JP2023007045A - Cleaning device - Google Patents

Abstract

To provide a cleaning device that can reduce rotation speed reduction and rotation stoppage of a substrate.SOLUTION: A cleaning device includes a rotation driving unit 10 that rotates a substrate W by rotating a plurality of rollers 10a that hold the outer periphery of the substrate W, a cleaning liquid ejection unit 40 that discharges a cleaning liquid onto the substrate W, and a cleaning unit 20 that cleans the surface of the substrate W by bringing a brush into contact with at least one surface of the rotating substrate W. The roller 10a has a protruding portion that protrudes into a notch N of the substrate W at a position that abuts on the outer periphery of the substrate W.SELECTED DRAWING: Figure 1

Description

The present invention relates to cleaning equipment.

2. Description of the Related Art In the manufacturing process of a semiconductor device, it is sometimes required to wash the surface of a semiconductor wafer, which is a substrate, with a high degree of cleanliness. For example, after chemical mechanical polishing (CMP) is performed in order to planarize the surface of a substrate, particles such as polishing scraps and slurry residue scraps containing organic substances and metals (hereinafter referred to as , contaminants) are attached.

Contaminants interfere with flat film formation and cause short circuits in circuit patterns, resulting in product defects. Therefore, it is necessary to remove it by cleaning the substrate with a cleaning liquid. As a device for performing such cleaning, a cleaning device using a rotating brush is known (see Patent Document 1).

In this cleaning apparatus, the substrate is driven to rotate, and the rotating brush is brought into contact with the surface of the substrate through the cleaning liquid and moved in a direction parallel to the substrate. As a result, contaminants adhering to the surface of the substrate are floated by the cleaning liquid and discharged to the outside of the substrate by the brush, so that the entire substrate is cleaned.

The substrate is held by a plurality of circular rollers on its outer periphery, and is rotated by rotating the rollers in the same direction. By changing the rotation speed of the roller, the rotation speed of the substrate can be adjusted, and the rotation speed of the substrate can be detected from the rotation speed of the motor that rotates the roller.

JP-A-7-283180

In order to stabilize the rotational speed of the substrate at a uniform speed, it is preferable that the rotating roller and the substrate are completely circular. However, a notch, which is a small notch, is provided on the periphery of the substrate as a mark for aligning the substrates and indicating the crystal orientation.

For this reason, the outer periphery of the substrate is not perfectly circular, and a minute recess is generated at the notch portion. Then, when the roller comes into contact with the notch of the board, the rotation of the roller is not transmitted to the board, and the board starts to slip. Things happen often.

SUMMARY OF THE INVENTION The present invention has been proposed to solve the problems described above, and an object of the present invention is to provide a cleaning apparatus capable of reducing rotation speed reduction and rotation stoppage of a substrate.

In order to solve the above problems, the cleaning apparatus of the present invention includes a rotation driving unit that rotates and drives the substrate by rotating a plurality of rollers that hold the outer periphery of the substrate, and a cleaning liquid that is discharged onto the substrate. a cleaning liquid discharge part; a cleaning part for cleaning the surface of the substrate by bringing a brush into contact with at least one surface of the rotating substrate; a protrusion that fits into a notch in the substrate.

The cleaning apparatus of the present invention can reduce rotation speed reduction and rotation stoppage of the substrate.

BRIEF DESCRIPTION OF THE DRAWINGS The perspective view which shows schematic structure of the washing|cleaning apparatus of embodiment. It is a diagram showing a state (A) in which a roller without a protrusion is in contact with the outer periphery of the substrate and a state (B) in which it is in contact with the notch of the substrate, the right figure is a plan view, and the left figure is a DD of the right figure. Vertical sectional view FIG. 10 shows a state (A) in which a roller with a protrusion is in contact with the outer periphery of a substrate and a state (B) in which it is in contact with a notch in the substrate, wherein the right figure is a plan view and the left figure is a DD of the right figure. cross section view Side view showing roller (A) in release position and roller (B) in holding position A plan view showing the roller (A) in the release position and the roller (B) in the holding position Side view showing cleaning unit A plan view showing the cleaning section (A) at the start position of cleaning, the cleaning section (B) during cleaning, and the cleaning section (C) at the end position. It is a diagram showing a state (A) in which the modified example of the roller of the embodiment is in contact with the outer periphery of the substrate and a state (B) in which it is in contact with the notch of the substrate, the right figure is a plan view, and the left figure is a DD arrow. Vertical cross-sectional view The top view which shows the modification of the roller of embodiment

BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the drawings. This embodiment, as shown in FIG. 1, is a cleaning apparatus 1 that cleans a substrate W with a cleaning liquid and a brush while rotating it. The substrate W to be cleaned is typically a semiconductor wafer, but may be a substrate for a display device or the like. The substrate W has a circular shape, and a notch N, which is a notch for positioning in a processing step and for indicating the crystal orientation, is formed on the outer periphery (see FIG. 2, etc.). The shape of the notch N is, for example, V-shaped or U-shaped. In a 300 mm wafer, the radial depth of the notch N is, for example, about 1 mm, but the present invention is not limited to this. Further, the outer periphery of the substrate W is beveled. That is, chamfering is performed by grinding the corners.

[Constitution]
As shown in FIG. 1, the cleaning device 1 has a rotation drive section 10, a cleaning section 20, a brush drive section 30, and a cleaning liquid discharge section 40. As shown in FIG.

(Rotating drive part)
The rotation driving unit 10 rotates the substrate W by rotating a plurality of rollers 10a that hold the outer circumference of the substrate W. As shown in FIG. The rotary drive section 10 has a first holding section 11 , a second holding section 12 , a first driving section 13 and a second driving section 14 . The first holding part 11 and the second holding part 12 are arranged at positions facing each other with the substrate W interposed therebetween.

Each of the first holding portion 11 and the second holding portion 12 has a pair of rollers 10a. The roller 10a is provided rotatably around an axis orthogonal to the substrate W. As shown in FIG. As shown in FIGS. 2A and 2B, each roller 10a in the first holding portion 11 and the second holding portion 12 includes a large-diameter cylindrical base portion 101 and a roller on the upper surface of the base portion 101. , has a small-diameter cylindrical transmission part 102 provided coaxially. The upper surface of the base portion 101 has a tapered shape that slopes upward toward the transmission portion 102 . The side surface of the transmission part 102 holds the substrate W by contacting the outer periphery of the substrate W. As shown in FIG. The roller 10a is made of a material such as PEEK that is resistant to the cleaning liquid.

As shown in FIGS. 3A and 3B, one of the four rollers 10a is provided with a protruding portion 103 that fits into the notch N of the substrate W at a position that abuts on the outer circumference of the substrate W. there is A plurality of protrusions 103 are provided along the outer circumference of the roller 10a. Each protruding portion 103 is provided so as to be able to move back and forth between a protruding position where at least part of it protrudes into the notch N of the substrate W and a retracted position where it retracts by being urged by the outer periphery of the substrate W.

In the roller 10a of the present embodiment, a plurality of radial housing holes 102a are formed in the side surface of the transmission portion 102 at regular intervals along the outer circumference. In the example of FIG. 3, 12 accommodation holes 102a are formed radially, and each accommodation hole 102a is provided with a protruding portion 103. In the example shown in FIG.

The protrusion 103 has a contact portion 103a and a support portion 103b. The contact portion 103a has, for example, a cylindrical shape with rounded corners at one end, and the one end contacts the outer periphery of the substrate W. As shown in FIG. The contact portion 103a has a shape and size (width and depth) that allows a portion thereof to enter the notch N. As shown in FIG. It is preferable to prevent rattling by forming the shape and size of a part of the contact portion 103a so that the gap is minimized when the contact portion 103a enters the notch N. For example, the shape and size of the portion of the contact portion 103a that fits into the notch N may be the shape and size that match the notch N, that is, the shape and size that are substantially the same as the notch N. As a result, the gap when the contact portion 103a enters the notch N can be reduced as much as possible, so that the substrate W can be rotated more smoothly. The shape and size of the portion of the protrusion 103 that enters the notch N may be the shape and size that match the notch N, regardless of whether the protrusion 103 has the configuration shown in FIG. The support portion 103b elastically supports the other end of the contact portion 103a. The support portion 103b is, for example, a compression coil spring. Each accommodation hole 102a is inserted so that the support portion 103b is on the inside and the contact portion 103a is on the outside.

