JP2023177697A - Grinding method of workpiece - Google Patents

Grinding method of workpiece Download PDF

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JP2023177697A
JP2023177697A JP2022090505A JP2022090505A JP2023177697A JP 2023177697 A JP2023177697 A JP 2023177697A JP 2022090505 A JP2022090505 A JP 2022090505A JP 2022090505 A JP2022090505 A JP 2022090505A JP 2023177697 A JP2023177697 A JP 2023177697A
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grinding
workpiece
holding
outer peripheral
grinding wheel
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智隆 田渕
Tomotaka Tabuchi
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Disco Corp
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Disco Abrasive Systems Ltd
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Abstract

To provide a grinding method of a workpiece which can inhibit occurrence of chips at an outer periphery part of the workpiece.SOLUTION: A grinding method of a workpiece includes: a holding step 101 in which a workpiece is held on a holding table; a center part grinding step 102 in which a center part of the workpiece is ground to a predetermined thickness to form a recessed part with a first grinding wheel having an outer diameter smaller than that of the workpiece; and an outer periphery part grinding step 103 in which the first grinding wheel is relatively moved from the recessed part to an outer periphery area of a holding surface of the holding table to grind an outer periphery part of the workpiece surrounding the recessed part after the center part grinding step 102 is performed.SELECTED DRAWING: Figure 2

Description

本発明は、被加工物を研削する被加工物の研削方法に関する。 The present invention relates to a method for grinding a workpiece.

反りがある被加工物を研削する際には、従来の加工方法では、まず被加工物を保持テーブルに吸着させる必要があると考えられていた。そこで保持テーブルに吸着させるために、搬送アームに被加工物の外周部を保持テーブルに対して押しつける機構を設ける(例えば、特許文献1参照)、保持テーブルの吸引力を上げるためにポンプを増やす、保持面の吸着経路を中央と外周とで分け、外周が沿って保持面から浮いてしまったとしても中心がリークせず、外周側を搬送アームなどで押す事でバキュームできる様にするため、外周専用のバキューム経路を形成するなどの解決策がとられてきた。 When grinding a warped workpiece, it has been thought that in conventional processing methods, it is necessary to first adsorb the workpiece to a holding table. Therefore, in order to attract the workpiece to the holding table, a mechanism for pressing the outer circumference of the workpiece against the holding table is provided on the transfer arm (for example, see Patent Document 1), and a pump is increased to increase the suction force of the holding table. The suction path on the holding surface is divided into the center and the outer periphery, so that even if the outer periphery lifts off the holding surface, the center will not leak, and the outer periphery can be vacuumed by pushing the outer periphery with a transfer arm. Solutions have been taken, such as creating dedicated vacuum paths.

特開2019-123047号公報JP 2019-123047 Publication

また、近年反りが大きい被加工物が生じ、搬送や保持面を工夫しても被加工物の全面を吸着ができないケースも生じている。 In addition, in recent years, workpieces with large warpage have occurred, and cases have also arisen in which the entire surface of the workpiece cannot be suctioned even if the conveyance or holding surface is devised.

万が一外周部が浮いている状態で研削が進んでしまい、研削ホイールが外周部にあたると、外周部に欠けが発生する恐れがあった。 If grinding were to proceed while the outer periphery was floating and the grinding wheel hit the outer periphery, there was a risk that the outer periphery would be chipped.

本発明の目的は、被加工物の外周部に欠けが発生することを抑制することができる被加工物の研削方法を提供することである。 An object of the present invention is to provide a method for grinding a workpiece that can suppress the occurrence of chipping on the outer periphery of the workpiece.

上述した課題を解決し、目的を達成するために、本発明の被加工物の研削方法は、被加工物の研削方法であって、保持テーブルに被加工物を保持する保持ステップと、外径が被加工物より小さい第1の研削ホイールで、被加工物の中央部を所定厚みまで研削し凹部を形成する中央部研削ステップと、該中央部研削ステップの実施後、該第1の研削ホイールを該凹部から該保持テーブルの保持面の外周領域に相対的に移動させ、該凹部を囲繞する被加工物の外周部を研削する外周部研削ステップと、を備えることを特徴とする。 In order to solve the above-mentioned problems and achieve the objects, the present invention provides a method for grinding a workpiece, which comprises: a holding step for holding the workpiece on a holding table; and a holding step for holding the workpiece on a holding table; a center part grinding step of grinding the center part of the workpiece to a predetermined thickness to form a concave part using a first grinding wheel having a smaller diameter than the workpiece; and after performing the center part grinding step, the first grinding wheel The method is characterized by comprising an outer peripheral part grinding step of relatively moving the material from the recess to an outer peripheral area of the holding surface of the holding table and grinding the outer peripheral part of the workpiece surrounding the recess.

前記被加工物の研削方法において、該保持テーブルは、該外周部を保持する外周領域と、該中央部を保持する中央領域と、に区画された保持面と、該外周領域と、該中央領域と、をそれぞれ独立して吸引源に接続する吸引経路と、を有し、該保持ステップは、該中央領域に吸引力を発生させ、被加工物の該中央部を保持しても良い。 In the method for grinding a workpiece, the holding table includes a holding surface partitioned into an outer peripheral area for holding the outer peripheral part and a central area for holding the central part, the outer peripheral area and the central area. and a suction path that connects each independently to a suction source, and the holding step may generate a suction force in the central region to hold the central portion of the workpiece.

前記被加工物の研削方法において、該中央部研削ステップと、該外周部研削ステップと、を繰り返し実施しても良い。 In the method for grinding the workpiece, the central portion grinding step and the outer peripheral portion grinding step may be repeatedly performed.

前記被加工物の研削方法において、該外周部研削ステップを開始してから所定のタイミングで、該中央領域の吸引力を維持した状態で、さらに該外周領域に吸引力を発生させ、薄化された被加工物の該外周部を該外周領域に吸着する外周吸着ステップと、該外周吸着ステップの実施後、該第1の研削ホイールまたは該第1の研削ホイールと異なる第2の研削ホイールで被加工物の全面を研削し、被加工物を所望する最終厚みまで薄化する全面研削ステップと、を備えても良い。 In the method for grinding the workpiece, at a predetermined timing after starting the outer circumferential grinding step, while maintaining the suction force in the central area, a suction force is further generated in the outer circumferential area so that the workpiece is thinned. an outer periphery adsorption step of adsorbing the outer periphery of the workpiece to the outer periphery area; and after performing the outer periphery adsorption step, the outer periphery of the workpiece is covered with the first grinding wheel or a second grinding wheel different from the first grinding wheel; and a full-surface grinding step of grinding the entire surface of the workpiece and thinning the workpiece to a desired final thickness.

前記被加工物の研削方法において、該第1の研削ホイールは、該中央領域よりも外径が小さくても良い。 In the method for grinding a workpiece, the first grinding wheel may have a smaller outer diameter than the central region.

前記被加工物の研削方法において、該全面研削ステップで使用する第2の研削ホイールは、該第1の研削ホイールよりも外径が大きくても良い。 In the method for grinding a workpiece, the second grinding wheel used in the entire surface grinding step may have a larger outer diameter than the first grinding wheel.

本発明は、被加工物の外周部に欠けが発生することを抑制することができるという効果を奏する。 The present invention has the effect of being able to suppress the occurrence of chipping on the outer peripheral portion of the workpiece.

