JP2023159921A - Antireflection hard coat film - Google Patents
Antireflection hard coat film Download PDFInfo
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- JP2023159921A JP2023159921A JP2022069851A JP2022069851A JP2023159921A JP 2023159921 A JP2023159921 A JP 2023159921A JP 2022069851 A JP2022069851 A JP 2022069851A JP 2022069851 A JP2022069851 A JP 2022069851A JP 2023159921 A JP2023159921 A JP 2023159921A
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 13
- 239000011347 resin Substances 0.000 claims abstract description 13
- 239000011230 binding agent Substances 0.000 claims abstract description 10
- 239000010419 fine particle Substances 0.000 claims abstract description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000002156 mixing Methods 0.000 claims description 10
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 229920000570 polyether Polymers 0.000 claims description 6
- YTLYLLTVENPWFT-UPHRSURJSA-N (Z)-3-aminoacrylic acid Chemical compound N\C=C/C(O)=O YTLYLLTVENPWFT-UPHRSURJSA-N 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims 1
- 210000002268 wool Anatomy 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 3
- 238000003475 lamination Methods 0.000 abstract 1
- 239000011342 resin composition Substances 0.000 description 35
- 239000010410 layer Substances 0.000 description 22
- 239000007787 solid Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000003999 initiator Substances 0.000 description 9
- 125000000524 functional group Chemical group 0.000 description 8
- 239000002245 particle Substances 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 238000005299 abrasion Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- -1 methacryloyl group Chemical group 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 238000004383 yellowing Methods 0.000 description 3
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 2
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical compound OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000005058 Isophorone diisocyanate Substances 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 229940105990 diglycerin Drugs 0.000 description 2
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 239000005056 polyisocyanate Substances 0.000 description 2
- 229920001228 polyisocyanate Polymers 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- FKTHNVSLHLHISI-UHFFFAOYSA-N 1,2-bis(isocyanatomethyl)benzene Chemical class O=C=NCC1=CC=CC=C1CN=C=O FKTHNVSLHLHISI-UHFFFAOYSA-N 0.000 description 1
- KCZQSKKNAGZQSZ-UHFFFAOYSA-N 1,3,5-tris(6-isocyanatohexyl)-1,3,5-triazin-2,4,6-trione Chemical compound O=C=NCCCCCCN1C(=O)N(CCCCCCN=C=O)C(=O)N(CCCCCCN=C=O)C1=O KCZQSKKNAGZQSZ-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- HEQOJEGTZCTHCF-UHFFFAOYSA-N 2-amino-1-phenylethanone Chemical compound NCC(=O)C1=CC=CC=C1 HEQOJEGTZCTHCF-UHFFFAOYSA-N 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 150000001925 cycloalkenes Chemical class 0.000 description 1
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003550 marker Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 229940105570 ornex Drugs 0.000 description 1
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
本発明は、外部光源の反射が少なく視認性が良好であり、また耐擦傷性に優れる反射防止ハードコートフィルムに関する。 The present invention relates to an antireflection hard-coated film that has low reflection from an external light source, good visibility, and excellent scratch resistance.
反射防止ハードコートフィルムは、蛍光灯などの外部光源の反射が少なく視認性が良好であるという特徴から、液晶ディスプレイや有機ELディスプレイなどに代表される画像表示装置で広く使用されている。特にタッチパネルなどのように、画像表示面を指で触る場合や、タッチペンで入力する場合は、外部光源の反射率を低くすると共に、より高い耐摩耗性や耐擦傷性が要求されるようになってきている。 Antireflection hard coat films are widely used in image display devices, such as liquid crystal displays and organic EL displays, because of their low reflection from external light sources such as fluorescent lamps and good visibility. In particular, when touching the image display surface with a finger or inputting with a touch pen, such as on a touch panel, it is necessary to lower the reflectance of the external light source and to have higher abrasion and scratch resistance. It's coming.
反射防止ハードコートフィルムとしては、フィルム基材の表面にハードコート層を設け、その上層に低屈折率の反射防止層を配置する構成が一般的であり、屈折率を低くするためには、屈折率1.0の空気を内包する中空シリカなどを配合することがよく知られている。こうした低屈折率の樹脂として例えば、シリコーングラフトアクリルポリマーとメタアクリロイル基を有する化合物と中空のコロイダルシリカを含有する組成物が提案されている(特許文献1)。 Anti-reflection hard-coated films generally have a structure in which a hard-coat layer is provided on the surface of the film base material, and an anti-reflection layer with a low refractive index is placed on top of the hard-coat layer. It is well known to include hollow silica containing air with a ratio of 1.0. As such a low refractive index resin, for example, a composition containing a silicone-grafted acrylic polymer, a compound having a methacryloyl group, and hollow colloidal silica has been proposed (Patent Document 1).
しかしながら、空隙を形成している低屈折率層は耐摩耗性が低下しやすく、上記配合についても耐摩耗性に優れるとは言うものの、スチールウールを用いた耐擦傷性評価では500g/cm2の荷重で10往復させるレベルでの評価であり、耐擦傷性という点においては十分とは言えなかった。そのため、反射率が低く視認性が良好で、スチールウールを用いた摩擦でも十分な耐擦傷性を有する反射防止フィルムが求められていた。 However, the abrasion resistance of the low refractive index layer that forms voids tends to decrease, and although the above formulation has excellent abrasion resistance, the scratch resistance was evaluated using steel wool at a load of 500 g/cm2. The evaluation was based on 10 reciprocations, and it could not be said that the scratch resistance was sufficient. Therefore, there has been a need for an antireflection film that has low reflectance, good visibility, and sufficient scratch resistance even when rubbed with steel wool.