Therefore, as shown in FIG. 3A, when the outer periphery of the substrate W is in contact with the side surface of the transmission portion 102, the contact portion 103a is pushed in against the biasing force of the support portion 103b. 103 is in the retracted position. However, as shown in FIG. 3B, when the notch N of the substrate W comes to the side surface of the transmission portion 102, the contact portion 103a protrudes into the notch N due to the biasing force of the support portion 103b. 103 is a projecting position. Even when the outer periphery of the substrate W does not touch the side surface of the transmission portion 102, the contact portion 103a protrudes due to the biasing force of the support portion 103b. The contact portion 103a and the support portion 103b are preferably made of a material having resistance to the cleaning liquid, for example, the same material as the roller 10a.

As shown in FIG. 1, the first drive section 13 and the second drive section 14 support the first holding section 11 and the second holding section 12, respectively, and rotate the roller 10a about its axis. At the same time, the roller 10a moves in the direction of contacting and separating from the substrate W. As shown in FIG. A rotating mechanism (not shown) for driving the roller 10a is accommodated in the first driving section 13 and the second driving section 14. As shown in FIG.

The rotating mechanism is, for example, a belt drive mechanism. In other words, between the drive shaft of the motor, which is the drive source, and the pulley provided on the drive shaft of one roller 10a, and between the pulleys provided on the drive shaft of the pair of rollers 10a, there are belts for transmitting the driving force. A pair of rollers 10a are provided so as to be rotatable by a drive source by being bridged. Note that the rotation mechanism is not limited to this, and for example, it may be configured such that each roller 10a is rotated by a motor provided for each roller 10a.

Further, the first drive section 13 and the second drive section 14 are configured to be movable in the directions of contacting and separating from the substrate W as described above. That is, a drive mechanism (not shown) is provided at the lower end of each of the first drive section 13 and the second drive section 14, and the first drive section 13 and the second drive section 14 are driven to move the substrate W by this drive mechanism. move toward or away from As a result, the first holding part 11 and the second holding part 12 also move toward and away from the substrate W. As shown in FIG. For example, the drive mechanism may be a rotary drive that moves the drive shafts provided at the lower ends of the first drive unit 13 and the second drive unit 14 in directions parallel to the surface of the substrate W in opposite directions. A cylinder can be used.

By moving the first holding portion 11 and the second holding portion 12 away from each other by the drive mechanism, the transmission portion 102 of the roller 10a is moved as shown in FIGS. It becomes a release position away from the substrate W. By moving the first holding portion 11 and the second holding portion 12 toward each other by the driving mechanism, the transmission portion 102 of the roller 10a is moved as shown in FIGS. 4(B) and 5(B). It becomes a holding position where the substrate W is held in contact with it.

(Washing part)
The cleaning unit 20 cleans the surface of the substrate W by bringing the rotating brush 25 into contact with the rotating substrate W surface. The term "contact" as used herein includes both direct contact with the brush 25 and contact with the cleaning liquid interposed therebetween. As shown in the side view of FIG. 6 , the cleaning section 20 has a body section 21 , a brush holder 23 , a support 24 and a brush 25 . The body part 21 is a cylindrical container and accommodates a motor (not shown) inside. The motor is a drive source for rotating the brush 25, and is a hollow motor having a cylindrical drive shaft.

The brush holder 23 is a disk-shaped member that is attached to the drive shaft of the motor and has a detachable support 24 . The brush holder 23 is provided rotatably independently of the trunk portion 21 . The support 24 is a disc-shaped member to which the brush 25 is fixed and which is detachable from the brush holder 23 by means of a chuck mechanism or the like.

The brush 25 is a cylindrical member made of a flexible and elastic material. Spongy resin such as PVA (nylon resin) or PTFE (fluorine resin) is used for the brush 25 of the present embodiment. A similar resin-made bristle brush may also be used. In other words, the brush 25 of this embodiment includes both a sponge-like lump and a brush with a large number of hair-like bodies. Note that the sponge-like mass brush also includes a mass of a plurality of densely packed fibrous bodies. Further, the number of brushes 25 provided on the support 24 may be single or plural.

(Brush drive unit)
As shown in FIG. 1, the brush driving section 30 moves the cleaning section 20 in a direction parallel to the surface of the substrate W. As shown in FIG. The brush drive section 30 has an arm 31 and a drive mechanism 32 . The arm 31 is a member extending parallel to the substrate W, and the cleaning unit 20 is attached to one end thereof. The drive mechanism 32 has a swing mechanism and a lifting mechanism.