図1は、実施形態1に係る被加工物の研削方法の加工対象の被加工物の構成例を示す斜視図である。FIG. 1 is a perspective view showing a configuration example of a workpiece to be processed by a method for grinding a workpiece according to a first embodiment. 図2は、実施形態1に係る被加工物の研削方法の流れを示すフローチャートである。FIG. 2 is a flowchart showing the flow of the method for grinding a workpiece according to the first embodiment. 図3は、図2に示された被加工物の研削方法の保持ステップを一部断面で模式的に示す側面図である。FIG. 3 is a side view schematically showing, partially in section, the holding step of the method for grinding the workpiece shown in FIG. 図4は、図2に示された被加工物の研削方法の中央部研削ステップを一部断面で模式的に示す側面図である。FIG. 4 is a side view schematically showing, partially in cross section, the central part grinding step of the method for grinding the workpiece shown in FIG. 図5は、図2に示された被加工物の研削方法の外周部研削ステップ開始直後を一部断面で模式的に示す側面図である。FIG. 5 is a side view schematically showing, in partial cross section, immediately after the start of the outer circumference grinding step of the method for grinding the workpiece shown in FIG. 図6は、図2に示された被加工物の研削方法の外周部研削ステップ終了直前を一部断面で模式的に示す側面図である。FIG. 6 is a side view schematically showing, in partial cross section, immediately before the end of the outer circumference grinding step of the method for grinding the workpiece shown in FIG. 図7は、実施形態2に係る被加工物の研削方法の流れを示すフローチャートである。FIG. 7 is a flowchart showing the flow of a method for grinding a workpiece according to the second embodiment. 図8は、図7に示された被加工物の研削方法の最初の外周部研削ステップ終了直前を一部断面で模式的に示す側面図である。FIG. 8 is a side view schematically showing, in partial cross section, immediately before the end of the first outer circumference grinding step of the method for grinding the workpiece shown in FIG. 図9は、図7に示された被加工物の研削方法の退避ステップを一部断面で模式的に示す側面図である。FIG. 9 is a side view schematically showing, partially in cross section, the retraction step of the method for grinding the workpiece shown in FIG. 図10は、図7に示された被加工物の研削方法の中央部研削準備ステップを一部断面で模式的に示す側面図である。FIG. 10 is a side view schematically showing a central part grinding preparation step of the method for grinding the workpiece shown in FIG. 7, with a partial cross section. 図11は、実施形態3に係る被加工物の研削方法の流れを示すフローチャートである。FIG. 11 is a flowchart showing the flow of the method for grinding a workpiece according to the third embodiment. 図12は、図11に示された被加工物の研削方法の外周吸着ステップを一部断面で模式的に示す側面図である。FIG. 12 is a side view schematically showing, partially in cross section, the outer periphery suction step of the method for grinding the workpiece shown in FIG. 図13は、図11に示された被加工物の研削方法の全面研削ステップを一部断面で模式的に示す側面図である。FIG. 13 is a side view schematically showing, in partial cross section, the entire surface grinding step of the method for grinding the workpiece shown in FIG. 図14は、実施形態1、実施形態2及び実施形態3の変形例に係る被加工物の研削方法の保持ステップを一部断面で模式的に示す側面図である。FIG. 14 is a side view schematically showing, partially in cross section, a holding step of a method for grinding a workpiece according to a modification of Embodiment 1, Embodiment 2, and Embodiment 3.

本発明を実施するための形態(実施形態)につき、図面を参照しつつ詳細に説明する。以下の実施形態に記載した内容により本発明が限定されるものではない。また、以下に記載した構成要素には、当業者が容易に想定できるもの、実質的に同一のものが含まれる。さらに、以下に記載した構成は適宜組み合わせることが可能である。また、本発明の要旨を逸脱しない範囲で構成の種々の省略、置換又は変更を行うことができる。 DESCRIPTION OF THE PREFERRED EMBODIMENTS Modes (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the contents described in the following embodiments. Further, the constituent elements described below include those that can be easily assumed by those skilled in the art and those that are substantially the same. Furthermore, the configurations described below can be combined as appropriate. Further, various omissions, substitutions, or changes in the configuration can be made without departing from the gist of the present invention.

〔実施形態1〕
本発明の実施形態1に係る被加工物の研削方法を図面に基づいて説明する。図1は、実施形態1に係る被加工物の研削方法の加工対象の被加工物の構成例を示す斜視図である。図2は、実施形態1に係る被加工物の研削方法の流れを示すフローチャートである。
[Embodiment 1]
A method for grinding a workpiece according to Embodiment 1 of the present invention will be described based on the drawings. FIG. 1 is a perspective view showing a configuration example of a workpiece to be processed by a method for grinding a workpiece according to a first embodiment. FIG. 2 is a flowchart showing the flow of the method for grinding a workpiece according to the first embodiment.

(被加工物)
実施形態1に係る被加工物の研削方法は、図1に示す被加工物1を研削する方法である。実施形態1に係る被加工物の研削方法の加工対象の被加工物1は、シリコン、サファイヤ、ガリウムヒ素、又はSiC(炭化ケイ素)等などを基板2とする円板状の半導体ウエーハや光デバイスウエーハ等である。被加工物1は、図1に示すように、表面3に互いに交差する分割予定ライン4が複数設定され、分割予定ライン4によって区画された領域にデバイス5が形成されている。
(Workpiece)
The method for grinding a workpiece according to the first embodiment is a method for grinding a workpiece 1 shown in FIG. The workpiece 1 to be processed in the workpiece grinding method according to the first embodiment is a disk-shaped semiconductor wafer or an optical device whose substrate 2 is silicon, sapphire, gallium arsenide, SiC (silicon carbide), or the like. Such as wafers. As shown in FIG. 1, the workpiece 1 has a plurality of dividing lines 4 that intersect with each other on the surface 3, and devices 5 are formed in areas partitioned by the dividing lines 4.

デバイス5は、例えば、IC(Integrated Circuit)、又はLSI(Large Scale Integration)等の集積回路、CCD(Charge Coupled Device)、又はCMOS(Complementary Metal Oxide Semiconductor)等のイメージセンサ、又はメモリ(半導体記憶装置)である。 The device 5 is, for example, an integrated circuit such as an IC (Integrated Circuit) or an LSI (Large Scale Integration), an image sensor such as a CCD (Charge Coupled Device), or a CMOS (Complementary Metal Oxide Semiconductor), or a memory (semiconductor storage device). ).

また、実施形態1において、被加工物1は、中央部8と、中央部8よりも外周側の外周部9とを含み、外周部9の方が中央部8より厚み方向に反っている(なお、図1は、被加工物1の反りを省略している)。なお、中央部8は、被加工物1の平面視における中心を含んだ領域であり、外周部9は、中央部8よりも外周側でかつ被加工物1の外縁を含んだ領域である。なお、外周部9は、表面3にデバイス5が形成されていても良く、表面3にデバイス5が形成されていなくても良い。 Further, in the first embodiment, the workpiece 1 includes a central portion 8 and an outer circumferential portion 9 on the outer circumferential side of the central portion 8, and the outer circumferential portion 9 is more warped in the thickness direction than the central portion 8 ( Note that FIG. 1 omits the warping of the workpiece 1). Note that the central portion 8 is a region including the center of the workpiece 1 in plan view, and the outer peripheral portion 9 is a region on the outer peripheral side of the central portion 8 and including the outer edge of the workpiece 1. Note that the device 5 may be formed on the surface 3 of the outer peripheral portion 9, or the device 5 may not be formed on the surface 3.

なお、実施形態1では、被加工物1は、前述したウエーハであるが、本発明では、ウエーハに限定されることなく、例えば、デバイスチップを複数配置した基板と、基板上の複数のデバイスチップをモールド封止したモールド樹脂とを備えたパッケージ基板等の種々の被加工物でも良い。また、本発明では、被加工物1は、表面3にデバイス5が形成されていないウエーハでも良い。 In Embodiment 1, the workpiece 1 is the aforementioned wafer, but in the present invention, it is not limited to the wafer, but may include, for example, a substrate on which a plurality of device chips are arranged, and a plurality of device chips on the substrate. Various workpieces may be used, such as a package substrate with a molded resin sealed with a mold. Further, in the present invention, the workpiece 1 may be a wafer in which the device 5 is not formed on the surface 3.

(被加工物の研削方法)
実施形態1に係る被加工物の研削方法は、被加工物1の表面3の裏側の裏面7を研削して、所望する最終厚み6まで被加工物1の薄化する方法である。被加工物の研削方法は、図2に示すように、保持ステップ101と、中央部研削ステップ102と、外周部研削ステップ103とを備える。
(Grinding method of workpiece)
The method of grinding a workpiece according to the first embodiment is a method of thinning the workpiece 1 to a desired final thickness 6 by grinding the back surface 7 on the back side of the front surface 3 of the workpiece 1. As shown in FIG. 2, the method for grinding a workpiece includes a holding step 101, a center grinding step 102, and an outer peripheral grinding step 103.

