JP2022534476A5 - - Google Patents
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- Publication number
- JP2022534476A5 JP2022534476A5 JP2021568400A JP2021568400A JP2022534476A5 JP 2022534476 A5 JP2022534476 A5 JP 2022534476A5 JP 2021568400 A JP2021568400 A JP 2021568400A JP 2021568400 A JP2021568400 A JP 2021568400A JP 2022534476 A5 JP2022534476 A5 JP 2022534476A5
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- Japan
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962855432P | 2019-05-31 | 2019-05-31 | |
| US62/855,432 | 2019-05-31 | ||
| US202062976449P | 2020-02-14 | 2020-02-14 | |
| US62/976,449 | 2020-02-14 | ||
| PCT/US2020/034590 WO2020243112A1 (en) | 2019-05-31 | 2020-05-26 | Films of multiwall, few wall, and single wall carbon nanotube mixtures |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2022534476A JP2022534476A (ja) | 2022-08-01 |
| JP2022534476A5 true JP2022534476A5 (https=) | 2023-01-27 |
| JPWO2020243112A5 JPWO2020243112A5 (https=) | 2023-01-27 |
| JP7684227B2 JP7684227B2 (ja) | 2025-05-27 |
Family
ID=73554187
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2021568400A Active JP7684227B2 (ja) | 2019-05-31 | 2020-05-26 | 多層、数層、及び単層のカーボンナノチューブ混合物のペリクル膜 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11820659B2 (https=) |
| JP (1) | JP7684227B2 (https=) |
| KR (3) | KR20260042317A (https=) |
| TW (1) | TWI783231B (https=) |
| WO (1) | WO2020243112A1 (https=) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20260042317A (ko) * | 2019-05-31 | 2026-03-30 | 린텍 오브 아메리카, 인크. | 다중벽, 소수벽 및 단일벽 탄소 나노튜브 혼합물의 필름 |
| WO2022210731A1 (ja) * | 2021-03-31 | 2022-10-06 | 三井化学株式会社 | ペリクル、露光原版、露光装置、ペリクルの製造方法、及び半導体装置の製造方法 |
| US12174526B2 (en) * | 2021-08-06 | 2024-12-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| TW202338508A (zh) * | 2021-09-28 | 2023-10-01 | 美商美國琳得科股份有限公司 | 用於ｅｕｖ微影之塗佈鋯的超薄且超低密度膜 |
| JP2024535841A (ja) * | 2021-09-28 | 2024-10-02 | リンテック オブ アメリカ インク | Ｅｕｖリソグラフィ用の強化された超薄型・超低密度フィルム及びその製造方法 |
| EP4202546B1 (en) * | 2021-12-22 | 2024-08-28 | Imec VZW | An euv pellicle |
| FI20225350A1 (en) * | 2022-04-27 | 2023-10-28 | Canatu Oy | A free-standing pellicle film comprising harm-structures |
| WO2023233932A1 (ja) * | 2022-05-31 | 2023-12-07 | 日本ゼオン株式会社 | カーボンナノチューブ積層構造体、カーボンナノチューブ分散液、電子素子製造用塗布液、カーボンナノチューブ膜、および電子素子 |
| WO2024204103A1 (ja) * | 2023-03-28 | 2024-10-03 | リンテック株式会社 | ペリクル膜およびペリクル |
| CN121002441A (zh) * | 2023-03-28 | 2025-11-21 | 琳得科株式会社 | 防护膜及防护膜组件 |
| EP4692931A1 (en) * | 2023-03-28 | 2026-02-11 | Lintec Corporation | Pellicle film and pellicle |
| EP4692927A1 (en) * | 2023-03-28 | 2026-02-11 | Lintec Corporation | Pellicle film and pellicle |
| CN120883131A (zh) * | 2023-03-28 | 2025-10-31 | 琳得科株式会社 | 防护膜组件、防护膜支撑体及防护膜组件的制造方法 |
| JP7714816B2 (ja) * | 2023-03-28 | 2025-07-29 | リンテック株式会社 | ペリクル及びペリクルの製造方法 |
| WO2025075913A1 (en) * | 2023-10-02 | 2025-04-10 | Lintec Of America, Inc. | Two-density extreme ultraviolet pellicle with enhanced properties |
| WO2026009466A1 (ja) * | 2024-07-01 | 2026-01-08 | 株式会社カーボンフライ | カーボンナノチューブ分散液 |
| WO2026009468A1 (ja) * | 2024-07-01 | 2026-01-08 | 株式会社カーボンフライ | 複合体、複合体の製造方法、および複合体の用途 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105696138B (zh) | 2004-11-09 | 2019-02-01 | 得克萨斯大学体系董事会 | 纳米纤维纱线、带和板的制造和应用 |