As shown in FIGS. 7(A) to 7(C), the swinging mechanism moves from the outer periphery of the substrate W to the outer periphery of the substrate W on the arc locus with the end opposite to the cleaning unit 20 as the axis. The arm 31 is reciprocated parallel to the substrate W. Further, the swing mechanism reciprocates the arm 31 from the standby position to the outer circumference of the substrate W. As shown in FIG. The swinging mechanism has a spindle extending from the arm 31 in a direction perpendicular to the surface of the substrate W, and a motor (not shown) as a drive source for swinging the spindle. The arm 31 is positioned at a standby position (not shown) outside the substrate W when the substrate W is not cleaned.

The elevating mechanism moves the arm 31 in a direction in which the cleaning unit 20 contacts and separates from the substrate W, as shown in FIGS. 4A and 4B. As the elevating mechanism, a ball screw mechanism, a cylinder, or the like for elevating the support shaft of the arm 31 can be applied.

(Washing liquid discharge part)
The cleaning liquid ejection part 40 ejects the cleaning liquid onto the substrate W. As shown in FIG. The cleaning liquid discharge unit 40 has a nozzle 41, and discharges cleaning liquid from a discharge port 41a at the tip of the nozzle 41 toward both surfaces of the rotating substrate W (see FIGS. 7A to 7C). The cleaning liquid of this embodiment is ozone water, pure water, or SC-1 (a cleaning liquid obtained by mixing ammonia water and hydrogen peroxide water). For example, when the brush 25 is made of PVA, it is washed with pure water. If the brush 25 is made of PTFE, ozone water or SC-1 is used. Since PTFE has liquid resistance, cleaning liquid such as ozone water and SC1 can be used together.

A pair of nozzles 41 are arranged vertically with the substrate W interposed therebetween. One end of the nozzle 41 is bent at an angle of, for example, 45° with respect to the surface of the substrate W, and has a discharge port 41a for discharging the cleaning liquid toward the surface of the substrate W. As shown in FIG. The nozzle 41 discharges from the outside of the substrate W toward the vicinity of the center of the surface of the substrate W, that is, toward the middle of the movement path of the brush 25 so as to spray.

The other end of the nozzle 41 is connected to a cleaning liquid supply device (not shown) via a pipe. The supply device has a pure water production device (pure water storage tank), an ozonated water production device (ozonated water storage tank), and a liquid delivery device, valve, etc. connected to the SC-1 supply device, and supplies pure water and ozonated water. and SC-1 can be switched and supplied. One nozzle 41 may be provided for each surface of the substrate W, or a plurality of nozzles 41 may be provided for each surface. Further, the number of lines provided on one side of the substrate W may be different from the number of lines provided on the other side.

As shown in FIG. 4, the cleaning unit 20, the brush driving unit 30, and the cleaning liquid discharge unit 40 described above clean the substrate W so that the upper and lower surfaces (also referred to as the front surface and the back surface) of the substrate W can be cleaned. A pair of them are provided above and below each other. That is, the pair of arms 31 of the brush drive section 30 are arranged above and below the substrate W so that the brushes 25 and the ejection ports 41a of the pair of cleaning sections 20 face the substrate W. As shown in FIG. The driving mechanism 32 moves a pair of arms between a contact position (FIG. 4B) where the pair of brushes 25 come into contact with the substrate W therebetween and a separated position where the substrate W is separated (FIG. 4A). Move 31.

Further, the drive mechanism 32 swings the pair of arms 31 to move the pair of brushes 25 at the contact position in an arc locus as shown in FIGS. 7(A) to 7(C). When viewed from above, the contact position is the start point of the brush 25 swinging as shown in FIG. 7A, and the separated position is the swinging point of the brush 25 as shown in FIG. is the end point to The contact position is on the outer periphery of the substrate W, and the separation position is on the outer periphery of the substrate W opposite to the contact position.

