JP2022185843A - Fine particle adsorbent and fine particle removal method - Google Patents
Fine particle adsorbent and fine particle removal method Download PDFInfo
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- 239000010419 fine particle Substances 0.000 title claims abstract description 67
- 239000003463 adsorbent Substances 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 15
- 239000002904 solvent Substances 0.000 claims abstract description 40
- 239000000523 sample Substances 0.000 claims abstract description 13
- 238000005259 measurement Methods 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 239000012528 membrane Substances 0.000 claims description 14
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 12
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 239000000835 fiber Substances 0.000 claims description 2
- 239000012046 mixed solvent Substances 0.000 claims description 2
- 239000002245 particle Substances 0.000 claims description 2
- 239000002861 polymer material Substances 0.000 abstract description 3
- 125000000524 functional group Chemical group 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910021642 ultra pure water Inorganic materials 0.000 description 6
- 239000012498 ultrapure water Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 4
- -1 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000003125 aqueous solvent Substances 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012510 hollow fiber Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005374 membrane filtration Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001471 micro-filtration Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical group O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical group 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Treatment Of Liquids With Adsorbents In General (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
本発明は微粒子吸着材及び微粒子除去方法に係り、好適には機械部品、電子部品の製造及び洗浄工程、あるいは化学合成工程等に用いられる溶媒中の微粒子を除去する微粒子吸着材及び除去方法に関するものである。 TECHNICAL FIELD The present invention relates to a fine particle adsorbent and a fine particle removal method, and preferably to a fine particle adsorbent and a removal method for removing fine particles in a solvent used in the manufacturing and washing processes of mechanical parts and electronic parts, or chemical synthesis processes. is.
半導体製造プロセス等において使用される超純水の製造・供給システムは、サブシステムの末端に微粒子除去用のクロスフロー型の限外濾過膜（ＵＦ膜）装置を設置し、水回収率９０～９９％で運転することで、ナノメートルサイズの微粒子の除去を行っている。また、半導体・電子材料洗浄用の洗浄機直前に、ユースポイントポリッシャーとして、ミニサブシステムを設置し、最終段に微粒子除去用のＵＦ膜装置を設置したり、ユースポイントにおける洗浄機内のノズル直前に微粒子除去用のＵＦ膜を設置し、より小さいサイズの微粒子を高度に除去することも検討されている。 The ultrapure water production and supply system used in the semiconductor manufacturing process etc. has a cross-flow type ultrafiltration membrane (UF membrane) device for removing fine particles at the end of the subsystem, and the water recovery rate is 90 to 99. %, removing nanometer-sized fine particles. In addition, a mini subsystem is installed as a point-of-use polisher just before the cleaning machine for cleaning semiconductors and electronic materials, and a UF membrane device for removing fine particles is installed at the final stage. It is also being considered to install a UF membrane for removal to remove fine particles of smaller size to a high degree.
溶媒中の微粒子除去については、上記超純水のように、明確な微粒子管理は設定されていない。しかし半導体構造の微細化に伴って、パターン倒壊を防ぐために、表面張力の小さな溶媒がウエハ洗浄時に用いられるようになってきており、その結果として、溶媒中の微粒子等の除去ニーズは高まってきている。 Concerning the removal of fine particles in a solvent, no clear fine particle control has been established like the ultrapure water mentioned above. However, with the miniaturization of semiconductor structures, solvents with low surface tension have come to be used for wafer cleaning in order to prevent pattern collapse. there is
電子部品の製造及び洗浄用途以外においても、例えば、機械部品の製造及び洗浄工程、あるいは化学合成工程においても、製品の歩留まり向上や不純物の影響の排除するために、溶媒中に含まれる不純物、特に微粒子を除去することが求められている。 In addition to electronic component manufacturing and cleaning applications, for example, mechanical component manufacturing and cleaning processes, or chemical synthesis processes, in order to improve product yields and eliminate the effects of impurities, impurities contained in solvents, especially There is a need to remove fine particles.
