JP2022137543A - Autoanalyzer - Google Patents

Abstract

To accurately detect the presence or absence of residual water in a reaction vessel.SOLUTION: An autoanalyzer according to an embodiment comprises a reaction vessel, irradiation means, light detection means, absorbance calculation means, and residual water detection means. The irradiation means irradiates the reaction vessel with light. The light detection means detects light passing through the reaction vessel. The absorbance calculation means determines absorbance based on a temporal change waveform indicating a change with time of a signal value output from the light detection means. The residual water detection means detects residual water in the reaction vessel based on the output from the light detection means.SELECTED DRAWING: Figure 1

Description

The embodiments disclosed in the specification and drawings relate to automated analyzers.

Automatic analyzers are devices that optically and electrically measure the concentrations or activity values of components contained in blood or urine using chemical reactions with test reagents.

The automatic analyzer dispenses samples stored for each examiner such as a patient or a checkup person into individual reaction containers assigned for measurement of each test item. Also, the automatic analyzer discharges a reagent corresponding to each test item into a reaction container corresponding to the test item. Then, the test item is measured using the mixed liquid of the sample and the reagent in each reaction container. After the measurement in each reaction container is completed, the mixed liquid is drained from each reaction container. Each reaction vessel is then washed. The process of washing the reaction vessel (hereinafter referred to as the washing process) consists of a process of supplying a washing solution or pure water corresponding to the discharged mixed liquid into the inside of the reaction vessel for washing, and a process of sucking the liquid used for washing. and a step of drying the reaction vessel from which the liquid used for washing has been sucked (hereinafter referred to as a drying step). After completion of the drying process, the reaction vessel is used for measurement of subsequent test items of the sample.

In the cleaning process, a phenomenon may occur in which the liquid discharged during the cleaning process remains inside the reaction vessel (hereinafter referred to as residual water) due to an abnormality in the cleaning mechanism or the like. Even when a small amount of residual water exists, it is required to accurately detect the presence or absence of residual water in the reaction vessel.

Japanese Patent Application Laid-Open No. 2009-031202

One of the problems to be solved by the embodiments disclosed in this specification and drawings is to accurately detect the presence or absence of residual water in the reaction vessel. However, the problems to be solved by the embodiments disclosed in this specification and drawings are not limited to the above problems. A problem corresponding to each effect of each configuration shown in the embodiments described later can be positioned as another problem.

An automatic analyzer according to an embodiment includes a reaction container, irradiation means, light detection means, absorbance calculation means, and residual water detection means. The irradiation means irradiates the reaction vessel with light. The light detection means detects light that has passed through the reaction vessel. The absorbance calculator calculates the absorbance based on the output of the light detector. The residual water detection means detects the residual water in the reaction container based on the time-varying waveform indicating the temporal change of the signal value output from the photodetector.

FIG. 1 is a diagram showing the configuration of an automatic analyzer according to the first embodiment. FIG. 2 is a perspective view showing an example of the configuration of the analysis mechanism of the automatic analyzer according to the first embodiment; FIG. 3 is a diagram showing a typical example of a signal waveform (photometric waveform) used for calculating absorbance. FIG. 4 is a diagram showing an example of the configuration of the cleaning mechanism of the automatic analyzer according to the first embodiment. FIG. 5 is a flowchart illustrating a processing procedure of stage determination processing by the automatic analyzer according to the first embodiment. FIG. 6 is a flowchart illustrating a processing procedure of residual water detection processing by the automatic analyzer according to the first embodiment. FIG. 7 is a diagram for explaining a method of calculating a determination value in residual water detection processing by the automatic analyzer according to the first embodiment. FIG. 8 is a diagram showing the frequency distribution of reference values used in residual water detection processing by the automatic analyzer according to the first embodiment. FIG. 9 is a flowchart exemplifying a processing procedure of reference value calculation processing by the automatic analyzer according to the first embodiment. FIG. 10 is a diagram for explaining a determination value calculation method in the remaining water detection process by the automatic analyzer according to the first modification of the first embodiment. FIG. 11 is a diagram for explaining a method of calculating a determination value in residual water detection processing by an automatic analyzer according to the second modification of the first embodiment. FIG. 12 is a diagram for explaining a method of calculating a determination value in residual water detection processing by an automatic analyzer according to the third modification of the first embodiment. FIG. 13 is a diagram showing the configuration of an automatic analyzer according to the second embodiment. FIG. 14 is a flowchart illustrating a processing procedure of residual water detection processing by the automatic analyzer according to the second embodiment. FIG. 15 is a flowchart exemplifying the processing procedure of determination processing by the automatic analyzer according to the second embodiment. FIG. 16 is a flowchart exemplifying the procedure of determination processing by the automatic analyzer according to the first modification of the second embodiment. FIG. 17 is a flowchart illustrating a procedure of determination processing by an automatic analyzer according to a second modification of the second embodiment; FIG. 18 is a flowchart illustrating a procedure of determination processing by an automatic analyzer according to the third modification of the second embodiment.

Hereinafter, embodiments of the automatic analyzer will be described in detail with reference to the drawings. In the following description, components having substantially the same functions and configurations are denoted by the same reference numerals, and redundant description will be given only when necessary.

(First embodiment)
FIG. 1 is a diagram showing the configuration of an automatic analyzer 1 according to the first embodiment. The automatic analyzer 1 includes an analysis mechanism 2 , an analysis circuit 3 , a drive mechanism 4 , an input interface 5 , an output interface 6 , a communication interface 7 , a storage circuit 8 and a control circuit 9 .

Analysis mechanism 2 mixes a sample such as blood or urine with a reagent solution used for each test item. Further, depending on the test item, the analysis mechanism 2 mixes the standard solution diluted by a predetermined ratio with the reagent solution used for this test item. The analysis mechanism 2 measures optical physical property values of a mixture of a sample or standard solution and a reagent solution. This measurement produces standard and test data expressed, for example, as transmitted light intensity or absorbance, and scattered light intensity.

The analysis circuit 3 is a processor that analyzes standard data and test data generated by the analysis mechanism 2 to generate calibration data and analysis data. The analysis circuit 3, for example, reads an analysis program from the storage circuit 8, and analyzes the standard data and the test data according to the read analysis program. Note that the analysis circuit 3 may include a storage area for storing at least part of the data stored in the storage circuit 8 .

The drive mechanism 4 drives the analysis mechanism 2 under the control of the control circuit 9 . The drive mechanism 4 is implemented by gears, stepping motors, belt conveyors, lead screws, and the like, for example.

The input interface 5 receives, for example, settings such as analysis parameters for each inspection item related to a sample for which an operator instructs measurement or a sample for which measurement is requested via the intra-hospital network NW. The input interface 5 is implemented by, for example, a mouse, a keyboard, a touch pad for inputting instructions by touching an operation surface, a touch panel, or the like. The input interface 5 is connected to the control circuit 9 , converts an operation instruction input by an operator into an electric signal, and outputs the electric signal to the control circuit 9 . The input interface 5 is an example of input means.

It should be noted that the input interface 5 in this specification is not limited to having physical operation parts such as a mouse and a keyboard. For example, the input interface 5 receives an electrical signal corresponding to an operation instruction input from an external input device provided separately from the automatic analyzer 1, and outputs this electrical signal to the control circuit 9. processing circuitry may be included.

The output interface 6 is connected to the control circuit 9 and outputs signals supplied from the control circuit 9 . The output interface 6 is realized by, for example, a display circuit, a printed circuit and an audio device. The output interface 6 notifies the user of the residual water detection result. The output interface 6 is an example of notification means. A notification means may be referred to as a reporting means.

Display circuits include, for example, CRT displays, liquid crystal displays, organic EL displays, LED displays and plasma displays. Further, the display circuit may include a processing circuit that converts data representing an object to be displayed into a video signal and outputs the video signal to the outside. Printed circuits include, for example, printers and the like. The printed circuit may also include an output circuit that outputs data representing a print target to the outside. Audio devices include, for example, speakers and the like. Also, the audio device may include an output circuit that outputs an audio signal to the outside. Note that the output interface 6 may be implemented as a touch panel or a touch screen together with the input interface 5 .

The communication interface 7 connects with, for example, an intra-hospital network NW. The communication interface 7 performs data communication with a HIS (Hospital Information System) via an intra-hospital network NW. Incidentally, the communication interface 7 may perform data communication with the HIS via a laboratory information system (LIS) connected to the intra-hospital network NW.