本発明の課題は、外部光源の反射が少なく視認性が良好であると共に、スチールウールを用いて摩擦しても、十分な耐擦傷性を有する反射防止ハードコートフィルムを提供することにある。 An object of the present invention is to provide an antireflection hard coat film that has good visibility with little reflection from an external light source and has sufficient scratch resistance even when rubbed with steel wool.
上記の課題を解決するため、請求項1の発明は、光透過性を有する基材フィルムにハードコート層、低屈折率層がこの順番で積層されており、前記低屈折率層はバインダー樹脂(A)と、中空シリカ微粒子(B)と、アミン変性(メタ)アクリレート(C)と、アルミナ微粒子(D)と、を含み、前記(C)の配合量が前記(A)100重量部に対し8~25重量部であることを特徴とする反射防止ハードコートフィルムを提供する。 In order to solve the above problem, the invention according to claim 1 is such that a hard coat layer and a low refractive index layer are laminated in this order on a base film having light transmittance, and the low refractive index layer is made of a binder resin ( A), hollow silica fine particles (B), amine-modified (meth)acrylate (C), and alumina fine particles (D), and the amount of the above (C) is based on 100 parts by weight of the above (A). Provided is an antireflection hard coat film characterized in that the amount is 8 to 25 parts by weight.
請求項2の発明は、前記(C)がアミン変性ポリエーテル(メタ)アクリレート及び/又はアミノアクリレートであることを特徴とする請求項1記載の反射防止ハードコートフィルムを提供する。 The invention according to claim 2 provides the antireflection hard coat film according to claim 1, wherein the (C) is an amine-modified polyether (meth)acrylate and/or an aminoacrylate.
請求項3の発明は、前記(D)の配合量が、(A)100重量部に対し30~100部であることを特徴とする請求項1又は2いずれか記載の反射防止ハードコートフィルムを提供する。 The invention according to claim 3 provides the antireflection hard coat film according to claim 1 or 2, wherein the amount of (D) is 30 to 100 parts by weight per 100 parts by weight of (A). provide.
請求項4の発明は、更に低屈折率層にレベリング剤(E)を含むことを特徴とする請求項1又は2いずれか記載の反射防止ハードコートフィルムを提供する。 The invention according to claim 4 provides the antireflection hard coat film according to claim 1 or 2, further comprising a leveling agent (E) in the low refractive index layer.
本発明のハードコートフィルムは、外部光源の反射が少なく視認性が良好であると共に、スチールウールのような硬度の高い素材を用いて摩擦した場合でも、良好な耐擦傷性を有しているため、画像表示装置用の反射防止フィルムとして有用である。 The hard coat film of the present invention has good visibility with little reflection from external light sources, and also has good scratch resistance even when rubbed with a highly hard material such as steel wool. , is useful as an antireflection film for image display devices.
本発明の反射防止ハードコートフィルムは、ハードコート(以下HCという)層を形成するためのHC樹脂組成物と、低屈折率層を形成するための低屈折率樹脂組成物の2種類を用いて製造される。低屈折率樹脂組成物はバインダー樹脂(A)と、中空シリカ微粒子(B)と、アミン変性(メタ)アクリレート(C)と、アルミナ微粒子(D)と、を含む組成物である。なお、本明細書において(メタ)アクリレートは、アクリレートとメタクリレートとの双方を包含する。 The antireflection hard coat film of the present invention uses two types of resin compositions: an HC resin composition for forming a hard coat (hereinafter referred to as HC) layer and a low refractive index resin composition for forming a low refractive index layer. Manufactured. The low refractive index resin composition is a composition containing a binder resin (A), hollow silica particles (B), amine-modified (meth)acrylate (C), and alumina particles (D). Note that (meth)acrylate in this specification includes both acrylate and methacrylate.
本発明で使用するバインダー樹脂(A)は、前記(B)と(D)を分散させ低屈折率層を形成する主要樹脂であり、例えばウレタン(メタ)アクリレート、エポキシ(メタ)アクリレート、ポリエステル(メタ)アクリレート、ポリカーボネート(メタ)アクリレート、アクリル系(メタ)アクリレート、ジエン系(メタ)アクリレート等のオリゴマーが挙げられ、また低分子量バインダーとしては、脂肪族、脂環族、ポリエーテル骨格、水酸基及びアミノ基等の官能基を有する(メタ)アクリレート等を挙げることができ、単独あるいは2種類以上を組み合わせて使用することができる。 The binder resin (A) used in the present invention is a main resin that disperses the above (B) and (D) to form a low refractive index layer, and includes, for example, urethane (meth)acrylate, epoxy (meth)acrylate, polyester ( Examples include oligomers such as meth)acrylate, polycarbonate (meth)acrylate, acrylic (meth)acrylate, and diene (meth)acrylate. Examples of low molecular weight binders include aliphatic, alicyclic, polyether skeletons, hydroxyl groups and Examples include (meth)acrylates having a functional group such as an amino group, which can be used alone or in combination of two or more types.
前記(A)の配合量は、樹脂組成物の固形分全量に対し10~30重量%が好ましく、15~25重量%が更に好ましく、18~23重量%が特に好ましい。10重量%以上とすることで十分な皮膜硬化性が確保でき、30重量%以下とすることで反射率を低くし、十分な耐擦傷性を確保することができる。 The blending amount of (A) is preferably 10 to 30% by weight, more preferably 15 to 25% by weight, particularly preferably 18 to 23% by weight based on the total solid content of the resin composition. When the content is 10% by weight or more, sufficient film hardening properties can be ensured, and when the content is 30% by weight or less, the reflectance can be lowered and sufficient scratch resistance can be ensured.