(保持ステップ)
図3は、図2に示された被加工物の研削方法の保持ステップを一部断面で模式的に示す側面図である。保持ステップ101は、研削装置20の保持テーブル21の保持面25に被加工物1を保持するステップである。なお、保持テーブル21は、円盤状の多孔質のポーラス部材22と、ポーラス部材22を中央に嵌合して取り付ける円形の凹部24が設けられた枠体23とを備える。
(holding step)
FIG. 3 is a side view schematically showing, partially in section, the holding step of the method for grinding the workpiece shown in FIG. The holding step 101 is a step of holding the workpiece 1 on the holding surface 25 of the holding table 21 of the grinding device 20 . Note that the holding table 21 includes a disc-shaped porous member 22 and a frame 23 provided with a circular recess 24 in the center of which the porous member 22 is fitted and attached.

ポーラス部材22は、ポーラスセラミック等の多孔質材で構成されている。ポーラス部材22の上面は、水平方向に沿って平坦に形成され、被加工物1を保持する保持面25である。また、保持テーブル21は、ポーラス部材22の上面である保持面25と、枠体23の上面とが同一平面上に配置されている。 The porous member 22 is made of a porous material such as porous ceramic. The upper surface of the porous member 22 is a holding surface 25 that is formed flat along the horizontal direction and holds the workpiece 1 . Further, in the holding table 21, a holding surface 25, which is the upper surface of the porous member 22, and the upper surface of the frame body 23 are arranged on the same plane.

また、実施形態1では、保持テーブル21は、保持面25が被加工物1の外周部9を保持する外周領域251と、被加工物1の中央部8を保持する中央領域252とに区画されている。なお、実施形態1では、保持テーブル21は、外周領域251と中央領域252との間に、ポーラス部材22の他の部分よりも通気性の低いポーラスセラミック、非通気性の樹脂、又は非通気性のガラス等により構成された隔壁部材26がポーラス部材22内に埋設されて、保持面25が外周領域251と、中央領域252とに区画されている。このように、保持テーブル21は、外周領域251と中央領域252とに区画された保持面25を有している。 Further, in the first embodiment, the holding surface 25 of the holding table 21 is divided into an outer peripheral area 251 that holds the outer peripheral part 9 of the workpiece 1 and a central area 252 that holds the central part 8 of the workpiece 1. ing. In the first embodiment, the holding table 21 is made of porous ceramic having lower air permeability than other parts of the porous member 22, non-porous resin, or non-porous material between the outer peripheral area 251 and the central area 252. A partition wall member 26 made of glass or the like is embedded within the porous member 22, and the holding surface 25 is divided into an outer peripheral region 251 and a central region 252. In this way, the holding table 21 has a holding surface 25 divided into an outer peripheral area 251 and a central area 252.

また、保持テーブル21は、保持面25の外周領域251と、保持面25の中央領域252とをそれぞれ独立して吸引源29に接続する吸引経路27,28を有している。各吸引経路27,28は、開閉弁271,281を設けている。吸引経路27は、凹部24の底面のうち隔壁部材26よりも外周側の位置に開口し、吸引経路28は、凹部24の底面のうち隔壁部材26よりも内周側の位置に開口している。 Further, the holding table 21 has suction paths 27 and 28 that independently connect the outer peripheral area 251 of the holding surface 25 and the central area 252 of the holding surface 25 to the suction source 29. Each suction path 27, 28 is provided with an on-off valve 271, 281. The suction path 27 opens at a position on the bottom surface of the recess 24 on the outer periphery side of the partition member 26, and the suction path 28 opens on the bottom surface of the recess 24 at a position on the inner periphery side of the partition wall member 26. .

実施形態1において、保持ステップ101では、表面3に支持部材10が貼着された被加工物1が研削装置20の保持テーブル21の保持面25に載置される。このとき、外周領域251上に被加工物1の外周部9が位置し、中央領域252上に被加工物1の中央部8が位置する。実施形態1において、保持ステップ101では、研削装置20が、開閉弁271を閉じた状態で、開閉弁281を開いて、保持面25の外周領域251と中央領域252とのうち中央領域252のみに吸引力を発生させて、被加工物1の中央部8を中央領域252に吸引保持する。 In the first embodiment, in the holding step 101 , the workpiece 1 having the support member 10 attached to the surface 3 is placed on the holding surface 25 of the holding table 21 of the grinding device 20 . At this time, the outer peripheral portion 9 of the workpiece 1 is located on the outer peripheral region 251, and the center portion 8 of the workpiece 1 is located on the central region 252. In the first embodiment, in the holding step 101, the grinding device 20 opens the on-off valve 281 with the on-off valve 271 closed, and applies only the central area 252 of the outer peripheral area 251 and the central area 252 of the holding surface 25. A suction force is generated to suction and hold the central portion 8 of the workpiece 1 in the central region 252 .

なお、実施形態1では、支持部材10は、可撓性と非粘着性を有する基材層と、基材層に積層されかつ可撓性と粘着性を有する粘着層とを有する粘着テープであるが、本発明では、粘着テープに限定されない。本発明では、支持部材10は、粘着層を有しない熱可塑性の樹脂で構成されたシートでも良い。粘着性を有さないシートの場合、支持部材10はポリオレフィン系シート、ポリエチレンシート、ポリプロピレンシート、又はポリスチレンシートである好ましく、被加工物1に熱圧着で貼着される。 In Embodiment 1, the support member 10 is an adhesive tape having a base material layer having flexibility and non-adhesiveness, and an adhesive layer laminated on the base material layer and having flexibility and adhesiveness. However, the present invention is not limited to adhesive tapes. In the present invention, the support member 10 may be a sheet made of thermoplastic resin without an adhesive layer. In the case of a non-adhesive sheet, the support member 10 is preferably a polyolefin sheet, a polyethylene sheet, a polypropylene sheet, or a polystyrene sheet, and is adhered to the workpiece 1 by thermocompression bonding.

(中央部研削ステップ)
図4は、図2に示された被加工物の研削方法の中央部研削ステップを一部断面で模式的に示す側面図である。中央部研削ステップ102は、外径が被加工物1の外径より小さい第1の研削ホイール30で、被加工物1の中央部8を所定厚みまで研削し、裏面7に部分的に凹部11を形成するステップである。
(Central grinding step)
FIG. 4 is a side view schematically showing, partially in cross section, the central part grinding step of the method for grinding the workpiece shown in FIG. In the center part grinding step 102, the center part 8 of the workpiece 1 is ground to a predetermined thickness using a first grinding wheel 30 whose outer diameter is smaller than the outer diameter of the workpiece 1, and a recess 11 is partially formed on the back surface 7. This is the step of forming.

実施形態1において、第1の研削ホイール30は、外径が被加工物1の外径よりも小さい。被加工物1の中央領域252の外径よりも小さな円盤状のホイール基台31と、ホイール基台31の外縁部に複数設けられた研削砥石32とを備える。このように、第1の研削ホイール30は、複数の研削砥石32の外縁で構成される円の直径(第1の研削ホイール30の外径に相当)が、被加工物1の外径及び被加工物1の中央領域252の外径よりも小さい。中央領域252は被加工物1の中央部8を保持するが、中央部8は外周部9に比べて反りが小さため、保持面25に吸引保持されている。第1の研削ホイール30の外径が中央領域252よりも小さいことで保持面25に吸引保持されている領域のみを研削する事ができるので、被加工物1が反って保持面25から浮いている部分に第1の研削ホイール30が衝突して被加工物1が損傷する恐れがない。 In the first embodiment, the first grinding wheel 30 has an outer diameter smaller than the outer diameter of the workpiece 1. It includes a disc-shaped wheel base 31 smaller than the outer diameter of the central region 252 of the workpiece 1, and a plurality of grinding wheels 32 provided on the outer edge of the wheel base 31. In this way, the first grinding wheel 30 has the diameter of the circle formed by the outer edges of the plurality of grinding wheels 32 (corresponding to the outer diameter of the first grinding wheel 30) equal to the outer diameter of the workpiece 1 and the outer diameter of the workpiece 1. It is smaller than the outer diameter of the central region 252 of the workpiece 1. The central region 252 holds the central portion 8 of the workpiece 1, but since the central portion 8 has less warp than the outer circumferential portion 9, it is held by the holding surface 25 under suction. Since the outer diameter of the first grinding wheel 30 is smaller than the central area 252, it is possible to grind only the area sucked and held by the holding surface 25, so that the workpiece 1 is warped and floats from the holding surface 25. There is no risk that the first grinding wheel 30 will collide with the part where the workpiece 1 is being processed and the workpiece 1 will be damaged.