The storage circuit 8 stores an analysis program to be executed by the analysis circuit 3 and a control program for realizing the functions of the control circuit 9 . The storage circuit 8 stores the calibration data generated by the analysis circuit 3 for each inspection item. The storage circuit 8 stores analysis data generated by the analysis circuit 3 for each sample. The storage circuit 8 stores an examination order input by the operator or an examination order received by the communication interface 7 via the intra-hospital network NW.

The storage circuit 8 is a storage device such as an HDD (Hard Disk Drive), an SSD (Solid State Drive), or an integrated circuit that stores various information. Moreover, the storage circuit 8 may be a portable storage medium such as a CD (Compact Disc), a DVD (Digital Versatile Disc), a flash memory, or the like, in addition to an HDD, an SSD, or the like. Note that the memory circuit 8 may be a driving device that reads and writes various information with semiconductor memory elements such as flash memory and RAM (Random Access Memory). The storage circuit 8 may be called memory.

The storage circuit 8 stores programs executed by the control circuit 9, various data used for processing by the control circuit 9, and the like. As the program, for example, a program that is installed in the computer in advance from a network or a non-transitory computer-readable storage medium and causes the computer to implement each function of the control circuit 9 is used. Various data handled in this specification are typically digital data. The memory circuit 8 is an example of memory means.

The control circuit 9 is a processor that functions as the core of the automatic analyzer 1 . The control circuit 9 executes a program stored in the storage circuit 8 to implement a function corresponding to the executed program. Each function executed by the control circuit 9 will be described later. Note that the control circuit 9 may include a storage area for storing at least part of the data stored in the storage circuit 8 . The control circuit 9 may also be called a control unit or a processing circuit.

Next, the configuration of the analysis mechanism 2 will be described in detail.
FIG. 2 is a perspective view showing an example of the configuration of the analysis mechanism 2 shown in FIG. 1. As shown in FIG. The analysis mechanism 2 includes a reaction disk 201, a sample disk 202, a first reagent storage 203, a reagent rack 203a, a second reagent storage 204, and a reagent rack 204a.

The reaction disk 201 holds a plurality of reaction vessels 2011 arranged in a ring. The reaction disk 201 has a constant temperature bath that heats the mixed liquid in the reaction vessel 2011 and keeps it at a constant temperature. The reaction disk 201 also has a cell wiper for removing air bubbles and dirt from the outside of the reaction container 2011 . The reaction disk 201 alternately repeats rotating and stopping at predetermined time intervals. The reaction vessel 2011 is made of glass, for example. The reaction vessel 2011 may also be referred to as a reaction tube or cell.

A sample disk 202 is provided near the reaction disk 201 . The sample disk 202 rotates to hold a plurality of sample containers 100 containing samples such as blood. The sample disk 202 moves the sample container 100 containing the sample to be dispensed to the sample suction position.

The first reagent storage 203 cools the reagent container 101 containing the first reagent that reacts with the predetermined component contained in each of the standard sample and the test sample. A reagent rack 203 a is rotatably provided in the first reagent storage 203 . The reagent rack 203 a holds a plurality of reagent containers 101 .

The second reagent storage 204, for example, insulates the reagent container 102 containing the second reagent paired with the first reagent of the two-reagent system. A reagent rack 204 a is rotatably provided in the second reagent storage 204 . Reagent rack 204 a holds a plurality of reagent containers 102 .

2 includes a sample pipetting arm 205, a sample pipetting probe 206, a washing tank 206a, a first reagent pipetting arm 207, a first reagent pipetting probe 208, a washing tank 208a, a second Reagent dispensing arm 209, second reagent dispensing probe 210, cleaning tank 210a, first stirring arm 211, first stirring element 212, cleaning tank 212a, second stirring arm 213, second stirring element 214, and cleaning tank 214a Prepare.

The sample dispensing arm 205 is provided between the reaction disk 201 and the sample disk 202 so as to be vertically movable and horizontally rotatable. A sample dispensing arm 205 holds a sample dispensing probe 206 at one end. The sample dispensing arm 205 is rotated by the driving mechanism 4 . As the sample-dispensing arm 205 rotates, the sample-dispensing probe 206 rotates along an arc-shaped rotation track. A sample aspirating position where the sample pipetting probe 206 aspirates the sample from the sample container 100 is set on this rotational orbit. Also, a sample discharge position for discharging the sample sucked by the sample pipetting probe 206 into the reaction container 2011 is set at a position different from the sample suction position on the rotation track. Further, a washing position where the sample pipetting probe 206 is washed is set at a position different from the sample suction position and the sample discharge position on the rotation orbit. A washing tank 206a for washing the sample dispensing probe 206 is provided at the washing position. The rotation trajectory of the sample pipetting probe 206 intersects with the movement trajectory of the sample container 100 held by the sample disk 202 and the movement trajectory of the reaction vessel 2011 held by the reaction disk 201 . The points of intersection with the respective movement trajectories are the sample suction position and the sample discharge position.

The sample pipetting probe 206 is driven by the drive mechanism 4 and moves vertically between the sample aspirating position, the sample discharging position, and the washing position. Also, the sample pipetting probe 206 aspirates the sample from the sample container 100 positioned at the sample aspirating position under the control of the control circuit 9 . Also, the sample pipetting probe 206 discharges the aspirated sample into the reaction container 2011 positioned at the sample discharge position under the control of the control circuit 9 .

The first reagent dispensing arm 207 is provided in the vicinity of the outer periphery of the reaction disk 201 so as to be vertically movable and horizontally rotatable. A first reagent dispensing arm 207 holds a first reagent dispensing probe 208 at one end. The first reagent dispensing arm 207 is rotated by the driving mechanism 4 . As the first reagent dispensing arm 207 rotates, the first reagent dispensing probe 208 rotates along the arc-shaped rotation track. A first reagent aspirating position where the first reagent dispensing probe 208 aspirates the first reagent corresponding to each test item from the reagent container 101 arranged in the first reagent storage 203 and a A first reagent ejection position is set for ejecting the first reagent into the reaction container 2011 . The rotation trajectory of the first reagent dispensing probe 208 is the movement trajectory of (the reagent suction port of) the reagent container 101 held in the reagent rack 203 a in the first reagent storage 203 , and the reaction trajectory held in the reaction disk 201 . It intersects with each movement trajectory of the container 2011 . The intersections with the respective movement trajectories are the first reagent aspirating position and the first reagent discharging position.

Also, a washing position is set on the rotation track where the first reagent dispensing probe 208 is washed. A washing tank 208a for washing the first reagent dispensing probe 208 is provided at this washing position. The cleaning tank 208a cleans the first reagent dispensing probe 208 each time dispensing of the first reagent corresponding to each inspection item is completed.

The first reagent dispensing probe 208 is driven by the driving mechanism 4 and moves vertically between the first reagent aspirating position and the first reagent discharging position on the rotation track. Also, the first reagent dispensing probe 208 aspirates the first reagent from the reagent container 101 located at the first reagent aspirating position under the control of the control circuit 9 . Under the control of the control circuit 9, the first reagent dispensing probe 208 discharges the sucked first reagent into the reaction container 2011 positioned at the first reagent discharge position.

The second reagent dispensing arm 209 is provided between the reaction disk 201 and the second reagent storage 204 so as to be vertically movable and horizontally rotatable. A second reagent dispensing arm 209 holds a second reagent dispensing probe 210 at one end. The second reagent dispensing arm 209 is rotated by the driving mechanism 4 . As the second reagent dispensing arm 209 rotates, the second reagent dispensing probe 210 rotates along an arc-shaped rotation track. On this rotating orbit, the second reagent dispensing probe 210 aspirates the second reagent corresponding to each test item from the reagent container 102 held in the reagent rack 204a arranged in the second reagent storage 204. A second reagent aspirating position and a second reagent discharging position for discharging the sucked second reagent into the reaction container 2011 are set. The rotation trajectory of the second reagent dispensing probe 210 is the movement trajectory of (the reagent suction port of) the reagent container 101 held in the reagent rack 204 a in the second reagent storage 204 , and the reaction trajectory held in the reaction disk 201 . It intersects with each movement trajectory of the container 2011 . The intersections with the respective movement trajectories are the second reagent aspirating position and the second reagent discharging position.

Also, a washing position is set on the rotation track where the second reagent dispensing probe 210 is washed. A cleaning tank 210a for cleaning the second reagent dispensing probe 210 is provided at this cleaning position. The cleaning tank 210a cleans the second reagent dispensing probe 210 each time dispensing of the second reagent corresponding to each inspection item is completed.