本発明で使用する中空シリカ微粒子(B)は、低屈折率層の屈折率を低下させる目的で配合する。(B)は低屈折率層の塗膜強度を保持しつつ、その屈折率を下げる機能を有し、内部に屈折率1の空気を含む空洞を有するシリカ粒子である。中実シリカ粒子の屈折率が1.45程度に対し、(B)の屈折率は内部の空洞の占有率が高くなるにつれて低下し、1.15~1.40程度である。 The hollow silica fine particles (B) used in the present invention are blended for the purpose of lowering the refractive index of the low refractive index layer. (B) is a silica particle that has a function of lowering the refractive index of the low refractive index layer while maintaining its coating strength, and has a cavity containing air with a refractive index of 1 inside. While the refractive index of solid silica particles is about 1.45, the refractive index of (B) decreases as the occupancy of internal cavities increases, and is about 1.15 to 1.40.
前記(B)の一次平均粒子径は5~100nmが好ましく、20~80nmが更に好ましく、40~70nmが特に好ましい。この範囲とすることで、低屈折率層の透明性を損なうことなく、良好な分散性を得られる。特に40~70nmであれば、強度不足とならない外殻の厚みを確保しつつ、空洞の占有率を上げて屈折率を下げることができる。なお平均粒子径は、JISZ8825-1に準拠したレーザー回折・散乱法により測定したメジアン径(d=50)とする。 The average primary particle diameter of (B) is preferably 5 to 100 nm, more preferably 20 to 80 nm, and particularly preferably 40 to 70 nm. By setting it as this range, good dispersibility can be obtained without impairing the transparency of a low refractive index layer. In particular, if the thickness is 40 to 70 nm, it is possible to increase the cavity occupancy and lower the refractive index while ensuring a thickness of the outer shell that does not cause insufficient strength. Note that the average particle diameter is the median diameter (d=50) measured by a laser diffraction/scattering method in accordance with JIS Z8825-1.
前記(B)の配合量は、樹脂組成物の固形分全量に対し30~50重量%が好ましく、35~45重量%が更に好ましい。30重量%以上とすることで屈折率を十分低くすることができ、50重量%以下とすることで十分な耐擦傷性を確保することができる。市販品としてはスルーリア2320(商品名:日揮触媒化成社製、固形分20.5%、一次平均粒子径50nm)が挙げられる。 The blending amount of (B) is preferably 30 to 50% by weight, more preferably 35 to 45% by weight based on the total solid content of the resin composition. By setting the content to 30% by weight or more, the refractive index can be made sufficiently low, and by setting the content to 50% by weight or less, sufficient scratch resistance can be ensured. As a commercially available product, Sururia 2320 (trade name: manufactured by JGC Catalysts & Chemicals Co., Ltd., solid content 20.5%, primary average particle diameter 50 nm) may be mentioned.
本発明で使用するアミン変性(メタ)アクリレート(C)は、少なくとも1つのアミノ基と、少なくとも1つのアクリロイル基またはメタクリロイル基とを有する化合物で、紫外線硬化時の酸素による重合阻害を緩和し、硬化度を向上させる目的で配合する。酸素による硬化阻害を回避するためには、窒素等の不活性ガスによる環境下で露光する方法がよく知られているが、高速搬送されるような生産プロセスでは、被露光物に付着した酸素の影響を完全になくすことが難しいとされ、(C)の配合と組み合わせることで格段に硬化性が向上する。アミノ基は、第1級アミノ基、第2級アミノ基、第3級アミノ基のいずれでもよいが、硬化促進性の点で3級アミノ基が好ましい。 The amine-modified (meth)acrylate (C) used in the present invention is a compound having at least one amino group and at least one acryloyl group or methacryloyl group, which alleviates polymerization inhibition caused by oxygen during ultraviolet curing and cures. It is blended for the purpose of improving the strength. In order to avoid curing inhibition caused by oxygen, it is well known to expose in an environment using an inert gas such as nitrogen, but in production processes where the exposed object is transported at high speed, It is said that it is difficult to completely eliminate this effect, and by combining it with (C), the curability is significantly improved. The amino group may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but a tertiary amino group is preferred from the viewpoint of curing acceleration.
前記(C)としては、例えば、アミノ(メタ)アクリレート、アミン変性脂肪族(メタ)アクリレート、アミン変性ポリエーテル(メタ)アクリレート、アミン変性ポリエステル(メタ)アクリレート、アミン変性エポキシ(メタ)アクリレート、アミン変性ウレタン(メタ)アクリレート等が挙げられ、単独あるいは2種類以上を組み合わせて使用することができる。これらの中では、反応性が高い点でアミン変性ポリエーテル(メタ)アクリレートが、また重合促進効果が高い点でアミノ(メタ)アクリレートが好ましい。 Examples of (C) include amino (meth)acrylate, amine-modified aliphatic (meth)acrylate, amine-modified polyether (meth)acrylate, amine-modified polyester (meth)acrylate, amine-modified epoxy (meth)acrylate, and amine. Examples include modified urethane (meth)acrylate, which can be used alone or in combination of two or more types. Among these, amine-modified polyether (meth)acrylate is preferred because of its high reactivity, and amino (meth)acrylate is preferred because it has a high polymerization promoting effect.
前記(C)の官能基数は2~8官能が好ましく、2~6官能が更に好ましく、2~4官能が特に好ましい。この範囲とすることで、硬化収縮を大きくすることなく、表面硬度や耐擦傷性を向上させることができる。 The number of functional groups in (C) is preferably 2 to 8 functional groups, more preferably 2 to 6 functional groups, and particularly preferably 2 to 4 functional groups. By setting it as this range, surface hardness and abrasion resistance can be improved without increasing curing shrinkage.