また、実施形態1では、第1の研削ホイール30の外径が被加工物1の中央部8の半径より大きい。なお、本発明では、反って保持面25から浮いている外周部9を研削せず、まずは保持面25に吸引保持されている中央部8を研削することが目的であるため、第1の研削ホイール30の外径は、被加工物1の中央領域252の外径以下である方が好ましいが、中央領域252の周辺も反りが小さくなっており吸引保持されていなくても被加工物1を損傷させずに研削出来る場合もあるため、被加工物1の外径よりも小さければよい。また、本発明では、第1の研削ホイール30の外径は、被加工物1の中央部8の半径に限定されてもよい。 Further, in the first embodiment, the outer diameter of the first grinding wheel 30 is larger than the radius of the center portion 8 of the workpiece 1. In addition, in the present invention, the purpose is not to grind the outer peripheral part 9 that is warped and floating from the holding surface 25, but to first grind the central part 8 that is sucked and held by the holding surface 25, so the first grinding It is preferable that the outer diameter of the wheel 30 is less than or equal to the outer diameter of the central region 252 of the workpiece 1, but the warpage around the central region 252 is also small, so that the workpiece 1 can be held even if it is not held by suction. Since it may be possible to grind without causing damage, it is sufficient that the diameter is smaller than the outer diameter of the workpiece 1. Further, in the present invention, the outer diameter of the first grinding wheel 30 may be limited to the radius of the central portion 8 of the workpiece 1.

実施形態1において、中央部研削ステップ102では、研削装置20が、保持テーブル21の軸心と、下端に第1の研削ホイール30を装着したスピンドル33の軸心34とを互いに平行でかつ間隔をあけるとともに、保持テーブル21に保持された被加工物1の裏面7の中央部8の上方に第1の研削ホイール30の研削砥石32を位置付ける。実施形態1において、中央部研削ステップ102では、研削装置20が、保持テーブル21を軸心回りに回転させた状態で、第1の研削ホイール30を軸心34回りに回転させながら被加工物1に研削水を供給しつつ第1の研削ホイール30を下方に移動させる。 In the first embodiment, in the center grinding step 102, the grinding device 20 aligns the axial center of the holding table 21 and the axial center 34 of the spindle 33, on which the first grinding wheel 30 is attached to the lower end, to be parallel to each other and spaced apart from each other. At the same time, the grinding wheel 32 of the first grinding wheel 30 is positioned above the center part 8 of the back surface 7 of the workpiece 1 held on the holding table 21. In the first embodiment, in the center grinding step 102, the grinding device 20 rotates the workpiece 1 while rotating the first grinding wheel 30 about the axis 34 while rotating the holding table 21 about the axis. The first grinding wheel 30 is moved downward while supplying grinding water.

実施形態1において、中央部研削ステップ102では、研削装置20が、図4に示すように、ホイール基台31の外縁部に設けられた複数の研削砥石32を保持テーブル21に所定の送り速度で近付けることによって、研削砥石32で被加工物1の裏面7を研削する。実施形態1において、中央部研削ステップ102では、研削装置20が、最終厚み6まで被加工物1の中央部8を研削して薄化し、被加工物1の裏面7に部分的に凹部11を形成する。なお、実施形態1では、第1の研削ホイール30の外径が被加工物1の中央部8の半径より大きいので、被加工物1の裏面7の中央部8の軸心付近が研削されずに、凹部11が環状に形成される。 In the first embodiment, in the central part grinding step 102, the grinding device 20, as shown in FIG. By approaching the workpiece 1, the grinding wheel 32 grinds the back surface 7 of the workpiece 1. In the first embodiment, in the central part grinding step 102, the grinding device 20 grinds and thins the central part 8 of the workpiece 1 to a final thickness 6, and partially forms a recess 11 in the back surface 7 of the workpiece 1. Form. In the first embodiment, since the outer diameter of the first grinding wheel 30 is larger than the radius of the center part 8 of the workpiece 1, the vicinity of the axis of the center part 8 of the back surface 7 of the workpiece 1 is not ground. A recess 11 is formed in an annular shape.

(外周部研削ステップ)
図5は、図2に示された被加工物の研削方法の外周部研削ステップ開始直後を一部断面で模式的に示す側面図である。図6は、図2に示された被加工物の研削方法の外周部研削ステップ終了直前を一部断面で模式的に示す側面図である。外周部研削ステップ103は、中央部研削ステップ102の実施後、第1の研削ホイール30を凹部11から保持テーブル21の保持面25の外周領域251に相対的に移動させ、凹部11を囲繞する被加工物1の外周部9を研削ステップである。
(Outer periphery grinding step)
FIG. 5 is a side view schematically showing, in partial cross section, immediately after the start of the outer circumference grinding step of the method for grinding the workpiece shown in FIG. FIG. 6 is a side view schematically showing, in partial cross section, immediately before the end of the outer circumference grinding step of the method for grinding the workpiece shown in FIG. In the outer peripheral grinding step 103, after the center grinding step 102 is performed, the first grinding wheel 30 is moved relatively from the recess 11 to the outer peripheral area 251 of the holding surface 25 of the holding table 21, and the cover surrounding the recess 11 is removed. This is a step of grinding the outer peripheral portion 9 of the workpiece 1.

実施形態1において、外周部研削ステップ103では、図5に示すように、研削装置20が、中央部研削ステップ102終了時の研削砥石32の保持面25からの距離を維持した状態で、第1の研削ホイール30を保持テーブル21に対して保持テーブル21の保持面25の外周領域251に向かって保持面25に沿って相対的に移動させて、被加工物1の外周部9を凹部11の内面側から研削する。外周部研削ステップ103において、第1の研削ホイール30が移動しながら研削することで図4に示す被加工物1の中央部8の軸心付近の研削されていない領域も除去される。外周部研削ステップ103では、最終的に図6に示すように、第1の研削ホイール30の研削砥石32が被加工物1の外縁まで保持面25に対して相対的に移動して位置付けられ、被加工物1の外周部9を最終厚み6まで薄化する。 In the first embodiment, in the outer peripheral part grinding step 103, as shown in FIG. 5, the grinding device 20 performs the first The grinding wheel 30 is moved relative to the holding table 21 toward the outer peripheral area 251 of the holding surface 25 of the holding table 21 along the holding surface 25, and the outer peripheral part 9 of the workpiece 1 is moved into the recess 11. Grind from the inside side. In the outer periphery grinding step 103, the first grinding wheel 30 performs the grinding while moving, thereby also removing an unground area near the axis of the central portion 8 of the workpiece 1 shown in FIG. In the outer peripheral grinding step 103, as finally shown in FIG. 6, the grinding wheel 32 of the first grinding wheel 30 is moved and positioned relative to the holding surface 25 to the outer edge of the workpiece 1, The outer peripheral portion 9 of the workpiece 1 is thinned to a final thickness 6.

なお、実施形態1では、外周部研削ステップ103では、研削装置20が、第1の研削ホイール30を保持テーブル21の保持面25の外周領域251に向かって相対的に50mm移動させる。 In the first embodiment, in the outer circumference grinding step 103, the grinding device 20 relatively moves the first grinding wheel 30 by 50 mm toward the outer circumference region 251 of the holding surface 25 of the holding table 21.

