JP2024521061A - 効率的なイオン収集部を備えたイオン生成システム - Google Patents

効率的なイオン収集部を備えたイオン生成システム Download PDF

Info

Publication number
JP2024521061A
JP2024521061A JP2023570163A JP2023570163A JP2024521061A JP 2024521061 A JP2024521061 A JP 2024521061A JP 2023570163 A JP2023570163 A JP 2023570163A JP 2023570163 A JP2023570163 A JP 2023570163A JP 2024521061 A JP2024521061 A JP 2024521061A
Authority
JP
Japan
Prior art keywords
target
ions
voltage
ion beam
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023570163A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024521061A5 (cg-RX-API-DMAC7.html
Inventor
ジョセフ シャーマン
サルコ チェレクドジアン
Original Assignee
シャイン テクノロジーズ リミテッド ライアビリティ カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャイン テクノロジーズ リミテッド ライアビリティ カンパニー filed Critical シャイン テクノロジーズ リミテッド ライアビリティ カンパニー
Publication of JP2024521061A publication Critical patent/JP2024521061A/ja
Publication of JP2024521061A5 publication Critical patent/JP2024521061A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • B01D59/48—Separation by mass spectrography using electrostatic and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/055—Arrangements for energy or mass analysis magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06375—Arrangement of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • External Artificial Organs (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
JP2023570163A 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム Pending JP2024521061A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163188729P 2021-05-14 2021-05-14
US63/188,729 2021-05-14
PCT/US2022/029153 WO2022241196A1 (en) 2021-05-14 2022-05-13 Ion production system with efficient ion collection

Publications (2)

Publication Number Publication Date
JP2024521061A true JP2024521061A (ja) 2024-05-28
JP2024521061A5 JP2024521061A5 (cg-RX-API-DMAC7.html) 2025-03-11

Family

ID=83998469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023570163A Pending JP2024521061A (ja) 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム

Country Status (10)

Country Link
US (1) US12391568B2 (cg-RX-API-DMAC7.html)
EP (1) EP4338194A4 (cg-RX-API-DMAC7.html)
JP (1) JP2024521061A (cg-RX-API-DMAC7.html)
KR (1) KR20240035391A (cg-RX-API-DMAC7.html)
CN (1) CN117678050A (cg-RX-API-DMAC7.html)
AU (1) AU2022273773A1 (cg-RX-API-DMAC7.html)
CA (1) CA3218431A1 (cg-RX-API-DMAC7.html)
IL (1) IL308413A (cg-RX-API-DMAC7.html)
MX (1) MX2023013468A (cg-RX-API-DMAC7.html)
WO (1) WO2022241196A1 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2022358410A1 (en) * 2021-10-01 2024-04-11 Shine Technologies, Llc Ion production system with fibrous lattice for ion collection
US20250054647A1 (en) * 2023-08-10 2025-02-13 Alpha Ring International, Ltd. Electron Suppressor Electrode for Improved Efficiency and In-Situ Electron Monitoring

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299716A (ja) * 1992-07-09 1993-11-12 Shimadzu Corp 集束イオンビーム装置
JPH0673537A (ja) * 1992-08-27 1994-03-15 Ishikawajima Harima Heavy Ind Co Ltd イオンビームデポジション装置
JPH06103953A (ja) * 1992-09-18 1994-04-15 Elionix Kk 金属イオンを用いた薄膜形成方法およびその装置
JP2004139913A (ja) * 2002-10-21 2004-05-13 National Institute Of Advanced Industrial & Technology イオンビーム発生装置、イオンビーム発生方法、イオン処理装置およびイオン処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354583A (en) * 1992-11-09 1994-10-11 Martin Marietta Energy Systems, Inc. Apparatus and method for selective area deposition of thin films on electrically biased substrates
RU2158170C1 (ru) * 1999-11-01 2000-10-27 Комбинат "Электрохимприбор" Способ разделения изотопов иттербия в электромагнитном сепараторе с использованием источника ионов
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
US7138626B1 (en) * 2005-05-05 2006-11-21 Eai Corporation Method and device for non-contact sampling and detection
WO2007067296A2 (en) 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP5575198B2 (ja) * 2012-09-25 2014-08-20 株式会社東芝 磁気抵抗効果素子の製造方法及び磁気抵抗効果素子の製造装置
US9443708B2 (en) * 2014-09-10 2016-09-13 Battelle Memorial Institute Ion implantation system and process for ultrasensitive determination of target isotopes