The second reagent dispensing probe 210 is driven by the driving mechanism 4 to move vertically between the second reagent aspirating position and the second reagent discharging position on the rotation track. Also, the second reagent dispensing probe 210 aspirates the second reagent from the reagent container 102 positioned at the second reagent aspirating position under the control of the control circuit 9 . In addition, the second reagent dispensing probe 210 discharges the aspirated second reagent into the reaction container 2011 positioned at the second reagent discharge position under the control of the control circuit 9 .

The first stirring arm 211 and the second stirring arm 213 are provided near the outer circumference of the reaction disk 201 . A first stirrer 212 is provided at the tip of the first stirring arm 211 . The first stirring arm 211 holds the first stirrer 212 and is vertically movable. In addition, the first stirring arm 211 is horizontally rotatable, and can move the first stirrer 212 along an arc-shaped rotation track. The first stirrer 212 is driven by the driving mechanism 4 to move vertically between a first stirring position on the reaction disk 201 and a cleaning position provided on the side of the reaction disk 201 . The first stirrer 212 stirs the mixture of the sample and the first reagent in the reaction container 2011 arranged at the first stirring position on the reaction disk 201 .

The washing position is on the rotation orbit of the first stirrer 212 . A washing tank 212a for washing the first stirrer 212 is provided at the washing position. In the washing tank 212a, the first stirrer 212 that stirs the mixture of the sample and the first reagent is washed.

A second stirrer 214 is provided at the tip of the second stirring arm 213 . The second stirring arm 213 holds the second stirrer 214 and is vertically movable. In addition, the second stirring arm 213 is rotatable in the horizontal direction, and can move the second stirring element 214 along an arc-shaped rotation track. The second stirrer 214 is driven by the drive mechanism 4 to move vertically between a second stirring position on the reaction disk 201 and a cleaning position provided on the side of the reaction disk 201 . The second stirrer 214 stirs the mixture of the sample, the first reagent, and the second reagent in the reaction container 2011 arranged at the second stirring position on the reaction disk 201 .

The washing position is on the rotational orbit of the second stirrer 214 . A washing tank 214a for washing the second stirrer 214 is provided at the washing position. In the washing tank 214a, the second stirrer 214 that stirs the mixture of the sample, the first reagent, and the second reagent is washed.

The analysis mechanism 2 also includes a photometry unit 220 and a cleaning mechanism 230 . A photometry position is set on the rotation orbit where the light irradiated toward the reaction container 2011 is measured. A photometry unit 220 is provided at the photometry position. The photometry unit 220 irradiates a mixture of sample and reagent discharged into the rotating reaction vessel 2011 with light, and optically measures the light passing through the mixture. The photometry unit 220 has a light source that irradiates the reaction container 2011 with light and a photodetector that detects the light that has passed through the reaction container 2011 . The photodetector generates standard data or test data including absorbance based on the light detection results. The light source is an example of irradiation means, and the photodetector is an example of light detection means and absorbance calculation means.

A light source irradiates the reaction vessel 2011 passing between the light source and the photodetector. The photodetector detects light that has passed through the mixture of the standard sample and the reagent or the mixture of the test sample and the reagent in the reaction container 2011 . Since the wavelength to be detected differs for each inspection item, the photodetector detects light of the wavelength set for each inspection item. The photodetector converts detected light into an electric signal using a photodiode array or the like, and amplifies the electric signal using an amplifier or the like. Then, the photodetector converts the amplified electric signal into a digital signal by an analog-digital converter (ADC) or the like. The signal value of the digital signal may be referred to as transmitted light intensity.

FIG. 3 is a diagram showing a typical example of a signal waveform (hereinafter referred to as a photometric waveform) showing temporal changes in the signal value of an electric signal amplified by an amplifier or the like in a photodetector. The photometric waveform is a time-varying waveform used for calculating absorbance. The horizontal axis of the photometric waveform shown in FIG. 3 is time, and the vertical axis is signal value. The photometric waveform shown in FIG. 3 indicates the photometric waveform for one reaction container 2011 . In the photometric waveform, as the time on the horizontal axis changes, the corresponding portion of the reaction container 2011 changes. Also, the photometric waveform changes from one end to the other end in the width direction of the reaction container 2011 . The photometric waveform has a time range (hereinafter referred to as a structural factor range) Rs in which the output value varies due to structural factors such as the reaction disk 201 and the reaction container 2011, and an output value due to the liquid properties of the reaction liquid. It has a time range (hereinafter referred to as a reaction solution factor range) Rr in which the value fluctuates. In the reaction solution factor range Rr, the signal value gradually increases from the end to the center of the reaction container 2011 and gradually decreases from the center to the other end. Therefore, the signal value becomes maximum near the central portion of the reaction liquid factor range Rr. That is, the photometric waveform has a maximum value near the central portion of the reaction liquid factor range Rr.

The photodetector uses the photometric waveform to generate standard or test data including absorbance. Absorbance is a representative value of the photometric waveform. Absorbance is calculated using a plurality of signal values sampled from the photometric waveform. The absorbance is, for example, the average value of multiple signal values sampled from the photometric waveform. The waveform showing the change in absorbance over time has the same shape as the photometric waveform shown in FIG. The range from which the signal value is extracted when calculating the absorbance (hereinafter referred to as sampling range) is set in the vicinity of the point where the signal value is maximum.

The photometry unit 220 outputs standard data and test data to the analysis circuit 3 . The photometry unit 220 also outputs a photometry waveform to the control circuit 9 .

The cleaning mechanism 230 cleans the reaction vessel 2011 for which the measurement by the photometry unit 220 has been completed using a predetermined cleaning liquid, and dries the cleaned reaction vessel 2011 . The cleaning mechanism 230 is an example of cleaning means. The process of cleaning the reaction vessel 2011 (hereinafter referred to as a cleaning process) includes a process of supplying a cleaning liquid or pure water corresponding to the discharged mixed liquid into the inside of the reaction vessel 2011 for cleaning; and a step of drying the reaction vessel 2011 from which the liquid used for washing has been sucked (hereinafter referred to as a drying step).

FIG. 4 is a diagram showing an example of the configuration of the cleaning mechanism 230. As shown in FIG. The cleaning mechanism 230 includes a cleaning liquid supply unit 240 , a cleaning nozzle group 250 , a drainage unit 260 , a flow rate adjustment unit 270 , a three-way solenoid valve 281 , a three-way solenoid valve 282 , a three-way solenoid valve 291 and a three-way solenoid valve 292 . The cleaning mechanism 230 also includes detergent containers 103 and 104 that contain cleaning liquid used for cleaning the reaction vessel 2011 . For example, an acidic detergent is contained in detergent container 103 and an alkaline detergent is contained in detergent container 104 .

The cleaning nozzle group 250 is a set of nozzles provided with predetermined piping. Also, the cleaning mechanism 230 further includes a drying mechanism 295 . The cleaning nozzle group 250 includes first nozzles 251 to seventh nozzles 257 . The first to seventh nozzles 251 to 257 and the drying mechanism 295 are provided above the cleaning positions W1, W2, W3, W4, W5, B, W7 and W8, respectively. Each of the cleaning positions W1, W2, W3, W4, W5, B, W7 and W8 is set for cleaning the reaction vessel 2011 held on the reaction disk 201. FIG. The first nozzle 251 to seventh nozzle 257 and the drying mechanism 295 move vertically under the control of the control circuit 9 .

The cleaning liquid supply unit 240 has a first supply pump 241 , a second supply pump 242 and a third supply pump 243 .

The first supply pump 241 sucks the pure water purified by the pure water device 300 . The first supply pump 241 supplies the sucked pure water to the flow rate adjustment unit 270 as a cleaning liquid.

The second supply pump 242 sucks the pure water and the alkaline detergent from the water purifier 300 and the detergent container 104 through the three-way solenoid valve 281, and dilutes the sucked alkaline detergent with pure water to generate a diluted solution. The symbols "NO (normally open)" attached to the three-way solenoid valves 271, 281, 282, 291, and 292 indicate that the solenoid valves are open when not energized, and closed when energized. Indicates that it is a solenoid valve. "NC (normally closed)" indicates that the solenoid valve is closed when not energized and opened when energized. Also, "COM (common hole)" indicates that the solenoid valve is a common valve. The second supply pump 242 supplies the generated diluted liquid to the third nozzle 253 via the three-way electromagnetic valve 281 and the three-way electromagnetic valve 282 as an alkaline cleaning liquid. As a result, the alkaline cleaning liquid is discharged from the third nozzle 253 into the reaction vessel 2011 positioned at the cleaning position W3.

