JP2023142161A - Substrate processing apparatus and substrate processing method - Google Patents

Abstract

To provide a substrate processing apparatus capable of removing only an excess liquid repellent material from a substrate.SOLUTION: A substrate processing apparatus 100 includes a substrate holding portion 13 and a removal member 151. The substrate holding portion 13 rotates a substrate while holding the substrate on which a liquid-repellent substance capable of repelling a processing liquid has adhered to at least the peripheral edge portion 501 of the main body surface and an end surface portion 51. During the rotation of the substrate W, the removal member 151 is separated from a side surface portion 515 in the radial direction RD of the end surface portion 51 of the substrate W, and is in contact with at least the peripheral edge portion 501 of the main body surface of the substrate W, thereby bringing a removing agent capable of removing the liquid-repellent substance into contact with the liquid-repellent substance adhered to the peripheral edge portion 501 of the main body surface. The peripheral edge portion 501 of the main body surface of the substrate W indicates the peripheral area of the surface A1 of a substrate body 50. The end surface portion 51 of the substrate W indicates an end surface region outside the substrate body 50 in the radial direction RD.SELECTED DRAWING: Figure 7

Description

The present invention relates to a substrate processing apparatus and a substrate processing method.

The substrate processing apparatus described in Patent Document 1 applies a liquid coating agent to the peripheral edge of the substrate, and covers dust attached to the peripheral edge of the substrate with the liquid coating agent. Then, by curing the coating material that covers the dust attached to the peripheral edge of the substrate, the dust is trapped inside the cured coating material. Therefore, by removing the coating material from the periphery of the substrate, dust can be removed from the periphery of the substrate. Further, since the photoresist is applied to the surface of the substrate after the coating is applied to the peripheral edge of the substrate, the photoresist is applied on top of the coating at the peripheral edge of the substrate. Therefore, when the coating is removed from the peripheral edge of the substrate, the photoresist coated on the coating is also removed from the peripheral edge of the substrate along with the coating. In this way, dust and photoresist can be simultaneously removed from the periphery of the substrate.

Japanese Patent Application Publication No. 2013-74126

However, in the substrate processing apparatus of Patent Document 1, the removal mechanism removes the photoresist together with the coating by blowing off the coating with nitrogen gas. Therefore, all coating material adhering to the substrate is removed. On the other hand, the inventor of the present application has conducted extensive research on liquid repellent substances capable of repelling processing liquid, and how to remove only the excess liquid repellent substances.

The present invention has been made in view of the above problems, and an object thereof is to provide a substrate processing apparatus and a substrate processing method that can remove only excess liquid-repellent material from a substrate.

According to one aspect of the present invention, a substrate processing apparatus includes a substrate holding section and a removal member. The substrate holding section rotates the substrate while holding the substrate, which has a liquid-repellent substance that can repel the processing liquid attached to at least the peripheral edge and end surface of the main body surface. The removal member removes the liquid repellent substance by contacting at least a peripheral edge of the main body surface of the substrate while being spaced apart from a radial side surface of the end surface of the substrate during rotation of the substrate. A remover that can be removed is brought into contact with the liquid repellent material attached to the peripheral edge of the surface of the main body. The body surface peripheral portion of the substrate indicates a peripheral region of the surface of the substrate body. The end surface portion of the substrate indicates an end surface region radially outer than the substrate main body.

In one aspect of the present invention, the removal member preferably includes a first contact portion and a second contact portion. The first contact portion contacts at least the peripheral edge of the main body surface of the substrate while being separated from the side surface of the substrate during rotation of the substrate, so that the first contact portion It is preferable to bring the removing agent into contact with a liquid repellent substance. The second contact portion is configured to repel the repellent attached to the periphery of the back surface of the main body by contacting at least the periphery of the back surface of the main body of the substrate while being separated from the side surface of the substrate during rotation of the substrate. Preferably, the removing agent is brought into contact with a liquid substance. It is preferable that the main body back surface peripheral portion of the substrate indicates a peripheral region of the back surface of the substrate main body.

In one aspect of the present invention, the first contact portion preferably includes a first outer contact portion and a first inner contact portion. It is preferable that the first outer contact portion contacts the peripheral edge of the surface of the main body during rotation of the substrate, thereby bringing the removal agent into contact with the liquid repellent substance attached to the peripheral edge of the surface of the main body. The first inner contact portion is disposed inside the first outer contact portion, and contacts a surface edge of the end surface portion of the substrate during rotation of the substrate, thereby causing the first inner contact portion to contact the surface edge of the end surface portion of the substrate. It is preferable to bring the removing agent into contact with a liquid repellent substance. The surface edge portion of the end surface portion is a region of the end surface portion located on the outer side in the radial direction than the peripheral portion of the main body surface on the front surface side of the substrate, and is located on the inner side in the radial direction than the side surface portion. Preferably, the region in which it is located is indicated. Preferably, the second contact portion includes a second outer contact portion and a second inner contact portion. It is preferable that the second outer contact part contacts the periphery of the back surface of the main body of the substrate during rotation of the substrate, thereby bringing the removal agent into contact with the liquid repellent substance attached to the periphery of the back surface of the main body. . The second inner contact portion is disposed inside the second outer contact portion, and contacts the back edge of the end surface portion of the substrate during rotation of the substrate, thereby causing the second inner contact portion to contact the back edge of the end surface of the substrate. It is preferable to bring the removing agent into contact with a liquid repellent substance. The back edge of the end face is a region of the end face on the back side of the substrate that is located radially outward from the back peripheral edge of the main body and radially inward from the side face. Preferably, the region in which it is located is indicated.

In one aspect of the present invention, it is preferable that the first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface. Preferably, the first inner contact portion has an inclined surface that contacts the surface edge. Preferably, the second outer contact portion has a flat surface that contacts the peripheral edge of the back surface of the main body. Preferably, the second inner contact portion has an inclined surface that contacts the back edge.

In one aspect of the present invention, it is preferable that the distance between the first inner contact part and the second inner contact part can be expanded or contracted.

In one aspect of the present invention, the substrate processing apparatus preferably further includes an inert gas discharge section. It is preferable that the inert gas discharge part discharges inert gas from between the first contact part and the second contact part.

In one aspect of the present invention, it is preferable that the removal member contacts at least the peripheral edge of the surface of the main body while rotating while being separated from the side surface of the substrate.

In one aspect of the present invention, it is preferable that at least a portion of the removal member enters a notch existing in the end surface portion of the substrate and contacts a bottom point of the notch.

In one aspect of the present invention, the substrate processing apparatus preferably further includes a biasing mechanism. Preferably, the biasing mechanism biases the removal member radially inward of the substrate.

In one aspect of the present invention, the substrate processing apparatus preferably further includes a removing agent supply section. It is preferable that the removing agent supply unit supplies the removing agent to the removing member.

According to another aspect of the present invention, a substrate processing method uses a removal member that brings a removal agent capable of removing a liquid repellent substance into contact with the liquid repellent substance. The substrate processing method includes a step of rotating the substrate while holding the substrate to which the liquid repellent substance has adhered at least to the periphery of the main body surface and the end surface, and during rotation of the substrate, the step of rotating the substrate to which the liquid repellent substance has adhered at least to the periphery of the main body surface and the end surface; bringing the removal agent into contact with the liquid-repellent substance attached to the periphery of the main body surface of the substrate by bringing the removal member into contact with at least the periphery of the main body surface of the substrate while separating the removal member from the periphery of the main body surface of the substrate; including. The body surface peripheral portion of the substrate indicates a peripheral region of the surface of the substrate body. The end surface portion of the substrate indicates an end surface region radially outer than the substrate main body.

In one aspect of the present invention, it is preferable that the removal member includes a first contact portion and a second contact portion that are spaced apart from each other in a certain direction. In the step of bringing the removal agent into contact with the liquid repellent substance, it is preferable that a first contact operation and a second contact operation are performed. The first contact operation includes, during rotation of the substrate, contacting at least the first contact portion with the peripheral edge of the main body surface of the substrate while separating the first contact portion from the side surface of the substrate. It is preferable that the removing agent be brought into contact with the liquid repellent substance attached to the peripheral edge of the surface of the main body. The second contact operation includes contacting at least a peripheral edge of the back surface of the main body of the substrate while separating the second contact portion from the side surface of the substrate while the substrate is rotating. In this case, it is preferable that the removing agent is brought into contact with the liquid-repellent substance attached to the peripheral edge of the back surface of the main body. It is preferable that the main body back surface peripheral portion of the substrate indicates a peripheral region of the back surface of the substrate main body.

In one aspect of the present invention, it is preferable that the first contact part includes a first outer contact part and a first inner contact part disposed inside the first outer contact part. In the step of bringing the removal agent into contact with the liquid repellent substance, it is preferable that a first body contacting action and a first end surface contacting action are performed as the first contacting action. The first body contacting operation is performed by bringing the first outer contact portion into contact with the peripheral edge of the surface of the main body while the substrate is rotating, thereby applying the removal agent to the liquid repellent substance attached to the peripheral edge of the surface of the main body. Preferably, the motion is a contacting motion. The first end surface contacting operation is performed by bringing the first inner contact portion into contact with the surface edge of the end surface portion of the substrate while the substrate is rotating, thereby contacting the liquid repellent substance attached to the surface edge. Preferably, the operation is to bring the removing agent into contact with the removing agent. The surface edge portion of the end surface portion is a region of the end surface portion located on the outer side in the radial direction than the peripheral portion of the main body surface on the front surface side of the substrate, and is located on the inner side in the radial direction than the side surface portion. Preferably, the region in which it is located is indicated. It is preferable that the second contact part includes a second outer contact part and a second inner contact part disposed inside the second outer contact part. In the step of bringing the removal agent into contact with the liquid repellent substance, it is preferable that a second body contacting action and a second end face contacting action are performed as the second contacting action. The second body contacting operation is performed by bringing the second outer contact portion into contact with the periphery of the back surface of the main body of the substrate while the substrate is rotating, thereby causing the liquid-repellent substance attached to the periphery of the back surface of the main body to be exposed to the liquid repellent material. Preferably, the operation involves contacting the removing agent. The second end face contacting operation is performed by bringing the second inner contact portion into contact with the back edge of the end face of the substrate while the substrate is rotating, thereby contacting the liquid repellent substance attached to the back edge. Preferably, the operation is to bring the removing agent into contact with the removing agent. The back edge of the end face is a region of the end face on the back side of the substrate that is located radially outward from the back peripheral edge of the main body and radially inward from the side face. Preferably, the region in which it is located is indicated.

In one aspect of the present invention, it is preferable that the first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface. Preferably, the first inner contact portion has an inclined surface that contacts the surface edge. Preferably, the second outer contact portion has a flat surface that contacts the peripheral edge of the back surface of the main body. Preferably, the second inner contact portion has an inclined surface that contacts the back edge.

In one aspect of the present invention, it is preferable that the distance between the first inner contact part and the second inner contact part can be expanded or contracted.

In one aspect of the present invention, in the step of bringing the removal agent into contact with the liquid repellent substance, it is preferable that an inert gas is discharged from between the first contact portion and the second contact portion.

In one aspect of the present invention, in the step of bringing the removal agent into contact with the liquid repellent substance, while separating the removal member from the side surface of the substrate and rotating the removal member, at least the It is preferable that the removal member is brought into contact with the peripheral edge of the main body surface.

In one aspect of the present invention, in the step of bringing the removal agent into contact with the liquid repellent substance, at least a portion of the removal member enters a notch present in the end surface portion of the substrate, Preferably, it touches a point.

In one aspect of the present invention, it is preferable that in the step of bringing the removal agent into contact with the liquid repellent substance, the removal member is urged radially inward of the substrate.

In one aspect of the present invention, the substrate processing method preferably further includes a step of supplying the removing agent to the removing member.

According to the present invention, only the excess liquid repellent material can be removed from the substrate.

FIG. 1 is a plan view showing the inside of a substrate processing apparatus according to an embodiment of the present invention. FIG. 2 is a plan view showing the inside of the liquid repellent processing unit according to the present embodiment. FIG. 2 is a side view showing the inside of the liquid repellent processing unit according to the present embodiment. FIG. 2 is a cross-sectional view showing a substrate according to the present embodiment. FIG. 2 is a plan view showing a part of the substrate according to the present embodiment. FIG. 3 is a diagram showing the first stage of the liquid-repellent substance removal method according to the present embodiment. FIG. 7 is a diagram showing the latter stage of the liquid-repellent substance removal method according to the present embodiment. It is a side view showing the brush concerning this embodiment. FIG. 3 is a diagram showing an example of a liquid-repellent substance removal process using a brush according to the present embodiment. It is a figure which shows an example of the removal process of the liquid-repellent substance by the brush based on the modification of this embodiment. It is a figure which shows an example of the removal process of the liquid-repellent substance by the brush based on another modification of this embodiment. 3 is a flowchart showing a substrate processing method according to the present embodiment. FIG. 2 is a plan view showing a substrate according to the present embodiment. FIG. 3 is a plan view showing a state in which the brush according to the present embodiment is in contact with a notch. FIG. 3 is a plan view showing a brush and a notch according to the present embodiment. It is a sectional view showing the brush concerning the 1st modification of this embodiment. It is a figure which shows the 1st process of the removal process of the liquid repellent substance by the brush based on the 1st modification. It is a figure which shows the 2nd process of the removal process of the liquid-repellent substance by the brush based on the 1st modification. It is a figure which shows an example of the removal process of the liquid-repellent substance by the brush based on the 2nd modification of this embodiment.