| EP1957406A4 (en) | 2005-11-16 | 2012-11-07 | Hyperion Catalysis Int | MIXED STRUCTURES OF SINGLE-WALL AND MULTI-WALL CARBON CANNONS |
| US8329135B2 (en) * | 2006-01-06 | 2012-12-11 | National Institute Of Advanced Industrial Science And Technology | Aligned carbon nanotube bulk structure having portions different in density |
| US7955535B2 (en) * | 2006-02-02 | 2011-06-07 | Florida State University Research Foundation | Method for fabricating macroscale films comprising multiple-walled nanotubes |
| US7428402B2 (en) * | 2006-07-26 | 2008-09-23 | Xerox Corporation | Carbon nanotube composites for blade cleaning in electrophotographic marking systems |
| CN101815563B (zh) | 2007-07-18 | 2013-02-13 | 新加坡南洋理工大学 | 空心多孔微球 |
| US8058364B2 (en) | 2008-04-15 | 2011-11-15 | Florida State University Research Foundation | Method for functionalization of nanoscale fibers and nanoscale fiber films |
| WO2009148959A2 (en) * | 2008-05-29 | 2009-12-10 | Lawrence Livermore National Security, Llc | Membranes with functionalized carbon nanotube pores for selective transport |
| US9154058B2 (en) * | 2008-08-15 | 2015-10-06 | Board Of Regents, The University Of Texas System | Nanofiber actuators and strain amplifiers |
| CN103518238B (zh) * | 2011-05-13 | 2017-02-15 | 国立大学法人熊本大学 | 碳纳米管复合电极及其制造方法 |
| US9088049B2 (en) * | 2012-01-23 | 2015-07-21 | Florida State University Research Foundation, Inc. | Bifunctional hollandite Ag2Mn8O16 catalyst for lithium-air batteries |
| WO2013133941A1 (en) | 2012-03-06 | 2013-09-12 | Applied Nanotech Holdings, Inc. | Carbon nanotube reinforced nanocomposites |
| KR101381889B1 (ko) | 2013-01-24 | 2014-04-17 | 광주과학기술원 | 층상 자기조립법에 의해 제조된 탄소나노튜브를 함유하는 다층막 |
| JP2016190772A (ja) | 2015-03-31 | 2016-11-10 | 日本ゼオン株式会社 | 炭素膜およびその製造方法 |
| JP6781864B2 (ja) * | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| EP3404487B1 (en) * | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
| EP3638674A1 (en) * | 2017-06-13 | 2020-04-22 | Yeda Research and Development Co. Ltd | Small molecules based free-standing films and hybrid materials |
| WO2019099299A1 (en) | 2017-11-15 | 2019-05-23 | Lintec Of America, Inc. | Nanofiber sheet holder |
| KR20260042317A (ko) * | 2019-05-31 | 2026-03-30 | 린텍 오브 아메리카, 인크. | 다중벽, 소수벽 및 단일벽 탄소 나노튜브 혼합물의 필름 |
| EP4606937A3 (en) * | 2019-08-26 | 2026-03-04 | ASML Netherlands B.V. | Pellicle membrane for a lithographic apparatus |
| US11860534B2 (en) * | 2021-08-06 | 2024-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
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2020
- 2020-05-26 KR KR1020267008791A patent/KR20260042317A/ko active Pending
- 2020-05-26 JP JP2021568400A patent/JP7684227B2/ja active Active
- 2020-05-26 US US17/605,753 patent/US11820659B2/en active Active
- 2020-05-26 KR KR1020217030576A patent/KR20220016026A/ko not_active Ceased
- 2020-05-26 TW TW109117525A patent/TWI783231B/zh active
- 2020-05-26 KR KR1020247010824A patent/KR102945373B1/ko active Active
- 2020-05-26 WO PCT/US2020/034590 patent/WO2020243112A1/en not_active Ceased
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2023
- 2023-10-10 US US18/378,531 patent/US12129175B2/en active Active