The third supply pump 243 sucks the pure water and the acid detergent from the water purifier 300 and the detergent container 103 through the three-way electromagnetic valve 291, and dilutes the sucked acid detergent with pure water to generate a diluted solution. The third supply pump 243 supplies the produced diluted liquid to the second nozzle 252 via the three-way solenoid valve 291 and the three-way solenoid valve 292 as an acidic cleaning liquid. As a result, the acidic cleaning liquid is discharged from the second nozzle 252 into the reaction vessel 2011 positioned at the cleaning position W2.

The flow rate adjustment unit 270 supplies the cleaning liquid supplied from the first supply pump 241 to each of the first nozzle 251 , fourth nozzle 254 , fifth nozzle 255 and sixth nozzle 256 . The flow rate adjustment unit 270 includes a three-way solenoid valve 271 and a flow rate adjustment valve 272 . In the three-way solenoid valve 271, under the control of the control circuit 9, the solenoid valve marked with "NC" is in an open state for a predetermined time. The opening/closing degree of the flow control valve 272 is manually adjusted by an operator or the like. As a result, a predetermined amount of cleaning liquid is supplied to the first nozzle 251 , fourth nozzle 254 , fifth nozzle 255 and sixth nozzle 256 . The supplied cleaning liquid is discharged from the first nozzle 251, the fourth nozzle 254, the fifth nozzle 255, and the sixth nozzle 256 to the reaction vessels 2011 located at the cleaning positions W1, W4, W5, and B, respectively. be done.

The drainage unit 260 has a first drainage pump 261 and a second drainage pump 262 . The first drainage pump 261 pumps a predetermined liquid contained in the reaction vessel 2011 stopped at the washing positions W1, W2, W3, W4, W5, B and W7 through the first nozzle 251 and the second nozzle. 252, a third nozzle 253, a fourth nozzle 254, a fifth nozzle 255, a sixth nozzle 256, and a seventh nozzle 257, respectively. The first drainage pump 261 drains the sucked liquid to the drainage tank. The first drainage pump 261 is an example of a suction pump that sucks any of drainage, detergent, and water.

The drying mechanism 295 dries the reaction container 2011 after the predetermined liquid has been sucked by the liquid discharge unit 260 . Drying mechanism 295 comprises eighth nozzle 258 and drying tip 296 . The second drainage pump 262 sucks the predetermined liquid contained in the reaction container 2011 stopped at the washing position W8 through the eighth nozzle 258. FIG. The second drain pump 262 drains the sucked liquid to the drain tank. The second drainage pump 262 is an example of a suction pump that sucks any of drainage, detergent, and water. A drying tip 296 is attached to the eighth nozzle 258 . The dry tip 296 is inserted into the reaction container 2011 stopped at the washing position W8 under the control of the control circuit 9. FIG. Then, according to the control of the control circuit 9, the drying chip 296 moves up and down while being in contact with the reaction vessel 2011, thereby wiping off the water adhering to the inner wall of the reaction vessel 2011. FIG. The drying mechanism 295 is an example of drying means.

Next, the configuration of the control circuit 9 according to this embodiment will be described in detail.
The control circuit 9 performs a system control function 91 , a remaining water detection function 92 , an output control function 93 and a reference value calculation function 94 by executing programs read from the storage circuit 8 . That is, the control circuit 9 has a system control function 91 , a remaining water detection function 92 , an output control function 93 and a reference value calculation function 94 . It should be noted that although the present embodiment is described assuming that each function is implemented by a single processor, the present invention is not limited to this. For example, a control circuit may be configured by combining a plurality of independent processors, and each function may be realized by executing a program by each processor. Also, the system control function 91, the residual water detection function 92, the output control function 93, and the reference value calculation function 94 may be called a system control circuit, a residual water detection circuit, an output circuit, and a reference value calculation circuit, respectively. It may be implemented as a hardware circuit. The above description of each function executed by the control circuit 9 is the same for each of the following embodiments and modifications.

The term "processor" used in the above description includes, for example, a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), or an ASIC, a programmable logic device (e.g., Simple Programmable Logic Device (SPLD) , Complex Programmable Logic Device (CPLD), Field Programmable Gate Array (FPGA), etc. The processor can read and execute the program stored in the memory circuit 8. It should be noted that instead of storing the program in the storage circuit 8, the program may be configured to be directly embedded in the circuit of the processor.In this case, the processor reads and executes the program embedded in the circuit. Note that each processor of the present embodiment is not limited to being configured as a single circuit for each processor, but may be configured as one processor by combining a plurality of independent circuits. 1 may be integrated into a single processor to achieve the function, and the above description of "processor" is The same applies to forms and modifications.

The control circuit 9 centrally controls each part in the automatic analyzer 1 based on the input information input from the input interface 5 by the system control function 91 . For example, in the system control function 91, the control circuit 9 drives the driving mechanism 4 so as to perform measurement according to the inspection item, and the analysis circuit 9 so as to analyze the standard data and test data generated by the analysis mechanism 2. 3. The control circuit 9 that implements the system control function 91 is an example of system control means.

The control circuit 9 uses the residual water detection function 92 to execute processing for detecting residual water in the reaction vessel 2011 based on the output of the photometry unit 220 (hereinafter referred to as residual water detection processing). In the remaining water detection process, the control circuit 9 calculates a judgment value using the photometric waveform obtained during the cleaning process, and compares the calculated judgment value with a pre-stored reference value to detect the residual water in the reaction vessel 2011. Detect water. For example, if the determination value is within the reference range, the control circuit 9 determines that there is no residual water in the reaction container 2011 that acquired the photometric waveform, and if the determination value is not within the reference range, acquires the photometric waveform. It is determined that there is residual water in the reaction vessel 2011 that has been removed. For example, the reference range is calculated based on the average value of the reference values and the standard deviation of the reference values. The control circuit 9 that implements the residual water detection function 92 is an example of residual water detection means.

The determination value is a value calculated using the photometric waveform detected during the cleaning process. The determination value is calculated using a plurality of signal values extracted (sampled) from a plurality of locations of the detected photometric waveform. The determination value is calculated using, for example, the photometric waveform measured from the reaction vessel 2011 passing through the photometric position after the drying process is completed at the cleaning position W8.

The number of signal values (hereinafter referred to as the number of samplings) used to calculate the determination value should be 2 or more. Moreover, the number of samplings for the judgment value is preferably larger than the number of samplings for the absorbance. In this case, the interval between a plurality of signal values sampled when calculating the judgment value (hereinafter referred to as sampling interval) is smaller than the absorbance sampling interval. That is, the sampling interval for the judgment value is different from the sampling interval for the absorbance.

Further, when calculating the determination value, the sampling range can be set to substantially the entire reaction liquid factor range Rr. Therefore, the sampling range of the judgment value can be made larger than the sampling range of the absorbance.

The reference value is a value calculated using a photometric waveform detected when an empty reaction vessel 2011 with no remaining water is irradiated with light. A reference value may be referred to as a normal value or a blank value. The reference value is calculated in advance when the automatic analyzer 1 is installed or when the reaction container 2011 is replaced. The reference value is calculated for each reaction container 2011 using the same calculation formula as the judgment value. Therefore, the number of samples for the reference value is the same as the number of samples for the judgment value. The reference value is stored in the storage circuit 8, for example.

The control circuit 9 uses the output control function 93 to control the output interface 6 based on the detection result of the residual water in the reaction vessel 2011 determined by the residual water detection function 92, and outputs information about the residual water and an abnormality of the reaction vessel 2011. information, information on anomaly of the automatic analyzer 1, and the like. The control circuit 9 uses the output control function 93 to display error information regarding remaining water, for example, on the display circuit. In addition, the control circuit 9 causes the printed circuit to print error information regarding remaining water, for example.

The control circuit 9 uses the reference value calculation function 94 to perform processing for calculating a reference value used in the remaining water detection processing (hereinafter referred to as reference value calculation processing). The control circuit 9 that implements the reference value calculation function 94 is an example of reference value calculation means.

(Step judgment process)
Next, the operation of the stage determination process executed by the automatic analyzer 1 will be described. The stage determination process is a process for determining whether the current stage is the operation stage of executing sample analysis or the standard value setting stage of calculating the standard value used in the remaining water detection process. The automatic analyzer 1 executes the stage determination process, for example, when the operator inputs an operation to start the process.

FIG. 5 is a flow chart showing an example of the steps of the stage determination process. It should be noted that the processing procedure in each processing described below is merely an example, and each processing can be changed as appropriate as possible. Further, in the processing procedures described below, steps can be omitted, replaced, and added as appropriate according to the embodiment. The above description of the processing procedure in each process is the same for each of the following embodiments and modifications. In the following description, an example in which the number of samplings of the determination value and the number of samplings of the reference value is "8" will be described.