以上説明した実施形態1に係る被加工物の研削方法は、中央部研削ステップ102において被加工物1の裏面7の中央部8に凹部11を形成した後に、外周部研削ステップ103において凹部11の内面を被加工物1の外縁に向かって研削するので、被加工物1の外周部9が保持面25から浮いていたとしても第1の研削ホイール30を凹部11の内面から押し当てるため第1の研削ホイール30で外周部9を保持面25に押しつけながら研削することとなる。このために、実施形態1に係る被加工物の研削方法は、被加工物1の外周部9が保持面25から浮いていたとしても、被加工物1の外周部9に第1の研削ホイール30が衝突することを抑制でき、外周部9が欠けることを抑制することができる。 In the method for grinding a workpiece according to the first embodiment described above, after forming the recess 11 in the center part 8 of the back surface 7 of the workpiece 1 in the center part grinding step 102, the recess 11 is formed in the outer peripheral part grinding step 103. Since the inner surface is ground toward the outer edge of the workpiece 1, even if the outer peripheral part 9 of the workpiece 1 is floating from the holding surface 25, the first grinding wheel 30 is pressed against the inner surface of the recess 11. The outer circumferential portion 9 is ground while being pressed against the holding surface 25 with the grinding wheel 30 . For this reason, in the method for grinding a workpiece according to the first embodiment, even if the outer circumference 9 of the workpiece 1 is floating from the holding surface 25, the first grinding wheel is attached to the outer circumference 9 of the workpiece 1. 30 can be prevented from colliding, and chipping of the outer peripheral portion 9 can be prevented.

その結果、実施形態1に係る被加工物の研削方法は、被加工物1の外周部9に欠けが発生することを抑制することができるという効果を奏する。 As a result, the method for grinding a workpiece according to the first embodiment has the effect of suppressing the occurrence of chipping in the outer peripheral portion 9 of the workpiece 1.

〔実施形態2〕
本発明の実施形態2に係る被加工物の研削方法を図面に基づいて説明する。図7は、実施形態2に係る被加工物の研削方法の流れを示すフローチャートである。図8は、図7に示された被加工物の研削方法の最初の外周部研削ステップ終了直前を一部断面で模式的に示す側面図である。図9は、図7に示された被加工物の研削方法の退避ステップを一部断面で模式的に示す側面図である。図10は、図7に示された被加工物の研削方法の中央部研削準備ステップを一部断面で模式的に示す側面図である。なお、図7、図8、図9及び図10は、実施形態1と同一部分には、同一符号を付して説明を省略する。
[Embodiment 2]
A method for grinding a workpiece according to Embodiment 2 of the present invention will be described based on the drawings. FIG. 7 is a flowchart showing the flow of a method for grinding a workpiece according to the second embodiment. FIG. 8 is a side view schematically showing, in partial cross section, immediately before the end of the first outer circumference grinding step of the method for grinding the workpiece shown in FIG. FIG. 9 is a side view schematically showing, partially in cross section, the retraction step of the method for grinding the workpiece shown in FIG. FIG. 10 is a side view schematically showing a central part grinding preparation step of the method for grinding the workpiece shown in FIG. 7, with a partial cross section. In addition, in FIGS. 7, 8, 9, and 10, the same parts as in the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted.

実施形態2に係る被加工物の研削方法は、最初の中央部研削ステップ102において被加工物1の中央部8を最終厚み6よりも厚い所定厚み12(図8に示す)まで研削し、図7に示すように、中央部研削ステップ102と、外周部研削ステップ103と、を繰り返しそれぞれ複数回実施して段階的に被加工物1の全面を最終厚み6に薄化する事と、退避ステップ105と、中央部研削準備ステップ106を備える事以外、実施形態1と同じである。 The method for grinding a workpiece according to the second embodiment includes grinding the center part 8 of the workpiece 1 to a predetermined thickness 12 (shown in FIG. 8) which is thicker than the final thickness 6 in the first center part grinding step 102, and 7, the central part grinding step 102 and the outer peripheral part grinding step 103 are repeated multiple times to gradually thin the entire surface of the workpiece 1 to a final thickness of 6, and the retreat step 105 and the central part grinding preparation step 106 are the same as in the first embodiment.

実施形態2に係る被加工物の研削方法では、研削装置20が、最初の中央部研削ステップ102において被加工物1の中央部8を最終厚み6よりも厚い所定厚み12まで研削し、最初の外周部研削ステップ103において、最初の中央部研削ステップ102終了時の研削砥石32の保持面25からの距離を維持した状態で、第1の研削ホイール30を保持テーブル21に対して保持テーブル21の保持面25の外周領域251に向かって保持面25に沿って相対的に移動させて、被加工物1の外周部9を凹部11の内面側から研削する。実施形態2において、外周部研削ステップ103では、図8に示すように、研削装置20が第1の研削ホイール30の研削砥石32が被加工物1の外縁に位置付けられると、被加工物1を最終厚み6まで薄化したか否かを判定する(ステップ104)。実施形態2において、研削装置20が被加工物1を最終厚み6まで薄化していないと判定する(ステップ104:No)と、退避ステップ105に進む。 In the method for grinding a workpiece according to the second embodiment, the grinding device 20 grinds the center part 8 of the workpiece 1 to a predetermined thickness 12 that is thicker than the final thickness 6 in the first center part grinding step 102, and In the outer peripheral grinding step 103, the first grinding wheel 30 is moved against the holding table 21 while maintaining the distance from the holding surface 25 of the grinding wheel 32 at the end of the first central grinding step 102. The outer circumferential portion 9 of the workpiece 1 is ground from the inner surface side of the recess 11 by relatively moving along the holding surface 25 toward the outer circumferential region 251 of the holding surface 25 . In the second embodiment, in the outer peripheral grinding step 103, as shown in FIG. It is determined whether the thickness has been reduced to a final thickness of 6 (step 104). In the second embodiment, when the grinding device 20 determines that the workpiece 1 has not been thinned to the final thickness 6 (step 104: No), the process proceeds to a retreat step 105.

実施形態2において、退避ステップ105は、研削砥石32が被加工物1に当たらない高さ即ち被加工物1の裏面7よりも上方に位置するように、第1の研削ホイール30を上昇させるステップである。実施形態2において、退避ステップ105では、図9に示すように、研削装置20が第1の研削ホイール30を保持テーブル21に対して相対的に上昇させる。 In the second embodiment, the retreat step 105 is a step of raising the first grinding wheel 30 so that the grinding wheel 32 does not hit the workpiece 1, that is, is located above the back surface 7 of the workpiece 1. It is. In the second embodiment, in the retreat step 105, the grinding device 20 raises the first grinding wheel 30 relative to the holding table 21, as shown in FIG.

実施形態2において、中央部研削準備ステップ106は、第1の研削ホイール30を被加工物1の裏面7の中央部8の上方に位置付けるステップである。実施形態2において、中央部研削準備ステップ106では、図10に示すように、研削装置20が第1の研削ホイール30を保持テーブル21に対して保持面25に沿って相対的に移動させて、第1の研削ホイール30を保持テーブル21に保持した被加工物1の裏面7の中央部8の上方に位置付けて、中央部研削ステップ102に戻る。 In the second embodiment, the central part grinding preparation step 106 is a step of positioning the first grinding wheel 30 above the central part 8 of the back surface 7 of the workpiece 1 . In the second embodiment, in the central part grinding preparation step 106, as shown in FIG. 10, the grinding device 20 moves the first grinding wheel 30 relative to the holding table 21 along the holding surface 25, The first grinding wheel 30 is positioned above the center part 8 of the back surface 7 of the workpiece 1 held on the holding table 21, and the process returns to the center part grinding step 102.

実施形態2において、中央部研削ステップ102では1回の実施につき、研削装置20が例えば10μm又は100μmなどの所定距離ずつ被加工物1の中央部8を薄化し、外周部研削ステップ103も1回の実施につき、中央部研削ステップ102と同様の所定距離ずつ薄化する。また、実施形態2において、外周部研削ステップ103後、研削装置20が被加工物1を最終厚み6まで薄化したと判定する(ステップ104:Yes)と終了する。このように、実施形態2では、被加工物1の厚みが最終厚み6になるまで、中央部研削ステップ102と外周部研削ステップ103とを繰り返し実施することとなる。 In the second embodiment, the grinding device 20 thins the center portion 8 of the workpiece 1 by a predetermined distance, such as 10 μm or 100 μm, each time the center portion grinding step 102 is performed, and the outer peripheral portion grinding step 103 is also performed once. , the central portion is thinned by a predetermined distance in the same manner as in the center grinding step 102. Further, in the second embodiment, after the outer peripheral portion grinding step 103, when the grinding device 20 determines that the workpiece 1 has been thinned to the final thickness 6 (step 104: Yes), the process ends. In this manner, in the second embodiment, the central portion grinding step 102 and the outer peripheral portion grinding step 103 are repeatedly performed until the thickness of the workpiece 1 reaches the final thickness 6.