従来、半導体・電子部品製造用等の濾過フィルターとして、１級アミノ基、２級アミノ基、３級アミノ基、及び４級アンモニウム塩からなる群から選ばれる１つ以上の官能基を有するポリケトン多孔膜が提案されている（特許文献１）。 Conventionally, porous polyketones having one or more functional groups selected from the group consisting of primary amino groups, secondary amino groups, tertiary amino groups, and quaternary ammonium salts have been used as filtration filters for manufacturing semiconductors and electronic parts. A membrane has been proposed (Patent Document 1).
また、超純水製造プロセスで水中の微粒子を除去する装置として、弱カチオン性官能基を有する精密濾過膜（ＭＦ膜）もしくは限外濾過膜（ＵＦ膜）を有する膜濾過手段を設けたものが提案されている（特許文献２）。 Also, as a device for removing fine particles in water in the ultrapure water production process, a device provided with a membrane filtration means having a microfiltration membrane (MF membrane) or an ultrafiltration membrane (UF membrane) having a weak cationic functional group. It has been proposed (Patent Document 2).
特許文献３には、モノリス状有機多孔質イオン交換体により有機溶媒や水中から微粒子を除去する方法が記載されている。 Patent Document 3 describes a method for removing fine particles from an organic solvent or water using a monolithic organic porous ion exchanger.
従来の微粒子除去は、微粒子とは逆の荷電を有する官能基で除去することが基本であった。本発明者は、非水溶媒中の微粒子の除去について、逆荷電基での除去を実施したが、除去率は低いことが認められた。 In the conventional method of removing fine particles, it was basically to remove them with a functional group having a charge opposite to that of the fine particles. Regarding the removal of microparticles in a non-aqueous solvent, the inventors performed removal with oppositely charged groups, but found that the removal rate was low.
本発明は、含水率の低い溶媒中の微粒子を十分に除去することができる微粒子吸着材及び除去方法を提供することを目的とする。 An object of the present invention is to provide a fine particle adsorbent and a removal method capable of sufficiently removing fine particles in a solvent having a low water content.
本発明の微粒子吸着材は、微粒子を含む溶媒中の微粒子を吸着して除去するための微粒子吸着材であって、負の荷電基を有する高分子材料よりなり、原子間力顕微鏡による計測において、探針サイズ０ｎｍの時の表面積Ｓ１と１００ｎｍの時の表面積Ｓ２との比率Ｓ１／Ｓ２が１０６％以上の表面構造を有する。 The fine particle adsorbent of the present invention is a fine particle adsorbent for adsorbing and removing fine particles in a solvent containing fine particles, and is made of a polymer material having a negatively charged group. It has a surface structure in which the ratio S1/S2 of the surface area S1 when the probe size is 0 nm and the surface area S2 when the probe size is 100 nm is 106% or more.
本発明の微粒子除去方法は、かかる本発明の微粒子吸着材と溶媒とを接触させ、溶媒中の微粒子を該微粒子吸着材に吸着させて溶媒中から除去する。 In the method for removing fine particles of the present invention, the fine particle adsorbent of the present invention is brought into contact with a solvent, and the fine particles in the solvent are adsorbed by the fine particle adsorbent and removed from the solvent.
本発明の一態様では、探針サイズ０ｎｍの時に表面積が０．２６μｍ２以上である。 In one aspect of the present invention, the surface area is 0.26 μm 2 or more when the probe size is 0 nm.
本発明の一態様では、前記負の荷電基がスルホン酸基である。 In one aspect of the invention, said negatively charged groups are sulfonic acid groups.
本発明の一態様では、前記荷電基は、Ｈ型、Ｎａ型、又はＫ型である。 In one aspect of the invention, the charged groups are of H-type, Na-type or K-type.