The control circuit 9 uses the system control function 91 to determine whether the current stage is the operating stage (step S101). At this time, the control circuit 9 determines whether or not the current stage is the operation stage based on the input by the operator. If the current stage is the operation stage (step S101-Yes), the control circuit 9 executes residual water detection processing by the residual water detection function 92 (step S102). Detailed processing of the remaining water detection processing will be described later.

If the current stage is not the operation stage (step S101-No), it is determined whether the current stage is the reference value setting stage (step S103). At this time, the control circuit 9 determines whether or not the current stage is the reference value setting stage based on the operator's input. If the current stage is the reference value setting stage (step S103-Yes), the control circuit 9 executes reference value calculation processing by the reference value calculation function 94 (step S104). Detailed processing of the reference value calculation processing will be described later.

If the current stage is not the reference value setting stage (step S103-No), the control circuit 9 causes the output control function 93 to display a status error display screen on the display circuit. The display screen that displays the status error displays, for example, a sentence prompting the operator to input information about whether the current stage is the operation stage or the reference value setting stage.

(Residual water detection processing)
Next, an example of the remaining water detection process procedure executed in step S102 will be described in detail. FIG. 6 is a flow chart showing an example of the procedure of residual water detection processing executed by the residual water detection function 92. As shown in FIG. In the remaining water detection process, the control circuit 9 sequentially performs the following processes on the reaction vessel 2011 for which the drying process is completed each time the drying process for the reaction vessel 2011 is completed.

A photometric waveform generated based on the light that has passed through the reaction container 2011 is obtained from the photodetector (step S201). Next, the control circuit 9 obtains the cell number of the reaction container 2011 from which the photometric waveform was obtained (step S202). Next, the control circuit 9 acquires the reference value of the reaction vessel 2011 from which the photometric waveform was acquired from the storage circuit 8 (step S203). The control circuit 9 uses the obtained photometric waveform to calculate a determination value (step S204).

FIG. 7 is a diagram for explaining a method of calculating the determination value. FIG. 7 shows photometric waveforms detected from n reaction vessels 2011 from cell number 1 to cell number n during the cleaning process. In FIG. 7, "Cn" indicates the cell number of the reaction container 2011. In FIG. For example, the photometric waveform "C1" indicates detection from the reaction container 2011 with the cell number 1. In the process of step S204, the control circuit 9 determines the signal value T_P1 at the first point P1 to the signal value T_P8 at the eighth point P8 for each of the reaction containers 2011 with cell numbers C1 to Cn. Calculate as a value. "Pn" indicates a sampling point. For example, "P1" indicates the first point in the A photometric waveform. "T_Pn" indicates the signal value sampled from the photometric waveform. For example, "T_P1" is the signal value at the first point P1.

After the calculation of the determination value is completed, the control circuit 9 uses the determination value and the reference value to determine the presence or absence of residual water (step S205). Here, a case where the average value and the standard deviation of the signal values are used as the reference values will be described as an example. Formula (1) is an example of a determination formula for determining the presence or absence of residual water. FIG. 8 is a diagram showing the frequency distribution of blank values. The horizontal axis of FIG. 8 indicates the signal value (blank value), and the vertical axis indicates the frequency. The control circuit 9 determines whether the determination value is within the reference range for each reaction vessel 2011 in the cleaning process by determining whether the determination value satisfies the formula (1).

M_P1-3×S_P1 < T_P1 < M_P1+3×S_P1 (1)

In Equation (1), "Mn" is a value (hereinafter referred to as an average value) obtained by averaging signal values (hereinafter referred to as blank values) measured multiple times using an empty reaction container 2011 at the time of installation. A blank value is measured, for example, 10 times. For example, "M_P1" is a value obtained by averaging blank values measured multiple times for the first point P1. "S_P1" is the standard deviation of the blank values. For example, "S_P1" is the standard deviation of the blank values obtained from the plurality of reaction vessels 2011 for the blank value at the first point P1.

In the process of step S205, the control circuit 9 uses equation (1) to determine whether the signal value T_P1 at the first point P1 is within the reference range. Similarly to the first point P1, the control circuit 9 determines whether each of the signal values T_P2-T_P8 from the second point P2 to the eighth point P8 is within the reference range. Then, if the determination values are within the reference range at all sampling points, the control circuit 9 determines that there is no residual water in the reaction container 2011 (step S205-No). In this case, the control circuit 9 turns the residual water detection flag of the reaction container 2011 to "OFF" (step S206).

If there is one or more sampling points where the determination value is out of the reference range, that is, if there is a determination value that does not satisfy the determination formula, the control circuit 9 determines that there is residual water in the reaction container 2011 (step S205). -Yes). In this case, the control circuit 9 determines whether the residual water detection flag of the reaction vessel 2011 is "ON" (step S207).

If the residual water detection flag of the reaction vessel 2011 is "OFF" (step S207-No), the control circuit 9 turns the residual water detection flag of the reaction vessel 2011 "ON" (step S208). If the residual water detection flag of the reaction vessel 2011 is already "ON" (step S207-Yes), the control circuit 9 causes the output interface 6 to display an error display screen indicating that an abnormality has been detected in the reaction vessel 2011. is displayed on the display circuit (step S209). Accordingly, in consideration of the case where the detection result of residual water is erroneous, it is possible to inform the user that residual water has been detected only when it is determined that there is an abnormality continuously in the same reaction vessel 2011. can.

The control circuit 9 determines the number of times it is continuously determined that there is residual water in the reaction container 2011 (hereinafter referred to as the number of continuous detection ) is calculated. The control circuit 9 determines whether or not the calculated number of consecutive detections is equal to or greater than a predetermined value N (step S210). If the number of consecutive detections is equal to or greater than N (step S210-Yes), the control circuit 9 determines that the cleaning mechanism 230 is abnormal. In this case, the control circuit 9 causes the display circuit of the output interface 6 to display an error display screen indicating that an abnormality has been detected in the cleaning mechanism 230, and stops using the reaction vessel 2011 in which residual water has been detected. Accordingly, when residual water is detected in a predetermined number or more of the reaction vessels 2011, the user can be notified that an abnormality has occurred in the cleaning mechanism 230. FIG.

The control circuit 9 repeats the processes from step S201 to step S211 until the cleaning process for all the reaction vessels 2011 is completed (step S212-No). Then, when the cleaning process for all the reaction vessels 2011 is completed (step S212-Yes), the control circuit 9 terminates the remaining water detection process and the stage determination process.

(Reference value calculation processing)
Next, an example of the procedure of the reference value calculation process executed in step S104 will be described in detail. FIG. 9 is a flow chart showing an example of the reference value calculation process executed by the reference value calculation function 94 or the like. The reference value calculation process is executed, for example, when the automatic analyzer 1 is installed.

In the reference value calculation process, the control circuit 9 irradiates the empty reaction container 2011 with light, and obtains from the photodetector a photometric waveform generated based on the light that has passed through the reaction container 2011 (step S301). . The control circuit 9 rotates the reaction disk 201 by the system control function 91 to obtain a photometric waveform for each empty reaction container 2011 . The control circuit 9 repeats the process of step S301 until 10 photometric waveforms of each reaction container 2011 are obtained (step S302).

Next, the control circuit 9 uses the obtained photometric waveform to calculate a reference value for each reaction vessel 2011 (step S303). In the process of step S303, first, signal values from the first point P1 to the eighth point P8 are sampled from each of ten photometric waveforms. Next, an average value M_P1 and a standard deviation S_P1 of ten signal values obtained from the first point P1 are calculated as reference values. Similarly to the first point P1, the average value M_P2-M_P8 and the standard deviation S_P2-S_P8 are calculated as reference values at each of the second point P2 to the eighth point P8. The control circuit 9 repeatedly executes the calculation of the reference value described above for all the reaction containers 2011 .

The control circuit 9 stores the calculated reference value in the storage circuit 8 (step S304). Here, average values M_P1 to M_P8 and standard deviations S_P1 to S_P8 are stored as reference values for each reaction container 2011 .

The effects of the automatic analyzer 1 according to this embodiment will be described below.

The automatic analyzer 1 according to this embodiment includes a reaction vessel 2011 and a photometric unit 220 . The photometry unit 220 includes a light source that irradiates the reaction container 2011 with light and a photodetector that detects the light that has passed through the reaction container 2011 . The automatic analyzer 1 can obtain the absorbance based on the output of the photodetector and detect the residual water in the reaction vessel 2011 based on the output of the photodetector.