[motion]
The operation of the cleaning apparatus 1 configured as described above will be described.
(Carrying in substrates)
First, the loading operation of the substrate W will be described. That is, in the previous step, ozone water is applied to the surface of the processed substrate W to form an oxide film, thereby making the surface hydrophilic. On the surface of the substrate W on which the oxide film is formed, organic contaminants (slurry, etc.), metal contaminants, and the like, which remain in the CMP process, which is the previous process, are adhered. This means that the ozone water is supplied while the contaminants remain attached to the front and back surfaces of the substrate W, that is, the oxide film is formed while the contaminants remain attached. Ozone water has the ability to remove organic substances, but the purpose of this pre-process is not to remove organic substances, but to make the front and back surfaces of the substrate W hydrophilic.

The transport robot unloads the substrate W from the previous process, transports it to the cleaning apparatus 1, and as shown in FIGS. is carried in between the rollers 10a. The first holding part 11 and the second holding part 12 move toward each other as shown in FIGS. 4B and 5B. Then, since the four rollers 10a move toward the substrate W, the inclination of the upper surface of the base portion 101 pushes up the outer periphery of the substrate W, and the side surface of the transmission portion 102 comes into contact with the outer periphery of the substrate W, thereby moving the substrate W. Hold.

(Washing of substrate)
Next, the cleaning operation of the substrate W will be described. As shown in FIGS. 2 and 5B, the substrate W rotates counterclockwise by rotating the roller 10a clockwise in the drawings. For example, it rotates at a low speed of 20-60 rpm. As shown in FIG. 2A, when the side surface of the transmission portion 102 of the roller 10a is in contact with the outer circumference of the substrate W other than the notch N, the rotation of the roller 10a is transmitted to the substrate W, rotation is maintained. At this time, as shown in FIG. 3A, in the roller 10a provided with the projecting portion 103, the contact portion 103a comes into contact with the outer periphery of the substrate W, thereby resisting the biasing force of the support portion 103b. It is pushed into the housing hole 102a and becomes the retracted position.

Then, as shown in FIG. 3B, in the roller 10a provided with the projecting portion 103, when the notch N of the substrate W comes to a position where it contacts the side surface of the transmitting portion 102, the support portion 103b is attached. Due to the force, the contact portion 103a protrudes into the notch N and becomes the protruding position. Then, the abutting portion 103a urges the inner wall of the notch N, so that the substrate W is pushed out in the rotational direction as the roller 10a rotates, and the rotation of the substrate W is maintained. Note that even when the side surface of the transmission portion 102 of the roller 10a is not in contact with the outer periphery of the substrate W, the contact portion 103a protrudes due to the urging force of the support portion 103b to reach the protruding position.

The upper and lower arms 31 are in a waiting position outside the substrate W at first. The upper and lower arms 31 at the standby position are swung to the outer circumference of the substrate W and temporarily stopped while rotating the brushes 25 by the motor 22, as shown in FIG. 7A. As the upper and lower arms 31 move toward the substrate W, the brushes 25 of the upper and lower cleaning units 20 come into contact with the front and rear surfaces of the substrate W as shown in FIG. , sandwiching the substrate W. The black arrow in the drawing indicates the direction of rotation of the substrate W. As shown in FIG.

As the upper and lower arms 31 rotate, the upper and lower brushes 25 move horizontally. At this time, the cleaning liquid is flowing between the brush 25 and the substrate W because the ejection port 41a of the nozzle 41 is ejecting the cleaning liquid. That is, as shown in FIGS. 7A and 7B, the brush 25, which has started to move from one side of the outer periphery of the substrate W, moves along an arc trajectory indicated by a white arrow in the drawing, and moves together with the cleaning liquid. Contaminants are pushed out to the outer periphery of the substrate W. As shown in FIG. 7C, when the brush 25 passes over the other outer periphery of the substrate W and is separated from the substrate W, the brush 25 stops rotating and stops discharging the cleaning liquid from the discharge port 41a. , to end the cleaning process.

Note that the peripheral speed is different between the outer peripheral side and the central side of the substrate W, and since the peripheral speed is high at the outer peripheral side and the area to be cleaned per rotation is large, the horizontal movement of the brush 25 is slowed down. In other words, the moving speed of the arm 31 by the brush driving section 30 is slowed down. The closer to the center, the slower the peripheral speed and the smaller the area to be cleaned per rotation, so the horizontal movement of the brush 25 is increased. In other words, the moving speed of the arm 31 by the brush driving section 30 is increased. The moving speed for swinging the brush 25 may be constant.