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299716A (ja) * 1992-07-09 1993-11-12 Shimadzu Corp 集束イオンビーム装置
JPH0673537A (ja) * 1992-08-27 1994-03-15 Ishikawajima Harima Heavy Ind Co Ltd イオンビームデポジション装置
JPH06103953A (ja) * 1992-09-18 1994-04-15 Elionix Kk 金属イオンを用いた薄膜形成方法およびその装置
JP2004139913A (ja) * 2002-10-21 2004-05-13 National Institute Of Advanced Industrial & Technology イオンビーム発生装置、イオンビーム発生方法、イオン処理装置およびイオン処理方法

Also Published As

Publication number Publication date
EP4338194A4 (en) 2025-10-29
EP4338194A1 (en) 2024-03-20
KR20240035391A (ko) 2024-03-15
WO2022241196A1 (en) 2022-11-17
US12391568B2 (en) 2025-08-19
MX2023013468A (es) 2024-03-07
CA3218431A1 (en) 2022-11-17
CN117678050A (zh) 2024-03-08
AU2022273773A1 (en) 2023-11-23
IL308413A (en) 2024-01-01
US20220363558A1 (en) 2022-11-17

Similar Documents

Publication Publication Date Title
CN101233597B (zh) 带电束收集和粒子吸引器
US12391568B2 (en) Ion production system with efficient ion collection
Reijnders et al. Low-energy-spread ion bunches from a trapped atomic gas
US20250285777A1 (en) Ion production system with fibrous lattice for ion collection
McHugh et al. Secondary positive ion emission from a tantalum surface
JP2024521061A5 (cg-RX-API-DMAC7.html)
Alton et al. The production of Ca− through sequential charge exchange with Li vapor
US20250095957A1 (en) Ion production system with a mass resolving aperture having a scatter recess
RU2071137C1 (ru) Источник ионов
Ban-d'Etat et al. Potential and kinetic sputtering of UO2 by slow highly charged ions
Fallavier et al. Metallic cluster beams from a 2.5 MV Van de Graaff accelerator for cluster–solid interaction studies: preliminary results with Aun+ clusters
RU2119730C1 (ru) Источник многокомпонентных атомарных потоков
Kumar et al. Studies on deposition of high energy Lu ions on metallic substrates using Multi-collector ICPMS
Alton High-efficiency target-ion sources for RIB generation
Kellerman et al. Particle trapping and annihilation within the extraction system of ion sources
Ichiki et al. Sputtering Properties of Si by Size-Selected Ar Gas Cluster Ion Beam
Bereanek et al. Self-discharging of Dust Grains by Ion Field Emission
Bassal et al. Design aspects of an ion injector
Siefken et al. A future, intense source of negative hydrogen ions
Steski et al. THE DARESBURY POLARIZED HE? AVY ION SOURCE
Kanai et al. Development of a Negative Ion Source for Unstable Nuclear Beams
Kishi et al. Ion optical properties of an electron‐beam‐guiding ion source
Motaweh et al. Energy spectra of the electrons and ions emitted from Ni single crystal surface under Ne ion bombardment
JP2010129297A (ja) クラスターイオンビーム装置及びクラスターイオンビームの生成方法
Sereda et al. APPLICATIONS AND TECHNOLOGY ELECTROMAGNETIC FILTER FOR H–SEPARATION FROM PIG WITH METAL HYDRIDE CATHODE

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250303

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250303

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20251210

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20251216

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20260312

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20260525

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20260622

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20260731