JP2023524023A5 - - Google Patents
Info
- Publication number
- JP2023524023A5 JP2023524023A5 JP2022566007A JP2022566007A JP2023524023A5 JP 2023524023 A5 JP2023524023 A5 JP 2023524023A5 JP 2022566007 A JP2022566007 A JP 2022566007A JP 2022566007 A JP2022566007 A JP 2022566007A JP 2023524023 A5 JP2023524023 A5 JP 2023524023A5
- Authority
- JP
- Japan
- Prior art keywords
- shower head
- main body
- substrate
- carrier ring
- cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063016641P | 2020-04-28 | 2020-04-28 | |
| US63/016,641 | 2020-04-28 | ||
| US202063041630P | 2020-06-19 | 2020-06-19 | |
| US63/041,630 | 2020-06-19 | ||
| PCT/US2021/026515 WO2021221881A1 (en) | 2020-04-28 | 2021-04-09 | Showerhead designs for controlling deposition on wafer bevel/edge |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2023524023A JP2023524023A (ja) | 2023-06-08 |
| JP2023524023A5 true JP2023524023A5 (https=) | 2024-04-16 |
Family
ID=78373848
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022566007A Pending JP2023524023A (ja) | 2020-04-28 | 2021-04-09 | ウエハのベベル／縁部上の堆積を制御するためのシャワーヘッド設計 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20230167552A1 (https=) |
| JP (1) | JP2023524023A (https=) |
| KR (1) | KR20230007440A (https=) |
| CN (1) | CN115461493A (https=) |
| TW (1) | TW202208672A (https=) |
| WO (1) | WO2021221881A1 (https=) |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2763222B2 (ja) * | 1991-12-13 | 1998-06-11 | 三菱電機株式会社 | 化学気相成長方法ならびにそのための化学気相成長処理システムおよび化学気相成長装置 |
| US20050230350A1 (en) * | 2004-02-26 | 2005-10-20 | Applied Materials, Inc. | In-situ dry clean chamber for front end of line fabrication |
| US8092606B2 (en) * | 2007-12-18 | 2012-01-10 | Asm Genitech Korea Ltd. | Deposition apparatus |
| JP2009277958A (ja) * | 2008-05-16 | 2009-11-26 | Nuflare Technology Inc | 成膜装置及び成膜方法 |
| WO2011009002A2 (en) * | 2009-07-15 | 2011-01-20 | Applied Materials, Inc. | Flow control features of cvd chambers |
| US9881788B2 (en) * | 2014-05-22 | 2018-01-30 | Lam Research Corporation | Back side deposition apparatus and applications |
| US10253412B2 (en) * | 2015-05-22 | 2019-04-09 | Lam Research Corporation | Deposition apparatus including edge plenum showerhead assembly |
| TWI723024B (zh) * | 2015-06-26 | 2021-04-01 | 美商應用材料股份有限公司 | 用於改良的氣體分配的遞迴注入設備 |
| KR20180071960A (ko) * | 2016-12-20 | 2018-06-28 | 램 리써치 코포레이션 | 가스 시일링을 갖는 화학적 증착 챔버 |
| JP6308318B2 (ja) * | 2017-04-06 | 2018-04-11 | 東京エレクトロン株式会社 | 成膜装置 |
| US10851457B2 (en) * | 2017-08-31 | 2020-12-01 | Lam Research Corporation | PECVD deposition system for deposition on selective side of the substrate |
| JP6462072B2 (ja) * | 2017-09-01 | 2019-01-30 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| KR102538177B1 (ko) * | 2017-11-16 | 2023-05-31 | 삼성전자주식회사 | 상부 샤워 헤드 및 하부 샤워 헤드를 포함하는 증착 장치 |
| JP7045883B2 (ja) * | 2018-03-07 | 2022-04-01 | 東京エレクトロン株式会社 | プラズマ処理方法及びプラズマ処理装置 |
| JP7066565B2 (ja) * | 2018-07-27 | 2022-05-13 | 東京エレクトロン株式会社 | プラズマ処理方法およびプラズマ処理装置 |
| JP7119747B2 (ja) * | 2018-08-10 | 2022-08-17 | 東京エレクトロン株式会社 | ガス処理装置及びガス処理方法 |
-
2021
- 2021-04-09 US US17/921,871 patent/US20230167552A1/en not_active Abandoned
- 2021-04-09 KR KR1020227041420A patent/KR20230007440A/ko not_active Ceased
- 2021-04-09 WO PCT/US2021/026515 patent/WO2021221881A1/en not_active Ceased
- 2021-04-09 JP JP2022566007A patent/JP2023524023A/ja active Pending
- 2021-04-09 CN CN202180031633.7A patent/CN115461493A/zh active Pending
- 2021-04-27 TW TW110115029A patent/TW202208672A/zh unknown
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