Embodiments of the present invention will be described below with reference to the drawings. In addition, in the drawings, the same or corresponding parts are given the same reference numerals and the description will not be repeated. Furthermore, in the drawings, the X-axis, Y-axis, and Z-axis are appropriately illustrated for easy understanding. The X-axis, Y-axis, and Z-axis are perpendicular to each other, the X-axis and Y-axis are parallel to the horizontal direction, and the Z-axis is parallel to the vertical direction. Note that "planar view" indicates viewing the object from vertically above. Moreover, a "plan view" refers to a drawing when an object is viewed from vertically above.

A substrate processing apparatus 100 according to an embodiment of the present invention will be described with reference to FIGS. 1 to 12. First, the substrate processing apparatus 100 will be explained with reference to FIG. FIG. 1 is a plan view showing the inside of the substrate processing apparatus 100. The substrate processing apparatus 100 shown in FIG. 1 processes a substrate W. For example, a pattern including a plurality of structures is formed on the substrate W.

The substrate W may be, for example, a semiconductor wafer (for example, a silicon wafer), a substrate for a liquid crystal display device, a substrate for a plasma display, a substrate for a field emission display (FED), a substrate for an optical disk, a substrate for a magnetic disk, or a magneto-optical substrate. It is a disk substrate, a photomask substrate, a ceramic substrate, or a solar cell substrate. Hereinafter, as an example, the substrate W is a silicon wafer.

As shown in FIG. 1, the substrate processing apparatus 100 includes a plurality of load ports LP, an indexer robot IR, a center robot CR, a plurality of processing units 1, a control device 2, a plurality of fluid boxes 3, It includes a chemical solution cabinet 4 and a liquid repellent processing unit 5.

Each of the load ports LP accommodates a plurality of stacked substrates W. The indexer robot IR transports the substrate W between the load port LP and the center robot CR. The center robot CR transports the substrate W between the indexer robot IR and the processing unit 1, between the indexer robot IR and the liquid repellent processing unit 5, or between the processing unit 1 and the liquid repellent processing unit 5. do. The liquid repellent processing unit 5 applies a liquid repellent to the substrate W. The liquid repellent is a liquid containing a liquid repellent substance that can repel the processing liquid. Then, the liquid repellent processing unit 5 removes the excess liquid repellent from the liquid repellent substances attached to the substrate W. Details of the liquid repellent processing unit 5 will be described later.

Each of the processing units 1 processes a substrate W using a processing liquid. Each of the processing units 1 is a single-wafer type device that processes the substrates W one by one. Specifically, the processing unit 1 includes a front nozzle 7 and a back nozzle 8. The front surface nozzle 7 processes the front surface of the substrate W by supplying a processing liquid to the front surface of the substrate W, which is the front surface (upper surface) and the back surface (lower surface) of the substrate W. The backside nozzle 8 supplies a processing liquid to the backside of the substrate W to process the backside of the substrate W.

The processing liquid is a chemical liquid or a rinsing liquid. The chemical liquid is a liquid for treating the substrate W. Examples of chemical solutions include dilute hydrofluoric acid (DHF), hydrofluoric acid (HF), buffered hydrofluoric acid (BHF), ammonium fluoride, HFEG (mixture of hydrofluoric acid and ethylene glycol), phosphoric acid (H ₃ PO ₄ ), and sulfuric acid. , acetic acid, nitric acid, hydrochloric acid, aqueous ammonia, aqueous hydrogen peroxide, organic acids (e.g. citric acid, oxalic acid), organic alkalis (e.g. TMAH: tetramethylammonium hydroxide), aqueous ammonia/hydrogen peroxide mixture (SC1 ), a mixture of hydrochloric acid and hydrogen peroxide (SC2), isopropyl alcohol (IPA), a surfactant, or a corrosion inhibitor.

The rinsing liquid is a liquid for washing away a chemical solution, by-products after processing with the chemical solution, and/or foreign matter from the substrate W. The rinsing liquid is, for example, deionized water (DIW), carbonated water, electrolyzed ionized water, hydrogen water, ozone water, or hydrochloric acid water at a diluted concentration (for example, about 10 ppm to 100 ppm).

A predetermined number of processing units 1 (three processing units 1 in the example of FIG. 1) are stacked vertically to form one tower TW. However, in the example of FIG. 1, one tower TW among the plurality of towers TW (four towers TW in the example of FIG. 1) includes one liquid repellent processing unit 5 instead of one processing unit 1. The plurality of towers TW are arranged so as to surround the center robot CR in a plan view. Note that the arrangement of the liquid repellent processing unit 5 is not particularly limited; for example, the liquid repellent processing unit 5 may be arranged in a dedicated space in the substrate processing apparatus 100, or may be arranged outside the substrate processing apparatus 100. You can leave it there. Further, the substrate processing apparatus 100 may include a plurality of liquid repellent processing units 5.

Each of the plurality of fluid boxes 3 accommodates a fluid device. Each of the plurality of fluid boxes 3 corresponds to the plurality of towers TW. The chemical liquid cabinet 4 accommodates chemical liquids. The chemical solution in the chemical solution cabinet 4 is supplied to all the processing units 1 included in the tower TW corresponding to the fluid box 3 via any one of the fluid boxes 3.

The control device 2 controls the load port LP, indexer robot IR, center robot CR, processing unit 1, fluid box 3, chemical cabinet 4, and liquid repellent processing unit 5. The control device 2 is, for example, a computer.

The control device 2 includes a control section 21 and a storage section 22. The control unit 21 includes a processor such as a CPU (Central Processing Unit). The storage unit 22 includes a storage device and stores data and computer programs. Specifically, the storage unit 22 includes a main storage device such as a semiconductor memory, and an auxiliary storage device such as a semiconductor memory, a solid state drive, and/or a hard disk drive. The storage unit 22 may include removable media. The storage unit 22 corresponds to an example of a non-transitory computer-readable storage medium.

Next, the liquid repellent processing unit 5 will be explained with reference to FIG. FIG. 2 is a plan view showing the inside of the liquid repellent processing unit 5. As shown in FIG. As shown in FIG. 2, the liquid repellent processing unit 5 includes a chamber 11, a spin chuck 13, a liquid repellent material removal mechanism 15, a removal agent supply section 17, a liquid receiving section 19, and a liquid repellent application section 31. , and a rinse liquid supply section 33. The liquid repellent substance removal mechanism 15 includes a brush 151 and a swing arm 152. The removing agent supply section 17 includes a removing agent nozzle 171, a valve 172, and a pipe 173. The liquid repellent application section 31 includes a liquid repellent nozzle 311 and an arm 312. The rinse liquid supply section 33 includes a rinse liquid nozzle 331. The control section 21 controls the spin chuck 13 , the liquid repellent material removal mechanism 15 , the removal agent supply section 17 , the liquid repellent application section 31 , and the rinsing liquid supply section 33 .

The chamber 11 has a substantially box shape. The chamber 11 accommodates the spin chuck 13, the liquid repellent material removal mechanism 15, the remover nozzle 171, the liquid receiving part 19, the liquid repellent application part 31, the liquid repellent nozzle 311, and the rinse liquid nozzle 331.

The spin chuck 13 rotates the substrate W while holding it. Specifically, the spin chuck 13 rotates the substrate W around the rotation axis AX1 while holding the substrate W substantially horizontally. The spin chuck 13 corresponds to an example of the "substrate holder" of the present invention.

The liquid repellent application unit 31 applies a liquid repellent to the end surface portion 51 of the substrate W on the outer side in the radial direction RD at the application position P3. The end surface portion 51 is a substantially annular portion of the substrate W around the rotation axis AX1. Specifically, the liquid repellent application unit 31 discharges the liquid repellent onto the end surface portion 51 of the substrate W on the outer side in the radial direction RD using the liquid repellent nozzle 311 at the application position P3. In this embodiment, the radial direction RD is approximately parallel to the horizontal direction. Further, the radial direction RD is orthogonal to the rotation axis AX1. The radial direction RD can also be regarded as the radial direction with respect to the rotation axis AX1. Note that the circumferential direction around the rotation axis AX1 may be referred to as a circumferential direction CD. The circumferential direction CD can also be regarded as the circumferential direction of the substrate W.

The coating position P3 indicates a position above the end surface portion 51 of the substrate W. On the other hand, the standby position P4 indicates a position outside the application position P3 in the radial direction RD. That is, the standby position P4 indicates a position separated from the substrate W in the radial direction RD.

A liquid repellent is a liquid containing a liquid repellent substance. Specifically, the liquid repellent is a solution containing a liquid repellent substance. The liquid-repellent substance is a substance that can repel the processing liquid used to process the substrate W. In other words, the liquid-repellent substance is a substance that has a property of repelling the processing liquid more than the substrate W. The liquid repellent substance has liquid repellency. Liquid repellency is the property of repelling liquid. For example, a substance with a contact angle of 90 degrees or more is a liquid-repellent substance.

A liquid repellent is a mixture of a solvent and a liquid repellent substance as a solute. The solvent is, for example, water. Water is, for example, the same liquid as the rinse liquid. The liquid repellent substance is, for example, a polymer compound. The liquid repellent material is preferably a non-fluorine liquid repellent material. As an example, NeoSeed (registered trademark) manufactured by NICCA CHEMICAL CO., LTD. can be used as the liquid repellent material. Note that the liquid repellent may be wax.

The liquid-repellent substance is, for example, a water-repellent substance. A water-repellent substance is a substance that can repel water. In other words, the water-repellent material is a material that has a property of repelling water more than the substrate W. The water repellent substance has water repellency. Water repellency is the property of repelling water. For example, a substance with a contact angle of 90 degrees or more is a water-repellent substance. The water in this case is, for example, the same liquid as the rinse liquid. When a water-repellent substance is used as the liquid-repellent substance, it is effective when the treatment liquid is an aqueous solution. Note that when the liquid-repellent substance is a water-repellent substance, the liquid-repellent agent is a water-repellent agent.

The liquid-repellent material may be, for example, a silicon-based liquid-repellent material or an acrylic-based liquid-repellent material. The silicon-based liquid repellent substance imparts liquid repellency to silicon itself and to compounds containing silicon. The silicone-based liquid repellent substance is, for example, a silane coupling agent. The silane coupling agent includes, for example, at least one of HMDS (hexamethyldisilazane), TMS (tetramethylsilane), fluorinated alkylchlorosilane, alkyldisilazane, and a non-chloro hydrophobizing agent. Non-chloro hydrophobizing agents include, for example, dimethylsilyldimethylamine, dimethylsilyldiethylamine, hexamethyldisilazane, tetramethyldisilazane, bis(dimethylamino)dimethylsilane, N,N-dimethylaminotrimethylsilane, N-(trimethylsilyl ) Contains at least one of dimethylamine and an organosilane compound.

Note that the liquid-repellent material may be, for example, a metal-based liquid-repellent material. Metal-based liquid repellent substances provide liquid repellency to metals themselves and compounds containing metals. The metal-based liquid-repellent substance includes, for example, at least one of an amine having a hydrophobic group and an organic silicon compound.

After the liquid repellent discharged onto the substrate W is dried, the liquid repellent substance removal mechanism 15 uses a brush 151 impregnated with the removal agent to remove the liquid repellent substance adhering to the substrate W at a removal position P1. and execute it. The removal process is a process for separating the liquid repellent substance attached to the substrate W from the substrate W. In this case, "separation" indicates that the liquid-repellent substance is separated from the substrate W by, for example, polishing the portion of the substrate W to which the liquid-repellent substance has adhered with a removal agent. However, "separation" may be, for example, separating the liquid repellent substance from the substrate W by dissolving the liquid repellent substance attached to the substrate W with a removing agent.

The removal position P1 indicates a position facing the end surface portion 51 of the substrate W in the radial direction RD. On the other hand, the standby position P2 indicates a position outside the removal position P1 in the radial direction RD. That is, the standby position P2 indicates a position separated from the substrate W in the radial direction RD. A liquid receiver 19 is arranged below the standby position P2. The liquid receiving part 19 is, for example, a pot.

The remover is a liquid for removing the liquid repellent substance. In other words, the remover is a liquid for separating the liquid repellent substance from the substrate W. The removing agent is, for example, a liquid containing an abrasive. The polishing agent is, for example, cerium oxide. As a removing agent, for example, "Kiirobin (registered trademark)" manufactured by Prostaff can be used. Note that as long as the liquid-repellent substance can be removed (separated) from the substrate W, the type of abrasive contained in the removal agent is not particularly limited. Further, the removing agent may be, for example, a liquid containing a component that dissolves the liquid repellent substance, as long as the liquid repellent substance can be removed (separated) from the substrate W.

The rinsing liquid supply unit 33 cleans the substrate W with the rinsing liquid after the removal process for the liquid-repellent substance adhering to the substrate W is performed. That is, the rinsing liquid supply unit 33 washes away the liquid-repellent substance separated from the substrate W with the rinsing liquid after the removal process is performed. Specifically, after the removal process is performed, the rinsing liquid supply unit 33 discharges the rinsing liquid to the radially outer portion of the substrate W (including the end surface portion 51) using the rinsing liquid nozzle 331.

The removing agent supply unit 17 supplies a removing agent to the brush 151 of the liquid-repellent substance removing mechanism 15 at the standby position P2. Therefore, according to this embodiment, the brush 151 can be effectively impregnated with the removal agent. The brush 151 corresponds to an example of the "removal member" of the present invention.