実施形態2に係る被加工物の研削方法は、中央部研削ステップ102において被加工物1の裏面7の中央部8に凹部11を形成した後に、外周部研削ステップ103において凹部11の内面を被加工物1の外縁に向かって研削するので、被加工物1の外周部9に第1の研削ホイール30が衝突することを抑制でき、外周部9が欠けることを抑制することができる。その結果、実施形態2に係る被加工物の研削方法は、実施形態1と同様に、被加工物1の外周部9に欠けが発生することを抑制することができるという効果を奏する。 In the method for grinding a workpiece according to the second embodiment, after forming a recess 11 in the center part 8 of the back surface 7 of the workpiece 1 in a central part grinding step 102, the inner surface of the recess 11 is covered in an outer peripheral part grinding step 103. Since grinding is performed toward the outer edge of the workpiece 1, collision of the first grinding wheel 30 with the outer circumference 9 of the workpiece 1 can be suppressed, and chipping of the outer circumference 9 can be suppressed. As a result, the method for grinding a workpiece according to the second embodiment has the effect of suppressing the occurrence of chipping in the outer peripheral portion 9 of the workpiece 1, similarly to the first embodiment.

〔実施形態3〕
本発明の実施形態3に係る被加工物の研削方法を図面に基づいて説明する。図11は、実施形態3に係る被加工物の研削方法の流れを示すフローチャートである。図12は、図11に示された被加工物の研削方法の外周吸着ステップを一部断面で模式的に示す側面図である。図13は、図11に示された被加工物の研削方法の全面研削ステップを一部断面で模式的に示す側面図である。なお、図11、図12及び図13は、実施形態1と同一部分には、同一符号を付して説明を省略する。
[Embodiment 3]
A method for grinding a workpiece according to Embodiment 3 of the present invention will be described based on the drawings. FIG. 11 is a flowchart showing the flow of the method for grinding a workpiece according to the third embodiment. FIG. 12 is a side view schematically showing, partially in cross section, the outer periphery suction step of the method for grinding the workpiece shown in FIG. FIG. 13 is a side view schematically showing, in partial cross section, the entire surface grinding step of the method for grinding the workpiece shown in FIG. Note that in FIGS. 11, 12, and 13, the same parts as in the first embodiment are denoted by the same reference numerals, and the description thereof will be omitted.

実施形態3に係る被加工物の研削方法は、中央部研削ステップ102において被加工物1の中央部8を最終厚み6よりも厚い第1段階仕上げ厚み13(図12に示す)まで研削し、図11に示すように、外周部研削ステップ103後に実施される外周吸着ステップ107と、全面研削ステップ108とを備える事以外、実施形態1と同等である。 The method for grinding a workpiece according to Embodiment 3 includes grinding the center part 8 of the workpiece 1 to a first stage finishing thickness 13 (shown in FIG. 12) which is thicker than the final thickness 6 in a center part grinding step 102; As shown in FIG. 11, this is the same as the first embodiment except that it includes an outer periphery adsorption step 107 and a full surface grinding step 108 that are performed after the outer periphery grinding step 103.

実施形態3に係る被加工物の研削方法では、研削装置20が、中央部研削ステップ102において被加工物1の中央部8を最終厚み6よりも厚い第1段階仕上げ厚み13まで研削し、外周部研削ステップ103において中央部研削ステップ102終了時の研削砥石32の保持面25からの距離を維持した状態で、第1の研削ホイール30を保持テーブル21に対して保持テーブル21の保持面25の外周領域251に向かって保持面25に沿って相対的に移動させて、被加工物1の外周部9を凹部11の内面側から研削する。なお、第1段階仕上げ厚み13は、外周部9が薄化されて反りが緩和し、保持テーブル21の外周領域251に外周部9を吸引保持することが可能となる被加工物1の厚みである。 In the method for grinding a workpiece according to the third embodiment, the grinding device 20 grinds the center part 8 of the workpiece 1 in the center part grinding step 102 to a first-stage finishing thickness 13 that is thicker than the final thickness 6, and grinds the outer periphery. In the center grinding step 103, the first grinding wheel 30 is moved against the holding surface 25 of the holding table 21 while maintaining the distance from the holding surface 25 of the grinding wheel 32 at the end of the center grinding step 102. The outer circumferential portion 9 of the workpiece 1 is ground from the inner surface side of the recess 11 by relatively moving along the holding surface 25 toward the outer circumferential region 251 . Note that the first stage finishing thickness 13 is the thickness of the workpiece 1 at which the outer circumferential portion 9 is thinned, the warping is alleviated, and the outer circumferential portion 9 can be sucked and held in the outer circumferential region 251 of the holding table 21. be.

実施形態3において、外周吸着ステップ107は、外周部研削ステップ103を開始してから所定のタイミングで、中央領域252の吸引力を維持した状態で、さらに外周領域251に吸引力を発生させ、薄化された被加工物1の外周部9を外周領域251に吸着するステップである。実施形態3において、外周吸着ステップ107では、研削装置20が、所定のタイミングとしての外周部研削ステップ103終了後、開閉弁281を開いた状態で、開閉弁271を開いて保持面25の外周領域251に吸引力を発生させて、図12に示すように、外周領域251に被加工物1の外周部9を吸引保持する。 In the third embodiment, the outer periphery suction step 107 further generates a suction force in the outer periphery area 251 while maintaining the suction force in the central area 252 at a predetermined timing after starting the outer periphery grinding step 103, thereby removing the thin layer. This is a step in which the outer circumferential portion 9 of the processed workpiece 1 is attracted to the outer circumferential region 251. In the third embodiment, in the outer periphery adsorption step 107, after the outer periphery grinding step 103 is completed at a predetermined timing, the grinding device 20 opens the on-off valve 281 and opens the on-off valve 271 to suck the outer periphery of the holding surface 25. A suction force is generated at 251 to suction and hold the outer circumferential portion 9 of the workpiece 1 in the outer circumferential region 251, as shown in FIG.

実施形態3において、全面研削ステップ108は、外周吸着ステップ107の実施後、第1の研削ホイール30と異なる第2の研削ホイール40で被加工物1の裏面7の全面を研削し、被加工物1を所望する最終厚み6まで薄化するステップである。第2の研削ホイール40は、半径が被加工物1の半径よりも大きな円盤状のホイール基台41と、ホイール基台41の外縁部に複数設けられた研削砥石42とを備える。このように、第2の研削ホイール40は、複数の研削砥石42の外縁で構成される円の半径(第2の研削ホイール40の半径に相当)が、被加工物1の半径よりも大きい。 In the third embodiment, the entire surface grinding step 108 includes grinding the entire back surface 7 of the workpiece 1 with a second grinding wheel 40 different from the first grinding wheel 30 after the outer circumferential suction step 107 is performed. 1 to a desired final thickness 6. The second grinding wheel 40 includes a disc-shaped wheel base 41 whose radius is larger than the radius of the workpiece 1, and a plurality of grinding wheels 42 provided on the outer edge of the wheel base 41. Thus, in the second grinding wheel 40, the radius of the circle formed by the outer edges of the plurality of grinding wheels 42 (corresponding to the radius of the second grinding wheel 40) is larger than the radius of the workpiece 1.

実施形態3において、全面研削ステップ108では、研削装置20が、保持テーブル21の軸心と、下端に第2の研削ホイール40を装着したスピンドル43の軸心44とを互いに平行でかつ間隔をあけるとともに、保持テーブル21に保持された被加工物1の裏面7の中央部8の上方に第2の研削ホイール40の研削砥石42を位置付ける。実施形態3において、全面研削ステップ108では、研削装置20が、保持テーブル21を軸心回りに回転させた状態で、第2の研削ホイール40を軸心回りに回転させながら被加工物1に研削水を供給しつつ第2の研削ホイール40を下方に移動させることで被加工物1の裏面7全面を研削する。 In the third embodiment, in the entire surface grinding step 108, the grinding device 20 makes the axial center of the holding table 21 and the axial center 44 of the spindle 43, on which the second grinding wheel 40 is mounted at the lower end, parallel to each other and spaced apart from each other. At the same time, the grinding wheel 42 of the second grinding wheel 40 is positioned above the center portion 8 of the back surface 7 of the workpiece 1 held on the holding table 21 . In the third embodiment, in the entire surface grinding step 108, the grinding device 20 grinds the workpiece 1 while rotating the second grinding wheel 40 about the axis while rotating the holding table 21 about the axis. By moving the second grinding wheel 40 downward while supplying water, the entire back surface 7 of the workpiece 1 is ground.