Also, the output of the photometric unit 220 includes a photometric waveform that indicates changes in signal values over time. Therefore, according to the automatic analyzer 1 according to the present embodiment, by detecting residual water using a photometric waveform, more signal values are taken into account than when absorbance is directly used for detecting residual water. remaining water can be detected. This further improves the detection accuracy of the presence or absence of residual water.

With the above configuration, the automatic analyzer 1 according to the present embodiment detects the residual water in the reaction container 2011 based on the output of the photodetector. Presence or absence of residual water inside can be detected with high accuracy. In addition, detection performance can be improved in detecting an abnormality in the reaction container 2011 .

Also, the sampling interval of the signal value used for detecting residual water is different from the sampling interval of the signal value used for calculating the absorbance. For this reason, by detecting residual water using signal values sampled at sampling intervals different from the calculation of absorbance, the presence or absence of residual water can be detected more accurately than when absorbance is directly used to detect residual water. be able to.

In addition, the number of samplings of signal values used for detecting residual water is greater than the number of samplings of signal values used for calculating absorbance. Therefore, according to the automatic analyzer 1 according to the present embodiment, it is possible to detect residual water by considering more signal values than when absorbance is directly used for detecting residual water. This further improves the detection accuracy of the presence or absence of residual water.

The automatic analyzer 1 also includes an output interface 6 for notifying the user of the detection result of residual water. The user can replace the reaction container 2011 in which residual water is detected by confirming the detection result of residual water displayed on the display circuit, for example. Also, the automatic analyzer 1 can stop using the reaction vessel 2011 in which residual water is detected. As a result, the inspection accuracy of the automatic analyzer 1 can be improved.

Further, the automatic analyzer 1 according to this embodiment further includes a cleaning mechanism 230 that cleans the reaction vessel 2011 . The automatic analyzer 1 can detect residual water based on the output of the photometric unit 220 obtained during the cleaning process of the reaction vessel 2011 . Therefore, the presence or absence of residual water generated during the cleaning process can be detected with high accuracy.

Further, the automatic analyzer 1 according to the present embodiment calculates the determination value based on the output of the photometric unit 220 obtained during the cleaning process, and based on the output of the photometric unit 220 obtained using the empty reaction vessel 2011. Remaining water can be detected by acquiring the reference value calculated by the method and comparing the judgment value and the reference value.

The photometric waveform when water remains is different from the photometric waveform when the reaction vessel 2011 is empty. In this embodiment, the photometric waveform acquired during the cleaning process is compared with the normal photometric waveform acquired using an empty reaction container 2011 when the automatic analyzer 1 is installed or when the reaction container 2011 is replaced. Thus, it is possible to accurately determine whether or not there is an abnormality such as residual water in the photometric waveform.

Also, the reaction container 2011 is reused for the next inspection after being dried in the drying process. The automatic analyzer 1 according to this embodiment can detect residual water based on the photometric waveform acquired after the drying process. Therefore, by detecting residual water after the drying process, it is possible to reliably prevent the reaction vessel 2011 containing residual water from being used for the next inspection.

(First Modification of First Embodiment)
In the present embodiment, an example in which the signal values extracted from the photometric waveform are used as the reference value and the determination value has been described, but other parameters calculated from the photometric waveform may be used as the determination value.

FIG. 10 is a diagram for explaining a first modification of the first embodiment. In FIG. 10, photometric waveforms detected from n reaction vessels 2011 from cell number 1 to cell number n are indicated by thin solid lines. In this modified example, coefficients α, β, and γ of a quadratic approximation curve (y=αX̂2+βX+γ) calculated from the photometric waveform are used as the reference value and the judgment value. In FIG. 10, the quadratic approximation curve is indicated by a thick solid line. A quadratic curve is generated by quadratic curve approximation of the photometric waveform.

Formula (2) is an example of a determination formula for determining the presence or absence of residual water. In Equation (2), "T_α" is the value of the approximate curve coefficient α calculated from the photometric waveform acquired during the cleaning process. “M_α” is the average value of coefficients α of the approximation curve calculated from the photometric waveform acquired when measuring the blank value. “S_α” is the standard deviation of the coefficient α calculated from the photometric waveform acquired when measuring the blank value.

M_α-3×S_α < T_α < M_α+3×S_α (2)

The control circuit 9 uses equation (2) to determine whether the coefficient T_α is within the reference range. Similarly to coefficient T_α, control circuit 9 determines whether each of coefficient T_β and coefficient T_γ is within the reference range. Then, when all of the coefficients T_α, T_β, and T_C are values within the reference range, it is determined that there is no residual water in the reaction vessel 2011 to be determined. On the other hand, if there is one or more coefficients outside the reference range, it is determined that there is residual water in the reaction vessel 2011 to be determined.

(Second Modification of First Embodiment)
FIG. 11 is a diagram for explaining a second modification of the first embodiment. FIG. 11 shows a photometric waveform detected from the reaction container 2011 to be determined. In this modification, the length of the horizontal section of the photometric waveform (hereinafter referred to as the upper side length) and the signal value of the horizontal section are used as the reference value and the determination value.

A horizontal section is a continuous range including a point Pm where the signal value is maximum (hereinafter referred to as maximum point) and having signal values within a predetermined range. In other words, all signal values contained within the horizontal interval are within the predetermined range. The predetermined range is, for example, the range from the signal value (hereinafter referred to as maximum value) Vm at the maximum point Pm to the value (Vm−A) obtained by subtracting the predetermined value L from the maximum value Vm. Also, it is a value obtained by averaging the signal value in the horizontal section and the signal value included in the horizontal section.

Equations (3) and (4) are examples of determination equations for determining the presence or absence of residual water. In Equation (3), "T_1" is the upper side length calculated from the photometric waveform acquired during the cleaning process. "M_1" is the average value of the upper side lengths calculated from the photometric waveform acquired when measuring the blank value. "S_1" is the standard deviation of the upper edge length calculated from the photometric waveform acquired when measuring the blank value. In Equation (4), "T_v" is the signal value in the horizontal section calculated from the photometric waveform acquired during the cleaning process. “M_v” is the average value of the signal values in the horizontal section calculated from the photometric waveform acquired when measuring the blank value, and “S_v” is the standard deviation of the signal values in the horizontal section.

M_1-3×S_1 < T_1 < M_1+3×S_1 (3)
M_v−3×S_v < T_v < M_v+3×S_v (4)

The control circuit 9 uses equation (3) to determine whether or not the upper side length T_1 is within the reference range, and uses equation (4) to determine if the signal value T_v is within the reference range. Determine whether or not Then, when both the upper side length T_1 and the signal value T_v in the horizontal section are values within the reference range, it is determined that there is no residual water in the reaction container 2011 to be determined. On the other hand, when one or more of the upper side length T_1 and the signal value T_v in the horizontal section are values outside the reference range, it is determined that there is residual water in the reaction vessel 2011 to be determined.

(Third Modification of First Embodiment)
FIG. 12 is a diagram for explaining a third modification of the first embodiment. In FIG. 12, the solid line indicates the photometric waveform detected from the reaction container 2011 to be determined. In this modified example, the coefficient A of the approximate straight line (y=AX+B) of the first slope section and the coefficient B of the approximate straight line (y=CX+D) of the second slope section are used as the reference value and the judgment value. In FIG. 12, the approximate straight line is indicated by a dotted line. The first slope section is a region where the signal value rises in the reaction liquid factor range Rr. The second slope section is a region where the signal value drops in the reaction liquid factor range Rr. The horizontal section is located between the first sloping section and the second sloping section.

Equations (5) and (6) are examples of determination equations for determining the presence or absence of residual water. In Equation (5), "T_A" is the value of coefficient A calculated from the photometric waveform acquired during the cleaning process. "M_A" is the average value of the coefficient A calculated from the photometric waveform acquired when measuring the blank value. "S_A" is the standard deviation of the coefficient A calculated from the photometric waveform acquired when measuring the blank value. In Equation (6), "T_C" is the value of coefficient C calculated from the photometric waveform acquired during the cleaning process. “M_C” is the average value of the coefficient C calculated from the photometric waveform acquired when measuring the blank value. "S_C" is the standard deviation of the coefficient C calculated from the photometric waveform acquired when measuring the blank value.

M_A-3 x S_A < T_A < M_A + 3 x S_A (5)
M_C-3 x S_C < T_C < M_C + 3 x S_C (6)

The control circuit 9 uses equation (5) to determine whether or not the coefficient T_A is a value within the reference range, and uses equation (6) to determine whether or not the coefficient T_C is a value within the reference range. determine whether Then, when both the coefficient T_A and the coefficient T_C are values within the reference range, it is determined that there is no residual water in the reaction vessel 2011 to be determined. On the other hand, when one or more of the coefficient T_A and the coefficient T_C are values outside the reference range, it is determined that there is residual water in the reaction vessel 2011 to be determined.