By moving the upper and lower arms 31 away from each other, the upper and lower brushes 25 are separated, and furthermore, the arm 31 is swung to retreat to a standby position outside the outer circumference of the substrate W. FIG. Incidentally, after that, the cleaning by the brush 25 may be performed a plurality of times by repeating the above operation. In this case, the arm 31 returns to the position where the cleaning is started after each cleaning (see FIGS. 4A and 7A).

(Effect)
(1) The cleaning apparatus 1 of the present embodiment as described above includes the rotation driving unit 10 that rotates the substrate W by rotating a plurality of rollers 10a that hold the outer periphery of the substrate W, and By bringing a brush 25 into contact with a cleaning liquid ejection part 40 that ejects a cleaning liquid and at least one surface of the rotating substrate W, a cleaning part 20 that cleans the surface of the substrate W and a roller 10a that hits the outer periphery of the substrate W. and a protrusion 103 provided at a contacting position to enter the notch N of the substrate W.

Therefore, when the notch N of the rotating substrate W reaches a position where it contacts the roller 10a, the protrusion 103 enters the notch N and biases the notch N, so that the roller 10a is prevented from slipping by the notch N. The substrate W is held down and pushed in the direction of rotation to maintain rotation. Therefore, it is possible to reduce the decrease in the rotation speed of the substrate W and the stoppage of rotation.

When the roller 10a slides on the notch N and idles, the roller 10a may be scraped, dust may be generated, and the substrate W may be contaminated. However, in the present embodiment, the rotation of the substrate W is maintained and the idle rotation of the roller 10a is prevented, so the possibility of contamination of the substrate W by dust can be reduced.

When the rotation of the substrate W stops, the cleaning part 20 presses the brush 25 and oscillates it, so that only the part through which the brush 25 passes can be cleaned, so that the entire surface of the substrate W can be cleaned uniformly. However, in the present embodiment, such a situation can be reduced and the occurrence of cleaning failures can be suppressed.

Further, when the brush 25 is located near the outer periphery of the substrate W, the resistance to the rotation of the substrate W by the brush 25 is increased, so that stoppage due to the notch N is likely to occur. In particular, when the brushes 25 are pressed against the substrate W from above and below, as in the above mode, the resistance to rotation increases and the substrate W tends to stop. However, in the present embodiment, even if the resistance of the brush 25 is applied, the protrusion 103 enters the notch N, thereby preventing the rotation from stopping.

Further, even if the force with which the substrate W is sandwiched by the rollers 10a is relatively weak, slippage can be reduced by the protrusion 103 entering the notch N. This is useful in preventing slippage of the substrate W by increasing the force with which the substrate W is sandwiched. In comparison, the substrate W can be prevented from being damaged.

Further, since the roller 10a is required to be liquid resistant and is relatively hard, it is likely to slip on the notch N. Rubber or the like has no liquid resistance, so it is difficult to use it as a non-slip material. be. In the present embodiment, the roller 10a and the protruding portion 103 are made of a liquid-resistant material and are anti-slip.

(2) A plurality of protrusions 103 are provided along the outer circumference of the roller 10a. Therefore, the possibility that the protruding portion 103 enters the notch N is increased, and the possibility that the rotation speed of the substrate W is lowered or the rotation is stopped can be further reduced.

(3) The projecting portion 103 is provided so as to move back and forth between a projecting position where at least a portion of it projects into the notch N of the substrate W and a retreating position where it retreats by being urged by the outer periphery of the substrate W. ing. Therefore, when the roller 10a comes into contact with the outer periphery of the substrate W other than the notch N, the projecting portion 103 is urged to retreat. be in the same state. As a result, the unevenness of the portion of the side surface of the transmission portion 102 of the roller 10a that comes into contact with the substrate W can be reduced, and smooth rotation can be maintained.

(4) The projecting portion 103 has a contact portion 103a whose one end contacts the outer periphery of the substrate W, and a support portion 103b which elastically supports the other end of the contact portion 103a. Therefore, the projecting portion 103 that has been pushed to the retracted position by the outer periphery of the substrate W can be returned to the projecting position by the supporting portion 103b without applying an external force.