実施形態3において、全面研削ステップ108では、研削装置20が、図13に示すように、第2の研削ホイール40のホイール基台41の外縁部に設けられた複数の研削砥石42を保持テーブル21に所定の送り速度で近付けることによって、研削砥石42で被加工物1の裏面7の全面を研削する。なお、本発明では、実施形態3よりも研削時間は余分にかかるが、全面研削ステップ108において、研削装置20が第1の研削ホイール30で被加工物1の裏面7全面を研削しても良い。 In the third embodiment, in the entire surface grinding step 108, the grinding device 20 holds the plurality of grinding wheels 42 provided on the outer edge of the wheel base 41 of the second grinding wheel 40 on the holding table 21, as shown in FIG. By approaching the grinding wheel 42 at a predetermined feed rate, the entire back surface 7 of the workpiece 1 is ground with the grinding wheel 42. Note that in the present invention, although the grinding time takes longer than in the third embodiment, the grinding device 20 may grind the entire back surface 7 of the workpiece 1 with the first grinding wheel 30 in the entire surface grinding step 108. .

実施形態3に係る被加工物の研削方法は、中央部研削ステップ102において被加工物1の裏面7の中央部8に凹部11を形成した後に、外周部研削ステップ103において凹部11の内面を被加工物1の外縁に向かって研削するので、被加工物1の外周部9に第1の研削ホイール30が衝突することを抑制でき、外周部9が欠けることを抑制することができる。その結果、実施形態3に係る被加工物の研削方法は、実施形態1と同様に、被加工物1の外周部9に欠けが発生することを抑制することができるという効果を奏する。また、実施形態3は、被加工物1の半径以上の半径を有する第2の研削ホイール40で全面研削をすることで保持面25と第2の研削ホイール40とを相対的に移動させて研削しなくても全面を研削する事ができる。よって、被加工物1の半径よりも外径が小さい第1の研削ホイール30で被加工物1の全面を最終厚み6まで研削すると比べて研削時間を削減出来る効果がある。 In the method for grinding a workpiece according to the third embodiment, after forming a recess 11 in the center part 8 of the back surface 7 of the workpiece 1 in a center part grinding step 102, the inner surface of the recess 11 is covered in an outer peripheral part grinding step 103. Since grinding is performed toward the outer edge of the workpiece 1, collision of the first grinding wheel 30 with the outer circumference 9 of the workpiece 1 can be suppressed, and chipping of the outer circumference 9 can be suppressed. As a result, the method for grinding a workpiece according to the third embodiment has the effect of suppressing the occurrence of chipping in the outer peripheral portion 9 of the workpiece 1, similarly to the first embodiment. In addition, in the third embodiment, the second grinding wheel 40 having a radius greater than or equal to the radius of the workpiece 1 performs the entire surface grinding, thereby moving the holding surface 25 and the second grinding wheel 40 relatively. You can grind the entire surface without having to do so. Therefore, compared to grinding the entire surface of the workpiece 1 to the final thickness 6 using the first grinding wheel 30 whose outer diameter is smaller than the radius of the workpiece 1, the grinding time can be reduced.

なお、本発明では、実施形態3において、研削装置20が、最初の中央部研削ステップ102において被加工物1の中央部8を第1段階仕上げ厚み13よりも厚い所定厚み12まで研削するなどして、実施形態2と同様に、中央部研削ステップ102と外周部研削ステップ103とを複数回繰り返し実施しても良い。 In addition, in the present invention, in the third embodiment, the grinding device 20 grinds the center part 8 of the workpiece 1 to a predetermined thickness 12 that is thicker than the first stage finishing thickness 13 in the first center part grinding step 102. Similarly to the second embodiment, the central part grinding step 102 and the outer peripheral part grinding step 103 may be repeated multiple times.

また、本発明では、実施形態1から3において、外周部研削ステップ103の実施中(所定のタイミングに相当)に、外周吸着ステップ107を実施しても良い。特に、本発明は、中央部研削ステップ102と外周部研削ステップ103とを複数回繰り返し実施する際には、これらを所定回実施した後(所定のタイミングに相当)に、外周吸着ステップ107を実施しても良い。 Further, in the present invention, in Embodiments 1 to 3, the outer periphery suction step 107 may be performed during the outer periphery grinding step 103 (corresponding to a predetermined timing). In particular, in the present invention, when repeating the central part grinding step 102 and the outer peripheral part grinding step 103 multiple times, the outer peripheral adsorption step 107 is performed after performing these a predetermined number of times (corresponding to a predetermined timing). You may do so.

〔変形例〕
本発明の実施形態1、実施形態2及び実施形態3の変形例に係る被加工物の研削方法を図面に基づいて説明する。図14は、実施形態1、実施形態2及び実施形態3の変形例に係る被加工物の研削方法の保持ステップを一部断面で模式的に示す側面図である。なお、図14は、実施形態1と同一部分に同一符号を付して説明を省略する。
[Modified example]
A method for grinding a workpiece according to a modification of Embodiment 1, Embodiment 2, and Embodiment 3 of the present invention will be described based on the drawings. FIG. 14 is a side view schematically showing, partially in cross section, a holding step of a method for grinding a workpiece according to a modification of Embodiment 1, Embodiment 2, and Embodiment 3. In addition, in FIG. 14, the same parts as in Embodiment 1 are given the same reference numerals, and the description thereof will be omitted.

変形例に係る被加工物の研削方法は、保持テーブル21が、ポーラス部材22内に隔壁部材26が埋設されることなく、保持面25が中央領域252と外周領域251とに区画されていないとともに、保持面25と吸引源29に接続する吸引経路28-1を一つのみ設けている事以外、実施形態1と同じである。吸引経路28-1は、開閉弁281-1を設けている。 In the method of grinding a workpiece according to the modified example, the holding table 21 has no partition wall member 26 embedded in the porous member 22, and the holding surface 25 is not divided into a central region 252 and an outer peripheral region 251. , is the same as the first embodiment except that only one suction path 28-1 connecting the holding surface 25 and the suction source 29 is provided. The suction path 28-1 is provided with an on-off valve 281-1.

変形例において、保持ステップ101では、表面3に支持部材10が貼着された被加工物1が研削装置20の保持テーブル21の保持面25に載置される。このとき、実施形態1と同様に、外周領域251上に被加工物1の外周部9が位置し、中央領域252上に被加工物1の中央部8が位置する。実施形態1において、保持ステップ101では、研削装置20が、開閉弁281-1を開いて、保持面25全体に吸引力を発生させて、反った被加工物1の場合、図14に示すように、中央部8を中央領域252に吸引保持する。なお、変形例において、実施形態3のように、全面研削ステップ108を実施する際には、外周吸着ステップ107を実施しない。 In the modification, in the holding step 101 , the workpiece 1 with the support member 10 attached to the surface 3 is placed on the holding surface 25 of the holding table 21 of the grinding device 20 . At this time, similarly to Embodiment 1, the outer peripheral portion 9 of the workpiece 1 is located on the outer peripheral region 251, and the center portion 8 of the workpiece 1 is located on the central region 252. In the first embodiment, in the holding step 101, the grinding device 20 opens the on-off valve 281-1 to generate a suction force on the entire holding surface 25, and in the case of a warped workpiece 1, as shown in FIG. Then, the central portion 8 is held in the central region 252 by suction. In addition, in a modification, when carrying out the whole surface grinding step 108 like Embodiment 3, the outer periphery suction step 107 is not carried out.