The brush 151 has, for example, a substantially cylindrical shape. The brush 151 has elasticity, for example. Brush 151 includes, for example, a porous material. In this case, for example, the brush 151 may be spongy. It is preferable that the brush 151 has liquid repellency. This is because the liquid repellent agent is easily transferred to the substrate W. The material of the brush 151 is, for example, PTFE (polytetrafluoroethylene) or PFA (tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer). Note that, for example, the brush 151 may be configured by combining a plurality of members, or may include a plurality of bristles.

Specifically, the remover nozzle 171 of the remover supply unit 17 discharges the remover to the brush 151 located at the standby position P2. As a result, the brush 151 is impregnated with the removal agent.

More specifically, a pipe 173 is connected to the remover nozzle 171. Piping 173 supplies the remover to remover nozzle 171 . A valve 172 is arranged in the pipe 173. The valve 172 closes or opens the flow path of the pipe 173. The control unit 21 controls the valve 172 so that the valve 172 opens the flow path of the pipe 173. As a result, since the valve 172 opens the flow path of the pipe 173, the remover nozzle 171 discharges the remover toward the brush 151. The removing agent that has not been impregnated into the brush 151 falls into the liquid receiving part 19 and accumulates in the liquid receiving part 19.

Next, the liquid repellent processing unit 5 will be described in detail with reference to FIG. FIG. 3 is a side view showing the inside of the liquid repellent processing unit 5. As shown in FIG. As shown in FIG. 3, in the liquid repellent processing unit 5, the spin chuck 13 is a vacuum chuck. Specifically, the spin chuck 13 includes a spin shaft 131, a spin base 132, and a spin motor 133. The spin axis 131 extends substantially vertically. The spin base 132 has a substantially disk shape and is attached to the upper end of the spin shaft 131. The spin base 132 holds the substrate W in a substantially horizontal position. In the example of FIG. 3, the spin base 132 attracts and holds the back surface of the substrate W in a substantially horizontal position. The spin motor 133 has a rotation shaft coaxially coupled to the spin shaft 131. Then, the spin motor 133 rotates the substrate W around the rotation axis AX1 of the spin shaft 131 while the substrate W is held on the spin base 132.

The liquid repellent treatment unit 5 further includes a heating section 20. The heating unit 20 heats the outer portion of the substrate W in the radial direction RD from the back side of the substrate W under the control of the control unit 21 . The heating unit 20 is arranged outside the spin chuck 13 in the radial direction RD. The heating unit 20 is arranged below the substrate W. Specifically, the heating unit 20 is disposed below the outer portion of the substrate W in the radial direction RD. In the example of FIG. 3, the heating section 20 has a substantially annular shape extending around the rotation axis AX1. The heating unit 20 is, for example, a heater. Note that the direction along the rotation axis AX1 may be referred to as the axial direction AD. The axial direction AD is perpendicular to the substrate W and substantially parallel to the vertical direction.

The liquid-repellent substance removal mechanism 15 swings the brush 151 in the horizontal direction or moves the brush 151 up and down under the control of the control unit 21 . The liquid repellent material removal mechanism 15 moves the brush 151 between a removal position P1 (FIG. 2) and a standby position P2 (FIG. 2). Details of the brush 151 will be described later.

Specifically, the liquid-repellent substance removal mechanism 15 includes a swinging arm 152, a swinging mechanism 153, a lifting mechanism 154, and an arm pivot 155. A brush 151 is attached to the tip of the swing arm 152 on one side in the horizontal direction. The swing arm 152 swings the brush 151 substantially horizontally, and moves the brush 151 up and down.

More specifically, the swing mechanism 153 swings the swing arm 152 approximately horizontally around the swing axis AX3 under the control of the control unit 21. Specifically, the upper end of the arm base shaft 155 is coupled to the other side of the swing arm 152 in the horizontal direction. The driving force of the swing mechanism 153 is input to the arm base shaft 155. By inputting the driving force of the swinging mechanism 153 to the arm base shaft 155, the arm base shaft 155 is reciprocated and the swing arm 152 is swung about the arm base shaft 155 as a fulcrum. The swing mechanism 153 includes, for example, a motor.

Further, the elevating mechanism 154 raises and lowers the swing arm 152 under the control of the control unit 21 . Specifically, a lifting mechanism 154 is coupled to the arm base shaft 155. The elevating mechanism 154 moves the arm base shaft 155 up and down, and moves the swing arm 152 up and down integrally with the arm base shaft 155. The elevating mechanism 154 includes, for example, a ball screw mechanism and a motor that provides driving force to the ball screw mechanism.

Specifically, the swing arm 152 includes an arm body 156, a support shaft 157, and a rotation mechanism 158. The arm body 156 is hollow and extends substantially horizontally. The arm body 156 swings approximately horizontally by the swing mechanism 153. The arm main body 156 is raised and lowered by the raising and lowering mechanism 154. The support shaft 157 is located on one horizontal side of the arm body 156 and protrudes substantially horizontally. The rotation mechanism 158 is supported by a support shaft 157. A brush 151 is attached to the lower end of the rotation mechanism 158.

The rotation mechanism 158 rotates the brush 151 around the rotation axis AX2 under the control of the control unit 21. In other words, the rotation mechanism 158 causes the brush 151 to rotate. Specifically, the rotation mechanism 158 includes a brush motor 160, a shaft portion 161, a first fixed portion C1, and a second fixed portion C2.

The output shaft of the brush motor 160 is fixed to the shaft portion 161. The shaft portion 161 extends vertically downward. That is, the shaft portion 161 extends downward along the axial direction AD. A first fixing part C1 and a second fixing part C2 are attached to the lower part of the shaft part 161. The first fixing part C1 and the second fixing part C2 fix the brush 151 to the shaft part 161. By rotating the shaft portion 161, the brush motor 160 rotates the brush 151 together with the first fixed portion C1 and the second fixed portion C2 around the rotation axis AX2. In this embodiment, the rotation axis AX2 is substantially parallel to the rotation axis AX1. Therefore, the axial direction AD with respect to the rotation axis AX1 is approximately parallel to the rotation axis AX2. Therefore, the axial direction AD can also be regarded as the axial direction with respect to the rotation axis AX2.

In addition, the swing arm 152 further includes a biasing mechanism 159. The biasing mechanism 159 biases the brush 151 toward the inside of the substrate W in the radial direction RD via the support shaft 157 and the rotation mechanism 158 under the control of the control unit 21 . Specifically, the biasing mechanism 159 maintains the pressing force of the brush 151 in the radial direction RD against the end surface portion 51 of the substrate W at a preset pressing force. The pressing force is the pressure when pressing the brush 151 against the end surface portion 51 in the radial direction RD. For example, the biasing mechanism 159 biases the brush 151 toward the inside of the substrate W in the radial direction RD by driving the support shaft 157 along the radial direction RD using an air cylinder.

In addition to the liquid repellent nozzle 311 and the arm 312, the liquid repellent application unit 31 further includes a rotation shaft 313, a nozzle moving mechanism 314, a valve 315, and a pipe 316. A pipe 316 is connected to the liquid repellent nozzle 311 . Piping 316 supplies the liquid repellent to the liquid repellent nozzle 311 . A valve 315 is arranged in the pipe 316. Valve 315 closes or opens the flow path of piping 316. The control unit 21 controls the valve 315 so that the valve 315 opens the flow path of the pipe 316. As a result, the valve 315 opens the flow path of the pipe 316, so the liquid repellent nozzle 311 discharges the liquid repellent towards the end surface 51 of the substrate W.

The nozzle moving mechanism 314 moves the liquid repellent nozzle 311 between the application position P3 (FIG. 2) and the standby position P4 (FIG. 2) via the arm 312 and the rotation shaft 313.

Specifically, arm 312 extends along a substantially horizontal direction. A liquid repellent nozzle 311 is attached to the tip of the arm 312. Arm 312 is coupled to pivot shaft 313 . The rotation shaft 313 extends substantially vertically. The nozzle moving mechanism 314 rotates the rotation shaft 313 around a rotation axis along a substantially vertical direction, and rotates the arm 312 along a substantially horizontal plane. As a result, the liquid repellent nozzle 311 moves along a substantially horizontal plane. For example, the nozzle moving mechanism 314 includes an arm swing motor that rotates the rotation shaft 313 around the rotation axis. The arm swing motor is, for example, a servo motor. Further, the nozzle moving mechanism 314 raises and lowers the rotation shaft 313 along the substantially vertical direction, thereby raising and lowering the arm 312. As a result, the liquid repellent nozzle 311 moves along the substantially vertical direction. For example, the nozzle moving mechanism 314 includes a ball screw mechanism and an arm lift motor that provides driving force to the ball screw mechanism. The arm lifting motor is, for example, a servo motor.

In addition to the rinse liquid nozzle 331, the rinse liquid supply section 33 further includes a valve 332 and piping 333. A pipe 333 is connected to the rinse liquid nozzle 331 . Piping 333 supplies rinsing liquid to rinsing liquid nozzle 331 . A valve 332 is arranged in the pipe 333. The valve 332 closes or opens the flow path of the piping 333. The control unit 21 controls the valve 332 so that the valve 332 opens the flow path of the pipe 333. As a result, the valve 332 opens the flow path of the pipe 333, so the rinse liquid nozzle 331 discharges the rinse liquid toward the outer portion of the substrate W in the radial direction RD (including the end surface portion 51).

Next, details of the substrate W will be explained with reference to FIGS. 4 and 5. FIG. 4 is a cross-sectional view showing the substrate W. FIG. 4 shows an enlarged cross-section of the outer portion of the substrate W in the radial direction RD. FIG. 5 is a plan view showing a part of the substrate W. In FIG. 5, the surface A1 of the outer portion in the radial direction RD of the substrate W is shown in an enlarged manner.

As shown in FIGS. 4 and 5, the substrate W includes a main body 50 (hereinafter referred to as "substrate main body 50") and an end surface portion 51. The substrate body 50 indicates a portion of the substrate W excluding the end surface portion 51. In other words, the substrate main body 50 indicates a portion of the substrate W that is inner than the end surface portion 51 in the radial direction RD. In other words, the substrate body 50 represents a substantially flat portion of the substrate W along the radial direction RD. A pattern is formed on the substrate body 50. For example, a pattern is formed on the substrate body 50 on the surface A1 side of the substrate W. Note that, for example, a pattern may be formed on the substrate body 50 on the back surface A2 side of the substrate W. The substrate main body 50 has a substantially disk shape. In addition, in FIG. 5, the boundary between the substrate main body 50 and the end face part 51 is shown by a broken line for easy understanding.

Specifically, the substrate main body 50 includes a main body front surface peripheral portion 501 and a main body back surface peripheral portion 502. The main body surface peripheral portion 501 indicates a peripheral region of the surface A1 of the substrate main body 50. The main body back surface peripheral portion 502 indicates a peripheral region of the back surface A2 of the substrate main body 50. Each of the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 is a substantially annular region around the rotation axis AX1 (FIG. 2). The width in the radial direction RD of each of the main body front peripheral edge 501 and the main body back peripheral edge 502 is, for example, 1 mm or more and 4 mm or less.

The end surface portion 51 indicates a portion of the substrate W that is outside the substrate body 50 in the radial direction RD. In other words, the end surface portion 51 indicates an end surface region of the substrate W that is outside the substrate main body 50 in the radial direction RD. In other words, the end surface portion 51 indicates an end surface region of the substrate W that is outside the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 in the radial direction RD. The end surface portion 51 has a front edge 511 , a front shoulder 512 , a side surface 515 , a back shoulder 514 , and a back edge 513 .

The surface edge portion 511 is a region of the end surface portion 51 located on the outer side of the substrate body 50 in the radial direction RD on the front surface A1 side of the front surface A1 and the back surface A2 of the substrate W, and This is also a region located on the inside in the radial direction RD.

The surface edge 511 is a substantially annular region around the rotation axis AX1 (FIG. 2). The surface edge portion 511 surrounds the substrate body 50 (specifically, the body surface peripheral portion 501) in the circumferential direction CD in a plan view. The surface edge portion 511 includes an inclined surface that is inclined with respect to the surface A1 of the substrate body 50 from the body surface peripheral portion 501 toward the surface shoulder portion 512 in a cross-sectional view. The surface edge portion 511 has an inclination angle θ1 with respect to the main body surface peripheral portion 501. Surface edge 511 connects body surface periphery 501 and surface shoulder 512 .

The surface shoulder portion 512 is a region of the end surface portion 51 located on the outer side in the radial direction RD than the surface edge portion 511 on the surface A1 side, and is a region located on the inner side in the radial direction RD than the side surface portion 515. .

The surface shoulder portion 512 is a substantially annular region around the rotation axis AX1 (FIG. 2). The surface shoulder portion 512 surrounds the surface edge portion 511 in the circumferential direction CD in a plan view. The surface shoulder portion 512 includes a curved surface that curves from the surface edge portion 511 toward the side surface portion 515 in a cross-sectional view. Surface shoulder 512 connects surface edge 511 and side surface 515 .

The back edge portion 513 is a region of the end surface portion 51 located on the outer side in the radial direction RD than the board main body 50 and on the inner side in the radial direction RD than the side surface portion 515 on the back surface A2 side.