前記(C)の配合量は、(A)100重量部に対し8~25重量部であり、10~20重量部が好ましく、12~18重量部が更に好ましい。8重量部未満では耐擦傷性が低下する傾向があり、25重量部超でも同様に耐擦傷性が低下したり、経時的に黄変が発現したりする傾向がある。また樹脂組成物の固形分全量に対する配合量は、1.5~5.5重量%が好ましく、2.0~4.5重量%が更に好ましく、2.5~4.0重量%が特に好ましい。 The blending amount of (C) is 8 to 25 parts by weight, preferably 10 to 20 parts by weight, and more preferably 12 to 18 parts by weight, based on 100 parts by weight of (A). If it is less than 8 parts by weight, scratch resistance tends to decrease, and if it exceeds 25 parts by weight, scratch resistance tends to decrease or yellowing occurs over time. Further, the blending amount based on the total solid content of the resin composition is preferably 1.5 to 5.5% by weight, more preferably 2.0 to 4.5% by weight, and particularly preferably 2.5 to 4.0% by weight. .
本発明で使用するアルミナ微粒子(D)は、低屈折率層の硬度を上げて耐擦傷性を向上させる目的で配合する。(D)の一次平均粒子径は1~100nmが好ましく、5~50nmが更に好ましく、10~30nmが特に好ましい。1nm以上とすることで耐擦傷性の向上が期待でき、100nm以下とすることでヘイズを高くすることなく十分な全光線透過率を確保することができる。 The alumina fine particles (D) used in the present invention are blended for the purpose of increasing the hardness of the low refractive index layer and improving the scratch resistance. The average primary particle diameter of (D) is preferably 1 to 100 nm, more preferably 5 to 50 nm, and particularly preferably 10 to 30 nm. When the thickness is 1 nm or more, an improvement in scratch resistance can be expected, and when the thickness is 100 nm or less, sufficient total light transmittance can be ensured without increasing the haze.
前記(D)の配合量は、(A)100重量部に対し40~85重量部が好ましく、45~80重量部が更に好ましく、55~70重量部が特に好ましい。40重量部以上とすることで十分な耐摩耗性を確保することができ、85重量部以下とすることで十分に反射率を低く保つことができる。また樹脂組成物の固形分全量に対する配合量は、5~25重量%が好ましく、8~20重量%が更に好ましく、10~18重量%が特に好ましい。市販品としてはALMIBK-M47(商品名:CIKナノテック社製、固形分15%、平均粒子径20nm)が挙げられる。 The blending amount of (D) is preferably 40 to 85 parts by weight, more preferably 45 to 80 parts by weight, and particularly preferably 55 to 70 parts by weight, based on 100 parts by weight of (A). When the amount is 40 parts by weight or more, sufficient wear resistance can be ensured, and when it is 85 parts by weight or less, the reflectance can be kept sufficiently low. Further, the blending amount based on the total solid content of the resin composition is preferably 5 to 25% by weight, more preferably 8 to 20% by weight, and particularly preferably 10 to 18% by weight. A commercially available product includes ALMIBK-M47 (trade name: manufactured by CIK Nanotech, solid content 15%, average particle size 20 nm).
本発明では更にレベリング剤(E)を配合することが好ましい。(E)を配合することで、低屈折率層のスリップ性を向上させて耐摩耗性を向上させると共に、撥水撥由性を上げて防汚性を向上させることができる。例えばシリコーン系、フッ素系、アクリル系等が挙げられるが、硬化後の皮膜からブリード等により経時的に欠落することが無く効果を長期的に持続できる点で、バインダー樹脂と重合して硬化塗膜を形成できる反応性官能基を有することが好ましい。特にフッ素系シリコーン化合物が、低い表面自由エネルギーにより、塗工~乾燥後に塗膜表面に偏析しやすく、耐摩耗性及び防汚性を長期にわたり安定化させることができる点で好ましい。 In the present invention, it is preferable to further include a leveling agent (E). By blending (E), it is possible to improve the slip property of the low refractive index layer and improve the abrasion resistance, and also to improve the water repellency and stain resistance. For example, silicone-based, fluorine-based, acrylic-based, etc. can be mentioned, but they can be used to polymerize with binder resin and form a cured coating because they do not come off over time due to bleeding etc. after curing and can maintain their effects over a long period of time. It is preferable to have a reactive functional group capable of forming . In particular, fluorine-based silicone compounds are preferred because their low surface free energy makes them easy to segregate on the coating surface after coating and drying, and can stabilize wear resistance and antifouling properties over a long period of time.
前記(E)の配合量は、樹脂組成物の固形分全量に対し30重量%以下が好ましく、10~28重量%が更に好ましく、15~25重量%が特に好ましい。特に10重量%以上とすることで耐摩耗性と防汚性を向上させることが期待でき、30重量%以下とすることで十分な硬化性を確保することができる。市販品としてはX-71-1203M(商品名:信越化学工業社製、固形分20%、反応性官能基を有するフッ素系シリコーン化合物)が挙げられる。 The blending amount of (E) is preferably 30% by weight or less, more preferably 10 to 28% by weight, and particularly preferably 15 to 25% by weight based on the total solid content of the resin composition. In particular, when the content is 10% by weight or more, it can be expected to improve wear resistance and antifouling properties, and when the content is 30% by weight or less, sufficient curability can be ensured. A commercially available product includes X-71-1203M (trade name: manufactured by Shin-Etsu Chemical Co., Ltd., solid content 20%, fluorine-based silicone compound having a reactive functional group).
本発明の低屈折率層の下層に位置するHC層を形成するためのHC樹脂組成物としては、バインダーとして多官能ウレタン(メタ)アクリレート(以下多官能ウレアク)を含むことが好ましい。 The HC resin composition for forming the HC layer located below the low refractive index layer of the present invention preferably contains polyfunctional urethane (meth)acrylate (hereinafter referred to as polyfunctional ureac) as a binder.