変形例に係る被加工物の研削方法は、中央部研削ステップ102において被加工物1の裏面7の中央部8に凹部11を形成した後に、外周部研削ステップ103において凹部11の内面を被加工物1の外縁に向かって研削するので、被加工物1の外周部9に第1の研削ホイール30が衝突することを抑制でき、外周部9が欠けることを抑制することができる。その結果、変形例に係る被加工物の研削方法は、実施形態1と同様に、被加工物1の外周部9に欠けが発生することを抑制することができるという効果を奏する。 In the method for grinding a workpiece according to the modified example, after forming a recess 11 in the center part 8 of the back surface 7 of the workpiece 1 in a central part grinding step 102, the inner surface of the recess 11 is processed in an outer peripheral part grinding step 103. Since the object 1 is ground toward the outer edge, it is possible to prevent the first grinding wheel 30 from colliding with the outer circumferential portion 9 of the workpiece 1, and to prevent the outer circumferential portion 9 from chipping. As a result, the method for grinding a workpiece according to the modified example has the effect of suppressing the occurrence of chipping in the outer peripheral portion 9 of the workpiece 1, as in the first embodiment.

また、変形例に係る被加工物の研削方法は、保持ステップ101において保持面25全体に吸引力を発生させるので、外周部研削ステップ103において外周部9を研削して反りを緩和すると保持面25に被加工物1の外周部9も吸引保持することが可能となる。その結果、変形例に係る被加工物の研削方法は、被加工物1の外周部9に第1の研削ホイール30が衝突することを抑制でき、外周部9が欠けることを抑制することができる。 In addition, in the method for grinding a workpiece according to the modified example, suction force is generated on the entire holding surface 25 in the holding step 101, so when the outer circumferential portion 9 is ground in the outer circumferential portion grinding step 103 to alleviate the warp, the holding surface 25 Also, the outer peripheral portion 9 of the workpiece 1 can be held by suction. As a result, the method for grinding a workpiece according to the modified example can prevent the first grinding wheel 30 from colliding with the outer circumference 9 of the workpiece 1, and can suppress chipping of the outer circumference 9. .

なお、本発明の実施形態においては反った被加工物1を対象として説明したが、本発明は反っていない被加工物1でも有効である。これは、被加工物1の反りに限らず、通常被加工物1の外縁は丸みを帯びた形状に面取りされており、保持面25からわずかに浮いており、研削中に研削水の侵入や研削ホイールの衝突によってもばたつきやすくなっていることや、事前に面取り部が除去された被加工物1であっても外周部から研削ホイールが衝突していくことで外周部を起点に被加工物1に欠けが発生する恐れがあるからである。よって被加工物1の中央部8に凹部11を形成し、凹部11の内面に研削ホイールを当てて研削領域を広げて外周部9を研削する本発明は、外周部9から研削ホイールが接触しないため、保持力が不安定な外周部9を起点に被加工物1が損傷することを防げるためである。なお、本発明は、上記実施形態に等限定されるものではない。即ち、本発明の骨子を逸脱しない範囲で種々変形して実施することができる。 Note that although the embodiment of the present invention has been described with reference to a warped workpiece 1, the present invention is also effective for a workpiece 1 that is not warped. This is not limited to warping of the workpiece 1, but the outer edge of the workpiece 1 is usually chamfered into a rounded shape and is slightly lifted from the holding surface 25, which prevents grinding water from entering during grinding. The grinding wheel is likely to flutter due to collisions, and even if the workpiece 1 has had its chamfered portion removed in advance, the grinding wheel will collide with it from the outer periphery, causing the workpiece to start from the outer periphery. This is because there is a risk that chipping may occur in 1. Therefore, in the present invention, in which a recess 11 is formed in the center part 8 of the workpiece 1 and the grinding wheel is applied to the inner surface of the recess 11 to widen the grinding area and grind the outer peripheral part 9, the grinding wheel does not come into contact with the outer peripheral part 9. This is because it is possible to prevent the workpiece 1 from being damaged starting from the outer peripheral portion 9 where the holding force is unstable. Note that the present invention is not limited to the above embodiments. That is, various modifications can be made without departing from the gist of the invention.

1 被加工物
6 最終厚み(所定厚み)
8 中央部
9 外周部
11 凹部
12 所定厚み
21 保持テーブル
25 保持面
27,28 吸引経路
29 吸引源
30 第1の研削ホイール
40 第2の研削ホイール
101 保持ステップ
102 中央部研削ステップ
103 外周部研削ステップ
107 外周吸着ステップ
108 全面研削ステップ
251 外周領域
252 中央領域
1 Workpiece 6 Final thickness (predetermined thickness)
8 Central part 9 Peripheral part 11 Recessed part 12 Predetermined thickness 21 Holding table 25 Holding surface 27, 28 Suction path 29 Suction source 30 First grinding wheel 40 Second grinding wheel 101 Holding step 102 Central part grinding step 103 Outer peripheral part grinding step 107 Outer periphery suction step 108 Full surface grinding step 251 Outer periphery area 252 Central area

Claims (6)

被加工物の研削方法であって、
保持テーブルに被加工物を保持する保持ステップと、
外径が被加工物より小さい第1の研削ホイールで、被加工物の中央部を所定厚みまで研削し凹部を形成する中央部研削ステップと、
該中央部研削ステップの実施後、該第1の研削ホイールを該凹部から該保持テーブルの保持面の外周領域に相対的に移動させ、該凹部を囲繞する被加工物の外周部を研削する外周部研削ステップと、
を備えることを特徴とする被加工物の研削方法。
A method for grinding a workpiece, the method comprising:
a holding step for holding the workpiece on a holding table;
a center part grinding step of grinding the center part of the workpiece to a predetermined thickness using a first grinding wheel having an outer diameter smaller than the workpiece to form a recess;
After performing the central part grinding step, the first grinding wheel is moved from the recess relatively to the outer peripheral area of the holding surface of the holding table to grind the outer peripheral part of the workpiece surrounding the recess. part grinding step;
A method for grinding a workpiece, comprising:
該保持テーブルは、
該外周部を保持する外周領域と、該中央部を保持する中央領域と、に区画された保持面と、
該外周領域と、該中央領域と、をそれぞれ独立して吸引源に接続する吸引経路と、を有し、
該保持ステップは、該中央領域に吸引力を発生させ、被加工物の該中央部を保持することを特徴とする請求項1に記載の被加工物の研削方法。
The holding table is
a holding surface partitioned into an outer peripheral area that holds the outer peripheral part and a central area that holds the central part;
a suction path that independently connects the outer peripheral region and the central region to a suction source;
2. The method of grinding a workpiece according to claim 1, wherein the holding step includes generating a suction force in the central region to hold the central portion of the workpiece.
該中央部研削ステップと、該外周部研削ステップと、を繰り返し実施することを特徴とする請求項1に記載の被加工物の研削方法。 2. The method of grinding a workpiece according to claim 1, wherein the central portion grinding step and the outer peripheral portion grinding step are repeatedly performed. 該外周部研削ステップを開始してから所定のタイミングで、該中央領域の吸引力を維持した状態で、さらに該外周領域に吸引力を発生させ、薄化された被加工物の該外周部を該外周領域に吸着する外周吸着ステップと、
該外周吸着ステップの実施後、該第1の研削ホイールまたは該第1の研削ホイールと異なる第2の研削ホイールで被加工物の全面を研削し、被加工物を所望する最終厚みまで薄化する全面研削ステップと、
を備えることを特徴とする請求項2に記載の被加工物の研削方法。
At a predetermined timing after starting the outer periphery grinding step, while maintaining the suction force in the central area, a suction force is further generated in the outer periphery to grind the thinned outer periphery of the workpiece. an outer periphery adsorption step of adhering to the outer periphery area;
After performing the outer circumferential suction step, the entire surface of the workpiece is ground with the first grinding wheel or a second grinding wheel different from the first grinding wheel, and the workpiece is thinned to a desired final thickness. Full-face grinding step,
The method for grinding a workpiece according to claim 2, further comprising:
該第1の研削ホイールは、該中央領域よりも外径が小さいことを特徴とする請求項2に記載の被加工物の研削方法。 3. The method of grinding a workpiece according to claim 2, wherein the first grinding wheel has a smaller outer diameter than the central region. 該全面研削ステップで使用する第2の研削ホイールは、該第1の研削ホイールよりも外径が大きいことを特徴とする請求項4に記載の被加工物の研削方法。 5. The method of grinding a workpiece according to claim 4, wherein the second grinding wheel used in the entire surface grinding step has a larger outer diameter than the first grinding wheel.
JP2022090505A 2022-06-02 2022-06-02 Grinding method of workpiece Pending JP2023177697A (en)

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