The back edge 513 is a substantially annular region around the rotation axis AX1 (FIG. 2). The back edge 513 surrounds the substrate body 50 (specifically, the main body back peripheral edge 502) in the circumferential direction CD in plan view. The back edge 513 includes an inclined surface that is inclined with respect to the back surface A2 of the substrate body 50 from the main body back peripheral edge 502 toward the back shoulder 514 in a cross-sectional view. The back edge 513 has an inclination angle θ2 with respect to the main body back peripheral edge 502. For example, the inclination angle θ2 is approximately the same as the inclination angle θ1. The back edge 513 connects the main body back peripheral edge 502 and the back shoulder 514 .

The back shoulder portion 514 is a region of the end surface portion 51 located on the outer side in the radial direction RD than the back edge portion 513 on the back surface A2 side, and is a region located on the inner side in the radial direction RD than the side surface portion 515. .

The back shoulder portion 514 is a substantially annular region around the rotation axis AX1 (FIG. 2). The back edge 513 surrounds the back edge 513 in the circumferential direction CD in plan view. The back shoulder 514 includes a curved surface that curves from the back edge 513 toward the side surface 515 in cross-sectional view. Back shoulder 514 connects back edge 513 and side surface 515 .

The side surface portion 515 is located at the outermost side of the substrate W in the radial direction RD. The side surface portion 515 is a substantially annular region around the rotation axis AX1 (FIG. 2). The side surface portion 515 surrounds the front shoulder portion 512 and the back shoulder portion 514 in the circumferential direction CD in a plan view. Side portion 515 includes a flat surface extending from front shoulder portion 512 toward back shoulder portion 514 in cross-sectional view. The side surface portion 515 has a substantially cylindrical shape around the rotation axis AX1. Side surface portion 515 connects front shoulder portion 512 and back shoulder portion 514 .

Here, as shown in FIG. 4, for example, the thickness d of the substrate W in the axial direction AD is 765 μm. Further, for example, the radius of curvature of the front shoulder portion 512 is 270 μm, the length L0 in the axial direction AD of the side surface portion 515 is 228 μm, and the radius of curvature of the back shoulder portion 514 is 238 μm. Further, for example, the length L1 is 314 μm, and the length L2 is 323 μm. The length L1 indicates the distance along the radial direction RD from the radially RD inner end of the surface edge 511 to the radially RD outer end (side surface portion 515) of the surface shoulder 512. The length L2 indicates the distance along the radial direction RD from the radial direction RD inner end of the back surface edge 513 to the radial direction RD outer end (side surface portion 515) of the back surface shoulder portion 514. Further, for example, the inclination angle θ1 of the front edge 511 is 22.3 degrees, and the inclination angle θ2 of the back edge 513 is 23.3 degrees.

Note that in FIGS. 6 to 11 and 16 to 19 shown below, the front shoulder portion 512 and the back shoulder portion 514 are simplified and shown as straight lines.

Next, a method for removing a liquid repellent substance according to this embodiment will be described with reference to FIGS. 6 and 7. The liquid repellent substance removal method constitutes a part of the substrate processing method according to this embodiment. 6 and 7 are diagrams showing the liquid repellent material removal method according to this embodiment. In FIGS. 6 and 7, in order to make the drawings easier to see, the brush 151 is shown in a side view, and the substrate W is shown in a cross section.

As shown in FIGS. 6 and 7, the liquid repellent material removal method includes step S100, step S200, step S300, step S400, and step S500.

First, as shown in FIG. 6, in step S100, the remover nozzle 171 discharges the remover 87 toward the rotating brush 151 at the standby position P2. As a result, the brush 151 is impregnated with the removal agent 87. In particular, in step S100, since the rotation mechanism 158 (FIG. 3) rotates the brush 151, the removal agent 87 evenly soaks into the brush 151. In FIG. 6, the remover nozzle 171 discharges the remover 87 in a direction intersecting the rotation axis AX2. Specifically, the remover nozzle 171 discharges the remover 87 in a direction substantially perpendicular to the rotation axis AX2. Further, the swing arm 152 (FIG. 3) moves (raises and lowers) the brush 151 along the axial direction AD. Therefore, even when the remover nozzle 171 is fixed, the remover 87 can be discharged over the entire brush 151. As a result, the entire brush 151 can be effectively impregnated with the removing agent. Note that the remover nozzle 171 may be moved (elevated and lowered) by a mechanism similar to the nozzle moving mechanism 314.

Next, in step S200, at the application position P3, the liquid repellent nozzle 311 applies the liquid repellent 81 to the end surface 51 of the substrate W by discharging the liquid repellent 81 onto the end surface 51 of the rotating substrate W. do. In this case, since the liquid repellent agent 81 is discharged toward the substrate W, the liquid repellent agent 81 adheres not only to the end surface portion 51 but also to the main body surface peripheral portion 501. Further, the liquid repellent agent 81 may wrap around the peripheral edge portion 502 of the back surface of the main body.

Next, in step S300, the heating unit 20 dries the liquid repellent agent 81 applied in step S200 by heating the outer portion of the rotating substrate W in the radial direction RD from below the substrate W. As a result, the solvent from the liquid repellent agent 81 evaporates, and the liquid repellent substance 82 adheres to the end surface portion 51 of the substrate W, the main body surface peripheral portion 501, and the main body back surface peripheral portion 502. That is, the liquid repellent agent 81 dries, and the liquid repellent substance 82 in the liquid repellent agent 81 adheres to the end surface portion 51 of the substrate W, the main body surface peripheral portion 501, and the main body back surface peripheral portion 502.

Next, as shown in FIG. 7, in step S400, at the removal position P1, the brush 151 is separated from the side surface 515, front shoulder 512, and back shoulder 514 of the rotating substrate W. At the same time, by contacting the main body surface peripheral edge 501, front surface edge 511, back surface edge 513, and main body back surface peripheral edge 502 of the rotating substrate W, the main body surface peripheral edge 501, front surface edge 511, and back surface edge The removing agent 87 is brought into contact with the liquid repellent substance 82 (step S300) attached to the portion 513 and the peripheral edge portion 502 of the rear surface of the main body. As a result, while leaving the liquid repellent material 82 on the side surface portion 515, the front shoulder portion 512, and the back shoulder portion 514, the liquid repellent material 82 is left on the main body surface peripheral portion 501, the front surface edge portion 511, the back surface edge portion 513, and the main body back surface peripheral portion 502. The liquid repellent substance 82 adhering to is removed by the removing agent 87. In other words, while leaving the liquid-repellent material 82 on the side surface portion 515, the front shoulder portion 512, and the back shoulder portion 514, the liquid repellent material 82 is left on the main body surface peripheral portion 501, the front surface edge portion 511, the back surface edge portion 513, and the main body back surface peripheral portion 502. The attached liquid-repellent substance 82 is separated from the main body surface peripheral edge 501, the front surface edge 511, the back surface edge 513, and the main body back peripheral edge 502. As a result, according to this embodiment, only the excess liquid repellent substance 82 can be removed (separated) from the substrate W.

Preferably, in step S400, the rotation mechanism 158 (FIG. 3) rotates the brush 151. In this case, the brush 151 rotates while separating from the side surface portion 515, front shoulder portion 512, and back shoulder portion 514 of the rotating substrate W. , contacts the front edge 511, the back edge 513, and the main body back peripheral edge 502. As a result, according to this embodiment, the excess liquid repellent substance 82 can be removed (separated) from the substrate W more effectively.

In the example of FIG. 7, at the contact position between the substrate W and the brush 151, the rotation direction of the substrate W and the rotation direction of the brush 151 are opposite to each other. Therefore, the excess liquid repellent substance 82 can be removed (separated) from the substrate W more reliably. Note that at the contact position between the substrate W and the brush 151, the rotation direction of the substrate W and the rotation direction of the brush 151 may be the same.

Next, in step S500, the rinsing liquid nozzle 331 discharges the rinsing liquid 86 onto the rotating substrate W, thereby washing away the excess liquid-repellent substance 82 separated from the substrate W from the substrate W. Thereafter, as the substrate W is rotated, the rinsing liquid adhering to the substrate W is dried.

For example, the rinse liquid nozzle 331 discharges the rinse liquid 86 onto the main body surface peripheral portion 501 and the end surface portion 51 . Note that the rinse liquid nozzle 331 may discharge the rinse liquid 86 onto the entire surface A1 of the substrate W. Further, the rinsing liquid may be discharged not only from the front surface A1 of the substrate W but also from the back surface A2 of the substrate W.

For example, after step S500, the substrate W having the liquid repellent material 82 adhered to the side surface portion 515, the front shoulder portion 512, and the back surface shoulder portion 514 is carried into the processing unit 1 (FIG. 1). Then, the back surface nozzle 8 (FIG. 1) discharges the processing liquid onto the back surface A2 of the substrate W. In this case, the liquid repellent material 82 attached to the side surface 515, front shoulder 512, and back shoulder 514 of the substrate W repels the processing liquid, so that the processing liquid is prevented from going around from the back surface A2 of the substrate W to the front surface A1. It can be suppressed. As a result, the pattern formed on the front surface A1 of the substrate W can be prevented from being influenced by the processing liquid discharged onto the back surface A2.

Here, the liquid-repellent substance 82 attached to the side surface portion 515, front surface shoulder portion 512, and back surface shoulder portion 514 of the substrate W is a polymer compound. Therefore, there is no need to remove the liquid repellent material 82. This is because the liquid repellent material 82 exists only on the side surface portions 515, the front shoulder portion 512, and the back surface shoulder portion 514.

Above, with reference to FIG. 7, step S400 has been described as an example of the step of bringing the removal agent into contact with the liquid repellent material. However, the following modifications are also possible.

That is, the spin chuck 13 (FIG. 3) rotates while holding the substrate W on which the liquid-repellent substance has adhered at least to the peripheral portion 501 of the main body surface and the end surface portion 51. During the rotation of the substrate W, the brush 151 is moved away from the side surface portion 515 in the radial direction RD of the end surface portion 51 of the substrate W while contacting at least the peripheral edge portion 501 of the main body surface of the substrate W, thereby repelling the brush 151. A removing agent capable of removing liquid substances is brought into contact with the liquid repellent substance attached to the peripheral edge portion 501 of the main body surface. As a result, at least the liquid repellent substance 82 attached to the peripheral edge portion 501 of the main body surface is removed by the removal agent 87 while leaving the liquid repellent substance 82 on the side surface portion 515 . In other words, at least the liquid repellent substance 82 attached to the peripheral edge 501 of the main body surface is separated from the peripheral edge 501 of the main body surface while leaving the liquid repellent substance 82 on the side surface 515 . As a result, according to this embodiment, only the excess liquid repellent substance 82 can be removed (separated) from the substrate W.

Preferably, the brush 151 contacts at least the main body surface peripheral portion 501 while rotating while being separated from the side surface portion 515 of the substrate W. In this case, the liquid repellent substance 82 can be more effectively removed (separated) from at least the peripheral portion 501 of the main body surface.

Further, a liquid-repellent substance may be attached to the peripheral edge portion 502 of the back surface of the main body. In this case, the spin chuck 13 rotates while holding the substrate W to which the liquid-repellent substance has adhered to the main body front peripheral edge 501, the main body back peripheral edge 502, and the end face 51. During the rotation of the substrate W, the brush 151 removes the removal agent by contacting at least the main body surface peripheral part 501 and the main body rear surface peripheral part 502 of the substrate W while being separated from the side surface part 515 of the substrate W. , the liquid-repellent material attached to the peripheral edge 501 of the front surface of the main body and the peripheral edge 502 of the back surface of the main body are brought into contact. As a result, while leaving the liquid repellent substance 82 on the side surface 515, at least the liquid repellent substance 82 adhering to the main body surface peripheral edge 501 and the main body rear surface peripheral edge 502 is removed by the removing agent 87. In other words, only the excess liquid repellent material 82 can be removed (separated) from the substrate W.

Preferably, the brush 151 contacts at least the main body front surface peripheral portion 501 and the main body rear surface peripheral portion 502 while rotating while being separated from the side surface portion 515 of the substrate W. In this case, the liquid repellent substance 82 can be more effectively removed (separated) from at least the main body surface peripheral edge 501 and the main body back surface peripheral edge 502.

Next, details of the brush 151 will be explained with reference to FIG. 8. FIG. 8 is a side view showing the brush 151. As shown in FIG. 8, the brush 151 includes a first contact portion B1 and a second contact portion B2. The first contact portion B1 and the second contact portion B2 are arranged at intervals in a certain direction. In the example of FIG. 8, the first contact portion B1 and the second contact portion B2 are arranged at intervals in the axial direction AD.

The first contact portion B1 includes a first outer contact portion B11 and a first inner contact portion B12. The first outer contact portion B11 has a substantially cylindrical shape or a substantially disk shape. The first outer contact portion B11 has a first fitting portion 55. The first fitting portion 55 includes a substantially columnar or substantially disc-shaped space. The first outer contact portion B11 includes a flat surface B14. The flat surface B14 has a substantially annular shape around the rotation axis AX2. The flat surface B14 is the lower end surface of the first outer contact portion B11.

The first fixing part C1 is fixed to the upper surface of the first outer contact part B11. Further, the first fixing portion C1 is fixed to the shaft portion 161.