本発明の一態様では、膜、フィルター又は繊維の形状を有している。 One aspect of the invention is in the form of a membrane, filter or fiber.
本発明の一態様では、溶媒の含水率は５６ｗｔ％以下である。本発明の一態様では、溶媒はイソプロピルアルコールと水との混合溶媒である。 In one aspect of the invention, the water content of the solvent is 56 wt % or less. In one aspect of the invention, the solvent is a mixed solvent of isopropyl alcohol and water.
含水率が低い溶媒における微粒子除去では、微粒子が接触する確率を上げて、吸着除去するための吸着サイトを多く有している必要がある。本発明に用いられる除去材は、ＡＦＭ計測における表面積が、好ましくは０．２６μｍ２以上かつ探針サイズ０ｎｍと１００ｎｍの表面積比が１０６％以上であることから、十分に吸着サイトを有している。上述の表面積条件を満たし、処理対象溶媒の含水率が５６ｗｔ％以下であることにより、微粒子除去率は７５％程度まで向上する。なお、溶媒中では荷電の正負よりも極性の有無が有効になるため、水中において微粒子と同符号の官能基であっても、極性の強い官能基による吸着サイトが多ければ、微粒子の除去効果が高い。従って、本発明によると、含水率の低い溶媒から微粒子を十分に吸着除去することができる。 In removing fine particles in a solvent having a low water content, it is necessary to increase the probability of fine particles coming into contact with each other and to have many adsorption sites for adsorption removal. The removal material used in the present invention preferably has a surface area of 0.26 μm 2 or more in AFM measurement and a surface area ratio of 0 nm to 100 nm of the probe size of 106% or more, so it has sufficient adsorption sites. . By satisfying the above surface area condition and the water content of the solvent to be treated is 56 wt % or less, the fine particle removal rate is improved to about 75%. In addition, since the presence or absence of polarity is more effective than the positive or negative charge in the solvent, even if the functional group has the same sign as the fine particle in water, if there are many adsorption sites due to the functional group with strong polarity, the fine particle removal effect will be large. high. Therefore, according to the present invention, fine particles can be sufficiently adsorbed and removed from a solvent having a low water content.
本発明の微粒子吸着材及び微粒子除去方法は、水分含水率の低い溶媒中の微粒子を吸着して除去するためのものである。 The fine particle adsorbent and the fine particle removing method of the present invention are for adsorbing and removing fine particles in a solvent having a low water content.
水分含水率の低い溶媒としては、好ましくは水分含水率が５６重量％以下、特に３０重量％以下である、イソプロピルアルコール、アセトン、ベンゼンなどが例示されるが、これらに限定されない。この溶媒中の微粒子としては、シリカ、金属酸化物などが例示されるが、これらに限定されない。溶媒中の微粒子濃度は、通常５０ｐｐｍ以下、特に１ｐｐｍ以下が例示されるが、これに限定されない。 Examples of solvents with low water content include, but are not limited to, isopropyl alcohol, acetone, and benzene, which preferably have a water content of 56% by weight or less, particularly 30% by weight or less. Examples of fine particles in this solvent include silica, metal oxides, and the like, but are not limited to these. The fine particle concentration in the solvent is typically 50 ppm or less, particularly 1 ppm or less, but not limited thereto.
本発明の微粒子吸着材は、負の荷電基を有する高分子材料よりなり、原子間力顕微鏡（以下、ＡＦＭ）による計測において、探針サイズ０ｎｍの時に表面積が好ましくは０．２６μｍ２以上、特に好ましくは０．２６～０．４０μｍ２であり、探針サイズ０ｎｍの時の表面積Ｓ１と１００ｎｍの時の表面積Ｓ２との比率（百分比）Ｓ１／Ｓ２が１０６％以上、好ましくは１０６～１５０％の表面構造を有する。 The fine particle adsorbent of the present invention is made of a polymer material having a negatively charged group, and when measured by an atomic force microscope (hereinafter referred to as AFM), the surface area is preferably 0.26 μm 2 or more when the probe size is 0 nm. It is preferably 0.26 to 0.40 μm 2 , and the ratio (percentage) S1/S2 between the surface area S1 when the probe size is 0 nm and the surface area S2 when the probe size is 100 nm is 106% or more, preferably 106 to 150%. It has a surface structure.