前記HC樹脂組成物に含むことが好ましい多官能ウレアクは、ウレタン結合に由来する水素結合の凝集力により優れた耐擦傷性を有する。例えばポリイソシアネートと水酸基を有する(メタ)アクリレートとの反応で得ることができる。使用するポリイソシアネートとしては、例えばヘキサメチレンジイソシアネート(以下HDI)、イソホロンジイソシアネート、ジフェニルメタンジイソシアネート、トリレンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアネート、水添キシリレンジイソシアネート、メチルシクロヘキシレンジイソシアネート、HDIイソシアヌレート体、IPDIイソシアヌレート体などがあり、これらを単独で用いてもよいし2種以上を併用してもよい。これらの中では耐候性が高く黄変しにくい脂肪族及び脂環族のジイソシアネートが好ましく、特にそれらの中では延伸性が高いHDIが好ましい。 The polyfunctional ureac preferably included in the HC resin composition has excellent scratch resistance due to the cohesive force of hydrogen bonds derived from urethane bonds. For example, it can be obtained by reacting polyisocyanate with (meth)acrylate having a hydroxyl group. Examples of the polyisocyanate to be used include hexamethylene diisocyanate (hereinafter HDI), isophorone diisocyanate, diphenylmethane diisocyanate, tolylene diisocyanate, dicyclohexylmethane-4,4'-diisocyanate, hydrogenated xylylene diisocyanate, methylcyclohexylene diisocyanate, HDI isocyanurate. and IPDI isocyanurate, and these may be used alone or in combination of two or more. Among these, aliphatic and alicyclic diisocyanates that have high weather resistance and are resistant to yellowing are preferred, and among these, HDI is particularly preferred because of its high stretchability.
前記多官能ウレアクにおいて使用する水酸基を有する(メタ)アクリレートとしては、例えば2官能ではトリメチロールプロパンジ(メタ)アクリレート、グリセリンジ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレート、ジグリセリンジ(メタ)アクリレート、ジトリメチロールプロパンジ(メタ)アクリレート、ジペンタエリスリトールジ(メタ)アクリレートなどが、3官能以上ではジグリセリントリ(メタ)アクリレート、ジトリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレートがある。これらの中では3官能で、硬化性の高いペンタエリスリトールトリアクリレート(以下PETA)が好ましい。 Examples of (meth)acrylates having a hydroxyl group used in the polyfunctional ureac include trimethylolpropane di(meth)acrylate, glycerin di(meth)acrylate, pentaerythritol di(meth)acrylate, and diglycerin di(meth)acrylate for difunctional ureacs. , ditrimethylolpropane di(meth)acrylate, dipentaerythritol di(meth)acrylate, etc., and those with trifunctional or higher functionality include diglycerin tri(meth)acrylate, ditrimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, There are dipentaerythritol tri(meth)acrylate, dipentaerythritol tetra(meth)acrylate, and dipentaerythritol penta(meth)acrylate. Among these, pentaerythritol triacrylate (hereinafter referred to as PETA), which is trifunctional and has high curability, is preferred.
本発明のHC樹脂組成物及び低屈折率樹脂組成物には、紫外線照射による硬化性向上のため光重合開始剤を配合することが好ましい。光重合開始剤は、紫外線や電子線などの照射でラジカルを生じ、そのラジカルが重合反応のきっかけとなるもので、ベンジルケタール系、アセトフェノン系、フォスフィンオキサイド系等汎用の光重合開始剤が使用できる。重合開始剤の光吸収波長を任意に選択することによって、紫外線領域から可視光領域にいたる広い波長範囲にわたって硬化性を付与することができる。具体的にはベンジルケタール系として2.2-ジメトキシ-1.2-ジフェニルエタン-1-オンが、α-ヒドロキシアセトフェノン系として1-ヒドロキシ-シクロヘキシル-フェニル-ケトン及び1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オンが、α-アミノアセトフェノン系として2-メチル-1-(4-メチルチオフェニル)-2-モルフォリノプロパン-1-オンが、アシルフォスフィンオキサイド系として2.4.6-トリメチルベンゾイル-ジフェニル-フォスフィンオキサイド及びビス(2.4.6‐トリメチルベンゾイル)‐フェニルフォスフィンオキサイド等があり、単独または2種以上を組み合わせて使用できる。 It is preferable to mix a photopolymerization initiator into the HC resin composition and low refractive index resin composition of the present invention in order to improve curability by ultraviolet irradiation. Photopolymerization initiators generate radicals when irradiated with ultraviolet rays or electron beams, and these radicals trigger polymerization reactions.General-purpose photopolymerization initiators such as benzyl ketal, acetophenone, and phosphine oxide are used. can. By arbitrarily selecting the light absorption wavelength of the polymerization initiator, curability can be imparted over a wide wavelength range from the ultraviolet region to the visible light region. Specifically, 2,2-dimethoxy-1,2-diphenylethan-1-one is used as a benzyl ketal type, and 1-hydroxy-cyclohexyl-phenyl-ketone and 1-[4-(2- hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one is converted into 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropan-1 as an α-aminoacetophenone system. -one is acylphosphine oxide, such as 2.4.6-trimethylbenzoyl-diphenyl-phosphine oxide and bis(2.4.6-trimethylbenzoyl)-phenylphosphine oxide, either singly or in combination. Can be used in combination.
