JP2022529878A - 波長変換装置用の高温耐性反射層 - Google Patents
波長変換装置用の高温耐性反射層 Download PDFInfo
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Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/007—Optical devices or arrangements for the control of light using movable or deformable optical elements the movable or deformable optical element controlling the colour, i.e. a spectral characteristic, of the light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
- G03B21/204—LED or laser light sources using secondary light emission, e.g. luminescence or fluorescence
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/16—Cooling; Preventing overheating
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V9/00—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters
- F21V9/40—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters with provision for controlling spectral properties, e.g. colour, or intensity
- F21V9/45—Elements for modifying spectral properties, polarisation or intensity of the light emitted, e.g. filters with provision for controlling spectral properties, e.g. colour, or intensity by adjustment of photoluminescent elements
Abstract
Description
Claims (19)
- 基板と、
前記基板上の反射層であって、(A)バインダーと、(B)約200ナノメートル~約500ナノメートルの粒子サイズを有する反射性二酸化チタン(TiO2)ナノ粒子と、を含む前記反射層と、
前記反射層上の波長変換層と、を備えており、
前記反射層が250℃において熱安定性であることを特徴とする、波長変換装置。 - 前記反射性TiO2ナノ粒子が、有機アルコール、シロキサン、酸化アルミニウム(Al2O3)、二酸化ジルコニウム(ZrO2)または二酸化ケイ素(SiO2)で表面改質されている、請求項1に記載の波長変換装置。
- 前記反射層が、約0.05mm~約0.15mmの厚さを有する、請求項1に記載の波長変換装置。
- 前記(A)バインダーに対する前記(B)反射性ナノ粒子の質量比が約1:2.5~約1:0.8である、請求項1に記載の波長変換装置。
- 前記バインダー(A)が、二酸化ケイ素または酸化アルミニウムから作られた無機ゾルゲルを含む、請求項1に記載の波長変換装置。
- 前記バインダー(A)がオクタメチルトリシロキサンを含む、請求項1に記載の波長変換装置。
- 前記反射層が、約420nm~約680nmの波長を有する光に対して少なくとも95%の反射率を有する、請求項1に記載の波長変換装置。
- 前記蛍光体層が、ガラス中、結晶中またはセラミック材料中に分散された蛍光体粒子を含む、請求項1に記載の波長変換装置。
- 前記基板が円盤形状を有する、請求項1に記載の波長変換装置。
- さらに前記基板を回転させるためのモータを備える、請求項1に記載の波長変換装置。
- 前記基板が、金属、非金属材料または複合材料である、請求項1に記載の波長変換装置。
- 請求項1に記載の波長変換装置を備えた光投影システム。
- (A)バインダーと、(B)約200ナノメートル~約500ナノメートルの粒子サイズを有する反射性二酸化チタン(TiO2)ナノ粒子と、を含む組成物を基板に塗布し、基板上に反射層を形成するステップと、
前記反射層上に波長変換層を形成するステップと、を含み、
前記反射層が250℃において熱安定性であることを特徴とする、波長変換装置の製造方法。 - 前記組成物が、約0センチポアズ(cP)~約1500cPの粘度を有する、請求項13に記載の方法。
- 前記組成物を約85℃~約150℃の温度で硬化させるステップをさらに含む、請求項13に記載の方法。
- 前記バインダー(A)が、二酸化ケイ素または酸化アルミニウムから作られた無機ゾルゲルを含む、請求項13に記載の方法。
- 前記組成物が、吐出、噴霧、刷毛塗り、フローイング、コーティングまたはシルク印刷によって塗布される、請求項13に記載の方法。
- 請求項13に記載の方法によって製造された波長変換装置。
- 請求項18に記載の波長変換装置を備えた光投影システム。
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PCT/CN2019/083523 WO2020211091A1 (en) | 2019-04-19 | 2019-04-19 | High temperature resistant reflective layer for wavelength conversion devices |
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JP2022529878A true JP2022529878A (ja) | 2022-06-27 |
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JP2021561975A Pending JP2022529070A (ja) | 2019-04-19 | 2020-04-16 | 波長変換装置用の高温耐性反射層 |
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Country Status (6)
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US (2) | US11762190B2 (ja) |
EP (2) | EP3956724A4 (ja) |
JP (2) | JP2022529878A (ja) |
CN (2) | CN113614635A (ja) |
TW (1) | TW202104468A (ja) |
WO (2) | WO2020211091A1 (ja) |
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CN113614635A (zh) * | 2019-04-19 | 2021-11-05 | 美题隆精密光学(上海)有限公司 | 用于波长转换装置的耐高温反射层 |
JP2023167773A (ja) * | 2022-05-13 | 2023-11-24 | 日本特殊陶業株式会社 | 波長変換部材および光源装置 |
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CN108628076A (zh) | 2018-06-25 | 2018-10-09 | 成都九天光学技术有限公司 | 一种高激发效率的投影机光源系统 |
CN113614635A (zh) * | 2019-04-19 | 2021-11-05 | 美题隆精密光学(上海)有限公司 | 用于波长转换装置的耐高温反射层 |
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2019
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- 2019-04-19 EP EP19924875.8A patent/EP3956724A4/en active Pending
- 2019-04-19 JP JP2021552730A patent/JP2022529878A/ja active Pending
- 2019-04-19 US US17/295,961 patent/US11762190B2/en active Active
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2020
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- 2020-04-16 CN CN202080029926.7A patent/CN113711125A/zh active Pending
- 2020-04-20 TW TW109113179A patent/TW202104468A/zh unknown
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WO2013111542A1 (ja) * | 2012-01-23 | 2013-08-01 | パナソニック株式会社 | 窒化物半導体発光装置 |
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JP2017517771A (ja) * | 2014-05-28 | 2017-06-29 | 深▲せん▼市繹立鋭光科技開発有限公司Appotronics(China)Corporation | 波長変換装置及びその関連発光装置 |
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CN113614635A (zh) | 2021-11-05 |
JP2022529070A (ja) | 2022-06-16 |
EP3956724A1 (en) | 2022-02-23 |
EP3956725A1 (en) | 2022-02-23 |
EP3956724A4 (en) | 2022-11-30 |
CN113711125A (zh) | 2021-11-26 |
US11762190B2 (en) | 2023-09-19 |
WO2020211824A1 (en) | 2020-10-22 |
US20220019073A1 (en) | 2022-01-20 |
WO2020211091A1 (en) | 2020-10-22 |
US20220179191A1 (en) | 2022-06-09 |
TW202104468A (zh) | 2021-02-01 |
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