JP2022094040A5 - - Google Patents

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Publication number
JP2022094040A5
JP2022094040A5 JP2020206834A JP2020206834A JP2022094040A5 JP 2022094040 A5 JP2022094040 A5 JP 2022094040A5 JP 2020206834 A JP2020206834 A JP 2020206834A JP 2020206834 A JP2020206834 A JP 2020206834A JP 2022094040 A5 JP2022094040 A5 JP 2022094040A5
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JP
Japan
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information
layout data
processing apparatus
substrate
user interface
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JP2020206834A
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English (en)
Japanese (ja)
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JP2022094040A (ja
JP7693305B2 (ja
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Priority to JP2020206834A priority Critical patent/JP7693305B2/ja
Priority claimed from JP2020206834A external-priority patent/JP7693305B2/ja
Priority to EP21210257.8A priority patent/EP4012519B1/en
Priority to US17/544,757 priority patent/US11645796B2/en
Publication of JP2022094040A publication Critical patent/JP2022094040A/ja
Publication of JP2022094040A5 publication Critical patent/JP2022094040A5/ja
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JP2020206834A 2020-12-14 2020-12-14 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法 Active JP7693305B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2020206834A JP7693305B2 (ja) 2020-12-14 2020-12-14 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法
EP21210257.8A EP4012519B1 (en) 2020-12-14 2021-11-24 Information processing apparatus, display control method, program, substrate processing apparatus, and manufacturing method of article
US17/544,757 US11645796B2 (en) 2020-12-14 2021-12-07 Information processing apparatus, display control method, storage medium, substrate processing apparatus, and manufacturing method of article

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020206834A JP7693305B2 (ja) 2020-12-14 2020-12-14 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法

Publications (3)

Publication Number Publication Date
JP2022094040A JP2022094040A (ja) 2022-06-24
JP2022094040A5 true JP2022094040A5 (https=) 2023-12-11
JP7693305B2 JP7693305B2 (ja) 2025-06-17

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ID=78789741

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JP2020206834A Active JP7693305B2 (ja) 2020-12-14 2020-12-14 情報処理装置、表示制御方法、プログラム、基板処理装置、及び物品の製造方法

Country Status (3)

Country Link
US (1) US11645796B2 (https=)
EP (1) EP4012519B1 (https=)
JP (1) JP7693305B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025030730A (ja) * 2023-08-24 2025-03-07 株式会社Kokusai Electric 基板処理装置、基板処理方法、半導体装置の製造方法、プログラム、及び制御装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002373836A (ja) 2001-06-15 2002-12-26 Canon Inc データ編集装置、データ編集方法、半導体製造装置および半導体製造方法
JP2004294358A (ja) 2003-03-28 2004-10-21 Hitachi High-Technologies Corp 欠陥検査方法および装置
US7343583B2 (en) * 2004-07-09 2008-03-11 Kla-Tencor Technologies Corporation System and method for searching for patterns of semiconductor wafer features in semiconductor wafer data
JP2006287061A (ja) 2005-04-01 2006-10-19 Canon Inc 露光装置及びそのパラメータ設定方法
JP2006310551A (ja) 2005-04-28 2006-11-09 Hitachi High-Technologies Corp 検査支援システム、及び方法
JP2008065555A (ja) 2006-09-06 2008-03-21 Hitachi High-Technologies Corp 画像処理装置の機能診断方法及び機能診断システム
JP4324207B2 (ja) * 2007-04-20 2009-09-02 キヤノン株式会社 露光装置
JP6877200B2 (ja) * 2017-03-15 2021-05-26 東京エレクトロン株式会社 基板処理装置の制御装置及び基板処理表示方法

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