The first inner contact portion B12 is arranged inside the first outer contact portion B11. The first inner contact portion B12 includes a first non-contact portion 41 and a first inclined contact portion 43. The first non-contact portion 41 has a substantially cylindrical shape or a substantially disk shape. The first non-contact part 41 fits into the first fitting part 55 and is fixed inside the first outer contact part B11. The first inclined contact portion 43 has a substantially inverted truncated cone shape. The first inclined contact portion 43 projects from the first outer contact portion B11 toward the second contact portion B2. The first inclined contact portion 43 has an inclined surface B13. The inclined surface B13 is inclined with respect to the flat surface B14. The inclined surface B13 has an inclined angle θ1 with respect to the flat surface B14. The inclination angle θ1 of the inclined surface B13 is approximately the same as the inclination angle θ1 of the surface edge portion 511 (FIG. 4). The inclined surface B13 is a substantially inverted truncated conical surface.

The second contact portion B2 includes a second outer contact portion B21 and a second inner contact portion B22. The second outer contact portion B21 has a substantially cylindrical shape or a substantially disk shape. The second outer contact portion B21 has a second fitting portion 56. The second fitting portion 56 includes a substantially columnar or substantially disk-shaped space. The second outer contact portion B21 includes a flat surface B24. The flat surface B24 has a substantially annular shape around the rotation axis AX2. The flat surface B24 is the upper end surface of the second outer contact portion B21.

The second fixing part C2 is fixed to the lower surface of the second outer contact part B21. Further, the second fixing portion C2 is fixed to the shaft portion 161.

The second inner contact portion B22 is arranged inside the second outer contact portion B21. The second inner contact portion B22 includes a second non-contact portion 42 and a second inclined contact portion 44. The second non-contact portion 42 has a substantially cylindrical shape or a substantially disc shape. The second non-contact portion 42 fits into the second fitting portion 56 and is fixed inside the second outer contact portion B21. The second inclined contact portion 44 has a substantially truncated conical shape. The second inclined contact portion 44 protrudes from the second outer contact portion B21 toward the first contact portion B1. The second inclined contact portion 44 has an inclined surface B23. The inclined surface B23 is inclined with respect to the flat surface B24. The inclined surface B23 has an inclined angle θ2 with respect to the flat surface B24. The inclination angle θ2 of the inclined surface B23 is approximately the same as the inclination angle θ2 of the surface edge portion 511 (FIG. 4). The inclined surface B23 is a substantially truncated conical surface.

The flat surface B14 of the first outer contact portion B11 and the flat surface B24 of the second outer contact portion B21 face each other with an interval in the axial direction AD. Further, the inclined surface B13 of the first inner contact portion B12 and the inclined surface B23 of the second inner contact portion B22 are opposed to each other with an interval in the axial direction AD. In this embodiment, the first contact portion B1 and the second contact portion B2 are symmetrical with respect to the virtual plane PL. The virtual plane PL is a virtual plane orthogonal to the rotation axis AX2, and passes through the midpoint of the opposing shaft portion 161a in the axial direction AD. Further, in this embodiment, the inclination angle θ1 and the inclination angle θ2 are substantially the same.

In addition, the 1st outer contact part B11 and the 1st inner contact part B12 may be comprised integrally. The second outer contact portion B21 and the second inner contact portion B22 may be integrally configured.

Further, the liquid repellent processing unit 5 (FIG. 3) further includes an inert gas supply section 35. The inert gas supply section 35 supplies inert gas from between the first contact section B1 and the second contact section B2. The inert gas is, for example, nitrogen or argon. Specifically, the inert gas supply section 35 includes an inert gas discharge section 353, a pipe 352, and a valve 351. The inert gas discharge section 353 discharges inert gas toward the outside of the shaft section 161 from between the first contact section B1 and the second contact section B2. The inert gas discharge part 353 is, for example, a nozzle.

Specifically, a pipe 352 is connected to the inert gas discharge section 353. Piping 352 supplies inert gas to inert gas discharge section 353 . A valve 351 is arranged in the pipe 352. The valve 351 closes or opens the flow path of the piping 352. The control unit 21 controls the valve 351 so that the valve 351 opens the flow path of the pipe 352. As a result, since the valve 351 opens the flow path of the pipe 352, the inert gas discharge section 353 discharges inert gas.

More specifically, the inert gas discharge section 353 is arranged on the opposing shaft section 161a. The opposing shaft portion 161a is a portion of the shaft portion 161 located between the first contact portion B1 and the second contact portion B2. For example, the shaft portion 161 passes through the first contact portion B1 and the second contact portion B2 in the axial direction AD.

Next, with reference to FIG. 9, an example of a process for removing the liquid repellent substance 82 using the brush 151 will be described. FIG. 9 is a diagram showing an example of a liquid-repellent substance removal process using the brush 151. In FIG. 9, in order to make the drawing easier to understand, the brush 151 is shown in a side view, and the substrate W is shown in a cross section. Further, in order to simplify the drawing, diagonal lines indicating the cross section are omitted.

As shown in FIG. 9, the first contact portion B1 contacts at least the peripheral edge portion 501 of the main body surface of the substrate W while being separated from the side surface portion 515 of the substrate W while the substrate W is rotating. A removing agent is brought into contact with the liquid-repellent substance adhering to the surface peripheral portion 501. That is, the removal agent impregnated in the first contact portion B1 is transferred to the main body surface peripheral portion 501 and the liquid repellent material. Therefore, the liquid repellent substance can be removed (separated) from the main body surface peripheral portion 501 using the removal agent while leaving the liquid repellent substance 82 on the side surface portion 515 .

On the other hand, during the rotation of the substrate W, the second contact portion B2 contacts at least the peripheral edge portion 502 of the back surface of the main body of the substrate W while being separated from the side surface portion 515 of the substrate W. Bring the remover into contact with the adhered liquid repellent material. In other words, the removal agent impregnated in the second contact portion B2 is transferred to the peripheral edge portion 502 of the back surface of the main body and the liquid repellent material. Therefore, while leaving the liquid repellent substance 82 on the side surface 515, the liquid repellent substance can be removed (separated) from the peripheral edge part 502 of the back surface of the main body using the removal agent.

Specifically, the first outer contact portion B11 contacts the main body surface peripheral portion 501 while the substrate W is rotating, thereby bringing the removal agent into contact with the liquid-repellent substance adhering to the main body surface peripheral portion 501. That is, the removal agent impregnated in the first outer contact portion B11 is transferred to the main body surface peripheral portion 501 and the liquid repellent material. Therefore, the liquid repellent substance can be effectively removed (separated) from the peripheral edge portion 501 of the main body surface using the removal agent.

In addition, the first inner contact portion B12 contacts the surface edge 511 of the end surface portion 51 of the substrate W during rotation of the substrate W, thereby bringing the removal agent into contact with the liquid-repellent substance adhering to the surface edge 511. . That is, the removal agent impregnated in the first inner contact portion B12 is transferred to the surface edge portion 511 and the liquid repellent material. Therefore, the liquid repellent material can be effectively removed (separated) from the surface edge 511 using the removal agent.

On the other hand, the second outer contact portion B21 contacts the peripheral edge 502 of the back surface of the main body of the substrate W during rotation of the substrate W, thereby bringing the removal agent into contact with the liquid-repellent substance attached to the peripheral edge 502 of the back surface of the main body. That is, the removal agent impregnated into the second outer contact portion B21 is transferred to the peripheral edge portion 502 of the back surface of the main body and the liquid repellent material. Therefore, the liquid repellent material can be effectively removed (separated) from the peripheral edge portion 502 of the back surface of the main body using the removal agent.

In addition, the second inner contact portion B22 contacts the back edge 513 of the end surface portion 51 of the substrate W during rotation of the substrate W, thereby bringing the removal agent into contact with the liquid-repellent substance adhering to the back edge 513. . That is, the removal agent impregnated in the second inner contact portion B22 is transferred to the back edge 513 and the liquid repellent material. Therefore, the liquid repellent material can be effectively removed (separated) from the back edge 513 using the removal agent.

More specifically, the flat surface B14 of the first outer contact portion B11 contacts the main body surface peripheral portion 501. Therefore, the removal liquid impregnated in the first outer contact portion B11 comes into contact with the liquid-repellent material attached to the main body surface peripheral portion 501 via the flat surface B14. Then, the liquid-repellent substance attached to the peripheral edge portion 501 of the main body surface is polished by, for example, the removal liquid and the flat surface B14, and separated from the peripheral edge portion 501 of the main body surface. In this way, the liquid-repellent substance can be removed more effectively from the peripheral portion 501 of the main body surface.

Further, the inclined surface B13 of the first inner contact portion B12 contacts the surface edge portion 511. Therefore, the removal liquid impregnated in the first inner contact portion B12 comes into contact with the liquid repellent material attached to the surface edge portion 511 via the inclined surface B13. Then, the liquid-repellent substance adhering to the surface edge 511 is separated from the surface edge 511 by being polished by, for example, the removal liquid and the inclined surface B13. In this way, the liquid repellent material can be removed more effectively from the surface edge 511. The inclined surface B13 is inclined along the surface edge 511.

On the other hand, the flat surface B24 of the second outer contact portion B21 contacts the peripheral edge portion 502 of the back surface of the main body. Therefore, the removal liquid impregnated in the second outer contact portion B21 comes into contact with the liquid-repellent material attached to the peripheral edge portion 502 of the back surface of the main body via the flat surface B24. Then, the liquid-repellent substance attached to the peripheral edge 502 of the back surface of the main body is polished by, for example, the removal liquid and the flat surface B24, and separated from the peripheral edge 502 of the back surface of the main body. In this way, the liquid repellent material can be removed more effectively from the peripheral edge portion 502 of the back surface of the main body.

Further, the inclined surface B23 of the second inner contact portion B22 contacts the back edge 513. Therefore, the removal liquid impregnated in the second inner contact portion B22 comes into contact with the liquid-repellent material attached to the back edge 513 via the inclined surface B23. Then, the liquid-repellent substance adhering to the back edge 513 is polished by, for example, the removal liquid and the inclined surface B23, and separated from the back edge 513. In this way, the liquid repellent material can be removed more effectively from the back edge 513. The inclined surface B23 is inclined along the back edge 513.

As a result of executing the removal process described above with reference to FIG. Also, the liquid repellent material 82 can be left on the front shoulder 512, the side surface 515, and the back shoulder 514 of the end surface 51 of the substrate W.

Further, the opposing shaft portion 161a faces the liquid repellent material 82 attached to the end surface portion 51 of the substrate W with an interval in the radial direction RDa. The radial direction RDa indicates the radial direction with respect to the rotation axis AX2, and is orthogonal to the rotation axis AX2. The inert gas discharge part 353 discharges inert gas toward the outside in the radial direction RDa from the opposing shaft part 161a. As a result, the liquid repellent substance 82 is exposed to the inert gas, and oxidation of the liquid repellent substance 82 can be prevented.

Note that the first inner contact portion B12 (specifically, the inclined surface B13) contacts the surface edge portion 511 and the surface shoulder portion 512 of the end surface portion 51 of the substrate W during rotation of the substrate W, so that the first inner contact portion B12 (specifically, the inclined surface B13) A removal agent may be brought into contact with the liquid-repellent substance adhering to the portion 511 and the surface shoulder portion 512. In this case, the liquid repellent material can be effectively removed (separated) from the surface edge 511 and the surface shoulder 512 using the removal agent. On the other hand, the second inner contact portion B22 (specifically, the inclined surface B23) contacts the back edge 513 and the back shoulder 514 of the end surface portion 51 of the substrate W during rotation of the substrate W, so that the second inner contact portion B22 (specifically, the inclined surface B23) A removal agent may be brought into contact with the liquid repellent material adhered to the portion 513 and the back shoulder portion 514. In this case, the liquid repellent material can be effectively removed (separated) from the back edge 513 and the back shoulder 514 using the removal agent.

In this case, for example, the control unit 21 adjusts the urging force (pressing force) by the urging mechanism 159 (FIG. 3) and elastically deforms the first inner contact portion B12 and the second inner contact portion B22 of the brush 151. , the first inner contact portion B12 of the brush 151 is brought into contact with the front edge 511 and the front shoulder 512, and the second inner contact portion B22 of the brush 151 is brought into contact with the back edge 513 and the back shoulder 514.

Next, with reference to FIG. 10, an example of a process for removing the liquid repellent substance 82 using the brush 151A according to the modified example will be described. FIG. 10 is a diagram illustrating an example of a liquid-repellent substance removal process using the brush 151A. In FIG. 10, in order to make the drawing easier to understand, the brush 151A is shown as a side view, and the substrate W is shown as a cross section. Further, in order to simplify the drawing, diagonal lines indicating the cross section are omitted.

As shown in FIG. 10, the first contact portion B1 includes a first inner contact portion B12a. The inclined surface B13 of the first inner contact portion B12a contacts the upper region a1 of the surface edge 511, but does not contact the lower region b1 of the surface edge 511. Therefore, only the liquid-repellent material adhering to the upper region a1 is removed, and the liquid-repellent material adhering to the lower region b1 remains.

On the other hand, the second contact portion B2 includes a second inner contact portion B22a. The inclined surface B13 of the second inner contact portion B22a contacts the lower region a2 of the back edge 513, but does not contact the upper region b2 of the back edge 513. Therefore, only the liquid-repellent material adhering to the lower region a2 is removed, and the liquid-repellent material adhering to the upper region b2 remains.

As a result of performing the removal process described above with reference to FIG. While removing the liquid-repellent substance from the substrate W, the lower region b1 of the front surface edge 511 of the end surface portion 51 of the substrate W, the front surface shoulder portion 512, the side surface portion 515, the back surface shoulder portion 514, and the upper region b2 of the back surface edge 513 The liquid repellent material 82 can be left behind.