(Second embodiment)
A second embodiment will be described. This embodiment is obtained by modifying the configuration of the first embodiment as follows. Descriptions of the same configurations, operations, and effects as in the first embodiment are omitted. The automatic analyzer 1 according to the present embodiment detects residual water using a photometric waveform at a plurality of timings during the cleaning process, thereby facilitating identification of abnormal locations that cause residual water.

FIG. 13 is a diagram showing the configuration of the automatic analyzer 1 of this embodiment. The control circuit 9 executes a determination function 95 in addition to each function described in the first embodiment. The control circuit 9 that implements the determination function 95 is an example of determination means.

The control circuit 9 uses the residual water detection function 92 to detect residual water in the reaction container 2011 at a plurality of timings during the cleaning process. For example, in addition to the timing of passing the photometric unit 220 after the drying process, detection of residual water is performed at the timing of passing the photometric unit 220 after the suction process. In this case, in addition to the timing of passing the photometry position after being dried at the cleaning position W8, the control circuit 9 performs the reaction at the timing of passing the photometry position after the liquid in the reaction container 2011 is sucked at the cleaning position W7. Remaining water in container 2011 is detected.

The control circuit 9 uses the determination function 95 to perform processing for determining the cause of residual water (hereinafter referred to as determination processing) based on the output of the photometry unit 220 . For example, the control circuit 9 identifies the location of the abnormality based on the detection result of the remaining water after the drying process and the detection result of the remaining water after the suction process by the determination process. When detecting the presence or absence of residual water after the aspiration process, a value calculated based on the photometric waveform after the aspiration process measured in the state where the automatic analyzer 1 is normal is used as the reference value.

(Residual water detection processing)
Next, the operation of the remaining water detection process executed by the automatic analyzer 1 of this embodiment will be described. FIG. 14 is a flow chart showing an example of the remaining water detection process procedure according to the present embodiment. The processing of steps S401-S404 is the same as the processing of steps S201-S204 in FIG. 6, respectively, so the description thereof is omitted.

As in the first embodiment, the control circuit 9 determines the presence or absence of residual water at each timing after the drying process and after the suction process (step S405). If no residual water is detected after the drying process and after the suction process, the control circuit 9 determines that there is no residual water in the reaction container 2011 to be determined (step S405—No), and sets the residual water detection flag. It is turned off (step S406).

On the other hand, if residual water is detected at least one of the timing after the drying process and after the suction process (step S405-Yes), the control circuit 9 determines that there is residual water in the reaction vessel 2011 to be determined, A residual water detection flag is turned ON (step S407). Then, the control circuit 9 executes determination processing by the determination function 95 (step S408).

(Determination process)
Next, the operation of determination processing executed by the automatic analyzer 1 of this embodiment will be described. FIG. 15 is a flowchart showing an example of the procedure of determination processing according to this embodiment.

In the determination process, the control circuit 9 first acquires the detection result of residual water after the drying process and the detection result of residual water after the suction process (step S501). When the detection result of residual water after the suction process is "residual water" (step S502-Yes), the control circuit 9 determines that the first drainage pump 261 has an abnormality (step S503). When residual water is detected after the suction process, it can be determined that there is an abnormality in the suction pump regardless of whether there is residual water after the drying process.

When the detection result of the residual water after the suction process is "no residual water" (step S502-No), that is, when the detection result of the residual water after the drying process is "with residual water", the control circuit 9 , the second drainage pump 262 or the dry chip 296 is determined to be abnormal (step S504). If no residual water is detected after the suction process and residual water is detected after the drying process, it can be determined that the second drainage pump 262 or the drying tip 296 has an abnormality.

The control circuit 9 causes the display circuit of the output interface 6 to display the determination result described above (step S505).

The effects of the automatic analyzer 1 according to this embodiment will be described below.

The automatic analyzer 1 according to the present embodiment can identify the location of an abnormality based on the detection result of residual water after the drying process and the detection result of residual water after the suction process. That is, by detecting residual water at a plurality of timings during the cleaning process, it is possible to easily isolate the location of the cause. The user can, for example, check the location of the abnormality displayed on the display circuit, and replace only the component in which the abnormality has occurred.

It should be noted that the timing of detecting residual water may be further increased during the cleaning process. In this case, by analyzing the acquired detection result, it is possible to specify the location where the abnormality has occurred in more detail.

(First Modification of Second Embodiment)
A first modification of the second embodiment will be described. This modification is obtained by modifying the configuration of the second embodiment as follows. Descriptions of the same configurations, operations, and effects as those of the second embodiment will be omitted.

When the same type of abnormality is repeatedly detected in the same reaction container 2011 by the determination function 95, the control circuit 9 determines that the reaction container 2011 is contaminated or damaged. In this case, the control circuit 9 determines that at least one of the reaction vessel 2011, the thermostat, and the cell wiper is abnormal, and prompts the user to check the reaction vessel 2011, the thermostat, and the cell wiper.

(Determination process)
Next, the operation of determination processing executed by the automatic analyzer 1 of this modified example will be described. FIG. 16 is a flowchart showing an example of the procedure of determination processing according to this modification.

In the determination process, the control circuit 9 first acquires all photometric waveforms related to the reaction container 2011 to be determined (step S601). At this time, the control circuit 9 acquires various data used when the remaining water detection process was performed in the past. Various data include, for example, photometric waveforms, judgment values, reference values, residual water detection results, and the like.

If the same type of abnormality is repeatedly detected in the photometric waveform of the same reaction container 2011 (step S602-Yes), the control circuit 9 determines that the reaction container 2011 is dirty or damaged. For example, when the signal value T_P1 at the first point P1 repeatedly does not satisfy the expression (1), the control circuit 9 determines that the reaction container 2011 has dirt or damage at the location corresponding to the first point P1 (step S603). ). In this case, the control circuit 9 determines that at least one of the reaction vessel 2011, the constant temperature bath, and the cell wiper is abnormal, and prompts the user to check the status of the reaction vessel 2011, the constant temperature bath, and the cell wiper along with the determination result. The display is displayed on the display circuit of the output interface 6 (step S604).

The effect of the automatic analyzer 1 according to this modified example will be described below.

When an abnormality occurs in the cell wiper, dirt may adhere to the outside of the reaction vessel 2011 . Further, when an abnormality occurs in the constant temperature bath, the outside of the reaction vessel 2011 may be damaged. When the reaction container 2011 is soiled or damaged, the same type of abnormality is repeatedly detected in the same reaction container 2011 . The automatic analyzer 1 according to this modification can determine that the reaction container 2011 is contaminated or damaged when the same type of abnormality is repeatedly detected in the same reaction container 2011 . In this case, it can be determined that there is an abnormality in the reaction vessel 2011, the constant temperature bath, or the cell wiper. In other words, by determining whether or not the reaction container 2011 in which residual water is detected is contaminated or damaged, it is possible to easily isolate the location of the cause. The user can confirm or replace only the component with the abnormality by confirming the location of the abnormality displayed on the display circuit, for example.

(Second Modification of Second Embodiment)
A second modification of the second embodiment will be described. This modification is obtained by modifying the configuration of the second embodiment as follows. Descriptions of the same configurations, operations, and effects as those of the second embodiment will be omitted.

The control circuit 9 uses the determination function 95 to determine whether or not the reaction vessel 2011 is contaminated with impurities or foreign matter using the photometric waveform at the time of impurity contamination or the photometric waveform at the time of foreign matter contamination. If impurities or foreign substances are mixed in the plurality of reaction vessels 2011, the control circuit 9 determines that at least one of the cleaning channel of the cleaning mechanism 230, the water purifier, and the cleaning tank is abnormal. do. A photometric waveform at the time of impurity contamination or foreign substance contamination is measured in advance, for example, when the automatic analyzer 1 is installed, and is stored in the storage circuit 8 . The photometric waveform at the time of impurity contamination or the photometric waveform at the time of foreign matter contamination may be measured in advance for each type of impurity or foreign matter.

(Determination process)
Next, the operation of determination processing executed by the automatic analyzer 1 of this modified example will be described. FIG. 17 is a flowchart showing an example of the procedure of determination processing according to this modification. Here, as an example, a case of determining whether or not foreign matter is mixed will be described.