負の荷電基を有するポリマー（有機高分子材料）としては、非芳香族系のポリマー、芳香族系のポリマーのいずれでもよい。非芳香族系ポリマーとしては、ＰＶＡ（ポリビニルアルコール）、ＰＴＦＥ（ポリテトラフルオロエチレン）、ＰＥ（ポリエチレン）、ポリビニリデンフロライドなどが挙げられる。本発明ではこれらの中でも、ＰＥが好適である。 The polymer (organic polymeric material) having a negatively charged group may be either a non-aromatic polymer or an aromatic polymer. Non-aromatic polymers include PVA (polyvinyl alcohol), PTFE (polytetrafluoroethylene), PE (polyethylene), polyvinylidene fluoride, and the like. Among these, PE is preferable in the present invention.
荷電性の官能基としては、負の荷電性の官能基が好適であり、特にスルホン酸基、リン酸基、ホスホン酸基、ホスフィン酸基、カルボキシル基などの１種又は２種以上が好適であるが、この限りではない。これらの官能基はＨ型だけではなく、Ｎａ型、Ｋ型などの塩型であってもよい。基材表面の単位面積当たりの荷電性の官能基の量は好ましくは、２．０～３．０ｍｍｏｌ／ｇ－Ｄｒｙであるが、これに限定されない。 As the charged functional group, a negatively charged functional group is preferable, and one or more of a sulfonic acid group, a phosphoric acid group, a phosphonic acid group, a phosphinic acid group, a carboxyl group, and the like are particularly preferable. Yes, but not limited to this. These functional groups may be not only H-type but also salt-type such as Na-type and K-type. The amount of chargeable functional groups per unit area of the substrate surface is preferably 2.0 to 3.0 mmol/g-Dry, but is not limited thereto.
本発明で用いる吸着材の形状としては、多孔質の平膜、中空糸膜、粒子状の樹脂、繊維状の糸や不織布が上げられる。平膜や不織布は折り畳んでプリーツ形状にしても良く、糸は巻き回して糸巻きフィルターにしても良い。 Examples of the shape of the adsorbent used in the present invention include porous flat membranes, hollow fiber membranes, particulate resins, fibrous threads and non-woven fabrics. The flat membrane or nonwoven fabric may be folded into a pleated shape, and the thread may be wound to form a thread-wound filter.
［実施例１、比較例１～４］
＜有機溶媒、微粒子及び超純水＞
有機溶媒、微粒子及び超純水として以下のものを用いた。
有機溶媒：イソプロピルアルコール（関東化学社製電子工業用ＥＬグレードＩＰＡ）
溶媒含水率：７３ｐｐｍ≒０．０１ｗｔ％（カールフィッシャー法により測定、ｎ＝３の平均値）
微粒子：コアフロント社製ｓｉｃａｓｔａｒ（粒径３０ｎｍシリカ微粒子）
純水：超純水（比抵抗１８．２ＭΩ・ｃｍ以上）
[Example 1, Comparative Examples 1 to 4]
<Organic solvent, fine particles and ultrapure water>
The following were used as the organic solvent, fine particles and ultrapure water.
Organic solvent: isopropyl alcohol (EL grade IPA for the electronics industry manufactured by Kanto Chemical Co., Ltd.)