HC樹脂組成物の場合、光重合開始剤は黄変しにくいα-ヒドロキシアセトフェノン系を含むことが好ましく、市販品としてはOmnirad127、Omnirad184、Omnirad2959(商品名:IGM Resins社製)などが挙げられる。これらの中では、特に黄変が少なく耐擦傷性に優れるOmnirad2959が好ましい。光重合開始剤のHC樹脂組成物におけるラジカル重合性分100重量部に対する配合は1~15重量部が好ましく、2~10重量部が更に好ましい。 In the case of the HC resin composition, the photopolymerization initiator preferably contains α-hydroxyacetophenone, which does not easily yellow, and commercially available products include Omnirad 127, Omnirad 184, and Omnirad 2959 (trade name: manufactured by IGM Resins). Among these, Omnirad 2959 is particularly preferred because it has little yellowing and excellent scratch resistance. The amount of the photopolymerization initiator to be added to 100 parts by weight of the radically polymerizable component in the HC resin composition is preferably 1 to 15 parts by weight, more preferably 2 to 10 parts by weight.
低屈折率樹脂組成物の場合、光重合開始剤はHC樹脂組成物の場合と同様にα-ヒドロキシアセトフェノン系を含むことが好ましく、特に酸素による重合阻害を受けにくい点でOmnirad127(2‐ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]-フェニル}-2-メチル-プロパン-1-オン)が好ましい。光重合開始剤の低屈折率樹脂組成物におけるラジカル重合性分100重量部に対する配合は1~10重量部が好ましく、2~8重量部が更に好ましい。 In the case of a low refractive index resin composition, the photopolymerization initiator preferably contains α-hydroxyacetophenone as in the case of the HC resin composition, and Omnirad 127 (2-hydroxy- 1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]-phenyl}-2-methyl-propan-1-one) is preferred. The amount of the photopolymerization initiator to be added to 100 parts by weight of the radically polymerizable component in the low refractive index resin composition is preferably 1 to 10 parts by weight, more preferably 2 to 8 parts by weight.
本発明の組成物には、性能を損なわない範囲で必要に応じて紫外線吸収剤、酸化防止剤、密着促進剤、ブルーイング剤、シランカップリング剤、消泡剤、増粘剤、沈澱防止剤、帯電防止剤、防曇剤、抗菌剤、有機微粒子等を添加してもよい。 The composition of the present invention may contain ultraviolet absorbers, antioxidants, adhesion promoters, bluing agents, silane coupling agents, antifoaming agents, thickeners, and anti-settling agents as necessary to the extent that performance is not impaired. , antistatic agents, antifogging agents, antibacterial agents, organic fine particles, etc. may be added.
HC樹脂組成物及び低屈折率樹脂組成物を塗工する際には、塗工特性を向上させるため溶剤にて希釈してもよい。希釈溶剤としては、例えばエタノール、n-プロピルアルコール、イソプロピルアルコール(以下IPA)、n-ブチルアルコール、イソブチルアルコール、ジアセトンアルコール等のアルコール系溶媒、アセトン、メチルエチルケトン(以下MEK)、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤、酢酸エチル、酢酸ブチル等のエステル系溶媒、PGM,ジエチルエーテル、ジイソプロピルエーテ等のエーテル系溶媒等があげられ、単独あるいは2種類以上を組み合わせて使用できる。希釈する場合の固形分としては1~70%が例示されるが、特に指定は無く、塗工しやすい粘度となるように適宜設定可能である。 When coating the HC resin composition and the low refractive index resin composition, they may be diluted with a solvent in order to improve coating properties. Examples of diluting solvents include alcoholic solvents such as ethanol, n-propyl alcohol, isopropyl alcohol (hereinafter referred to as IPA), n-butyl alcohol, isobutyl alcohol, and diacetone alcohol, acetone, methyl ethyl ketone (hereinafter referred to as MEK), methyl isobutyl ketone, and cyclohexanone. Examples include ketone solvents such as ethyl acetate and butyl acetate, ester solvents such as ethyl acetate and butyl acetate, and ether solvents such as PGM, diethyl ether and diisopropyl ether, which can be used alone or in combination of two or more. The solid content when diluting is exemplified as 1 to 70%, but there is no particular specification and it can be set as appropriate so as to provide a viscosity that is easy to coat.
HC樹脂組成物が塗布される基材フィルムとしては、ポリエステルフィルム、トリアセチルセルロースフィルム、ポリカーボネートフィルム、ポリスルフォンフィルム、ナイロンフィルム、シクロオレフィンフィルム、アクリルフィルム、ポリイミドフィルム、ABSフィルム、ポリオレフィンフィルム、PVCフィルム、PVAフィルム等を挙げることができる。なかでも耐候性、加工性、寸法安定性などの点から二軸延伸処理されたポリエステルフィルムが好ましく用いられる。フィルムの厚みは概ね25μm~500μmであればよい。 The base film to which the HC resin composition is applied includes polyester film, triacetylcellulose film, polycarbonate film, polysulfone film, nylon film, cycloolefin film, acrylic film, polyimide film, ABS film, polyolefin film, and PVC film. , PVA film, etc. Among these, a biaxially stretched polyester film is preferably used from the viewpoint of weather resistance, processability, dimensional stability, and the like. The thickness of the film may be approximately 25 μm to 500 μm.
前記基材フィルムは、HC樹脂組成物との密着性を向上させる目的で、プライマー処理やサンドブラスト法、溶剤処理法などによる表面の凹凸化処理、あるいはコロナ放電処理、クロム酸処理、オゾン・紫外線照射処理などの表面の酸化処理などの表面処理を施すことができる。 The base film may be subjected to surface roughening treatment such as primer treatment, sandblasting, solvent treatment, corona discharge treatment, chromic acid treatment, or ozone/ultraviolet irradiation in order to improve adhesion with the HC resin composition. Surface treatment such as surface oxidation treatment can be performed.