In the determination process, the control circuit 9 first acquires the photometric waveform acquired in the current inspection (step S701). Next, the control circuit 9 acquires the photometric waveform at the time when foreign matter is mixed in the reaction container 2011 to be determined (step S702). The control circuit 9 compares the photometric waveform acquired this time with the photometric waveform at the time of foreign matter contamination to determine the presence or absence of foreign matter in the reaction container 2011 to be determined (step S703). At this time, for example, similarly to the first embodiment and each modification of the first embodiment, the reference value and the reference range are obtained from the photometric waveform when the foreign matter is mixed in, and the determination value obtained from the photometric waveform obtained this time is The presence or absence of contamination is determined by determining whether the value is within the reference range.

If it is determined that there is foreign matter mixed in (step S703-Yes), the control circuit 9 determines that at least one of the cleaning channel, demineralizer, and cleaning tank is abnormal, and outputs the determination result. It is displayed on the display circuit of the interface 6 (step S704). At this time, for example, it is determined that at least one of the cleaning channel, the water purifier, and the cleaning tank is abnormal only when it is determined that foreign matter is mixed in the plurality of reaction vessels 2011 .

The effect of the automatic analyzer 1 according to this modified example will be described below.

The automatic analyzer 1 according to the present embodiment can determine whether or not the reaction container 2011 is contaminated with impurities or foreign matter using the photometric waveform at the time of impurity contamination or the photometric waveform at the time of foreign matter contamination. Then, when impurities or foreign substances are mixed in the plurality of reaction vessels 2011, it can be determined that at least one of the cleaning channel of the cleaning mechanism 230, the water purifier, and the cleaning tank is abnormal. That is, by determining whether or not impurities or foreign substances are mixed in the reaction vessel 2011 in which residual water is detected, it is possible to easily isolate the location of the cause. The user can confirm or replace only the component with the abnormality by confirming the location of the abnormality displayed on the display circuit, for example.

(Third Modification of Second Embodiment)
A second modification of the second embodiment will be described. This modification is obtained by modifying the configuration of the second embodiment as follows. Descriptions of the same configurations, operations, and effects as those of the second embodiment will be omitted.

The control circuit 9 uses the determination function 95 to determine the presence or absence of carryover using the photometric waveform at the time of carryover occurrence, and when carryover is detected, the reaction vessel 2011 is washed until carryover is no longer detected. Carryover is a phenomenon in which the liquid used in the immediately preceding inspection remains inside the reaction container 2011 during the next inspection. Carryover can occur when multiple tests are performed in a specific order. The photometric waveform at the time of carryover occurrence is measured in advance and stored in the storage circuit 8 as carryover information together with inspection item information.

(Determination process)
Next, the operation of determination processing executed by the automatic analyzer 1 of this modified example will be described. FIG. 18 is a flowchart showing an example of the procedure of determination processing according to this modification.

In the determination process, the control circuit 9 first discharges water into the reaction container 2011 at the cleaning position B. FIG. As a result, the reaction vessel 2011 is filled with blank water for determining the presence or absence of carryover. After that, the control circuit 9 obtains a photometric waveform obtained using the reaction container 2011 filled with blank water (step S801). Next, the control circuit 9 acquires information on inspection items (step S802). At this time, the control circuit 9 acquires the current inspection item name and the previous inspection item name. Next, the control circuit 9 acquires carryover information (step S803). The carryover information includes a photometric waveform at the time of carryover occurrence and an inspection item name. When the inspection is performed in the order in which carryover may occur, the control circuit 9 compares the photometric waveform at the time of carryover occurrence with the photometric waveform acquired in the current inspection, thereby determining the determination target. The presence or absence of carryover is determined for the reaction container 2011 (step S804). At this time, for example, similarly to the first embodiment and each modification of the first embodiment, the reference value and the reference range are obtained from the photometric waveform at the time of carryover occurrence, and the determination value obtained from the photometric waveform acquired this time The presence or absence of carryover is determined by determining whether or not is a value within the reference range.

If it is determined that carryover has occurred (step S804-Yes), the control circuit 9 cleans the reaction vessel 2011 to be determined again until carryover is no longer detected (step S805).

The effect of the automatic analyzer 1 according to this modified example will be described below.

When carryover occurs, it is considered that residual water is eliminated by washing the reaction vessel 2011 again. The automatic analyzer 1 according to this embodiment can determine the presence or absence of carryover using the photometric waveform when carryover occurs. Then, when carryover is detected, the reaction vessel 2011 can be washed until carryover is no longer detected. That is, by determining the presence or absence of carryover for the reaction container 2011 in which carryover is detected, necessary countermeasures can be efficiently taken.

According to at least one embodiment described above, it is possible to accurately detect the presence or absence of residual water in the reaction vessel.

While several embodiments of the invention have been described, these embodiments have been presented by way of example and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, replacements, and modifications can be made without departing from the scope of the invention. These embodiments and their modifications are included in the scope and spirit of the invention, as well as the scope of the invention described in the claims and equivalents thereof.

Reference Signs List 1 Automatic analyzer 2 Analysis mechanism 201 Reaction disk 2011 Reaction vessel 220 Photometry unit 230 Cleaning mechanism 240 Cleaning liquid supply unit 250 Cleaning nozzle group 260 Drainage unit 295 Drying mechanism 3 Analysis circuit 4 Drive mechanism 5 Input interface 6 Output interface 7 Communication interface 8 Storage circuit 9 Control circuit 91 System control function 92 Remaining water detection function 93 Output control function 94 Reference value calculation function 95 Judgment function W1- W5, B, W7, W8...Washing position

Claims (15)

a reaction vessel;
irradiating means for irradiating the reaction vessel with light;
a light detection means for detecting light that has passed through the reaction container;
Absorbance calculation means for obtaining absorbance based on the output of the light detection means;
residual water detection means for detecting residual water in the reaction vessel based on a time-varying waveform indicating a temporal change in signal value output from the light detection means;
An automated analyzer. The sampling interval of the plurality of signal values extracted from the output of the photodetector in the detection of residual water is different from the sampling interval of the plurality of signal values extracted from the output of the photodetector in the calculation of the absorbance.
The automatic analyzer according to claim 1. The number of samplings of a plurality of signal values extracted from the output of the light detection means in detecting residual water is greater than the number of samplings of signal values extracted from the output of the light detection means in calculating the absorbance.
The automatic analyzer according to claim 2. In the time-varying waveform, the corresponding part of the reaction vessel changes as time changes.
An automatic analyzer according to any one of claims 1 to 3. further comprising notification means for notifying the user of the detection result of the remaining water;
An automatic analyzer according to any one of claims 1 to 4. The residual water detection means stops using the reaction vessel in which residual water is detected.
The automatic analyzer according to claim 1. The remaining water detection means calculates a determination value based on the output of the light detection means obtained during the washing process, and the reference calculated based on the output of the light detection means obtained using an empty reaction vessel. detecting the residual water by obtaining a value and comparing the judgment value and the reference value;
An automatic analyzer according to any one of claims 1 to 6. The washing step includes a suction step of sucking any of waste liquid, detergent, and water from the reaction container, and a drying step of drying the reaction container after the suction step,
The residual water detection means detects the residual water based on the output of the light detection means obtained after the drying step.
An automatic analyzer according to any one of claims 1 to 6. Further comprising determination means for determining the cause of the residual water based on the output of the light detection means,
The automatic analyzer according to claim 7 or 8. The washing step includes a suction step of sucking any of waste liquid, detergent, and water from the reaction container, and a drying step of drying the reaction container after the suction step,
The determination means identifies the location of the abnormality based on the detection result of residual water after the drying process and the detection result of residual water after the suction process.
The automatic analyzer according to claim 9. The determination means determines that the reaction container is contaminated or damaged when the same type of abnormality is repeatedly detected in the same reaction container.
The automatic analyzer according to claim 9. The determination means determines that there is an abnormality in the reaction vessel, the constant temperature bath, or the cell wiper when the reaction vessel is dirty or scratched.
The automatic analyzer according to claim 11. The determination means uses the output of the light detection means at the time of impurity contamination or foreign matter contamination to determine whether or not the reaction vessel is contaminated with impurities or foreign matter.
The automatic analyzer according to claim 9. The determination means determines that at least one of the cleaning channel, the water purifier, and the cleaning tank has an abnormality when impurities or foreign substances are mixed in the plurality of reaction vessels.
The automatic analyzer according to claim 13. The judging means judges the presence or absence of carryover using the output of the light detecting means when carryover occurs, and if carryover is detected, the reaction container is washed until carryover is no longer detected.
The automatic analyzer according to claim 9.

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