JP2024537818A5 - - Google Patents
Info
- Publication number
- JP2024537818A5 JP2024537818A5 JP2024519727A JP2024519727A JP2024537818A5 JP 2024537818 A5 JP2024537818 A5 JP 2024537818A5 JP 2024519727 A JP2024519727 A JP 2024519727A JP 2024519727 A JP2024519727 A JP 2024519727A JP 2024537818 A5 JP2024537818 A5 JP 2024537818A5
- Authority
- JP
- Japan
- Prior art keywords
- gate
- transistor device
- source contact
- semiconductor layer
- layer structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/492,032 | 2021-10-01 | ||
| US17/492,032 US12464760B2 (en) | 2016-03-17 | 2021-10-01 | Bypassed gate transistors having improved stability |
| PCT/US2022/075500 WO2023056145A1 (en) | 2021-10-01 | 2022-08-26 | Bypassed gate transistors having improved stability |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024537818A JP2024537818A (ja) | 2024-10-16 |
| JP2024537818A5 true JP2024537818A5 (https=) | 2025-07-15 |
Family
ID=83283330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024519727A Pending JP2024537818A (ja) | 2021-10-01 | 2022-08-26 | 安定性を改善されたバイパス・ゲート・トランジスタ |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP4393009A1 (https=) |
| JP (1) | JP2024537818A (https=) |
| WO (1) | WO2023056145A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4481813A1 (en) * | 2023-06-21 | 2024-12-25 | NXP USA, Inc. | Structures for suppressing odd-mode instabilities |
| WO2025140234A1 (zh) * | 2023-12-25 | 2025-07-03 | 苏州能讯高能半导体有限公司 | 半导体器件 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6316793B1 (en) | 1998-06-12 | 2001-11-13 | Cree, Inc. | Nitride based transistors on semi-insulating silicon carbide substrates |
| US6548333B2 (en) | 2000-12-01 | 2003-04-15 | Cree, Inc. | Aluminum gallium nitride/gallium nitride high electron mobility transistors having a gate contact on a gallium nitride based cap segment |
| US6849882B2 (en) | 2001-05-11 | 2005-02-01 | Cree Inc. | Group-III nitride based high electron mobility transistor (HEMT) with barrier/spacer layer |
| US7030428B2 (en) | 2001-12-03 | 2006-04-18 | Cree, Inc. | Strain balanced nitride heterojunction transistors |
| US6982204B2 (en) | 2002-07-16 | 2006-01-03 | Cree, Inc. | Nitride-based transistors and methods of fabrication thereof using non-etched contact recesses |
| US7045404B2 (en) | 2004-01-16 | 2006-05-16 | Cree, Inc. | Nitride-based transistors with a protective layer and a low-damage recess and methods of fabrication thereof |
| JP2012023212A (ja) * | 2010-07-14 | 2012-02-02 | Sumitomo Electric Ind Ltd | 半導体装置 |
| WO2018204622A1 (en) * | 2017-05-05 | 2018-11-08 | Cree, Inc. | High power mmic devices having bypassed gate transistors |
-
2022
- 2022-08-26 JP JP2024519727A patent/JP2024537818A/ja active Pending
- 2022-08-26 WO PCT/US2022/075500 patent/WO2023056145A1/en not_active Ceased
- 2022-08-26 EP EP22769536.8A patent/EP4393009A1/en active Pending
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