(Modification)
The present embodiment is not limited to the above aspect, and the following modifications can also be configured. For example, since the protrusion 103 only needs to bias the notch N in the rotational direction, the protrusion 103 may enter the notch N entirely or only partially.

Also, the number of projecting portions 103 in one roller 10a is not limited to the above aspect. At least one should be provided on the roller 10a. Even in the case of a plurality, it may be less or more than the above embodiment. When a plurality of projecting portions 103 are provided, it is preferable that the projecting portions 103 are provided on the side surface of the roller 10a symmetrically about the axis of rotation so that the rotation of the substrate W can be stabilized. Furthermore, the protrusions 103 may be provided on a plurality of rollers 10a. As a result, it is possible to increase the possibility that the protrusion 103 will contact the notch N and reduce the possibility that slippage will occur. In addition, the number of rollers 10a is not limited to the above embodiment.

The projecting portion 103 may be made of an elastic material. For example, as shown in FIGS. 8A and 8B, a plate-like elastic member having one side supported by the side surface of the transmission portion 102 of the roller 10a is used as the projecting portion 103. It may be formed by curving so as to imitate. The projecting portion 103, which is a plate-like elastic member, has a size and shape that fits into the notch N, as shown in FIG. 8(B). Incidentally, such a projecting portion 103 may be integrally formed of the same material as the roller 10a. By forming the thin plate-like shape, the protruding portion 103 can have elasticity. As shown in FIG. 8(A), such a projecting portion 103 is also pushed to the retracted position by the outer periphery of the substrate W other than the notch N, and corresponds to the notch N as shown in FIG. 8(B). position, the notch N can be biased to keep the substrate W rotated.

Furthermore, the projecting portion 103 may be fixedly formed on the side surface of the roller 10a. For example, as shown in FIG. 9 , unevenness may be formed on the side surface of the transmitting portion 102 by a gently curved surface without corners, and the convex portion may be used as the projecting portion 103 . The protruding portion 103, which is a gently curved surface without corners, has a size and shape that allows it to enter a part of the notch N. As shown in FIG. By entering the notch N, the projection 103 can also urge the substrate W to keep it rotating.

Moreover, the configuration of the cleaning unit 20 is not limited to the above aspect. For example, only one surface of the substrate W may be cleaned with the brush 25 . A cylindrical brush 25 having an axis parallel to the surface of the substrate W may be used, and the substrate W may be cleaned by bringing the side surface of the brush 25 into contact with the substrate W. FIG.

[Other embodiments]
Although the embodiment of the present invention and the modification of each part have been described above, the embodiment and the modification of each part are presented as an example and are not intended to limit the scope of the invention. These novel embodiments described above can be implemented in various other forms, and various omissions, replacements, and modifications can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims.

1 cleaning device 10 rotary drive unit 10a roller 11 first holding unit 12 second holding unit 13 first drive unit 14 second drive unit 20 cleaning unit 21 body 22 motor 23 brush holder 24 support 25 brush 30 Brush drive unit 31 Arm 32 Drive mechanism 40 Cleaning liquid discharge unit 41 Nozzle 41a Discharge port 101 Base unit 102 Transmission unit 102a Accommodating hole 103 Projection unit 103a Contact unit 103b Support unit

Claims (5)

a rotation driving unit that rotates the substrate by rotating a plurality of rollers that hold the outer periphery of the substrate;
a cleaning liquid ejection unit configured to eject a cleaning liquid onto the substrate;
a cleaning unit that cleans the surface of the rotating substrate by bringing a brush into contact with at least one surface of the substrate;
a protruding portion provided at a position where the roller abuts against the outer periphery of the substrate and enters the notch of the substrate;
A cleaning device comprising: 2. The cleaning apparatus according to claim 1, wherein a plurality of said protrusions are provided along the outer periphery of said roller. The protruding portion is provided so as to move back and forth between a protruding position where at least a portion of the protruding portion protrudes into the notch of the substrate and a retracted position where the protruding portion is retracted by being urged by the outer periphery of the substrate. 2. A cleaning device according to claim 1. The protrusion is
an abutting part, one end of which abuts against the outer periphery of the substrate;
a support portion that elastically supports the other end of the contact portion;
4. The cleaning device according to claim 3, characterized by comprising: 4. A cleaning apparatus according to claim 3, wherein said projecting portion is made of an elastic material.

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