In addition, the 1st outer contact part B11 and the 1st inner contact part B12a may be comprised integrally. The second outer contact portion B21 and the second inner contact portion B22a may be integrally configured.

Next, with reference to FIG. 11, an example of a process for removing the liquid repellent substance 82 using the brush 151B according to another modification will be described. FIG. 11 is a diagram showing an example of a liquid-repellent substance removal process using the brush 151B. In FIG. 11, in order to make the drawing easier to understand, the brush 151B is shown as a side view, and the substrate W is shown as a cross section. Further, in order to simplify the drawing, diagonal lines indicating the cross section are omitted.

As shown in FIG. 11, the first contact portion B1 has a first outer contact portion B11 and does not have a first inner contact portion B12 (FIG. 9). That is, the configuration of the first contact portion B1 is the same as the configuration of the first outer contact portion B11. In this case, the first contact portion B1 does not need to have the first fitting portion 55 (FIG. 9). Then, the flat surface B14 of the first contact portion B1 contacts the main body surface peripheral portion 501 while being separated from the end surface portion 51 of the substrate W. Therefore, only the liquid repellent material attached to the peripheral edge 501 of the main body surface is removed.

On the other hand, the second contact part B2 has a second outer contact part B21 and does not have a second inner contact part B22 (FIG. 9). That is, the configuration of the second contact portion B2 is the same as the configuration of the second outer contact portion B21. In this case, the second contact portion B2 does not need to have the second fitting portion 56 (FIG. 9). Then, the flat surface B24 of the first contact portion B1 contacts the peripheral edge portion 502 of the back surface of the main body while being separated from the end surface portion 51 of the substrate W. Therefore, only the liquid-repellent substance adhering to the peripheral edge 502 of the rear surface of the main body is removed.

As a result of performing the removal process described above with reference to FIG. The liquid repellent material 82 can be left behind.

Next, the substrate processing method according to this embodiment will be explained with reference to FIGS. 1 to 3 and FIG. 12. The substrate processing method uses a brush 151 that brings a removal agent capable of removing the liquid repellent substance into contact with the liquid repellent substance. The substrate processing method includes a liquid repellent material removal method. FIG. 12 is a flowchart showing the substrate processing method according to this embodiment. As shown in FIG. 12, the substrate processing method includes steps S1 to S13. Steps S1 to S13 are executed by the substrate processing apparatus 100.

First, as shown in FIGS. 2, 3, and 10, in step S1, the remover supply unit 17 supplies the remover to the brush 151 while rotating the brush 151 located at the standby position P2. . Specifically, the control unit 21 controls the rotation mechanism 158 so that the brush 151 rotates on its axis. As a result, the rotation mechanism 158 causes the brush 151 to rotate. Furthermore, the control unit 21 controls the removal agent supply unit 17 to supply the removal agent to the brush 151. As a result, the remover supply unit 17 supplies the remover to the brush 151. Note that the rotation of the brush 151 and the supply of the removal agent may be performed at the same time, or the rotation may be performed first and the removal agent may be supplied after, or the rotation may be performed and the removal agent may be supplied first. Note that when the supply of the removal agent to the brush 151 is completed, the rotation mechanism 158 stops the rotation of the brush 151.

Next, as shown in FIGS. 1 and 10, in step S2, the control unit 21 controls the central robot CR to carry the substrate W into the liquid repellent processing unit 5. As a result, the central robot CR carries the substrate W into the liquid repellent processing unit 5 and causes the spin chuck 13 to hold the substrate W.

Next, as shown in FIGS. 2, 3, and 10, in step S3, the control unit 21 controls the spin chuck 13 to rotate the substrate W. As a result, the spin chuck 13 rotates the substrate W.

Next, in step S4, the liquid repellent coating unit 31 discharges the liquid repellent toward the end surface 51 of the rotating substrate W at the coating position P3. Specifically, the control unit 21 controls the valve 315 so that the liquid repellent nozzle 311 discharges the liquid repellent onto the end surface 51 of the rotating substrate W. As a result, the valve 315 opens the flow path of the pipe 316, so the liquid repellent nozzle 311 discharges the liquid repellent onto the end surface 51 of the substrate W. Therefore, the liquid repellent agent is applied to the end surface portion 51 of the substrate W. However, since the liquid repellent nozzle 311 performs application of the liquid repellent, the liquid repellent is also applied to the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 of the substrate W. When the application of the liquid repellent is completed, the liquid repellent nozzle 311 stops discharging the liquid repellent.

Next, in step S5, the spin chuck 13 rotates the substrate W while holding the substrate W on which the liquid-repellent substance has adhered to at least the peripheral portion 501 of the main body surface and the end surface portion 51. Typically, the spin chuck 13 rotates the substrate W while holding the substrate W to which a liquid-repellent substance has adhered to the peripheral edge 501 of the front surface of the main body, the peripheral edge 502 of the back surface of the main body, and the end surface 51. The rotation of the substrate W continues from step S3. Then, the heating unit 20 heats the outer portion of the substrate W in the radial direction RD from below the substrate W. Specifically, the control unit 21 controls the heating unit 20 to heat the substrate W. As a result, the heating unit 20 heats the substrate W and dries the liquid repellent applied to the substrate W by heat. Therefore, the liquid repellent substance contained in the liquid repellent agent adheres to the end surface portion 51 of the substrate W, the main body surface peripheral portion 501, and the main body back surface peripheral portion 502.

Next, in step S6, the brush 151 contacts the rotating substrate W while rotating, and removes (separates) excess liquid-repellent material from the substrate W.

Specifically, the control unit 21 controls the rotation mechanism 158 so that the brush 151 rotates on its axis. As a result, the rotation mechanism 158 causes the brush 151 to rotate. The control unit 21 then controls the swing arm 152 so that the brush 151 moves from the standby position P2 to the removal position P1. Therefore, the swing arm 152 moves the brush 151 from the standby position P2 to the removal position P1. As a result, the brush 151 removes only the excess liquid repellent material from the substrate W while leaving the necessary liquid repellent material on the substrate W. When the removal of the excess liquid-repellent material is completed, the swing arm 152 moves the brush 151 from the removal position P1 to the standby position P2, and the rotation mechanism 158 stops the rotation of the brush 151.

Specifically, in step S6, during the rotation of the substrate W, the brush 151 is separated from the side surface portion 515 in the radial direction RD of the end surface portion 51 of the substrate W, and the brush 151 is applied to at least the peripheral edge portion 501 of the main body surface of the substrate W. 151, the removal agent is brought into contact with the liquid-repellent substance adhering to the peripheral edge portion 501 of the main body surface.

More specifically, in step S6, the brush 151 performs a first contact operation and a second contact operation. The first contact operation is to bring the first contact portion B1 into contact with at least the peripheral edge portion 501 of the main body surface of the substrate W while separating the first contact portion B1 from the side surface portion 515 of the substrate W while the substrate W is rotating. This is an operation of bringing the brush 151 into contact with the liquid-repellent substance attached to the peripheral edge 501 of the main body surface. The second contact operation is to contact at least the peripheral edge portion 502 of the back surface of the main body of the substrate W while separating the second contact portion B2 from the side surface portion 515 of the substrate W while the substrate W is rotating. This is an operation of bringing the removal agent into contact with the liquid repellent substance 82 attached to the peripheral edge portion 502 of the rear surface of the main body.

More specifically, in step S6, a first body contact action and a first end surface contact action are performed as the first contact action.

The first main body contacting operation is an operation of bringing the removal agent into contact with the liquid-repellent substance attached to the main body surface peripheral part 501 by bringing the first outer contact part B11 into contact with the main body surface peripheral part 501 while the substrate W is rotating. It is.

The first end surface contact operation is performed by bringing the first inner contact portion B12 into contact with the surface edge 511 of the end surface portion 51 of the substrate W while the substrate W is rotating, thereby removing the liquid-repellent substance attached to the surface edge 511. This is the action of bringing the agent into contact. Note that the first end surface contact operation is performed by bringing the first inner contact portion B12 into contact with the surface edge 511 and the surface shoulder 512 of the substrate W while the substrate W is rotating. The operation may also be an operation of bringing the removal agent into contact with the liquid repellent substance adhered to the liquid repellent material.

Moreover, in step S6, a second main body contacting action and a second end face contacting action are performed as the second contacting action.

The second body contact operation is performed by bringing the second outer contact portion B21 into contact with the peripheral edge 502 of the back surface of the main body of the substrate W while the substrate W is rotating, thereby applying a removal agent to the liquid-repellent substance attached to the peripheral edge 502 of the back surface of the main body. This is the action of making contact.

The second end face contact operation is performed by bringing the second inner contact portion B22 into contact with the back edge 513 of the end face 51 of the substrate W while the substrate W is rotating, thereby removing the liquid-repellent substance attached to the back edge 513. This is the action of bringing the agent into contact. Note that the second end surface contact operation is performed by bringing the second inner contact portion B22 into contact with the back edge 513 and the back shoulder 514 of the substrate W while the substrate W is rotating. The operation may also be an operation of bringing the removal agent into contact with the liquid repellent substance adhered to the liquid repellent material.

Preferably, in step S6, the brush 151 is brought into contact with at least the peripheral edge portion 501 of the main body surface while the brush 151 is rotated while being separated from the side surface portion 515 of the substrate W. More preferably, in step S6, the brush 151 is brought into contact with at least the main body front surface peripheral portion 501 and the main body back surface peripheral portion 502 while separating the brush 151 from the side surface portion 515 of the substrate W and rotating the brush 151 on its own axis. More preferably, in step S6, while separating the brush 151 from the side surface portion 515, front shoulder portion 512, and back shoulder portion 514 of the substrate W, and rotating the brush 151, the main body surface peripheral portion 501 and the surface edge The brush 151 is brought into contact with the portion 511, the back edge 513, and the main body back peripheral edge 502. More preferably, in step S6, while separating the brush 151 from the side surface portion 515 of the substrate W and rotating the brush 151, the main body surface peripheral portion 501, the surface edge portion 511, the surface shoulder portion 512, and the back surface shoulder portion are rotated. 514, the back edge 513, and the main body back peripheral edge 502 with the brush 151.

Preferably, in step S6, inert gas is discharged toward the liquid-repellent material 82 from between the first contact portion B1 and the second contact portion B2 of the brush 151.

Next, in step S7, the rinsing liquid supply unit 33 supplies a rinsing liquid to the substrate W, thereby washing away from the substrate W the excess liquid-repellent substance that was removed (separated) from the substrate W in step S6. Specifically, the control unit 21 controls the valve 332 so that the rinse liquid nozzle 331 discharges the rinse liquid onto the rotating substrate W. As a result, the valve 332 opens the flow path of the pipe 333, so the rinse liquid nozzle 331 discharges the rinse liquid onto the substrate W.

Next, in step S8, the spin chuck 13 dries the substrate W by rotating the substrate W. The rotation of the substrate W continues from step S3.

Next, in step S9, the control unit 21 controls the spin chuck 13 to stop the rotation of the substrate W. As a result, the spin chuck 13 stops rotating the substrate W.

Next, in step S10, the control unit 21 controls the central robot CR to carry out the substrate W from the liquid repellent processing unit 5. As a result, the center robot CR carries out the substrate W from the liquid repellent processing unit 5.

Next, in step S11, the control unit 21 controls the substrate W to which the liquid-repellent substance has adhered to the side surface portion 515, or the substrate W to which the liquid-repellent substance has adhered to the side surface portion 515, the front shoulder portion 512, and the back surface shoulder portion 514. The central robot CR is controlled so as to carry the data into the processing unit 1. As a result, the central robot CR carries the substrate W into the processing unit 1.

Next, in step S12, the control unit 21 controls the processing unit 1 to process the substrate W with the processing liquid. As a result, the processing unit 1 processes the substrate W using the processing liquid. As an example, the back surface nozzle 8 (FIG. 1) of the processing unit 1 processes the back surface A2 of the substrate W by discharging a processing liquid onto the back surface A2 of the substrate W. As another example, the surface nozzle 7 (FIG. 1) of the processing unit 1 processes the surface A1 of the substrate W by discharging a processing liquid onto the surface A1 of the substrate W.

Next, in step S13, the control unit 21 controls the center robot CR to carry out the substrate W from the processing unit 1. As a result, the center robot CR carries out the substrate W from the processing unit 1. Then, the process ends.

As described above with reference to FIG. 12, according to the substrate processing method according to the present embodiment, the brush 151 is separated from the side surface 515 of the substrate W while removing excess liquid-repellent material ( Step S6). Therefore, the excess liquid repellent material can be removed while leaving the liquid repellent material on the side surface portion 515 of the substrate W.

Further, according to the present embodiment, even if the processing liquid is discharged onto the back surface A2 of the substrate W in step S12, for example, it is possible to suppress the processing liquid from going around to the front surface A1 of the substrate W. This is because in step S6, only the excess liquid repellent material is removed, and the liquid repellent material is still attached to the side surface portion 515 of the substrate W.

Next, with reference to FIG. 13, the notch 52 formed in the substrate W will be described. FIG. 13 is a plan view showing the substrate W. As shown in FIG. 13, the substrate W may have a notch 52. The notch 52 is a recessed portion recessed inward in the radial direction RD from the end surface portion 51 of the substrate W in plan view. For example, the width of the notch 52 in the circumferential direction CD becomes smaller toward the inner side in the radial direction RD.