HC樹脂組成物及び低屈折率樹脂組成物を塗布する方法は、特に制限はなく、公知のスプレーコート、ロールコート、ダイコート、エアナイフコート、ブレードコート、スピンコート、リバースコート、グラビアコート、ワイヤーバーなどの塗工法またはグラビア印刷、スクリーン印刷、オフセット印刷、インクジェット印刷などの印刷法により形成できる。 The method of applying the HC resin composition and the low refractive index resin composition is not particularly limited, and may include known spray coating, roll coating, die coating, air knife coating, blade coating, spin coating, reverse coating, gravure coating, wire bar, etc. It can be formed by a coating method or a printing method such as gravure printing, screen printing, offset printing, or inkjet printing.
HC樹脂組成物の膜厚は乾燥時で1μm~10μmが例示できるが、これに限定されるものではない。ハードコート樹脂層上に塗布する低屈折率樹脂組成物の膜厚は乾燥時で50~200nmであることが好ましく、80~150nmであることが更に好ましい。低屈折率層の厚さがこの範囲であれば、反射率を十分低くすることが可能となる。 The film thickness of the HC resin composition is, for example, 1 μm to 10 μm when dry, but is not limited thereto. The film thickness of the low refractive index resin composition coated on the hard coat resin layer is preferably 50 to 200 nm, more preferably 80 to 150 nm when dry. If the thickness of the low refractive index layer is within this range, it is possible to make the reflectance sufficiently low.
HC樹脂組成物及び低屈折率樹脂組成物を硬化させる際に用いる紫外線照射の光源としては、低圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ、カーボンアーク灯、キセノンランプ、メタルハライドランプ、LEDランプ、無電極紫外線ランプなどがあり、また照射する雰囲気は空気中でもよいし、窒素、アルゴンなどの不活性ガス中でもよい。また紫外線照射時にバックロールの加温や、IRヒーターなどにより塗膜を加熱することで、より硬化性を上げることができる。照射条件としては照射強度500mW/cm2~3000mW/cm2、露光量50~400mJ/cm2が例示されるが、これに限定されるものではない。紫外線照射はフィルム成型後に行うが、成形前に低露光量(例えば15~30mJ/cm2)によるセミキュアをしても良い。 The light source for ultraviolet irradiation used when curing the HC resin composition and the low refractive index resin composition includes a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, an LED lamp, Electrodeless ultraviolet lamps are available, and the irradiation atmosphere may be air or an inert gas such as nitrogen or argon. Moreover, by heating the back roll or heating the coating film with an IR heater or the like during ultraviolet irradiation, the curability can be further improved. Irradiation conditions include, but are not limited to, an irradiation intensity of 500 mW/cm 2 to 3000 mW/cm 2 and an exposure amount of 50 to 400 mJ/cm 2 . Ultraviolet irradiation is performed after film molding, but semi-curing with a low exposure dose (for example, 15 to 30 mJ/cm 2 ) may be performed before molding.
以下、本発明について実施例、比較例を挙げて詳細に説明するが、具体例を示すものであって、特にこれらに限定するものではない。なお表記が無い場合は、室温25℃、相対湿度65%の条件下で測定を行った。また配合量は重量部を示す。 Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples, but these are intended to be specific examples and are not particularly limited to these. Unless otherwise specified, measurements were performed at a room temperature of 25° C. and a relative humidity of 65%. Moreover, the blending amount indicates parts by weight.
HC樹脂組成物
バインダーとしてHDIとPETAを反応させた6官能のウレアクを100部、光重合開始剤としてOmnirad2959(商品名:IGM Resins社製)を5部用い、固形分が40%になるよう酢酸エチルとPGMを用いて希釈し、均一に溶解・分散するまで撹拌してHC樹脂組成物を得た。
HC resin composition : 100 parts of hexafunctional ureac made by reacting HDI and PETA as a binder, 5 parts of Omnirad 2959 (trade name: manufactured by IGM Resins) as a photopolymerization initiator, and the solid content is 40%. The HC resin composition was diluted with ethyl acetate and PGM so as to have the following properties, and stirred until uniformly dissolved and dispersed to obtain an HC resin composition.
低屈折率樹脂組成物
前記(A)としてDPHA(商品名:日本化薬社製、ジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートの混合物)を、(B)としてスルーリア2320(商品名:日揮触媒化成社製、固形分20.5%、一次平均粒子径50nm)を、(C)としてEBECRYL80(商品名:ダイセルオルネクス社製、アミン変性ポリエーテルアクリレート、固形分100%、4官能の3級アミノ基化合物)及びEBECRYL 7100(商品名:ダイセルオルネクス社製、固形分100%、アミノアクリレート、2官能の3級アミノ基化合物)を、(D)としてM47(商品名:CIKナノテック社製、固形分30%、平均粒子径20nm、MIBK希釈)を、(E)としてX-71-1203M(商品名:信越化学工業社製、固形分20%、反応性官能基含有フッ素系シリコーン化合物)を、光重合開始剤としてOmnirad127(商品名:IGM Resins社製)を表1及び表2記載の配合で用い、固形分が3%になるようIPAとPGMを用いて希釈(IPA:PGM=1:1)し、均一に溶解・分散するまで撹拌して低屈折率樹脂組成物を得た。
Low refractive index resin composition (A) is DPHA (product name: Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate), and (B) is Surulia 2320 (product name: JGC Catalyst). (manufactured by Kasei Co., Ltd., solid content 20.5%, primary average particle diameter 50 nm) as (C) EBECRYL80 (trade name: manufactured by Daicel Ornex, amine-modified polyether acrylate, solid content 100%, tetrafunctional tertiary amino group compound) and EBECRYL 7100 (trade name: manufactured by Daicel Allnex, solid content 100%, amino acrylate, bifunctional tertiary amino group compound) as (D) M47 (trade name: manufactured by CIK Nanotech, manufactured by CIK Nanotech, Solid content 30%, average particle size 20 nm, MIBK dilution) as (E), X-71-1203M (trade name: manufactured by Shin-Etsu Chemical Co., Ltd., solid content 20%, reactive functional group-containing fluorosilicone compound) , Omnirad 127 (trade name: manufactured by IGM Resins) was used as a photopolymerization initiator in the formulation shown in Tables 1 and 2, and diluted with IPA and PGM so that the solid content was 3% (IPA:PGM=1: 1) and stirred until uniformly dissolved and dispersed to obtain a low refractive index resin composition.