Solvent water content: 73 ppm ≈ 0.01 wt% (measured by Karl Fischer method, average value of n = 3)
Fine particles: sicastar manufactured by Core Front (particle size 30 nm silica fine particles)
Pure water: ultrapure water (specific resistance of 18.2 MΩ cm or more)
＜吸着材＞
吸着材として表１のものを用いた。吸着材表面のＡＦＭ計測条件は次の通りである。
測定装置：自作ＡＦＭ
カンチレバー：ＯＰＵＳ １６０ＡＣ－ＮＧ （ＭｉｋｒｏＭａｓｃｈ社製）
測定モード：周波数変調方式（ＦＭモード）
ソフトウエア：自作プログラム＋Ｇｗｙｄｄｉｏｎ（フリーソフト）
<Adsorbent>
As the adsorbent, those shown in Table 1 were used. The AFM measurement conditions for the adsorbent surface are as follows.
Measuring device: self-made AFM
Cantilever: OPUS 160AC-NG (manufactured by MikroMasch)
Measurement mode: Frequency modulation method (FM mode)
Software: Original program + Gwyddion (free software)
なお、具体的には、吸着材Ａのポリマーはポリエチレンベースであり、その荷電基はＮａ型のスルホン酸基である。吸着材Ｂのポリマーは、スチレンージビニルベンゼン共重合体であり、その荷電基はＮａ型のスルホン酸基である。吸着材Ｃのポリマーはスチレンージビニルベンゼン共重合体であり、その荷電基はＮａ型の４級アミン基である。 Specifically, the polymer of adsorbent A is polyethylene-based, and its charged groups are Na-type sulfonic acid groups. The polymer of adsorbent B is a styrene-divinylbenzene copolymer, and its charged groups are Na-type sulfonic acid groups. The polymer of adsorbent C is a styrene-divinylbenzene copolymer, and its charged groups are Na-type quaternary amine groups.
＜実験方法＞
上記微粒子５０ｐｐｍを含む溶媒１００ｍＬを１２５ｍLポリエチレン瓶に収容し、この溶媒に吸着材６００ｃｍ２を浸漬させ、常温にて３０分間振盪撹拌し、微粒子の吸着材への吸着操作を行った。その後、溶媒をサンプリングし、モリブデン青吸光光度法によって溶媒中のシリカ濃度を測定し、微粒子除去率を算出した。結果を表２に示す。
<Experimental method>
100 mL of the solvent containing 50 ppm of the above fine particles was placed in a 125 mL polyethylene bottle, 600 cm 2 of the adsorbent was immersed in this solvent, and the mixture was shaken and stirred at room temperature for 30 minutes to adsorb the fine particles to the adsorbent. After that, the solvent was sampled, the concentration of silica in the solvent was measured by molybdenum blue absorptiometry, and the fine particle removal rate was calculated. Table 2 shows the results.
＜考察＞
表２の通り、実施例１は比較例に比べて、溶媒中の微粒子除去率が高いことが分かる。なお、ここでの膜面積や溶媒種、微粒子濃度などは本発明の一例であり、本発明はこれに限定されない。
<Discussion>
As shown in Table 2, it can be seen that Example 1 has a higher fine particle removal rate in the solvent than Comparative Example. It should be noted that the film area, solvent type, fine particle concentration, etc. here are examples of the present invention, and the present invention is not limited thereto.
Claims (8)
負の荷電基を有する非芳香族高分子材料よりなり、
原子間力顕微鏡による計測において、探針サイズ０ｎｍの時の表面積Ｓ１と１００ｎｍの時の表面積Ｓ２との比率Ｓ１／Ｓ２が１０６％以上の表面構造を有する微粒子吸着材。 A particulate adsorbent for adsorbing and removing particulates in a solvent containing particulates,
Consisting of a non-aromatic polymeric material having a negatively charged group,
A fine particle adsorbent having a surface structure in which the ratio S1/S2 of the surface area S1 when the probe size is 0 nm to the surface area S2 when the probe size is 100 nm is 106% or more in measurement by an atomic force microscope.
8. The method of removing fine particles from a solvent according to claim 6, wherein said solvent is a mixed solvent of isopropyl alcohol and water.
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