Next, the relationship between the notch 52 and the brush 151 will be described with reference to FIGS. 9 and 14. FIG. 14 is a plan view showing a state in which the brush 151 is in contact with the notch 52. In FIG. 14, the largest portion MX1 of the first inclined contact portion 43 in the brush 151 is shown. Further, the first outer contact portion B11 is indicated by a two-dot chain line.

As shown in FIG. 14, at least a portion of the brush 151 enters the notch 52 present in the end surface portion 51 of the substrate W and comes into contact with the bottom point BM of the notch 52. Therefore, according to the present embodiment, as in the case of the end surface portion 51, the main body surface peripheral portion 501, and the main body back surface peripheral portion 502, the liquid repellent material is left in the portion of the notch 52 where the liquid repellent material is required. Also, the liquid repellent material can be removed from the part of the notch 52 where the liquid repellent material is unnecessary and from the vicinity of the notch 52. The portion requiring the liquid repellent material includes at least a portion of the notch 52 that corresponds to the side surface portion 515. The liquid-repellent material is required in the notch 52 in a part corresponding to the front shoulder 512, a part corresponding to the back shoulder 514, a part corresponding to the front edge 511, and a part corresponding to the back edge 513. It may contain one or more of the following. The portion that does not require a liquid repellent material is a portion of the notch 52 that does not require a liquid repellent material.

In the example of FIG. 14, the entire first inclined contact portion 43 and the entire second inclined contact portion 44 (FIG. 9) of the brush 151 have entered the notch 52 in plan view. However, as long as the first inclined contact part 43 and the second inclined contact part 44 of the brush 151 contact the bottom point BM of the notch 52, part of the first inclined contact part 43 and the second inclined contact part 44 may enter the notch 52.

In the example of FIG. 14, the diameter 2R of the brush 151 is smaller than the maximum width L of the notch 52 in the circumferential direction CD. "R" indicates the radius of the brush 151 in plan view. As shown in FIG. 9, in this embodiment, the radius R of the brush 151 indicates the radius Rmx of the maximum portion MX1 of the first inclined contact portion 43 of the brush 151. Similarly, the diameter 2R of the brush 151 indicates the diameter 2Rmx of the largest portion MX1 of the first inclined contact portion 43 of the brush 151. In the example of FIG. 14, the diameter 2R of the brush 151 is smaller than the depth D of the notch 52 in the radial direction RD. Therefore, in plan view, the entire first inclined contact portion 43 and the entire second inclined contact portion 44 of the brush 151 fit inside the notch 52. Since the substrate W rotates in the rotation direction D1, the brush 151 moves relative to the notch 52. Therefore, in a plan view, while the liquid repellent substance remains in the area where the liquid repellent substance is required over the entire notch 52, the first inclined contact part 43 and the second inclined contact part 44 repel the liquid from the area where the liquid repellent substance is not required. Can remove substances. Similarly, in plan view, the liquid repellent material can be removed over the entire vicinity of the notch 52 by the first outer contact portion B11 and the second outer contact portion B21 (FIG. 9).

In particular, in this embodiment, the biasing mechanism 159 (FIG. 3) biases the brush 151 toward the inside of the substrate W in the radial direction RD. Therefore, when the brush 151 is positioned in the notch 52 due to the rotation of the substrate W, the first inclined contact part 43 and the second inclined contact part 44 of the brush 151 quickly enter the notch 52. As a result, the liquid repellent material can be more reliably removed from the portion of the notch 52 where the liquid repellent material is unnecessary.

Next, an example of a method for determining the radius R of the brush 151 will be described with reference to FIGS. 9, 13, and 15. As shown in FIG. 13, the width L of the notch 52 is expressed by equation (1). In formula (1), "Rw" indicates the radius of the substrate W. “θ” indicates the central angle with respect to the notch 52. The unit of the central angle θ is "degrees".

L=2π×Rw×(θ/360)…(1)

FIG. 15 is a plan view showing the brush 151 and the notch 52. In FIG. 15, the largest portion MX1 of the first inclined contact portion 43 in the brush 151 is shown. Further, the first outer contact portion B11 is indicated by a two-dot chain line. As shown in FIG. 15, the x and y coordinates are defined with the bottom point BM of the notch 52 as the origin 0. Then, the notch 52 is approximated by a parabola y. Therefore, notch 52 is represented by equation (2). The coefficient a in equation (2) is given by equation (3).

y=a×x ² …(2)
a=y/ ^x2 =By/ ^Ax2 ...(3)

The radius of curvature Rc at each point x of the parabola y is expressed by equation (4). "y1" indicates the first differential of equation (2) and is expressed by equation (5). "y2" indicates the second differential of equation (2) and is expressed by equation (6).

Rc=(1+y1 ² ) ^3/2 /y2...(4)
y1=dy/dx...(5)
y2=dy/dx...(6)

The radius of curvature R0 at the origin 0 of the parabola y, that is, the radius of curvature R0 at the bottom point BM of the notch 52 is expressed by equation (7). That is, in equation (7), x=0.

R0=(1+(2a) ² ×x ² ) ^3/2 /2a=1/2a...(7)

In this embodiment, the radius of curvature R0 at the origin 0 is set to the radius R of the brush 151. Therefore, the first inclined contact portion 43 and the second inclined contact portion 44 of the brush 151 can be reliably entered into the notch 52. As a result, the liquid repellent material can be reliably removed from the portion of the notch 52 where the liquid repellent material is unnecessary.

Here, as an example, the maximum value Rmax and minimum value Rmin of the radius R of the brush 151 are calculated.

First, the maximum value Rmax is calculated. In this case, assuming that the radius Rw of the substrate W is 150 mm and the central angle θ is 2, the width L of the notch 52 is 5.24 mm according to equation (1). Further, when Ax=2.62 mm and By=1.20 mm, the coefficient a=0.175 according to equation (3). When the coefficient a is substituted into equation (7), the maximum value of the radius of curvature R0 is 2.86 mm. Therefore, the maximum value Rmax of the radius R of the brush 151 is set to 2.86 mm.

Next, the minimum value Rmin is calculated. In this case, assuming that the radius Rw of the substrate W is 150 mm and the central angle θ is 1.5, the width L of the notch 52 is 3.93 mm according to equation (1). Further, when Ax=1.96 mm and By=1.20 mm, the coefficient a=0.31 according to equation (3). When the coefficient a is substituted into equation (7), the minimum value of the radius of curvature R0 is 1.61 mm. Therefore, the minimum value Rmin of the radius R of the brush 151 is set to 1.61 mm.

That is, for example, when the width L of the notch 52 is 3.93 mm or more and 5.24 mm or less, the radius R of the brush 151 is set to 1.61 mm or more and 2.86 mm or less.

(First modification)
A brush 151C according to a first modification of the present embodiment will be described with reference to FIGS. 16 to 18. The first modified example differs from the embodiment described with reference to FIG. 8 mainly in that the first inner contact portion B12c and the second inner contact portion B22c of the brush 151C according to the first modified example are movable. Hereinafter, the differences between the first modified example and the embodiment will be mainly explained.

FIG. 16 is a sectional view showing a brush 151C according to the first modification. As shown in FIG. 16, the first outer contact portion B11c has an internal space SP1. The internal space SP1 can accommodate the first inner contact portion B12c.

The first inner contact portion B12c includes a slider 181 and a main body 185. The main body 185 is attached to the outer peripheral surface of the slider 181. The slider 181 has a substantially cylindrical shape. The slider 181 is inserted into the shaft portion 161. The slider 181 is movable along the axial direction AD in the shaft portion 161. Therefore, the first inner contact portion B12c is movable along the axial direction AD in the shaft portion 161. Further, the slider 181 rotates together with the shaft portion 161 around the rotation axis AX2. In this case, the engaging portion of the slider 181 and the engaging portion of the shaft portion 161 are engaged. The engaging portion of the slider 181 is, for example, a convex portion extending in the axial direction AD, and the engaging portion of the shaft portion 161 is, for example, a recessed portion extending in the axial direction AD.

Internal space SP1 includes a gap GP1 and a gap GP2. Gap GP1 indicates the space between the upper surface 71 of the first inner contact portion B12c and the inner upper surface 72 of the first outer contact portion B11c. Gap GP2 indicates a space between the outer circumferential surface 75 of the first inner contact portion B12c and the inner circumferential surface 74 of the first outer contact portion B11c.

On the other hand, the second outer contact portion B21c has an internal space SP2. The internal space SP2 can accommodate the second inner contact portion B22c.

The second inner contact portion B22c includes a slider 182 and a main body 186. The main body 186 is attached to the outer peripheral surface of the slider 182. Slider 182 has a substantially cylindrical shape. The slider 182 is inserted into the shaft portion 161. The slider 182 is movable along the axial direction AD in the shaft portion 161. Therefore, the second inner contact portion B22c is movable along the axial direction AD in the shaft portion 161. Further, the slider 182 rotates together with the shaft portion 161 around the rotation axis AX2. The configuration of slider 182 is similar to that of slider 181.

Internal space SP2 includes a gap GP3 and a gap GP4. Gap GP3 indicates the space between the upper surface 91 of the second inner contact portion B22c and the inner upper surface 92 of the second outer contact portion B21c. Gap GP4 indicates the space between the outer circumferential surface 95 of the second inner contact portion B22c and the inner circumferential surface 94 of the second outer contact portion B21c.

As a first example, a biasing member that biases the first inner contact portion B12c downward is disposed in the gap GP1, and a biasing member that biases the second inner contact portion B22c upward is disposed in the gap GP3. May be placed. The biasing member is, for example, an elastic member such as a spring. Alternatively, as a second example, the positions of the first inner contact portion B12c and the second inner contact portion B22c may be fixed by arranging spacers in the gap GP1 and the gap GP3, respectively. In the first and second examples, stoppers are disposed below the first inner contact portion B12c and above the second inner contact portion B22c in the opposing shaft portion 161a.

Next, with reference to FIGS. 17 and 18, a liquid-repellent substance removal process using the brush 151C according to the first modification will be described. FIG. 17 is a diagram showing the first step S1000 of the liquid-repellent substance removal process using the brush 151C. FIG. 18 is a diagram showing the second step S2000 of the liquid-repellent substance removal process using the brush 151C.

As shown in FIGS. 17 and 18, in the first step S1000 and the second step S2000, the slider 181 moves downward, and the first inner contact portion B12c (specifically, the first inclined contact portion 43) It protrudes downward from the first outer contact portion B11c. Further, the slider 182 moves upward, and the second inner contact portion B22c (specifically, the second inclined contact portion 44) protrudes upward from the second outer contact portion B21c.

First, as shown in FIG. 17, in the first step S1000, the flat surface B14 of the first outer contact portion B11c contacts the region M2 of the main body surface peripheral portion 501, and the inclined surface B13 of the first inner contact portion B12c contacts the surface It contacts the edge 511. As a result, the liquid repellent substance adhering to the region M2 and the surface edge 511 is removed (separated) by the removal liquid. Further, in the first step S1000, the flat surface B24 of the second outer contact portion B21c contacts the region N2 of the back surface peripheral portion 502 of the main body, and the inclined surface B23 of the second inner contact portion B22c contacts the back surface edge portion 513. . As a result, the liquid repellent substance adhering to the region N2 and the surface shoulder portion 512 is removed (separated) by the removal liquid.

However, at the time of completion of the first step S1000, the liquid-repellent substance 85 remains in the area M1 of the main body front peripheral edge 501 and the area N1 of the main body back peripheral edge 502.

Therefore, after the first step S1000 is completed, the swing arm 152 (FIG. 3) moves the brush 151C in the direction DA. The direction DA indicates a direction facing outward in the radial direction RD. Specifically, the swing arm 152 moves the brush 151C in the direction DA by a distance corresponding to the regions M1 and N1.

Note that the region M1 indicates the radially RD inner portion of the main body surface peripheral portion 501, and the region M2 indicates the radially RD outer portion of the main body surface peripheral portion 501. Region N1 indicates the radially RD inner portion of the main body back surface peripheral portion 502, and region N2 indicates the radial direction RD outer portion of the main body back surface peripheral portion 502.

Next, as shown in FIG. 18, in the second step S2000, the flat surface B14 of the first outer contact portion B11c contacts the region M1 of the main body surface peripheral portion 501, and the inclined surface B13 of the first inner contact portion B12c contacts the region M1 of the main body surface peripheral portion 501. It is spaced apart from the surface edge 511. As a result, the liquid repellent substance adhering to the region M1 is removed (separated) by the removal liquid. Further, in the second step S2000, the flat surface B24 of the second outer contact portion B21c contacts the region N1 of the back surface peripheral portion 502 of the main body, and the inclined surface B23 of the second inner contact portion B22c is separated from the back surface edge portion 513. . As a result, the liquid repellent substance adhering to the region N1 is removed (separated) by the removal liquid.

As a result of the above, in the first modified example, the liquid-repellent substance 82 remains on the side surface portion 515, front surface shoulder portion 512, and back surface shoulder portion 514 of the substrate W. Note that the first step S1000 may be performed after the second step S2000.

Further, in the first modification, the brush 151C includes sliders 181 and 182. Therefore, the interval in the axial direction AD between the first inner contact portion B12c and the second inner contact portion B22c can be expanded or contracted. As a result, the positions of the first inner contact portion B12c (sloped surface B13) and the second inner contact portion B22c (sloped surface B23) in the axial direction AD can be set according to the shape of the end surface portion 51 of the substrate W.