表1
Table 1
表2
Table 2
評価方法は以下の通りとした。 The evaluation method was as follows.
HC層の作成
HC樹脂組成物を用い、PETフィルムU403(商品名:東レ社製、厚み100μm、易接着層有)に乾燥膜厚で3μmとなるように塗布し、80℃で1分乾燥した。その後、アイグラフィックス社製の紫外線露光装置ECS-151Uを用い、100mW/cm2,800mJ/cm2の条件で硬化してHCフィルムを作成した。
Creation of HC layer The HC resin composition was applied to PET film U403 (product name: Toray Industries, Ltd., thickness 100 μm, with easy adhesive layer) to a dry film thickness of 3 μm, and dried at 80° C. for 1 minute. . Thereafter, the film was cured using an ultraviolet exposure device ECS-151U manufactured by Eye Graphics under conditions of 100 mW/cm 2 and 800 mJ/cm 2 to prepare an HC film.
反射防止フィルムの作成
上記で作成したハードコート層上に、低屈折率樹脂組成物を乾燥膜厚で100nmとなるように塗布し、80℃で1分乾燥した。その後、アイグラフィックス社製の紫外線露光装置ECS-151Uを用い、100mW/cm2,800mJ/cm2, 窒素雰囲気下の条件で硬化させ反射防止フィルムを形成した。
Preparation of antireflection film A low refractive index resin composition was coated on the hard coat layer prepared above to a dry film thickness of 100 nm, and dried at 80° C. for 1 minute. Thereafter, using an ultraviolet exposure device ECS-151U manufactured by Eye Graphics Co., Ltd., the film was cured under conditions of 100 mW/cm 2 , 800 mJ/cm 2 and a nitrogen atmosphere to form an antireflection film.
ヘイズ:上記反射防止フィルムを、東洋精機製作所社製のHaze-GARD2を用いJIS K7361-1に準拠して測定し、1.0%以下を〇、1.0%超を×とした。 Haze: The above antireflection film was measured in accordance with JIS K7361-1 using Haze-GARD2 manufactured by Toyo Seiki Seisakusho Co., Ltd., and 1.0% or less was evaluated as ○, and over 1.0% was evaluated as ×.
最小反射率:上記反射防止フィルムを用い、塗工面とは反対面を紙やすりで擦り傷を付け、黒色顔料マーカーで塗りつぶし、更に黒色PETを貼り合せ反対面側の反射率を0%とする。その後HC面側を分光光度計にて300nm~780nmの範囲で1nm毎に反射率をプロットして最低の反射率を測定し、1.8%以下を〇、1.8%超を×とした。 Minimum reflectance: Using the above anti-reflection film, scratch the surface opposite to the coated surface with sandpaper, fill it in with a black pigment marker, and then paste black PET to make the reflectance of the opposite surface 0%. After that, the reflectance of the HC side was plotted every 1 nm in the range of 300 nm to 780 nm using a spectrophotometer, and the lowest reflectance was measured, and 1.8% or less was marked as ○, and over 1.8% was marked as ×. .
耐擦傷性:スチールウール#0000の上に1000g/cm2の荷重を載せて300往復させ、目視による観察で傷が付かない場合を○、わずかに傷が付く場合を△、多数の傷が付く場合を×とした。 Scratch resistance: Place a load of 1000 g/cm2 on steel wool #0000 and make it reciprocate 300 times. If there is no scratch by visual observation, ○, if there is a slight scratch, △, if there are many scratches was marked as ×.
評価結果
表3
Evaluation results Table 3
評価結果
表4
Evaluation results Table 4
実施例は、ヘイズ、最小反射率、耐擦傷性の全ての面で問題はなく良好であった。 Examples had no problems and were good in all aspects of haze, minimum reflectance, and scratch resistance.
一方、(C)が未配合の比較例1は耐擦傷性が劣り、(B)が未配合の比較例2は最小反射率が高く、(D)が未配合の比較例5は耐擦傷性が劣っていた。また(C)の配合量が下限未満の比較例3、上限を超えた比較例4は耐擦傷性が劣っており、いずれも本願発明に適さないものであった。
On the other hand, Comparative Example 1 without (C) has poor scratch resistance, Comparative Example 2 without (B) has a high minimum reflectance, and Comparative Example 5 without (D) has poor scratch resistance. was inferior. Furthermore, Comparative Example 3, in which the amount of (C) blended was less than the lower limit, and Comparative Example 4, in which the amount exceeded the upper limit, had poor scratch resistance, and both were unsuitable for the present invention.
Claims (4)
3. The antireflection hard coat film according to claim 1, further comprising a leveling agent (E) in the low refractive index layer.
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JP2022069851A JP2023159921A (en) | 2022-04-21 | 2022-04-21 | Antireflection hard coat film |
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JP2022069851A JP2023159921A (en) | 2022-04-21 | 2022-04-21 | Antireflection hard coat film |
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