | JP2024544616A (https=) |
| KR (1) | KR20240108802A (https=) |
| CN (1) | CN118339643A (https=) |
| TW (1) | TW202340519A (https=) |
| WO (1) | WO2023102325A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW202518632A (zh) * | 2023-07-12 | 2025-05-01 | 美商蘭姆研究公司 | 具有前驅物分配系統的多站處理工具 |
| KR102952480B1 (ko) * | 2023-07-24 | 2026-04-14 | 주식회사 유진테크 | 기판 처리 장치 및 기판 처리 방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7169231B2 (en) * | 2002-12-13 | 2007-01-30 | Lam Research Corporation | Gas distribution system with tuning gas |
| JP6789932B2 (ja) * | 2014-10-17 | 2020-11-25 | ラム リサーチ コーポレーションLam Research Corporation | 調整可能ガスフロー制御のためのガス分離器を含むガス供給配送配置 |
| KR20250005539A (ko) * | 2015-08-17 | 2025-01-09 | 아이커 시스템즈, 인크. | 유체 제어 시스템 |
| US20220228263A1 (en) * | 2019-06-07 | 2022-07-21 | Lam Research Corporation | Independently adjustable flowpath conductance in multi-station semiconductor processing |
| US11869754B2 (en) * | 2019-09-06 | 2024-01-09 | Applied Materials, Inc. | Dynamic pressure control for processing chambers implementing real-time learning |
-
2022
- 2022-11-19 WO PCT/US2022/080198 patent/WO2023102325A1/en not_active Ceased
- 2022-11-19 KR KR1020247021724A patent/KR20240108802A/ko active Pending
- 2022-11-19 JP JP2024531442A patent/JP2024544616A/ja active Pending
- 2022-11-19 CN CN202280079962.3A patent/CN118339643A/zh active Pending
- 2022-11-19 US US18/709,590 patent/US20250003069A1/en active Pending
- 2022-11-21 TW TW111144334A patent/TW202340519A/zh unknown
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