(Second modification)
With reference to FIG. 19, a brush 151D according to a second modification of the present embodiment will be described. The second modification differs from the embodiment described with reference to FIG. 8 in that the first inner contact portion B12 of the brush 151D according to the second modification follows the shapes of the surface edge 511 and the surface shoulder 512. Mainly different. Hereinafter, the differences between the second modified example and the embodiment will be mainly explained.

FIG. 19 is a diagram illustrating an example of a liquid-repellent substance removal process using a brush 151D according to the second modification. In FIG. 91, in order to make the drawing easier to understand, the brush 151D is shown as a side view, and the substrate W is shown as a cross section. Further, in order to simplify the drawing, diagonal lines indicating the cross section are omitted.

As shown in FIG. 19, the first inclined contact portion 43d has a first contact surface B15 and a second contact surface B16. The first contact surface B15 has a shape along the surface edge 511. Therefore, when the first contact surface B15 comes into contact with the surface edge 511, the liquid repellent substance adhering to the surface edge 511 is removed (separated) by the removal liquid. The second contact surface B16 has a shape along the surface shoulder portion 512. Therefore, when the second contact surface B16 comes into contact with the surface shoulder portion 512, the liquid repellent substance adhering to the surface shoulder portion 512 is removed (separated) by the removal liquid.

Further, the second inclined contact portion 44d has a first contact surface B25 and a second contact surface B26. The first contact surface B25 has a shape along the back edge 513. Therefore, when the first contact surface B25 comes into contact with the back edge 513, the liquid repellent substance adhering to the back edge 513 is removed (separated) by the removal liquid. The second contact surface B26 has a shape along the back shoulder portion 514. Therefore, when the second contact surface B26 comes into contact with the back shoulder 514, the liquid repellent substance adhering to the back shoulder 514 is removed (separated) by the removal liquid.

As a result of the above, in the second modification, the liquid repellent substance 82 remains only on the side surface portion 515 of the substrate W.

The embodiments of the present invention have been described above with reference to the drawings. However, the present invention is not limited to the above-described embodiments, and can be implemented in various forms without departing from the spirit thereof. Furthermore, the plurality of components disclosed in the above embodiments can be modified as appropriate. For example, some of the components shown in one embodiment may be added to the components of another embodiment, or some of the components shown in one embodiment may be configured. Elements may be deleted from the embodiment.

In addition, the drawings mainly schematically show each component in order to facilitate understanding of the invention, and the thickness, length, number, spacing, etc. of each component shown in the drawings are Actual results may differ due to circumstances. Further, the configuration of each component shown in the above embodiment is an example, and is not particularly limited, and it goes without saying that various changes can be made without substantially departing from the effects of the present invention. .

(1) In the embodiment described with reference to FIG. 3 (including the modified example), the brush 151 was rotated by the rotation mechanism 158. However, the brush 151 may rotate following the substrate W. Note that the brush 151 does not need to rotate.

(2) In the embodiment described with reference to FIG. 12, after removing excess liquid repellent material from the substrate W, the processing unit 1 processed the substrate W with the processing liquid. However, after removing excess liquid repellent material from the substrate W, the liquid repellent treatment unit 5 may treat the substrate W with the treatment liquid. In this case, the liquid repellent treatment unit 5 includes a nozzle that discharges the treatment liquid onto the substrate W. For example, the liquid repellent treatment unit 5 may include a front surface nozzle 7 and/or a back surface nozzle 8.

(3) The brushes 151, 151A to 151D described with reference to FIGS. 8 to 11 and FIGS. Although the brushes 151, 151A to 151D have contact surfaces B15, B25 and second contact surfaces B16, B26, the shapes of the brushes 151, 151A to 151D are not particularly limited as long as they can remove excess liquid repellent material.

Further, the first contact portion B1 and the second contact portion B2 may constitute separate brushes. In this case, for example, a shaft portion and a rotation mechanism are provided for each brush. Furthermore, the first outer contact portion B11, the first inner contact portion B12, the second outer contact portion B21, and the second inner contact portion B22 may each constitute separate brushes. In this case, for example, a shaft portion and a rotation mechanism are provided for each brush.

(4) Although the spin chuck 13 described with reference to FIG. 3 is of a vacuum suction type, it may be of a clamping type or a Bernoulli type, for example.

INDUSTRIAL APPLICATION This invention is suitably used for a substrate processing apparatus and a substrate processing method.

13 Spin chuck (substrate holding part)
100 Substrate processing apparatus 151, 151A to 151D Brush (removal member)
158 Rotation mechanism 159 Biasing mechanism 353 Inert gas discharge part B1 First contact part B11 First outer contact part B12, B12a, B12c, B12d First inner contact part B2 Second contact part B21 Second outer contact part B22, B22a , B22c, B22d Second inner contact portion W Substrate

Claims (20)

a substrate holder that holds and rotates a substrate on which a liquid-repellent substance capable of repelling a processing liquid is attached to at least a peripheral edge portion and an end surface portion of the main body surface;
During the rotation of the substrate, the liquid repellent material is removed by contacting at least the peripheral edge of the main body surface of the substrate while being separated from the radial side surface of the end surface of the substrate. a removal member that brings a possible removal agent into contact with the liquid repellent substance attached to the peripheral edge of the surface of the main body;
The body surface peripheral portion of the substrate indicates a peripheral area of the surface of the substrate body,
In the substrate processing apparatus, the end surface portion of the substrate indicates an end surface region radially outer than the substrate main body. The removal member is
During the rotation of the substrate, by contacting at least the periphery of the main body surface of the substrate while being separated from the side surface of the substrate, the liquid repellent substance attached to the periphery of the main body surface is removed. a first contact portion that contacts the agent;
During the rotation of the substrate, the removing agent contacts at least the periphery of the back surface of the main body of the substrate while being separated from the side surface of the substrate, so that the liquid repellent substance attached to the periphery of the back surface of the main body is coated with the removal agent. a second contact portion that contacts the
2. The substrate processing apparatus according to claim 1, wherein the peripheral edge of the back surface of the substrate indicates a peripheral area of the back surface of the substrate main body. The first contact portion is
a first outer contact portion that brings the removal agent into contact with the liquid repellent substance attached to the periphery of the main body surface by contacting the periphery of the main body surface while the substrate is rotating;
The removal agent is disposed inside the first outer contact portion, and contacts the surface edge of the end surface portion of the substrate during rotation of the substrate, thereby causing the removal agent to contact the liquid repellent substance attached to the surface edge. a first inner contact portion that contacts the
The surface edge portion of the end surface portion is a region of the end surface portion located on the outer side in the radial direction than the peripheral portion of the main body surface on the front surface side of the substrate, and is located on the inner side in the radial direction than the side surface portion. Indicates the area where it is located,
The second contact portion is
a second outer contact portion that contacts the peripheral edge of the back surface of the main body of the substrate during rotation of the substrate, thereby bringing the removal agent into contact with the liquid repellent substance attached to the peripheral edge of the back surface of the main body;
The removal agent is disposed inside the second outer contact portion, and contacts the back edge of the end face portion of the substrate during rotation of the substrate, thereby causing the removal agent to be attached to the liquid repellent substance attached to the back edge. a second inner contact portion that contacts the
The back edge of the end face is a region of the end face on the back side of the substrate that is located radially outward from the back peripheral edge of the main body and radially inward from the side face. 3. The substrate processing apparatus according to claim 2, wherein the substrate processing apparatus indicates a region in which the substrate is located. The first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface,
The first inner contact portion has an inclined surface that contacts the surface edge,
The second outer contact portion has a flat surface that contacts the peripheral edge of the back surface of the main body,
The substrate processing apparatus according to claim 3, wherein the second inner contact portion has an inclined surface that contacts the back edge. 5. The substrate processing apparatus according to claim 3, wherein the distance between the first inner contact part and the second inner contact part can be expanded or contracted. The substrate processing apparatus according to any one of claims 2 to 5, further comprising an inert gas discharge part that discharges an inert gas from between the first contact part and the second contact part. The substrate processing apparatus according to any one of claims 1 to 6, wherein the removal member contacts at least the peripheral edge of the main body surface while rotating while being separated from the side surface of the substrate. . The substrate processing apparatus according to any one of claims 1 to 7, wherein at least a portion of the removal member enters a notch existing in the end face portion of the substrate and contacts a bottom point of the notch. . The substrate processing apparatus according to claim 8, further comprising a biasing mechanism that biases the removal member radially inward of the substrate. The substrate processing apparatus according to any one of claims 1 to 9, further comprising a removing agent supply unit that supplies the removing agent to the removing member. A substrate processing method using a removal member that brings a removal agent capable of removing a liquid repellent substance into contact with the liquid repellent substance, the method comprising:
holding and rotating the substrate to which the liquid-repellent substance is attached at least to the periphery of the main body surface and the end surface;
During the rotation of the substrate, the removal member is brought into contact with at least the peripheral edge of the main body surface of the substrate while being separated from the radial side surface of the end surface portion of the substrate; bringing the removal agent into contact with the liquid-repellent substance attached to the peripheral edge of the surface of the main body,
The body surface peripheral portion of the substrate indicates a peripheral area of the surface of the substrate body,
The substrate processing method, wherein the end surface portion of the substrate indicates an end surface region radially outer than the substrate main body. The removal member includes a first contact part and a second contact part arranged at intervals in a certain direction,
In the step of bringing the removal agent into contact with the liquid repellent substance, a first contact operation and a second contact operation are performed,
The first contact operation includes, during rotation of the substrate, contacting at least the first contact portion with the peripheral edge of the main body surface of the substrate while separating the first contact portion from the side surface of the substrate. The removing agent is brought into contact with the liquid repellent substance attached to the peripheral edge of the surface of the main body by
The second contact operation includes contacting at least a peripheral edge of the back surface of the main body of the substrate while separating the second contact portion from the side surface of the substrate while the substrate is rotating. This is an operation of bringing the removal agent into contact with the liquid-repellent substance attached to the peripheral edge of the back surface of the main body,
12. The substrate processing method according to claim 11, wherein the peripheral edge of the back surface of the substrate body indicates a peripheral area of the back surface of the substrate body. The first contact part includes a first outer contact part and a first inner contact part disposed inside the first outer contact part,
In the step of bringing the removal agent into contact with the liquid repellent substance, the first contact operation includes a first body contact operation and a first end surface contact operation,
The first body contacting operation is performed by bringing the first outer contact portion into contact with the peripheral edge of the surface of the main body while the substrate is rotating, thereby applying the removal agent to the liquid repellent substance attached to the peripheral edge of the surface of the main body. It is a touching action,
The first end surface contacting operation is performed by bringing the first inner contact portion into contact with the surface edge of the end surface portion of the substrate while the substrate is rotating, thereby contacting the liquid repellent substance attached to the surface edge. an operation of bringing the removal agent into contact;
The surface edge portion of the end surface portion is a region of the end surface portion located on the outer side in the radial direction than the peripheral portion of the main body surface on the front surface side of the substrate, and is located on the inner side in the radial direction than the side surface portion. Indicates the area where it is located,
The second contact part includes a second outer contact part and a second inner contact part disposed inside the second outer contact part,
In the step of bringing the removal agent into contact with the liquid repellent substance, a second main body contacting operation and a second end face contacting operation are performed as the second contacting operation,
The second body contacting operation is performed by bringing the second outer contact portion into contact with the periphery of the back surface of the main body of the substrate while the substrate is rotating, thereby causing the liquid-repellent substance attached to the periphery of the back surface of the main body to be exposed to the liquid repellent material. This is the action of bringing the remover into contact with the
The second end face contacting operation is performed by bringing the second inner contact portion into contact with the back edge of the end face of the substrate while the substrate is rotating, thereby contacting the liquid repellent substance attached to the back edge. an operation of bringing the removal agent into contact;
The back edge of the end face is a region of the end face on the back side of the substrate that is located radially outward from the back peripheral edge of the main body and radially inward from the side face. 13. The substrate processing method according to claim 12, wherein the substrate processing method indicates a region in which the substrate is located. The first outer contact portion has a flat surface that contacts the peripheral edge of the main body surface,
The first inner contact portion has an inclined surface that contacts the surface edge,
The second outer contact portion has a flat surface that contacts the peripheral edge of the back surface of the main body,
14. The substrate processing method according to claim 13, wherein the second inner contact portion has an inclined surface that contacts the back edge. 15. The substrate processing method according to claim 13, wherein the distance between the first inner contact part and the second inner contact part can be expanded or contracted. Any one of claims 12 to 15, wherein in the step of bringing the removing agent into contact with the liquid repellent substance, an inert gas is discharged from between the first contact part and the second contact part. The substrate processing method described in . In the step of bringing the removal agent into contact with the liquid repellent substance, the removal member is separated from the side surface of the substrate and rotated, while the removal member is applied to at least the peripheral edge of the surface of the main body. The substrate processing method according to any one of claims 11 to 16, wherein the substrate is brought into contact with the substrate. 11. In the step of bringing the removal agent into contact with the liquid repellent substance, at least a portion of the removal member enters a notch present in the end surface portion of the substrate and comes into contact with a bottom point of the notch. 18. The substrate processing method according to claim 17. 19. The substrate processing method according to claim 18, wherein in the step of bringing the removal agent into contact with the liquid repellent substance, the removal member is urged radially inward of the substrate. The substrate processing method according to any one of claims 11 to 19, further comprising the step of supplying the removing agent to the removing member.

Images